CN102621736A - Method for patterning black matrix in touch panel - Google Patents

Abstract

The invention provides a method for patterning a black matrix in a touch panel, which comprises the following steps: providing a glass substrate and a buffer layer, wherein the buffer layer is positioned above the glass substrate; providing a stripping mask layer above the buffer layer, wherein the stripping mask layer covers the display area of the touch panel; coating a black matrix layer of an inorganic material on respective surfaces of the buffer layer and the stripping mask layer; and stripping the stripping mask layer to form the patterned black matrix layer. According to the invention, the glue stripping mask layer is arranged above the buffer layer, the glue stripping mask layer covers the display area of the touch panel, and then the black matrix layer made of inorganic materials is coated on the surface of the buffer layer and the surface of the glue stripping mask layer, so that the patterned black matrix layer is formed after the glue stripping mask layer is stripped. The black matrix layer of the inorganic material is not peeled off compared with the black matrix layer of the organic material. In addition, another buffer layer and a metal layer may be sequentially deposited on the black matrix layer, thereby reducing an etching time of the buffer layer.

Description

A method of patterning a black matrix in a touch panel

technical field

The invention relates to a touch panel, in particular to a method for patterning a black matrix in the touch panel.

Background technique

At present, for Thin Film Transistor Liquid Crystal Display (TFT-LCD), which is widely used in electronic products to display images, it can be called one of the most important electronic products after integrated circuits (ICs). . In particular, the thin-film manufacturing process is the most important part in the development of thin-film liquid crystal displays, and also occupies the highest capital expenditure. If we can focus on the research and development of key processes, equipment and raw materials, we can save a lot of purchase costs and improve industrial competitiveness.

Taking the touch panel as an example, a layer of metal film is coated on the bottom layer of the color filter glass substrate, also known as black matrix (Black Matrix, BM). The main functions of this black matrix include improving color contrast, preventing color mixing and preventing light leakage. Generally, in order to meet the above functions of the black matrix, the principle of multilayer film interference should be adopted to form a BM with low reflectivity (high contrast), high optical density (to prevent color mixing and light leakage) and a total thickness of about 100-300nm multilayer film. For example, sputtering is mainly used in the production of BM, and the commonly used materials are chromium or chromium oxide, molybdenum or molybdenum oxide and chromium nitride to complete the interference sputtering of BM multilayer film.

However, in the prior art, the BM peeling in the FPC bonding area after the damp heat test only occurs in the BM made of organic materials, but not in the BM made of inorganic materials. In addition, for TFT array fabrication based on organic material BM, the conversion to inorganic developer and recycling system is also cumbersome and expensive.

In view of this, how to design a novel thin-film manufacturing process to solve the BM peeling situation of the touch panel and reduce the manufacturing or conversion cost is an urgent task to be solved by relevant technical personnel in the industry.

Contents of the invention

Aiming at the above defects in the BM stripping process in the prior art, the present invention provides a method for patterning the black matrix in the touch panel.

According to one aspect of the present invention, a method for patterning a black matrix in a touch panel is provided, comprising the following steps:

providing a glass substrate and a buffer layer, the buffer layer being located above the glass substrate;

providing a peeling mask layer above the buffer layer, wherein the peeling mask layer covers the display area of the touch panel;

coating a black matrix layer of inorganic material on the respective surfaces of the buffer layer and the stripping mask layer; and

peeling off the stripping mask layer to form a patterned black matrix layer.

Preferably, after the above step of coating the black matrix layer, it further includes: providing a second buffer layer above the black matrix layer; and coating a metal layer on the upper surface of the second buffer layer.

Preferably, the metal layer is a transparent electrode layer. More preferably, the transparent electrode layer is made of indium tin oxide (ITO) or indium zinc oxide (IZO) material.

Preferably, the touch panel is manufactured using an OGS (One Glass Solution) process.

Using the method for patterning the black matrix of the touch panel of the present invention, a peeling mask layer is arranged above the buffer layer, so that the peeling mask layer covers the display area of the touch panel, and then an inorganic The black matrix layer of the material is on the surface of the buffer layer and the surface of the peeling mask layer, so that a patterned black matrix layer is formed after peeling off the peeling mask layer. Compared with the black matrix layer of organic material, the black matrix layer of inorganic material will not peel off. In addition, another buffer layer and a metal layer can be sequentially deposited on the black matrix layer, thereby reducing the etching time of the buffer layer.

Description of drawings

Readers will have a clearer understanding of various aspects of the present invention after reading the detailed description of the present invention with reference to the accompanying drawings. in,

FIG. 1 shows a block flow diagram of a method for patterning a black matrix in a touch panel according to one aspect of the present invention;

Fig. 2 shows a specific embodiment of thin film manufacturing process using the method in Fig. 1; and

FIG. 3 shows another specific embodiment of thin film fabrication using the method in FIG. 1 .

Detailed ways

In order to make the technical content disclosed in this application more detailed and complete, reference may be made to the drawings and the following various specific embodiments of the present invention, and the same symbols in the drawings represent the same or similar components. However, those skilled in the art should understand that the examples provided below are not intended to limit the scope of the present invention. In addition, the drawings are only for schematic illustration and are not drawn according to their original scale.

The specific implementation manners of various aspects of the present invention will be further described in detail below with reference to the accompanying drawings.

As mentioned earlier, in the existing thin-film manufacturing process, after the touch panel wet heat test, the BM peeling in the FPC bonding area can only be monitored in the BM made of organic materials, but cannot be detected in the BM made of inorganic materials. Check in the completed BM. On the other hand, for TFT array wafers, switching to an inorganic developer and recycling system is cumbersome and expensive. In order to effectively solve the dependence on BM material, the present invention proposes a novel manufacturing method.

FIG. 1 shows a flow chart of a method for patterning a black matrix in a touch panel according to one aspect of the present invention.

Referring to FIG. 1 , in the method of the present invention, step S1 is first performed to provide a glass substrate and a buffer layer, and the buffer layer is located above the glass substrate. Then, step S2 is performed to provide a peeling mask layer on the buffer layer, wherein the peeling mask layer covers the display area of the touch panel, so as to avoid subsequent process damage or contamination of the display area of the touch panel, Image display performance of imaging products.

Next, in step S3, a black matrix layer of inorganic material is coated on the respective surfaces of the buffer layer and the stripping mask layer. For example, the black matrix layer is sputtered on the upper surface of the left buffer layer, the upper surface of the peeling mask layer and the upper surface of the right buffer layer, so that it is coated on the buffer layer and the peeling mask layer . Finally, the stripping mask layer and a part of the black matrix layer coated thereon are peeled off to form a patterned black matrix layer.

In a specific embodiment, the touch panel is manufactured using an OGS (One Glass Solution) process.

FIG. 2 shows a specific embodiment of thin film fabrication using the method in FIG. 1 . Wherein, Fig. 2 a is a state diagram when a stripping mask layer is provided, Fig. 2 b is a state diagram when a black matrix layer is coated on the respective surfaces of the buffer layer and the stripping mask layer, and Fig. 2c is a stripping mask State diagram after layers have been stripped away.

Please refer to Figures 2a, 2b and 2c. First, a glass substrate 10 and a buffer layer 20 are provided in sequence, and the buffer layer 20 is located above the glass substrate 10 . Then, a peeling mask layer 30 is provided on the buffer layer 20, and the peeling mask layer 30 at least covers the display area of the touch panel, and the state at this time is shown in FIG. 2a.

Then, a black matrix layer of an inorganic material is coated on the respective surfaces of the buffer layer 20 and the peeling mask layer 30, as shown in FIG. The buffer layer, and the black matrix 402 is located on the stripping mask layer 30 . Finally, the stripping mask layer 30 is peeled off to form a patterned black matrix layer. As shown in FIG. peel off.

