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FR2148245B1 - - Google Patents

Info

Publication number
FR2148245B1
FR2148245B1 FR7228084A FR7228084A FR2148245B1 FR 2148245 B1 FR2148245 B1 FR 2148245B1 FR 7228084 A FR7228084 A FR 7228084A FR 7228084 A FR7228084 A FR 7228084A FR 2148245 B1 FR2148245 B1 FR 2148245B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7228084A
Other languages
French (fr)
Other versions
FR2148245A1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of FR2148245A1 publication Critical patent/FR2148245A1/fr
Application granted granted Critical
Publication of FR2148245B1 publication Critical patent/FR2148245B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7228084A 1971-08-04 1972-08-03 Expired FR2148245B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD15697371 1971-08-04
GB1611472A GB1391842A (en) 1971-08-04 1972-04-07 Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel

Publications (2)

Publication Number Publication Date
FR2148245A1 FR2148245A1 (de) 1973-03-11
FR2148245B1 true FR2148245B1 (de) 1976-05-14

Family

ID=25747417

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7228084A Expired FR2148245B1 (de) 1971-08-04 1972-08-03

Country Status (4)

Country Link
CH (1) CH553259A (de)
DE (1) DE2221600A1 (de)
FR (1) FR2148245B1 (de)
GB (1) GB1391842A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371777A1 (fr) * 1976-11-18 1978-06-16 Loic Henry Procede de fabrication d'une barriere de diffusion en nitrure de silicium sur un substrat de semiconducteur, en particulier du type iii-v
GB1570380A (en) * 1978-05-30 1980-07-02 Standard Telephones Cables Ltd Electroless plating
US4194962A (en) * 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
DD153497A3 (de) * 1980-02-08 1982-01-13 Georg Rudakoff Verfahren und vorrichtung zum plasmaaetzen oder zur plasma cvd
DE3041551A1 (de) * 1980-11-04 1982-06-09 Siemens AG, 1000 Berlin und 8000 München Elektroden fuer plasma-aetzanlage
DE3306738A1 (de) * 1983-02-25 1984-08-30 Berna AG Olten, Olten Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung
DE3404880A1 (de) * 1984-02-11 1985-08-14 Glyco-Metall-Werke Daelen & Loos Gmbh, 6200 Wiesbaden Verfahren zum herstellen von schichtwerkstoff oder schichtwerkstuecken
IL127236A0 (en) * 1997-11-26 1999-09-22 Vapor Technologies Inc Apparatus for sputtering or arc evaporation
EP2081212B1 (de) * 2008-01-16 2016-03-23 Applied Materials, Inc. Doppelbeschichtungsvorrichtung mit einer Prozesskammer
US9175383B2 (en) 2008-01-16 2015-11-03 Applied Materials, Inc. Double-coating device with one process chamber
JP6946410B2 (ja) * 2016-07-12 2021-10-06 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ スパッタ堆積源、スパッタ堆積装置及びスパッタ堆積源を操作する方法
GB202119151D0 (en) * 2021-12-31 2022-02-16 Spts Technologies Ltd Method of operating a pvd apparatus

Also Published As

Publication number Publication date
GB1391842A (en) 1975-04-23
FR2148245A1 (de) 1973-03-11
DE2221600A1 (de) 1973-02-15
CH553259A (de) 1974-08-30

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Legal Events

Date Code Title Description
ST Notification of lapse