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DE60325925D1 - Polierkissen - Google Patents

Polierkissen

Info

Publication number
DE60325925D1
DE60325925D1 DE60325925T DE60325925T DE60325925D1 DE 60325925 D1 DE60325925 D1 DE 60325925D1 DE 60325925 T DE60325925 T DE 60325925T DE 60325925 T DE60325925 T DE 60325925T DE 60325925 D1 DE60325925 D1 DE 60325925D1
Authority
DE
Germany
Prior art keywords
polishing pad
polishing
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60325925T
Other languages
English (en)
Inventor
Hiroshi Shiho
Hiromi Aoi
Kou Hasegawa
Nobuo Kawahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE60325925D1 publication Critical patent/DE60325925D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10P52/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
    • B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
    • B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
DE60325925T 2002-11-05 2003-11-04 Polierkissen Expired - Lifetime DE60325925D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002321856A JP4039214B2 (ja) 2002-11-05 2002-11-05 研磨パッド

Publications (1)

Publication Number Publication Date
DE60325925D1 true DE60325925D1 (de) 2009-03-12

Family

ID=32105440

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60325925T Expired - Lifetime DE60325925D1 (de) 2002-11-05 2003-11-04 Polierkissen

Country Status (7)

Country Link
US (1) US6992123B2 (de)
EP (1) EP1418021B1 (de)
JP (1) JP4039214B2 (de)
KR (1) KR100681980B1 (de)
CN (1) CN100443263C (de)
DE (1) DE60325925D1 (de)
TW (1) TWI264344B (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY114512A (en) * 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
DE10255652B4 (de) * 2002-11-28 2005-07-14 Infineon Technologies Ag Schleifkissen, Vorrichtung zum chemisch-mechanischen Polieren und Verfahren zum nasschemischen Schleifen einer Substratoberfläche
KR100590513B1 (ko) * 2002-12-30 2006-06-15 동부일렉트로닉스 주식회사 화학 기계적 연마 장치 및 방법
EP1466699A1 (de) * 2003-04-09 2004-10-13 JSR Corporation Polierkissen, Verfahren und Metallgiessform zur Herstellung desselben und Halbleiterscheibepolierverfahren
CN100424830C (zh) * 2004-04-23 2008-10-08 Jsr株式会社 用于抛光半导体晶片的抛光垫、层叠体和方法
JP2005340271A (ja) * 2004-05-24 2005-12-08 Jsr Corp 化学機械研磨用パッド
US7153191B2 (en) * 2004-08-20 2006-12-26 Micron Technology, Inc. Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods
DE602005007125D1 (de) * 2004-09-17 2008-07-10 Jsr Corp Chemisch-mechanisches Polierkissen und chemisch-mechanisches Polierverfahren
US7316977B2 (en) * 2005-08-24 2008-01-08 Air Products And Chemicals, Inc. Chemical-mechanical planarization composition having ketooxime compounds and associated method for use
TWI409136B (zh) * 2006-07-19 2013-09-21 Innopad Inc 表面具微溝槽之化學機械平坦化墊
US7985269B2 (en) * 2006-12-04 2011-07-26 3M Innovative Properties Company Nonwoven abrasive articles and methods of making the same
US7635290B2 (en) 2007-08-15 2009-12-22 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Interpenetrating network for chemical mechanical polishing
WO2009042073A2 (en) * 2007-09-21 2009-04-02 Cabot Microelectronics Corporation Polishing composition and method utilizing abrasive particles treated with an aminosilane
JP2009117815A (ja) * 2007-10-18 2009-05-28 Jsr Corp 化学機械研磨パッドの製造方法
US8444458B2 (en) 2007-12-31 2013-05-21 3M Innovative Properties Company Plasma treated abrasive article and method of making same
JP5514806B2 (ja) * 2008-04-29 2014-06-04 セミクエスト・インコーポレーテッド 研磨パッド組成物およびその製造方法ならびに使用
JP5587337B2 (ja) 2009-01-05 2014-09-10 イノパッド，インコーポレイテッド 複数層化学機械平坦化パッド
CN103154178B (zh) * 2010-10-21 2015-02-25 株式会社Moresco 玻璃基板抛光用润滑组合物和抛光浆料
US9050697B2 (en) 2012-03-20 2015-06-09 Jh Rhodes Company, Inc. Self-conditioning polishing pad and a method of making the same
US9144880B2 (en) 2012-11-01 2015-09-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical polishing pad
US9238296B2 (en) 2013-05-31 2016-01-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer
US9238295B2 (en) 2013-05-31 2016-01-19 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical window polishing pad
US9233451B2 (en) 2013-05-31 2016-01-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Soft and conditionable chemical mechanical polishing pad stack
JP2015185815A (ja) * 2014-03-26 2015-10-22 株式会社東芝 研磨パッド、研磨方法、及び半導体装置の製造方法
US20150306731A1 (en) 2014-04-25 2015-10-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad
CN105802508B (zh) * 2014-12-29 2020-03-13 安集微电子（上海）有限公司 一种氮唑类化合物在提高化学机械抛光液稳定性中的应用
CN105802510A (zh) * 2014-12-29 2016-07-27 安集微电子（上海）有限公司 一种化学机械抛光液及其应用
US12397082B2 (en) * 2015-06-01 2025-08-26 Amogreentech Co., Ltd. Antimicrobial dressing
US9484212B1 (en) 2015-10-30 2016-11-01 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method
EP3452253B1 (de) * 2016-05-06 2021-02-24 3M Innovative Properties Company Härtbare zusammensetzung, schleifartikel und verfahren zur herstellung davon
US11168237B2 (en) 2018-06-14 2021-11-09 3M Innovative Properties Company Adhesion promoters for curable compositions
CN112243454B (zh) * 2018-06-14 2022-03-22 3M创新有限公司 处理表面的方法、表面改性的磨料颗粒和树脂粘结磨具制品
CN110774153B (zh) * 2019-10-23 2022-02-08 华侨大学 一种大尺寸单晶金刚石的抛光方法
CN118438342B (zh) * 2024-04-29 2025-01-21 广东工业大学 一种可改变磨料运动状态的核壳磨料研抛盘、制备方法及其应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY114512A (en) * 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
US5250085A (en) * 1993-01-15 1993-10-05 Minnesota Mining And Manufacturing Company Flexible bonded abrasive articles, methods of production and use
US5976000A (en) 1996-05-28 1999-11-02 Micron Technology, Inc. Polishing pad with incompressible, highly soluble particles for chemical-mechanical planarization of semiconductor wafers
US6435958B1 (en) * 1997-08-15 2002-08-20 Struers A/S Abrasive means and a grinding process
JP3668046B2 (ja) 1998-05-11 2005-07-06 株式会社東芝 研磨布及びこの研磨布を用いた半導体装置の製造方法
JP3918359B2 (ja) 1998-05-15 2007-05-23 Ｊｓｒ株式会社 研磨パッド用重合体組成物および研磨パッド
US6390890B1 (en) * 1999-02-06 2002-05-21 Charles J Molnar Finishing semiconductor wafers with a fixed abrasive finishing element
JP3880028B2 (ja) * 1999-08-06 2007-02-14 Ｊｓｒ株式会社 研磨パッド用重合体組成物及びそれを用いた研磨パッド
JP3925041B2 (ja) * 2000-05-31 2007-06-06 Ｊｓｒ株式会社 研磨パッド用組成物及びこれを用いた研磨パッド
JP3826702B2 (ja) * 2000-10-24 2006-09-27 Ｊｓｒ株式会社 研磨パッド用組成物及びこれを用いた研磨パッド
US20020098790A1 (en) * 2001-01-19 2002-07-25 Burke Peter A. Open structure polishing pad and methods for limiting pore depth
DE60228784D1 (de) * 2001-04-25 2008-10-23 Jsr Corp Lichtduchlässiges Polierkissen für eine Halbleiterschleife

Also Published As

Publication number Publication date
KR20040040374A (ko) 2004-05-12
US6992123B2 (en) 2006-01-31
CN1498723A (zh) 2004-05-26
KR100681980B1 (ko) 2007-02-15
JP4039214B2 (ja) 2008-01-30
EP1418021B1 (de) 2009-01-21
JP2004158581A (ja) 2004-06-03
US20040118051A1 (en) 2004-06-24
EP1418021A1 (de) 2004-05-12
TWI264344B (en) 2006-10-21
CN100443263C (zh) 2008-12-17
TW200414967A (en) 2004-08-16

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Legal Events

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