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GB1391842A - Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel - Google Patents

Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel

Info

Publication number
GB1391842A
GB1391842A GB1611472A GB1611472A GB1391842A GB 1391842 A GB1391842 A GB 1391842A GB 1611472 A GB1611472 A GB 1611472A GB 1611472 A GB1611472 A GB 1611472A GB 1391842 A GB1391842 A GB 1391842A
Authority
GB
United Kingdom
Prior art keywords
substrates
target
cleaning
electrodes
vacuum vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1611472A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Priority to GB1611472A priority Critical patent/GB1391842A/en
Priority to DE19722221600 priority patent/DE2221600A1/de
Priority to CH853472A priority patent/CH553259A/de
Priority to FR7228084A priority patent/FR2148245B1/fr
Publication of GB1391842A publication Critical patent/GB1391842A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB1611472A 1971-08-04 1972-04-07 Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel Expired GB1391842A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GB1611472A GB1391842A (en) 1971-08-04 1972-04-07 Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel
DE19722221600 DE2221600A1 (de) 1971-08-04 1972-05-03 Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess
CH853472A CH553259A (de) 1971-08-04 1972-06-08 Vorrichtung zum beschichten von substraten durch katodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess.
FR7228084A FR2148245B1 (de) 1971-08-04 1972-08-03

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD15697371 1971-08-04
GB1611472A GB1391842A (en) 1971-08-04 1972-04-07 Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel

Publications (1)

Publication Number Publication Date
GB1391842A true GB1391842A (en) 1975-04-23

Family

ID=25747417

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1611472A Expired GB1391842A (en) 1971-08-04 1972-04-07 Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel

Country Status (4)

Country Link
CH (1) CH553259A (de)
DE (1) DE2221600A1 (de)
FR (1) FR2148245B1 (de)
GB (1) GB1391842A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0034706A3 (en) * 1980-02-08 1981-09-09 Veb Zentrum Fur Forschung Und Technologie Mikroelektronik Process and apparatus for ion etching or for plasma c.v.d.
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering
FR2772185A1 (fr) * 1997-11-26 1999-06-11 Vapor Technologies Inc Cathode de pulverisation cathodique ou d'evaporation par arc et appareil la comportant
EP2081212A1 (de) * 2008-01-16 2009-07-22 Applied Materials, Inc. Doppelbeschichtungsvorrichtung mit einer Prozesskammer
US9175383B2 (en) 2008-01-16 2015-11-03 Applied Materials, Inc. Double-coating device with one process chamber
WO2018010770A1 (en) * 2016-07-12 2018-01-18 Applied Materials, Inc. Sputter deposition source, sputter deposition apparatus and method of operating a sputter deposition source
EP4207245A1 (de) * 2021-12-31 2023-07-05 SPTS Technologies Limited Verfahren zum betreiben eines pvd-gerätes

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371777A1 (fr) * 1976-11-18 1978-06-16 Loic Henry Procede de fabrication d'une barriere de diffusion en nitrure de silicium sur un substrat de semiconducteur, en particulier du type iii-v
GB1570380A (en) * 1978-05-30 1980-07-02 Standard Telephones Cables Ltd Electroless plating
US4194962A (en) * 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
DE3041551A1 (de) * 1980-11-04 1982-06-09 Siemens AG, 1000 Berlin und 8000 München Elektroden fuer plasma-aetzanlage
DE3306738A1 (de) * 1983-02-25 1984-08-30 Berna AG Olten, Olten Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0034706A3 (en) * 1980-02-08 1981-09-09 Veb Zentrum Fur Forschung Und Technologie Mikroelektronik Process and apparatus for ion etching or for plasma c.v.d.
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering
FR2772185A1 (fr) * 1997-11-26 1999-06-11 Vapor Technologies Inc Cathode de pulverisation cathodique ou d'evaporation par arc et appareil la comportant
EP2081212A1 (de) * 2008-01-16 2009-07-22 Applied Materials, Inc. Doppelbeschichtungsvorrichtung mit einer Prozesskammer
US9175383B2 (en) 2008-01-16 2015-11-03 Applied Materials, Inc. Double-coating device with one process chamber
WO2018010770A1 (en) * 2016-07-12 2018-01-18 Applied Materials, Inc. Sputter deposition source, sputter deposition apparatus and method of operating a sputter deposition source
CN109314035A (zh) * 2016-07-12 2019-02-05 应用材料公司 溅射沉积源、溅射沉积设备和操作溅射沉积源的方法
TWI665324B (zh) * 2016-07-12 2019-07-11 應用材料股份有限公司 濺射沉積源、濺射沉積設備及操作濺射沉積源之方法
EP4207245A1 (de) * 2021-12-31 2023-07-05 SPTS Technologies Limited Verfahren zum betreiben eines pvd-gerätes

Also Published As

Publication number Publication date
FR2148245B1 (de) 1976-05-14
FR2148245A1 (de) 1973-03-11
CH553259A (de) 1974-08-30
DE2221600A1 (de) 1973-02-15

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees