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GB1394942A - Target changing device for sputtering by means of ions - Google Patents

Target changing device for sputtering by means of ions

Info

Publication number
GB1394942A
GB1394942A GB555673A GB555673A GB1394942A GB 1394942 A GB1394942 A GB 1394942A GB 555673 A GB555673 A GB 555673A GB 555673 A GB555673 A GB 555673A GB 1394942 A GB1394942 A GB 1394942A
Authority
GB
United Kingdom
Prior art keywords
mask
targets
sputtering
carrier
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB555673A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of GB1394942A publication Critical patent/GB1394942A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P72/7618—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H10P72/7621—
    • H10P72/7622—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1394942 Changing targets in sputtering BALZERS PATENT- & BETEILIGUNGS AG 5 Feb 1973 [23 Nov 1972] 5556/73 Heading C7F A target-changing device for sputtering by means of an ion-beam 1 comprises a rotatable carrier 7 for a plurality of targets 11, (12, 13, 14) Fig. lb (not shown), and a mask 2 which has an equal number of openings for exposing each one of the targets in succession to sputtering, the mask being constructed as an ion screening electrode mechanically connected to the carrier and rotatable therewith but electrically insulated therefrom and chargeable to a positive potential relative to the targets. The carrier may be planar as shown, and have disc-like targets, like 11, disposed on its flat surface, or may be a cylinder. Insulator 3 connects mask 2 and carrier 7, which is rotated by drive 8 and gear 9; high voltage supply 5 is connected to 7, and supply 4 to mask 2; a stationary mask 10 may also be provided. Mask 2 may be connected to the anode of the system, or it may be insulated as that ion-impact charges it positively.
GB555673A 1972-11-23 1973-02-05 Target changing device for sputtering by means of ions Expired GB1394942A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1720272A CH558428A (en) 1972-11-23 1972-11-23 TARGET CHANGING DEVICE FOR SPRAYING BY ION.

Publications (1)

Publication Number Publication Date
GB1394942A true GB1394942A (en) 1975-05-21

Family

ID=4423556

Family Applications (1)

Application Number Title Priority Date Filing Date
GB555673A Expired GB1394942A (en) 1972-11-23 1973-02-05 Target changing device for sputtering by means of ions

Country Status (4)

Country Link
US (1) US3853740A (en)
CH (1) CH558428A (en)
FR (1) FR2208185B1 (en)
GB (1) GB1394942A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213838A (en) * 1987-12-23 1989-08-23 Plessey Co Plc Environmental protection of superconducting thin films
GB2228948A (en) * 1989-02-28 1990-09-12 British Aerospace Fabrication of thin films from a composite target

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169031A (en) * 1978-01-13 1979-09-25 Polyohm, Inc. Magnetron sputter cathode assembly
US4282924A (en) * 1979-03-16 1981-08-11 Varian Associates, Inc. Apparatus for mechanically clamping semiconductor wafer against pliable thermally conductive surface
US4239611A (en) * 1979-06-11 1980-12-16 Vac-Tec Systems, Inc. Magnetron sputtering devices
US4574733A (en) * 1982-09-16 1986-03-11 Energy Conversion Devices, Inc. Substrate shield for preventing the deposition of nonhomogeneous films
US4816133A (en) * 1987-05-14 1989-03-28 Northrop Corporation Apparatus for preparing thin film optical coatings on substrates
JPH0733576B2 (en) * 1989-11-29 1995-04-12 株式会社日立製作所 Sputter device, target exchanging device, and exchanging method thereof
DE4040856A1 (en) * 1990-12-20 1992-06-25 Leybold Ag SPRAYING SYSTEM
DE19543375A1 (en) * 1995-11-21 1997-05-22 Leybold Ag Apparatus for coating substrates by magnetron sputtering
US6051113A (en) * 1998-04-27 2000-04-18 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing
WO2001055477A1 (en) * 2000-01-27 2001-08-02 Nikon Corporation Method for preparing film of compound material containing gas forming element
SG90171A1 (en) * 2000-09-26 2002-07-23 Inst Data Storage Sputtering device
US6635154B2 (en) * 2001-11-03 2003-10-21 Intevac, Inc. Method and apparatus for multi-target sputtering
GB0404436D0 (en) * 2004-02-27 2004-03-31 Nanofilm Technologies Int Continuous arc deposition apparatus and method with multiple available targets

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3528906A (en) * 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
US3537973A (en) * 1967-09-15 1970-11-03 Varian Associates Sequential sputtering with movable targets

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213838A (en) * 1987-12-23 1989-08-23 Plessey Co Plc Environmental protection of superconducting thin films
GB2228948A (en) * 1989-02-28 1990-09-12 British Aerospace Fabrication of thin films from a composite target

Also Published As

Publication number Publication date
FR2208185B1 (en) 1977-02-04
US3853740A (en) 1974-12-10
FR2208185A1 (en) 1974-06-21
CH558428A (en) 1975-01-31

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee