FI900124L - Nya flerfunktionella a-diazo-b-ketoestrar, foerfarande foer deras framstaellning och deras anvaending. - Google Patents

Nya flerfunktionella a-diazo-b-ketoestrar, foerfarande foer deras framstaellning och deras anvaending. Download PDF

Info

Publication number: FI900124L
Authority: FI; Finland
Prior art keywords: deras; ketoestrar; anvaending; fler; diazo
Prior art date: 1989-01-12

Application number

FI900124A

Other languages

English (en)

Other versions

FI900124A7 (fi

FI900124A0 (fi

Inventor

Peter Wilharm

Hans-Joachim Merrem

Georg Pawlowski

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-01-12

Filing date

1990-01-10

Publication date

1990-07-13

1990-01-10 Application filed by Hoechst Ag filed Critical Hoechst Ag

1990-01-10 Publication of FI900124A0 publication Critical patent/FI900124A0/fi

1990-07-13 Publication of FI900124A7 publication Critical patent/FI900124A7/fi

1990-07-13 Publication of FI900124L publication Critical patent/FI900124L/fi

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C245/00—Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond
- C07C245/12—Diazo compounds, i.e. compounds having the free valencies of >N2 groups attached to the same carbon atom
- C07C245/14—Diazo compounds, i.e. compounds having the free valencies of >N2 groups attached to the same carbon atom having diazo groups bound to acyclic carbon atoms of a carbon skeleton
- C07C245/18—Diazo compounds, i.e. compounds having the free valencies of >N2 groups attached to the same carbon atom having diazo groups bound to acyclic carbon atoms of a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Materials For Photolithography (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Polymerisation Methods In General (AREA)
Indole Compounds (AREA)

FI900124A 1989-01-12 1990-01-10 Nya flerfunktionella a-diazo-b-ketoestrar, foerfarande foer deras framstaellning och deras anvaending. FI900124L (fi)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE3900735A DE3900735A1 (de)	1989-01-12	1989-01-12	Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung
DE3900736A DE3900736A1 (de)	1989-01-12	1989-01-12	Positiv arbeitendes strahlungsempfindliches gemisch enthaltend einen mehrfunktionellen (alpha)-diazo-(beta)-ketoester, verfahren zu dessen herstellung und strahlungsempfindliches aufzeichnungsmaterial enthaltend dieses gemisch

Publications (3)

Publication Number	Publication Date
FI900124A0 FI900124A0 (fi)	1990-01-10
FI900124A7 FI900124A7 (fi)	1990-07-13
FI900124L true FI900124L (fi)	1990-07-13

Family

ID=39712381

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
FI900124A FI900124L (fi)	1989-01-12	1990-01-10	Nya flerfunktionella a-diazo-b-ketoestrar, foerfarande foer deras framstaellning och deras anvaending.
FI900125A FI900125A7 (fi)	1989-01-12	1990-01-10	Positivt arbetande straolningskaenslig blandning innehaollande en flerfunktionell a-diazo-b-ketoester, foerfarande foer dess framstaellning och staolningskaensligt registreringsmaterial som innehaoller denna blandning.

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
FI900125A FI900125A7 (fi)	1989-01-12	1990-01-10	Positivt arbetande straolningskaenslig blandning innehaollande en flerfunktionell a-diazo-b-ketoester, foerfarande foer dess framstaellning och staolningskaensligt registreringsmaterial som innehaoller denna blandning.

Country Status (9)

Country	Link
US (2)	US5198322A (fi)
EP (2)	EP0378067B1 (fi)
JP (2)	JP2740321B2 (fi)
AU (2)	AU626966B2 (fi)
BR (2)	BR9000116A (fi)
CA (2)	CA2007546A1 (fi)
DE (2)	DE3900735A1 (fi)
FI (2)	FI900124L (fi)
ZA (2)	ZA90168B (fi)

