GB2602119B - A method of producing an electronic device precursor - Google Patents
A method of producing an electronic device precursor Download PDFInfo
- Publication number
- GB2602119B GB2602119B GB2020131.5A GB202020131A GB2602119B GB 2602119 B GB2602119 B GB 2602119B GB 202020131 A GB202020131 A GB 202020131A GB 2602119 B GB2602119 B GB 2602119B
- Authority
- GB
- United Kingdom
- Prior art keywords
- producing
- electronic device
- device precursor
- precursor
- electronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002243 precursor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/0052—Manufacturing aspects; Manufacturing of single devices, i.e. of semiconductor magnetic sensor chips
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/07—Hall effect devices
- G01R33/072—Constructional adaptation of the sensor to specific applications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/01—Manufacture or treatment
- H10D48/031—Manufacture or treatment of three-or-more electrode devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/8303—Diamond
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
- H10D62/882—Graphene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/101—Semiconductor Hall-effect devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N52/00—Hall-effect devices
- H10N52/80—Constructional details
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Carbon And Carbon Compounds (AREA)
- Formation Of Insulating Films (AREA)
- Thin Film Transistor (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2020131.5A GB2602119B (en) | 2020-12-18 | 2020-12-18 | A method of producing an electronic device precursor |
| GBGB2107674.0A GB202107674D0 (en) | 2020-12-18 | 2021-05-28 | Hall sensor |
| GB2109011.3A GB2602174B (en) | 2020-12-18 | 2021-06-23 | Hall sensor |
| US18/258,174 US20240130248A1 (en) | 2020-12-18 | 2021-12-17 | Graphene hall sensor, fabrication and use thereof |
| DE112021006520.3T DE112021006520T5 (en) | 2020-12-18 | 2021-12-17 | GRAPHENE HALL SENSOR, PRODUCTION AND USE THEREOF |
| EP21840905.0A EP4264693A1 (en) | 2020-12-18 | 2021-12-17 | Method of producing a graphene electronic device precursor |
| JP2023537063A JP7693811B2 (en) | 2020-12-18 | 2021-12-17 | Method for producing precursors of electronic devices |
| PCT/EP2021/086642 WO2022129606A1 (en) | 2020-12-18 | 2021-12-17 | Method of producing a graphene electronic device precursor |
| KR1020237024543A KR20230118683A (en) | 2020-12-18 | 2021-12-17 | Methods for fabricating graphene electronic device precursors |
| PCT/EP2021/086593 WO2022129570A1 (en) | 2020-12-18 | 2021-12-17 | Graphene hall sensor, fabrication and use thereof |
| US18/268,567 US20240040937A1 (en) | 2020-12-18 | 2021-12-17 | Method of producing an electronic device precursor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2020131.5A GB2602119B (en) | 2020-12-18 | 2020-12-18 | A method of producing an electronic device precursor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB202020131D0 GB202020131D0 (en) | 2021-02-03 |
| GB2602119A GB2602119A (en) | 2022-06-22 |
| GB2602119B true GB2602119B (en) | 2023-02-15 |
Family
ID=74221422
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2020131.5A Active GB2602119B (en) | 2020-12-18 | 2020-12-18 | A method of producing an electronic device precursor |
| GBGB2107674.0A Ceased GB202107674D0 (en) | 2020-12-18 | 2021-05-28 | Hall sensor |
| GB2109011.3A Active GB2602174B (en) | 2020-12-18 | 2021-06-23 | Hall sensor |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB2107674.0A Ceased GB202107674D0 (en) | 2020-12-18 | 2021-05-28 | Hall sensor |
| GB2109011.3A Active GB2602174B (en) | 2020-12-18 | 2021-06-23 | Hall sensor |
Country Status (1)
| Country | Link |
|---|---|
| GB (3) | GB2602119B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2585842B (en) * | 2019-07-16 | 2022-04-20 | Paragraf Ltd | A method of making graphene structures and devices |
| US12313709B2 (en) | 2021-10-21 | 2025-05-27 | Paragraf Limited | Magnetoresistive sensor |
| GB202115100D0 (en) * | 2021-10-21 | 2021-12-08 | Paragraf Ltd | Magnetoresistive sensor |
| WO2023237561A1 (en) | 2022-06-08 | 2023-12-14 | Paragraf Limited | A thermally stable graphene-containing laminate |
| CN116236206B (en) * | 2023-05-10 | 2023-08-11 | 苏州浪潮智能科技有限公司 | A kind of neural microelectrode and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103985762A (en) * | 2014-03-28 | 2014-08-13 | 中国电子科技集团公司第十三研究所 | Ultra-low ohm contact resistance graphene transistor and preparation method thereof |
-
2020
- 2020-12-18 GB GB2020131.5A patent/GB2602119B/en active Active
-
2021
- 2021-05-28 GB GBGB2107674.0A patent/GB202107674D0/en not_active Ceased
- 2021-06-23 GB GB2109011.3A patent/GB2602174B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103985762A (en) * | 2014-03-28 | 2014-08-13 | 中国电子科技集团公司第十三研究所 | Ultra-low ohm contact resistance graphene transistor and preparation method thereof |
Non-Patent Citations (2)
| Title |
|---|
| Carbon 139, 2018, Ciuk et al, "Thermally activated double-carrier transport in epitaxial graphene on vanadium-compensated 6H-SiC as revealed by Hall effect measurements", pages 776-781. * |
| Journal of the Electron Devices Society, Volume 8, 2020, ASAD et al., "Dependence of High-Frequency Performance of Graphene Field-Effect Transistors", pages 457-464. * |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2602174A (en) | 2022-06-22 |
| GB202020131D0 (en) | 2021-02-03 |
| GB202109011D0 (en) | 2021-08-04 |
| GB202107674D0 (en) | 2021-07-14 |
| GB2602119A (en) | 2022-06-22 |
| GB2602174B (en) | 2023-08-23 |
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