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1980-10-06 |
1982-08-24 |
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1980-10-06 |
1985-04-09 |
Werner Tabarelli |
Apparatus for the photolithographic manufacture of integrated circuit elements
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JPS57117238A
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1981-01-14 |
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Nippon Kogaku Kk <Nikon> |
Exposing and baking device for manufacturing integrated circuit with illuminometer
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JPS57153433A
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1981-03-18 |
1982-09-22 |
Hitachi Ltd |
Manufacturing device for semiconductor
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JPS57169244A
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1981-04-13 |
1982-10-18 |
Canon Inc |
Temperature controller for mask and wafer
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1981-12-07 |
1985-06-19 |
Philips Electronic Associated |
Insulated-gate field-effect transistors
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JPS58202448A
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1982-05-21 |
1983-11-25 |
Hitachi Ltd |
露光装置
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Hitachi Ltd |
液浸距離保持装置
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1983-09-14 |
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Mikroelektronik Zt Forsch Tech |
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Canon Inc |
半導体露光装置
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JPS6144429A
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Nippon Kogaku Kk <Nikon> |
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Hitachi Ltd |
露光装置
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微細パタ−ン転写装置
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Canon Inc |
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1991-04-02 |
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Nikon Corp |
密着型露光装置
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1991-04-02 |
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Nikon Corp |
密着型露光装置
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Nikon Corporation |
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Canon Inc |
液浸式投影露光装置
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液浸式投影露光装置
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