JP2018178003A - Fluorine-containing epoxy-modified silsesquioxane and curable composition containing the same - Google Patents
Fluorine-containing epoxy-modified silsesquioxane and curable composition containing the same Download PDFInfo
- Publication number
- JP2018178003A JP2018178003A JP2017081292A JP2017081292A JP2018178003A JP 2018178003 A JP2018178003 A JP 2018178003A JP 2017081292 A JP2017081292 A JP 2017081292A JP 2017081292 A JP2017081292 A JP 2017081292A JP 2018178003 A JP2018178003 A JP 2018178003A
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- JP
- Japan
- Prior art keywords
- group
- fluorine
- epoxy
- modified silsesquioxane
- containing epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 81
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 74
- 239000011737 fluorine Substances 0.000 title claims abstract description 74
- 239000000203 mixture Substances 0.000 title claims description 66
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 45
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 23
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 11
- 239000004593 Epoxy Substances 0.000 claims description 56
- 238000006243 chemical reaction Methods 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 125000002947 alkylene group Chemical group 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000005227 gel permeation chromatography Methods 0.000 claims description 8
- 239000004793 Polystyrene Substances 0.000 claims description 7
- 229920002223 polystyrene Polymers 0.000 claims description 7
- 239000000470 constituent Substances 0.000 abstract 2
- -1 for example Chemical group 0.000 description 90
- 150000001875 compounds Chemical class 0.000 description 89
- 239000000047 product Substances 0.000 description 46
- 239000010410 layer Substances 0.000 description 28
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 25
- 239000003795 chemical substances by application Substances 0.000 description 25
- 125000002723 alicyclic group Chemical group 0.000 description 22
- 239000002904 solvent Substances 0.000 description 20
- 229960000834 vinyl ether Drugs 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- 239000000758 substrate Substances 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 15
- 229910000077 silane Inorganic materials 0.000 description 15
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 238000006482 condensation reaction Methods 0.000 description 13
- 239000003505 polymerization initiator Substances 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- 238000010538 cationic polymerization reaction Methods 0.000 description 12
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 12
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical class OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- 230000007062 hydrolysis Effects 0.000 description 10
- 238000006460 hydrolysis reaction Methods 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 9
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 9
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 8
- 125000004450 alkenylene group Chemical group 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 7
- 229910052783 alkali metal Inorganic materials 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001340 alkali metals Chemical class 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 6
- 238000006068 polycondensation reaction Methods 0.000 description 6
- 229910000027 potassium carbonate Inorganic materials 0.000 description 6
- 235000011181 potassium carbonates Nutrition 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 5
- 125000002091 cationic group Chemical group 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 125000004430 oxygen atom Chemical group O* 0.000 description 5
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 150000005846 sugar alcohols Polymers 0.000 description 5
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 4
- 238000012663 cationic photopolymerization Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000001896 cresols Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000003607 modifier Substances 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 210000002268 wool Anatomy 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001342 alkaline earth metals Chemical class 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
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- 238000002360 preparation method Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 3
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- GZPRASLJQIBVDP-UHFFFAOYSA-N 2-[[4-[2-[4-(oxiran-2-ylmethoxy)cyclohexyl]propan-2-yl]cyclohexyl]oxymethyl]oxirane Chemical compound C1CC(OCC2OC2)CCC1C(C)(C)C(CC1)CCC1OCC1CO1 GZPRASLJQIBVDP-UHFFFAOYSA-N 0.000 description 2
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
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- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
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- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
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- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
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- XDODWINGEHBYRT-UHFFFAOYSA-N [2-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCCCC1CO XDODWINGEHBYRT-UHFFFAOYSA-N 0.000 description 2
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 2
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
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- 150000002118 epoxides Chemical class 0.000 description 2
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- 229940052303 ethers for general anesthesia Drugs 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
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- 230000001678 irradiating effect Effects 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 150000004950 naphthalene Chemical class 0.000 description 2
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 2
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- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 2
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- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- GAMLUOSQYHLFCT-UHFFFAOYSA-N triethoxy-[3-[(3-ethyloxetan-3-yl)methoxy]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1(CC)COC1 GAMLUOSQYHLFCT-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- IJROHELDTBDTPH-UHFFFAOYSA-N trimethoxy(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F IJROHELDTBDTPH-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- ZFEAYIKULRXTAR-UHFFFAOYSA-M triphenylsulfanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 ZFEAYIKULRXTAR-UHFFFAOYSA-M 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- INRGAWUQFOBNKL-UHFFFAOYSA-N {4-[(Vinyloxy)methyl]cyclohexyl}methanol Chemical compound OCC1CCC(COC=C)CC1 INRGAWUQFOBNKL-UHFFFAOYSA-N 0.000 description 1
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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Abstract
Description
本発明は、新規のフッ素含有エポキシ変性シルセスキオキサン、及び前記フッ素含有エポキシ変性シルセスキオキサンを用いた硬化性組成物に関する。 The present invention relates to novel fluorine-containing epoxy-modified silsesquioxanes and curable compositions using the fluorine-containing epoxy-modified silsesquioxanes.
各種ディスプレイの表面に貼付して使用するハードコートフィルムには、表面硬度と耐擦傷性を備えることが求められる。特許文献1には、エポキシ変性シルセスキオキサンを含むハードコート剤の硬化膜を備えたハードコートフィルムが前記特性を備えることが記載されている。しかし、耐擦傷性の更なる向上が求められている。
Hard coat films used by being attached to the surface of various displays are required to have surface hardness and scratch resistance.
従って、本発明の目的は、耐擦傷性に優れた硬化物を形成することができる、新規のフッ素含有エポキシ変性シルセスキオキサンを提供することにある。
また、本発明の他の目的は、前記のフッ素含有エポキシ変性シルセスキオキサンを含み、耐擦傷性に優れた硬化物を形成することができる硬化性組成物を提供することにある。
さらに、本発明の他の目的は、前記硬化性組成物の硬化膜を備えたハードコートフィルムを提供することにある。
Accordingly, an object of the present invention is to provide a novel fluorine-containing epoxy-modified silsesquioxane capable of forming a cured product having excellent scratch resistance.
Another object of the present invention is to provide a curable composition capable of forming a cured product having the above-mentioned fluorine-containing epoxy-modified silsesquioxane and having excellent scratch resistance.
Furthermore, another object of the present invention is to provide a hard coat film provided with a cured film of the curable composition.
本発明者等は上記課題を解決するため鋭意検討した結果、エポキシ基とフッ素置換アルキル基とを有するシルセスキオキサンは、カチオン重合により優れた耐擦傷性を有する硬化物を形成することができることを見出した。本発明は、これらの知見に基づいて完成されたものである。 As a result of intensive studies to solve the above problems, the present inventors have found that silsesquioxane having an epoxy group and a fluorine-substituted alkyl group can form a cured product having excellent scratch resistance by cationic polymerization. Found out. The present invention has been completed based on these findings.
すなわち、本発明は、下記式(T-1)
[R1SiO3/2] (T-1)
[式中、R1は、エポキシ基を含有する基を示す]
で表されるシロキサン構成単位(T-1)と、
下記式(T-2)
[R2SiO3/2] (T-2)
[式中、R2は、炭素数2〜16のアルキル基の水素原子の2個以上がフッ素原子で置換された基を示す]
で表されるシロキサン構成単位(T-2)とを有するフッ素含有エポキシ変性シルセスキオキサンを提供する。
That is, the present invention provides the following formula (T-1)
[R 1 SiO 3/2 ] (T-1)
[Wherein, R 1 represents a group containing an epoxy group]
And a siloxane structural unit (T-1) represented by
Following formula (T-2)
[R 2 SiO 3/2 ] (T-2)
[Wherein, R 2 represents a group in which two or more hydrogen atoms of an alkyl group having 2 to 16 carbon atoms are substituted with a fluorine atom]
And a fluorine-containing epoxy-modified silsesquioxane having a siloxane structural unit (T-2) represented by
本発明は、また、フッ素含有エポキシ変性シルセスキオキサンを構成する全てのシロキサン構成単位(100モル%)における、シロキサン構成単位(T-1)とシロキサン構成単位(T-2)の合計の占める割合が80モル%以上であり、且つシロキサン構成単位(T-1)とシロキサン構成単位(T-2)のモル比(前者/後者)が、90/10〜10/90である、前記のフッ素含有エポキシ変性シルセスキオキサンを提供する。 In the present invention, the total of the siloxane structural unit (T-1) and the siloxane structural unit (T-2) in all the siloxane structural units (100 mol%) constituting the fluorine-containing epoxy-modified silsesquioxane A fluorine having a ratio of 80 mol% or more and a molar ratio of the siloxane structural unit (T-1) to the siloxane structural unit (T-2) (former / latter) of 90/10 to 10/90 An epoxy-modified silsesquioxane is provided.
本発明は、また、ゲルパーミエーションクロマトグラフィーによる標準ポリスチレン換算の数平均分子量(Mn)が500〜4000である、前記のフッ素含有エポキシ変性シルセスキオキサンを提供する。 The present invention also provides the fluorine-containing epoxy-modified silsesquioxane as described above, which has a polystyrene-equivalent number average molecular weight (Mn) of 500 to 4000 as measured by gel permeation chromatography.
本発明は、また、前記R1が、下記式(1a)、(1b)、(1c)、及び(1d)で表される基からなる群より選択される1種以上の基である、前記のフッ素含有エポキシ変性シルセスキオキサンを提供する。
本発明は、また、前記のフッ素含有エポキシ変性シルセスキオキサンを含む硬化性組成物を提供する。 The present invention also provides a curable composition comprising the above-mentioned fluorine-containing epoxy-modified silsesquioxane.
本発明は、また、ハードコート剤である、前記の硬化性組成物を提供する。 The present invention also provides the curable composition as described above, which is a hard coating agent.
本発明は、また、前記の硬化性組成物の硬化膜を備えたハードコートフィルムを提供する。 The present invention also provides a hard coat film provided with a cured film of the above-mentioned curable composition.
本発明のフッ素含有エポキシ変性シルセスキオキサンは、硬化性組成物に添加することで、得られる硬化物の耐擦傷性を向上することができる。また、本発明のフッ素含有エポキシ変性シルセスキオキサンは、硬化性組成物に添加しても、得られる硬化物の透明性を損なうことがない。従って、本発明のフッ素含有エポキシ変性シルセスキオキサンは、耐擦傷性付与材等として好適に使用することができる。 The fluorine-containing epoxy-modified silsesquioxane of the present invention can improve the scratch resistance of the resulting cured product by adding it to the curable composition. In addition, the fluorine-containing epoxy-modified silsesquioxane of the present invention does not impair the transparency of the resulting cured product even when added to the curable composition. Therefore, the fluorine-containing epoxy-modified silsesquioxane of the present invention can be suitably used as a scratch resistance imparting agent and the like.
[フッ素含有エポキシ変性シルセスキオキサン]
本発明のフッ素含有エポキシ変性シルセスキオキサンは、下記式(T-1)
[R1SiO3/2] (T-1)
[式中、R1は、エポキシ基を含有する基を示す]
で表されるシロキサン構成単位(T-1)と、
下記式(T-2)
[R2SiO3/2] (T-2)
[式中、R2は、炭素数2〜16のアルキル基の水素原子の2個以上がフッ素原子で置換された基を示す]
で表されるシロキサン構成単位(T-2)とを有する。
[Fluorine-containing epoxy-modified silsesquioxane]
The fluorine-containing epoxy-modified silsesquioxane of the present invention has the following formula (T-1)
[R 1 SiO 3/2 ] (T-1)
[Wherein, R 1 represents a group containing an epoxy group]
And a siloxane structural unit (T-1) represented by
Following formula (T-2)
[R 2 SiO 3/2 ] (T-2)
[Wherein, R 2 represents a group in which two or more hydrogen atoms of an alkyl group having 2 to 16 carbon atoms are substituted with a fluorine atom]
And a siloxane structural unit (T-2) represented by
前記シロキサン構成単位(T-1)とシロキサン構成単位(T-2)はT単位(1個のケイ素原子に3個の酸素原子が結合する単位)であり、詳細には後述の式(t3)で表されるT3体である。 The siloxane structural unit (T-1) and the siloxane structural unit (T-2) are T units (units in which three oxygen atoms are bonded to one silicon atom), and in detail, the formula (t3) described later It is T3 body represented by
式(T-1)中のR1は、エポキシ基を含有する基(一価の基)を示す。即ち、本発明のフッ素含有エポキシ変性シルセスキオキサンは、分子内にエポキシ基を少なくとも有するカチオン硬化性化合物である。上記エポキシ基を含有する基としては、オキシラン環を有する公知乃至慣用の基が挙げられ、特に限定されないが、硬化性組成物の硬化性、耐熱性の観点で、下記式(1a)で表される基、下記式(1b)で表される基、下記式(1c)で表される基、下記式(1d)で表される基が好ましく、より好ましくは下記式(1a)で表される基、下記式(1c)で表される基、さらに好ましくは下記式(1a)で表される基である。
上記式中、R1a、R1b、R1c、及びR1dは、同一又は異なって、直鎖又は分岐鎖状のアルキレン基を示す。直鎖又は分岐鎖状のアルキレン基としては、例えば、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、プロピレン基、トリメチレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基、デカメチレン基等の炭素数1〜10の直鎖又は分岐鎖状のアルキレン基が挙げられる。本発明においては、中でも、硬化性の観点で、炭素数1〜4の直鎖状のアルキレン基、炭素数3又は4の分岐鎖状のアルキレン基が好ましく、より好ましくはエチレン基、トリメチレン基、プロピレン基、さらに好ましくはエチレン基、トリメチレン基である。 In the above formulae, R 1a , R 1b , R 1c and R 1d are the same or different and each represents a linear or branched alkylene group. As a linear or branched alkylene group, for example, methylene group, methyl methylene group, dimethyl methylene group, ethylene group, propylene group, trimethylene group, tetramethylene group, pentamethylene group, hexamethylene group, decamethylene group, etc. A C1-C10 linear or branched alkylene group is mentioned. In the present invention, among them, from the viewpoint of curability, a linear alkylene group having 1 to 4 carbon atoms and a branched alkylene group having 3 to 4 carbon atoms are preferable, and ethylene and trimethylene groups are more preferable, Propylene group is more preferable such as ethylene group and trimethylene group.
式(T-1)中のR1としては、特に、上記式(1a)で表される基であって、R1aがエチレン基又はトリメチレン基である基[中でも、2−(3,4−エポキシシクロヘキシル)エチル基]が好ましい。 Particularly, R 1 in the formula (T-1) is a group represented by the above formula (1a), and a group in which R 1a is an ethylene group or a trimethylene group [in particular, 2- (3,4- Epoxycyclohexyl) ethyl group] is preferable.
式(T-2)中のR2は、炭素数2〜16(好ましくは3〜10、特に好ましくは3〜6)のアルキル基(好ましくは直鎖状アルキル基)の水素原子の2個以上がフッ素原子で置換された基(フッ化アルキル基)である。中でも、下記式(r2)で表される基が好ましい。下記式中、nは1以上の整数であり、好ましくは1〜8、特に好ましくは1〜5、最も好ましくは1〜3である。mは0以上の整数であり、好ましくは0〜8、特に好ましくは0〜5、最も好ましくは0〜4である。尚、下記式の左端が式(T-2)中のケイ素原子に結合する。
−(CH2)n−(CF2)m−CF3 (r2)
R 2 in the formula (T-2) is at least two hydrogen atoms of an alkyl group (preferably linear alkyl group) having 2 to 16 (preferably 3 to 10, particularly preferably 3 to 6) carbon atoms Is a group substituted with a fluorine atom (fluorinated alkyl group). Among them, a group represented by the following formula (r2) is preferable. In the following formulas, n is an integer of 1 or more, preferably 1 to 8, particularly preferably 1 to 5, and most preferably 1 to 3. m is an integer of 0 or more, preferably 0 to 8, particularly preferably 0 to 5, and most preferably 0 to 4. The left end of the following formula is bonded to the silicon atom in formula (T-2).
- (CH 2) n - ( CF 2) m -CF 3 (r2)
本発明のフッ素含有エポキシ変性シルセスキオキサンは、T単位として、シロキサン構成単位(T-1)とシロキサン構成単位(T-2)とを有するものであればよく、各シロキサン構成単位は1種を単独で有するものであっても、2種以上を組み合わせて有するものであってもよい。 The fluorine-containing epoxy-modified silsesquioxane of the present invention only needs to have a siloxane structural unit (T-1) and a siloxane structural unit (T-2) as T units, and each siloxane structural unit is one kind. Or a combination of two or more.
本発明のフッ素含有エポキシ変性シルセスキオキサンを構成する全てのシロキサン構成単位(100モル%)における、シロキサン構成単位(T-1)とシロキサン構成単位(T-2)の合計の占める割合は、例えば80モル%以上、好ましくは85モル%以上、特に好ましくは90モル%以上である。尚、上限は100モル%である。前記シロキサン構成単位(T-1)、(T-2)を前記範囲で含有するフッ素含有エポキシ変性シルセスキオキサンは、硬化物に耐擦傷性を付与する効果が特に優れる傾向がある。 The proportion of the sum of the siloxane structural unit (T-1) and the siloxane structural unit (T-2) in all the siloxane structural units (100 mol%) constituting the fluorine-containing epoxy-modified silsesquioxane of the present invention is For example, it is 80 mol% or more, preferably 85 mol% or more, and particularly preferably 90 mol% or more. The upper limit is 100 mol%. The fluorine-containing epoxy-modified silsesquioxane containing the siloxane structural units (T-1) and (T-2) in the above-mentioned range tends to be particularly excellent in the effect of imparting scratch resistance to a cured product.
