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IT1144060B - PROCEDURE FOR THE MATURATION OF POLYAMIC ACIDS OR THEIR SALTS THROUGH ULTRAVIOLET IRRADIATION FOR EXAMPLE FOR THE FORMATION OF IMAGES IN SUBSTRATES AND PRODUCT OBTAINED - Google Patents

PROCEDURE FOR THE MATURATION OF POLYAMIC ACIDS OR THEIR SALTS THROUGH ULTRAVIOLET IRRADIATION FOR EXAMPLE FOR THE FORMATION OF IMAGES IN SUBSTRATES AND PRODUCT OBTAINED

Info

Publication number
IT1144060B
IT1144060B IT48637/80A IT4863780A IT1144060B IT 1144060 B IT1144060 B IT 1144060B IT 48637/80 A IT48637/80 A IT 48637/80A IT 4863780 A IT4863780 A IT 4863780A IT 1144060 B IT1144060 B IT 1144060B
Authority
IT
Italy
Prior art keywords
maturation
substrates
salts
images
procedure
Prior art date
Application number
IT48637/80A
Other languages
Italian (it)
Other versions
IT8048637A0 (en
Inventor
Rama P Samudrala
Robert Richard Rohloff
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/038,061 external-priority patent/US4242437A/en
Priority claimed from US06/120,710 external-priority patent/US4331705A/en
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT8048637A0 publication Critical patent/IT8048637A0/en
Application granted granted Critical
Publication of IT1144060B publication Critical patent/IT1144060B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
IT48637/80A 1979-05-11 1980-05-09 PROCEDURE FOR THE MATURATION OF POLYAMIC ACIDS OR THEIR SALTS THROUGH ULTRAVIOLET IRRADIATION FOR EXAMPLE FOR THE FORMATION OF IMAGES IN SUBSTRATES AND PRODUCT OBTAINED IT1144060B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3806079A 1979-05-11 1979-05-11
US06/038,061 US4242437A (en) 1979-05-11 1979-05-11 Photosensitized polyamic acids curable by exposure to actinic radiation
US06/120,710 US4331705A (en) 1979-05-11 1980-02-11 Curing of polyamic acids or salts thereof by ultraviolet exposure

Publications (2)

Publication Number Publication Date
IT8048637A0 IT8048637A0 (en) 1980-05-09
IT1144060B true IT1144060B (en) 1986-10-29

Family

ID=27365331

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48637/80A IT1144060B (en) 1979-05-11 1980-05-09 PROCEDURE FOR THE MATURATION OF POLYAMIC ACIDS OR THEIR SALTS THROUGH ULTRAVIOLET IRRADIATION FOR EXAMPLE FOR THE FORMATION OF IMAGES IN SUBSTRATES AND PRODUCT OBTAINED

Country Status (6)

Country Link
AU (1) AU534941B2 (en)
BR (1) BR8002860A (en)
DE (1) DE3018069A1 (en)
FR (1) FR2456339B1 (en)
GB (2) GB2053941B (en)
IT (1) IT1144060B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
EP0092524B1 (en) * 1982-04-21 1987-08-12 Ciba-Geigy Ag Radiation-sensible coating composition and its use
EP0315216A3 (en) * 1983-05-18 1991-02-06 Ciba-Geigy Ag Polyimides, process for their preparation and their use
US4657832A (en) * 1983-05-18 1987-04-14 Ciba-Geigy Corporation Photosensitive polymers as coating materials
US4696890A (en) * 1985-04-11 1987-09-29 Ciba-Geigy Corporation Processes for preparing protective coatings and relief structures
EP0200680A3 (en) * 1985-04-11 1988-10-05 Ciba-Geigy Ag Coated material and its use
US7274854B2 (en) 2002-06-27 2007-09-25 Pirelli & C. S.P.A. Polyimide optical waveguides and method for the preparation thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3623870A (en) * 1969-07-22 1971-11-30 Bell Telephone Labor Inc Technique for the preparation of thermally stable photoresist
US3978341A (en) * 1974-04-10 1976-08-31 E. I. Du Pont De Nemours And Company Short wavelength ultraviolet irradiation treatment of polymeric surfaces
CH619250A5 (en) * 1975-12-19 1980-09-15 Ciba Geigy Ag
GB2008784B (en) * 1977-11-17 1982-04-15 Asahi Chemical Ind Heat resistant photoresist composition and process for preparing the same
WO1980000706A1 (en) * 1978-09-29 1980-04-17 Hitachi Ltd Light-sensitive polymer composition

Also Published As

Publication number Publication date
GB2053941A (en) 1981-02-11
GB8302448D0 (en) 1983-03-02
GB2120799B (en) 1984-05-23
BR8002860A (en) 1980-12-23
FR2456339B1 (en) 1986-11-28
DE3018069A1 (en) 1980-11-20
FR2456339A1 (en) 1980-12-05
AU5824980A (en) 1980-11-13
AU534941B2 (en) 1984-02-23
GB2120799A (en) 1983-12-07
GB2053941B (en) 1983-11-16
IT8048637A0 (en) 1980-05-09

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