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GB2058142B - Sputtering electrodes - Google Patents

Sputtering electrodes

Info

Publication number
GB2058142B
GB2058142B GB8024998A GB8024998A GB2058142B GB 2058142 B GB2058142 B GB 2058142B GB 8024998 A GB8024998 A GB 8024998A GB 8024998 A GB8024998 A GB 8024998A GB 2058142 B GB2058142 B GB 2058142B
Authority
GB
United Kingdom
Prior art keywords
sputtering electrodes
sputtering
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8024998A
Other versions
GB2058142A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nordiko Ltd
Original Assignee
Nordiko Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordiko Ltd filed Critical Nordiko Ltd
Priority to GB8024998A priority Critical patent/GB2058142B/en
Publication of GB2058142A publication Critical patent/GB2058142A/en
Application granted granted Critical
Publication of GB2058142B publication Critical patent/GB2058142B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB8024998A 1979-07-31 1980-07-31 Sputtering electrodes Expired GB2058142B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8024998A GB2058142B (en) 1979-07-31 1980-07-31 Sputtering electrodes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB7926699 1979-07-31
GB8024998A GB2058142B (en) 1979-07-31 1980-07-31 Sputtering electrodes

Publications (2)

Publication Number Publication Date
GB2058142A GB2058142A (en) 1981-04-08
GB2058142B true GB2058142B (en) 1983-08-10

Family

ID=26272386

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8024998A Expired GB2058142B (en) 1979-07-31 1980-07-31 Sputtering electrodes

Country Status (1)

Country Link
GB (1) GB2058142B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH646459A5 (en) * 1982-03-22 1984-11-30 Balzers Hochvakuum RECTANGULAR TARGET PLATE FOR CATHODE SPRAY PLANTS.
GB8512455D0 (en) * 1985-05-16 1985-06-19 Atomic Energy Authority Uk Coating apparatus
EP0342537B1 (en) * 1988-05-16 1995-09-06 Tosoh Corporation Process for the manufacture of a sputtering target for producing electroconductive transparent films
JP3852967B2 (en) * 1995-07-14 2006-12-06 株式会社アルバック Low pressure sputtering equipment
IL127236A0 (en) * 1997-11-26 1999-09-22 Vapor Technologies Inc Apparatus for sputtering or arc evaporation
CN111876739B (en) * 2020-08-04 2021-12-31 中国科学院兰州化学物理研究所 Wide-surface rectangular cathode target with high utilization rate and method for improving utilization rate thereof

Also Published As

Publication number Publication date
GB2058142A (en) 1981-04-08

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee