JP2008192678A - Substrate processing equipment - Google Patents

Abstract

In a substrate processing apparatus for continuously processing glass substrates, the processing time per sheet is not shortened and the processing capacity is increased, and the processing time is not decreased and the processing time per sheet is extended. Processing equipment.
A substrate processing apparatus that starts a processing operation using a second or first substrate transport mechanism immediately after the processing operation using a first or second substrate transport mechanism is finished. In addition, the start time of the processing operation by the first or second substrate transport mechanism is the same time as the start time of the processing operation when there is one substrate transport mechanism, and the processing operation by the first or second substrate transport mechanism is performed. The substrate processing apparatus in which the end point is until immediately before the start point of the processing operation for the next glass substrate when there is one substrate transport mechanism.
[Selection] Figure 3

Description

  The present invention relates to a substrate processing apparatus for processing a glass substrate, which is used for manufacturing a color filter for a liquid crystal display device, and in particular, without shortening the operation time of a processing conveyance unit per glass substrate, The present invention relates to a substrate processing apparatus capable of increasing the processing capacity per time, and a substrate processing apparatus capable of extending the operation time of the processing conveyance unit per glass substrate without decreasing the processing capacity per time.

FIG. 7 is a plan view schematically showing an example of a color filter used in the liquid crystal display device. FIG. 8 is a cross-sectional view taken along line XX ′ of the color filter shown in FIG.
As shown in FIGS. 7 and 8, the color filter used in the liquid crystal display device has a black matrix (41), a colored pixel (42), and a transparent conductive film (43) sequentially on a glass substrate (40). It is formed.
FIGS. 7 and 8 schematically show a color filter, and 12 colored pixels (42) are shown. In an actual color filter, for example, several hundreds are displayed on a 17-inch diagonal screen. A large number of colored pixels of about μm are arranged.

  As a method for manufacturing a color filter having the above structure used in many liquid crystal display devices, first, a black matrix is formed on a glass substrate, and then the black matrix on the glass substrate on which the black matrix is formed. A method in which colored pixels are formed in alignment with a pattern and a transparent conductive film is further formed in alignment is widely used. The black matrix (41) is a matrix having light shielding properties, the colored pixels (42) have, for example, red, green, and blue filter functions, and the transparent conductive film (43) is transparent. Provided as a simple electrode.

The black matrix (41) is composed of a matrix portion (41A) between the colored pixels (42) and a frame portion (41B) surrounding the peripheral portion of the region (display portion) where the colored pixels (42) are formed. Yes.
The black matrix determines the position of the colored pixels of the color filter, makes the size uniform, and shields unwanted light when used in a display device, making the image of the display device uniform and uniform. In addition, it has a function of making an image with improved contrast.

This black matrix is formed using a chromium film processing line on a glass substrate (40) with a metal such as chromium (Cr) or chromium oxide (CrO _x ) as a black matrix material or a metal compound in a thin film form. Then, using a black matrix processing line, for example, a positive photoresist etching resist pattern is formed on the formed thin film, and then the exposed portion of the formed metal thin film is formed. Etching and stripping of an etching resist pattern are performed to form a black matrix (41) made of a metal thin film such as Cr or CrO _x .
Alternatively, the black matrix (41) is formed on the glass substrate (40) by photolithography using a black photosensitive resin for forming a black matrix.

In addition, the colored pixel (42) is formed by applying a negative photoresist coating film in which, for example, a pigment or other pigment is dispersed on the glass substrate on which the black matrix is formed, using a colored pixel processing line. And a colored pixel is formed by exposure and development on the coating film.
The transparent conductive film (43) is formed on a glass substrate on which colored pixels are formed using a transparent conductive film processing line, for example, by using ITO (Indium Tin Oxide) by sputtering. The method of forming is taken.

The color filter shown in FIGS. 7 and 8 has a basic function as a color filter used in a liquid crystal display device. The liquid crystal display device incorporates such a color filter to realize full color display, and its application range is dramatically expanded, and many products using liquid crystal display devices such as liquid crystal color TVs and notebook PCs are created. It was done.
With the development and practical use of various liquid crystal display devices, the following various functions have been added to the color filters used in the liquid crystal display devices in addition to the above basic functions.

  Examples of functions added to the color filter shown in FIG. 7 include a protective layer, a photo spacer, an alignment control protrusion, an optical path adjustment layer, and a light scattering layer. Among these functions, one function or a plurality of functions are added to the color filter shown in FIG. 6 based on the use and specification of the color filter.

FIG. 9 is an explanatory diagram illustrating an example of a colored pixel processing line among the various processing lines. The processing line of the colored pixels illustrated in FIG. 9 includes a cleaning device (12), a coating device (13), a film thickness / unevenness inspection device (14), an exposure device (15), a developing device (16), a post-baking device ( 17), a process device (P) such as an inspection / correction device (18), a carry-in device (LD), and a carry-out device (ULD).
Although the glass substrate is not shown, the flow line of the glass substrate is represented by a solid arrow. The glass substrate is sequentially transported between the devices by a transport mechanism.

  As shown in FIG. 9, a glass substrate is carried in from a carrying-in apparatus (LD) to a washing | cleaning apparatus (12), and a washing process is given in a washing | cleaning apparatus (12). Next, it is conveyed from the cleaning device (12) to the coating device (13), and a photoresist is applied by the coating device (13). After coating, the film is transferred to a film thickness / unevenness inspection apparatus (14), and a coating film of the photoresist is inspected.

  Subsequently, exposure by the exposure device (15), development by the development device (16), post-baking by the post-baking device (17), inspection and correction by the inspection device (18) are performed, and a pattern is formed. The glass substrate is unloaded from the inspection / correction device (18) to the unloading device (ULD). The film thickness / unevenness inspection apparatus (14) performed after the application of the photoresist performs, for example, an optical non-contact film thickness inspection and a nonuniformity inspection for capturing a macro image. It is a so-called in-line inspection device incorporated. The inspection / correction device (18) is, for example, an appearance inspection and defect correction device that performs an appearance inspection of a formed pattern and corrects a detected white defect such as a pinhole or a black defect such as adhesion of foreign matter. is there.

  FIG. 1 is a plan view showing an example of a substrate processing apparatus in the substrate processing apparatuses ((12) to (18)) constituting the process apparatus (P). As shown in FIG. 1, the substrate processing apparatus shown as an example includes a substrate receiving unit (20), a processing preparation unit (30), a processing transport unit (50), a substrate delivery unit (60), a processing unit (70), And a substrate transfer mechanism (10). The substrate receiving section (20) to the substrate delivery section (60) are provided in this order in the X-axis direction in FIG. 1, and the processing section (70) is a processing preparation section (30) above the processing transport section (50). On the side.

In FIG. 1, the glass substrate (40) carried in from the substrate processing apparatus (not shown) located upstream of the substrate processing apparatus, as indicated by the white thick arrow on the left side, is the substrate receiving section (20). Then, it is placed horizontally on the processing preparation section (30), and the side end of the processing preparation section (30) is fixed and held by the substrate fixture (9) of the substrate transport mechanism (10). The processing unit (70) performs processing on the upper surface of the glass substrate (40) while being transported (passed) horizontally at a constant speed below (70), and is transported to the processing transport unit (50).

The glass substrate (40) processed by the processing unit (70) is transferred from the processing transfer unit (50) to the substrate transfer unit (60), and the white substrate on the right side in FIG. 1 is transferred from the substrate transfer unit (60). As indicated by a thick arrow, the substrate processing apparatus is carried out to a substrate processing apparatus (not shown) located downstream of the substrate processing apparatus.
In FIG. 1, the side edge of the glass substrate (40) is fixed and held by the substrate fixing tool (12) in the processing preparation unit (30), and the glass substrate (40) is moved below the processing unit (70). It shows a state immediately before the conveyance is started.

  The substrate transport mechanism (10) includes a guide / drive transmission unit (8) and a substrate fixture (9). In FIG. 1, the guide / drive transmission unit (8) is located between the processing preparation unit (30) and the processing conveyance unit (50) in the X-axis direction, on the side of the conveyance path of the glass substrate (40) and in parallel with the conveyance path. The substrate fixture (9) is reciprocated at an arbitrary speed during this period.

  The substrate fixture (9) provided on the guide / drive transmission unit (8) fixes and holds the side end of the glass substrate (40) placed horizontally on the processing preparation unit (30). The operation of the drive transmission unit (8) causes the glass substrate (40) to be conveyed (passed) under the processing unit (70) at a constant speed and is conveyed horizontally to the processing conveyance unit (50). During this time, the upper surface of the glass substrate (40) is processed by the processing unit (70).

The substrate fixture (9) that has transported the glass substrate (40) to the processing transport unit (50) opens the glass substrate (40) in the processing transport unit (50), and returns to the processing preparation unit (30). The next glass substrate is conveyed.
As the substrate fixture (9), for example, a suction pad is often used.

  The conveyance of the glass substrate (40) from the substrate receiving unit (20) to the processing preparation unit (30) and the conveyance of the glass substrate (40) from the processing conveyance unit (50) to the substrate delivery unit (60) are, for example, A transport mechanism such as a roller conveyor is used (not shown). Moreover, the conveyance mechanism provided in the lower part of a process part (70) is required for conveyance of a glass substrate (40), for example according to conveyance precision, such as a bending of a glass substrate, a vibration, etc., for example, a roller conveyor Such a transport mechanism or an air levitation transport mechanism is appropriately selected and used.

  In addition, in order to perform a uniform process on the upper surface of the glass substrate (40), the transport mechanism provided in the lower part of the processing unit (70) requires a high precision transport speed (uniform speed). A drive system such as a servo motor or a linear motor is used.

FIG. 2 is a specific example of a time chart in which the operation states of the respective parts of the substrate processing apparatus shown in FIG. 1 are arranged in time order. In FIG. 2, the vertical axis represents the glass substrate receiving operation, the processing operation to the glass substrate, and the glass substrate transport operation in the substrate processing apparatus from above. Further, the horizontal axis represents time (one scale per second).
In the receiving operation, the substrate receiving operation (6 seconds from (a) to (b)) for receiving the glass substrate (40) carried in from the substrate processing apparatus located upstream and the glass receiving unit (20), and the glass This is a receiving / preparation transporting operation (5 seconds from (b) to (c)) for transporting the substrate (40) from the substrate receiving unit (20) to the processing preparation unit (30).

The processing operation is an operation in the order of the substrate fixing operation, the processing transport unit operation, the substrate delivery operation, and the fixture returning operation. Substrate fixing operation (4 of symbols (c) to (d1)) in which the substrate fixing tool (9) fixes and holds the side end portion of the glass substrate (40) placed horizontally in the processing preparation section (30). Second), and then the fixed and held glass substrate (40) is transferred from the processing preparation section (30) to the processing transport section (50).
Processing transport unit operation (10 seconds of reference signs (d1) to (f)), and then substrate transfer operation for transferring the glass substrate (40) from the processing transport unit (50) to the substrate transfer unit (60) ( Next, the substrate fixture (9), which has opened the glass substrate (40), returns from the process transport unit (50) to the process preparation unit (30), and then returns to the process preparation unit (30). This is an operation (3 seconds from reference signs (h) to (i)).

In addition, in the said process conveyance part operation | movement (10 seconds of code | symbol (d1)-(f)), a process is performed by the process part (70) on the upper surface of a glass substrate (40).
Further, the transfer operation is a process / delivery transfer operation (reference numerals (h) to (h)) for transferring the glass substrate (40) delivered from the process transfer unit (50) from the process transfer unit (50) to the substrate transfer unit (60). j) for 5 seconds).

FIG. 1 shows the operation of each part and the position of the glass substrate at the time indicated by reference numeral (d1) in FIG.
When each of the above operations is performed on the first glass substrate (40), the substrate receiving operation to the fixture return operation are sequentially performed. However, the processing / delivery transfer operation is parallel to the fixture return operation. Has been done.
Further, regarding the second glass substrate (40), the substrate receiving operation starts at the time indicated by the symbol (e). In other words, the process starts during the processing and conveying unit operation (reference numerals (d1) to (f)) of the first glass substrate.

  As shown in FIG. 2, the glass substrate receiving cycle (C1) is 20 seconds from (a) to (e), and the processing cycle (C2) is from 20 seconds from (d1) to (k1). ) Is 20 seconds from (h) to (l). That is, in this substrate processing apparatus, an operation is performed in which reception cycle (C1) = processing cycle (C2) = conveying cycle (C3).

  Further, as described above, the processing cycle (C2) for performing the processing on the glass substrate (40) is 20 seconds / sheet, as indicated by reference numerals (d1) to (k1). This represents the processing capacity of the substrate processing apparatus, and the processing capacity is 180 sheets / hour (3600 seconds / 20 seconds = 180 sheets, 180 sheets / hour).

  In this substrate processing apparatus, when the processing time (T2) is kept the same and the quality is maintained, the processing cycle is shortened and the processing capacity is increased. The waiting time (W2) when the processing operation is not performed, in other words, the waiting time (W2) during which the processing unit cannot perform the processing operation is shortened. However, the waiting time (W2) of the processing cycle (C2) includes the substrate fixing operation time (t1), the substrate delivery operation time (t2), and the fixture return operation time (t3). It is not easy to shorten (W2).

  On the other hand, when the processing capability of the substrate processing apparatus is increased, the shortening of the receiving cycle (C1) and the conveying cycle (C3) accompanying the shortening of the processing cycle (C2) is the waiting time (W1) of the receiving cycle (C1). In the waiting time (W3) of the transfer cycle (C3), the operations corresponding to the substrate fixing operation, the substrate delivery operation, and the fixture returning operation are not involved, so it can be said that it is relatively easy.

In addition, this substrate processing apparatus comprises the said process apparatus (P) in which each process is performed in each substrate processing apparatus, while a glass substrate (40) is conveyed sequentially between each substrate processing apparatus. Since this is a substrate processing apparatus, the processing capacity of 180 wafers / hour is set and adjusted in advance between the respective substrate processing apparatuses.
In accordance with the processing cycle (C2) on which the processing capability is based, the receiving cycle (C1) and the transport cycle (C3) are unified between the substrate processing apparatuses.

Even in such a situation, there is a strong demand in the actual work site to increase the processing capacity of the glass substrate per hour of the substrate processing apparatus.
Further, for example, in order to improve quality, there is a strong demand to extend the processing conveyance unit operation time (T2) per glass substrate without reducing the processing capacity per time.
Japanese Patent Laid-Open No. 11-54428 JP 2005-175310 A JP 2004-109968 A

  As described above, the present invention includes a substrate receiving unit, a processing preparation unit, a processing transport unit, a substrate delivery unit, a processing unit, and a substrate transport mechanism, and the side of the glass substrate placed horizontally on the processing preparation unit A substrate fixture of the substrate transport mechanism fixes and holds the end of the substrate, and the processing unit performs processing on the upper surface of the glass substrate while transporting (passing) the lower part of the processing unit horizontally at a constant speed. Open the glass substrate at the processing transport unit and return to the processing preparation unit, and repeat the operations of fixing and holding the next glass substrate in the same way and transporting (passing) the processing unit below, continuously. To provide a substrate processing apparatus capable of increasing the processing capacity per hour without reducing the processing transport unit operating time (T2) per glass substrate. The first issue .

  In addition, as described above, the present invention includes a substrate receiving unit, a processing preparation unit, a processing transport unit, a substrate delivery unit, a processing unit, and a substrate transport mechanism, and is a glass substrate placed horizontally on the processing preparation unit. The substrate fixture of the substrate transport mechanism fixes and holds the side edge of the substrate, and the processing unit performs processing on the upper surface of the glass substrate while transporting (passing) the lower part of the processing unit horizontally at a constant speed. The fixing tool opens the glass substrate at the processing conveyance unit and returns to the processing preparation unit, repeatedly fixing and holding the next glass substrate in the same manner, and conveying (passing) below the processing unit, continuously. In a substrate processing apparatus that performs processing on the upper surface of a glass substrate, the processing time of the processing conveyance unit per glass substrate (T2) can be extended without reducing the processing capacity of the glass substrate per hour. To provide the second It is an issue.

According to a first aspect of the present invention, there is provided a substrate processing apparatus including at least a substrate receiving unit, a processing preparation unit, a processing transfer unit, a substrate transfer unit, a processing unit, and a substrate transfer mechanism.
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operation time is the same as the processing transport unit operation time in the case where there is one substrate transport mechanism,
2) Immediately after the end of the processing transport unit operation using the first substrate transport mechanism, the processing transport unit operation using the second substrate transport mechanism is started, and the processing transport unit operation using the second substrate transport mechanism is started. Immediately after the completion of the processing, the substrate processing apparatus is characterized in that the processing and transport unit operation using the first substrate transport mechanism is started.

The second invention of the present invention is a substrate processing apparatus comprising at least a substrate receiving unit, a processing preparation unit, a processing transport unit, a substrate delivery unit, a processing unit, and a substrate transport mechanism.
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operating time is longer than the processing transport unit operating time in the case of one substrate transport mechanism,
2) The start time of the process transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism is the same time as the start time of the process transport unit operation to each glass substrate when the number of substrate transport mechanisms is one. The end point of the processing transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism is until just before the start point of the processing transport unit operation to the next glass substrate when there is one substrate transport mechanism. A substrate processing apparatus is characterized.

According to a first aspect of the present invention, there is provided a substrate processing apparatus including at least a substrate receiving unit, a processing preparation unit, a processing transfer unit, a substrate transfer unit, a processing unit, and a substrate transfer mechanism.
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operation time is the same as the processing transport unit operation time in the case where there is one substrate transport mechanism,
2) Immediately after the end of the processing transport unit operation using the first substrate transport mechanism, the processing transport unit operation using the second substrate transport mechanism is started, and the processing transport unit operation using the second substrate transport mechanism is started. Since the substrate processing apparatus starts the processing transport unit operation using the first substrate transport mechanism immediately after the process is completed, the processing transport unit operating time (T2) per one glass substrate is not shortened. It becomes a substrate processing apparatus capable of increasing the processing capacity of the substrate.

According to a second aspect of the present invention, there is provided a substrate processing apparatus including at least a substrate receiving unit, a processing preparation unit, a processing transfer unit, a substrate transfer unit, a processing unit, and a substrate transfer mechanism.
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operating time is longer than the processing transport unit operating time in the case of one substrate transport mechanism,
2) The start time of the process transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism is the same time as the start time of the process transport unit operation to each glass substrate when the number of substrate transport mechanisms is one. Substrate processing in which the processing transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism ends is immediately before the start of the processing transport unit operation for the next glass substrate in the case of one substrate transport mechanism. Since it is an apparatus, it becomes a substrate processing apparatus which can extend the processing conveyance part operation time (T2) per glass substrate, without reducing the processing capacity of the glass substrate per time.

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 3 is a plan view showing an embodiment of the substrate processing apparatus according to the present invention. As shown in FIG. 3, the substrate processing apparatus shown as one embodiment includes a substrate receiving unit (20), a base processing preparation unit (30B) in the present invention, a processing transport unit (50), a substrate delivery unit (60), A processing unit (70) and a substrate transport mechanism (10) are included. The substrate receiving section (20) to the substrate delivery section (60) are provided in this order in the X-axis direction in FIG. 3, and the processing section (70) is a processing preparation section (30B) above the processing transport section (50). On the side.

  The substrate transport mechanism (10) according to the present invention includes a first substrate transport mechanism (10A) and a second substrate transport mechanism (10B). The first guide / drive transmission unit (8A) of the first substrate transport mechanism (10A) is located in the X-axis direction, above the transport path of the glass substrate (40) in FIG. The second guide / drive transmission unit (8B) is provided below the conveyance path of the glass substrate (40) between the processing preparation unit (30B) and the processing conveyance unit (50) in parallel with the conveyance path. The first and second substrate fixtures (9A, 9B) are reciprocated at an arbitrary speed during this time.

The substrate transport mechanism (10) in the present invention is configured to alternately operate the first substrate transport mechanism (10A) and the second substrate transport mechanism (10B).
The first substrate fixture (9A) provided on the first guide / drive transmission unit (8A) fixes the side end of the glass substrate (40) placed horizontally on the processing preparation unit (30B), When held, the glass substrate (40) is conveyed (passed) under the processing unit (70) at a constant speed by the operation of the first guide / drive transmission unit (8A), and is horizontally conveyed to the processing conveyance unit (50). . During this time, the upper surface of the glass substrate (40) is processed by the processing unit (70).

  Subsequently, similarly, the second substrate fixture (9B) provided on the second guide / drive transmission unit (8B) moves the glass substrate (40) from the processing preparation unit (30B) to the processing transport unit (50). During this time, the upper surface of the glass substrate (40) is processed by the processing section (70).

  In the present invention, the preceding glass substrate (40) is conveyed (passed) under the processing unit (70) by the first substrate fixture (9A), for example, that is, the preceding glass substrate ( 40) Since the next glass substrate (40) is carried into the substrate receiving section (20) and is transferred from the substrate receiving section (20) to the processing preparing section while the rear portion is still left in the processing preparing section. The processing preparation section (30B) in the present invention divides the processing preparation section (30B) into a rear processing preparation section (30B-b) and a front processing preparation section (30B-a), and precedes the glass substrate (40). While the rear portion is still left in the front processing preparation section (30B-a), the next glass substrate (40) can be placed on the rear processing preparation section (30B-b).

  In FIG. 3, as shown by the white thick arrow on the left, the glass substrate carried in from the substrate processing apparatus (not shown) located upstream of the substrate processing apparatus passes through the substrate receiving section (20), It is placed horizontally on the rear processing preparation section (30B-b), and the side end of the rear processing preparation section (30B-b) is the first substrate transport mechanism (10A) or the second substrate transport mechanism (10B). The processing unit (70) performs processing on the upper surface of the glass substrate (40) while being transported (passed) horizontally at a constant speed under the processing unit (70) while being fixed and held by the substrate fixture. Part (50).

The glass substrate (40) processed by the processing unit (70) is transferred from the processing transfer unit (50) to the substrate transfer unit (60), and the white substrate on the right side in FIG. 1 is transferred from the substrate transfer unit (60). As indicated by a thick arrow, the substrate processing apparatus is carried out to a substrate processing apparatus (not shown) located downstream of the substrate processing apparatus.
FIG. 3 shows a case where the side edge of the first glass substrate (40-1) is fixed and held by the first substrate fixture (9A) in the rear processing preparation unit (30B-b), The glass substrate (40-1) of the eye represents a state immediately before the downward conveyance of the processing unit (70) is started. At this time, the second glass substrate (40-2) is being carried into the substrate receiving portion (20).

FIG. 4 is a specific example of a time chart in which the operation state of each part of the substrate processing apparatus shown in FIG. 3 is arranged in time order. FIG. 4 illustrates the substrate processing apparatus according to the first aspect of the present invention, that is, a processing apparatus capable of increasing the processing capacity per hour without reducing the processing transport unit operating time (T2) per glass substrate. To do.
In the receiving operation of the first glass substrate (40-1), the substrate receiving section (20) receives the first glass substrate (40-1) carried in from the substrate processing apparatus located upstream. Substrate receiving operation (six seconds (a) to (b)) and the first glass substrate (40-1) are transferred from the substrate receiving unit (20) to the rear processing preparation unit (30B-b). This is a receiving / preparing transport operation (5 seconds of reference signs (b) to (c)).

  The first processing operation by the first substrate transport mechanism (10A) is a sequence of a substrate fixing operation, a processing transport unit operation, a substrate delivery operation, and a fixture return operation. Substrate fixing in which the first substrate fixture (9A) fixes and holds the side end portion of the first glass substrate (40-1) placed horizontally in the rear processing preparation unit (30B-b). Operation (4 seconds from reference (c) to (d)), and then the first glass substrate (40-1) fixed and held is transferred from the rear processing preparation section (30B-b) to the processing transport section (30B-b). 50) (10 seconds from reference (d) to (g)), and then the first glass substrate (40-1) is transferred from the processing transfer unit (50) to the substrate transfer unit (50). 60) Substrate delivery operation (symbols (g) to (i) for 3 seconds), and then the first substrate fixture (9A) that has opened the first glass substrate (40-1), It is a fixture return operation (3 seconds from (i) to (j)) to return from the processing conveyance unit (50) to the rear processing preparation unit (30B-b).

