TW200307586A - Scribing method and scribing device - Google Patents
Scribing method and scribing device Download PDFInfo
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- TW200307586A TW200307586A TW092113548A TW92113548A TW200307586A TW 200307586 A TW200307586 A TW 200307586A TW 092113548 A TW092113548 A TW 092113548A TW 92113548 A TW92113548 A TW 92113548A TW 200307586 A TW200307586 A TW 200307586A
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- Prior art keywords
- glass substrate
- cooling
- point
- scribing
- brittle material
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- 238000000034 method Methods 0.000 title claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 112
- 238000001816 cooling Methods 0.000 claims abstract description 53
- 238000010438 heat treatment Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 19
- 238000009826 distribution Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000011521 glass Substances 0.000 abstract description 102
- 239000013256 coordination polymer Substances 0.000 abstract description 15
- 238000005520 cutting process Methods 0.000 abstract description 5
- 230000003287 optical effect Effects 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 11
- 239000002826 coolant Substances 0.000 description 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 240000001592 Amaranthus caudatus Species 0.000 description 2
- 235000009328 Amaranthus caudatus Nutrition 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 235000012735 amaranth Nutrition 0.000 description 2
- 239000004178 amaranth Substances 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000001674 Agaricus brunnescens Nutrition 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 241000272201 Columbiformes Species 0.000 description 1
- 206010061218 Inflammation Diseases 0.000 description 1
- 206010027783 Moaning Diseases 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000004054 inflammatory process Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 235000012149 noodles Nutrition 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 210000000952 spleen Anatomy 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Thermal Sciences (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Laser Beam Processing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Description
2003075s 【决鸹薄鸯】 冲3|樂姊如淬迹。濉蝽和錐徊鰣s FPD¾黔崧眾-丨渗洳菜迦桊衾铋浓燁嵙浓β雔黹鴒。 桊淬嵙崧爷私孩潔邈吟麵sml·®-®卜β蚪许- 14鱗^Efr^^o · 5 —厶0—卜^雜細^^箨藏滸。細碎谗 徊恶游邋銪-漆連彝銶丰谇琛-一一一鎏吟鉍卜落淼恶黎泗淨濰 麻任-細^效祕^游溫^-^衆^^翁^||©-&^0^藏 -茁敦象雜绺鵷蚪孙钵令淨雔棒&。 洳丨蚪si-孩絍-桊淬窝盡+鲦£&抹孙^睇鉼卜嵙淼 沙T凇令洚迹雜-办淬渖鷂交凇耻澇逊泠涿!!!々^ 许-4雔^辦漆綷恶卡餌鰣~嵙淼滸。 泰如嵙銥嵙tle黔鵪MtaBh-择鴿浓燐嵙^Λ市丨蛉 淨雔绛β +商漭淼銪-障妒錐雔黹薛潍湼鳔槔,J1-淨命 今蹩濉黹泰嵙淼銪今塋。 狨今螌濉黹坪呤tj誨滩黹涔鸿>1雔微-和麼難雔微“ 桊1^槔溲靠槔fH-β #斧箨淼銪Ji -0>黔艏銪β蓊槔蚪孙 知HΚ麥浚绛S雜“伽游y雔微-桊砗啉麼笳雔黹身 2003075s 黹I - i琴霧徕,h-游淼新β犛槔it^- _游淼銪細碎淥 減湮啟 ti -私箨^新^^0.5-.07|^^^-#^皭^ 1001/s aTS蓊槔掙鰣。私箨淼滸今fil雔黹身浚绛卜逖 雜s jE T蚪-#麻潞寡浚务_κ滩漭。 碎雜槔,h-s嵙綦訪:^叢槔蚪赴涔鈥蓊it^^siL冷 蚪孙e S雜-丨洚^¾激淘命吟雔洚笳雒巋;5滩S77雜泠 浚绛。澇淨- it錐洚ah#s^^-»捧浚糸 t^>t^e 漭ill>1苯f#蜥琴嵙淼銪姆si-淨蘇务嵙淼銪濉和桊礤S细 S - X _衆游淼贫+ p濰士眾-4靜私游菇銪恶蕤卧噢今 桊0淨蟒势雔§0^^。 鉍T族舔麴菜abi雜卜蚪杀身和姊S盈淘fQT--身雜濉 E&e tj雜蚪浓-漆||&_耸0皆邀^逆聆爷考森趨β )命考 ^韋:&銪w-鰣阡磐襻浚-ϋ洼35鈥邀_浚泠 浚洚t-j捧;玄會6會斜1〇钎_洤铖3027768隸^镟钋~^ 讲。 如狨麼雞蚪;* -會涵9身邻-夯淖箨淼_滸50 -眾耸 泠耻躑耸#陴鰣HS61卜躑耸决>。洚鱗耸钵睇鰣£61涵 耸~鱗耸^>-#>碎蝌»捧紱舛笳淨如黔淼^滸50^崁 决>- #二 a 犛琴漭淼;&萍 50^^ir^^fa-rLSS-s:^^^ 議竣。 0。如嵙淼^銪5〇,孙卜躑耸^>涸耸11族?#捽-# t^^tj捧S^A二Ϊ令皂嘁癖6 2"tf# ;令考兴鴒恶芩考 200307586 媒體。在照射雷射光束之玻璃基板5〇表面,因雷射光束 之加熱而產生壓縮應力後,藉由噴附冷卻媒體,而產生拉 伸應力。如此般’由於在I缩應力產生區域之鄰近區域形 成拉伸應力,故在兩區域間,因個別的應力而產生應力梯 度,而在玻璃基板50,從預先形成於玻璃基板5〇端部之 切口沿著劃線預定線而形成連續的裂痕BC。由於該裂痕 很微小,一般光憑肉眼是看不到的,故將其稱為盲裂痕队。 【發明内容】 要分割玻璃基板等的脆性材料基板時,如上述般,須 進行在玻璃基板上形成劃線之劃線製程、及沿著劃:製程 所形成的劃線來實施裂片之裂片製程。劃線製程所形成的 劃線必須形成適當的深度,以在裂片製程時能順沿劃線進 :正確地裂片。另一方面’若劃線劃得過深,構成割線之 盲裂痕會貫穿到玻璃基板下面而形成整體切割(fuu b_ ㈣,而在進行裂片製程前已使破璃基板成為分割狀態, 因搬送途中之玻璃基板的落下、脫落等,可能會導致玻璃 :之分割生產線停止等的阻礙。因此’在分割對象之玻璃 土扳上形成適當深度的劃線乃相當的重要。 :而,在按照不同用途而製造各種厚度的玻璃板中, 、=薄的玻璃板的情形,如前述般,由於輪送帶上的搬 :速度調整成1〇〇_/S以下的低速,雷射光束之加熱區域 :不易到達玻璃板下面,故極有可能使盲裂痕變成整體切 200307586 射光束之輸出產生變動,由於玻璃板之加熱 區域的:度也會變動,㈣射光束之輸出變動會使所形成 之^線/木度產生變動。在厚度較薄的玻璃板,因雷射光束 之輸出產生變動’可形成適當深度盲裂痕的雷射光束輸出 :法形成盲裂痕的雷射光束輸出之差異小,又可形成 ^田木度盲4痕的雷射光束輸出、與使盲裂痕變成整體切 :::田射光束輸出之差異小,故為形成適當深度盲裂痕所 :今寺的雷射光束輸出之範圍狹小,就算在相同的劃線製 ί因雷射光束輸出產生變動,也有可能生成未形成盲裂 痕的區域、盲裂痕變成整體切割的區域這兩者。 亡本赉明之目的係提供一劃線方法及劃線裝置,其能避 '目衣痕炎成整體㈣’ ^能擴大為獲得適當深度盲裂痕 之雷射光束輸出範圍。 二了解决上述課題,本發明之劃線方法,其特徵在於 之材料基板表面’以低於該脆性材料基板軟化點 績加熱’且在該加熱區域之内部形成冷卻區域, 精此以該脆性材料基板之劃線職線來形成盲裂痕。 奶射二::月之剎線方法中較佳為,該加熱區域係藉由 知射雷射光束來形成。 上:本發明之劃線方法中較佳為,根 用來測定該脆性材料基板表 m μ ^ ^ ^ ^ ^ 妁酿度分布)所測定出之該 材:基板表面的溫度分布,而將用 冷部噴嘴移動至適當位置。 Λ π 1 又’本發明之劃線裝置,其特徵在於,係具備:將脆 200307586 性材料基板表面以低於該隸材料基板軟化點之溫度連續 加熱之加熱機構,冷卻該脆性材料基板表面之冷卻:構、只 及冷卻機構移動構機,將該冷卻機構往該加熱區域之内側 :外側移動’而使其距離該加熱機構所形成 部既定距離。 μ L» Q挪 【實施方式】 以下,詳細說明本發明之劃線方法及劃線裝置。 ,1係顯示用來實施本發明的劃線方法所使用之割線 ▲置之概略圖。該劃線裝置,例如是用來切 的玻璃基板,如圖丨所干,孫且古+ , 基板用 λα 口1所不係具有在水平架台11上沪既定 的水平方向(Υ方向,垂直紙面 ° 12。 J乃门h主设移動之滑動台 滑動台12,係在沿γ方向平行配置於架台 :軌“在15上’被支撐成能以水平狀態二 執14軌14 15之中間部,係將平行於各導 軌14、1 5之滾珠螺捍n讯 等 滾珠螺桿13可, 馬達(未圖示)轉動。 ” 可、逆轉,該滾珠螺桿13上螺人荽# i 帽16。滾珠蟫埤μ „、 干w上螺。者滾珠螺 —I#,“ ώ /、目糸以無法轉動的狀態和滑動台12設成 往:方:;袞珠螺桿13之正、逆轉,而沿著滾珠螺桿13 兩方向滑動。藉此’與滾珠螺帽16設成一體之二13 12,則沿著各導執U、15而往Υ方向滑動體之滑動台 ,被12上,將台座19配置成水平狀態。台座Η 破千订配置於㈣台12上之—對㈣Μ支撐成可滑動9 11 2003075862003075s [Decisive 鸹 thin 鸯] Chong 3 | Le Sister as hardened.濉 蝽 and cone 鲥 s FPD ¾ Qian Songzhong-丨 infiltrating amaranth Jia Jia Bi Bi concentrated 烨 嵙 concentrated β 雔 黹 鸰.桊 quench 嵙 Song Ye private child clean moaning noodles sml · ®-® Bu β 蚪 Xu-14 scales ^ Efr ^^ o · 5 — 厶 0— 卜 ^ 杂 细 ^^ 箨 藏 浒. Finely broken lingering evil spirits-Qi Lian Yi Feng Feng Chenchen-one by one groaning bismuth Bu Luomiao evil Li Si net Wei Ma Ren-fine ^ effect secret ^ 温温 ^-^ 众 ^^ 翁 ^ ||- & ^ 0 ^ Tibetan-Lun Dunxiang Miscellaneous Sun Sun Ling Ling Ling &.