FIG. 3 shows another specific embodiment of thin film fabrication using the method in FIG. 1 . Wherein, Fig. 3 a is a state diagram when a peeling mask layer is provided, and Fig. 3 b is a state diagram when a black matrix layer, a second buffer layer and a metal layer are sequentially coated on the respective surfaces of the buffer layer and the peeling mask layer , and FIG. 3c is a state diagram after the stripping mask layer is peeled off.

Please refer to Figures 3a, 3b and 3c. First, a glass substrate 10 and a buffer layer 20 are provided in sequence, and the buffer layer 20 is located above the glass substrate 10 . Then, a peeling mask layer 30 is provided on the buffer layer 20, and the peeling mask layer 30 at least covers the display area of the touch panel, the state at this time is shown in FIG. 3a.

Then, a black matrix layer of an inorganic material is coated on the respective surfaces of the buffer layer 20 and the peeling mask layer 30, as shown in FIG. The buffer layer, and the black matrix 402 is located on the stripping mask layer 30 . Next, a second buffer layer is deposited on the upper surfaces of the black matrices 401 , 402 and 403 respectively. For example, a part of the second buffer layer (marked 501 ) is deposited on the black matrix 401 , a part of the second buffer layer (marked 503 ) is deposited on the black matrix 403 , and then a metal layer is respectively deposited on the upper surface of the second buffer layer. For example, a part of the metal layer is deposited on the second buffer layer 501 (marked 601 ), a part of the metal layer is deposited on the second buffer layer 502 (marked 602 ), and a part of the metal layer is deposited on the second buffer layer 503 (marked 603 ). Finally, the stripping mask layer 30 is peeled off to form a patterned black matrix layer. As shown in FIG. And the metal layer is also peeled off. Since the second buffer layer and the metal layer are also deposited on the black matrix layer, the etching time of the buffer layer can be shortened and the process efficiency can be improved.

In a specific embodiment, the metal layer is a transparent electrode layer. Preferably, the transparent electrode layer is made of indium tin oxide (ITO) or indium zinc oxide (IZO).

Using the method for patterning the black matrix of the touch panel of the present invention, a peeling mask layer is arranged above the buffer layer, so that the peeling mask layer covers the display area of the touch panel, and then an inorganic The black matrix layer of the material is on the surface of the buffer layer and the surface of the peeling mask layer, so that a patterned black matrix layer is formed after peeling off the peeling mask layer. Compared with the black matrix layer of organic material, the black matrix layer of inorganic material will not peel off. In addition, another buffer layer and a metal layer can be sequentially deposited on the black matrix layer, thereby reducing the etching time of the buffer layer.

Hereinbefore, specific embodiments of the present invention have been described with reference to the accompanying drawings. However, those skilled in the art can understand that without departing from the spirit and scope of the present invention, various changes and substitutions can be made to the specific embodiments of the present invention. These changes and substitutions all fall within the scope defined by the claims of the present invention.

Claims (5)

1. A method for patterning a black matrix in a touch panel, characterized in that the method may further comprise the steps: providing a glass substrate and a buffer layer, the buffer layer being located above the glass substrate; providing a peeling mask layer above the buffer layer, wherein the peeling mask layer covers the display area of the touch panel; coating a black matrix layer of inorganic material on the respective surfaces of the buffer layer and the stripping mask layer; and peeling off the stripping mask layer to form a patterned black matrix layer. 2. method according to claim 1, is characterized in that, also comprises after the step of above-mentioned coating black matrix layer: providing a second buffer layer above the black matrix layer; and Coating a metal layer on the upper surface of the second buffer layer. 3. The method according to claim 2, wherein the metal layer is a transparent electrode layer. 4. The method according to claim 3, wherein the transparent electrode layer is made of indium tin oxide (ITO) or indium zinc oxide (IZO) material. 5. The method according to claim 1, characterized in that, the touch panel is manufactured using an OGS (One Glass Solution) process.

Images