KR20180081686A - 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 - Google Patents
산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 Download PDFInfo
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Abstract
Description
도 2 는, 본 발명의 스퍼터링 타깃 (원반형) 의 벌크 저항률의 측정 지점을 나타내는 도면이다.
도 3 은, 본 발명의 스퍼터링 타깃의 휨량의 측정을 나타내는 모식도이다.
Claims (10)
- In, Zn, O 로 이루어지는 스퍼터링 타깃으로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In + Zn) ≤ 0.30 을 만족시키고, 그 타깃의 스퍼터 면에 있어서의 벌크 저항률의 표준 편차가 1.0 mΩ·㎝ 이하인 것을 특징으로 하는 스퍼터링 타깃.
- 제 1 항에 있어서,
벌크 저항률이 1.0 ∼ 10 mΩ·㎝ 인 것을 특징으로 하는 스퍼터링 타깃. - 제 1 항 또는 제 2 항에 있어서,
상대 밀도가 98 % 이상인 것을 특징으로 하는 스퍼터링 타깃. - 제 1 항 내지 제 3 항 중 어느 한 항에 있어서,
스퍼터 면의 면적이 60000 ㎟ ∼ 400000 ㎟ 인 것을 특징으로 하는 스퍼터링 타깃. - In, Zn, O 로 이루어지는 소결체로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In + Zn) ≤ 0.30 을 만족시키고, 휨량이 2.0 ㎜ 이내인 것을 특징으로 하는 IZO 소결체.
- 원료 분말을 프레스 성형한 성형체를 소결하여 제조되는 IZO 소결체로 이루어지는 스퍼터링 타깃의 제조 방법으로서, 실온으로부터 소결 온도까지 승온시키는 공정에 있어서, 도중 유지 온도를 600 ∼ 800 ℃ 로 하고, 1 ∼ 10 시간 유지하는 공정, 당해 도중 유지 온도로부터 소결 온도까지 0.2 ∼ 2.0 ℃/min 로 승온시키는 공정, 소결 온도를 1350 ∼ 1500 ℃ 로 하고, 소결 유지 시간을 1 ∼ 100 시간으로 소결하는 공정으로 이루어지는 것을 특징으로 하는 스퍼터링 타깃의 제조 방법.
- 제 6 항에 있어서,
소결 온도를 1380 ∼ 1420 ℃ 로 하는 것을 특징으로 하는 스퍼터링 타깃의 제조 방법. - 제 6 항 또는 제 7 항에 있어서,
소결 유지 시간을 5 ∼ 30 시간으로 소결하는 것을 특징으로 하는 스퍼터링 타깃의 제조 방법. - 제 6 항 내지 제 8 항 중 어느 한 항에 있어서,
1.0 ∼ 5.0 ℃/min 로 강온시키는 것을 특징으로 하는 스퍼터링 타깃의 제조 방법. - 제 6 항 내지 제 9 항 중 어느 한 항에 있어서,
도중 유지 온도로부터 소결 온도까지 0.5 ∼ 1.5 ℃/min 로 승온시키는 것을 특징으로 하는 스퍼터링 타깃의 제조 방법.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071381A JP6125689B1 (ja) | 2016-03-31 | 2016-03-31 | 酸化インジウム−酸化亜鉛系(izo)スパッタリングターゲット |
| JPJP-P-2016-071381 | 2016-03-31 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020160163661A Division KR20170112970A (ko) | 2016-03-31 | 2016-12-02 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
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| Publication Number | Publication Date |
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| KR20180081686A true KR20180081686A (ko) | 2018-07-17 |
| KR101956506B1 KR101956506B1 (ko) | 2019-03-08 |
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| KR1020160163661A Ceased KR20170112970A (ko) | 2016-03-31 | 2016-12-02 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
| KR1020180077156A Active KR101956506B1 (ko) | 2016-03-31 | 2018-07-03 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
| KR1020190017109A Ceased KR20190019104A (ko) | 2016-03-31 | 2019-02-14 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
| KR1020200017636A Active KR102322184B1 (ko) | 2016-03-31 | 2020-02-13 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
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| KR1020190017109A Ceased KR20190019104A (ko) | 2016-03-31 | 2019-02-14 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
| KR1020200017636A Active KR102322184B1 (ko) | 2016-03-31 | 2020-02-13 | 산화인듐-산화아연계 (izo) 스퍼터링 타깃 및 그 제조 방법 |
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| Country | Link |
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| JP (1) | JP6125689B1 (ko) |
| KR (4) | KR20170112970A (ko) |
| CN (3) | CN107267936A (ko) |
| TW (2) | TWI645059B (ko) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6523510B1 (ja) * | 2018-03-30 | 2019-06-05 | Jx金属株式会社 | スパッタリングターゲット |
| JP2020143359A (ja) * | 2019-03-08 | 2020-09-10 | Jx金属株式会社 | スパッタリングターゲット部材の製造方法及びスパッタリングターゲット部材 |
| CN113555451A (zh) * | 2020-04-23 | 2021-10-26 | 南方科技大学 | 一种透明光电器件的制备方法及透明光电器件 |
| JP7162647B2 (ja) * | 2020-09-15 | 2022-10-28 | Jx金属株式会社 | Cu-W-Oスパッタリングターゲット及び酸化物薄膜 |
| CN115679259A (zh) * | 2021-07-30 | 2023-02-03 | 北京北方华创微电子装备有限公司 | Izo薄膜制备方法及物理气相沉积设备 |
| CN113956022A (zh) * | 2021-11-30 | 2022-01-21 | 郑州大学 | 一种锌掺杂氧化铟粉体、溅射靶材及其制备方法 |
| CN116041047B (zh) * | 2022-12-15 | 2024-05-17 | 先导薄膜材料(广东)有限公司 | 一种溅镀用izo掺杂靶材及其制备方法 |
| CN116199496B (zh) * | 2022-12-15 | 2024-07-19 | 先导薄膜材料(广东)有限公司 | 一种氧化铟锌掺杂稀土金属靶材及其制备方法 |
| CN116219375B (zh) * | 2022-12-15 | 2024-07-19 | 先导薄膜材料(广东)有限公司 | 一种氧化铟锌靶材及其制备方法 |
| CN116162908B (zh) * | 2022-12-15 | 2024-08-30 | 先导薄膜材料(广东)有限公司 | 一种氧化铟锌靶材及其制备方法 |
| CN116177993A (zh) * | 2022-12-15 | 2023-05-30 | 先导薄膜材料(广东)有限公司 | 一种氧化铟锌烧结靶及其制备方法 |
| CN117247273B (zh) * | 2023-11-17 | 2024-02-23 | 江苏迪纳科精细材料股份有限公司 | 高迁移率的x-izo磁控溅射靶材的制备方法与装置 |
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| JP2015021165A (ja) * | 2013-07-19 | 2015-02-02 | 三菱マテリアル株式会社 | スパッタリングターゲット及びその製造方法 |
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| WO2000068456A1 (fr) * | 1999-05-10 | 2000-11-16 | Japan Energy Corporation | Cible de pulverisation cathodique et procede de production de celle-ci |
| CN1320155C (zh) * | 2001-06-26 | 2007-06-06 | 三井金属矿业株式会社 | 高电阻透明导电膜用溅射靶及高电阻透明导电膜的制造方法 |
| CN100585752C (zh) * | 2003-05-20 | 2010-01-27 | 出光兴产株式会社 | 非晶透明导电膜及其原料溅射靶、非晶透明电极衬底及其制造方法、及液晶显示器用滤色器 |
| KR20060043427A (ko) * | 2004-03-05 | 2006-05-15 | 토소가부시키가이샤 | 원통형 스퍼터링 타겟, 세라믹 소결체와 그 제조방법 |
| JP4762062B2 (ja) * | 2006-06-22 | 2011-08-31 | 出光興産株式会社 | 焼結体、膜及び有機エレクトロルミネッセンス素子 |
| CN102191465A (zh) * | 2010-03-18 | 2011-09-21 | 中国科学院福建物质结构研究所 | 一种铟掺杂氧化锌靶材及透明导电膜的制备方法 |
| JPWO2012153522A1 (ja) * | 2011-05-10 | 2014-07-31 | 出光興産株式会社 | In2O3−ZnO系スパッタリングターゲット |
| CN105308208A (zh) * | 2013-03-29 | 2016-02-03 | 吉坤日矿日石金属株式会社 | Igzo溅射靶和igzo膜 |
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| JP2010024087A (ja) * | 2008-07-18 | 2010-02-04 | Idemitsu Kosan Co Ltd | 酸化物焼結体の製造方法、酸化物焼結体、スパッタリングタ−ゲット、酸化物薄膜、薄膜トランジスタの製造方法及び半導体装置 |
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| JP2015021165A (ja) * | 2013-07-19 | 2015-02-02 | 三菱マテリアル株式会社 | スパッタリングターゲット及びその製造方法 |
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| TW201805457A (zh) | 2018-02-16 |
| JP6125689B1 (ja) | 2017-05-10 |
| CN108930015A (zh) | 2018-12-04 |
| KR20200019654A (ko) | 2020-02-24 |
| CN114752901A (zh) | 2022-07-15 |
| TW201837222A (zh) | 2018-10-16 |
| TWI645059B (zh) | 2018-12-21 |
| CN107267936A (zh) | 2017-10-20 |
| KR20170112970A (ko) | 2017-10-12 |
| KR20190019104A (ko) | 2019-02-26 |
| KR101956506B1 (ko) | 2019-03-08 |
| TWI661069B (zh) | 2019-06-01 |
| KR102322184B1 (ko) | 2021-11-04 |
| JP2017179536A (ja) | 2017-10-05 |
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