KR900006818A - 감방사선성 수지 조성물 - Google Patents

감방사선성 수지 조성물

Info

Publication number: KR900006818A
Authority: KR; South Korea
Prior art keywords: radiation; resin composition; sensitive resin; sensitive; composition
Prior art date: 1988-10-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

KR1019890014917A

Other languages

English (en)

Other versions

KR0126914B1 (ko

Inventor

사또시 미야시따

아끼히로 야마노우찌

이꾸오 노즈에

다까오 미우라

Original Assignee

니혼 고오세이 고무 가부시끼가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-10-18

Filing date

1989-10-17

Publication date

1990-05-08

1989-10-17 Application filed by 니혼 고오세이 고무 가부시끼가이샤 filed Critical 니혼 고오세이 고무 가부시끼가이샤

1990-05-08 Publication of KR900006818A publication Critical patent/KR900006818A/ko

1997-12-26 Application granted granted Critical

1997-12-26 Publication of KR0126914B1 publication Critical patent/KR0126914B1/ko

2009-10-17 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Medicinal Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)

KR1019890014917A 1988-10-18 1989-10-17 감방사선성 수지 조성물 Expired - Lifetime KR0126914B1 (ko)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP63-262084		1988-10-18
JP63262084A JP2623778B2 (ja)	1988-10-18	1988-10-18	感放射線性樹脂組成物

Publications (2)

Publication Number	Publication Date
KR900006818A true KR900006818A (ko)	1990-05-08
KR0126914B1 KR0126914B1 (ko)	1997-12-26

Family

ID=17370806

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1019890014917A Expired - Lifetime KR0126914B1 (ko)	1988-10-18	1989-10-17	감방사선성 수지 조성물

Country Status (4)

Country	Link
EP (1)	EP0365318B1 (ko)
JP (1)	JP2623778B2 (ko)
KR (1)	KR0126914B1 (ko)
DE (1)	DE68913898T2 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2645587B2 (ja) *	1989-03-29	1997-08-25	富士写真フイルム株式会社	微細パターン形成材料及び微細パターン形成方法
CA2023791A1 (en) *	1989-08-24	1991-02-25	Ayako Ida	Radiation-sensitive positive resist composition
DE4003025A1 (de) *	1990-02-02	1991-08-08	Hoechst Ag	Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
US5279918A (en) *	1990-05-02	1994-01-18	Mitsubishi Kasei Corporation	Photoresist composition comprising a quinone diazide sulfonate of a novolac resin
US5413896A (en) *	1991-01-24	1995-05-09	Japan Synthetic Rubber Co., Ltd.	I-ray sensitive positive resist composition
SG49669A1 (en) *	1992-09-28	1998-06-15	Hoechst Celanese Corp	Positive working photoresist composition
US5371169A (en) *	1992-09-28	1994-12-06	Hoechst Celanese Corporation	Novolak resin mixtures
KR100305333B1 (ko) *	1993-10-28	2001-11-22	마티네즈 길러모	감광성수지조성물및이를사용한패턴의형성방법
JP3434340B2 (ja) *	1994-03-29	2003-08-04	東京応化工業株式会社	高感度ポジ型ホトレジスト組成物
JPH0990622A (ja) *	1995-09-22	1997-04-04	Fuji Photo Film Co Ltd	ポジ型フォトレジスト組成物
KR101253351B1 (ko) *	2005-01-28	2013-04-11	스미토모 베이클라이트 가부시키가이샤	노볼락형 페놀 수지의 제조방법, 노볼락형 페놀 수지 및포토레지스트용 페놀 수지 조성물

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60176034A (ja) *	1984-02-23	1985-09-10	Japan Synthetic Rubber Co Ltd	ポジ型感光性樹脂組成物
JPS6035347A (ja) *	1984-06-07	1985-02-23	Toppan Printing Co Ltd	ピツクアツプ
JPS61205933A (ja) *	1985-03-08	1986-09-12	Konishiroku Photo Ind Co Ltd	感光性平版印刷版
JPH0654384B2 (ja) *	1985-08-09	1994-07-20	東京応化工業株式会社	ポジ型ホトレジスト組成物
EP0227487B1 (en) *	1985-12-27	1992-07-15	Japan Synthetic Rubber Co., Ltd.	Positive type radiation-sensitive resin composition
DE3751743T2 (de) *	1986-03-28	1996-11-14	Japan Synthetic Rubber Co Ltd	Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPH0654386B2 (ja) *	1986-03-28	1994-07-20	日本合成ゴム株式会社	ポジ型感放射線性樹脂組成物
JPS62229138A (ja) *	1986-03-29	1987-10-07	Nippon Zeon Co Ltd	ポジ型フオトレジスト組成物
JP2555620B2 (ja) *	1987-08-21	1996-11-20	日本合成ゴム株式会社	感放射線性樹脂組成物