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* Cited by examiner, † Cited by third party
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DE3900735A1 (de) *	1989-01-12	1990-07-26	Hoechst Ag	Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung
US5202217A (en) *	1989-08-08	1993-04-13	Tosoh Corporation	Solubilization-inhibitor and positive resist composition
DE3930086A1 (de) *	1989-09-09	1991-03-21	Hoechst Ag	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) *	1989-09-09	1991-03-14	Hoechst Ag	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5583198A (en) *	1989-12-22	1996-12-10	Commonwealth Scientific And Industrial Research Organization	Amino acids, peptides or derivatives thereof coupled to fats
DE4004719A1 (de) *	1990-02-15	1991-08-22	Hoechst Ag	Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4006190A1 (de) *	1990-02-28	1991-08-29	Hoechst Ag	Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4014648A1 (de) *	1990-05-08	1991-11-14	Hoechst Ag	Positiv arbeitendes strahlungsempfindiches gemisch und strahlungsempfindliches aufzeichnungsmaterial fuer die belichtung mit duv-strahlung
DE4014649A1 (de) *	1990-05-08	1991-11-14	Hoechst Ag	Neue mehrfunktionelle verbindungen mit (alpha)-diazo-ss-ketoester- und sulfonsaeureester-einheiten, verfahren zu ihrer herstellung und deren verwendung
DE4106357A1 (de) *	1991-02-28	1992-09-03	Hoechst Ag	Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE69218393T2 (de) *	1991-12-16	1997-10-16	Matsushita Electric Ind Co Ltd	Resistmaterial
FR2692891B1 (fr) *	1992-06-25	1994-10-14	Hoechst France	Tris (acétoacétoxy-2-éthyl)-amine, et ses sels hydrosolubles, procédé de préparation, application à titre de capteurs de formaldéhyde et procédé d'ennoblissement de tissus.
JPH0643636A (ja) *	1992-07-22	1994-02-18	Fuji Photo Film Co Ltd	感光性平版印刷版
GB9407511D0 (en) *	1994-04-15	1994-06-08	Smithkline Beecham Corp	Compounds
US5691098A (en) *	1996-04-03	1997-11-25	Minnesota Mining And Manufacturing Company	Laser-Induced mass transfer imaging materials utilizing diazo compounds
US6153733A (en) *	1998-05-18	2000-11-28	Tokyo Ohka Kogyo Co., Ltd.	(Disulfonyl diazomethane compounds)
AT408866B (de)	2000-03-17	2002-03-25	Goldmann Norbert	Streugerät
US7022452B2 (en) *	2002-09-04	2006-04-04	Agilent Technologies, Inc.	Contrast enhanced photolithography
KR100843147B1 (ko) *	2007-02-12	2008-07-03	삼성전자주식회사	올리고머 프로브 어레이용 기판과 올리고머 프로브 어레이및 이들의 제조 방법
KR20110059471A (ko) *	2009-11-27	2011-06-02	삼성전자주식회사	포토레지스트 조성물, 이를 이용한 패턴의 형성방법 및 반도체 장치의 제조방법
AP2015008510A0 (en)	2012-12-21	2015-06-30	Gilead Sciences Inc	Polycyclic-carbamoylpyridone compounds and their pharmaceutical use
PL3252058T3 (pl)	2013-07-12	2021-07-19	Gilead Sciences, Inc.	Policykliczne związki karbamoilopirydonowe i ich zastosowanie do leczenia infekcji hiv
NO2865735T3 (fi)	2013-07-12	2018-07-21
NO2717902T3 (fi)	2014-06-20	2018-06-23
TWI677489B (zh)	2014-06-20	2019-11-21	美商基利科學股份有限公司	多環型胺甲醯基吡啶酮化合物之合成
TW201613936A (en)	2014-06-20	2016-04-16	Gilead Sciences Inc	Crystalline forms of(2R,5S,13aR)-8-hydroxy-7,9-dioxo-n-(2,4,6-trifluorobenzyl)-2,3,4,5,7,9,13,13a-octahydro-2,5-methanopyrido[1',2':4,5]pyrazino[2,1-b][1,3]oxazepine-10-carboxamide
CN110386883B (zh) *	2019-08-11	2020-05-12	西南石油大学	一种致密油气藏开采用超临界二氧化碳稠化剂的制备方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3226381A (en) *	1964-07-06	1965-12-28	Hercules Powder Co Ltd	Poly (alpha-diazoalkanoates)
US4163106A (en) *	1976-02-25	1979-07-31	Sagami Chemical Research Center	Prostaglandin precursors and processes for preparing the same
US4339522A (en) *	1979-06-18	1982-07-13	International Business Machines Corporation	Ultra-violet lithographic resist composition and process
DE3246037A1 (de) *	1982-12-09	1984-06-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
US4522911A (en) *	1983-06-28	1985-06-11	International Business Machines Corporation	Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
US4622283A (en) *	1983-10-07	1986-11-11	J. T. Baker Chemical Company	Deep ultra-violet lithographic resist composition and process of using
US4626491A (en) *	1983-10-07	1986-12-02	J. T. Baker Chemical Company	Deep ultra-violet lithographic resist composition and process of using
US4601969A (en) *	1985-03-28	1986-07-22	International Business Machines Corporation	High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
US4624908A (en) *	1985-04-15	1986-11-25	J. T. Baker Chemical Company	Deep ultra-violet lithographic resist composition and process of using
US4735885A (en) *	1985-12-06	1988-04-05	Allied Corporation	Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
US4752551A (en) *	1986-10-02	1988-06-21	J. T. Baker Inc.	Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions
JPH07117750B2 (ja) *	1987-09-24	1995-12-18	株式会社日立製作所	感光性樹脂組成物
JPH01154047A (ja) *	1987-12-10	1989-06-16	Toshiba Corp	感光性組成物
DE3841571A1 (de) *	1987-12-10	1989-06-29	Toshiba Kawasaki Kk	Lichtempfindliche masse
JPH01241544A (ja) *	1988-03-23	1989-09-26	Toshiba Corp	感光性組成物
JPH01154048A (ja) *	1987-12-10	1989-06-16	Toshiba Corp	感光性組成物
JPH01231039A (ja) *	1988-03-11	1989-09-14	Oki Electric Ind Co Ltd	光脱色性層用材料及びそれを用いたパターン形成方法
JPH01265066A (ja) *	1988-04-15	1989-10-23	Hitachi Ltd	α−ジアゾアセト酢酸エステル及びその製造方法
JPH01300248A (ja) *	1988-05-30	1989-12-04	Tosoh Corp	フォトレジスト組成物
JP2719640B2 (ja) *	1988-06-30	1998-02-25	日本合成ゴム株式会社	ポジ型感放射線樹脂組成物
US4965167A (en) *	1988-11-10	1990-10-23	Olin Hunt Specialty Products, Inc.	Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
DE3900735A1 (de) *	1989-01-12	1990-07-26	Hoechst Ag	Neue mehrfunktionelle (alpha)-diazo-(beta)-ketoester, verfahren zu ihrer herstellung und deren verwendung

