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JPH0582941A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH0582941A
JPH0582941A JP24010491A JP24010491A JPH0582941A JP H0582941 A JPH0582941 A JP H0582941A JP 24010491 A JP24010491 A JP 24010491A JP 24010491 A JP24010491 A JP 24010491A JP H0582941 A JPH0582941 A JP H0582941A
Authority
JP
Japan
Prior art keywords
circuit
wiring board
printed wiring
plating
electroless plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24010491A
Other languages
Japanese (ja)
Inventor
Minoru Shimada
稔 島田
Haruo Ogino
晴夫 荻野
Fuminao Kato
文直 加藤
Hiroyuki Chiku
弘幸 知久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP24010491A priority Critical patent/JPH0582941A/en
Publication of JPH0582941A publication Critical patent/JPH0582941A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To provide the manufacture of a printed wiring board, in which the firm adhesion of an insulating substrate and a precipitated electroless plating layer is obtained, regarding the manufacture of the printed wiring board, in which a circuit is manufactured by a circuit forming process including electroless plating to a section, to which at least the circuit is formed. CONSTITUTION:In a roughening process as plating pretreatment, in which the resin layer of an insulating substrate is formed in a surface shape proper to plating, the resin layer is chemically roughened by a chromic acid- tetrafluoroboric acid aqueous solution containing fluorine ions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、少なくとも回路が形成
される部分に無電解めっきを含む回路形成工程で回路を
作製する印刷配線板の製造方法に関し、絶縁基板を化学
粗化し、析出した無電解めっき層と強固な接着が得られ
る印刷配線板の製造方法を提供するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a printed wiring board in which a circuit is formed in a circuit forming step including electroless plating at least in a portion where a circuit is formed. It is intended to provide a method for producing a printed wiring board, which can obtain strong adhesion with an electrolytic plating layer.

【0002】[0002]

【従来の技術】近年、印刷配線板の製造方法として、少
なくとも回路が形成される部分に無電解めっきを含む回
路形成工程で回路を作製する方法(アディティブ法)が
広く使われるようになってきた。アディティブ法には、
絶縁基板を化学粗化した後、回路が形成される部分以外
に無電解めっきレジストを被覆するか、又は、絶縁基板
の回路が形成される部分以外に無電解めっきレジストを
被覆した後粗化を行い、無電解めっき液に浸漬して回路
を形成する方法(フルアディティブ法)と、絶縁基板を
化学粗化した後回路が形成される部分以外に無電解めっ
きをして基板全面に無電解めっき層を形成し、回路が形
成される部分以外に電気めっきレジストを被覆し、回路
部分に厚付けめっきを行い、エッチングにより回路部以
外の無電解めっき層を除去する方法(セミアディティブ
法)が行われている。
2. Description of the Related Art In recent years, as a method of manufacturing a printed wiring board, a method of forming a circuit in a circuit forming step including electroless plating at least in a portion where a circuit is formed (additive method) has been widely used. .. Additive law includes
After chemically roughening the insulating substrate, cover the portion where the circuit is not formed with the electroless plating resist, or coat the portion other than the portion where the circuit of the insulating substrate is formed with the electroless plating resist and then roughen it. Perform a method of forming a circuit by dipping it in an electroless plating solution (full additive method), and chemically roughen the insulating substrate, and then electrolessly plate the entire surface of the substrate except the part where the circuit is to be formed. A method (semi-additive method) of forming a layer, coating electroplating resist on the area other than the area where the circuit is formed, performing thick plating on the area of the circuit, and removing the electroless plating layer other than the area of the circuit by etching is performed. It is being appreciated.

【0003】これらの方法はいずれも絶縁基板を粗化
し、無電解めっきを行うものであり、析出しためっきが
樹脂層と強固に密着する為、表面に凹凸形状を作ること
が重要になる。めっき前処理として表面を粗化する粗化
液は、一般に酸化性酸溶液が使用され、例えば、特開昭
63−199497の実施例や特開昭63−19839
5の実施例4のクロム酸−硫酸水溶液やクロム酸−テト
ラフルオロホウ酸水溶液が用いられている。
In all of these methods, the insulating substrate is roughened and electroless plating is performed. Since the deposited plating firmly adheres to the resin layer, it is important to make the surface uneven. As a roughening liquid for roughening the surface as a pretreatment for plating, an oxidizing acid solution is generally used. For example, the examples of JP-A-63-199497 and JP-A-63-19839 are used.
The chromic acid-sulfuric acid aqueous solution or chromic acid-tetrafluoroboric acid aqueous solution of Example 4 of Example 5 is used.

【0004】[0004]

【発明が解決しようとする課題】特開昭63−1994
97の実施例や特開昭63−198395の実施例4の
クロム酸−硫酸水溶液は、良好な粗化形状を作るがスル
ーホール内を不活性化してしまい、無電解めっきの析出
を妨げ、更には不析出にしてしまう問題点がある。又、
クロム酸−テトラフルオロホウ酸水溶液は、無電解めっ
きの析出を妨げることはないが、粗化凹凸を作り易い組
成(樹脂中にジエン系合成ゴムを50重量%以上含むも
の)に規制される。又、樹脂中にジエン系合成ゴムを多
量に含む基板は、印刷配線板の電気特性、耐熱性あるい
は表面硬度を低下させるため好ましくなく、ジエン系合
成ゴムを少なくすることや、含まないことが望まれてい
る。
Problems to be Solved by the Invention JP-A-63-1994
97 and the chromic acid-sulfuric acid aqueous solution of Example 4 of JP-A-63-198395 make a good roughened shape, but inactivate the inside of the through holes, and prevent the deposition of electroless plating. Has a problem that it does not precipitate. or,
The chromic acid-tetrafluoroboric acid aqueous solution does not hinder the deposition of electroless plating, but is regulated to a composition that easily forms roughening irregularities (containing 50% by weight or more of diene-based synthetic rubber in the resin). In addition, a substrate containing a large amount of diene-based synthetic rubber in the resin is not preferable because it lowers the electrical characteristics, heat resistance or surface hardness of the printed wiring board, and it is desirable to reduce or not include the diene-based synthetic rubber. It is rare.

【0005】本発明は、少なくとも回路が形成される部
分に無電解めっきを含む回路形成工程で回路を作製する
印刷配線板の製造方法に関し、絶縁基板と析出した無電
解めっき層との強固な接着が得られる印刷配線板の製造
方法を提供することを目的とする。
The present invention relates to a method for manufacturing a printed wiring board in which a circuit is formed in a circuit forming step including electroless plating at least in a portion where a circuit is formed, and a strong adhesion between an insulating substrate and a deposited electroless plating layer. It is an object of the present invention to provide a method for manufacturing a printed wiring board that can obtain the above.

【0006】[0006]

【課題を解決するための手段】本発明は絶縁基板の樹脂
層をめっきに適した表面凹凸形状を作るめっき前処理の
粗化工程において、フッ素イオンを含むクロム酸−テト
ラフルオロホウ酸水溶液で化学粗化することを特徴とす
る。
According to the present invention, a resin layer of an insulating substrate is chemically treated with a chromic acid-tetrafluoroboric acid aqueous solution containing a fluorine ion in a roughening step of a pretreatment for forming a surface uneven shape suitable for plating. It is characterized by roughening.

【0007】フッ素イオンを含むクロム酸−テトラフル
オロホウ酸水溶液は、重クロム酸ナトリウム、無水クロ
ム酸等の重クロム酸塩とテトラフルオロホウ酸との水溶
液にフッ素イオンを供給できる水溶性フッ化物を添加し
たものを使用することができる。
A chromic acid-tetrafluoroboric acid aqueous solution containing fluorine ions is a water-soluble fluoride capable of supplying fluorine ions to an aqueous solution of dichromate such as sodium dichromate or chromic anhydride and tetrafluoroboric acid. What was added can be used.

【0008】6価のクロムイオンは濃度0.01〜0.
2mol/lの範囲が使用でき、好ましくは0.5〜
0.15mol/lの範囲が望ましい。0.01mol
/l以下では樹脂の酸化力を得ることができず、0.2
mol/l以上ではクロムイオンの溶解が困難であり作
業上問題があり、使用できない。テトラフルオロホウ酸
は濃度30〜60重量%の範囲が使用でき、好ましくは
40〜50重量%の範囲が望ましい。30重量%以下の
濃度では樹脂の酸化力を得ることができず、60重量%
以上はテトラフルオロホウ酸が飽和し溶解困難であり、
6価のクロムイオン、フッ素イオンの溶解が困難にな
り、使用できない。フッ素イオンは濃度は0.01〜
0.5mol/lの範囲が使用でき、好ましくは0.1
〜0.3mol/lの範囲が望ましい。0.01mol
/l以下の濃度では樹脂の酸化力を増加する効果は得ら
れず、0.5mol/l以上では樹脂上にめっきが析出
するのを阻害するため使用できない。
Hexavalent chromium ions have a concentration of 0.01-0.
A range of 2 mol / l can be used, preferably 0.5 to
The range of 0.15 mol / l is desirable. 0.01 mol
If it is less than 1 / l, the oxidizing power of the resin cannot be obtained, and 0.2
When it is more than 1 mol / l, it is difficult to dissolve chromium ions and there is a problem in working, so that it cannot be used. Tetrafluoroboric acid may be used in a concentration range of 30 to 60% by weight, preferably 40 to 50% by weight. At a concentration of 30% by weight or less, the oxidizing power of the resin cannot be obtained, and 60% by weight
Above is tetrafluoroboric acid is saturated and difficult to dissolve,
Hexavalent chromium ions and fluorine ions are difficult to dissolve and cannot be used. The concentration of fluorine ion is 0.01-
A range of 0.5 mol / l can be used, preferably 0.1
A range of up to 0.3 mol / l is desirable. 0.01 mol
If the concentration is less than 1 / l, the effect of increasing the oxidizing power of the resin cannot be obtained, and if it is more than 0.5 mol / l, plating deposition on the resin is hindered, and therefore it cannot be used.

【0009】[0009]

【作用】クロム酸−テトラフルオロホウ酸水溶液にフッ
素イオンを供給することにより、クロム酸の樹脂酸化力
を増し、析出した無電解めっき層と強固な接着が得られ
る凹凸形状を形成することができる。
[Function] By supplying fluorine ions to the chromic acid-tetrafluoroboric acid aqueous solution, it is possible to increase the resin oxidizing power of chromic acid and form an uneven shape capable of obtaining firm adhesion with the deposited electroless plating layer. ..

【0010】[0010]

【実施例】実施例1 接着剤付き積層板(日立化成工業(株)製ACL−E−
168)に紫外線硬化型めっきレジスト(日立化成工業
(株)製SR−3000)を絶縁基板の回路が形成され
る部分以外に作製した後、重クロム酸ナトリウム20g
/l、フッ化ナトリウム10g/lを42%テトラフル
オロホウ酸に溶解した粗化液に40℃5分間浸漬して粗
化処理し、中和処理を行った後、無電解銅めっき(日立
化成工業(株)製L−59)を用い、導体厚30μmの
回路を作製した。このようにして作製した回路基板をJ
IS−C6481に基づき導電回路の引き剥し強さを測
定した結果、2.0〜2.2N/cmの値を有してい
た。
[Example] Example 1 Laminated plate with adhesive (Hitachi Chemical Co., Ltd. ACL-E-
168), an ultraviolet-curable plating resist (SR-3000 manufactured by Hitachi Chemical Co., Ltd.) was prepared on a portion of the insulating substrate other than the portion where the circuit is formed, and then sodium dichromate 20 g
/ L, sodium fluoride 10g / l are immersed in a roughening solution in which 42% tetrafluoroboric acid is dissolved at 40 ° C for 5 minutes for roughening treatment and neutralization treatment, followed by electroless copper plating (Hitachi Chemical A circuit having a conductor thickness of 30 μm was produced using L-59 manufactured by Kogyo Co., Ltd. The circuit board manufactured in this way is
As a result of measuring the peeling strength of the conductive circuit based on IS-C6481, it had a value of 2.0 to 2.2 N / cm.

【0011】粗化後のエポキシ樹脂表面及び断面を走査
型電子顕微鏡で観察すると、約15〜25μm深さの均
一な凹凸形状を形成していた。
When the surface and cross section of the roughened epoxy resin were observed with a scanning electron microscope, a uniform uneven shape having a depth of about 15 to 25 μm was formed.

