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HK1165661B - 脉冲等离子体装置 - Google Patents

脉冲等离子体装置 Download PDF

Info

Publication number
HK1165661B
HK1165661B HK12106200.9A HK12106200A HK1165661B HK 1165661 B HK1165661 B HK 1165661B HK 12106200 A HK12106200 A HK 12106200A HK 1165661 B HK1165661 B HK 1165661B
Authority
HK
Hong Kong
Prior art keywords
plasma
anode
diameter
channel
cathode
Prior art date
Application number
HK12106200.9A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1165661A1 (zh
Inventor
Nikolay Suslov
Original Assignee
Plasma Surgical, Inc.
Filing date
Publication date
Priority claimed from PCT/EP2007/006939 external-priority patent/WO2009018837A1/en
Application filed by Plasma Surgical, Inc. filed Critical Plasma Surgical, Inc.
Publication of HK1165661A1 publication Critical patent/HK1165661A1/zh
Publication of HK1165661B publication Critical patent/HK1165661B/zh

Links

HK12106200.9A 2012-06-25 脉冲等离子体装置 HK1165661B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2007/006939 WO2009018837A1 (en) 2007-08-06 2007-08-06 Pulsed plasma device and method for generating pulsed plasma

Publications (2)

Publication Number Publication Date
HK1165661A1 HK1165661A1 (zh) 2012-10-05
HK1165661B true HK1165661B (zh) 2017-06-09

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