1988
- 1988-10-18 JP JP63262084A patent/JP2623778B2/ja not_active Expired - Fee Related
1989
- 1989-10-17 KR KR1019890014917A patent/KR0126914B1/ko not_active Expired - Lifetime
- 1989-10-18 DE DE68913898T patent/DE68913898T2/de not_active Expired - Lifetime
- 1989-10-18 EP EP89310735A patent/EP0365318B1/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
KR0126914B1 (ko)	1997-12-26
EP0365318B1 (en)	1994-03-16
DE68913898T2 (de)	1994-09-01
DE68913898D1 (de)	1994-04-21
EP0365318A2 (en)	1990-04-25
EP0365318A3 (en)	1990-11-14
JPH02108054A (ja)	1990-04-19
JP2623778B2 (ja)	1997-06-25

Publication	Publication Date	Title
DE68928328D1 (de)	1997-10-23	Harzzusammensetzung
BR8905204A (pt)	1990-05-15	Composicao colutoria
DE69034033D1 (de)	2003-01-30	Thermoplastische Harzzusammensetzung
DE68911242D1 (de)	1994-01-20	Kristalline Harzzusammensetzung.
KR900009865A (ko)	1990-07-05	폴리카보네이트계 수지조성물
DE68920092D1 (de)	1995-02-02	Harzzusammensetzung.
BR8704567A (pt)	1988-04-26	Composicao de resina termofixavel
MX163730B (es)	1992-06-17	Composicion adhesiva mejorada
FI900652A7 (fi)	1990-08-11	Resiinikoostumus
BR8906787A (pt)	1990-09-18	Composicao
DE68919151D1 (de)	1994-12-08	Harzzusammensetzung.
DE68911340D1 (de)	1994-01-27	Harzzusammensetzung.
DE69030484D1 (de)	1997-05-22	Fotoempfindliche Harzzusammensetzung
KR900007942A (ko)	1990-06-02	폴리프로필렌 수지조성물
BR8901491A (pt)	1989-11-14	Composicao de resina de policarbonato
KR900006817A (ko)	1990-05-08	레지스트 조성물
DE68918544D1 (de)	1994-11-03	Harzzusammensetzung.
DE68924798D1 (de)	1995-12-21	Harzzusammensetzung.
KR900011853A (ko)	1990-08-02	수지 조성물
KR900006818A (ko)	1990-05-08	감방사선성 수지 조성물
DE68911597D1 (de)	1994-02-03	Harzzusammensetzung.
KR900007946A (ko)	1990-06-02	경화성수지조성물
BR8902491A (pt)	1990-01-16	Composicao
BR8903852A (pt)	1990-03-20	Composicao vulcanizavel
TR26099A (tr)	1993-12-28	Islah edilmis pestisid terkip

Legal Events

Date	Code	Title	Description
1989-10-17	A201	Request for examination
1989-10-17	PA0109	Patent application	Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19891017
1989-10-17	PA0201	Request for examination
1990-05-08	PG1501	Laying open of application
1997-09-12	E701	Decision to grant or registration of patent right
1997-09-12	PE0701	Decision of registration	Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19970912
1997-10-17	GRNT	Written decision to grant
1997-10-17	PR0701	Registration of establishment	Comment text: Registration of Establishment Patent event date: 19971017 Patent event code: PR07011E01D
1997-10-17	PR1002	Payment of registration fee	Payment date: 19971017 End annual number: 3 Start annual number: 1
1997-12-26	PG1601	Publication of registration
2000-08-28	PR1001	Payment of annual fee	Payment date: 20000829 Start annual number: 4 End annual number: 4
2001-10-10	PR1001	Payment of annual fee	Payment date: 20011010 Start annual number: 5 End annual number: 5
2002-10-07	PR1001	Payment of annual fee	Payment date: 20021007 Start annual number: 6 End annual number: 6
2003-10-09	PR1001	Payment of annual fee	Payment date: 20031009 Start annual number: 7 End annual number: 7
2004-10-11	PR1001	Payment of annual fee	Payment date: 20041012 Start annual number: 8 End annual number: 8
2005-10-11	PR1001	Payment of annual fee	Payment date: 20051011 Start annual number: 9 End annual number: 9
2006-10-11	PR1001	Payment of annual fee	Payment date: 20061011 Start annual number: 10 End annual number: 10
2007-10-10	PR1001	Payment of annual fee	Payment date: 20071010 Start annual number: 11 End annual number: 11
2008-10-10	PR1001	Payment of annual fee	Payment date: 20081010 Start annual number: 12 End annual number: 12
2009-10-08	PR1001	Payment of annual fee	Payment date: 20091009 Start annual number: 13 End annual number: 13
2010-10-08	G170	Re-publication after modification of scope of protection [patent]
2010-10-08	PG1701	Publication of correction	Publication date: 20101008
2010-10-12	PR1001	Payment of annual fee	Payment date: 20101012 Start annual number: 14 End annual number: 14
2011-09-20	FPAY	Annual fee payment	Payment date: 20110920 Year of fee payment: 15
2011-09-20	PR1001	Payment of annual fee	Payment date: 20110920 Start annual number: 15 End annual number: 15
2012-10-18	EXPY	Expiration of term
2012-10-18	PC1801	Expiration of term	Termination date: 20130709 Termination category: Expiration of duration