1989
- 1989-01-12 DE DE3900735A patent/DE3900735A1/de not_active Withdrawn
- 1989-01-12 DE DE3900736A patent/DE3900736A1/de not_active Withdrawn
1990
- 1990-01-02 EP EP90100003A patent/EP0378067B1/de not_active Expired - Lifetime
- 1990-01-02 EP EP90100004A patent/EP0378068B1/de not_active Expired - Lifetime
- 1990-01-10 FI FI900124A patent/FI900124L/fi not_active IP Right Cessation
- 1990-01-10 FI FI900125A patent/FI900125A7/fi not_active IP Right Cessation
- 1990-01-10 ZA ZA90168A patent/ZA90168B/xx unknown
- 1990-01-10 ZA ZA90169A patent/ZA90169B/xx unknown
- 1990-01-11 AU AU47891/90A patent/AU626966B2/en not_active Ceased
- 1990-01-11 CA CA002007546A patent/CA2007546A1/en not_active Abandoned
- 1990-01-11 CA CA002007547A patent/CA2007547A1/en not_active Abandoned
- 1990-01-11 AU AU47892/90A patent/AU627265B2/en not_active Ceased
- 1990-01-12 US US07/466,007 patent/US5198322A/en not_active Expired - Fee Related
- 1990-01-12 US US07/464,003 patent/US4996301A/en not_active Expired - Fee Related
- 1990-01-12 BR BR909000116A patent/BR9000116A/pt unknown
- 1990-01-12 BR BR909000110A patent/BR9000110A/pt not_active Application Discontinuation
- 1990-01-12 JP JP2006036A patent/JP2740321B2/ja not_active Expired - Lifetime
- 1990-01-12 JP JP2006037A patent/JP2839610B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
FI900125A7 (fi)	1990-07-13
DE3900735A1 (de)	1990-07-26
JP2740321B2 (ja)	1998-04-15
US4996301A (en)	1991-02-26
CA2007547A1 (en)	1990-07-12
AU4789290A (en)	1990-07-19
FI900124A7 (fi)	1990-07-13
EP0378067B1 (de)	1995-05-31
EP0378068B1 (de)	1993-03-31
ZA90168B (en)	1991-04-24
EP0378067A2 (de)	1990-07-18
FI900125A0 (fi)	1990-01-10
FI900124A0 (fi)	1990-01-10
JPH02262551A (ja)	1990-10-25
JP2839610B2 (ja)	1998-12-16
EP0378067A3 (de)	1991-08-07
AU626966B2 (en)	1992-08-13
JPH02239250A (ja)	1990-09-21
BR9000116A (pt)	1991-10-08
EP0378068A1 (de)	1990-07-18
AU627265B2 (en)	1992-08-20
DE3900736A1 (de)	1990-07-26
CA2007546A1 (en)	1990-07-12
ZA90169B (en)	1991-04-24
US5198322A (en)	1993-03-30
AU4789190A (en)	1990-07-19
BR9000110A (pt)	1990-10-23