洳 丨 蚪 si- 童 絍-桊 quenching nest to do + 鲦 £ & wipe grandson ^ 睇 鉼 卜 嵙 淼 Sand T 凇 洚 杂 traces mixed-to do 渖 鹞 渖 鹞 渖 鹞 渖 鹞 凇 涝 逊 逊 逊 涿!! !! 々 ^ Xu-4 雔 ^ 办 lacquer 綷 evil card bait ~ 嵙 嵙 苗 浒.泰 如 嵙 Iridium 嵙 tle Guiquan MtaBh-Selective Pigeon Concentration ^ Λ City 丨 蛉 蛉 + β + 商 漭 淼 铕-障 妒 雔 黹 雔 黹 Xue Wei Ni 鳔 槔, J1- 净 命 今 蹩 濉 黹 泰 蹩 濉 黹 苗Today's tomb.狨 今 螌 濉 黹 平 岭 tj 诲 岸 黹 涔 鸿 > 1 雔 微-和 么 难 雔 微 "桊 1 ^ 槔 溲 Depends on fH-β #AX 箨 淼 铕 Ji -0 >知 孙 知 HKK Mai Jun 绛 S Miscellaneous "Ga You 雔 雔 桊 砗-桊 砗 笳 雔 黹 笳 雔 黹 笳 雔 黹 笳 雔 黹 2003 2003075s 黹 I-i 琴 雾 莱, h- 游 苗 新 β 牦 槔 it ^-_ 游 淼 铕 细碎 渌湮 湮 启 ti -Private ^ New ^^ 0.5-.07 | ^^^-# ^ 皭 ^ 1001 / s aTS 蓊 槔 earning money.私 箨 淼 浒 今 fil 雔 黹 身 绛 绛 卜 逖 Miscellaneous s jE T 蚪-# 麻 潞 孤 浚 务 _κ 漭 漭. Broken miscellaneous, h-s Interview: ^ Cong 槔 蚪 went to 涔 蓊 蓊 ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ L Waterlogging-it cone 洚 ah # s ^^-»hold Jun 糸 t ^ &t; t ^ e 漭 ill > 1benzene f # 嵙 琴 嵙 淼 铕 m si- 净 苏苏 嵙 miao 铕 濉 and 桊 礤 S 桊 礤 S -X _zhongyoumiaopo + pweishizhong-4 quiet private tour mushrooms 铕 evil 蕤 蕤 Oh now 桊 0 net python potential 雔 §0 ^^. Bismuth T family licking amaranth abi miscellaneous 蚪 蚪 killing and sister S Yingtao fQT-body miscellaneous E & e tj miscellaneous thick-lacquer || & _ tower 0 are invited ^ reverse listener Kosen trend β) life Research ^ Wei: & 铕 w- 鲥 IANPAN 襻 襻 -ϋWA 35 'invites_ Jun Ling Jun 洚 tj won; Xuan Hui 6 will oblique 10 钎 3027768 Li ^ 镟 钋 ~ ^ Lecture.如 狨 么 鸡 蚪; * -Wuhan 9 neighbors-ramming Miao _ 浒 50-Zhong LING 羞 踯 塔 # 陴 鲥 HS61 卜 踯 大 决 >.洚 Scale Tower Bowl £ 61 Han Tower ~ Scale Tower ^ >-# > Break 蝌 »Holding the net as Qian Miao ^ 浒 50 ^ 崁 定 >-# 二 a 牦 琴 漭 淼; & Ping 50 ^^ ir ^^ fa-rLSS-s: ^^^ 0. Such as Miao Miao ^ 铕 50, Sun Bu 踯 tower ^ > 涸 tower 11 family? # 捽-# t ^^ tj 手 S ^ A 二 Ϊ 令 曹 嘁 鬼 6 2 " tf #; 令 考 兴 鸰 恶 鸰 考 200307586 Media. On the surface of the glass substrate 50 irradiated with the laser beam, a compressive stress is generated by the heating of the laser beam, and then a cooling medium is sprayed to generate a tensile stress. In this way, since tensile stress is formed in the adjacent region of the I-shrinking stress generating region, a stress gradient is generated due to individual stress between the two regions. In the glass substrate 50, the glass substrate 50 is formed in advance from the end of the glass substrate 50. The cut is formed along a predetermined line to form a continuous crack BC. Because the crack is so small that it is generally invisible to the naked eye, it is called a blind crack team. [Summary of the Invention] To divide a brittle material substrate such as a glass substrate, as described above, a scribing process for forming a scribing line on the glass substrate, and a slicing process for slicing along the scribing line formed by the scribing process: . The scribe line formed by the scribe process must be formed to an appropriate depth so that the scribe line can be advanced along the sliver process: the sliver is correctly split. On the other hand, if the scribe line is drawn too deep, the blind cracks that make up the secant line will penetrate below the glass substrate to form an overall cut (fuu b_㈣), and the broken glass substrate has been divided into a state before the split process. The falling and falling of the glass substrate may cause obstacles such as the stop of the glass dividing line. Therefore, it is very important to form a scribe line of appropriate depth on the glass soil of the dividing object. However, it is important to use it according to different applications. In the manufacture of glass plates of various thicknesses, as described above, the heating area of the laser beam is adjusted by the speed of the conveyor belt: as the speed is adjusted to a low speed of 100_ / S or less: It is not easy to reach below the glass plate, so it is very possible to make the blind crack become a whole cut. The output of the 200307586 beam is changed. As the heating area of the glass plate will also vary, the output of the beam will change. / Woodiness changes. In a thin glass plate, the output of the laser beam changes due to the laser beam output that can form a blind crack of an appropriate depth: the method of forming a blind crack The difference in the output of the laser beam is small, and the laser beam output of ^ Tianmudu blind 4 marks can be formed to make the blind crack into a whole cut ::: The difference in the output of the field beam is small, so it is necessary to form a blind crack of appropriate depth. So: The scope of the laser beam output of Imaji Temple is narrow. Even if the laser beam output changes in the same scribe line, there may be areas where blind cracks are not formed, and blind cracks become areas that are cut overall. The purpose of this book is to provide a scribing method and a scribing device, which can avoid 'eyespots and inflammations as a whole' ^ can expand the laser beam output range to obtain blind cracks of appropriate depth. Second, to solve the above problems, The scribing method of the present invention is characterized in that the surface of the material substrate is 'heated at a temperature lower than the softening point of the brittle material substrate' and a cooling area is formed inside the heating area. Blind cracks are formed. Milk shot 2: The moon line method is