本発明のフッ素含有エポキシ変性シルセスキオキサンは、T単位としてシロキサン構成単位(T-1)とシロキサン構成単位(T-2)以外にも他のシロキサン構成単位を有していてもよい。T3体として、下記式(T-3)で表されるシロキサン構成単位(T-3)を有していてもよい。更に、T2体として、下記式(T-1’)、(T-2’)で表されるシロキサン構成単位を有していてもよい。
[R3SiO3/2] (T-3)
[R1SiO2/2(OR4)] (T-1')
[R2SiO2/2(OR4)] (T-2’)
(式中、R1、R2は上記に同じ。R3は水素原子、又は置換基(ハロゲン原子及びエポキシ基を除く)を有していてもよい炭化水素基を示す。R4は、同一又は異なって、水素原子又は炭素数1〜4のアルキル基を示す)
The fluorine-containing epoxy-modified silsesquioxane of the present invention may have other siloxane structural units in addition to the siloxane structural unit (T-1) and the siloxane structural unit (T-2) as T units. The T3 body may have a siloxane structural unit (T-3) represented by the following formula (T-3). Furthermore, it may have a siloxane structural unit represented by the following formulas (T-1 ′) and (T-2 ′) as a T2 body.
[R 3 SiO 3/2 ] (T-3)
[R 1 SiO 2/2 (OR 4 )] (T-1 ')
[R 2 SiO 2/2 (OR 4 )] (T-2 ')
(Wherein, R 1 and R 2 are the same as above. R 3 represents a hydrogen atom or a hydrocarbon group which may have a substituent (excluding a halogen atom and an epoxy group). R 4 is the same. Or different, it represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms)
尚、T3体は、より詳細には下記式(t3)で表される。また、T2体は、より詳細には下記式(t2)で表される。下記式(t3)で表される構造中に示されるケイ素原子に結合した3つの酸素原子はそれぞれ、他のケイ素原子(式(t3)中に示されていないケイ素原子)と結合している。一方、下記式(t2)で表される構造中に示されるケイ素原子の上と下に位置する2つの酸素原子はそれぞれ、他のケイ素原子(式(t2)中に示されていないケイ素原子)と結合している。尚、下記式中、Rは前記R1、R2、又はR3を示す。R4は前記に同じ。
上記R3における炭化水素基には、脂肪族炭化水素基、脂環式炭化水素基、芳香族炭化水素基、及びこれらの結合した基が含まれる。 The hydrocarbon group in the above R 3, an aliphatic hydrocarbon group, alicyclic hydrocarbon group, aromatic hydrocarbon groups, and these groups bound to each.
脂肪族炭化水素基としては、炭素数1〜10の脂肪族炭化水素基が好ましく、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、t−ブチル基、ペンチル基、イソペンチル基等の炭素数1〜10(好ましくは1〜5、特に好ましくは1〜3)のアルキル基;ビニル基、アリル基、1−ブテニル基等の炭素数2〜10(好ましくは2〜5、特に好ましくは2〜3)のアルケニル基;エチニル基、プロピニル基等の炭素数2〜10(好ましくは2〜5、特に好ましくは2〜3)のアルキニル基等を挙げることができる。 The aliphatic hydrocarbon group is preferably an aliphatic hydrocarbon group having 1 to 10 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group and a t-butyl group. Alkyl group having 1 to 10 (preferably 1 to 5, particularly preferably 1 to 3) carbon atoms such as pentyl group and isopentyl group; 2 to 10 carbon atoms such as vinyl, allyl and 1-butenyl group Preferably, an alkenyl group of 2 to 5 and particularly preferably 2 to 3); an alkynyl group having 2 to 10 carbon atoms (preferably 2 to 5 and particularly preferably 2 to 3) such as ethynyl group and propynyl group etc. Can.
脂環式炭化水素基としては、3〜10員の脂環式炭化水素基が好ましく、例えば、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基等の3〜10員(好ましくは5〜8員)のシクロアルキル基;シクロペンテニル基、シクロへキセニル基等の3〜10員(好ましくは5〜8員)のシクロアルケニル基等を挙げることができる。 The alicyclic hydrocarbon group is preferably a 3- to 10-membered alicyclic hydrocarbon group, and for example, a 3- to 10-membered (preferably a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cyclooctyl group, etc.) 5-8 membered cycloalkyl group; 3-10 membered (preferably 5-8 membered) cycloalkenyl group such as cyclopentenyl group, cyclohexenyl group and the like can be mentioned.
芳香族炭化水素基としては、炭素数6〜14(特に、炭素数6〜10)芳香族炭化水素基が好ましく、例えば、フェニル基、ナフチル基等を挙げることができる。 As an aromatic hydrocarbon group, a C6-C14 (especially C6-C10) aromatic hydrocarbon group is preferable, For example, a phenyl group, a naphthyl group, etc. can be mentioned.
上記炭化水素基が有していてもよい置換基としては、例えば、オキソ基、ヒドロキシル基、置換オキシ基(例えば、C1-3アルコキシ基、C6-10アリールオキシ基、C7-10アラルキルオキシ基、アシルオキシ基等)、カルボキシル基、置換オキシカルボニル基(例えば、C1-3アルコキシカルボニル基、C6-10アリールオキシカルボニル基、C7-10アラルキルオキシカルボニル基等)、置換又は無置換カルバモイル基、シアノ基、ニトロ基、アミノ基、メルカプト基、(メタ)アクリル基等が挙げられる。 As the substituent which the above-mentioned hydrocarbon group may have, for example, oxo group, hydroxyl group, substituted oxy group (for example, C 1-3 alkoxy group, C 6-10 aryloxy group, C 7-10 aralkyl) Oxy group, acyloxy group etc.), carboxyl group, substituted oxycarbonyl group (eg, C 1-3 alkoxycarbonyl group, C 6-10 aryloxycarbonyl group, C 7-10 aralkyloxycarbonyl group etc.), substituted or unsubstituted A carbamoyl group, a cyano group, a nitro group, an amino group, a mercapto group, a (meth) acryl group etc. are mentioned.
上記R4における炭素数1〜4のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基等の直鎖又は分岐鎖状のアルキル基が挙げられる。 The alkyl group having 1 to 4 carbon atoms in the R 4, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, include straight chain or branched chain alkyl groups such as isobutyl.
本発明のフッ素含有エポキシ変性シルセスキオキサンを構成する全てのシロキサン構成単位に含まれる、T3体とT2体のモル比[T3体/T2体]は、例えば5〜40であり、耐擦傷性を向上する効果が得られる点で、好ましくは10〜30、特に好ましくは15〜25、最も好ましくは20〜25である。 The molar ratio [T3 body / T2 body] of T3 body to T2 body contained in all the siloxane structural units constituting the fluorine-containing epoxy-modified silsesquioxane of the present invention is, for example, 5 to 40, and the scratch resistance is Preferably, it is 10 to 30, particularly preferably 15 to 25, and most preferably 20 to 25 in that the effect of improving
前記T3体とT2体のモル比[T3体/T2体]は、例えば、29Si−NMRスペクトル測定により求めることができる。29Si−NMRスペクトルにおいて、T3体におけるケイ素原子と、T2体におけるケイ素原子とは、異なる位置(化学シフト)にシグナル(ピーク)を示すため、これらそれぞれのピークの積分比を算出することにより、[T3体/T2体]が求められる。尚、T3体におけるケイ素原子のシグナルは−64〜−70ppmに現れ、T2体におけるケイ素原子のシグナルは−54〜−60ppmに現れる。 The molar ratio [T3 body / T2 body] of the T3 body and the T2 body can be determined, for example, by 29 Si-NMR spectrum measurement. In the 29 Si-NMR spectrum, silicon atoms in the T3 body and silicon atoms in the T2 body show signals (peaks) at different positions (chemical shifts), so by calculating the integral ratio of these respective peaks, [T3 body / T2 body] is obtained. In addition, the signal of the silicon atom in T3 body appears in -64 to -70 ppm, and the signal of the silicon atom in T2 body appears in -54 to -60 ppm.
29Si−NMRスペクトルは、例えば、下記の装置及び条件により測定することができる。
測定装置:商品名「JNM−ECA500NMR」(日本電子(株)製)
溶媒:重クロロホルム
積算回数:1800回
測定温度:25℃
The 29 Si-NMR spectrum can be measured, for example, by the following apparatus and conditions.
Measuring device: Brand name "JNM-ECA 500 NMR" (manufactured by Nippon Denshi Co., Ltd.)
Solvent: Heavy chloroform Accumulated number of times: 1800 times Measurement temperature: 25 ° C
本発明のフッ素含有エポキシ変性シルセスキオキサンは、上記T単位以外にも、M単位[R3SiO1/2]、D単位[R2SiO2/2]、Q単位[SiO4/2]を1種又は2種以上有していてもよい。尚、前記Rは前記R1、R2、又はR3を示す。 The fluorine-containing epoxy-modified silsesquioxane of the present invention is not limited to the T unit described above, and M unit [R 3 SiO 1/2 ], D unit [R 2 SiO 2/2 ], Q unit [SiO 4/2 ] It may have one or two or more. In addition, said R shows said R < 1 >, R < 2 > or R < 3 >.
本発明のフッ素含有エポキシ変性シルセスキオキサンにおけるフッ素原子含有量としては、フッ素含有エポキシ変性シルセスキオキサンに含まれるケイ素原子1モルに対して、フッ素原子を例えば0.1モル以上10モル未満であり、上限は好ましくは5モル、より好ましくは2.5モル、特に好ましくは2.0モル、最も好ましくは1.8モル、とりわけ好ましくは1.5モルである。本発明のフッ素含有エポキシ変性シルセスキオキサンが上記範囲でフッ素原子を含有すると、エポキシ変性シルセスキオキサン等の他のカチオン硬化性化合物との相溶性を有し、他のカチオン硬化性化合物に添加することで得られる硬化物の耐擦傷性付を向上することができる。一方、フッ素原子含有量が過剰となると、エポキシ変性シルセスキオキサン等の他のカチオン硬化性化合物との相溶性が低下し、混ざりにくくなる傾向がある。 The fluorine atom content of the fluorine-containing epoxy-modified silsesquioxane of the present invention is, for example, 0.1 mol or more and less than 10 mol of fluorine atoms per 1 mol of silicon atoms contained in the fluorine-containing epoxy-modified silsesquioxane The upper limit is preferably 5 moles, more preferably 2.5 moles, particularly preferably 2.0 moles, most preferably 1.8 moles, especially preferably 1.5 moles. When the fluorine-containing epoxy-modified silsesquioxane of the present invention contains a fluorine atom in the above range, it has compatibility with other cation-curable compounds such as epoxy-modified silsesquioxane, and other cation-curable compounds By adding it, abrasion resistance of the hardened | cured material obtained can be improved. On the other hand, when the fluorine atom content is excessive, the compatibility with other cationically curable compounds such as epoxy-modified silsesquioxane tends to be reduced and mixing tends to be difficult.
本発明のフッ素含有エポキシ変性シルセスキオキサンのエポキシ当量(g/eq)は、例えば150〜500、好ましくは170〜400、特に好ましくは190〜350である。上記エポキシ当量が上記範囲内であると、他のカチオン硬化性化合物との重合性に特に優れ、得られる硬化物の耐擦傷性を著しく向上することができる。また、硬化物の耐クラック性及び被接着体に対する接着性に優れる傾向がある。更に、耐熱性に優れる傾向もある。なお、エポキシ当量は、JIS K7236:2001に準じて測定される。 The epoxy equivalent (g / eq) of the fluorine-containing epoxy-modified silsesquioxane of the present invention is, for example, 150 to 500, preferably 170 to 400, and particularly preferably 190 to 350. It is especially excellent in the polymerizability with other cation hardenability compounds as the above-mentioned epoxy equivalent is in the above-mentioned range, and the abrasion resistance of the hardened material obtained can be improved remarkably. Moreover, there exists a tendency to be excellent in the crack resistance of hardened | cured material, and adhesiveness with respect to a to-be-adhered body. Furthermore, the heat resistance tends to be excellent. The epoxy equivalent is measured in accordance with JIS K 7236: 2001.
本発明のフッ素含有エポキシ変性シルセスキオキサンのゲルパーミエーションクロマトグラフィーによる標準ポリスチレン換算の数平均分子量(Mn)は、特に限定されないが、例えば500〜4000、好ましくは1000〜2500、特に好ましくは1200〜1800、最も好ましくは1300〜1700である。フッ素含有エポキシ変性シルセスキオキサンの数平均分子量が500以上であると、これを含有する硬化性組成物は製膜性が良好であり、基材等に塗布する際にはハジキが生じにくく、塗膜表面に窪みやへこみが生じにくい。また、前記硬化性組成物の硬化物は耐熱性、及び耐擦傷性に特に優れる。一方、フッ素含有エポキシ変性シルセスキオキサンの数平均分子量が4000以下であると、硬化性組成物に含まれる他の成分との相溶性に優れる。 The number average molecular weight (Mn) in terms of standard polystyrene equivalent by gel permeation chromatography of the fluorine-containing epoxy-modified silsesquioxane of the present invention is not particularly limited, but for example 500 to 4000, preferably 1000 to 2500, particularly preferably 1200 ~ 1800, most preferably 1300-1700. When the number average molecular weight of the fluorine-containing epoxy-modified silsesquioxane is 500 or more, the curable composition containing the same has good film forming properties, and when applied to a substrate or the like, repelling hardly occurs, It is hard to produce a dent and a dent on the coating film surface. The cured product of the curable composition is particularly excellent in heat resistance and scratch resistance. On the other hand, when the number average molecular weight of the fluorine-containing epoxy-modified silsesquioxane is 4000 or less, the compatibility with other components contained in the curable composition is excellent.
本発明のフッ素含有エポキシ変性シルセスキオキサンのゲルパーミエーションクロマトグラフィーによる標準ポリスチレン換算の分子量分散度(Mw/Mn)は、特に限定されないが、3.0以下(例えば、1.0〜3.0)が好ましく、より好ましくは1.1〜2.0、さらに好ましくは1.1〜1.5である。フッ素含有エポキシ変性シルセスキオキサンの分子量分散度が3.0以下であると、これを含有する硬化性組成物の硬化物は耐擦傷性に特に優れる。一方、フッ素含有エポキシ変性シルセスキオキサンの分子量分散度が1.1以上であると、液状となりやすく、取り扱い性が良好である。 Although the molecular weight dispersion degree (Mw / Mn) of standard polystyrene conversion by gel permeation chromatography of fluorine-containing epoxy-modified silsesquioxane of the present invention is not particularly limited, it is 3.0 or less (for example, 1.0 to 3. 0) is preferable, More preferably, it is 1.1-2.0, More preferably, it is 1.1-1.5. When the molecular weight dispersion of the fluorine-containing epoxy-modified silsesquioxane is 3.0 or less, the cured product of the curable composition containing the same is particularly excellent in the scratch resistance. On the other hand, when the molecular weight dispersion degree of the fluorine-containing epoxy-modified silsesquioxane is 1.1 or more, it becomes easily liquid, and the handleability is good.
なお、本発明のフッ素含有エポキシ変性シルセスキオキサンの数平均分子量、分子量分散度は、下記の装置及び条件により測定することができる。
測定装置:商品名「LC−20AD」((株)島津製作所製)
カラム:Shodex KF−801×2本、KF−802、及びKF−803(昭和電工(株)製)
測定温度:40℃
溶離液:THF、試料濃度0.1〜0.2重量%
流量:1mL/分
検出器:UV−VIS検出器(商品名「SPD−20A」、(株)島津製作所製)
分子量:標準ポリスチレン換算
In addition, the number average molecular weight of the fluorine-containing epoxy modified silsesquioxane of this invention and molecular weight dispersion degree can be measured by the following apparatus and conditions.
Measuring device: Brand name "LC-20AD" (manufactured by Shimadzu Corporation)
Column: Shodex KF-801 × 2, KF-802, and KF-803 (manufactured by Showa Denko KK)
Measurement temperature: 40 ° C
Eluent: THF, sample concentration 0.1 to 0.2% by weight
Flow rate: 1 mL / min Detector: UV-VIS detector (trade name "SPD-20A", manufactured by Shimadzu Corporation)
Molecular weight: Standard polystyrene equivalent
本発明のフッ素含有エポキシ変性シルセスキオキサンの構造としては、ラダー構造、カゴ構造(完全カゴ構造、不完全カゴ構造)、ランダム型等が挙げられる。フッ素含有エポキシ変性シルセスキオキサンの構造は、FT−IRスペクトル測定及びT3体とT2体のモル比[T3体/T2体]から確認することができる。 Examples of the structure of the fluorine-containing epoxy-modified silsesquioxane of the present invention include a ladder structure, a cage structure (complete cage structure, incomplete cage structure), a random type, and the like. The structure of the fluorine-containing epoxy-modified silsesquioxane can be confirmed from the FT-IR spectrum measurement and the molar ratio of T3 body to T2 body [T3 body / T2 body].
本発明のフッ素含有エポキシ変性シルセスキオキサンは、これを構成するシロキサン構成単位に対応する加水分解性三官能シラン化合物(例えば、下記式(t)で表される化合物)を加水分解及び縮合反応に付すことによって製造することができる。
RSi(X)3 (t)
(式中、Rは前記R1、R2、又はR3を示す。Xは、同一又は異なって、アルコキシ基又はハロゲン原子を示す)
The fluorine-containing epoxy-modified silsesquioxane of the present invention hydrolyzes and condenses a hydrolysable trifunctional silane compound (for example, a compound represented by the following formula (t)) corresponding to a siloxane constituting unit constituting the same. It can be manufactured by attaching to.
RSi (X) 3 (t)
(Wherein, R represents the R 1 , R 2 or R 3. X is the same or different and represents an alkoxy group or a halogen atom)
本発明のフッ素含有エポキシ変性シルセスキオキサンにおける各シロキサン構成単位の割合は、これらの構成単位を形成するための原料(加水分解性三官能シラン)の組成をコントロールすることにより適宜調整可能である。 The ratio of each siloxane structural unit in the fluorine-containing epoxy-modified silsesquioxane of the present invention can be appropriately adjusted by controlling the composition of the raw material (hydrolyzable trifunctional silane) for forming these structural units. .
使用する加水分解性シラン化合物の全量(100モル%)における、シロキサン構成単位(T-1)に対応する三官能シラン化合物とシロキサン構成単位(T-2)に対応する三官能シラン化合物の割合(総量の割合)は、特に限定されないが、80モル%以上であり、好ましくは85モル%以上、特に好ましくは90モル%以上である。尚、上限は100モル%である。 Ratio of the trifunctional silane compound corresponding to the siloxane structural unit (T-1) to the trifunctional silane compound corresponding to the siloxane structural unit (T-2) in the total amount (100 mol%) of the hydrolyzable silane compound to be used The proportion of the total amount) is not particularly limited, but is 80 mol% or more, preferably 85 mol% or more, and particularly preferably 90 mol% or more. The upper limit is 100 mol%.
また、シロキサン構成単位(T-1)に対応する三官能シラン化合物とシロキサン構成単位(T-2)に対応する三官能シラン化合物の加水分解及び縮合反応は、同時に行うこともできるし、逐次行うこともできる。上記反応を逐次行う場合、反応を行う順序は特に限定されない。 Also, the hydrolysis and condensation reactions of the trifunctional silane compound corresponding to the siloxane structural unit (T-1) and the trifunctional silane compound corresponding to the siloxane structural unit (T-2) can be performed simultaneously or sequentially It can also be done. When the above reactions are carried out sequentially, the order in which the reactions are carried out is not particularly limited.
上記加水分解性シラン化合物の加水分解及び縮合反応は、溶媒の存在下で行うことが好ましい。上記溶媒としては、例えば、ベンゼン、トルエン、キシレン、エチルベンゼン等の芳香族炭化水素;ジエチルエーテル、ジメトキシエタン、テトラヒドロフラン、ジオキサン等のエーテル;アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン;酢酸メチル、酢酸エチル、酢酸イソプロピル、酢酸ブチル等のエステル;N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等のアミド;アセトニトリル、プロピオニトリル、ベンゾニトリル等のニトリル;メタノール、エタノール、イソプロピルアルコール、ブタノール等のアルコール等が挙げられる。これらは1種を単独で、又は2種以上を組み合わせて使用することができる。上記溶媒としては、中でも、ケトン及び/又はエーテルが好ましい。 The hydrolysis and condensation reaction of the hydrolyzable silane compound is preferably performed in the presence of a solvent. Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene; ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran and dioxane; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; methyl acetate, ethyl acetate Esters such as isopropyl acetate and butyl acetate; amides such as N, N-dimethylformamide and N, N-dimethylacetamide; nitriles such as acetonitrile, propionitrile and benzonitrile; alcohols such as methanol, ethanol, isopropyl alcohol and butanol Etc. These can be used singly or in combination of two or more. Among the above solvents, ketones and / or ethers are preferable.
溶媒の使用量は、特に限定されず、加水分解性シラン化合物の全量100重量部に対して、2000重量部以下の範囲内で、反応時間等に応じて適宜調整することができる。 The amount of the solvent used is not particularly limited, and can be appropriately adjusted according to the reaction time and the like within the range of 2000 parts by weight or less with respect to 100 parts by weight of the total amount of the hydrolyzable silane compound.
上記加水分解性シラン化合物の加水分解及び縮合反応は、触媒及び水の存在下で進行させることが好ましい。上記触媒としては、酸触媒、及びアルカリ触媒が挙げられる。上記酸触媒としては、例えば、塩酸、硫酸、硝酸、リン酸、ホウ酸等の鉱酸;リン酸エステル;酢酸、ギ酸、トリフルオロ酢酸等のカルボン酸;メタンスルホン酸、トリフルオロメタンスルホン酸、p−トルエンスルホン酸等のスルホン酸;活性白土等の固体酸;塩化鉄等のルイス酸等が挙げられる。上記アルカリ触媒としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属の水酸化物;水酸化マグネシウム、水酸化カルシウム、水酸化バリウム等のアルカリ土類金属の水酸化物;炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属の炭酸塩;炭酸マグネシウム等のアルカリ土類金属の炭酸塩;炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属の炭酸水素塩;酢酸リチウム、酢酸ナトリウム、酢酸カリウム、酢酸セシウム等のアルカリ金属の有機酸塩(例えば、酢酸塩);酢酸マグネシウム等のアルカリ土類金属の有機酸塩(例えば、酢酸塩);リチウムメトキシド、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムイソプロポキシド、カリウムエトキシド、カリウムt−ブトキシド等のアルカリ金属のアルコキシド;ナトリウムフェノキシド等のアルカリ金属のフェノキシド;トリエチルアミン、N−メチルピペリジン、1,8−ジアザビシクロ[5.4.0]ウンデカ−7−エン、1,5−ジアザビシクロ[4.3.0]ノナ−5−エン等のアミン類(第3級アミン等);ピリジン、2,2'−ビピリジル、1,10−フェナントロリン等の含窒素芳香族複素環化合物等が挙げられる。これらは1種を単独で、又は2種以上を組み合わせて使用することができる。また、触媒は、水や溶媒等に溶解又は分散させた状態で使用することもできる。 The hydrolysis and condensation reaction of the hydrolyzable silane compound is preferably allowed to proceed in the presence of a catalyst and water. As said catalyst, an acid catalyst and an alkali catalyst are mentioned. Examples of the acid catalyst include mineral acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, formic acid and trifluoroacetic acid; methanesulfonic acid, trifluoromethanesulfonic acid, p -Sulfonic acids such as toluene sulfonic acid; Solid acids such as activated clay; Lewis acids such as iron chloride and the like. Examples of the alkali catalyst include hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide; alkaline earth metals such as magnesium hydroxide, calcium hydroxide and barium hydroxide Hydroxides; carbonates of alkali metals such as lithium carbonate, sodium carbonate, potassium carbonate and cesium carbonate; carbonates of alkaline earth metals such as magnesium carbonate; lithium hydrogen carbonate, sodium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate and cesium hydrogen carbonate Bicarbonates of alkali metals such as, for example; organic acid salts of alkali metals such as lithium acetate, sodium acetate, potassium acetate, cesium acetate (for example, acetates); organic acid salts of alkaline earth metals such as magnesium acetate (for example, Acetates); lithium methoxide, sodium methoxide, sodium ether Alkali metal alkoxides such as sodium isopropoxide, potassium ethoxide and potassium t-butoxide; phenoxides of alkali metals such as sodium phenoxide; triethylamine, N-methylpiperidine, 1,8-diazabicyclo [5.4.0] Amides such as undec-7-ene and 1,5-diazabicyclo [4.3.0] non-5-ene (tertiary amines etc.); pyridine, 2,2'-bipyridyl, 1,10-phenanthroline etc. And nitrogen-containing aromatic heterocyclic compounds of the following. These can be used singly or in combination of two or more. The catalyst can also be used in the state of being dissolved or dispersed in water, a solvent or the like.
上記触媒の使用量は、特に限定されず、加水分解性シラン化合物の全量1モルに対して、例えば0.002〜0.200モルであり、この範囲内で適宜調整することができる。 The amount of the catalyst used is not particularly limited, and is, for example, 0.002 to 0.200 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound, and can be appropriately adjusted within this range.
上記加水分解及び縮合反応に際しての水の使用量は、特に限定されず、加水分解性シラン化合物の全量1モルに対して、例えば0.5〜20モルであり、この範囲内で適宜調整することができる。 The amount of water used in the above hydrolysis and condensation reactions is not particularly limited, and is, for example, 0.5 to 20 moles, per 1 mole of the total of hydrolyzable silane compounds, and can be appropriately adjusted within this range. Can.
上記水の添加方法は、特に限定されず、使用する水の全量(全使用量)を一括で添加してもよいし、逐次的に添加してもよい。逐次的に添加する際には、連続的に添加してもよいし、間欠的に添加してもよい。 The method of adding water is not particularly limited, and the entire amount (total use amount) of water to be used may be added at once or may be added sequentially. When adding sequentially, you may add continuously and may add intermittently.
上記加水分解及び縮合反応の反応温度は、特に限定されないが、15〜100℃が好ましく、より好ましくは20〜80℃である。反応温度を上記範囲に制御することにより、重合度が向上する傾向がある。また、上記加水分解及び縮合反応の反応時間は、特に限定されないが、0.1〜10時間が好ましく、より好ましくは1〜8時間である。また、上記加水分解及び縮合反応は、常圧下で行うこともできるし、加圧下又は減圧下で行うこともできる。なお、上記加水分解及び縮合反応を行う際の雰囲気は、特に限定されず、例えば、窒素雰囲気、アルゴン雰囲気等の不活性ガス雰囲気下、空気下等の酸素存在下等のいずれであってもよいが、不活性ガス雰囲気下が好ましい。 Although the reaction temperature of the said hydrolysis and condensation reaction is not specifically limited, 15-100 degreeC is preferable, More preferably, it is 20-80 degreeC. By controlling the reaction temperature within the above range, the degree of polymerization tends to be improved. Moreover, the reaction time of the said hydrolysis and condensation reaction is although it does not specifically limit, 0.1 to 10 hours are preferable, More preferably, it is 1 to 8 hours. Further, the above-mentioned hydrolysis and condensation reaction can be carried out under normal pressure or can be carried out under pressure or under reduced pressure. In addition, the atmosphere at the time of performing the said hydrolysis and condensation reaction is not specifically limited, For example, under inert gas atmospheres, such as nitrogen atmosphere and argon atmosphere, oxygen presence, such as under air, etc. may be any, etc. However, under inert gas atmosphere is preferable.
なお、本発明のフッ素含有エポキシ変性シルセスキオキサンの製造方法として、シロキサン構成単位(T-1)に対応する三官能シラン化合物[R1Si(X)3]とシロキサン構成単位(T-2)に対応する三官能シラン化合物[R2Si(X)3]を少なくとも含む加水分解性シラン化合物を加水分解及び縮合させる方法を説明したが、本発明のフッ素含有エポキシ変性シルセスキオキサンの製造方法はこの方法には限定されず、例えば、前記[R1Si(X)3]に代えて、[RxSi(X)3](Rx:置換若しくは無置換のアルケニル基である)で表される化合物を加水分解及び縮合反応させ、その後、過酸等の酸化剤を反応させてエポキシ化する方法により製造してもよい。 In addition, as a method for producing the fluorine-containing epoxy-modified silsesquioxane of the present invention, a trifunctional silane compound [R 1 Si (X) 3 ] corresponding to the siloxane structural unit (T-1) and a siloxane structural unit (T-2) Described a method for hydrolyzing and condensing a hydrolyzable silane compound containing at least a trifunctional silane compound [R 2 Si (X) 3 ] corresponding to the above), but the production of the fluorine-containing epoxy-modified silsesquioxane of the present invention The method is not limited to this method. For example, in place of the above [R 1 Si (X) 3 ], [R x Si (X) 3 ] (R x is a substituted or unsubstituted alkenyl group) The compound represented may be produced by a hydrolysis and condensation reaction, followed by reaction with an oxidizing agent such as peracid to epoxidize.
本発明のフッ素含有エポキシ変性シルセスキオキサンは上述の構成を有するため、硬化性組成物に添加することにより、得られる硬化物の耐擦傷性を向上する効果を発揮することができる。従って、本発明のフッ素含有エポキシ変性シルセスキオキサンは、耐擦傷性付与材等として好適に使用することができる。 Since the fluorine-containing epoxy-modified silsesquioxane of the present invention has the above-mentioned constitution, by adding it to the curable composition, it is possible to exhibit the effect of improving the scratch resistance of the obtained cured product. Therefore, the fluorine-containing epoxy-modified silsesquioxane of the present invention can be suitably used as a scratch resistance imparting agent and the like.
[硬化性組成物]
本発明の硬化性組成物は、上記フッ素含有エポキシ変性シルセスキオキサンを必須成分とする硬化性組成物である。本発明の硬化性組成物は、上記フッ素含有エポキシ変性シルセスキオキサンを、1種を単独で又は2種以上を組み合わせて含有することができる。本発明の硬化性組成物は、更に、上記フッ素含有エポキシ変性シルセスキオキサン以外の硬化性化合物(以後、「他の硬化性化合物」と称する場合がある)、重合開始剤(特に光カチオン重合開始剤)や表面調整剤あるいは表面改質剤等を含んでいてもよい。
[Curable composition]
The curable composition of the present invention is a curable composition containing the above-mentioned fluorine-containing epoxy-modified silsesquioxane as an essential component. The curable composition of the present invention can contain the above-mentioned fluorine-containing epoxy-modified silsesquioxane singly or in combination of two or more. The curable composition of the present invention further comprises a curable compound other than the above-mentioned fluorine-containing epoxy-modified silsesquioxane (hereinafter sometimes referred to as "other curable compound"), a polymerization initiator (in particular photo cationic polymerization) Initiators), surface conditioners, surface modifiers and the like may be included.
本発明の硬化性組成物に含まれる硬化性化合物全量(100重量%)における上記フッ素含有エポキシ変性シルセスキオキサンの含有量(配合量)は、例えば0.1重量%以上、好ましくは0.1〜10重量%、より好ましくは0.5〜10重量%、特に好ましくは0.5〜5重量%、最も好ましくは0.5〜3重量%である。上記フッ素含有エポキシ変性シルセスキオキサンを0.1重量%以上含有することで、耐擦傷性に優れた硬化物を得ることができる。また、上記フッ素含有エポキシ変性シルセスキオキサンを10重量%以下の範囲で含有することで、透明性に優れた硬化物が得られる。 The content (compounding amount) of the fluorine-containing epoxy-modified silsesquioxane in the total amount (100% by weight) of the curable compound contained in the curable composition of the present invention is, for example, 0.1% by weight or more, preferably 0. It is 1 to 10% by weight, more preferably 0.5 to 10% by weight, particularly preferably 0.5 to 5% by weight, and most preferably 0.5 to 3% by weight. By containing 0.1% by weight or more of the above-mentioned fluorine-containing epoxy-modified silsesquioxane, a cured product having excellent scratch resistance can be obtained. Moreover, the hardened | cured material excellent in transparency is obtained by containing the said fluorine-containing epoxy modified silsesquioxane in 10 weight% or less.
他の硬化性化合物としては、公知乃至慣用のカチオン硬化性化合物を使用することができ、特に限定されないが、例えば、本発明のフッ素含有エポキシ変性シルセスキオキサン以外のエポキシ化合物(「他のエポキシ化合物」と称する場合がある)、オキセタン化合物、ビニルエーテル化合物等が挙げられる。これらは1種を単独で又は2種以上を組み合わせて使用することができる。 As other curable compounds, known or commonly used cationic curable compounds can be used and are not particularly limited. For example, epoxy compounds other than the fluorine-containing epoxy-modified silsesquioxane of the present invention (“other epoxy compounds Compounds), oxetane compounds, vinyl ether compounds, etc. may be mentioned. These can be used individually by 1 type or in combination of 2 or more types.
本発明の硬化性組成物は、他の硬化性化合物として、5%重量減少温度(Td5)が、例えば280℃以上(好ましくは300℃以上、特に好ましくは350℃以上)である化合物を含有することが、耐熱性に優れた硬化物を形成することができ、耐熱性に優れたハードコート層を形成することができる点で好ましい。なお、硬化性化合物の5%重量減少温度は、TG/DTAにより測定することができる。 The curable composition of the present invention contains, as another curable compound, a compound having a 5% weight loss temperature (Td 5 ) of, for example, 280 ° C. or higher (preferably 300 ° C. or higher, particularly preferably 350 ° C. or higher). It is preferable from the viewpoint that a cured product excellent in heat resistance can be formed and a hard coat layer excellent in heat resistance can be formed. The 5% weight loss temperature of the curable compound can be measured by TG / DTA.
他のエポキシ化合物としては、分子内に1以上のエポキシ基(オキシラン環)を有する公知乃至慣用の化合物を使用することができ、特に限定されないが、例えば、エポキシ変性シロキサン化合物、脂環式エポキシ化合物、芳香族エポキシ化合物、脂肪族エポキシ化合物等が挙げられる。 As other epoxy compounds, known or commonly used compounds having one or more epoxy groups (oxirane ring) in the molecule can be used, and it is not particularly limited. For example, epoxy modified siloxane compounds, alicyclic epoxy compounds And aromatic epoxy compounds and aliphatic epoxy compounds.
前記エポキシ変性シロキサン化合物としては、例えば、エポキシ変性シリコーンやエポキシ変性シルセスキオキサン等を挙げることができる。これらは1種を単独で、又は2種以上を組み合わせて使用することができる。 As said epoxy modified siloxane compound, an epoxy modified silicone, an epoxy modified silsesquioxane etc. can be mentioned, for example. These can be used singly or in combination of two or more.
前記エポキシ変性シリコーンは、ジメチルシリコーン骨格の末端及び側鎖の少なくとも1つにエポキシ基(例えば、グリシジル基、脂環エポキシ基等)を導入した化合物である。 The epoxy-modified silicone is a compound in which an epoxy group (for example, a glycidyl group, an alicyclic epoxy group, etc.) is introduced into at least one of the terminal and the side chain of the dimethylsilicone skeleton.
前記エポキシ変性シルセスキオキサンはシルセスキオキサン構造(ラダー構造、カゴ構造(完全カゴ構造、不完全カゴ構造)、ランダム型等)と、それに結合したエポキシ基を有するポリシロキサン化合物であり、例えば、T単位(特に、T3体)として、下記式(T-1)
[R1SiO3/2] (T-1)
[式中、R1は、エポキシ基を含有する基を示す]
で表されるシロキサン構成単位(T-1)と、下記式(T-3)
[R3SiO3/2] (T-3)
[式中、R3は水素原子、又は置換基(ハロゲン原子及びエポキシ基を除く)を有していてもよい炭化水素基を示す]
で表されるシロキサン構成単位(T-3)とを有する化合物を挙げることができる。
The epoxy-modified silsesquioxane is a polysiloxane compound having a silsesquioxane structure (ladder structure, cage structure (complete cage structure, incomplete cage structure), random type, etc.) and an epoxy group bonded thereto, for example, , T unit (especially, T3 form), the following formula (T-1)
[R 1 SiO 3/2 ] (T-1)
[Wherein, R 1 represents a group containing an epoxy group]
And a siloxane structural unit (T-1) represented by the following formula (T-3)
[R 3 SiO 3/2 ] (T-3)
[Wherein, R 3 represents a hydrogen atom or a hydrocarbon group which may have a substituent (excluding a halogen atom and an epoxy group)]
And compounds having the siloxane structural unit (T-3) represented by
尚、前記式(T-1)中のR1、及び前記式(T-3)中のR3は、何れも上記と同様の例を挙げることができる。 The examples of R 1 in the formula (T-1) and R 3 in the formula (T-3) can all be the same as described above.
前記エポキシ変性シルセスキオキサンは、T単位(特に、T2体)として、下記式で表されるシロキサン構造単位を有していてもよい。
[R1SiO2/2(OR4)] (T-1’)
[R3SiO2/2(OR4)] (T-3’)
(式中、R1、R3、R4は、上記に同じ)
The epoxy-modified silsesquioxane may have a siloxane structural unit represented by the following formula as a T unit (in particular, a T2 form).
[R 1 SiO 2/2 (OR 4 )] (T-1 ')
[R 3 SiO 2/2 (OR 4 )] (T-3 ')
(Wherein, R 1 , R 3 and R 4 are the same as above)
前記エポキシ変性シルセスキオキサンは、T単位以外にも、M単位、D単位、Q単位を1種又は2種以上有していてもよい。 The epoxy-modified silsesquioxane may have one or more M units, D units, and Q units in addition to T units.
前記エポキシ変性シルセスキオキサンにおける[T3体/T2体]としては、5以上であることが耐クラック性に優れる点で好ましい。 The [T3 body / T2 body] in the epoxy-modified silsesquioxane is preferably 5 or more from the viewpoint of excellent crack resistance.
前記エポキシ変性シルセスキオキサンのゲルパーミエーションクロマトグラフィーによる標準ポリスチレン換算の数平均分子量(Mn)は、特に限定されないが、500〜4000が好ましく、より好ましくは1000〜2500、さらに好ましくは1100〜2600である。数平均分子量が1000以上であると、得られる硬化物の耐擦傷性、耐熱性、接着性が優れる傾向がある。また、該硬化性組成物の硬化物の耐熱性、接着性が向上する傾向がある。一方、数平均分子量が4000以下であると、硬化性組成物における他の成分との相溶性が向上し、硬化物の耐熱性が向上する傾向がある。 Although the number average molecular weight (Mn) of standard polystyrene conversion by gel permeation chromatography of the said epoxy modified silsesquioxane is not specifically limited, 500-4000 are preferable, More preferably, 1000-2500, More preferably, 1100-2600 It is. When the number average molecular weight is 1,000 or more, the resulting cured product tends to be excellent in the abrasion resistance, heat resistance and adhesiveness. In addition, the heat resistance and adhesiveness of the cured product of the curable composition tend to be improved. On the other hand, when the number average molecular weight is 4000 or less, the compatibility with other components in the curable composition is improved, and the heat resistance of the cured product tends to be improved.
前記エポキシ変性シルセスキオキサンのゲルパーミエーションクロマトグラフィーによる標準ポリスチレン換算の分子量分散度(Mw/Mn)は、特に限定されないが、3.0以下(例えば、1.0〜3.0)が好ましく、より好ましくは1.1〜2.0、さらに好ましくは1.1〜1.5である。 Although the molecular weight dispersion degree (Mw / Mn) of standard polystyrene conversion by gel permeation chromatography of the said epoxy modified silsesquioxane is not limited, 3.0 or less (for example, 1.0-3.0) is preferable More preferably, it is 1.1-2.0, More preferably, it is 1.1-1.5.
前記エポキシ変性シルセスキオキサンは、これを構成するシロキサン構成単位に対応する加水分解性三官能シラン化合物を加水分解及び縮合反応に付すことによって製造することができる。 The epoxy-modified silsesquioxane can be produced by subjecting a hydrolyzable trifunctional silane compound corresponding to a siloxane constitutional unit constituting the same to hydrolysis and condensation reactions.
上記脂環式エポキシ化合物としては、分子内に1個以上の脂環と1個以上のエポキシ基とを有する公知乃至慣用の化合物が挙げられ、特に限定されないが、例えば、下記化合物等が挙げられる。
(1)分子内に脂環を構成する隣接する2つの炭素原子と酸素原子とで構成されるエポキシ基(「脂環エポキシ基」と称する)を有する化合物
(2)脂環にエポキシ基が直接単結合で結合している化合物
(3)分子内に脂環及びグリシジルエーテル基を有する化合物(グリシジルエーテル型エポキシ化合物)
Examples of the above-mentioned alicyclic epoxy compound include known and commonly used compounds having one or more alicyclic groups and one or more epoxy groups in the molecule, and are not particularly limited. For example, the following compounds may be mentioned. .
(1) Compound having an epoxy group (referred to as "alicyclic epoxy group") composed of two adjacent carbon atoms constituting an alicyclic ring and oxygen atom in the molecule (2) An epoxy group is directly on the alicyclic ring Compound (3) having a single bond and a compound having an alicyclic and glycidyl ether group in the molecule (glycidyl ether type epoxy compound)
上記(1)分子内に脂環エポキシ基を有する化合物としては、下記式(i)で表される化合物が挙げられる。
上記式(i)中、Yは単結合又は連結基(1以上の原子を有する二価の基)を示す。上記連結基としては、例えば、二価の炭化水素基、炭素−炭素二重結合の一部又は全部がエポキシ化されたアルケニレン基、カルボニル基、エーテル結合、エステル結合、カーボネート基、アミド基、これらが複数個連結した基等が挙げられる。なお、式(i)におけるシクロヘキサン環(シクロヘキセンオキシド基)を構成する炭素原子の1以上には、アルキル基等の置換基が結合していてもよい。 In said Formula (i), Y shows a single bond or a coupling group (bivalent group which has one or more atoms). Examples of the linking group include a divalent hydrocarbon group, an alkenylene group in which a part or all of carbon-carbon double bonds are epoxidized, a carbonyl group, an ether bond, an ester bond, a carbonate group, an amide group, and the like. And the like. In addition, substituents, such as an alkyl group, may be couple | bonded with one or more of the carbon atom which comprises the cyclohexane ring (cyclohexene oxide group) in Formula (i).
上記二価の炭化水素基としては、炭素数が1〜18の直鎖又は分岐鎖状のアルキレン基、二価の脂環式炭化水素基等が挙げられる。炭素数が1〜18の直鎖又は分岐鎖状のアルキレン基としては、例えば、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、プロピレン基、トリメチレン基等が挙げられる。上記二価の脂環式炭化水素基としては、例えば、1,2−シクロペンチレン基、1,3−シクロペンチレン基、シクロペンチリデン基、1,2−シクロヘキシレン基、1,3−シクロヘキシレン基、1,4−シクロヘキシレン基、シクロヘキシリデン基等のシクロアルキレン基(シクロアルキリデン基を含む)等が挙げられる。 As said bivalent hydrocarbon group, a C1-C18 linear or branched alkylene group, a bivalent alicyclic hydrocarbon group, etc. are mentioned. As a C1-C18 linear or branched alkylene group, a methylene group, a methyl methylene group, dimethyl methylene group, ethylene group, a propylene group, trimethylene group etc. are mentioned, for example. Examples of the divalent alicyclic hydrocarbon group include a 1,2-cyclopentylene group, a 1,3-cyclopentylene group, a cyclopentylidene group, a 1,2-cyclohexylene group, and a 1,3-disubstituted cycloaliphatic hydrocarbon group. Cycloalkylene groups (including cycloalkylidene groups) such as cyclohexylene group, 1,4-cyclohexylene group, cyclohexylidene group and the like can be mentioned.
上記炭素−炭素二重結合の一部又は全部がエポキシ化されたアルケニレン基(「エポキシ化アルケニレン基」と称する場合がある)におけるアルケニレン基としては、例えば、ビニレン基、プロペニレン基、1−ブテニレン基、2−ブテニレン基、ブタジエニレン基、ペンテニレン基、ヘキセニレン基、ヘプテニレン基、オクテニレン基等の炭素数2〜8の直鎖又は分岐鎖状のアルケニレン基等が挙げられる。特に、上記エポキシ化アルケニレン基としては、炭素−炭素二重結合の全部がエポキシ化されたアルケニレン基が好ましく、より好ましくは炭素−炭素二重結合の全部がエポキシ化された炭素数2〜4のアルケニレン基である。 The alkenylene group in the above-mentioned alkenylene group (sometimes referred to as “epoxidized alkenylene group”) in which part or all of the carbon-carbon double bond is epoxidized is, for example, vinylene group, propenylene group, 1-butenylene group And C2-C8 linear or branched alkenylene groups such as 2-butenylene group, butadienylene group, pentenylene group, hexenylene group, heptenylene group, octenylene group and the like. In particular, as the above-mentioned epoxidized alkenylene group, an alkenylene group in which all of carbon-carbon double bonds are epoxidized is preferable, and more preferably, all of carbon-carbon double bonds have 2 to 4 carbon atoms having epoxidized all of carbon-carbon double bonds. It is an alkenylene group.
上記式(i)で表される脂環式エポキシ化合物の代表的な例としては、(3,4,3’,4’−ジエポキシ)ビシクロヘキシル、ビス(3,4−エポキシシクロヘキシルメチル)エーテル、1,2−エポキシ−1,2−ビス(3,4−エポキシシクロヘキサン−1−イル)エタン、2,2−ビス(3,4−エポキシシクロヘキサン−1−イル)プロパン、1,2−ビス(3,4−エポキシシクロヘキサン−1−イル)エタンや、下記式(i-1)〜(i-10)で表される化合物等が挙げられる。尚、下記式(i-5)中のR'は炭素数1〜8のアルキレン基であり、なかでも、メチレン基、エチレン基、プロピレン基、イソプロピレン基等の炭素数1〜3の直鎖又は分岐鎖状のアルキレン基が好ましい。また、下記式(i-5)、(i-7)、(i-9)、(i-10)中のn1〜n8は、それぞれ1〜30の整数を示す。
上述の(2)脂環にエポキシ基が直接単結合で結合している化合物としては、例えば、下記式(ii)で表される化合物等が挙げられる。
式(ii)中、R"は、p価のアルコールの構造式からp個の水酸基(−OH)を除いた基(p価の有機基)であり、p、n9はそれぞれ自然数を表す。p価のアルコール[R"(OH)p]としては、2,2−ビス(ヒドロキシメチル)−1−ブタノール等の多価アルコール(炭素数1〜15のアルコール等)等が挙げられる。pは1〜6が好ましく、n9は1〜30が好ましい。pが2以上の場合、それぞれの[ ]内(外側の角括弧内)の基におけるn9は同一でもよく異なっていてもよい。上記式(ii)で表される化合物としては、具体的には、2,2−ビス(ヒドロキシメチル)−1−ブタノールの1,2−エポキシ−4−(2−オキシラニル)シクロヘキサン付加物[例えば、商品名「EHPE3150」((株)ダイセル製)等]等が挙げられる。 In formula (ii), R ′ ′ is a group (p-valent organic group) obtained by removing p hydroxyl groups (—OH) from the structural formula of p-valent alcohol, and p and n 9 each represent a natural number. Examples of the p-valent alcohol [R ′ (OH) p ] include polyhydric alcohols such as 2,2-bis (hydroxymethyl) -1-butanol (alcohols having 1 to 15 carbon atoms, etc.), and the like. p is preferably 1 to 6, n 9 is preferably 1 to 30. When p is 2 or more, n 9 in each of the groups in [] (in the outer square brackets) may be the same or different. Specific examples of the compound represented by the above formula (ii) include 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol [for example, And trade name "EHPE 3150" (manufactured by Daicel Co., Ltd.) and the like.
上述の(3)分子内に脂環及びグリシジルエーテル基を有する化合物としては、例えば、脂環式アルコール(特に、脂環式多価アルコール)のグリシジルエーテルが挙げられる。より詳しくは、例えば、2,2−ビス[4−(2,3−エポキシプロポキシ)シクロへキシル]プロパン、2,2−ビス[3,5−ジメチル−4−(2,3−エポキシプロポキシ)シクロへキシル]プロパンなどのビスフェノールA型エポキシ化合物を水素化した化合物(水素化ビスフェノールA型エポキシ化合物);ビス[o,o−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[o,p−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[p,p−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[3,5−ジメチル−4−(2,3−エポキシプロポキシ)シクロへキシル]メタンなどのビスフェノールF型エポキシ化合物を水素化した化合物(水素化ビスフェノールF型エポキシ化合物);水素化ビフェノール型エポキシ化合物;水素化フェノールノボラック型エポキシ化合物;水素化クレゾールノボラック型エポキシ化合物;ビスフェノールAの水素化クレゾールノボラック型エポキシ化合物;水素化ナフタレン型エポキシ化合物;トリスフェノールメタンから得られるエポキシ化合物を水素化した化合物等が挙げられる。 Examples of the compound having an alicyclic and glycidyl ether group in the (3) molecule described above include glycidyl ethers of alicyclic alcohols (particularly, alicyclic polyhydric alcohols). More specifically, for example, 2,2-bis [4- (2,3-epoxypropoxy) cyclohexyl] propane, 2,2-bis [3,5-dimethyl-4- (2,3-epoxypropoxy)] Compound (hydrogenated bisphenol A epoxy compound) obtained by hydrogenating a bisphenol A epoxy compound such as cyclohexyl] propane; bis [o, o- (2,3-epoxypropoxy) cyclohexyl] methane, bis [o , P- (2,3-epoxypropoxy) cyclohexyl] methane, bis [p, p- (2,3-epoxypropoxy) cyclohexyl] methane, bis [3,5-dimethyl-4- (2, 2, Compound obtained by hydrogenating a bisphenol F-type epoxy compound such as 3-epoxypropoxy) cyclohexyl] methane (hydrogenated bisphenol F-type epoxy compound Hydrogenated biphenol type epoxy compound; hydrogenated phenol novolac type epoxy compound; hydrogenated cresol novolac type epoxy compound; hydrogenated cresol novolac type epoxy compound of bisphenol A; hydrogenated naphthalene type epoxy compound; epoxy compound obtained from trisphenolmethane And the like.
上述の(3)分子内に脂環及びグリシジルエーテル基を有する化合物としては、例えば、脂環式アルコール(特に、脂環式多価アルコール)のグリシジルエーテルが挙げられる。より詳しくは、例えば、2,2−ビス[4−(2,3−エポキシプロポキシ)シクロへキシル]プロパン、2,2−ビス[3,5−ジメチル−4−(2,3−エポキシプロポキシ)シクロへキシル]プロパンなどのビスフェノールA型エポキシ化合物を水素化した化合物(水素化ビスフェノールA型エポキシ化合物);ビス[o,o−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[o,p−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[p,p−(2,3−エポキシプロポキシ)シクロへキシル]メタン、ビス[3,5−ジメチル−4−(2,3−エポキシプロポキシ)シクロへキシル]メタンなどのビスフェノールF型エポキシ化合物を水素化した化合物(水素化ビスフェノールF型エポキシ化合物);水素化ビフェノール型エポキシ化合物;水素化フェノールノボラック型エポキシ化合物;水素化クレゾールノボラック型エポキシ化合物;ビスフェノールAの水素化クレゾールノボラック型エポキシ化合物;水素化ナフタレン型エポキシ化合物;トリスフェノールメタンから得られるエポキシ化合物の水素化エポキシ化合物;下記芳香族エポキシ化合物の水素化エポキシ化合物等が挙げられる。 Examples of the compound having an alicyclic and glycidyl ether group in the (3) molecule described above include glycidyl ethers of alicyclic alcohols (particularly, alicyclic polyhydric alcohols). More specifically, for example, 2,2-bis [4- (2,3-epoxypropoxy) cyclohexyl] propane, 2,2-bis [3,5-dimethyl-4- (2,3-epoxypropoxy)] Compound (hydrogenated bisphenol A epoxy compound) obtained by hydrogenating a bisphenol A epoxy compound such as cyclohexyl] propane; bis [o, o- (2,3-epoxypropoxy) cyclohexyl] methane, bis [o , P- (2,3-epoxypropoxy) cyclohexyl] methane, bis [p, p- (2,3-epoxypropoxy) cyclohexyl] methane, bis [3,5-dimethyl-4- (2, 2, Compound obtained by hydrogenating a bisphenol F-type epoxy compound such as 3-epoxypropoxy) cyclohexyl] methane (hydrogenated bisphenol F-type epoxy compound Hydrogenated biphenol type epoxy compound; hydrogenated phenol novolac type epoxy compound; hydrogenated cresol novolac type epoxy compound; hydrogenated cresol novolac type epoxy compound of bisphenol A; hydrogenated naphthalene type epoxy compound; epoxy compound obtained from trisphenolmethane Hydrogenated epoxy compounds; hydrogenated epoxy compounds of the following aromatic epoxy compounds, and the like.