Publication	Publication Date	Title
FI900124L (fi)	1990-07-13	Nya flerfunktionella a-diazo-b-ketoestrar, foerfarande foer deras framstaellning och deras anvaending.
FI905769A7 (fi)	1991-05-24	Nya isoindolonderivat, deras framstaellning och dessa innehaollande farmaceutiska kompositioner.
FI893262L (fi)	1990-01-06	Nya disfosfonsyraderivat, foerfarande foer deras framstaellning och laekemedel innehaollande dessa foereningar.
FI880546A7 (fi)	1988-02-05	Nya kolfibriller, foerfarande foer framstaellning daerav och kompositioner innehaollande desamma.
FI903845A0 (fi)	1990-08-02	Renininhibitorer, foerfarande foer deras framstaellning och deras anvaendning i laekemedel.
FI902734A0 (fi)	1990-06-01	Nya 2-hydroxi-n-propylaminer, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI873142A7 (fi)	1988-01-17	Nya benzolsulfonamido -indanylfoereningar, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI875727L (fi)	1988-07-01	Nya oligosackarider, immunogener och vacciner och foerfarande foer framstaellning av saodana oligosackarider, immunogener och vacciner.
FI874323A7 (fi)	1988-04-05	Nya imidazo-benzoxazinoner, deras framstaellning och dessa foereningar innehaollande laekemedel.
FI870274A0 (fi)	1987-01-22	Nya alkan- och alkoxialkanderivat, foerfarande foer deras framstaellning och dessa foereningar innehaollande bekaempningsmedel foer insekter och kvalster.
FI871052A7 (fi)	1987-09-14	Nya substituerade tiazoler och oxazoler, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI875719A0 (fi)	1987-12-28	Nya alkansulfonanilidderivat, foerfarande foer deras framstaellning och dessa innehaollande farmaceutiska blandningar.
FI911615L (fi)	1991-10-07	Nya 4-kinolyl-dihydropyridiner, foerfaranden foer deras framstaellning och deras anvaendning i laekemedel.
FI904533A0 (fi)	1990-09-14	Nya tiazolderivat, foerfarande foer deras framstaellning och dessa innehaollande farmaceutiska blandingar.
FI893142A0 (fi)	1989-06-28	Nya aromoljor av minttyp, foerfarande foer framstaellning av desamma, och kompositioner innehaollande desamma.
FI875086A7 (fi)	1988-05-22	Nya benzotiadiazinfoereningar, foerfarande foer deras framstaellning och dessa innehaollande farmaceutiska blandningar.
FI873917A7 (fi)	1988-03-12	Nya naftalin- och indanderivat, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI873934A7 (fi)	1988-03-13	Nya naftylderivat, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI890285A0 (fi)	1989-01-19	Nya aminosyraglycerider, foerfaranden foer deras framstaellning, dessa innehaollande laekemedel och deras anvaendning.
FI873783A7 (fi)	1988-03-04	Nya sulfonamido-etylfoereningar, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI891115A7 (fi)	1989-09-11	Nya benzocykloheptenderivat, dessa foereningar innehaollande laekemedel och foerfarande foer deras framstaellning.
FI872635A7 (fi)	1987-12-21	Nya polypeptider, deras framstaellning och anvaendning.
FI893795A7 (fi)	1990-02-16	Nya furyltiazolderivat, foerfarande foer deras framstaellning och dessa innehaollande farmaceutiska blandingar.
FI872719L (fi)	1987-12-22	Nya tetrahydro-benzotiazoler, deras framstaellning och anvaendning.
FI890187L (fi)	1989-07-16	Foerfarande foer framstaellning av hydroxialkylerande foereningar, saolunda erhaollna nya foereningar och deras anvaendning.

Legal Events

Date	Code	Title	Description
1993-07-31	FD	Application lapsed
2004-08-31	MM	Patent lapsed	Owner name: HOECHST AKTIENGESELLSCHAFT