JP2002200854A - 無処理平版印刷版 - Google Patents

無処理平版印刷版

Info

Publication number: JP2002200854A
Authority: JP; Japan
Prior art keywords: hydrophilic; layer; material according; lithographic; plate
Prior art date: 2000-11-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP2001353251A

Other languages

English (en)

Japanese (ja)

Inventor

Damme Marc Van

マルク・バン・ダメ

Wim Sap

ウイム・サプ

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Agfa Gevaert NV

Original Assignee

Agfa Gevaert NV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-11-21

Filing date

2001-11-19

Publication date

2002-07-16

2001-11-19 Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV

2002-07-16 Publication of JP2002200854A publication Critical patent/JP2002200854A/ja

Status Pending legal-status Critical Current

Links

238000007639 printing Methods 0.000 title claims abstract description 59
239000000463 material Substances 0.000 claims abstract description 38
230000005660 hydrophilic surface Effects 0.000 claims abstract description 7
229910052723 transition metal Inorganic materials 0.000 claims abstract description 7
150000003624 transition metals Chemical class 0.000 claims abstract description 7
150000007524 organic acids Chemical class 0.000 claims abstract description 4
229910052782 aluminium Inorganic materials 0.000 claims description 15
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
238000003384 imaging method Methods 0.000 claims description 13
239000011230 binding agent Substances 0.000 claims description 11
238000000034 method Methods 0.000 claims description 11
239000011248 coating agent Substances 0.000 claims description 10
238000000576 coating method Methods 0.000 claims description 10
150000001875 compounds Chemical class 0.000 claims description 5
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
239000006229 carbon black Substances 0.000 claims description 4
238000004519 manufacturing process Methods 0.000 claims description 4
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
229910052804 chromium Inorganic materials 0.000 claims description 3
239000011651 chromium Substances 0.000 claims description 3
229910052710 silicon Inorganic materials 0.000 claims description 3
239000010703 silicon Substances 0.000 claims description 3
229910052688 Gadolinium Inorganic materials 0.000 claims description 2
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
229910052787 antimony Inorganic materials 0.000 claims description 2
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
229910052785 arsenic Inorganic materials 0.000 claims description 2
RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 2
229910052790 beryllium Inorganic materials 0.000 claims description 2
ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 2
229910052797 bismuth Inorganic materials 0.000 claims description 2
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 2
229910052732 germanium Inorganic materials 0.000 claims description 2
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
239000010439 graphite Substances 0.000 claims description 2
229910002804 graphite Inorganic materials 0.000 claims description 2
229910052738 indium Inorganic materials 0.000 claims description 2
APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
229910052749 magnesium Inorganic materials 0.000 claims description 2
239000011777 magnesium Substances 0.000 claims description 2
229910052714 tellurium Inorganic materials 0.000 claims description 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 2
229910052718 tin Inorganic materials 0.000 claims description 2
229910052719 titanium Inorganic materials 0.000 claims description 2
239000010936 titanium Substances 0.000 claims description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims 1
230000035945 sensitivity Effects 0.000 abstract description 4
239000010410 layer Substances 0.000 description 69
239000000243 solution Substances 0.000 description 24
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
239000000976 ink Substances 0.000 description 12
239000002245 particle Substances 0.000 description 12
239000000203 mixture Substances 0.000 description 9
238000011282 treatment Methods 0.000 description 9
229920001577 copolymer Polymers 0.000 description 8
-1 borides Chemical class 0.000 description 7
239000008119 colloidal silica Substances 0.000 description 7
229920002451 polyvinyl alcohol Polymers 0.000 description 7
239000004372 Polyvinyl alcohol Substances 0.000 description 6
239000002253 acid Substances 0.000 description 6
229920000642 polymer Polymers 0.000 description 6
239000000126 substance Substances 0.000 description 6
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
239000000020 Nitrocellulose Substances 0.000 description 5
FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 5
239000008367 deionised water Substances 0.000 description 5
