[go: up one dir, main page]

SG144817A1 - Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys - Google Patents

Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys

Info

Publication number
SG144817A1
SG144817A1 SG200800102-6A SG2008001026A SG144817A1 SG 144817 A1 SG144817 A1 SG 144817A1 SG 2008001026 A SG2008001026 A SG 2008001026A SG 144817 A1 SG144817 A1 SG 144817A1
Authority
SG
Singapore
Prior art keywords
alloys
magnetic recording
perpendicular magnetic
media
granular perpendicular
Prior art date
Application number
SG200800102-6A
Other languages
English (en)
Inventor
Anirban Das
Michael Gene Racine
Makoto Imakawa
Steven Roger Kennedy
Rikhit Arora
Original Assignee
Heraeus Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Inc filed Critical Heraeus Inc
Publication of SG144817A1 publication Critical patent/SG144817A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/06—Making non-ferrous alloys with the use of special agents for refining or deoxidising
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7371—Non-magnetic single underlayer comprising nickel
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7373—Non-magnetic single underlayer comprising chromium
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7377—Physical structure of underlayer, e.g. texture
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
SG200800102-6A 2007-01-08 2008-01-07 Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys SG144817A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87941807P 2007-01-08 2007-01-08
US11/877,587 US20080166596A1 (en) 2007-01-08 2007-10-23 Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys

Publications (1)

Publication Number Publication Date
SG144817A1 true SG144817A1 (en) 2008-08-28

Family

ID=39594563

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200800102-6A SG144817A1 (en) 2007-01-08 2008-01-07 Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys

Country Status (6)

Country Link
US (1) US20080166596A1 (ja)
JP (1) JP2008169483A (ja)
KR (1) KR20080065241A (ja)
CN (2) CN101220434A (ja)
SG (1) SG144817A1 (ja)
TW (1) TW200839018A (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7866418B2 (en) 2008-10-03 2011-01-11 Us Synthetic Corporation Rotary drill bit including polycrystalline diamond cutting elements
US9315881B2 (en) 2008-10-03 2016-04-19 Us Synthetic Corporation Polycrystalline diamond, polycrystalline diamond compacts, methods of making same, and applications
US8297382B2 (en) 2008-10-03 2012-10-30 Us Synthetic Corporation Polycrystalline diamond compacts, method of fabricating same, and various applications
TWI382408B (zh) * 2008-12-22 2013-01-11 國立清華大學 垂直記錄媒體
CN102453932A (zh) * 2010-10-25 2012-05-16 北京卫星环境工程研究所 锇膜的电镀制备方法
US8758912B2 (en) 2011-09-16 2014-06-24 WD Media, LLC Interlayers for magnetic recording media
JP5930725B2 (ja) * 2012-01-17 2016-06-08 キヤノン株式会社 アモルファス合金、成形用型および光学素子の成形方法
JP5936487B2 (ja) * 2012-08-23 2016-06-22 キヤノン株式会社 アモルファス合金、成形用型および光学素子の製造方法
CN106270530B (zh) * 2016-08-18 2018-06-19 中铼新材料有限公司 一种高密度纯铼试管的制造方法
CN108160995B (zh) * 2017-12-25 2020-03-06 安泰天龙钨钼科技有限公司 纯铼制品的制备方法
CN108213441B (zh) * 2017-12-25 2019-12-31 安泰天龙钨钼科技有限公司 一种纯铼管的制备方法
CN108213440B (zh) * 2017-12-25 2019-12-31 安泰天龙钨钼科技有限公司 一种钼铼合金管材的制备方法
CN108296487B (zh) * 2017-12-25 2020-08-11 安泰天龙钨钼科技有限公司 一种纯铼板的制备方法
TWI663264B (zh) * 2017-12-27 2019-06-21 光洋應用材料科技股份有限公司 含釕錸濺鍍靶材、含釕錸層及其製法
TWI658150B (zh) * 2018-02-05 2019-05-01 光洋應用材料科技股份有限公司 含鈷鉻鉑硼錸濺鍍靶材、含鈷鉻鉑硼錸層及其製法
CN108480621A (zh) * 2018-04-26 2018-09-04 航天材料及工艺研究所 一种利用球形铼粉成形铼构件的方法
WO2020031459A1 (ja) * 2018-08-09 2020-02-13 Ｊｘ金属株式会社 スパッタリングターゲット、グラニュラ膜および垂直磁気記録媒体
EP4486405A2 (en) * 2022-03-03 2025-01-08 MiRus LLC Medical device that includes a rhenium-chromium alloy
CN117448772A (zh) * 2023-10-26 2024-01-26 西北有色金属研究院 一种制备难熔高熵NbMoTaWRe纳米薄膜的方法

Also Published As

Publication number Publication date
TW200839018A (en) 2008-10-01
CN101220434A (zh) 2008-07-16
US20080166596A1 (en) 2008-07-10
JP2008169483A (ja) 2008-07-24
KR20080065241A (ko) 2008-07-11
CN101230426A (zh) 2008-07-30

Similar Documents

Publication Publication Date Title
SG144817A1 (en) Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
Ren et al. Structure and mechanical properties of multi-element (AlCrMnMoNiZr) Nx coatings by reactive magnetron sputtering
TW200717472A (en) Heatsink films for magnetic recording media
WO2009054369A1 (ja) 磁気記録膜用スパッタリングターゲットおよびその製造方法
US10600440B2 (en) Sputtering target for forming magnetic recording film and method for producing same
SG142249A1 (en) Co-fe-zr based alloy sputtering target material and process for production thereof
WO2007146964A3 (en) Thin-film devices fromed from solid particles
SG143177A1 (en) (cofe)zrnb/ta/hf based target material and method for producing the same
WO2005084242A3 (en) Method of making sputtering target
EP1956106A3 (en) Re-based alloys usable as deposition targets for forming interlayers in granular perpendicular magnetic recording media & media utilizing said alloys
MY182858A (en) Fe-co-based alloy sputtering target material
TW200731300A (en) Ruthenium alloy magnetic media and sputter targets
SG140548A1 (en) Cr-doped fecob based target material and method for producing the same
Ren et al. Effect of sputtering parameters on (AlCrMnMoNiZr) N films
TW200617192A (en) Sputter target material for improved magnetic layer
MY167435A (en) Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same
EP1780300A3 (en) Carbon containing sputter target alloy compositions
MY169280A (en) Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same
SG134200A1 (en) Magnetic sputter targets manufactured using directional solidification
MY174127A (en) Fept-based sputtering target
GB2441330B (en) Alloys, bulk metallic glass, and methods of forming the same
JP2010095794A (ja) Ｃｏ−Ｆｅ−Ｎｉ系合金スパッタリングターゲット材の製造方法
Zhang et al. Formation of conical carbides on the surface of stainless and alloy steels by sputter-etching
Berrached et al. Nitriding effect on structural stability and magnetic properties of FeAl alloys: DFT study
SG144788A1 (en) Full density co-w magnetic sputter targets