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AU534941B2 - Curing polyamic acid - Google Patents

Curing polyamic acid

Info

Publication number
AU534941B2
AU534941B2 AU58249/80A AU5824980A AU534941B2 AU 534941 B2 AU534941 B2 AU 534941B2 AU 58249/80 A AU58249/80 A AU 58249/80A AU 5824980 A AU5824980 A AU 5824980A AU 534941 B2 AU534941 B2 AU 534941B2
Authority
AU
Australia
Prior art keywords
polyamic acid
curing
curing polyamic
acid
polyamic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU58249/80A
Other versions
AU5824980A (en
Inventor
Robert Richard Rohloff
Rama P. Samudrala
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/038,061 external-priority patent/US4242437A/en
Priority claimed from US06/120,710 external-priority patent/US4331705A/en
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of AU5824980A publication Critical patent/AU5824980A/en
Application granted granted Critical
Publication of AU534941B2 publication Critical patent/AU534941B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU58249/80A 1979-05-11 1980-05-09 Curing polyamic acid Ceased AU534941B2 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US3806079A 1979-05-11 1979-05-11
US038060 1979-05-11
US06/038,061 US4242437A (en) 1979-05-11 1979-05-11 Photosensitized polyamic acids curable by exposure to actinic radiation
US038061 1979-05-11
US120710 1980-02-11
US06/120,710 US4331705A (en) 1979-05-11 1980-02-11 Curing of polyamic acids or salts thereof by ultraviolet exposure

Related Child Applications (1)

Application Number Title Priority Date Filing Date
AU24639/84A Division AU561038B2 (en) 1979-05-11 1984-02-15 Light sensitive article

Publications (2)

Publication Number Publication Date
AU5824980A AU5824980A (en) 1980-11-13
AU534941B2 true AU534941B2 (en) 1984-02-23

Family

ID=27365331

Family Applications (1)

Application Number Title Priority Date Filing Date
AU58249/80A Ceased AU534941B2 (en) 1979-05-11 1980-05-09 Curing polyamic acid

Country Status (6)

Country Link
AU (1) AU534941B2 (en)
BR (1) BR8002860A (en)
DE (1) DE3018069A1 (en)
FR (1) FR2456339B1 (en)
GB (2) GB2053941B (en)
IT (1) IT1144060B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
DE3372983D1 (en) * 1982-04-21 1987-09-17 Ciba Geigy Ag Radiation-sensible coating composition and its use
US4657832A (en) * 1983-05-18 1987-04-14 Ciba-Geigy Corporation Photosensitive polymers as coating materials
EP0315216A3 (en) * 1983-05-18 1991-02-06 Ciba-Geigy Ag Polyimides, process for their preparation and their use
US4696890A (en) * 1985-04-11 1987-09-29 Ciba-Geigy Corporation Processes for preparing protective coatings and relief structures
EP0200680A3 (en) * 1985-04-11 1988-10-05 Ciba-Geigy Ag Coated material and its use
US7274854B2 (en) 2002-06-27 2007-09-25 Pirelli & C. S.P.A. Polyimide optical waveguides and method for the preparation thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3623870A (en) * 1969-07-22 1971-11-30 Bell Telephone Labor Inc Technique for the preparation of thermally stable photoresist
US3978341A (en) * 1974-04-10 1976-08-31 E. I. Du Pont De Nemours And Company Short wavelength ultraviolet irradiation treatment of polymeric surfaces
CH619250A5 (en) * 1975-12-19 1980-09-15 Ciba Geigy Ag
GB2008784B (en) * 1977-11-17 1982-04-15 Asahi Chemical Ind Heat resistant photoresist composition and process for preparing the same
WO1980000706A1 (en) * 1978-09-29 1980-04-17 Hitachi Ltd Light-sensitive polymer composition

Also Published As

Publication number Publication date
GB8302448D0 (en) 1983-03-02
GB2120799A (en) 1983-12-07
FR2456339A1 (en) 1980-12-05
AU5824980A (en) 1980-11-13
GB2053941B (en) 1983-11-16
IT8048637A0 (en) 1980-05-09
IT1144060B (en) 1986-10-29
GB2053941A (en) 1981-02-11
FR2456339B1 (en) 1986-11-28
GB2120799B (en) 1984-05-23
DE3018069A1 (en) 1980-11-20
BR8002860A (en) 1980-12-23

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