JP5694023B2 - 積層構造体の製造装置 - Google Patents
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- 238000007740 vapor deposition Methods 0.000 claims description 116
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- 238000010030 laminating Methods 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
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- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
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- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000343 polyazomethine Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
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- 239000011112 polyethylene naphthalate Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2252/00—Sheets
- B05D2252/02—Sheets of indefinite length
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Description
14a,14b 金属蒸着膜 15 金属化フィルム
16 蒸着重合膜 22,96 製造装置
24 真空チャンバ 35 キャンローラ
44 真空ポンプ 46 巻出しローラ
48 巻取りローラ 50 フィルムロール
64 吹出口部材 66 吹出口
78 成膜室 82 防着バー
84 モノマー蒸気供給装置 86a 第一蒸発源
86b 第二蒸発源 98 金属蒸気供給装置
Claims (4)
- 真空蒸着重合法により成膜される蒸着重合膜が、膜状基材上に少なくとも一つ積層形成されてなる積層構造体の製造装置であって、
(a)真空チャンバと、(b)該真空チャンバ内の空気を排出して、該真空チャンバ内を真空状態とする排気手段と、(c)前記真空チャンバ内に一軸回りに回転可能に設置され、前記膜状基材が外周面上に接触して配置されることにより、一軸回りの回転に伴って、該膜状基材を周方向に走行させる回転ドラムと、(d)前記膜状基材が前記回転ドラムの外周面上に接触して配置されるように、該膜状基材を該回転ドラムの外周面上に供給する膜状基材供給手段と、(e)前記真空チャンバ内における前記回転ドラムの外周面上で、該外周面に向かって開口する吹出口と、周壁部に囲まれた内側空間とを有して、前記回転ドラムの周囲に周方向に並んで配置された複数の吹出口部材と、(f)前記複数の吹出口部材のそれぞれの内側空間に形成されて、前記吹出口が配置されてなる、前記真空チャンバ内において画成された複数の成膜室と、(g)複数種類の原料モノマーを加熱し、蒸発させて、複数種類のモノマー蒸気をそれぞれ発生させる蒸発源と、それらモノマー蒸気を該蒸発源から前記吹出口部材にそれぞれ導く連通路とを有し、該蒸発源にて生ぜしめられた該複数種類のモノマー蒸気を、該連通路を通じて該吹出口部材の前記成膜室内に供給することにより、該複数種類のモノマー蒸気を該成膜室の吹出口から吹き出させる、少なくとも一つのモノマー蒸気供給手段とを有し、
且つ前記吹出口部材の内部空間が、仕切壁によって、前記複数種類のモノマー蒸気が導入されて、混合せしめられる混合室と、前記吹出口が配置された成膜室とに仕切られてなると共に、かかる仕切壁に、該混合室と該成膜室とを連通する通孔を設けて、該複数種類のモノマー蒸気が該混合室内において混合せしめられた後、該仕切壁の通孔から該成膜室内に供給されるようにしたことを特徴とする積層構造体の製造装置。 - 前記膜状基材を部分的に被覆する被覆部材が、前記吹出口部材の吹出口を該回転ドラムの周方向に横切って延びるように配置されていることにより、該吹出口から吹き出される前記複数種類のモノマー蒸気の、該被覆部材による該膜状基材の被覆部分への付着が阻止されるようになっている請求項1に記載の積層構造体の製造装置。
- 前記回転ドラムの周囲において、前記膜状基材の前記回転ドラムの周方向での走行方向の最も上流側に配置された前記吹出口部材よりも該走行方向の上流側の箇所に、前記膜状基材を帯電させる帯電手段が配設される一方、前記膜状基材の前記回転ドラムの周方向での走行方向の最も下流側に配置された前記吹出口部材よりも該走行方向の下流側の箇所に、前記帯電手段にて帯電させられた該膜状基材を除電する除電手段が配設される請求項1又は請求項2に記載の積層構造体の製造装置。
- 前記回転ドラムの周囲において、前記膜状基材の前記回転ドラムの周方向での走行方向の最も下流側に配置された前記吹出口部材よりも該走行方向の下流側の箇所に、該膜状基材上に積層形成された前記蒸着重合膜を硬化させる硬化手段が配設される請求項1乃至請求項3の何れか1項に記載の積層構造体の製造装置。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011063462A JP5694023B2 (ja) | 2011-03-23 | 2011-03-23 | 積層構造体の製造装置 |
| US13/413,919 US9243331B2 (en) | 2011-03-23 | 2012-03-07 | Apparatus for producing laminated body |