229910021641 deionized water Inorganic materials 0.000 description 5
239000006185 dispersion Substances 0.000 description 5
239000000975 dye Substances 0.000 description 5
229920001220 nitrocellulos Polymers 0.000 description 5
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
239000007864 aqueous solution Substances 0.000 description 4
239000011888 foil Substances 0.000 description 4
150000003839 salts Chemical class 0.000 description 4
JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
238000002679 ablation Methods 0.000 description 3
229940048053 acrylate Drugs 0.000 description 3
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
230000002209 hydrophobic effect Effects 0.000 description 3
JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 3
239000000049 pigment Substances 0.000 description 3
229920006255 plastic film Polymers 0.000 description 3
239000002985 plastic film Substances 0.000 description 3
229920002689 polyvinyl acetate Polymers 0.000 description 3
239000011118 polyvinyl acetate Substances 0.000 description 3
239000000377 silicon dioxide Substances 0.000 description 3
239000000758 substrate Substances 0.000 description 3
229920002554 vinyl polymer Polymers 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
241000282461 Canis lupus Species 0.000 description 2
229920003270 Cymel® Polymers 0.000 description 2
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
229910010413 TiO 2 Inorganic materials 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 2
239000000619 acesulfame-K Substances 0.000 description 2
150000001299 aldehydes Chemical class 0.000 description 2
150000001735 carboxylic acids Chemical class 0.000 description 2
229920002301 cellulose acetate Polymers 0.000 description 2
239000000460 chlorine Substances 0.000 description 2
238000011109 contamination Methods 0.000 description 2
230000007547 defect Effects 0.000 description 2
230000004069 differentiation Effects 0.000 description 2
LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
150000004679 hydroxides Chemical class 0.000 description 2
239000007788 liquid Substances 0.000 description 2
229910044991 metal oxide Inorganic materials 0.000 description 2
150000004706 metal oxides Chemical class 0.000 description 2
235000005985 organic acids Nutrition 0.000 description 2
229920005575 poly(amic acid) Polymers 0.000 description 2
229920000728 polyester Polymers 0.000 description 2
239000004848 polyfunctional curative Substances 0.000 description 2
230000001737 promoting effect Effects 0.000 description 2
239000002344 surface layer Substances 0.000 description 2
LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
239000004408 titanium dioxide Substances 0.000 description 2
229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 1
OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
229920000742 Cotton Polymers 0.000 description 1
239000004971 Cross linker Substances 0.000 description 1
101150000715 DA18 gene Proteins 0.000 description 1
101100321670 Fagopyrum esculentum FA18 gene Proteins 0.000 description 1
108010010803 Gelatin Proteins 0.000 description 1
229920000084 Gum arabic Polymers 0.000 description 1
WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
229920000877 Melamine resin Polymers 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
229920000881 Modified starch Polymers 0.000 description 1
235000021360 Myristic acid Nutrition 0.000 description 1
TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
GXCLVBGFBYZDAG-UHFFFAOYSA-N N-[2-(1H-indol-3-yl)ethyl]-N-methylprop-2-en-1-amine Chemical compound CN(CCC1=CNC2=C1C=CC=C2)CC=C GXCLVBGFBYZDAG-UHFFFAOYSA-N 0.000 description 1
229910002651 NO3 Inorganic materials 0.000 description 1
ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
239000002202 Polyethylene glycol Substances 0.000 description 1
239000004642 Polyimide Substances 0.000 description 1
239000004793 Polystyrene Substances 0.000 description 1
229920001328 Polyvinylidene chloride Polymers 0.000 description 1
241000978776 Senegalia senegal Species 0.000 description 1
239000004115 Sodium Silicate Substances 0.000 description 1
229920002125 Sokalan® Polymers 0.000 description 1
235000021355 Stearic acid Nutrition 0.000 description 1
BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
229920004482 WACKER® Polymers 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
235000010489 acacia gum Nutrition 0.000 description 1
239000000205 acacia gum Substances 0.000 description 1
DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
150000001241 acetals Chemical class 0.000 description 1
ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
150000001408 amides Chemical group 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
229940092714 benzenesulfonic acid Drugs 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
230000001680 brushing effect Effects 0.000 description 1
125000005587 carbonate group Chemical group 0.000 description 1