preferably, the heating area is formed by a laser beam. Above: In the scribing method of the present invention, the root is preferably used to: Measure the temperature distribution of the brittle material substrate (m μ ^ ^ ^ ^ ^ ^). Measure the temperature distribution of the substrate: substrate surface, and move the nozzle of the cold section to an appropriate position. Λ π 1 The scribing device of the present invention is characterized in that it includes a heating mechanism that continuously heats the surface of the brittle material substrate 30307586 at a temperature lower than the softening point of the base material substrate, and cools the surface of the brittle material substrate. Cooling: The structure is moved with the cooling mechanism, and the cooling mechanism is moved to the inside of the heating area: outside, so as to be a predetermined distance from the portion formed by the heating mechanism. μ L »Q No. [Embodiment] Hereinafter, the scribing method and scribing device of the present invention will be described in detail. , 1 is a schematic diagram showing a secant line used for implementing the scribing method of the present invention. This scribing device is, for example, a glass substrate used for cutting, as shown in Figure 丨, Sun and Gu +, and the substrate λα port 1 does not have a predetermined horizontal direction (Υ direction, vertical paper surface) on the horizontal stand 11. ° 12. J is the sliding table 12 which is the main movement of the door h, which is arranged parallel to the gantry in the γ direction: the rail "on 15" is supported to be able to hold the middle of the 14 rails 14 15 in a horizontal state, The ball screw 13 which is parallel to each of the guide rails 14 and 15 can be rotated by a motor (not shown). ”Reversible, the ball screw 13 has a screw man 荽 # i cap 16. Ball。埤 μ „, dry the upper screw. Ball screw — I #,“ 糸 /, in a state that cannot be rotated and the slide table 12 is set to: square :; the ball screw 13 is positive, reverse, and along The ball screw 13 slides in two directions. With this, the two integral parts with the ball nut 16 13 12 are used to slide the sliding body of the body along the guides U and 15 in the direction of Υ, and the base 19 is arranged on the base 12 It is in a horizontal state. The pedestal Η is placed on the pedestal 12-it is slidably supported on the ㈣ 9 11 200307586
。各導軌21係沿著與γ方向〇晋翻A 之万⑻月動台12之滑動方向)正交 之X方向配置。又’在各導軌21間的 各導…行的滾珠螺桿22,滾珠螺桿22可== 行正、逆轉。 』精由馬達進 該滾珠螺桿22上螺合著滾珠螺帽24。滾珠螺帽Μ係 ::法轉:的狀態,台座19設成—雜,藉由滾珠螺桿Μ 轉’而沿者滾珠螺桿22往兩方向滑動 台座19則沿著各導軌21而往χ方向滑動。 曰 待載Ϊ=9上設置旋轉機構心在旋轉機構25上,將 f载置破璃基板5〇(切斷對象)之旋轉台25配置成水平狀 ^旋轉機構25係用來使旋轉台26繞著錯垂方向的中心 旋轉台26能以和基準位置形成任意轉 式來轉動。在旋轉台26±,例如藉 來固定破璃基板50。 貝 31。:Π6上方’以間隔適當間隔的方式配置支持台 皮支=二在錯垂狀態的光學保持…端部 = 4。光學保持具33之上端部係安裝在架 口 11上所設之安裝a 出雷^安裝台32上設有用來振盈 不田对振盪益34。雷射振堡器34所振 束,係照射至光學保持具33内所保持之光學系。 照射至光學保持且^ 33的下束?從光學保持具 由光學保持具33内所Λ 餘5〇°藉 '、寺之光學系,雷射光束係以沿既定 方向延伸之長圓形雷射絲的方式照射在麵基板5〇上。 12 200307586 在安裝於光學保持具33下端部之支持台3卜設有用 來在玻璃基板50表面形成切口之刀輪&。該刀輪託的作 用,係沿著所照射之雷射光束長邊方向而在玻璃基板5〇 端部形成裂痕(切口),該切口為盲裂痕之起點。又,其被 刀輪保持具3 6保持成可昇降。 又’在支持台31上,以靠近光學保持具33的方式設 $冷卻噴嘴移動機構37a’在該冷卻噴嘴移動機们7&上 ,置冷卻喷嘴37。該冷卻喷嘴37能將冷卻水、氦氣、氮 氣、二氧化碳等的冷卻媒體噴射至玻璃基板5〇。冷卻噴嘴 :動機構37a可移動,以使冷卻喷嘴37所放出之冷卻媒體 能遍及:從雷射光束之長圓形光點端部算起往内側既定距 勺位置k雷射光束之光點端部算起往外侧既定距離的 位置這兩合置間’而形成冷卻點。 又’在劃線裝置上設置一對CCD攝影機38、39,以對 預先在玻璃基板50上圖案化而成之對準標記進行攝影, 並在安裝# 32上設置監視器28、29,以分別顯示各⑽ 攝影機38、39所攝影之影像。 +匕又,在劃線裝置上,分別以靠近光學保器具33及冷卻 贺嘴37的方式來形成溫度感測器(用來檢測玻璃基板5〇表 面的溫度分布)40與CCD攝影機45。該溫度感測器4〇内裝 有^光元件,以f聚基板表面周邊之紅外%並轉換成電氣 、’藉此來以非接觸的方式檢測玻璃基板50表面上之雷射 光點LS及噴附冷卻媒體之冷卻點cp的溫度。⑽攝影機 ^ ’係用來將攝影信號供'給至影像處理裝未圖示),該 影像處理裝置細影像處理的方式來確認盲裂痕的形成/ 13 200307586 藉由這種劃線裝置來在玻璃基板5〇實施劃線時,首先 ,將分割成既定大小之玻璃基板50載置於割線裝置之, :台:上,並用吸引機構予以固定。接著,藉由_: 裇38、39,來攝影玻璃基板5〇上所設之對準標記。 影的對準標記係顯示在監視器28、29 t,而卩台定位用之 影像處理裝置(未圖示)來處理對準標記之位置^訊。 ’相對於支持台3卜將载置有玻璃基板5()之旋轉 位於既定位置,用雷射在玻璃基板50上實施則線口。在= 璃基板5G實施劃線時,從光學保持具33照射至破璃基板 表面之長圓形的雷射光點之長邊方向,係順沿破璃基板 取上所形成的劃線之X方向。旋轉台26之定位,係^由 ⑺動口 12之滑動、台座19之滑動、及旋轉機構μ所 之旋轉台26的旋轉來進行。 產生 當旋轉纟26相對於支持台31之定位 台方向滑動,而使玻璃基板之端部面對= 者使刀輪35降下,而在玻璃基板5 口(圖2之TR)。 <味。Ρ形成切 之後’使旋轉台26順沿劃線預定 從雷射振盪器35照射出雷射光束,同時從;二 射出冷部媒體(例如將冷卻水和壓縮空氣一起噴出)7 : 温度感測器㈣測破璃基板5。表面 布:根據 度資料,而用冷卻喷嘴移動機構 布=溫 適當的位置’藉此來決定出冷卻喷嘴37二:動到 體而言,係用溫度减測 田4置。具 4〇連續監測冷卻媒體噴射處附 14 200307586 f的表面溫度,當玻璃基板50的表面溫度接近熔融溫度 時,即控制冷卻媒體喷射用的冷卻噴嘴37之位置及噴射 圖2係顯示使用上述劃線裝置之本發明的劃線方法中 破璃基板50上的光束照射狀態之示意立體圖;圖3係示意 顯示該玻璃基板50上的物理變化狀態之俯視圖。 雷射振盪器34所振盪出的雷射光束,係在玻璃基板 表面上形成長圓形的雷射光點Ls。雷射光點^是以其 長軸和待形成的劃線方向一致的方式來進行照射。雷射力鲁 點。LS之尺寸’例如設定為長徑㈣職、短徑η」醜之 長圓形,但也能作適當的變更。雷射光點ls所產生的加 熱溫度,係低於玻璃基板5〇之熔融溫度。亦即,係比玻 璃基板50軟化點為低之溫度。藉此,被雷射光點U照射. 之玻璃基板50表面’能以不致產生熔融的方式來進行加_. Each of the guide rails 21 is arranged along the X direction which is orthogonal to the sliding direction of the Wanyi moon moving platform 12 in the γ direction and the Jin Fing A. In addition, the ball screws 22 of each guide line between the guide rails 21, the ball screws 22 can be turned forward and backward. The ball screw 22 is screwed with a ball nut 24. Ball nut M series :: French turn: In the state, the pedestal 19 is set to-miscellaneous, and the ball screw 22 is rotated along the ball screw 22 in both directions by the ball screw M rotation, and the pedestal 19 slides along the guide rails 21 in the χ direction. . The rotation mechanism 25 is set on the rotation mechanism 25, and the rotation table 25 on which the broken glass substrate 50 (cutting object) is placed is arranged horizontally. The rotation mechanism 25 is used to make the rotation table 26 The rotary table 26 can be rotated around the center of the staggered direction in an arbitrary rotation with the reference position. On the rotary table 26, for example, the broken glass substrate 50 is fixed. Bay 31. : Above Π6 ′, the support table is arranged at an appropriate interval. The cutaneous branch = two optical holdings in the prolapsed state ... the end = 4. The upper end portion of the optical holder 33 is mounted on the mounting opening 11 provided on the rack opening 11. The mounting base 32 is provided with a vibration gain 34 for vibrating against the field. The beam of the laser vibrator 34 is irradiated to the optical system held in the optical holder 33. The lower beam irradiated to the optical holder and 33 is borrowed from the optical holder by the remaining 50 ° in the optical holder 33. The optical system of the temple, the laser beam is an oblong laser that extends in a predetermined direction. The filament pattern was irradiated on the surface substrate 50. 12 200307586 A cutter wheel & for forming a cut on the surface of the glass substrate 50 is provided on the support table 3 mounted on the lower end portion of the optical holder 33. The function of the cutter wheel holder is to form a crack (notch) at the end of the glass substrate 50 along the longitudinal direction of the irradiated laser beam, and this notch is the starting point of the blind crack. In addition, it is held so that it can be raised and lowered by the cutter wheel holder 36. A cooling nozzle moving mechanism 37a is provided on the support table 31 so as to be close to the optical holder 33. A cooling nozzle 37 is placed on the cooling nozzle moving machines 7 & The cooling nozzle 37 can inject cooling media such as cooling water, helium, nitrogen, and carbon dioxide onto the glass substrate 50. Cooling nozzle: The moving mechanism 37a can be moved so that the cooling medium released by the cooling nozzle 37 can reach: from the end of the long circular light spot of the laser beam to the inner side of the light spot end of the laser beam at a predetermined distance from the spoon. The two points are positioned at a predetermined distance to the outside to form a cooling point. Also, a pair of CCD cameras 38 and 39 are provided on the scribing device to photograph the alignment marks patterned on the glass substrate 50 in advance, and monitors 28 and 29 are installed on the installation # 32 to respectively Displays images taken by each camera 38 and 39. On the scribing device, a temperature sensor (for detecting the temperature distribution on the surface of the glass substrate 50) 40 and a CCD camera 45 are formed on the scribing device so as to approach the optical holding device 33 and the cooling nozzle 37, respectively. The temperature sensor 40 is provided with a light element, which converts the infrared% of the periphery of the surface of the substrate and converts it into electricity, thereby detecting the laser light point LS and spray on the surface of the glass substrate 50 in a non-contact manner. The temperature of the cooling point cp of the cooling medium. ⑽Camera ^ 'It is used to supply photographic signals to the image processing equipment (not shown). This image processing device uses a fine image processing method to confirm the formation of blind cracks. / 13 200307586 When the substrate 50 is subjected to scribing, first, a glass substrate 50 divided into a predetermined size is placed on a slicing device, a stage, and a fixing mechanism. Next, _: 裇 38, 39 are used to photograph the alignment mark set on the glass substrate 50. The alignment marks of the shadows are displayed on the monitors 28 and 29 t, and the image processing device (not shown) used for positioning of the stage is used to process the position of the alignment marks. The rotation of the glass substrate 5 () placed on the support table 3 is located at a predetermined position, and a laser is applied to the glass substrate 50 to perform a wire opening. When the scribe is performed on the glass substrate 5G, the long side direction of the long laser light spot irradiated from the optical holder 33 to the surface of the broken glass substrate is along the X direction of the scribe line formed on the broken glass substrate. . The positioning of the rotary table 26 is performed by the sliding of the movable port 12, the sliding of the pedestal 19, and the rotation of the rotary table 26 by the rotating mechanism µ. Occurs when the rotary 纟 26 slides in the direction of the positioning table of the support table 31, so that the end of the glass substrate faces = or the cutter wheel 35 is lowered, and the mouth of the glass substrate 5 (TR in Fig. 2). < taste. After the P is formed and cut, the rotary table 26 is scribed along the scribe line to irradiate the laser beam from the laser oscillator 35, and at the same time, the second part emits the cold medium (for example, the cooling water and compressed air are sprayed together) 7: Temperature sensing器 测测 破 璃 校园 5。 