上記芳香族エポキシ化合物としては、例えば、ビスフェノール類[例えば、ビスフェノールA、ビスフェノールF、ビスフェノールS、フルオレンビスフェノール等]と、エピハロヒドリンとの縮合反応により得られるエピビスタイプグリシジルエーテル型エポキシ樹脂;これらのエピビスタイプグリシジルエーテル型エポキシ樹脂を上記ビスフェノール類とさらに付加反応させることにより得られる高分子量エピビスタイプグリシジルエーテル型エポキシ樹脂;フェノール類[例えば、フェノール、クレゾール、キシレノール、レゾルシン、カテコール、ビスフェノールA、ビスフェノールF、ビスフェノールS等]とアルデヒド[例えば、ホルムアルデヒド、アセトアルデヒド、ベンズアルデヒド、ヒドロキシベンズアルデヒド、サリチルアルデヒド等]とを縮合反応させて得られる多価アルコール類を、さらにエピハロヒドリンと縮合反応させることにより得られるノボラック・アルキルタイプグリシジルエーテル型エポキシ樹脂;フルオレン環の9位に2つのフェノール骨格が結合し、かつこれらフェノール骨格のヒドロキシ基から水素原子を除いた酸素原子に、それぞれ、直接又はアルキレンオキシ基を介してグリシジル基が結合しているエポキシ化合物等が挙げられる。 As the above-mentioned aromatic epoxy compound, for example, an epi-bis-type glycidyl ether type epoxy resin obtained by condensation reaction of bisphenols [eg bisphenol A, bisphenol F, bisphenol S, fluorene bisphenol etc.] with epihalohydrin; High molecular weight epi-bis-type glycidyl ether type epoxy resin obtained by further addition reaction of bis-type glycidyl ether type epoxy resin with the above-mentioned bisphenol; phenols [eg phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F, bisphenol S, etc.] and aldehydes [eg, formaldehyde, acetaldehyde, benzaldehyde, hydroxybenzaldehyde, salicylic acid Novolak alkyl type glycidyl ether type epoxy resin obtained by further condensation reaction of polyhydric alcohol obtained by condensation reaction with aldehyde etc. with epihalohydrin; two phenol skeletons bonded to position 9 of fluorene ring And the epoxy compound etc. which the glycidyl group has couple | bonded directly or via the alkylene oxy group to the oxygen atom which remove | eliminated the hydrogen atom from the hydroxyl group of these phenol frame | skeleton are mentioned, respectively.
上記脂肪族エポキシ化合物としては、例えば、q価の環状構造を有しないアルコール(qは自然数である)のグリシジルエーテル;一価又は多価カルボン酸[例えば、酢酸、プロピオン酸、酪酸、ステアリン酸、アジピン酸、セバシン酸、マレイン酸、イタコン酸等]のグリシジルエステル;エポキシ化亜麻仁油、エポキシ化大豆油、エポキシ化ひまし油等の二重結合を有する油脂のエポキシ化物;エポキシ化ポリブタジエン等のポリオレフィン(ポリアルカジエンを含む)のエポキシ化物等が挙げられる。なお、上記q価の環状構造を有しないアルコールとしては、例えば、メタノール、エタノール、1−プロピルアルコール、イソプロピルアルコール、1−ブタノール等の一価のアルコール;エチレングリコール、1,2−プロパンジオール、1,3−プロパンジオール、1,4−ブタンジオール、ネオペンチルグリコール、1,6−ヘキサンジオール、ジエチレングリコール、トリエチレングリコール、テトラエチレングリコール、ジプロピレングリコール、ポリエチレングリコール、ポリプロピレングリコール等の二価のアルコール;グリセリン、ジグリセリン、エリスリトール、トリメチロールエタン、トリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトール、ソルビトール等の三価以上の多価アルコール等が挙げられる。また、q価のアルコールは、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール、ポリオレフィンポリオール等であってもよい。 Examples of the aliphatic epoxy compounds include glycidyl ethers of alcohols having no q-valent cyclic structure (q is a natural number); monohydric or polyhydric carboxylic acids [eg, acetic acid, propionic acid, butyric acid, stearic acid, Glycidyl esters of adipic acid, sebacic acid, maleic acid, itaconic acid etc.]; Epoxides of fats and oils with double bonds such as epoxidized linseed oil, epoxidized soybean oil, epoxidized castor oil etc. Polyolefins such as epoxidized polybutadiene Epoxides of alkadiene are included. Examples of the above-mentioned alcohol having no q-valent cyclic structure include monohydric alcohols such as methanol, ethanol, 1-propyl alcohol, isopropyl alcohol and 1-butanol; ethylene glycol, 1,2-propanediol, 1 And a dihydric alcohol such as 3-propanediol, 1,4-butanediol, neopentyl glycol, 1,6-hexanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, polyethylene glycol, polypropylene glycol and the like; And trivalent or higher polyhydric alcohols such as glycerin, diglycerin, erythritol, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol, and sorbitol. That. Also, the q-valent alcohol may be polyether polyol, polyester polyol, polycarbonate polyol, polyolefin polyol or the like.
上記オキセタン化合物としては、分子内に1以上のオキセタン環を有する公知乃至慣用の化合物が挙げられ、特に限定されないが、例えば、3,3−ビス(ビニルオキシメチル)オキセタン、3−エチル−3−(ヒドロキシメチル)オキセタン、3−エチル−3−(2−エチルヘキシルオキシメチル)オキセタン、3−エチル−3−[(フェノキシ)メチル]オキセタン、3−エチル−3−(ヘキシルオキシメチル)オキセタン、3−エチル−3−(クロロメチル)オキセタン、3,3−ビス(クロロメチル)オキセタン、1,4−ビス[(3−エチル−3−オキセタニルメトキシ)メチル]ベンゼン、ビス{[1−エチル(3−オキセタニル)]メチル}エーテル、4,4'−ビス[(3−エチル−3−オキセタニル)メトキシメチル]ビシクロヘキシル、1,4−ビス[(3−エチル−3−オキセタニル)メトキシメチル]シクロヘキサン、1,4−ビス{〔(3−エチル−3−オキセタニル)メトキシ〕メチル}ベンゼン、3−エチル−3−{〔(3−エチルオキセタン−3−イル)メトキシ〕メチル)}オキセタン、キシリレンビスオキセタン、3−エチル−3−{[3−(トリエトキシシリル)プロポキシ]メチル}オキセタン、オキセタニルシルセスキオキサン、フェノールノボラックオキセタン等が挙げられる。 Examples of the oxetane compounds include known and commonly used compounds having one or more oxetane rings in the molecule, and are not particularly limited. For example, 3,3-bis (vinyloxymethyl) oxetane, 3-ethyl-3- (Hydroxymethyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3-[(phenoxy) methyl] oxetane, 3-ethyl-3- (hexyloxymethyl) oxetane, 3-ethyl-3- (hexyloxymethyl) oxetane Ethyl-3- (chloromethyl) oxetane, 3,3-bis (chloromethyl) oxetane, 1,4-bis [(3-ethyl-3-oxetanylmethoxy) methyl] benzene, bis {[1-ethyl (3-) Oxetanyl)] methyl} ether, 4,4'-bis [(3-ethyl-3-oxetanyl) methoxymethyl] bisi Clohexyl, 1,4-bis [(3-ethyl-3-oxetanyl) methoxymethyl] cyclohexane, 1,4-bis {[(3-ethyl-3-oxetanyl) methoxy] methyl} benzene, 3-ethyl-3- {[(3-Ethyl oxetan-3-yl) methoxy] methyl)} oxetane, xylylene bis oxetane, 3-ethyl-3-{[3- (triethoxysilyl) propoxy] methyl} oxetane, oxetanyl silsesquioxane And phenol novolac oxetane.
上記ビニルエーテル化合物としては、分子内に1以上のビニルエーテル基を有する公知乃至慣用の化合物を使用することができ、特に限定されないが、例えば、2−ヒドロキシエチルビニルエーテル(エチレングリコールモノビニルエーテル)、3−ヒドロキシプロピルビニルエーテル、2−ヒドロキシプロピルビニルエーテル、2−ヒドロキシイソプロピルビニルエーテル、4−ヒドロキシブチルビニルエーテル、3−ヒドロキシブチルビニルエーテル、2−ヒドロキシブチルビニルエーテル、3−ヒドロキシイソブチルビニルエーテル、2−ヒドロキシイソブチルビニルエーテル、1−メチル−3−ヒドロキシプロピルビニルエーテル、1−メチル−2−ヒドロキシプロピルビニルエーテル、1−ヒドロキシメチルプロピルビニルエーテル、4−ヒドロキシシクロヘキシルビニルエーテル、1,6−ヘキサンジオールモノビニルエーテル、1,6−ヘキサンジオールジビニルエーテル、1,8−オクタンジオールジビニルエーテル、1,4−シクロヘキサンジメタノールモノビニルエーテル、1,4−シクロヘキサンジメタノールジビニルエーテル、1,3−シクロヘキサンジメタノールモノビニルエーテル、1,3−シクロヘキサンジメタノールジビニルエーテル、1,2−シクロヘキサンジメタノールモノビニルエーテル、1,2−シクロヘキサンジメタノールジビニルエーテル、p−キシレングリコールモノビニルエーテル、p−キシレングリコールジビニルエーテル、m−キシレングリコールモノビニルエーテル、m−キシレングリコールジビニルエーテル、o−キシレングリコールモノビニルエーテル、o−キシレングリコールジビニルエーテル、エチレングリコールジビニルエーテル、ジエチレングリコールモノビニルエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールモノビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールモノビニルエーテル、テトラエチレングリコールジビニルエーテル、ペンタエチレングリコールモノビニルエーテル、ペンタエチレングリコールジビニルエーテル、オリゴエチレングリコールモノビニルエーテル、オリゴエチレングリコールジビニルエーテル、ポリエチレングリコールモノビニルエーテル、ポリエチレングリコールジビニルエーテル、ジプロピレングリコールモノビニルエーテル、ジプロピレングリコールジビニルエーテル、トリプロピレングリコールモノビニルエーテル、トリプロピレングリコールジビニルエーテル、テトラプロピレングリコールモノビニルエーテル、テトラプロピレングリコールジビニルエーテル、ペンタプロピレングリコールモノビニルエーテル、ペンタプロピレングリコールジビニルエーテル、オリゴプロピレングリコールモノビニルエーテル、オリゴプロピレングリコールジビニルエーテル、ポリプロピレングリコールモノビニルエーテル、ポリプロピレングリコールジビニルエーテル、イソソルバイドジビニルエーテル、オキサノルボルネンジビニルエーテル、フェニルビニルエーテル、n−ブチルビニルエーテル、イソブチルビニルエーテル、オクチルビニルエーテル、シクロヘキシルビニルエーテル、ハイドロキノンジビニルエーテル、1,4−ブタンジオールジビニルエーテル、シクロヘキサンジメタノールジビニルエーテル、トリメチロールプロパンジビニルエーテル、トリメチロールプロパントリビニルエーテル、ビスフェノールAジビニルエーテル、ビスフェノールFジビニルエーテル、ヒドロキシオキサノルボルナンメタノールジビニルエーテル、1,4−シクロヘキサンジオールジビニルエーテル、ペンタエリスリトールトリビニルエーテル、ペンタエリスリトールテトラビニルエーテル、ジペンタエリスリトールペンタビニルエーテル、ジペンタエリスリトールヘキサビニルエーテル等が挙げられる。 As the vinyl ether compound, known or commonly used compounds having one or more vinyl ether groups in the molecule can be used, and although not particularly limited, for example, 2-hydroxyethyl vinyl ether (ethylene glycol monovinyl ether), 3-hydroxy Propyl vinyl ether, 2-hydroxypropyl vinyl ether, 2-hydroxy isopropyl vinyl ether, 4-hydroxy butyl vinyl ether, 3-hydroxy butyl vinyl ether, 2-hydroxy butyl vinyl ether, 3-hydroxy isobutyl vinyl ether, 2-hydroxy isobutyl vinyl ether, 1-methyl-3 -Hydroxypropyl vinyl ether, 1-methyl-2-hydroxypropyl vinyl ether, 1-hydroxymethyl propyl vinyl ether 4-hydroxycyclohexyl vinyl ether, 1,6-hexanediol monovinyl ether, 1,6-hexanediol divinyl ether, 1,8-octanediol divinyl ether, 1,4-cyclohexane dimethanol monovinyl ether, 1,4-cyclohexane Methanol divinyl ether, 1,3-cyclohexanedimethanol monovinyl ether, 1,3-cyclohexane dimethanol divinyl ether, 1,2-cyclohexane dimethanol monovinyl ether, 1,2-cyclohexane dimethanol divinyl ether, p-xylene glycol monovinyl ether P-xylene glycol divinyl ether, m-xylene glycol monovinyl ether, m-xylene glycol divinyl ether, o-xylene Glycol monovinyl ether, o-xylene glycol divinyl ether, ethylene glycol divinyl ether, diethylene glycol monovinyl ether, diethylene glycol divinyl ether, triethylene glycol monovinyl ether, triethylene glycol divinyl ether, tetraethylene glycol monovinyl ether, tetraethylene glycol divinyl ether, penta Ethylene glycol monovinyl ether, pentaethylene glycol divinyl ether, oligoethylene glycol monovinyl ether, oligoethylene glycol divinyl ether, polyethylene glycol monovinyl ether, polyethylene glycol divinyl ether, dipropylene glycol monovinyl ether, dipropylene glycol Cole divinyl ether, tripropylene glycol monovinyl ether, tripropylene glycol divinyl ether, tetrapropylene glycol monovinyl ether, tetrapropylene glycol divinyl ether, pentapropylene glycol monovinyl ether, pentapropylene glycol divinyl ether, oligopropylene glycol monovinyl ether, oligopropylene glycol di Vinyl ether, polypropylene glycol monovinyl ether, polypropylene glycol divinyl ether, isosorbide divinyl ether, oxanorbornene divinyl ether, phenyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, octyl vinyl ether, cyclohexyl vinyl ether, Droquinone divinyl ether, 1,4-butanediol divinyl ether, cyclohexane dimethanol divinyl ether, trimethylolpropane divinyl ether, trimethylolpropane trivinyl ether, bisphenol A divinyl ether, bisphenol F divinyl ether, hydroxyoxa norbornane methanol divinyl ether, 4-cyclohexanediol divinyl ether, pentaerythritol trivinyl ether, pentaerythritol tetravinyl ether, dipentaerythritol pentavinyl ether, dipentaerythritol hexavinyl ether and the like.
本発明の硬化性組成物に含まれる硬化性化合物全量(100重量%)における他の硬化性化合物(特に他のエポキシ化合物、とりわけエポキシ変性シロキサン化合物と脂環式エポキシ化合物)の含有量(配合量)は、例えば90〜99.5重量%、好ましくは95〜99.5重量%、特に好ましくは97〜99.5重量%である。他の硬化性化合物を上記範囲で配合することにより所望の性能(例えば、速硬化性や粘度調整等)を付与することができる場合がある。 Content (compounding amount) of other curable compounds (particularly, other epoxy compounds, particularly epoxy modified siloxane compound and alicyclic epoxy compound) in the total amount (100% by weight) of the curable compound contained in the curable composition of the present invention Is, for example, 90 to 99.5% by weight, preferably 95 to 99.5% by weight, particularly preferably 97 to 99.5% by weight. Desired performance (for example, rapid curability, viscosity adjustment, etc.) may be able to be provided by mix | blending another curable compound in the said range.
また、本発明の硬化性組成物に含まれる硬化性化合物全量(100重量%)におけるフッ素含有エポキシ変性シルセスキオキサンと他のエポキシ化合物(特に、エポキシ変性シロキサン化合物と脂環式エポキシ化合物)の合計含有量の占める割合は、例えば70重量%以上、好ましくは80重量%以上、特に好ましくは90重量%以上、とりわけ好ましくは95重量%以上である。尚、上限は100重量%である。 In addition, fluorine-containing epoxy-modified silsesquioxane and the other epoxy compounds (particularly, epoxy-modified siloxane compounds and alicyclic epoxy compounds) in the total amount (100% by weight) of the curable compound contained in the curable composition of the present invention The proportion of the total content is, for example, 70% by weight or more, preferably 80% by weight or more, particularly preferably 90% by weight or more, and particularly preferably 95% by weight or more. The upper limit is 100% by weight.
(カチオン重合開始剤)
本発明の硬化性組成物はカチオン重合開始剤を1種又は2種以上含有することが、速硬化性を発揮して、タックフリーとなるまでの硬化時間を短縮することができる点で好ましい。カチオン重合開始剤には光カチオン重合開始剤と熱カチオン重合開始剤が含まれるが、なかでも光カチオン重合開始剤を含有することが好ましい。
(Cationic polymerization initiator)
It is preferable that the curable composition of the present invention contains one or more cationic polymerization initiators in that it can achieve quick curing and shorten the curing time until tack-free. The cationic polymerization initiator includes a photo cationic polymerization initiator and a thermal cationic polymerization initiator, and among them, it is preferable to contain a photo cationic polymerization initiator.
光カチオン重合開始剤は、光の照射によって酸を発生して、硬化性組成物に含まれるカチオン硬化性化合物の硬化反応を開始させる化合物であり、光を吸収するカチオン部と酸の発生源となるアニオン部からなる。光カチオン重合開始剤は1種を単独で、又は2種以上を組み合わせて使用することができる。 The cationic photopolymerization initiator is a compound that generates an acid upon irradiation with light to initiate a curing reaction of the cationically curable compound contained in the curable composition, and is a cationic part that absorbs light and a source of the acid. Of the anion moiety The cationic photopolymerization initiators can be used alone or in combination of two or more.
