[go: up one dir, main page]

DK553786D0 - Fotofaelsomt materiale og deri indgaaende fotohaerdneligt materiale - Google Patents

Fotofaelsomt materiale og deri indgaaende fotohaerdneligt materiale

Info

Publication number
DK553786D0
DK553786D0 DK553786A DK553786A DK553786D0 DK 553786 D0 DK553786 D0 DK 553786D0 DK 553786 A DK553786 A DK 553786A DK 553786 A DK553786 A DK 553786A DK 553786 D0 DK553786 D0 DK 553786D0
Authority
DK
Denmark
Prior art keywords
cardable
including photo
photographic
photographic material
photo
Prior art date
Application number
DK553786A
Other languages
English (en)
Other versions
DK553786A (da
Inventor
Peter Gottschalk
Douglas Carlyle Neckers
Gary Benjamin Schuster
Original Assignee
Mead Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/917,873 external-priority patent/US4772541A/en
Application filed by Mead Corp filed Critical Mead Corp
Publication of DK553786D0 publication Critical patent/DK553786D0/da
Publication of DK553786A publication Critical patent/DK553786A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/06—Dyestuff salts, e.g. salts of acid dyes with basic dyes of cationic dyes with organic acids or with inorganic complex acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H53/00—Cams or cam-followers, e.g. rollers for gearing mechanisms
    • F16H53/02—Single-track cams for single-revolution cycles; Camshafts with such cams
    • F16H53/025—Single-track cams for single-revolution cycles; Camshafts with such cams characterised by their construction, e.g. assembling or manufacturing features
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C13/00—Dental prostheses; Making same
    • A61C13/0003—Making bridge-work, inlays, implants or the like
    • A61C13/0006—Production methods
    • A61C13/0013—Production methods using stereolithographic techniques
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61C—DENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00—Dental auxiliary appliances
    • A61C19/003—Apparatus for curing resins by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DK553786A 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale DK553786A (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80001485A 1985-11-20 1985-11-20
US86036786A 1986-05-06 1986-05-06
US06/917,873 US4772541A (en) 1985-11-20 1986-10-10 Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same

Publications (2)

Publication Number Publication Date
DK553786D0 true DK553786D0 (da) 1986-11-19
DK553786A DK553786A (da) 1987-05-21

Family

ID=27419957

Family Applications (1)

Application Number Title Priority Date Filing Date
DK553786A DK553786A (da) 1985-11-20 1986-11-19 Fotofoelsomt materiale og deri indgaaende fotohaerdneligt materiale

Country Status (6)

Country Link
EP (2) EP0223587B1 (da)
KR (1) KR940002538B1 (da)
CN (1) CN86108826A (da)
BR (1) BR8605710A (da)
DE (2) DE3650107T2 (da)
DK (1) DK553786A (da)

Families Citing this family (195)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4977511A (en) * 1985-11-20 1990-12-11 The Mead Corporation Photosensitive materials containing ionic dye compound as initiators
JPS62232638A (ja) * 1986-04-02 1987-10-13 Brother Ind Ltd 感光感圧記録シ−ト
US4895880A (en) * 1986-05-06 1990-01-23 The Mead Corporation Photocurable compositions containing photobleachable ionic dye complexes
JPH07120036B2 (ja) * 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
US4950581A (en) * 1987-07-06 1990-08-21 Fuji Photo Film Co., Ltd. Photopolymerizable composition
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
JPH0820732B2 (ja) * 1987-10-13 1996-03-04 富士写真フイルム株式会社 光重合性組成物
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
US4840866A (en) * 1988-03-24 1989-06-20 The Mead Corporation Microcapsule imaging system having improved dynamic range
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
JPH02244051A (ja) * 1988-10-11 1990-09-28 Mead Corp:The 画像形成方法
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
CA2005933A1 (en) * 1989-01-09 1990-07-09 Jesse Hipps, Sr. Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US4954415A (en) * 1989-03-09 1990-09-04 The Mead Corporation Photoinitiator compositions containing O-acylthiohydroxamate or an N-alkoxypyridinethione and photohardenable compositions containing the same
CA2009652A1 (en) * 1989-03-09 1990-09-09 Paul Davis Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
EP0390439A1 (en) * 1989-03-27 1990-10-03 The Mead Corporation Complexes useful as photoinitiators and photohardenable compositions containing the same
DE69030477T2 (de) * 1989-10-13 1997-08-28 Fuji Photo Film Co Ltd Einen Aluminatkomplex enthaltendes Bildaufzeichnungsmaterial
KR910012820A (ko) * 1989-12-20 1991-08-08 로레인 제이. 프란시스 황산화제 배합물을 함유하는 유리 라디칼 중합성 조성물
DE69112852T2 (de) * 1990-01-16 1996-05-15 Showa Denko Kk Polymerisationsinitiator verwendbar in der Nähe von Infrarot.
EP0450254A1 (en) * 1990-04-03 1991-10-09 Ciba-Geigy Ag Photocurable compositions
JPH043064A (ja) * 1990-04-20 1992-01-08 Oriental Photo Ind Co Ltd 感光体
TW207021B (da) * 1990-07-23 1993-06-01 Showa Denko Kk
JP3244288B2 (ja) * 1990-07-23 2002-01-07 昭和電工株式会社 近赤外光消色型記録材料
TW363999B (en) * 1991-06-04 1999-07-11 Vantico Ag Photosensitive compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
DE59407524D1 (de) * 1993-08-26 1999-02-04 Ciba Geigy Ag Flüssige strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
DE59409385D1 (de) * 1993-09-16 2000-07-06 Ciba Sc Holding Ag Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
DE69609967T2 (de) 1995-06-05 2001-04-12 Kimberly-Clark Worldwide, Inc. Farbstoffvorläufer und diese enthaltende zusammensetzungen
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
AU5535296A (en) 1995-06-28 1997-01-30 Kimberly-Clark Worldwide, Inc. Novel colorants and colorant modifiers
DE69624496T2 (de) * 1995-09-09 2003-07-17 Vantico Ltd., Duxford Verfahren zum herstellung von polymerschichten mit selektiv gefärbten zonen
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
KR19980701718A (ko) 1995-11-28 1998-06-25 바바라 에이취. 폴 개량된 착색제 안정화제
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
EP0822445B2 (de) * 1996-07-29 2005-02-09 Huntsman Advanced Materials (Switzerland) GmbH Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
DE69710657T3 (de) † 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren
JPH10319584A (ja) * 1997-05-21 1998-12-04 Brother Ind Ltd マイクロカプセルを用いた感光性記録材料
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
DE69821190D1 (de) * 1997-11-05 2004-02-26 Showa Denko Kk Photohärtbare Farbzusammensetzung für Strassenmarkierungen
CA2319603A1 (en) * 1998-02-25 1999-09-02 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
JPH11249304A (ja) * 1998-03-02 1999-09-17 Oriental Photo Ind Co Ltd 乾式画像形成材料及び乾式画像形成方法
US6100007A (en) 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
PL342006A1 (en) 1998-06-03 2001-05-07 Kimberly Clark Co Neonanoplasts and method of obtaining microemulsions for printing inks being applied by spraying
