[go: up one dir, main page]

HK1091271B - 为浸没式光刻提供流体的装置和方法 - Google Patents

为浸没式光刻提供流体的装置和方法 Download PDF

Info

Publication number
HK1091271B
HK1091271B HK06112925.9A HK06112925A HK1091271B HK 1091271 B HK1091271 B HK 1091271B HK 06112925 A HK06112925 A HK 06112925A HK 1091271 B HK1091271 B HK 1091271B
Authority
HK
Hong Kong
Prior art keywords
fluid
porous member
pressure
space
recovery
Prior art date
Application number
HK06112925.9A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1091271A1 (zh
Inventor
Alex Ka Tim Poon
Leonard Wai Fung Kho
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority claimed from PCT/US2004/022915 external-priority patent/WO2005024517A2/en
Publication of HK1091271A1 publication Critical patent/HK1091271A1/zh
Publication of HK1091271B publication Critical patent/HK1091271B/zh

Links

HK06112925.9A 2003-09-03 2004-07-16 为浸没式光刻提供流体的装置和方法 HK1091271B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US50031203P 2003-09-03 2003-09-03
US60/500,312 2003-09-03
US54132904P 2004-02-02 2004-02-02
US60/541,329 2004-02-02
PCT/US2004/022915 WO2005024517A2 (en) 2003-09-03 2004-07-16 Apparatus and method for providing fluid for immersion lithography

Publications (2)

Publication Number Publication Date
HK1091271A1 HK1091271A1 (zh) 2007-01-12
HK1091271B true HK1091271B (zh) 2015-10-09

Family

ID=

Similar Documents

Publication Publication Date Title
EP1660925B1 (en) Apparatus and method for providing fluid for immersion lithography
US8054448B2 (en) Apparatus and method for providing fluid for immersion lithography
HK1238729A1 (zh) 用於回收流体的浸没式光刻设备和方法
HK1238727A1 (zh) 为浸没光刻提供流体的装置和方法
HK1091271B (zh) 为浸没式光刻提供流体的装置和方法
HK1214367B (zh) 为浸没光刻提供流体的装置和方法
CN100394244C (zh) 为浸没光刻提供流体的装置和方法