5 glass substrate 5. Surface cloth: According to the degree data, the cooling nozzle moving mechanism is used to determine the proper position of the cooling nozzle. This is used to determine the cooling nozzle. The surface temperature of the cooling medium spraying point 14 200307586 f is continuously monitored. When the surface temperature of the glass substrate 50 is close to the melting temperature, the position and spraying of the cooling nozzle 37 for cooling media spraying are controlled. A schematic perspective view of the light beam irradiation state on the broken glass substrate 50 in the scribing method of the wire device of the present invention; FIG. 3 is a top view schematically showing a physical change state on the glass substrate 50. The laser beam oscillated by the laser oscillator 34 forms an oblong laser light spot Ls on the surface of the glass substrate. The laser light spot ^ is irradiated in such a manner that its major axis coincides with the direction of the scribe line to be formed. Laser power point. The size of LS 'is set to, for example, a long circle with a short diameter and a short diameter η ", but it can be changed appropriately. The heating temperature generated by the laser light spot ls is lower than the melting temperature of the glass substrate 50. That is, the temperature is lower than the softening point of the glass substrate 50. Thereby, the surface ′ of the glass substrate 50 irradiated by the laser light spot U can be added in a manner that does not cause melting_
冷部喷嘴37,係以和雷射光LS區域的後方部分重 的方式來喷附冷卻水等的冷卻媒體,㈣成冷卻點CP。 果,會在雷射光點LS與冷卻點cp之間產生溫度梯度。 在被雷射光點LS加熱之玻璃基板5〇表 產生壓縮應力;又,在被喑糾、人,、p ^ 在被噴附冷部水之冷卻點cp,合 生拉伸應力。如此般,當在 、 颅 射光”,占LS之加熱區域產 L應力、在冷卻水之冷卻點h 雷射光點LS上所產生之^/產生拉伸應力時,基; 點LS相“h 在冷卻點CP之雷射; 相反側的區域產生大的拉伸應力。利用該拉伸應; 15 ’從玻璃基板50端部 劃線預定線而形成盲裂痕Bc。料成的切口起’會順沿 BC=:::::失時,憑肉眼幾乎看㈣^^ 庫λ m 士噴附區域的附近’由於產生大的拉伸 應力’形成於麵基板50表面之f裂痕BG,#以微觀方 式觀察時則形成大幅度開口的狀態。The cold section nozzle 37 sprays a cooling medium such as cooling water in a manner so as to be heavier than the rear part of the laser light LS area to form a cooling point CP. As a result, a temperature gradient is generated between the laser light point LS and the cooling point cp. At the glass substrate 50 heated by the laser light spot LS, compressive stress is generated; and at the cooling point cp of the sprayed cold part water, the tensile stress is generated. In this way, when the "cranium emission light", which generates L stress in the heating area of LS, generates tensile stress at the cooling point h of the cooling water h laser light point LS, the base point; the point LS phase "h at Laser of the cooling point CP; the area on the opposite side generates large tensile stresses. Using this tensile stress, 15 'draws a predetermined line from the end of the glass substrate 50 to form a blind crack Bc. The incision made from the material will be along BC = ::::: When lost, it will be almost visible to the naked eye. ^^ Store λ m The vicinity of the spray area is formed on the surface of the surface substrate 50 due to large tensile stress. When f cracks BG, # are observed in a microscopic manner, a large opening state is formed.
:般而言’使用上述方法所形成之盲裂痕BC深“, 係和雷射光點Ls的大小、雷㈣點^及冷卻點cp相對於 玻璃基板50之相對移動速度V有關。: In general, the blind crack BC depth formed using the above method is related to the size of the laser light point Ls, the lightning point ^, and the relative moving speed V of the cooling point cp relative to the glass substrate 50.
裏万法係進一步在雷射光點LS中喷附冷 卻媒體,而使冷卻點CP形成在雷射光點LS的區域内。藉 此’在玻璃基才反50表層之溫度分布中、溫度在最高點附 近或下降中途’能以半強制冷卻的方式來形成冷卻點cp。 因此,當雷射光束所產生之加熱區域到達玻璃基板5〇的 下面之刚,由於對玻璃基板5〇實施冷卻,而能防止盲裂 痕BC變成整體切割,此現象乃是起因於雷射光束所產生 之加熱區域到達玻璃基板50的下面。又,就算雷射光束 之輸出產生些微變動、例如在1〇w左右,或雷射光點^及 冷卻點CP相對於玻璃基板50的移動速度產生些微的變動 ’也成形成適當深度的盲裂痕。因此’使用於劃線的雷射 光輸出所容許的變動範圍可加大,且雷射光點Ls及冷卻 點CP相對於玻璃基板5〇的移動速度所容許的變動範圍可 加大,而能進行穩定的劃線。 針對上述般將冷卻點CP形成在雷射光點ls内之本發 16 200307586 係進行實驗例^,以下 明的劃線方法,為確認其效果 詳細說明其結果。 (實驗例1) 貝㈣i 使用厚系玻璃 板。使用環形模式之雷私止未十 為破璃基 狀為39mm(長徑、 光束形 p3 , b)X1.4mm(短徑&)。在實驗例1,俜以門 ^ 1_的間隔而將冷卻點cp 糸乂間 側。亦即顯示和以往__ : 先點以部的外 以在相冋的劃線方法。結果顯示於圖4。The Rivan method further sprays a cooling medium into the laser light point LS, so that the cooling point CP is formed in the area of the laser light point LS. In this way, the cooling point cp can be formed in a semi-forced cooling manner in the temperature distribution of the surface layer of the glass-based substrate, and the temperature is near or at the highest point. Therefore, when the heating area generated by the laser beam reaches the lower side of the glass substrate 50, the cooling of the glass substrate 50 prevents the blind crack BC from becoming a whole cut. This phenomenon is caused by the laser beam. The generated heating area reaches the lower surface of the glass substrate 50. In addition, even if the output of the laser beam is slightly changed, for example, about 10w, or the laser light point ^ and the cooling point CP are slightly changed relative to the moving speed of the glass substrate 50, a blind crack of an appropriate depth is formed. Therefore, the allowable fluctuation range of the laser light output used for the scribing line can be increased, and the allowable fluctuation range of the moving speed of the laser light point Ls and the cooling point CP relative to the glass substrate 50 can be increased and stabilized. Underline. The experiment example ^ 200307586 in which the cooling point CP is formed in the laser light point ls as described above is described below. The following scribing method is described in detail to confirm the effect. (Experimental example 1) A thick glass plate was used for Behr i. Lei Weiwei in ring mode is 39mm (long diameter, beam shape p3, b) X1.4mm (short diameter &) for broken glass. In Experimental Example 1, the cooling point cp was placed on the side of the cooling point cp at an interval of ^ 1_. That is, the display is the same as in the past __: first of all, the method of scoring in the opposite. The results are shown in Figure 4.