【0012】実施例2 接着剤付き積層板(日立化成工業(株)製ACL−E−
168)を重クロム酸ナトリウム20g/l、フッ化ナ
トリウム10g/lを42%テトラフルオロホウ酸に溶
解した粗化液に40℃5分間浸漬して粗化処理し、中和
処理を行った後紫外線硬化型めっきレジスト(日立化成
工業(株)製SR−3000)を絶縁基板の回路が形成
される部分以外に作製し、無電解銅めっき(日立化成工
業(株)製L−59)を用い、導体厚30μmの回路を
作製した。このようにして作製した回路基板をJIS−
C6481に基づき導電回路の引き剥し強さを測定した
結果、1.9〜2.1N/cmの値を有していた。
Example 2 A laminated board with an adhesive (ACL-E- manufactured by Hitachi Chemical Co., Ltd.)
168) was immersed in a roughening solution prepared by dissolving 20 g / l of sodium dichromate and 10 g / l of sodium fluoride in 42% tetrafluoroboric acid at 40 ° C for 5 minutes for roughening treatment and neutralization treatment. An ultraviolet curable plating resist (SR-3000 manufactured by Hitachi Chemical Co., Ltd.) was prepared on a portion of the insulating substrate other than the portion where the circuit is formed, and electroless copper plating (L-59 manufactured by Hitachi Chemical Co., Ltd.) was used. A circuit having a conductor thickness of 30 μm was produced. The circuit board produced in this way is JIS-
As a result of measuring the peeling strength of the conductive circuit based on C6481, it had a value of 1.9 to 2.1 N / cm.

【0013】粗化後のエポキシ樹脂表面及び断面を走査
型電子顕微鏡で観察すると、約15〜25μm深さの均
一な凹凸形状を形成していた。本発明の効果を従来方法
として比較して表1に示す。
When the surface and cross section of the roughened epoxy resin were observed with a scanning electron microscope, a uniform uneven shape having a depth of about 15 to 25 μm was formed. The effect of the present invention is shown in Table 1 in comparison with the conventional method.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【発明の効果】表に示した通り、本発明は基板表面の樹
脂に十分な凹凸粗化形状を形成し、析出した無電解めっ
き層と強固な接着が得ることができ、めっき析出性を阻
害しない粗化を可能にする印刷配線板の製造方法を得る
ことができる。
As shown in the table, according to the present invention, the resin on the surface of the substrate can be formed with a sufficiently roughened and roughened shape, and strong adhesion can be obtained with the deposited electroless plating layer, which hinders the plating depositability. It is possible to obtain a method for manufacturing a printed wiring board that allows roughening without being performed.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 知久 弘幸 茨城県下館市大字小川1500番地 日立化成 工業株式会社電子部品事業部内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyuki Chihisa 1500 Ogawa, Shimodate City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Electronic Components Division

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 接着剤付き積層板にめっきレジスト付
与、粗化、無電解めっきを行い、所望回路を形成する配
線板の製造方法において、粗化工程が酸化性水溶液に配
線板を浸漬する方法であって、かつ粗化液が0.01〜
0.2mol/lの6価のクロムイオン、30〜60重
量%のテトラフルオロホウ酸、0.01〜0.5mol
/lのフッ素イオンを含むことを特徴とする印刷配線板
の製造方法。
1. A method for manufacturing a wiring board in which plating resist is applied, roughening, and electroless plating are performed on a laminated board with an adhesive to form a desired circuit, and the roughening step is to immerse the wiring board in an oxidizing aqueous solution. And the roughening liquid is 0.01 to
Hexavalent chromium ion of 0.2 mol / l, tetrafluoroboric acid of 30 to 60% by weight, 0.01 to 0.5 mol
A method for producing a printed wiring board, which comprises a fluorine ion of 1 / l.
JP24010491A 1991-09-20 1991-09-20 Manufacture of printed wiring board Pending JPH0582941A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24010491A JPH0582941A (en) 1991-09-20 1991-09-20 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24010491A JPH0582941A (en) 1991-09-20 1991-09-20 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPH0582941A true JPH0582941A (en) 1993-04-02

Family

ID=17054554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24010491A Pending JPH0582941A (en) 1991-09-20 1991-09-20 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPH0582941A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7645111B2 (en) 2002-11-05 2010-01-12 Central Glass Company, Limited System for putting glass plates to target positions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7645111B2 (en) 2002-11-05 2010-01-12 Central Glass Company, Limited System for putting glass plates to target positions

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