CA2298468A1 (en) 1998-06-03 1999-12-09 John Gavin Macdonald Novel photoinitiators and applications therefor
WO2000004104A1 (en) 1998-07-20 2000-01-27 Kimberly-Clark Worldwide, Inc. Improved ink jet ink compositions
AU5620499A (en) 1998-08-21 2000-03-14 Ciba Specialty Chemicals Holding Inc. Photoactivatable bases containing nitrogen
US6398981B1 (en) 1998-09-18 2002-06-04 Universite Laval Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
US6265458B1 (en) 1998-09-28 2001-07-24 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
EP1002817B1 (en) 1998-11-17 2004-04-28 Showa Denko K.K. Photocurable composition
WO2000042110A1 (en) 1999-01-19 2000-07-20 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6174642B1 (en) 1999-02-25 2001-01-16 Cycolor, Inc. Imaging system employing encapsulated radiation sensitive composition
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
DE60121588T2 (de) 2000-06-19 2006-11-16 Kimberly-Clark Worldwide, Inc., Neenah Neue photoinitiatoren
WO2003029365A1 (en) 2001-10-03 2003-04-10 3D Systems, Inc. Phase change support material composition
US6841589B2 (en) 2001-10-03 2005-01-11 3D Systems, Inc. Ultra-violet light curable hot melt composition
KR100811393B1 (ko) * 2001-12-04 2008-03-07 주식회사 하이닉스반도체 패턴 붕괴 개선용 포토레지스트 첨가제 및 이를 함유하는포토레지스트 조성물
JP2005529200A (ja) 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7635727B2 (en) 2003-06-24 2009-12-22 Ppg Industries Ohio, Inc. Composite transparencies
EP1622178A1 (en) * 2004-07-29 2006-02-01 Ecole Polytechnique Federale De Lausanne (Epfl) 2,2 -Bipyridine ligand, sensitizing dye and dye sensitized solar cell
DE102004058584A1 (de) 2004-12-03 2006-06-08 Basf Ag Strahlungshärtbare Beschichtungsmassen
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
CN101939140B (zh) 2006-12-21 2012-11-28 圣戈本磨料股份有限公司 低腐蚀磨料制品及其制备方法
IL200995A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Polyether-based polyurethane formulations for the production of holographic media
IL200997A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Special polyether-based polyurethane formulations for the production of holographic media
IL200996A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer formulations having a low crosslinking density
IL200722A0 (en) 2008-10-01 2010-06-30 Bayer Materialscience Ag Photopolymer compositions for optical elements and visual displays
US8852829B2 (en) 2008-10-01 2014-10-07 Bayer Materialscience Ag Prepolymer-based polyurethane formulations for producing holographic media
EP2218742A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Photopolymerzusammensetzungen als verdruckbare Formulierungen
EP2218743A1 (de) 2009-02-12 2010-08-18 Bayer MaterialScience AG Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme
EP2219073B1 (de) 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
CN102272227B (zh) 2009-03-13 2014-03-12 帝斯曼知识产权资产管理有限公司 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法
TW201133264A (en) 2009-11-03 2011-10-01 Bayer Materialscience Ag Method for selecting additives in photopolymers
US8771903B2 (en) 2009-11-03 2014-07-08 Bayer Materialscience Ag Method for producing a holographic film
RU2570662C9 (ru) 2009-11-03 2016-07-20 Байер Матириальсайенс Аг Фторуретаны в качестве добавки в фотополимерной композиции
WO2011054818A2 (de) 2009-11-03 2011-05-12 Bayer Materialscience Ag Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
ATE548730T1 (de) 2009-11-03 2012-03-15 Bayer Materialscience Ag Photopolymerformulierungen mit einstellbarem mechanischem modul guv
TWI489209B (zh) 2009-11-03 2015-06-21 Bayer Materialscience Ag 在光聚合物配製物中作為添加劑的胺甲酸乙酯
EP2497083B1 (de) 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Photopolymer-formulierung mit verschiedenen schreibcomonomeren
EP2496588B1 (de) 2009-11-03 2017-01-11 Covestro Deutschland AG Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte
KR101804591B1 (ko) 2010-02-02 2017-12-04 바이엘 인텔렉쳐 프로퍼티 게엠베하 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
EP2354845B1 (de) 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
KR20120125270A (ko) 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2330461A1 (de) 2010-03-26 2011-06-08 Bayer MaterialScience AG Projektionseinrichtung für einen Picoprojektor und holographischer Projektionsschirm
BR112013003243A2 (pt) 2010-08-11 2017-06-13 Bayer Ip Gmbh monômeros de escrita de (metil) acrilato difuncionais
EP2450387A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
US8460451B2 (en) 2011-02-23 2013-06-11 3D Systems, Inc. Support material and applications thereof
US9157007B2 (en) 2011-03-09 2015-10-13 3D Systems, Incorporated Build material and applications thereof
US9394441B2 (en) 2011-03-09 2016-07-19 3D Systems, Inc. Build material and applications thereof
US9475889B2 (en) 2011-05-16 2016-10-25 Eastman Kodak Company Photoinitiator and photocurable compositions and uses
US20120295999A1 (en) * 2011-05-16 2012-11-22 Deepak Shukla Photoinitiator and photocurable compositions and uses
US20140295328A1 (en) 2011-10-12 2014-10-02 Bayer Intellectual Property Gmbh Chain transfer reagents in polyurethane-based photopolymer formulations
JP2014535071A (ja) 2011-10-12 2014-12-25 バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ ポリウレタン系フォトポリマー処方物における硫黄含有連鎖移動剤
PL2613318T3 (pl) 2012-01-05 2014-12-31 Bayer Ip Gmbh Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową
TWI557187B (zh) 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
EP2700510B1 (de) 2012-08-23 2015-09-16 Bayer MaterialScience AG Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper
RU2015109872A (ru) 2012-08-23 2016-10-10 Байер Матириальсайенс Аг Защищенный документ и/или ценная бумага, содержащие визуально меняющееся окно с голограммой
US8980406B2 (en) 2012-08-28 2015-03-17 3D Systems, Inc. Color stable inks and applications thereof
US9657186B2 (en) 2012-09-13 2017-05-23 3D Systems, Inc. Opaque inks and applications thereof
CN105051620A (zh) 2013-01-25 2015-11-11 拜耳材料科技股份有限公司 具有体积全息图和印刷特征的安全元件
EP2772917A1 (de) 2013-02-27 2014-09-03 Bayer MaterialScience AG Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen
TWI640428B (zh) 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
EP2969482B1 (en) 2013-03-15 2018-05-09 3D Systems, Inc. Three dimensional printing material system
JP6497850B2 (ja) 2013-05-08 2019-04-10 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ ハロー防止層を有するホログラフィック記録媒体およびその製造
KR102315409B1 (ko) 2013-10-17 2021-10-21 코베스트로 도이칠란트 아게 Tg가 낮은 보레이트를 포함하는 홀로그래픽 매체의 제조를 위한 광중합체 배합물
CN105659323A (zh) 2013-10-30 2016-06-08 科思创德国股份有限公司 包含基底和光聚合物薄膜的复合件
WO2015091427A1 (de) 2013-12-20 2015-06-25 Bayer Materialscience Ag Holographische medien mit verbesserter lichtempfindlichkeit
US11602892B2 (en) 2013-12-23 2023-03-14 3D Systems, Inc. Three dimensional printing materials, systems, and methods
US10052861B2 (en) 2014-03-11 2018-08-21 3D Systems, Inc. Inks for 3D printing
WO2015161969A1 (de) 2014-04-25 2015-10-29 Bayer Material Science Ag Aromatische glykolether als schreibmonomere in holographischen photopolymer-formulierungen
EP3148782B1 (en) 2014-05-30 2019-05-08 3D Systems, Incorporated Water dispersible support materials for 3d printing
EP3152266B1 (en) 2014-06-04 2020-10-07 3D Systems, Inc. Inks comprising gellants for 3d printing
EP3152035B1 (en) 2014-06-09 2020-09-02 3D Systems, Inc. Methods of printing full-color 3d articles
US9650526B2 (en) 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
KR101989717B1 (ko) 2014-11-24 2019-06-14 3디 시스템즈 인코오퍼레이티드 3d 인쇄를 위한 액체 고무를 포함하는 잉크
CN107001246B (zh) 2014-12-12 2021-02-02 科思创德国股份有限公司 作为光聚合物用书写单体的萘基丙烯酸酯
WO2016096641A1 (de) 2014-12-19 2016-06-23 Covestro Deutschland Ag Feuchtigkeitsstabile holographische medien
TWI698326B (zh) 2015-01-14 2020-07-11 德商科思創德意志股份有限公司 以全相光學元件製備光學鑄件之方法及光學鑄件
US10308619B2 (en) 2015-06-23 2019-06-04 Covestro Deutschland Ag Substituted triazines and a method for producing same
EP3371263B1 (en) 2015-11-03 2020-10-21 3D Systems, Incorporated Biocompatible inks for 3d printing
EP3166109A1 (de) 2015-11-09 2017-05-10 Covestro Deutschland AG Kit-of-parts enthaltend versiegellungsschicht und photopolymer
EP3426737B1 (en) 2016-03-08 2021-11-24 3D Systems, Incorporated Non-isocyanate polyurethane inks for 3d printing
EP3440138B1 (en) 2016-04-07 2024-02-21 3D Systems, Inc. Thiol-ene inks for 3d printing
JP6977033B2 (ja) 2016-11-09 2021-12-08 コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag トリアリールオルガノボレートの製造方法
WO2018087064A1 (de) 2016-11-09 2018-05-17 Covestro Deutschland Ag Verfahren zur herstellung von triaryl-organoboraten
EP3538532B1 (en) 2016-11-09 2020-09-16 Covestro Intellectual Property GmbH & Co. KG Process for the manufacturing of triarvl-organo borates
WO2018144501A1 (en) 2017-02-01 2018-08-09 3D Systems, Incorporated 3d printing ink containing a cyclopolymerizable monomer
TW201906730A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
TW201906882A (zh) 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
CN110573968B (zh) 2017-05-09 2021-12-21 科思创德国股份有限公司 用于保护光致聚合物-膜复合结构中的全息图的由两个可干燥转移的uv-固化涂料层构成的体系
CN110603589B (zh) 2017-05-09 2021-11-16 科思创德国股份有限公司 含全息曝光的光致聚合物层和高耐受性涂料层的全息介质
EP3435156A1 (de) 2017-07-26 2019-01-30 Covestro Deutschland AG Schutzschicht für photopolymer
WO2019071071A1 (en) 2017-10-05 2019-04-11 3D Systems, Inc. CYCLOPOLYMERIZABLE COMPOUNDS FOR 3D PRINTING
JP7165190B2 (ja) 2017-11-07 2022-11-02 スリーディー システムズ インコーポレーテッド 低プリントスルー深さの３ｄプリント用インク
EP3495886A1 (de) 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
EP3810401B1 (en) 2018-06-22 2022-08-03 3D Systems, Inc. Method of verifying integrity of a post-process removal of support material
WO2019245845A1 (en) 2018-06-22 2019-12-26 3D Systems, Inc. 3d printing build materials and support materials comprising a phosphor
EP3887126A1 (en) 2018-11-30 2021-10-06 3D Systems, Inc. Inks for 3d printing having low polymerization shrinkage
WO2021011357A1 (en) 2019-07-12 2021-01-21 3D Systems, Inc. Build materials for 3d printing
EP3772671A1 (de) 2019-08-06 2021-02-10 Covestro Deutschland AG Schichtaufbau für die belichtung von hologrammen
JP7340099B2 (ja) 2019-10-01 2023-09-06 スリーディー システムズ インコーポレーテッド ３ｄプリントのための光学活性造形材料
EP4038152A1 (en) 2019-10-01 2022-08-10 3D Systems, Inc. Shelf-stable build materials for 3d printing
WO2021150854A1 (en) 2020-01-24 2021-07-29 3D Systems, Inc. Water soluble waxy support materials for three-dimensional printing applications
EP4244066A1 (en) 2020-11-16 2023-09-20 3D Systems, Inc. Build materials for printing 3d articles
WO2022125668A1 (en) 2020-12-10 2022-06-16 3D Systems, Inc. Flame resistant build materials and associated printed 3d articles
EP4305017A1 (en) 2021-03-10 2024-01-17 3D Systems, Inc. Additives for build materials and associated printed 3d articles
CN116917108A (zh) 2021-03-10 2023-10-20 3D系统公司 阻燃构建材料和相关的3d印刷制品
WO2022235893A1 (en) 2021-05-07 2022-11-10 3D Systems, Inc. Additives for build materials and associated printed 3d articles
EP4405407A1 (en) 2021-09-21 2024-07-31 3D Systems, Inc. Curable compounds and formulations for biomedical applications
WO2023156484A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich
EP4483367A1 (de) 2022-02-21 2025-01-01 Covestro Deutschland AG Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen
WO2023156482A1 (de) 2022-02-21 2023-08-24 Covestro Deutschland Ag Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit
WO2024015911A1 (en) 2022-07-15 2024-01-18 3D Systems, Inc. Hydrogels for 3d printing having high resolution
EP4584335A1 (de) 2022-09-07 2025-07-16 Covestro Deutschland AG Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen
WO2024124024A1 (en) 2022-12-09 2024-06-13 3D Systems, Inc. Inks for 3d printing having high modulus and dispersion stability
EP4677036A1 (en) 2023-03-08 2026-01-14 3D Systems, Inc. Additives for build materials and associated printed 3d articles
US20250144872A1 (en) 2023-11-03 2025-05-08 3D Systems, Inc. Water dispersible build materials for molding applications
US20250229484A1 (en) 2024-01-17 2025-07-17 3D Systems, Inc. Systems, methods, and compositions for additive manufacturing
US20250320363A1 (en) 2024-04-12 2025-10-16 3D Systems, Inc. Methods and compositions for additive manufacturing having high water permeability
US20250340689A1 (en) 2024-05-02 2025-11-06 3D Systems, Inc. Compositions and methods for 3d printing for molding applications

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567453A (en) * 1967-12-26 1971-03-02 Eastman Kodak Co Light sensitive compositions for photoresists and lithography
JPS509178B1 (da) * 1970-12-28 1975-04-10
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives

Also Published As

Publication number Publication date
EP0223587A1 (en) 1987-05-27
EP0389067A2 (en) 1990-09-26
EP0389067B1 (en) 1994-10-19
DE3650107T2 (de) 1995-05-24
DE3677527D1 (de) 1991-03-21
DE3650107D1 (de) 1994-11-24
EP0223587B1 (en) 1991-02-13
KR940002538B1 (ko) 1994-03-25
EP0389067A3 (en) 1990-11-28
CN86108826A (zh) 1987-11-25
DK553786A (da) 1987-05-21
KR870005270A (ko) 1987-06-05
BR8605710A (pt) 1987-08-18

Similar Documents

Publication Publication Date Title
DK553786D0 (da) Fotofaelsomt materiale og deri indgaaende fotohaerdneligt materiale
DK164795C (da) Fotografisk materiale
DK506082A (da) Fotografisk materiale
DK401583D0 (da) Parenkymal celle-cellulose og beslaegtede materialer
NO833596L (no) Uv-herdbart materiale
DE68926588D1 (de) Photographisches Silberhalogenidmaterial
DE68927687D1 (de) Photographisches Silberhalogenidmaterial
DK338983A (da) Ovnfast artikel og materiale til fremstilling deraf
DK512085A (da) Ildfast materiale og produkter fremstillet deraf
DK218390A (da) Superledende materiale og fremgangsmaade til fremstilling
DK139586D0 (da) Polymeriserbart materiale og fremgangsmaade til fremstilling deraf
NO834722L (no) Saltsyreholdig materiale og anvendelse derav
MX161393A (es) Mejoras en material fotografico
DK204682A (da) Parfumeafgivende materiale
DK144789D0 (da) Fotografisk materiale og dets anvendelse
DK490388D0 (da) Materiale
DE3855361D1 (de) Photographisches Silberhalogenidmaterial
DK36985D0 (da) Fremgangsmaade til indeslutning af genstande og materiale til anvendelse herved
DK51985D0 (da) Afdaekningsstykke og materiale hertil
NO832079L (no) Formbart materiale og formede produkter fremstilt derav
BR8803564A (pt) Elemento antiestatico;e elemento fotografico
DE68925216D1 (de) Photographisches Silberhalogenidmaterial
DK160290C (da) Elektro-smeltekobling for termoplastisk materiale og styreapparat dertil
ES553964A0 (es) Perfeccionamientos en camaras fotograficas
DK420089D0 (da) Apparatur til fremkaldelse og efterbehandling af fotografisk materiale

Legal Events

Date Code Title Description
AHS Application shelved for other reasons than non-payment