| EP12160451.6A EP2503024B1 (en) | 2011-03-23 | 2012-03-20 | Apparatus and method for Producing Laminated Body. |
| CN201210083679.6A CN102693847B (zh) | 2011-03-23 | 2012-03-22 | 用于生产层压主体的设备 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011063462A JP5694023B2 (ja) | 2011-03-23 | 2011-03-23 | 積層構造体の製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012197499A JP2012197499A (ja) | 2012-10-18 |
| JP5694023B2 true JP5694023B2 (ja) | 2015-04-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011063462A Active JP5694023B2 (ja) | 2011-03-23 | 2011-03-23 | 積層構造体の製造装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9243331B2 (ja) |
| EP (1) | EP2503024B1 (ja) |
| JP (1) | JP5694023B2 (ja) |
| CN (1) | CN102693847B (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014002773A1 (ja) * | 2012-06-29 | 2014-01-03 | 株式会社アルバック | 成膜装置 |
| JP6347662B2 (ja) * | 2014-05-09 | 2018-06-27 | 東レエンジニアリング株式会社 | 薄膜形成装置 |
| KR102622868B1 (ko) * | 2016-11-28 | 2024-01-08 | 엘지디스플레이 주식회사 | 열충격이 방지된 롤투롤 제조장치 |
| CN110385222A (zh) * | 2018-04-18 | 2019-10-29 | 张家港康得新光电材料有限公司 | 镀膜装置 |
| CN112368413B (zh) * | 2019-03-12 | 2022-04-29 | 株式会社爱发科 | 真空蒸镀装置 |
| CN111250855A (zh) * | 2020-02-20 | 2020-06-09 | 宁夏中科农副产品辐照中心有限公司 | 一种多电子束中心送丝的电子束加工系统 |
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| JP2007308774A (ja) | 2006-05-19 | 2007-11-29 | Utec:Kk | 薄膜形成装置、及び薄膜形成方法 |
| JP2008023928A (ja) * | 2006-07-25 | 2008-02-07 | Toppan Printing Co Ltd | 積層体、その製造方法および積層体の製造装置 |
| CN101177484B (zh) * | 2006-11-08 | 2010-06-09 | 同济大学 | 一种双酚a型聚酰亚胺材料及其制备方法 |
| JP4268195B2 (ja) * | 2007-02-13 | 2009-05-27 | 株式会社神戸製鋼所 | プラズマcvd装置 |
| JP4881789B2 (ja) * | 2007-05-16 | 2012-02-22 | 株式会社Harmonic Uni−Brain | 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス素子の製造装置 |
| JP2009270134A (ja) * | 2008-04-30 | 2009-11-19 | Fujifilm Corp | フラッシュ蒸着方法及び装置 |
| US20130302520A1 (en) * | 2012-05-11 | 2013-11-14 | Kai-An Wang | Co-evaporation system comprising vapor pre-mixer |
-
2011
- 2011-03-23 JP JP2011063462A patent/JP5694023B2/ja active Active
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2012
- 2012-03-07 US US13/413,919 patent/US9243331B2/en active Active
- 2012-03-20 EP EP12160451.6A patent/EP2503024B1/en not_active Not-in-force
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|---|---|
| US9243331B2 (en) | 2016-01-26 |
| CN102693847B (zh) | 2016-05-18 |
| JP2012197499A (ja) | 2012-10-18 |
| US20120240854A1 (en) | 2012-09-27 |
| CN102693847A (zh) | 2012-09-26 |
| EP2503024B1 (en) | 2016-01-13 |
| EP2503024A1 (en) | 2012-09-26 |
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