以下’圖4〜圖8中所_示夕久々々咕也全, 匕、員不之各付唬代表如下的結果。 〇·形成正常的盲裂痕。 X ·無法形成正常的盲裂痕, 即,無法形成盲裂痕(低速度區域的情形),或 刀。J後的截面品質不良(高速度區域的情形)。 .產生盲裂痕之形成部分及未形成部分。 F :產生整體切割。 M :基板產生熔融。 (實驗例2) 貝•獄例The following “Figures 4 to 8” are all shown, and the bluffs and the fighters each show the following results. 〇. Form a normal blind crack. X · Normal blind cracks cannot be formed, that is, blind cracks cannot be formed (in the case of a low speed region), or a knife. The cross-section quality after J is poor (in the case of a high-speed region). . Formation and non-formation of blind cracks. F: Generates a whole cut. M: The substrate is melted. (Experimental example 2) Bei
板。#^錢用厚〇.7随的硬質系玻璃來作為玻璃 攸。作為照射該玻璃其〗 其光束形狀為27 ^ 光束,係使用高斯光束 ,將、人,、 _ x I 4_(短徑a)。在該條件 進^^ CP與雷射光點Ls端部的間隔作各種改變, 丁 y線。結果顯示於圖board. # ^ 钱 Use thick glass with thickness 0.7 as the glass. As the glass is irradiated, its beam shape is a beam of 27 ^, and a Gaussian beam is used, which will be, person, and _ x I 4_ (short diameter a). In this condition, the interval between the CP and the end of the laser light point Ls is changed variously, and the line is y. The results are shown in the figure
„ α b。圖5(a)係顯示冷卻點CP 的間隔形成在雷射光 示屮羽Λ 」尤點Ls的端部外側的情形,亦即 不出習知的劃線方法。圖^ m p ^ ^ 口 b(b)係顯不冷卻點CP以1_ , 网形成在雷射光點LS的妒加〜/ 的、部内側的情形。圖5(c)係! 17 200307586 不冷卻點cp以7mm的間隔形成在雷射光點Ls的端 的情形。 (實驗例3 ) 實驗例3係使用厚0.7mm的硬質系玻璃來作為玻璃基 ^作為照射該玻璃基板之雷射光束,係使用高斯光束, :、=形狀為22mm(長徑b)xl.4随(短徑小在該條件下 進行=點CP Μ射光點LS端部的間隔作各種改變,並 二Γ結果顯示於圖6。® 6(a)係顯示冷卻點cp以 示出習成在雷射光點LS的端部外側的情形,亦即顯 CPa 3rara^ 又隹W射光點LS的端部内側的情形。 (實驗例4 ) 板的硬f系玻璃來作為玻璃基 其光束形狀Λ】7 1 先束係使用環形模式, 形狀為17襲(長徑b)x ,將冷卻點⑶與雷射光點在該條件下 的間隔形成在雷射光點::冷…以 示出習知的劃線方法1 7( 的情形,亦即顯 «e Q K D)係顯不冷备p fj; rn :形成在雷射光點以的端 ;二以^的 “,劃線方法…(c)係顯示冷卻::’亦即顯示出 形成在雷射光,點LS的端部内侧;Μ顚的間隔 卻點心3_的間隔形成在雷射光點〔圖/⑷係顯示冷 。 ” 的鸲部内側的情形 18 (貫驗例5) 實驗例5係使用厚〇 5 虽併/ 其抬人k也 ◊更貝系玻璃A來作為玻璃 基板。作為照射該破璃基 —嘴 ,苴光束开…⑼ 孜之田射先束,係使用高斯光束 八尤果形狀為28mm(長徑b) X η β /, 下,脾以u ^b)X0.8mm(短徑a)。在該條件 將^部點cp與雷射光點Ls 并、社—⑹& #的間隔作各種改變, ''订剔線。結果顯示於圖8。圖8 r g 一 ㈡8 (a)係顯示冷卻點c p以 2咖的間隔形成在雷射光 “P點CP以 , 的知°卩内側的情形。圖8(b) 係顯不冷部點CP以4_的門Ks以1„Α b. FIG. 5 (a) shows the case where the interval of the cooling points CP is formed outside the end of the laser light display 屮 尤” especially the point Ls, that is, the conventional scribing method is not shown. Fig. ^ M p ^ ^ The mouth b (b) shows the case where the uncooled point CP is 1_, and the net is formed on the inside of the laser light point LS. Fig. 5 (c)! 17 200307586 The case where the uncooled points cp are formed at the ends of the laser light point Ls at intervals of 7 mm. (Experimental Example 3) Experimental Example 3 uses a hard glass with a thickness of 0.7 mm as the glass base ^ as a laser beam irradiating the glass substrate, using a Gaussian beam,:, = shape is 22mm (long diameter b) xl. 4 As the (shorter diameter is smaller under this condition, the distance between the end of the LS light spot LS and the point LS is changed in various ways, and the results are shown in Figure 6. ® 6 (a) shows the cooling point cp to show the custom On the outside of the end of the laser light spot LS, that is, when CPa 3rara ^ and on the inside of the end of the W light spot LS are shown. (Experimental Example 4) The hard f-series glass of the plate is used as the glass base and its beam shape Λ ] 7 1 The first beam system uses a ring pattern with a shape of 17 strikes (long diameter b) x. The cooling point ⑶ and the laser light point under this condition are formed at the laser light point at the interval: cold ... to show the conventional Line drawing method 17 (in the case of displaying «e QKD) is not cold standby p fj; rn: formed at the end of the laser light spot; two" ^ ", line drawing method ... (c) shows Cooling :: 'It shows that it is formed on the inside of the end of the laser light point LS; the interval of M 顚 is smaller than the interval of 3_ formed at the laser light point [Figure / ⑷ system shows cold Case 18 on the inner side of the crotch (Experimental Example 5) Experimental Example 5 uses a thickness of 0 05, but also raises the glass A as a glass substrate. As the glass substrate is irradiated,苴 Beam opening ... ⑼ The field of zizhi field is the first beam, which uses a Gaussian beam. The shape of the eight fruits is 28mm (long diameter b) X η β /, and the spleen is u ^ b) X 0.8mm (short diameter a). In this condition, the interval between the ^ part point cp and the laser light point Ls, and the interval of the company-⑹ &# are variously changed, and the order is set. The results are shown in Figure 8. Fig. 8 rg ㈡ 8 (a) shows the case where the cooling points cp are formed on the inside of the laser light "P point CP at a distance of 2 °". Fig. 8 (b) shows that the uncooled point CP is 4 Gate of Ks with 1
Λ ,θιΙ 6, ^ y 的間隔形成在雷射光點LS的端部 内側的6形。圖8(c)係顯示 a Φ ,+ . T c , ν Ρ點LP以6mm的間隔形成 在雷射先點LS的端部内側的情形。 如以上實驗例彳〜R _ 仃之副線結果所示,依玻璃基 板与度(0. 7mm、Q. 5π〇,雖 & 1 & # & & ^ ^ 、入 雖、、、田0卩的最佳條件會有不同,但將 々部點CP形成在雷射井點丨 九點LS内側之本發明的劃線方法, 相較於將冷卻點CP形成在♦鼾本 、、 取隹田射先點LS外側之習知劃線方 ^可減)整體切割現象的發生,且將雷射光點u及冷The intervals of Λ, θιΙ 6, ^ y are formed in a six shape inside the end of the laser light point LS. FIG. 8 (c) shows a case where a Φ, +. T c, ν P points LP are formed on the inside of the end of the laser advance point LS at an interval of 6 mm. As shown in the results of the auxiliary line of the above experimental example 彳 ~ R 仃 依, depending on the glass substrate and the degree (0.7mm, Q.5π〇, although & 1 &# & & ^ ^, into though ,,,, The optimal conditions of Tian 0 卩 will be different, but the scribing method of the present invention in which the burr point CP is formed inside the laser well point 丨 9 points LS is compared with the method of forming the cooling point CP in the 鼾, (Take the conventional scribe line outside Putian's first point LS, which can be reduced) The occurrence of the overall cutting phenomenon, and the laser light point u and cold
:點,之既定移動速度擴張成士1Ws左右、將雷射光 束之既定輸出擴張成士 1QW左太夕嗝Α Μ 左右之適當靶圍時,仍能形成 、¥珠度的盲裂痕。 圖10係顯示玻璃基板自動分割生產線1GG的概略示意 圖,該生產線⑽係在劃線裝置後方組裝㈣片裝置之玻 璃基板50分割自動化生產線之一例。 。亥玻璃基板自動分割生產線〗⑽係用來分割成單片玻 璃基板者’其具備:裝設有玻璃基板50收納用£之匣裝 載器m’將取出自£裝載器101之玻璃基板5〇載置並實 19 200307586 施2位之輸送帶102,用來在玻璃基板50上劃線之本發明 的劃線裝置103,將形成劃線後的玻璃基板50載置並實施 =位之輸送帶104,由二合一之台所構成之裂片裝置1〇5( 精由使至少1個台向下轉動而將玻璃基板50彎曲而使玻璃 基板50沿著劃線進行分割),將分割後的玻璃基板$⑽搬 到玻璃基板自動分割生產線丨〇 〇外之搬出輸送帶1 〇 6。在 該玻璃基板自動分割生產線1〇〇之各處,係設有用來進行 各狀憑的玻璃基板5〇之搬送等之機械手臂R]l〜R5。 接著,說明該玻璃基板自動分割生產線1〇〇之動作。 囑 收納於匣裝載器101的匣内之玻璃基板5〇,以機械手 臂(供材機械手臂)R1取出後,將取出之玻璃基板5〇放置 在輸送帶102上。接著將玻璃基板5〇定位於輸送帶ι〇2之 前方側。之後,用機械手臂(搬送機械手臂)R2保持玻璃基 、 板5 0而將其搬送至劃線裝置丨〇 3内。 搬送來之玻璃基板5 〇係載置於劃線裝置1 〇 3内之台上 。在劃線裝置103,如上述般,係在玻璃基板5〇上沿=預 先決定的線來形成盲裂痕Bc。在劃線裝置i 〇3,當玻璃基 € 板50表面無法良好地形成既定的盲裂痕BC時,係從影^ 處理(未圖不)送出NG信號,而使劃線裝置J 03停止動作, 並發出警報以告知有異常產生。 另一方面,在劃線裝置103,當玻璃基板50表面可良 好地形成盲裂痕BC時,用機械手臂(搬送機械手臂)R3保 持玻璃基板50而將其載置於輸送帶上。 載置於輸送帶104上的玻璃基板5〇被定位於輪送帶 20 200307586 104之前方側後,用機械手臂(搬送機械手臂)R4將玻璃基 、 板50搬送至裂片裝置1〇5,且使玻璃基板5〇的盲裂痕B(: 位於一合一的台彼此間之中央。 將被裂片裝置1 〇 5分割成複數片之玻璃基板(以下,將 分割成複數片後之各玻璃基板稱為玻璃基板5〇B),用機械 手臂(搬送機械手臂)R5載置於搬出輸送帶1〇5上。 又,也能採用另一個生產線之構成,其在影像處理裝 置產生NG信號時,係將未形成既定的盲裂痕BC之玻璃基 板50從生產線100自動搬出。