光カチオン重合開始剤としては、例えば、ジアゾニウム塩系化合物、ヨードニウム塩系化合物、スルホニウム塩系化合物、ホスホニウム塩系化合物、セレニウム塩系化合物、オキソニウム塩系化合物、アンモニウム塩系化合物、臭素塩系化合物等を挙げることができる。本発明においては、なかでも、ヨードニウム塩系化合物及び/又はスルホニウム塩系化合物を使用することが好ましい。 Examples of the cationic photopolymerization initiator include diazonium salt compounds, iodonium salt compounds, sulfonium salt compounds, phosphonium salt compounds, selenium salt compounds, oxonium salt compounds, ammonium salt compounds, bromine salt compounds, etc. Can be mentioned. In the present invention, among them, it is preferable to use an iodonium salt compound and / or a sulfonium salt compound.
ヨードニウム塩系化合物のカチオン部としては、例えば、ビス[4−n−アルキル(C10-13)フェニル]ヨードニウムイオン等を挙げることができる。 As a cation part of an iodonium salt type compound, the bis [4-n-alkyl ( C10-13 ) phenyl] iodonium ion etc. can be mentioned, for example.
スルホニウム塩系化合物のカチオン部としては、例えば、(4−ヒドロキシフェニル)メチルベンジルスルホニウムイオン、トリフェニルスルホニウムイオン、ジフェニル[4−(フェニルチオ)フェニル]スルホニウムイオン、4−(4−ビフェニリルチオ)フェニル−4−ビフェニリルフェニルスルホニウムイオン、トリ−p−トリルスルホニウムイオン等のアリールスルホニウムイオン(特に、トリアリールスルホニウムイオン)を挙げることができる。 Examples of the cation part of the sulfonium salt compound include (4-hydroxyphenyl) methylbenzylsulfonium ion, triphenylsulfonium ion, diphenyl [4- (phenylthio) phenyl] sulfonium ion, 4- (4-biphenylylthio) phenyl Examples include arylsulfonium ions such as -4-biphenylylphenylsulfonium ion and tri-p-tolylsulfonium ion (particularly, triarylsulfonium ion).
光カチオン重合開始剤のアニオン部としては、例えば、[(Z)sB(Phf)4-s]-(式中、Zはフェニル基又はビフェニリル基を示す。Phfは水素原子の少なくとも1つが、パーフルオロアルキル基、パーフルオロアルコキシ基、及びハロゲン原子から選択される少なくとも1種で置換されたフェニル基を示す。sは0〜3の整数である)、BF4 -、[(Rf)tPF6-t]-(Rf:水素原子の80%以上がフッ素原子で置換されたアルキル基、t:0〜5の整数)、AsF6 -、SbF6 -、SbF5OH-等を挙げることができる。 The anionic portion of the cationic photopolymerization initiator, for example, [(Z) s B ( Phf) 4-s] - ( wherein, Z is .Phf illustrating a phenyl group or a biphenylyl group is at least one hydrogen atom, Represents a phenyl group substituted with at least one selected from a perfluoroalkyl group, a perfluoroalkoxy group, and a halogen atom, s is an integer of 0 to 3), BF 4 − , [(R f) t PF 6-t] - (Rf: alkyl group in which at least 80% are substituted with fluorine atoms of the hydrogen atom, t: 0 to 5 integer), AsF 6 -, SbF 6 - and the like, etc. -, SbF 5 OH it can.
光カチオン重合開始剤としては、例えば、ビス[4−n−アルキル(C10-13)フェニル]ヨードニウム テトラキス(ペンタフルオロフェニル)ボレート、(4−ヒドロキシフェニル)メチルベンジルスルホニウム テトラキス(ペンタフルオロフェニル)ボレート、4−(4−ビフェニリルチオ)フェニル−4−ビフェニリルフェニルスルホニウム テトラキス(ペンタフルオロフェニル)ボレート、4−(フェニルチオ)フェニルジフェニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、[4−(4−ビフェニリルチオ)フェニル]−4−ビフェニリルフェニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、ジフェニル[4−(フェニルチオ)フェニルスルホニウム] ヘキサフルオロアンチモネート、ジフェニル[4−(フェニルチオ)フェニル]スルホニウム トリス(ペンタフルオロエチル)トリフルオロホスフェート、ジフェニル[4−(フェニルチオ)フェニル]スルホニウム テトラキス(ペンタフルオロフェニル)ボレート、ジフェニル[4−(フェニルチオ)フェニル]スルホニウム ヘキサフルオロホスフェート、4−(4−ビフェニリルチオ)フェニル−4−ビフェニリルフェニルスルホニウム トリス(ペンタフルオロエチル)トリフルオロホスフェート、ビス[4−(ジフェニルスルホニオ)フェニル]スルフィド フェニルトリス(ペンタフルオロフェニル)ボレート、[4−(2−チオキサントニルチオ)フェニル]フェニル−2−チオキサントニルスルホニウム フェニルトリス(ペンタフルオロフェニル)ボレート、商品名「サイラキュアUVI−6970」、「サイラキュアUVI−6974」、「サイラキュアUVI−6990」、「サイラキュアUVI−950」(以上、米国ユニオンカーバイド社製)、「Irgacure250」、「Irgacure261」、「Irgacure264」(以上、BASF社製)、「CG−24−61」(チバガイギー社製)、「オプトマーSP−150」、「オプトマーSP−151」、「オプトマーSP−170」、「オプトマーSP−171」(以上、(株)ADEKA製)、「DAICAT II」((株)ダイセル製)、「UVAC1590」、「UVAC1591」(以上、ダイセル・サイテック(株)製)、「CI−2064」、「CI−2639」、「CI−2624」、「CI−2481」、「CI−2734」、「CI−2855」、「CI−2823」、「CI−2758」、「CIT−1682」(以上、日本曹達(株)製)、「PI−2074」(ローディア社製、テトラキス(ペンタフルオロフェニル)ボレート トリルクミルヨードニウム塩)、「FFC509」(3M社製)、「BBI−102」、「BBI−101」、「BBI−103」、「MPI−103」、「TPS−103」、「MDS−103」、「DTS−103」、「NAT−103」、「NDS−103」(以上、ミドリ化学(株)製)、「CD−1010」、「CD−1011」、「CD−1012」(以上、米国、Sartomer社製)、「CPI−100P」、「CPI−101A」(以上、サンアプロ(株)製)等の市販品を使用できる。 As a photocationic polymerization initiator, For example, bis [4-n-alkyl (C 10-13 ) phenyl] iodonium tetrakis (pentafluorophenyl) borate, (4-hydroxyphenyl) methyl benzyl sulfonium tetrakis (pentafluorophenyl) borate 4- (4-biphenylylthio) phenyl-4-biphenylylphenylsulfonium tetrakis (pentafluorophenyl) borate, 4- (phenylthio) phenyldiphenylsulfonium phenyltris (pentafluorophenyl) borate, [4- (4-biphenyl] Rylthio) phenyl] -4-biphenylylphenylsulfonium phenyltris (pentafluorophenyl) borate, diphenyl [4- (phenylthio) phenylsulfonium] hexafluoroantimone Diphenyl [4- (phenylthio) phenyl] sulfonium tris (pentafluoroethyl) trifluorophosphate, diphenyl [4- (phenylthio) phenyl] sulfonium tetrakis (pentafluorophenyl) borate, diphenyl [4- (phenylthio) phenyl] sulfonium hexame Fluorophosphate, 4- (4-biphenylylthio) phenyl-4-biphenylylphenylsulfonium tris (pentafluoroethyl) trifluorophosphate, bis [4- (diphenylsulfonio) phenyl] sulfide phenyltris (pentafluorophenyl) borate , [4- (2-thioxanthonylthio) phenyl] phenyl-2-thioxanthonyl sulfonium phenyltris (pentafluorophenyl) vole , Trade names “Cyracure UVI-6970”, “Cyracure UVI-6974”, “Cyracure UVI-6990”, “Cyracure UVI-950” (all manufactured by Union Carbide Corporation), “Irgacure 250”, “Irgacure 261”, “Irgacure264” (Above, BASF Corporation), "CG-24-61" (Ciba Geigy Corporation), "Optomer SP-150", "Optomer SP-151", "Optomer SP-170", "Optomer SP-171" ( As described above, manufactured by ADEKA Co., Ltd., “DAICAT II” (manufactured by Daicel Co., Ltd.), “UVAC 1590”, “UVAC 1591” (manufactured by Daicel Cytech Co., Ltd.), “CI-2064”, “CI-2639 "," CI-2624 "," CI-2481 " “CI-2734”, “CI-2855”, “CI-2823”, “CI-2758”, “CIT-1682” (all manufactured by Nippon Soda Co., Ltd.), “PI-2074” (manufactured by Rhodia, Inc.) Tetrakis (pentafluorophenyl) borate tolkyumil iodonium salt), "FFC 509" (manufactured by 3M company), "BBI-102", "BBI-101", "BBI-103", "MPI-103", "TPS -103 "," MDS-103 "," DTS-103 "," NAT-103 "," NDS-103 "(above, Midori Chemical Co., Ltd. product)," CD-1010 "," CD-1011 ", Commercial products such as “CD-1012” (above, Sartomer, USA), “CPI-100P”, and “CPI-101A” (above, San-Apro Ltd.) can be used. .
上記カチオン重合開始剤の含有量は、特に限定されないが、硬化性組成物に含まれるカチオン硬化性化合物100重量部に対して、0.01〜3.0重量部が好ましく、より好ましくは0.05〜3.0重量部、さらに好ましくは0.1〜1.0重量部、特に好ましくは0.3〜0.8重量部である。カチオン重合開始剤の含有量を0.01重量部以上とすることにより、硬化反応を効率的に、且つ十分に進行させることができ、耐擦傷性に優れた硬化物を得ることができる。一方、カチオン重合開始剤の含有量を3.0重量部以下とすることにより、硬化性組成物の保存安定性を向上することができ、硬化物の着色を抑制することができる。 The content of the cationic polymerization initiator is not particularly limited, but is preferably 0.01 to 3.0 parts by weight, and more preferably 0.2 parts by weight with respect to 100 parts by weight of the cationic curable compound contained in the curable composition. It is preferably 0.5 to 3.0 parts by weight, more preferably 0.1 to 1.0 parts by weight, and particularly preferably 0.3 to 0.8 parts by weight. By setting the content of the cationic polymerization initiator to 0.01 parts by weight or more, the curing reaction can be efficiently and sufficiently progressed, and a cured product having excellent scratch resistance can be obtained. On the other hand, when the content of the cationic polymerization initiator is 3.0 parts by weight or less, the storage stability of the curable composition can be improved, and the coloring of the cured product can be suppressed.
(レベリング剤)
本発明の硬化性組成物は、更にレベリング剤を含有することが、得られる硬化物に表面平滑性、及び密着性を付与することができ、耐擦傷性を一層向上する効果が得られる点で好ましい。レベリング剤としては、シリコーン系レベリング剤、フッ素系レベリング剤等を挙げることができる。これらは1種を単独で、又は2種以上を組み合わせて使用することができる。本発明においては、なかでも、特に優れた表面平滑性を付与することができる点で、フッ素系レベリング剤が好ましい。
(Leveling agent)
In the curable composition of the present invention, the inclusion of a leveling agent can impart surface smoothness and adhesion to the obtained cured product, and the effect of further improving the scratch resistance can be obtained. preferable. As a leveling agent, a silicone type leveling agent, a fluorine type leveling agent, etc. can be mentioned. These can be used singly or in combination of two or more. In the present invention, among these, a fluorine-based leveling agent is preferable in that it can impart particularly excellent surface smoothness.
上記フッ素系レベリング剤には、パーフルオロアルキル基を有する化合物、及びポリ(パーフルオロアルキレンエーテル)鎖を有する化合物が含まれる。 The fluorine-based leveling agent includes a compound having a perfluoroalkyl group and a compound having a poly (perfluoroalkylene ether) chain.
前記パーフルオロアルキル基を有する化合物におけるパーフルオロアルキル基としては、例えば、トリフルオロメチル、ペンタフルオロエチル、ヘキサフルオロプロピル、ヘプタフルオロイソプロピル等のパーフルオロC1-10アルキル基等を挙げることができる。 Examples of the perfluoroalkyl group in the compound having a perfluoroalkyl group include perfluoroC 1-10 alkyl groups such as trifluoromethyl, pentafluoroethyl, hexafluoropropyl, heptafluoroisopropyl and the like.
前記ポリ(パーフルオロアルキレンエーテル)鎖を有する化合物におけるポリ(パーフルオロアルキレンエーテル)鎖は、例えば、下記式(c)で表され、式中のY’は例えばC1-10パーフルオロアルキレン基であり、具体的には下記式(1)〜(5)で表される基を挙げることができる。
上記式(c)中の複数のY’はそれぞれ同一であっても、異なっていてもよい。また、式(c)中のt’はパーフルオロアルキレンエーテル単位の繰り返しの数(重合度)であり、例えば10〜3000、好ましくは30〜1000、より好ましくは50〜500である。 The plurality of Y's in the formula (c) may be identical to or different from each other. Moreover, t 'in Formula (c) is a number (polymerization degree) of repetition of a perfluoro alkylene ether unit, for example, 10-3000, preferably 30-1000, more preferably 50-500.
フッ素系レベリング剤は、パーフルオロアルキル基、又はポリ(パーフルオロアルキレンエーテル)鎖以外にも、例えば、親水性基、親油性基、エポキシ基に対する反応性基、ラジカル重合性基等を有していてもよい。 The fluorine-based leveling agent has, for example, a hydrophilic group, a lipophilic group, a reactive group for an epoxy group, a radically polymerizable group, etc., in addition to the perfluoroalkyl group or the poly (perfluoroalkylene ether) chain. May be
前記親水性基としては、例えば、スルホン酸基、硫酸エステル基、リン酸エステル基、ポリエチレンオキシド鎖、水酸基等を挙げることができる。 Examples of the hydrophilic group include a sulfonic acid group, a sulfuric acid ester group, a phosphoric acid ester group, a polyethylene oxide chain, and a hydroxyl group.
前記親油性基としては、例えば、炭化水素基、エーテル基、エステル基等を挙げることができる。 As said lipophilic group, a hydrocarbon group, an ether group, ester group etc. can be mentioned, for example.
前記エポキシ基に対する反応性基としては、例えば、ヒドロキシル基、アミノ基、カルボキシル基、酸無水物基(無水マレイン酸基等)、イソシアネート基等を挙げることができる。 Examples of the reactive group for the epoxy group include a hydroxyl group, an amino group, a carboxyl group, an acid anhydride group (maleic anhydride group etc.), an isocyanate group and the like.
上記ラジカル重合性基としては、例えば、(メタ)アクリロイルオキシ基、ビニル基等を挙げることができる。 As said radically polymerizable group, a (meth) acryloyloxy group, a vinyl group etc. can be mentioned, for example.
上記フッ素系レベリング剤としては、例えば、商品名「オプツールDSX」、「オプツールDAC−HP」(以上、ダイキン工業(株)製);商品名「サーフロンS−242」、「サーフロンS−243」、「サーフロンS−420」、「サーフロンS−611」、「サーフロンS−651」、「サーフロンS−386」(以上、AGCセイミケミカル(株)製);商品名「BYK−340」(ビックケミー・ジャパン(株)製);商品名「AC 110a」、「AC 100a」(以上、Algin Chemie製);商品名「メガファックF−114」、「メガファックF−410」、「メガファックF−444」、「メガファックEXP TP−2066」、「メガファックF−430」、「メガファックF−472SF」、「メガファックF−477」、「メガファックF−552」、「メガファックF−553」、「メガファックF−554」、「メガファックF−555」、「メガファックR−94」、「メガファックRS−72−K」、「メガファックRS−75」、「メガファックRS−90」、「メガファックF−556」、「メガファックEXP TF−1367」、「メガファックEXP TF−1437」、「メガファックF−558」、「メガファックEXP TF−1537」(以上、DIC(株)製);商品名「FC−4430」、「FC−4432」(以上、住友スリーエム(株)製);商品名「フタージェント 100」、「フタージェント 100C」、「フタージェント 110」、「フタージェント 150」、「フタージェント 150CH」、「フタージェント A−K」、「フタージェント 501」、「フタージェント 250」、「フタージェント 251」、「フタージェント 222F」、「フタージェント 208G」、「フタージェント 300」、「フタージェント 310」、「フタージェント 400SW」(以上、(株)ネオス製);商品名「PF−136A」、「PF−156A」、「PF−151N」、「PF−636」、「PF−6320」、「PF−656」、「PF−6520」、「PF−651」、「PF−652」、「PF−3320」(以上、北村化学産業(株)製)等の市販品を使用することができる。 As the fluorine-based leveling agent, for example, trade names “Optool DSX”, “Optool DAC-HP” (all manufactured by Daikin Industries, Ltd.); trade names “Surflon S-242”, “Surflon S-243”, "Surflon S-420", "Surflon S-611", "Surflon S-651", "Surflon S-386" (above, AGC Seimi Chemical Co., Ltd. product); Brand name "BYK-340" (Bick Chemie Japan) (Product name) "AC 110a", "AC 100a" (all, Algin Chemie product); trade name "Megafuck F-114", "Megafuck F-410", "Megafuck F-444" "Megafuck EXP TP-2066", "Megafuck F-430", "Megafuck F-472SF", "MegaFat "F-477", "Megafuck F-552", "Megafuck F-553", "Megafuck F-554", "Megafuck F-555", "Megafuck R-94", "Megafuck RS" -72-K "," Megafuck RS-75 "," Megafuck RS-90 "," Megafuck F-556 "," Megafuck EXP TF-1367 "," Megafuck EXP TF-1437 "," Megafuck Fuck F-558 "," Megafuck EXP TF-1537 "(all, DIC Corporation); trade name" FC-4430 "," FC-4432 "(Sumitomo 3M Corp.); trade name "Futagent 100", "Futagent 100C", "Futagent 110", "Futagent 150", "Futagent 150CH", "Futagent 150" Agent AK, "Futagent 501," "Futagent 250," "Futagent 251," "Futagent 222F," "Futagent 208G," "Futagent 300," "Futagent 310", "Futagent Genent 400 SW "(all manufactured by Neos Co., Ltd.); trade names" PF-136A "," PF-156A "," PF-151N "," PF-636 "," PF-6320 "," PF-656 " Commercial products, such as "PF-6520", "PF-651", "PF-652", and "PF-3320" (above, Kitamura Chemical Industrial Co., Ltd. product) can be used.
レベリング剤の使用量(2種以上使用する場合はその総量)は、カチオン硬化性化合物100重量部に対して、例えば0.1〜2.0重量部である。レベリング剤を上記範囲で使用すると、得られる硬化物の耐擦傷性を向上することができる。一方、レベリング剤の使用量が過剰であると、硬化物の表面硬度が低下する傾向がある。 The amount of the leveling agent used (the total amount of two or more types used) is, for example, 0.1 to 2.0 parts by weight with respect to 100 parts by weight of the cationically curable compound. When the leveling agent is used in the above range, the scratch resistance of the resulting cured product can be improved. On the other hand, when the amount of the leveling agent used is excessive, the surface hardness of the cured product tends to decrease.
(溶媒)
本発明の硬化性組成物は、更に、溶媒を含有していてもよい。溶媒としては、例えば、水、有機溶媒等が挙げられ、本発明のフッ素含有エポキシ変性シルセスキオキサン、及び必要に応じて使用される添加物を溶解することができ、且つ重合を阻害しないものであれば特に制限されることはない。
(solvent)
The curable composition of the present invention may further contain a solvent. Examples of the solvent include water, organic solvents and the like, which can dissolve the fluorine-containing epoxy-modified silsesquioxane of the present invention, and the additives used as needed, and do not inhibit the polymerization There is no particular limitation as long as
溶媒は、スピンコートによって塗布するのに適した流動性を付与することができ、且つ重合の進行を抑制可能な温度において加熱することにより容易に除去できる溶媒を使用することが好ましく、沸点(1気圧における)が170℃以下の溶媒(例えば、トルエン、酢酸ブチル、メチルイソブチルケトン(MIBK)、キシレン、メシチレン、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、シクロヘキサノン等)を1種又は2種以上使用することが好ましい。 It is preferable to use a solvent which can impart fluidity suitable for application by spin coating and can be easily removed by heating at a temperature at which the progress of polymerization can be suppressed, and the boiling point (1 One or more solvents (for example, toluene, butyl acetate, methyl isobutyl ketone (MIBK), xylene, mesitylene, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, etc.) at 170 ° C. or less at atmospheric pressure are used It is preferable to do.
溶媒は、硬化性組成物に含まれる不揮発分の濃度が例えば30〜80重量%程度、好ましくは40〜70重量%、特に好ましくは50〜60重量%となる範囲で使用することが、良好な塗布性を付与することができる点で好ましい。溶媒の使用量が過剰であると、硬化性組成物の粘度が低くなり適度な膜厚(例えば、0.5〜30μm程度)の層を形成することが困難となる傾向がある。一方、溶媒の使用量が少なすぎると、硬化性組成物の粘度が高くなりすぎ、支持体若しくは被着体に均一に塗布することが困難となる場合がある。 It is preferable to use the solvent in the range where the concentration of non-volatile components contained in the curable composition is, for example, about 30 to 80% by weight, preferably 40 to 70% by weight, particularly preferably 50 to 60% by weight. It is preferable at the point which can provide coating property. If the amount of the solvent used is excessive, the viscosity of the curable composition tends to be low, and it tends to be difficult to form a layer having an appropriate film thickness (for example, about 0.5 to 30 μm). On the other hand, when the amount of the solvent used is too small, the viscosity of the curable composition may be too high, and it may be difficult to uniformly apply the composition to a support or an adherend.
本発明の硬化性組成物は、更にまた、任意成分として、無機質充填剤(沈降シリカ、湿式シリカ、ヒュームドシリカ、焼成シリカ、酸化チタン、アルミナ、ガラス、石英、アルミノケイ酸、酸化鉄、酸化亜鉛、炭酸カルシウム、カーボンブラック、炭化ケイ素、窒化ケイ素、窒化ホウ素等)や、これらの無機質充填剤をオルガノハロシラン、オルガノアルコキシシラン、オルガノシラザン等の有機ケイ素化合物により表面処理したもの、有機樹脂微粉末(シリコーン樹脂、エポキシ樹脂、フッ素樹脂等の微粉末)、導電性金属粉末(銀、銅等の粉末)、硬化剤(アミン系硬化剤、ポリアミノアミド系硬化剤、酸無水物系硬化剤、フェノール系硬化剤等)、硬化助剤、硬化促進剤(イミダゾール類、アルカリ金属又はアルカリ土類金属アルコキシド、ホスフィン類、アミド化合物、ルイス酸錯体化合物、硫黄化合物、ホウ素化合物、縮合性有機金属化合物等)、安定化剤(酸化防止剤、紫外線吸収剤、耐光安定剤、熱安定化剤、重金属不活性化剤等)、難燃剤(リン系難燃剤、ハロゲン系難燃剤、無機系難燃剤等)、難燃助剤、補強材(他の充填剤等)、核剤、カップリング剤、滑剤、ワックス、可塑剤、離型剤、耐衝撃改良剤、色相改良剤、透明化剤、レオロジー調整剤(流動性改良剤等)、加工性改良剤、着色剤(染料、顔料等)、帯電防止剤、分散剤、表面改質剤(スリップ剤等)、艶消し剤、消泡剤、抑泡剤、脱泡剤、抗菌剤、防腐剤、粘度調整剤、増粘剤、光増感剤、発泡剤等を1種又は2種以上含んでいてもよい。上記任意成分の含有量(2種以上含有する場合はその総量)は、本発明の硬化性組成物全量の、例えば10重量%以下、好ましくは5重量%以下、特に好ましくは1重量%以下である。 The curable composition of the present invention further comprises, as an optional component, an inorganic filler (precipitated silica, wet silica, fumed silica, calcined silica, titanium oxide, alumina, glass, quartz, aluminosilicate, iron oxide, zinc oxide , Calcium carbonate, carbon black, silicon carbide, silicon nitride, boron nitride, etc.) or those obtained by surface treating these inorganic fillers with organosilicon compounds such as organohalosilanes, organoalkoxysilanes, organosilazanes, etc., fine powders of organic resins (Fine powder of silicone resin, epoxy resin, fluoro resin etc.) Conductive metal powder (powder of silver, copper etc.), curing agent (amine curing agent, polyaminoamide curing agent, acid anhydride curing agent, phenol Curing agents etc.), curing assistants, curing accelerators (imidazoles, alkali metals or alkaline earth metal alkoxides , Phosphines, amide compounds, Lewis acid complex compounds, sulfur compounds, boron compounds, condensable organic metal compounds, etc., stabilizers (antioxidants, ultraviolet absorbers, light stabilizers, heat stabilizers, heavy metal free) Activators, etc.), flame retardants (phosphorus flame retardants, halogen flame retardants, inorganic flame retardants, etc.), flame retardant aids, reinforcements (other fillers etc.), nucleating agents, coupling agents, lubricants, Waxes, plasticizers, mold release agents, impact modifiers, hue modifiers, clarifying agents, rheology modifiers (such as flow improvers), processability modifiers, colorants (such as dyes and pigments), antistatic agents , Dispersants, surface modifiers (slip agents etc.), matting agents, antifoaming agents, foam inhibitors, defoamers, antibacterial agents, preservatives, viscosity modifiers, thickeners, photosensitizers, foaming One or more agents may be contained. The content (the total amount of two or more components) of the above optional components is, for example, 10% by weight or less, preferably 5% by weight or less, particularly preferably 1% by weight or less of the total amount of the curable composition of the present invention is there.
本発明の硬化性組成物は、上記の各成分を室温で又は必要に応じて加熱しながら撹拌・混合することにより調製することができる。 The curable composition of the present invention can be prepared by stirring and mixing the above-mentioned components at room temperature or while heating as required.
本発明の硬化性組成物は、特に限定されないが、常温(約25℃)で液体であることが好ましい。本発明の硬化性組成物の粘度は、スピンコートにて塗布を行う際の膜厚に応じて調整することが好ましく、例えば、0.1〜50μmの膜厚で塗布する場合、1〜5000mPa・sとすることが好ましい。本発明の硬化性組成物の粘度が上記範囲内である場合、例えば、基材等の表面に均一な膜厚を有する塗膜を形成することが容易となる。なお、本発明の硬化性組成物の粘度は、粘度計(商品名「MCR301」、アントンパール社製)を用いて、振り角5%、周波数0.1〜100(1/s)、温度:25℃の条件で測定される。 The curable composition of the present invention is not particularly limited, but is preferably liquid at normal temperature (about 25 ° C.). The viscosity of the curable composition of the present invention is preferably adjusted according to the film thickness at the time of coating by spin coating, for example, 1 to 5000 mPa · s when coated at a film thickness of 0.1 to 50 μm. It is preferable to set it as s. When the viscosity of the curable composition of the present invention is within the above range, for example, it becomes easy to form a coating film having a uniform film thickness on the surface of a substrate or the like. The viscosity of the curable composition of the present invention was measured using a viscometer (trade name "MCR301", manufactured by Anton Paar Co., Ltd.), with a swing angle of 5%, a frequency of 0.1 to 100 (1 / s), and a temperature: Measured under conditions of 25 ° C.
[硬化物]
本発明の硬化性組成物に含まれるカチオン硬化性化合物の重合反応を進行させることにより、該硬化性組成物を硬化させることができ、硬化物(「本発明の硬化物」と称する場合がある)を得ることができる。硬化の方法は、周知の方法より適宜選択でき、特に限定されないが、活性エネルギー線を照射する方法が好ましい。上記活性エネルギー線としては、例えば、赤外線、可視光線、紫外線、X線、電子線、α線、β線、γ線等のいずれを使用することもできる。中でも、取り扱い性に優れる点で、紫外線が好ましい。
[Cured product]
By advancing the polymerization reaction of the cationic curable compound contained in the curable composition of the present invention, the curable composition can be cured, and a cured product ("the cured product of the present invention" may be referred to) ) Can be obtained. The method of curing can be appropriately selected from known methods, and is not particularly limited, but a method of irradiating active energy rays is preferable. As the active energy ray, any of infrared ray, visible light, ultraviolet ray, X-ray, electron beam, α-ray, β-ray, γ-ray and the like can be used, for example. Among them, ultraviolet light is preferable in terms of excellent handleability.
本発明の硬化性組成物を活性エネルギー線の照射により硬化させる際の条件(活性エネルギー線の照射条件等)は、照射する活性エネルギー線の種類やエネルギー、硬化物の形状やサイズ等に応じて適宜調整することができ、特に限定されないが、紫外線を照射する場合には、例えば1〜1000mJ/cm2程度とすることが好ましい。なお、活性エネルギー線の照射には、例えば、高圧水銀ランプ、超高圧水銀ランプ、キセノンランプ、カーボンアーク、メタルハライドランプ、太陽光、LEDランプ、レーザー等を使用することができる。活性エネルギー線の照射後には、さらに加熱処理(アニール、エージング)を施してさらに硬化反応を進行させることができる。 The conditions for curing the curable composition of the present invention by irradiation with active energy rays (such as irradiation conditions with active energy rays) depend on the type and energy of the active energy ray to be irradiated, the shape and size of the cured product, etc. Although it can adjust suitably and it does not specifically limit, When irradiating an ultraviolet-ray, it is preferable to set it as about 1-1000 mJ / cm < 2 >, for example. For irradiation with active energy rays, for example, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a carbon arc, a metal halide lamp, sunlight, an LED lamp, a laser or the like can be used. After irradiation with active energy rays, heat treatment (annealing, aging) can be further performed to further promote the curing reaction.
本発明の硬化物は耐擦傷性に優れる。このため、本発明の硬化性組成物はハードコート剤として好適に使用することができる。 The cured product of the present invention is excellent in abrasion resistance. Therefore, the curable composition of the present invention can be suitably used as a hard coating agent.
[ハードコートフィルム]
本発明のハードコートフィルムは、上記硬化性組成物の硬化膜(すなわち、上記硬化性組成物の硬化物から成る膜)を備えることを特徴とする。本発明のハードコートフィルムは、基材の少なくとも一方の面に上記硬化性組成物の硬化膜が積層された構成を有することが好ましい。従って、本発明のハードコートフィルムは基材層と上記硬化性組成物の硬化膜からなるハードコート層とを備えることが好ましい。本発明のハードコートフィルムは、基材層及びハードコート層を、それぞれ1層のみ有するものであってもよいし、2層以上有するものであってもよい。また、本発明のハードコートフィルムは、前記基材層とハードコート層以外の層(例えば、下塗り層、接着剤層、中間層等)も備えていてもよい。
[Hard coat film]
The hard coat film of the present invention is characterized by comprising a cured film of the above-mentioned curable composition (that is, a film composed of a cured product of the above-mentioned curable composition). The hard coat film of the present invention preferably has a configuration in which a cured film of the curable composition is laminated on at least one surface of a substrate. Accordingly, the hard coat film of the present invention preferably comprises a base layer and a hard coat layer comprising a cured film of the above-mentioned curable composition. The hard coat film of the present invention may have only one base layer and one hard coat layer, or may have two or more layers. The hard coat film of the present invention may also be provided with layers other than the base layer and the hard coat layer (for example, an undercoat layer, an adhesive layer, an intermediate layer, etc.).
前記基材としては、周知慣用の基材(接着シートに使用される基材)を使用することができ、特に限定されないが、例えば、プラスチック基材、金属基材、セラミックス基材、半導体基材、ガラス基材、紙基材、木基材、表面が塗装表面である基材等が挙げられる。また、上記基材の厚み(2層以上有する場合はその総厚み)は、例えば、1〜1000μmの範囲で適宜選択できる。 A well-known and commonly used substrate (a substrate used for an adhesive sheet) can be used as the substrate, and is not particularly limited. For example, plastic substrates, metal substrates, ceramic substrates, semiconductor substrates , Glass substrates, paper substrates, wood substrates, substrates whose surfaces are coated surfaces, and the like. In addition, the thickness of the substrate (in the case of having two or more layers, the total thickness thereof) can be appropriately selected, for example, in the range of 1 to 1000 μm.
本発明のハードコートフィルムは前記基材の少なくとも一方の面に、上記硬化性組成物を塗布し、必要に応じて乾燥させ、さらに、活性エネルギー線の照射等により硬化性組成物を硬化させることによって製造することができる。塗布の方法は特に限定されず、周知慣用の手段を利用することができる。また、乾燥の手段や条件も特に限定されず、溶媒等の揮発分をできるだけ除去できる条件を設定することができ、周知慣用の手段を用いることができる。 In the hard coat film of the present invention, the curable composition is applied to at least one surface of the substrate, dried if necessary, and the curable composition is further cured by irradiation of active energy rays or the like. It can be manufactured by The method of application is not particularly limited, and known means may be used. Further, the means and conditions for drying are not particularly limited, and conditions capable of removing volatile matter such as solvent can be set as much as possible, and well-known and commonly used means can be used.
本発明のハードコートフィルムにおける硬化膜(すなわち、ハードコート層)の厚みは、例えば1〜100μm程度であり、下限は、好ましくは3μm、特に好ましくは5μm、最も好ましくは8μm、とりわけ好ましくは10μmである。また、上限は、好ましくは70μm、特に好ましくは50μm、最も好ましくは30μmである。 The thickness of the cured film (that is, the hard coat layer) in the hard coat film of the present invention is, for example, about 1 to 100 μm, and the lower limit is preferably 3 μm, particularly preferably 5 μm, most preferably 8 μm, particularly preferably 10 μm. is there. The upper limit is preferably 70 μm, particularly preferably 50 μm, and most preferably 30 μm.
本発明のハードコートフィルム全体の厚みは、例えば10〜400μm程度であり、下限は、好ましくは30μm、特に好ましくは50μm、最も好ましくは100μm、とりわけ好ましくは150μmである。また、上限は、好ましくは300μm、特に好ましくは250μm、とりわけ好ましくは200μmである。 The total thickness of the hard coat film of the present invention is, for example, about 10 to 400 μm, and the lower limit is preferably 30 μm, particularly preferably 50 μm, most preferably 100 μm, and particularly preferably 150 μm. Also, the upper limit is preferably 300 μm, particularly preferably 250 μm, particularly preferably 200 μm.
本発明のハードコートフィルムは上記硬化性組成物の硬化膜をハードコート層として備えるため耐擦傷性に優れ、スチールウール耐久性試験(1000回)によるヘーズの変化度(ΔHz)は例えば0.1%以下、特に好ましくは0.05%以下、スチールウール耐久性試験(2000回)によるヘーズの変化度(ΔHz)は例えば0.5%以下である。 The hard coat film of the present invention is excellent in scratch resistance because it comprises the cured film of the curable composition as a hard coat layer, and the degree of change in haze (ΔHz) according to the steel wool durability test (1000 times) is, for example, 0.1. % Or less, particularly preferably 0.05% or less, and the degree of change in haze (ΔHz) according to the steel wool durability test (2000 times) is, for example, 0.5% or less.
また、本発明のハードコートフィルムのハードコート層は上記硬化性組成物の硬化膜であるため透明性に優れ、ハードコート層積層によるヘーズの変化度(ΔHz)は例えば1.0%以下、好ましくは0.7%以下、特に好ましくは0.5%以下、最も好ましくは0.3%以下である。 In addition, the hard coat layer of the hard coat film of the present invention is a cured film of the above curable composition, and therefore it is excellent in transparency. Is preferably at most 0.7%, particularly preferably at most 0.5%, most preferably at most 0.3%.
本発明のハードコートフィルムは上記特性を兼ね備えるため、例えば、液晶テレビ、液晶モニター、ノートパソコン、モバイルディスプレイ、タブレットPC、スマートフォン等の各種ディスプレイやタッチパネルの傷付き防止用途に好適に使用することができる。 Since the hard coat film of the present invention has the above-mentioned properties, it can be suitably used for preventing scratches on various displays and touch panels such as liquid crystal televisions, liquid crystal monitors, notebook computers, mobile displays, tablet PCs and smartphones. .
以下に、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらの実施例により限定されるものではない。なお、生成物の分子量の測定は、Alliance HPLCシステム 2695(Waters製)、Refractive Index Detector 2414(Waters製)、カラム:Tskgel GMHHR−M×2(東ソー(株)製)、ガードカラム:Tskgel guard column HHRL(東ソー(株)製)、カラムオーブン:COLUMN HEATER U−620(Sugai製)、溶媒:THF、測定条件:40℃、分子量:標準ポリスチレン換算により行った。また、生成物におけるT2体とT3体のモル比[T3体/T2体]の測定は、JEOL ECA500(500MHz)による29Si−NMRスペクトル測定により行った。 EXAMPLES The present invention will be described in more detail based on examples given below, but the present invention is not limited by these examples. In addition, the measurement of the molecular weight of a product can be performed using Alliance HPLC system 2695 (manufactured by Waters), Refractive Index Detector 2414 (manufactured by Waters), column: Tskgel GMH HR- M × 2 (manufactured by Tosoh Corp.), guard column: Tskgel guard column (manufactured by Tosoh (Ltd.)) H HR L, column oven: cOLUMN HEATER U-620 (manufactured by Sugai), solvent: THF, measuring conditions: 40 ° C., the molecular weight was performed by standard polystyrene. Moreover, the measurement of the molar ratio [T3 body / T2 body] of T2 body and T3 body in a product was performed by 29 Si-NMR spectrum measurement by JEOL ECA500 (500 MHz).
調製例1[エポキシ変性シルセスキオキサンの製造]
温度計、撹拌装置、還流冷却器、及び窒素導入管を取り付けた300mLのフラスコ(反応容器)に、窒素気流下で2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン161.5ミリモル(39.79g)、フェニルトリメトキシシラン9ミリモル(1.69g)、及びアセトン165.9gを仕込み、50℃に昇温した。このようにして得られた混合物に、5%炭酸カリウム水溶液4.70g(炭酸カリウムとして1.7ミリモル)を5分かけて滴下した後、水1700ミリモル(30.60g)を20分かけて滴下した。なお、滴下の間、著しい温度上昇は起こらなかった。その後、50℃のまま、重縮合反応を窒素気流下で4時間行った。
重縮合反応後の反応溶液中の生成物をGPC測定に付したところ、数平均分子量は1911であり、分子量分散度は1.47であった。上記生成物の29Si−NMRスペクトルから算出されるT2体とT3体の割合[T3体/T2体]は10.3であった。
その後、反応溶液を冷却し、下層液が中性になるまで水洗を行い、上層液を分取した後、1mmHg、40℃の条件で上層液から溶媒を留去し、無色透明の液状の生成物(エポキシ変性シルセスキオキサン;ESQ、エポキシ当量:198g/eq)を得た。上記生成物のTd5は370℃であった。
Preparation Example 1 [Production of Epoxy-Modified Silsesquioxane]
In a 300 mL flask (reaction vessel) equipped with a thermometer, a stirrer, a reflux condenser, and a nitrogen inlet tube, 161.5 millimoles (39 of 39) of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane under a nitrogen stream. 79 g), 9 mmol (1.69 g) of phenyltrimethoxysilane, and 165.9 g of acetone were charged, and the temperature was raised to 50.degree. To the mixture thus obtained, 4.70 g of a 5% aqueous solution of potassium carbonate (1.7 mmol as potassium carbonate) was added dropwise over 5 minutes, and then 1700 mmol (30.60 g) of water was added dropwise over 20 minutes did. Note that no significant temperature rise occurred during the dropping. Thereafter, the polycondensation reaction was performed for 4 hours under a nitrogen stream while maintaining the temperature at 50 ° C.
When the product in the reaction solution after the polycondensation reaction was subjected to GPC measurement, the number average molecular weight was 1911, and the molecular weight dispersion degree was 1.47. The ratio of T2 body to T3 body [T3 body / T2 body] calculated from the 29 Si-NMR spectrum of the above product was 10.3.
Thereafter, the reaction solution is cooled, washed with water until the lower layer solution becomes neutral, and the upper layer solution is separated, and then the solvent is distilled off from the upper layer solution under the conditions of 1 mmHg and 40 ° C. to form a colorless and transparent liquid (Epoxy-modified silsesquioxane; ESQ, epoxy equivalent weight: 198 g / eq) was obtained. The T d5 of the above product was 370 ° C.
実施例1[フッ素含有エポキシ変性シルセスキオキサンの製造]
温度計、撹拌装置、還流冷却器、及び窒素導入管を取り付け100mLのフラスコ(反応容器)に、窒素気流下で2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン20.0ミリモル(4.93g)、3,3,3−トリフルオロプロピルトリメトキシシラン20ミリモル(4.37g)、アセトン37.32g、及び水400ミリモル(7.2g)を仕込み、48℃に昇温した。このようにして得られた混合物に、5%炭酸カリウム水溶液1.11g(炭酸カリウムとして0.4ミリモル)を5分かけて滴下した。なお、滴下の間、著しい温度上昇は起こらなかった。その後、48℃のまま、重縮合反応を窒素気流下で5時間行った。
重縮合反応後の反応溶液中の生成物をGPC測定に付したところ、数平均分子量は約1400であり、分子量分散度は1.27であった。上記生成物の29Si−NMRスペクトル(図1)から算出されるT2体とT3体の割合[T3体/T2体]は23.5であった。また、上記生成物の1H−NMR(CDCl3)測定結果を図2に示す。
その後、反応溶液を冷却し、MIBKを加え、下層液が中性になるまで水洗を行い、上層液を分取した後、1mmHg、50℃の条件で上層液から溶媒を留去し、MIBKを約25重量%含有する無色透明の液状の生成物(フッ素含有エポキシ変性シルセスキオキサン;FESQ(1)、エポキシ当量:222g/eq)を約10g得た。
Example 1 [Production of Fluorine-Containing Epoxy-Modified Silsesquioxane]
A thermometer, a stirrer, a reflux condenser, and a nitrogen inlet tube were attached to a 100 mL flask (reaction vessel), and 20.0 mmol of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane under nitrogen stream (4. 93 g), 20 mmol (4.37 g) of 3,3,3-trifluoropropyltrimethoxysilane, 37.32 g of acetone, and 400 mmol (7.2 g) of water were charged, and the temperature was raised to 48 ° C. To the mixture thus obtained, 1.11 g of a 5% aqueous potassium carbonate solution (0.4 mmol as potassium carbonate) was added dropwise over 5 minutes. Note that no significant temperature rise occurred during the dropping. Thereafter, the polycondensation reaction was performed for 5 hours under a nitrogen stream at 48 ° C.
When the product in the reaction solution after the polycondensation reaction was subjected to GPC measurement, the number average molecular weight was about 1400, and the molecular weight dispersion degree was 1.27. The ratio of T2 body to T3 body [T3 body / T2 body] calculated from the 29 Si-NMR spectrum (FIG. 1) of the above product was 23.5. Also shows a 1 H-NMR (CDCl 3) measurement results of the product in FIG.
Thereafter, the reaction solution is cooled, MIBK is added, water washing is performed until the lower layer solution becomes neutral, the upper layer solution is separated, and then the solvent is distilled off from the upper layer solution under 1 mmHg and 50 ° C. About 10 g of a colorless and transparent liquid product (fluorine-containing epoxy-modified silsesquioxane; FESQ (1), epoxy equivalent weight: 222 g / eq) was obtained, containing about 25% by weight.
実施例2[フッ素含有エポキシ変性シルセスキオキサンの製造]
温度計、撹拌装置、還流冷却器、及び窒素導入管を取り付け100mLのフラスコ(反応容器)に、窒素気流下で2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン20.0ミリモル(4.93g)、1H、1H、2H、2H−ノナフルオロヘキシルトリメトキシシラン20ミリモル(7.37g)、アセトン49.2g、及び水400ミリモル(7.2g)を仕込み、48℃に昇温した。このようにして得られた混合物に、5%炭酸カリウム水溶液1.10g(炭酸カリウムとして0.4ミリモル)を5分かけて滴下した。なお、滴下の間、著しい温度上昇は起こらなかった。その後、48℃のまま、重縮合反応を窒素気流下で5時間行った。重縮合反応後の反応溶液中の生成物を分析したところ、数平均分子量は1550であり、分子量分散度は1.30であった。上記生成物の29Si−NMRスペクトル(図3)から算出されるT2体とT3体の割合[T3体/T2体]は19.4であった。また、上記生成物の1H−NMR(CDCl3)測定結果を図4に示す。
その後、反応溶液を冷却し、MIBKを加え、下層液が中性になるまで水洗を行い、上層液を分取した後、1mmHg、50℃の条件で上層液から溶媒を留去し、MIBKを約25重量%含有する無色透明の液状の生成物(フッ素含有エポキシ変性シルセスキオキサン;FESQ(2)、エポキシ当量:294g/eq)を12g得た。
Example 2 [Production of Fluorine-Containing Epoxy-Modified Silsesquioxane]
A thermometer, a stirrer, a reflux condenser, and a nitrogen inlet tube were attached to a 100 mL flask (reaction vessel), and 20.0 mmol of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane under nitrogen stream (4. 93 g), 1 H, 1 H, 2 H, 2 H-nonafluorohexyl trimethoxysilane 20 mmol (7.37 g), acetone 49.2 g, and water 400 mmol (7.2 g) were charged, and the temperature was raised to 48 ° C. To the mixture thus obtained, 1.10 g of a 5% aqueous solution of potassium carbonate (0.4 mmol as potassium carbonate) was added dropwise over 5 minutes. Note that no significant temperature rise occurred during the dropping. Thereafter, the polycondensation reaction was performed for 5 hours under a nitrogen stream at 48 ° C. Analysis of the product in the reaction solution after the polycondensation reaction revealed that the number average molecular weight was 1550 and the molecular weight dispersity was 1.30. The ratio of T2 body to T3 body [T3 body / T2 body] calculated from the 29 Si-NMR spectrum (FIG. 3) of the above product was 19.4. Also shows a 1 H-NMR (CDCl 3) measurement results of the product in FIG.
Thereafter, the reaction solution is cooled, MIBK is added, water washing is performed until the lower layer solution becomes neutral, the upper layer solution is separated, and then the solvent is distilled off from the upper layer solution under 1 mmHg and 50 ° C. 12 g of a colorless and transparent liquid product (fluorine-containing epoxy-modified silsesquioxane; FESQ (2), epoxy equivalent weight: 294 g / eq) containing about 25% by weight was obtained.
実施例3
6mLの茶褐色サンプル瓶に、実施例1で得られた生成物を0.15g(FESQ(1)0.11g+MIBK0.04g)、調製例1で得られた生成物を2.85g(ESQ2.18g+MIBK0.67g)、WPI−124を45.8mg(50%溶液、光カチオン重合開始剤を22.9mg含む)、S−243を0.0114g、及びMIBKを0.502g入れてバイブレーターで撹拌混合し、硬化性組成物(ハードコート剤、25℃における粘度:97.5mPa・s)を作製した。
得られたハードコート剤を、PETフィルム(厚み188μm、商品名「A4300」、東洋紡(株)製)上に、硬化後のハードコート層の厚さが10μmとなるようにワイヤーバーを使用して流延塗布した後、120℃のオーブン内で10分間放置(プレベイク)し、次いで紫外線を照射した(照射条件(照射量):430mJ/cm2、照射強度:120W/cm2)。最後に80℃で2時間熱処理(エージング)することによって、上記ハードコート剤の塗工膜を硬化させ、ハードコート層を有するハードコートフィルム(厚み198μm)を作製した。
Example 3
In a 6 mL brown sample bottle, 0.15 g of the product obtained in Example 1 (0.11 g of FESQ (1) +0.04 g of MIBK) and 2.85 g of the product obtained in Preparation Example 1 (ESQ 2.18 g + MIBK0. 67 g), 45.8 mg of WPI-124 (50% solution, containing 22.9 mg of photo cationic polymerization initiator), 0.0114 g of S-243, and 0.502 g of MIBK, mixed by stirring with a vibrator, and cured (Hard coat agent, viscosity at 25 ° C .: 97.5 mPa · s) was prepared.
Using the obtained hard coating agent, a wire bar is used on a PET film (thickness: 188 μm, trade name “A4300”, manufactured by Toyobo Co., Ltd.) so that the thickness of the hard coat layer after curing is 10 μm. After cast coating, it was allowed to stand (prebaked) in an oven at 120 ° C. for 10 minutes and then irradiated with ultraviolet light (irradiation conditions (irradiation amount): 430 mJ / cm 2 , irradiation intensity: 120 W / cm 2 ). Finally, the coated film of the above hard coating agent was cured by heat treatment (aging) at 80 ° C. for 2 hours to prepare a hard coated film (thickness 198 μm) having a hard coated layer.
実施例4〜5、比較例1
下記表1に記載の通りに処方(単位:g)を変更した以外は実施例3と同様にして、硬化性組成物(ハードコート剤)を作製し、ハードコートフィルムを作製した。
Examples 4 to 5, Comparative Example 1
A curable composition (hard coat agent) was produced and a hard coat film was produced in the same manner as in Example 3 except that the formulation (unit: g) was changed as described in Table 1 below.
実施例及び比較例で得られたハードコートフィルムについて、下記方法で耐擦傷性を評価した。
ハードコートフィルムのハードコート層表面を、スチールウール耐久性試験機を用い、直径1.0cmのスチールウール#0000で2.0kg/cm2の荷重において1000、2000往復(速度10cm/s)摩擦した。試験前後のハードコートフィルムのヘイズをヘーズメータ(日本電色工業(株)製、NDH−300A)を用いて測定し、ヘーズの変化度(ΔHz)から耐擦傷性を評価した。結果を表1、図5、6に示す。
The abrasion resistance of the hard coat films obtained in Examples and Comparative Examples was evaluated by the following method.
Hard coat layer surface of hard coat film was rubbed with steel wool endurance tester with 1000, 2000 reciprocation (speed 10 cm / s) with load of 2.0 kg / cm 2 with steel wool # 0000 of diameter 1.0 cm . The haze of the hard coat film before and after the test was measured using a haze meter (manufactured by Nippon Denshoku Kogyo Co., Ltd., NDH-300A), and the scratch resistance was evaluated from the degree of change in haze (Δ Hz). The results are shown in Table 1, FIGS.
FESQ(1):実施例1で得られたフッ素含有エポキシ変性シルセスキオキサン
FESQ(2):実施例2で得られたフッ素含有エポキシ変性シルセスキオキサン
ESQ:調製例1で得られたエポキシ変性シルセスキオキサン
WPI−124:光カチオン重合開始剤、ビス[4−n−アルキル(C10-13)フェニル]ヨードニウム テトラキス(ペンタフルオロフェニル)ボレート、分子量1296.79、和光純薬工業(株)製
S−243:フッ素系レベリング剤、商品名「サーフロンS−243」、AGCセイミケミカル(株)製
MIBK:メチルイソブチルケトン、溶媒
FESQ (1): Fluorine-containing epoxy-modified silsesquioxane obtained in Example 1 FESQ (2): Fluorine-containing epoxy-modified silsesquioxane ESQ obtained in Example 2: Epoxy obtained in Preparation Example 1 Modified silsesquioxane WPI-124: Photocationic polymerization initiator, bis [4-n-alkyl (C 10-13 ) phenyl] iodonium tetrakis (pentafluorophenyl) borate, molecular weight 1296.79, Wako Pure Chemical Industries, Ltd. S-243: a fluorine-based leveling agent, trade name "Surflon S-243", AGC Seimi Chemical Co., Ltd. MIBK: methyl isobutyl ketone, solvent
表1より、本発明のフッ素含有エポキシ変性シルセスキオキサンを含む硬化性組成物によれば、得られる硬化物の透明性を維持しつつ、優れた耐擦傷性を付与することができることがわかる。 From Table 1, according to the curable composition containing the fluorine-containing epoxy-modified silsesquioxane of the present invention, it can be understood that excellent scratch resistance can be imparted while maintaining the transparency of the obtained cured product. .
Claims (7)
[R1SiO3/2] (T-1)
[式中、R1は、エポキシ基を含有する基を示す]
で表されるシロキサン構成単位(T-1)と、
下記式(T-2)
[R2SiO3/2] (T-2)
[式中、R2は、炭素数2〜16のアルキル基の水素原子の2個以上がフッ素原子で置換された基を示す]
で表されるシロキサン構成単位(T-2)とを有するフッ素含有エポキシ変性シルセスキオキサン。 Following formula (T-1)
[R 1 SiO 3/2 ] (T-1)
[Wherein, R 1 represents a group containing an epoxy group]
And a siloxane structural unit (T-1) represented by
Following formula (T-2)
[R 2 SiO 3/2 ] (T-2)
[Wherein, R 2 represents a group in which two or more hydrogen atoms of an alkyl group having 2 to 16 carbon atoms are substituted with a fluorine atom]
And fluorine-containing epoxy-modified silsesquioxane having a siloxane structural unit (T-2) represented by
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| PCT/JP2018/015500 WO2018193979A1 (en) | 2017-04-17 | 2018-04-13 | Fluorine-containing epoxy-modified silsesquioxane and curable composition comprising same |
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| WO2018193979A1 (en) | 2018-10-25 |
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