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GB202107674D0 - Hall sensor - Google Patents

Hall sensor

Info

Publication number
GB202107674D0
GB202107674D0 GBGB2107674.0A GB202107674A GB202107674D0 GB 202107674 D0 GB202107674 D0 GB 202107674D0 GB 202107674 A GB202107674 A GB 202107674A GB 202107674 D0 GB202107674 D0 GB 202107674D0
Authority
GB
United Kingdom
Prior art keywords
hall sensor
hall
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB2107674.0A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Paragraf Ltd
Original Assignee
Paragraf Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Paragraf Ltd filed Critical Paragraf Ltd
Priority to GB2109011.3A priority Critical patent/GB2602174B/en
Publication of GB202107674D0 publication Critical patent/GB202107674D0/en
Priority to PCT/EP2021/086642 priority patent/WO2022129606A1/en
Priority to US18/268,567 priority patent/US20240040937A1/en
Priority to EP21840905.0A priority patent/EP4264693A1/en
Priority to PCT/EP2021/086593 priority patent/WO2022129570A1/en
Priority to KR1020237024543A priority patent/KR20230118683A/en
Priority to JP2023537063A priority patent/JP7693811B2/en
Priority to US18/258,174 priority patent/US20240130248A1/en
Priority to DE112021006520.3T priority patent/DE112021006520T5/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/07—Hall effect devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/0052—Manufacturing aspects; Manufacturing of single devices, i.e. of semiconductor magnetic sensor chips
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/07—Hall effect devices
    • G01R33/072—Constructional adaptation of the sensor to specific applications
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/01—Manufacture or treatment
    • H10D48/031—Manufacture or treatment of three-or-more electrode devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/8303—Diamond
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
    • H10D62/882—Graphene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/62—Electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H10N52/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H10N52/101—Semiconductor Hall-effect devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00—Hall-effect devices
    • H10N52/80—Constructional details

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Thin Film Transistor (AREA)
  • Formation Of Insulating Films (AREA)
GBGB2107674.0A 2020-12-18 2021-05-28 Hall sensor Ceased GB202107674D0 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
GB2109011.3A GB2602174B (en) 2020-12-18 2021-06-23 Hall sensor
PCT/EP2021/086642 WO2022129606A1 (en) 2020-12-18 2021-12-17 Method of producing a graphene electronic device precursor
US18/268,567 US20240040937A1 (en) 2020-12-18 2021-12-17 Method of producing an electronic device precursor
EP21840905.0A EP4264693A1 (en) 2020-12-18 2021-12-17 Method of producing a graphene electronic device precursor
PCT/EP2021/086593 WO2022129570A1 (en) 2020-12-18 2021-12-17 Graphene hall sensor, fabrication and use thereof
KR1020237024543A KR20230118683A (en) 2020-12-18 2021-12-17 Methods for fabricating graphene electronic device precursors
JP2023537063A JP7693811B2 (en) 2020-12-18 2021-12-17 Method for producing precursors of electronic devices
US18/258,174 US20240130248A1 (en) 2020-12-18 2021-12-17 Graphene hall sensor, fabrication and use thereof
DE112021006520.3T DE112021006520T5 (en) 2020-12-18 2021-12-17 GRAPHENE HALL SENSOR, PRODUCTION AND USE THEREOF

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2020131.5A GB2602119B (en) 2020-12-18 2020-12-18 A method of producing an electronic device precursor

Publications (1)

Publication Number Publication Date
GB202107674D0 true GB202107674D0 (en) 2021-07-14

Family

ID=74221422

Family Applications (3)

Application Number Title Priority Date Filing Date
GB2020131.5A Active GB2602119B (en) 2020-12-18 2020-12-18 A method of producing an electronic device precursor
GBGB2107674.0A Ceased GB202107674D0 (en) 2020-12-18 2021-05-28 Hall sensor
GB2109011.3A Active GB2602174B (en) 2020-12-18 2021-06-23 Hall sensor

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB2020131.5A Active GB2602119B (en) 2020-12-18 2020-12-18 A method of producing an electronic device precursor

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB2109011.3A Active GB2602174B (en) 2020-12-18 2021-06-23 Hall sensor

Country Status (1)

Country Link
GB (3) GB2602119B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2585842B (en) * 2019-07-16 2022-04-20 Paragraf Ltd A method of making graphene structures and devices
GB202115100D0 (en) * 2021-10-21 2021-12-08 Paragraf Ltd Magnetoresistive sensor
US12313709B2 (en) 2021-10-21 2025-05-27 Paragraf Limited Magnetoresistive sensor
KR20250022791A (en) 2022-06-08 2025-02-17 파라그라프 리미티드 Thermally stable graphene-containing laminates
CN116236206B (en) * 2023-05-10 2023-08-11 苏州浪潮智能科技有限公司 A kind of neural microelectrode and preparation method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103985762B (en) * 2014-03-28 2017-02-01 中国电子科技集团公司第十三研究所 Ultralow ohmic contact resistance graphene transistor and preparation method thereof

Also Published As

Publication number Publication date
GB202020131D0 (en) 2021-02-03
GB2602174A (en) 2022-06-22
GB202109011D0 (en) 2021-08-04
GB2602119B (en) 2023-02-15
GB2602119A (en) 2022-06-22
GB2602174B (en) 2023-08-23

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)