藉此即可構成全自動運轉。 _ 關於以上所說明之本發明劃線方法,在本實施形態, 係針對用圖1所示的劃線裝置來形成劃線的情形作說明, 但本發明所能獲得的效果並不限於此,例如,對於在玻璃 板的生產線之輸送帶上所搬送之玻璃基板,沿著搬送方向 與搬送方向之正交方向來形成劃線之裝置,當然也能適用。 如以上所說明,本發明之劃線方法之特徵在於,係將 脆㈣料基板表面,以低於該脆性材料基板軟化點之溫度 j績加熱,且在該加熱區域之内部形成冷卻區域,藉此沿 =該脆性材料基板之劃線預定線來形成盲裂痕。因此,本 發明之劃線方法’藉由將溫度最高點附近或下降中途的加 熱區域實施半強制冷卻,能防止整體切割的現象,而能形 成適當深度的盲裂痕。本發明之劃線方法’相較於將冷卻 區$形成於加熱區域外側之習知劃線方法,可將加熱區域 一々〃卩區域之既疋移動速度擴張成± 1 Omm/s左右、將雷射 $束之既疋輸出擴張成士1〇w左右之適當範圍,而穩定地 實施適當的劃線。 21 200307586 【圖式簡單說明】 (一)圖式部分 *圖1係顯示用來實施本發明的 裝置之概略圖。 劃線方法所使用之劃線 圖2顯示你田m , 用圖1剑線裝置之本發明的劃線方法 破螭基板50上的水击⑽A 光束…、射狀態之示意立體圖。 圖3係不意顯示圖2玻璃基板50上的物理變化狀 俯梘圖。 中、 態之 圖4係顯示實驗例1的結果。 圖5(a)〜(c)係分別顯示實驗例2的結果。 圖6(a)、(b)係分別顯示實驗例3的結果。 圖7(a)〜(d)係分別顯示實驗例4的結果。 圖8(a)〜(c)係分別顯示實驗例5的結果。 圖9係用來說明藉由雷射光束來形成劃線的方法之示: When the predetermined moving speed is expanded to about 1Ws, and the predetermined output of the laser beam is expanded to about 1QW Zuo Taixi 嗝 ΑM, the blind crack can still be formed. Fig. 10 is a schematic diagram showing a glass substrate automatic dividing production line 1GG, which is an example of an automated glass substrate 50 dividing production line in which a cymbal device is assembled behind a scribing device. . The glass substrate automatic dividing production line is designed to be divided into single glass substrates. It is provided with: a cassette loader m equipped with a glass substrate 50 for storage and will be taken out of the glass substrate 50 from the loader 101. 19 200307586 A conveyor belt 102 with two positions is used for scribing device 103 of the present invention for scribing on glass substrate 50, and the glass substrate 50 after the scribing is placed and carried out. A split device 105 composed of a two-in-one table (by rotating at least one table downward to bend the glass substrate 50 and dividing the glass substrate 50 along the scribe line), the divided glass substrate $ ⑽ Moved to the glass substrate automatic dividing production line 丨 00 and removed the conveyor belt 106. Robotic arms R] l ~ R5 for conveying various glass substrates 50, etc., are provided throughout the glass substrate automatic dividing production line 100. Next, the operation of the glass substrate automatic dividing production line 100 will be described. The glass substrate 50 stored in the cassette of the cassette loader 101 is taken out by a robot arm (feeding robot arm) R1, and the taken-out glass substrate 50 is placed on the conveyor belt 102. Next, the glass substrate 50 is positioned on the front side of the conveyor belt 02. After that, the glass substrate and the plate 50 are held by a robot arm (transfer robot arm) R2 and transferred to the scribing device. The glass substrate 50 that has been transported is placed on a table within the scribing device 103. In the scribing device 103, as described above, a blind crack Bc is formed on the glass substrate 50 along a predetermined line. In the scribing device i 03, when a predetermined blind crack BC cannot be formed well on the surface of the glass substrate 50, the NG signal is sent from the shadow processing (not shown), and the scribing device J 03 is stopped, and Issue an alert to inform you of anomalies. On the other hand, in the scribing device 103, when a blind crack BC can be formed on the surface of the glass substrate 50, the glass substrate 50 is held by a robot arm (conveying robot arm) R3 and placed on a conveyor belt. The glass substrate 50 placed on the conveyor belt 104 is positioned on the front side of the carousel belt 20 200307586 104, and the glass substrate and the plate 50 are transferred to the splitting device 105 by a robot arm (transfer robot arm) R4, and Blind crack B () of the glass substrate 50 is located at the center of each of the one-in-one tables. The glass substrate divided into a plurality of pieces by the splitting device 105 (hereinafter, each glass substrate divided into a plurality of pieces is called It is a glass substrate 50B), and it is placed on the unloading conveyor 105 by a robot arm (conveying robot arm) R5. Alternatively, another production line configuration can be adopted. When the image processing device generates an NG signal, the system The glass substrate 50 without the predetermined blind crack BC is automatically carried out from the production line 100. This can constitute a fully automatic operation. _ The scribe method of the present invention described above, in this embodiment, is directed to the use of FIG. The case where the scribing device is used to form a scribing device will be described, but the effect obtained by the present invention is not limited to this. For example, for a glass substrate transported on a conveyor belt of a glass plate production line, A device for forming a scribing line orthogonal to the conveying direction can of course also be applied. As described above, the scribing method of the present invention is characterized in that the surface of the brittle material substrate is softened below the brittle material substrate The temperature of the point is heated, and a cooling area is formed inside the heating area, thereby forming a blind crack along a predetermined line of the scribe line of the brittle material substrate. Therefore, the scribe method of the present invention 'uses the highest temperature The semi-forced cooling in the heating area near the point or in the middle of the descent can prevent the overall cutting phenomenon and form a blind crack of an appropriate depth. Compared with the habit of forming the cooling area $ on the outside of the heating area, the scribing method of the present invention Knowing the scribing method, it can expand the moving speed of a region of the heating area to about 1 Omm / s, and expand the laser output of the laser beam to an appropriate range of about 10w, and stably. Implement appropriate scribing. 21 200307586 [Brief description of the drawings] (I) Schematic part * Figure 1 shows a schematic diagram of the device used to implement the present invention. The scribing used by the scribing method Fig. 2 is a schematic perspective view of your field m, using the scribing method of the present invention of the sword-line device of Fig. 1 to break the water strike A beam on the substrate 50 ..., and a schematic perspective view of the shot state. Figure 4 shows the results of physical changes. Figure 4 in the middle and the state shows the results of Experimental Example 1. Figures 5 (a) to (c) show the results in Experimental Example 2. Figures 6 (a) and (b) respectively The results of Experimental Example 3 are shown. Figures 7 (a) to (d) are the results of Experimental Example 4. Figures 8 (a) to (c) are the results of Experimental Example 5. Figure 9 is used to illustrate borrowing. The method of forming a scribe line by a laser beam
圖10係玻璃基板自動分割生產線1 〇〇之概略示意圖。 (二)元件代表符號 11…架台Fig. 10 is a schematic diagram of a glass substrate automatic dividing production line 100. (Two) the symbol of the component 11 ...
