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EA201201462A1 - METHOD OF MEASURING THE THICKNESSES OF NANOMETER LAYERS OF A MULTILAYER COATING CONDUCTED IN ITS SPRAYING PROCESS - Google Patents

METHOD OF MEASURING THE THICKNESSES OF NANOMETER LAYERS OF A MULTILAYER COATING CONDUCTED IN ITS SPRAYING PROCESS

Info

Publication number
EA201201462A1
EA201201462A1 EA201201462A EA201201462A EA201201462A1 EA 201201462 A1 EA201201462 A1 EA 201201462A1 EA 201201462 A EA201201462 A EA 201201462A EA 201201462 A EA201201462 A EA 201201462A EA 201201462 A1 EA201201462 A1 EA 201201462A1
Authority
EA
Eurasian Patent Office
Prior art keywords
thickness
measuring
substrate
deposition
spectrum
Prior art date
Application number
EA201201462A
Other languages
Russian (ru)
Inventor
Владимир Александрович ЛАБУСОВ
Захар Владимирович СЕМЁНОВ
Геннадий Владимирович ЭРГ
Original Assignee
Общество С Ограниченной Ответственностью "Вмк-Оптоэлектроника"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Общество С Ограниченной Ответственностью "Вмк-Оптоэлектроника" filed Critical Общество С Ограниченной Ответственностью "Вмк-Оптоэлектроника"
Publication of EA201201462A1 publication Critical patent/EA201201462A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8438—Mutilayers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

Изобретение относится к вакуумной технике, а именно к установкам для напыления многослойных покрытий нанометровой толщины, используемых, например, в качестве спектральных фильтров для оптических приборов в приборостроении, и может быть использовано для напыления покрытий со строго заданной толщиной и полосой пропускания оптического спектра. Заявляется способ измерения толщин нанометровых слоев многослойного покрытия, проводимого в процессе его напыления, включающий измерение спектра пропускания нанесенного на контрольную подложку покрытия в широком спектральном диапазоне и вычисление толщины напыляемого слоя. Новым является то, что в качестве контрольной подложки используют подложку с предварительно нанесенным слоем достаточной толщины, чтобы в спектральной зависимости отражения и/или пропускания от подложки с предварительно нанесенным слоем появился хотя бы один локальный экстремум или хотя бы одна точка перегиба, при этом само измерение толщины слоя может быть проведено как в режиме измерения спектра отражения, так и в режиме измерения спектра пропускания.The invention relates to vacuum technology, in particular to installations for the deposition of multilayer coatings of nanometer thickness, used, for example, as spectral filters for optical instruments in instrumentation, and can be used for the deposition of coatings with strictly specified thickness and bandwidth of the optical spectrum. A method is proposed for measuring the thickness of nanometer layers of a multilayer coating carried out during its deposition, including measuring the transmission spectrum of a coating deposited on a test substrate in a wide spectral range and calculating the thickness of the sprayed layer. New is that as a control substrate using a substrate with a pre-applied layer of sufficient thickness so that in the spectral dependence of reflection and / or transmission from the substrate with a pre-applied layer appeared at least one local extremum or at least one inflection point, while the measurement itself layer thickness can be carried out both in the mode of measurement of the reflection spectrum and in the mode of measurement of the transmission spectrum.

EA201201462A 2012-01-10 2012-01-10 METHOD OF MEASURING THE THICKNESSES OF NANOMETER LAYERS OF A MULTILAYER COATING CONDUCTED IN ITS SPRAYING PROCESS EA201201462A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/RU2012/000001 WO2013105870A1 (en) 2012-01-10 2012-01-10 Method for measuring thicknesses of nanometric layers of a multi-layered coating during spraying of said coating

Publications (1)

Publication Number Publication Date
EA201201462A1 true EA201201462A1 (en) 2013-12-30

Family

ID=48781722

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201201462A EA201201462A1 (en) 2012-01-10 2012-01-10 METHOD OF MEASURING THE THICKNESSES OF NANOMETER LAYERS OF A MULTILAYER COATING CONDUCTED IN ITS SPRAYING PROCESS

Country Status (3)

Country Link
EA (1) EA201201462A1 (en)
RU (1) RU2527670C2 (en)
WO (1) WO2013105870A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU188584U1 (en) * 2018-09-24 2019-04-17 федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет им. Ф.М. Достоевского" Device for the manufacture of nanometer transparent films
CN114459414B (en) * 2021-12-23 2023-12-19 宜昌测试技术研究所 Depth detection method for semi-submersible vehicle

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2107894C1 (en) * 1994-04-08 1998-03-27 Войсковая часть 75360 Method for measurement of coating thickness on substrate
GB9616853D0 (en) * 1996-08-10 1996-09-25 Vorgem Limited An improved thickness monitor
RU2154807C2 (en) * 1998-01-26 2000-08-20 Войсковая часть 75360 Process measuring thickness of coat on substrate
JP3852386B2 (en) * 2002-08-23 2006-11-29 株式会社島津製作所 Film thickness measuring method and film thickness measuring apparatus
RU2006136761A (en) * 2006-10-18 2008-04-27 ФГОУ ВПО Российский государственный университет имени Иммануила Канта (РГУ им. И. Канта) (RU) METHOD FOR FILM THICKNESS CONTROL DURING ITS APPLICATION BY DEPOSITION IN A VACUUM CAMERA
RU2009112917A (en) * 2009-04-06 2010-10-20 Государственное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный университет METHOD FOR DETERMINING THIN FILM PARAMETERS DURING VACUUM DEPOSITION

Also Published As

Publication number Publication date
RU2527670C2 (en) 2014-09-10
WO2013105870A1 (en) 2013-07-18
RU2012150284A (en) 2014-05-27

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