150000004649 carbonic acid derivatives Chemical class 0.000 description 1
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
239000001768 carboxy methyl cellulose Substances 0.000 description 1
235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
239000008112 carboxymethyl-cellulose Substances 0.000 description 1
239000005018 casein Substances 0.000 description 1
BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
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239000007795 chemical reaction product Substances 0.000 description 1
239000003153 chemical reaction reagent Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
229910052801 chlorine Inorganic materials 0.000 description 1
150000001844 chromium Chemical class 0.000 description 1
239000000084 colloidal system Substances 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
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238000004132 cross linking Methods 0.000 description 1
238000013016 damping Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000010017 direct printing Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
OJCSPXHYDFONPU-UHFFFAOYSA-N etoac etoac Chemical compound CCOC(C)=O.CCOC(C)=O OJCSPXHYDFONPU-UHFFFAOYSA-N 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
239000012530 fluid Substances 0.000 description 1
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235000019322 gelatine Nutrition 0.000 description 1
235000011852 gelatine desserts Nutrition 0.000 description 1
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FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
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125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
229920001480 hydrophilic copolymer Polymers 0.000 description 1
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229910001506 inorganic fluoride Inorganic materials 0.000 description 1
230000031700 light absorption Effects 0.000 description 1
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
150000001247 metal acetylides Chemical class 0.000 description 1
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
YACKEPLHDIMKIO-UHFFFAOYSA-N methylphosphonic acid Chemical compound CP(O)(O)=O YACKEPLHDIMKIO-UHFFFAOYSA-N 0.000 description 1
235000019426 modified starch Nutrition 0.000 description 1
DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
150000004767 nitrides Chemical class 0.000 description 1
229920003986 novolac Polymers 0.000 description 1
QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
238000007645 offset printing Methods 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
229950005308 oxymethurea Drugs 0.000 description 1
150000003014 phosphoric acid esters Chemical class 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
239000004584 polyacrylic acid Substances 0.000 description 1
229920001281 polyalkylene Polymers 0.000 description 1
229920000767 polyaniline Polymers 0.000 description 1
229920006289 polycarbonate film Polymers 0.000 description 1
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229920001223 polyethylene glycol Polymers 0.000 description 1
229920006290 polyethylene naphthalate film Polymers 0.000 description 1
229920000139 polyethylene terephthalate Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
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229920001228 polyisocyanate Polymers 0.000 description 1
239000005056 polyisocyanate Substances 0.000 description 1
229920000128 polypyrrole Polymers 0.000 description 1
229920002223 polystyrene Polymers 0.000 description 1
229920000123 polythiophene Polymers 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
229920001447 polyvinyl benzene Polymers 0.000 description 1
229920000915 polyvinyl chloride Polymers 0.000 description 1
239000004800 polyvinyl chloride Substances 0.000 description 1
239000005033 polyvinylidene chloride Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
DOKHEARVIDLSFF-UHFFFAOYSA-N prop-1-en-1-ol Chemical group CC=CO DOKHEARVIDLSFF-UHFFFAOYSA-N 0.000 description 1
230000005855 radiation Effects 0.000 description 1
238000009877 rendering Methods 0.000 description 1
230000002940 repellent Effects 0.000 description 1
239000005871 repellent Substances 0.000 description 1
235000010413 sodium alginate Nutrition 0.000 description 1
239000000661 sodium alginate Substances 0.000 description 1
229940005550 sodium alginate Drugs 0.000 description 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
229910052911 sodium silicate Inorganic materials 0.000 description 1
239000008117 stearic acid Substances 0.000 description 1
150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1
238000010626 work up procedure Methods 0.000 description 1
239000004246 zinc acetate Substances 0.000 description 1
229910052726 zirconium Inorganic materials 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation

Landscapes

Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Thermal Sciences (AREA)
Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Printing Plates And Materials Therefor (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Manufacture Or Reproduction Of Printing Formes (AREA)

JP2001353251A 2000-11-21 2001-11-19 無処理平版印刷版 Pending JP2002200854A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
EP20000204092 EP1208973B1 (de)	2000-11-21	2000-11-21	Verarbeitungsfreie Flachdruckplatte
EP00204092.1		2000-11-21

Publications (1)

Publication Number	Publication Date
JP2002200854A true JP2002200854A (ja)	2002-07-16

Family

ID=8172290

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2001353251A Pending JP2002200854A (ja)	2000-11-21	2001-11-19	無処理平版印刷版

Country Status (3)

Country	Link
EP (1)	EP1208973B1 (de)
JP (1)	JP2002200854A (de)
DE (1)	DE60010283T2 (de)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0967077B1 (de) *	1998-06-26	2003-08-20	Agfa-Gevaert	Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung von Flachdruckformen damit

2000
- 2000-11-21 DE DE2000610283 patent/DE60010283T2/de not_active Expired - Lifetime
- 2000-11-21 EP EP20000204092 patent/EP1208973B1/de not_active Expired - Lifetime
2001
- 2001-11-19 JP JP2001353251A patent/JP2002200854A/ja active Pending

Also Published As

Publication number	Publication date
DE60010283D1 (de)	2004-06-03
EP1208973A1 (de)	2002-05-29
DE60010283T2 (de)	2005-05-19
EP1208973B1 (de)	2004-04-28

Publication	Publication Date	Title
EP0931647B1 (de)	2003-04-02	Wärmeempfindliches Aufzeichnungselement und Verfahren um damit Flachdruckplatten herzustellen
EP1088653B1 (de)	2005-11-23	Infrarotlaser-bebilderbare Flachdruckplatte und Verfahren zu ihrer Herstellung
EP0816070B1 (de)	2000-10-18	Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer lithographischen Druckform damit
US6197478B1 (en)	2001-03-06	Method for making a driographic printing plate involving the use of a heat-sensitive imaging element
US6210857B1 (en)	2001-04-03	Heat sensitive imaging element for providing a lithographic printing plate
EP0832739B1 (de)	2001-06-20	Verfahren zur Herstellung einer lithographischen Druckplatte unter Verwendung eines wärme-empfindlichen Materials
EP0960730B1 (de)	2003-07-02	Wärmeempfindliches Aufzeichnungselement zur Herstellung lithographischer Druckplatten
JP4257878B2 (ja)	2009-04-22	画像及び非画像領域の間の色素濃度における差を有する平版印刷版を与えるための感熱性非−融蝕性で廃棄物のない画像形成要素
US6511782B1 (en)	2003-01-28	Heat sensitive element and a method for producing lithographic plates therewith
US6620573B2 (en)	2003-09-16	Processless lithographic printing plate
JPH10329440A (ja)	1998-12-15	感熱性画像形成要素及びそれを用いて平版印刷版を作製するための方法
US6790595B2 (en)	2004-09-14	Processless lithographic printing plate
EP0967077B1 (de)	2003-08-20	Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung von Flachdruckformen damit
EP1065049B1 (de)	2004-11-10	Wärmeempfindliches Aufzeichnungselement mit einer Deckschicht zur Herstellung lithographischer Druckplatten
EP1208973B1 (de)	2004-04-28	Verarbeitungsfreie Flachdruckplatte
EP1065053B1 (de)	2004-02-04	Verarbeitungsfreie Flachdruckplatte mit niedrigem anorganisches Pigment/Härter Verhältnis
EP1065052B1 (de)	2004-02-04	Verarbeitungsfreie Flachdruckplatte mit hohem anorganisches Pigment/Härter Verhältnis
EP1065051B1 (de)	2003-10-08	Verarbeitungsfreie Flachdruckplatte mit einer Deckschicht die kationische Gruppen enthaltende Verbindungen enthält
EP1065050B1 (de)	2004-02-04	Verarbeitungsfreie Flachdruckplatte mit einer dünnen oleophilen Schicht
US6555285B1 (en)	2003-04-29	Processless printing plate with low ratio of an inorganic pigment over hardener
EP1208974B1 (de)	2007-06-13	Verarbeitungsfreie Flachdruckplatte
US6576395B1 (en)	2003-06-10	Processless printing plate with high ratio of inorganic pigment over hardener in a hydrophilic layer
US6503684B1 (en)	2003-01-07	Processless thermal printing plate with cover layer containing compounds with cationic groups
JP2002200855A (ja)	2002-07-16	無処理平版印刷版
JP2000081698A (ja)	2000-03-21	熱的平版印刷版前駆体の作製のための乾式法

Legal Events

Date	Code	Title	Description
2004-09-17	A621	Written request for application examination	Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040916
2006-04-12	A977	Report on retrieval	Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060412
2007-06-05	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070605
2007-11-13	A02	Decision of refusal	Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20071113