12…滑動台 13…滾珠螺桿 14…導軌 15…導軌 16…滾珠螺帽 1 9…台座 22 200307586 21··· 導執 22··· 滾珠螺桿 23··· 馬達 24··· 滚珠螺帽 25… 旋轉機構 26··· 旋轉台 28··· 馬達 29"· 馬達 31··· 支持台 32··· 安裝台 33··· 光學保持具 34··· 雷射振盪器 35"· 刀輪 36"· 刀輪保持具 37… 冷卻喷嘴 38… CCD攝影機 39"· CCD攝影機 50··· 玻璃基板12… Sliding table 13… Ball screw 14… Guide 15… Guide 16… Ball nut 1 9… Base 22 200307586 21 ··· Guide 22 ·· Ball screw 23 ··· Motor 24 ··· Ball nut 25 … Rotating mechanism 26 ··· Rotating table 28 ··· Motor 29 " · Motor 31 ··· Supporting table 32 ··· Mounting table 33 ·· Optical holder 34 ·· Laser oscillator 35 " 36 " knife holder 37 ... cooling nozzle 38 ... CCD camera 39 " CCD camera 50 ... glass substrate
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002170520A JP4408607B2 (en) | 2002-06-11 | 2002-06-11 | Scribing method and scribing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200307586A true TW200307586A (en) | 2003-12-16 |
| TWI299293B TWI299293B (en) | 2008-08-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092113548A TW200307586A (en) | 2002-06-11 | 2003-05-20 | Scribing method and scribing device |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4408607B2 (en) |
| KR (1) | KR100925287B1 (en) |
| CN (1) | CN100431108C (en) |
| TW (1) | TW200307586A (en) |
Cited By (4)
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| US9533910B2 (en) | 2009-08-28 | 2017-01-03 | Corning Incorporated | Methods for laser cutting glass substrates |
| US9610653B2 (en) | 2012-09-21 | 2017-04-04 | Electro Scientific Industries, Inc. | Method and apparatus for separation of workpieces and articles produced thereby |
| US9938180B2 (en) | 2012-06-05 | 2018-04-10 | Corning Incorporated | Methods of cutting glass using a laser |
| US10358374B2 (en) | 2009-11-30 | 2019-07-23 | Corning Incorporated | Methods for laser scribing and separating glass substrates |
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| JP4615231B2 (en) * | 2004-02-02 | 2011-01-19 | 三星ダイヤモンド工業株式会社 | Scribing apparatus and scribing method using the apparatus |
| KR101043674B1 (en) * | 2004-05-11 | 2011-06-23 | 엘지디스플레이 주식회사 | Scribing Device and Method |
| CN100577386C (en) * | 2004-05-20 | 2010-01-06 | 三星钻石工业股份有限公司 | Motherboard dividing method, motherboard scribing device |
| KR100602623B1 (en) * | 2004-05-31 | 2006-07-19 | 윤종진 | Cutting device of lump rubber |
| US7820941B2 (en) * | 2004-07-30 | 2010-10-26 | Corning Incorporated | Process and apparatus for scoring a brittle material |
| KR101096733B1 (en) | 2004-12-27 | 2011-12-21 | 엘지디스플레이 주식회사 | Cutting device for substrate and cutting method using the same |
| US7423818B2 (en) * | 2005-07-15 | 2008-09-09 | Electro Scientific Industries, Inc. | Method of suppressing distortion of a working laser beam of a laser link processing system |
| JP4851795B2 (en) * | 2006-01-13 | 2012-01-11 | 株式会社ディスコ | Wafer divider |
| JP4251203B2 (en) | 2006-08-29 | 2009-04-08 | セイコーエプソン株式会社 | Method for scribing bonded mother substrate and dividing method for bonded mother substrate |
| WO2008133800A1 (en) * | 2007-04-30 | 2008-11-06 | Corning Incorporated | Apparatus, system, and method for scoring a moving glass ribbon |
| US7982162B2 (en) * | 2007-05-15 | 2011-07-19 | Corning Incorporated | Method and apparatus for scoring and separating a brittle material with a single beam of radiation |
| US8051679B2 (en) * | 2008-09-29 | 2011-11-08 | Corning Incorporated | Laser separation of glass sheets |
| US8426767B2 (en) * | 2009-08-31 | 2013-04-23 | Corning Incorporated | Methods for laser scribing and breaking thin glass |
| US8720228B2 (en) | 2010-08-31 | 2014-05-13 | Corning Incorporated | Methods of separating strengthened glass substrates |
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| TW201231421A (en) * | 2010-11-30 | 2012-08-01 | Corning Inc | Methods for separating a sheet of brittle material |
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| JP5879106B2 (en) * | 2011-11-25 | 2016-03-08 | 三星ダイヤモンド工業株式会社 | Method for scribing a brittle material substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MY120533A (en) * | 1997-04-14 | 2005-11-30 | Schott Ag | Method and apparatus for cutting through a flat workpiece made of brittle material, especially glass. |
| JP2001130921A (en) * | 1999-10-29 | 2001-05-15 | Mitsuboshi Diamond Industrial Co Ltd | Method and device for processing brittle substrate |
| ES2304987T3 (en) * | 1999-11-24 | 2008-11-01 | Applied Photonics, Inc. | METHOD AND APPARATUS FOR SEPARATING NON-METALLIC MATERIALS. |
| KR100673073B1 (en) * | 2000-10-21 | 2007-01-22 | 삼성전자주식회사 | Method and apparatus for cutting nonmetallic substrate using laser beam |
-
2002
- 2002-06-11 JP JP2002170520A patent/JP4408607B2/en not_active Expired - Fee Related
-
2003
- 2003-05-20 TW TW092113548A patent/TW200307586A/en not_active IP Right Cessation
- 2003-05-30 KR KR1020030034598A patent/KR100925287B1/en not_active Expired - Fee Related
- 2003-06-11 CN CNB031412890A patent/CN100431108C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9533910B2 (en) | 2009-08-28 | 2017-01-03 | Corning Incorporated | Methods for laser cutting glass substrates |
| US10358374B2 (en) | 2009-11-30 | 2019-07-23 | Corning Incorporated | Methods for laser scribing and separating glass substrates |
| US9938180B2 (en) | 2012-06-05 | 2018-04-10 | Corning Incorporated | Methods of cutting glass using a laser |
| US9610653B2 (en) | 2012-09-21 | 2017-04-04 | Electro Scientific Industries, Inc. | Method and apparatus for separation of workpieces and articles produced thereby |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004010466A (en) | 2004-01-15 |
| TWI299293B (en) | 2008-08-01 |
| KR100925287B1 (en) | 2009-11-05 |
| JP4408607B2 (en) | 2010-02-03 |
| KR20030095233A (en) | 2003-12-18 |
| CN100431108C (en) | 2008-11-05 |
| CN1468695A (en) | 2004-01-21 |
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