In addition, in the said process conveyance part operation | movement (10 second of code | symbol (d)-(g)), a process is performed by the process part (70) on the upper surface of the 1st glass substrate (40-1).
In addition, the transfer operation is a process / delivery transfer operation for transferring the first glass substrate (40-1) delivered from the process transfer unit (50) from the process transfer unit (50) to the substrate transfer unit (60). (Symbols (i) to (l) for 6 seconds).

FIG. 3 shows the operation of each part and the position of the glass substrate at the time indicated by the symbol (d) in FIG.
When each of the above operations is performed on the first glass substrate (40-1), the substrate receiving operation to the fixture return operation are sequentially performed. However, the processing / delivery transfer operation is the fixture return operation. It is done in parallel.

  Now, regarding the second glass substrate (40-2), the substrate receiving operation of the second glass substrate (40-2) has started at the time indicated by reference numeral (c). In other words, the substrate receiving operation is performed during the processing conveyance unit operation (reference numerals (d) to (g)) of the first glass substrate (40-1).

  As shown in the processing transport section operation (10 seconds from (h) to (m)) during the second processing operation by the second substrate transport mechanism (10B), the second glass substrate (40-2) The processing transport unit operation starts at the time indicated by the symbol (h) in FIG. That is, immediately after (g) the processing and transport unit operation of the first glass substrate (40-1) is completed (1 second), the processing and transport unit operation of the second glass substrate (40-2). Has started.

  Now, when it sees about the 3rd glass substrate (40-3), the process conveyance part operation | movement (10 seconds of code | symbol (n)-(s)) in the 1st process operation by a 1st board | substrate conveyance mechanism (10A). As shown in FIG. 4, the operation of the processing and conveying unit of the third glass substrate (40-3) starts at the time indicated by the symbol (n) in FIG. That is, immediately after (1 second) the processing transport unit operation of the second glass substrate (40-2) is completed (m), the processing transport unit operation of the third glass substrate (40-3). Has started.

  As shown in FIG. 4, the processing cycle (C12A) in the first processing operation is 22 seconds from (d) to (n), and the processing cycle (C12B) in the second processing operation is It is 22 seconds from (h) to (t). This is longer than the processing cycle (C2) (reference numerals (d1) to (k1) of 20 seconds when the number of substrate transport mechanisms is one, as shown in FIG.

  However, the processing cycle as the substrate processing apparatus when the first processing operation by the first substrate transport mechanism (10A) and the second processing operation by the second substrate transport mechanism (10B) are added is denoted by reference numeral (C12). Thus, the processing cycle (C12) of the first glass substrate (40-1) is the processing cycle (C12) of the second glass substrate (40-2) for 11 seconds from (d) to (h). ) Is 11 seconds from (h) to (n). The breakdown is the processing conveyance unit operating time of 10 seconds and the waiting time of 1 second.

  In the processing operation according to the first aspect of the present invention, the processing transport unit operation time (T12A, T12B) is the same as the processing transport unit operation time (T2) in the case where there is one substrate transport mechanism, Immediately after the end of the processing transport unit operation using the first substrate transport mechanism (10A) (after 1 second), the processing transport unit operation using the second substrate transport mechanism (10B) is started, and the second substrate This is because the processing transport unit operation using the first substrate transport mechanism (10A) is started immediately after the processing transport unit operation using the transport mechanism (10B) is completed (after one second).

  That is, the substrate processing apparatus according to the first aspect of the present invention can increase the processing capacity per hour without reducing the processing transport unit operating time (T2) per glass substrate (T2 = T12A = T12). It becomes a substrate processing apparatus.

FIG. 5 is a plan view showing an embodiment of the substrate processing apparatus according to the present invention, which has the same structure as the substrate processing apparatus shown in FIG. FIG. 5 illustrates a second invention according to the present invention.
FIG. 6 is a specific example of a time chart in which the operation states of the respective parts of the substrate processing apparatus shown in FIG. 5 are arranged in time order. FIG. 6 shows the second invention of the present invention, that is, the substrate processing capable of extending the processing conveyance unit operating time (T2) per glass substrate without reducing the processing capacity of the glass substrate per hour. The apparatus is described.

  In the receiving operation of the first glass substrate (40-1), the substrate receiving section (20) receives the first glass substrate (40-1) carried in from the substrate processing apparatus located upstream. Substrate receiving operation (six seconds (a) to (b)) and the first glass substrate (40-1) are transferred from the substrate receiving unit (20) to the rear processing preparation unit (30B-b). This is a receiving / preparing transport operation (5 seconds of reference signs (b) to (c)).

The first processing operation by the first substrate transport mechanism (10A) is a sequence of a substrate fixing operation, a processing transport unit operation, a substrate delivery operation, and a fixture return operation. Substrate fixing in which the first substrate fixture (9A) fixes and holds the side end portion of the first glass substrate (40-1) placed horizontally in the rear processing preparation unit (30B-b). Operation (4 seconds from reference (c) to (d)), and then the first glass substrate (40-1) fixed and held is transferred from the rear processing preparation section (30B-b) to the processing transport section (30B-b). 50) processing transport unit operation (symbols (d) to (h) for 19 seconds), then the first glass substrate (40-1) from the processing transport unit (50) to the substrate delivery unit ( 60) Substrate delivery operation (3 seconds from (h) to (j)), and then the first substrate fixture (9A) that has opened the first glass substrate (40-1), It is a fixture return operation (3 seconds from (j) to (k)) to return from the processing conveyance unit (50) to the rear processing preparation unit (30B-b).

  The starting point of the process transport unit operation indicated by the symbol (d) is the start point of the process transport unit operation of the first glass substrate shown in FIG. 2 (FIG. 2). Among them, it is the same time as the code (d1)).

In addition, in the said processing conveyance part operation | movement (19 seconds of code | symbol (d)-(h)), a process is performed by the process part (70) on the upper surface of the 1st glass substrate (40-1) (T22A). > T2).
In addition, the transfer operation is a process / delivery transfer operation for transferring the first glass substrate (40-1) delivered from the process transfer unit (50) from the process transfer unit (50) to the substrate transfer unit (60). (Symbols (j) to (l) for 6 seconds).

FIG. 5 shows the operation of each part and the position of the glass substrate at the time indicated by the symbol (d) in FIG. The first glass substrate (40-1) is placed on the rear processing preparation section (30B-b) via the substrate receiving section (20).
When each of the above operations is performed on the first glass substrate (40-1), the substrate receiving operation to the fixture return operation are sequentially performed. However, the processing / delivery transfer operation is the fixture return operation. It is done in parallel.

  Now, regarding the second glass substrate (40-2), the substrate receiving operation of the second glass substrate (40-2) has started at the time indicated by the symbol (e). That is, the substrate receiving operation is performed during the processing and conveying unit operation (reference numerals (d) to (h)) of the first glass substrate (40-1).

  As shown in the processing transport section operation (19 seconds from (i) to (o)) during the second processing operation by the second substrate transport mechanism (10B), the second glass substrate (40-2) The processing transport unit operation starts at the time indicated by the symbol (i) in FIG. That is, at the start point (reference (i)) of the processing and transport unit operation by the second substrate transport mechanism (10B) of the second glass substrate (40-2), the substrate transport mechanism shown in FIG. It is the same time as the start time of the processing and conveying unit operation of the second glass substrate in the base case (reference numeral (k1) in FIG. 2).

  Now, as for the third glass substrate (40-3), as shown by the processing transport unit operation (reference (p)-) during the first processing operation by the first substrate transport mechanism (10A), The processing and conveying unit operation of the third glass substrate (40-3) starts at the time indicated by the symbol (p) in FIG. That is, the start point (reference (p)) of the processing and transport unit operation by the first substrate transport mechanism (10A) of the third glass substrate (40-3) is 1 for the substrate transport mechanism shown in FIG. It is the same time as the start time of the processing and conveying unit operation of the third glass substrate in the base case (reference numeral (u1) in FIG. 2).

  As shown in FIG. 6, the processing cycle (C22A) during the first processing operation is 40 seconds from (d) to (p), and the processing cycle (C22B) during the second processing operation is (I) to 40 seconds. This is longer than the processing cycle (C2) (reference numerals (d1) to (k1) of 20 seconds when the number of substrate transport mechanisms is one, as shown in FIG.

  However, the processing cycle as the substrate processing apparatus when the first processing operation by the first substrate transport mechanism (10A) and the second processing operation by the second substrate transport mechanism (10B) are added is indicated by a symbol (C22). Thus, the processing cycle (C22) of the first glass substrate (40-1) is the processing cycle (C22) of the second glass substrate (40-2) for 20 seconds indicated by reference numerals (d) to (i). ) Is 20 seconds from (i) to (p). The breakdown is the processing transport unit operating time of 19 seconds and the waiting time of 1 second.

  In the processing operation according to the second aspect of the present invention, the processing transport unit operation time (T22A, T22B) (19 seconds) is the processing transport unit operation time (T2) (10 seconds when there is one substrate transport mechanism). ) It is a longer time, and each glass substrate in the case where there is one substrate transport mechanism is the starting point (reference numerals (d, i, p)) of the processing transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism. Is the same time as the start time of the processing transport unit operation (symbol (d1, k1, u1)), and the end point of the processing transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism (symbol (h, o)) This is because when the number of substrate transport mechanisms is one, the processing transport unit operation to the next glass substrate starts (immediately before (1 second before) the symbol (i, p)).

  That is, the substrate processing apparatus according to the second aspect of the present invention extends the processing transport unit operation time (T2) per glass substrate without reducing the processing capacity of the glass substrate per hour (C22 = C2) (( T22A = T22)> T2).

It is a top view which shows an example of a certain substrate processing apparatus of the substrate processing apparatus which comprises a process apparatus. It is a specific example of the time chart which arranged the operation state of each part of the substrate processing apparatus shown in FIG. 1 in order of time. It is a top view which shows one Example of the substrate processing apparatus by this invention. It is a specific example of the time chart which arranged the operation state of each part of the substrate processing apparatus in 1st invention in order of time. It is a top view which shows one Example of the substrate processing apparatus by this invention, and demonstrates 2nd invention. It is a specific example of the time chart which arranged the operation state of each part of the substrate processing apparatus in 2nd invention in order of time. It is the top view which showed typically an example of the color filter used for a liquid crystal display device. It is sectional drawing in the X-X 'line | wire of the color filter shown in FIG. It is explanatory drawing which shows an example of the processing line of a colored pixel.

Explanation of symbols

8 ... guide / drive transmission unit 8A ... first guide / drive transmission unit 8B ... second guide / drive transmission unit 9 ... substrate fixture 9A ... first substrate fixture 9B ... Second substrate fixture 10 ... substrate transport mechanism 10A ... first substrate transport mechanism 10B in the present invention ... second substrate transport mechanism 12 in the present invention ... cleaning device 13 ... coating device 14 ... Film thickness / unevenness inspection device 15 ... Exposure device 16 ... Development device 17 ... Post bake device 18 ... Inspection / correction device 20 ... Substrate receiving unit 30 ... Processing preparation unit 30B: Processing preparation section 30B-a ... front processing preparation section 30B-b ... rear processing preparation section 40 ... glass substrate 40-1 ... first glass substrate in the present invention 40-2 ... second glass substrate 40-3 ... third glass Plate 41 ... Black matrix 42 ... Colored pixel 43 ... Transparent conductive film 50 ... Processing transport unit 60 ... Substrate delivery unit 70 ... Processing unit C1 ... Conventional receiving cycle C2. .. Conventional processing cycle C3... Conventional transfer cycle C11A, C11B... Receiving cycle C12 in the first invention... Processing cycle C12A as a substrate processing apparatus in the first invention. Processing cycle C12B during the first processing operation in the invention ... Processing cycles C13A, C13B during the second processing operation in the first invention ... Transport cycles C21A, C21B in the first invention ... Second invention Receiving cycle C22 in the second invention. Processing cycle C22A as the substrate processing apparatus in the second invention ... During the first processing operation in the second invention. Physical cycle C22B ... Processing cycles C23A, C23B during the second processing operation in the second invention ... Transport cycle P in the second invention ... Process device T1 ... Conventional receiving cycle receiving operation time T2 ... Processing transfer unit operation time T3 in the conventional processing cycle T3 Transfer operation time in the conventional transfer cycle T12 ... Processing transfer unit operation time T12A as a substrate processing apparatus in the first invention T12A, T12B Processing transport unit operation time T22 of the processing operation in the first invention Processing transport unit operating time T22A, T22B as the substrate processing apparatus in the second invention Processing transport processing unit of the processing operation in the second invention Operating time LD ... Loading device ULD ... Unloading device W1 ... Conventional reception cycle waiting time W2 ... Conventional processing cycle waiting time W3 ... Conventional transport cycle waiting time

Claims (2)

In a substrate processing apparatus comprising at least a substrate receiving unit, a processing preparation unit, a processing transfer unit, a substrate transfer unit, a processing unit, and a substrate transfer mechanism,
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operation time is the same as the processing transport unit operation time in the case where there is one substrate transport mechanism,
2) Immediately after the end of the processing transport unit operation using the first substrate transport mechanism, the processing transport unit operation using the second substrate transport mechanism is started, and the processing transport unit operation using the second substrate transport mechanism is started. Immediately after the completion of the processing, the substrate transfer apparatus starts the operation of the transfer processing unit using the first substrate transfer mechanism. In a substrate processing apparatus comprising at least a substrate receiving unit, a processing preparation unit, a processing transfer unit, a substrate transfer unit, a processing unit, and a substrate transfer mechanism,
A) The process preparation unit includes a rear process preparation unit and a front process preparation unit, and the substrate transport mechanism includes two units, a first substrate transport mechanism and a second substrate transport mechanism.
B) Using the first substrate transport mechanism and the second substrate transport mechanism alternately, the side edge of the glass substrate placed horizontally on the rear processing preparation section through the substrate receiving section is connected to the first substrate transport mechanism or the second substrate transport mechanism. When processing the top surface of the glass substrate by the processing unit while the substrate fixing tool of the substrate transport mechanism is fixed and held and transported (passed) horizontally at a constant speed below the processing unit,
C) 1) The processing transport unit operating time is longer than the processing transport unit operating time in the case of one substrate transport mechanism,
2) The start time of the process transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism is the same time as the start time of the process transport unit operation to each glass substrate when the number of substrate transport mechanisms is one. The end point of the processing transport unit operation by the first substrate transport mechanism or the second substrate transport mechanism is until just before the start point of the processing transport unit operation to the next glass substrate when there is one substrate transport mechanism. A substrate processing apparatus.

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