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DE60318301D1 - Mit positiv geladenen polyelektrolyten behandelte anionische schleifmittelteilchen für das chemomechanische polieren - Google Patents

Mit positiv geladenen polyelektrolyten behandelte anionische schleifmittelteilchen für das chemomechanische polieren

Info

Publication number
DE60318301D1
DE60318301D1 DE60318301T DE60318301T DE60318301D1 DE 60318301 D1 DE60318301 D1 DE 60318301D1 DE 60318301 T DE60318301 T DE 60318301T DE 60318301 T DE60318301 T DE 60318301T DE 60318301 D1 DE60318301 D1 DE 60318301D1
Authority
DE
Germany
Prior art keywords
polyelectrolytes
antibody
particles treated
grinding particles
chemomechanical polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60318301T
Other languages
English (en)
Other versions
DE60318301T2 (de
Inventor
Isaac K Cherian
Phillip W Carter
Jeffrey P Chamberlain
Kevin J Moeggenborg
David W Boldridge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMC Materials LLC
Original Assignee
Cabot Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Microelectronics Corp filed Critical Cabot Microelectronics Corp
Publication of DE60318301D1 publication Critical patent/DE60318301D1/de
Application granted granted Critical
Publication of DE60318301T2 publication Critical patent/DE60318301T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/046—Lapping machines or devices; Accessories designed for working plane surfaces using electric current
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Disintegrating Or Milling (AREA)
DE60318301T 2002-02-11 2003-02-10 Mit positiv geladenen polyelektrolyten behandelte anionische schleifmittelteilchen für das chemomechanische polieren Expired - Lifetime DE60318301T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/073,844 US6776810B1 (en) 2002-02-11 2002-02-11 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
US73844 2002-02-11
PCT/US2003/003930 WO2003068883A1 (en) 2002-02-11 2003-02-10 Anionic abrasive particles treated with positively-charged polyelectrolytes for cmp

Publications (2)

Publication Number Publication Date
DE60318301D1 true DE60318301D1 (de) 2008-02-07
DE60318301T2 DE60318301T2 (de) 2008-04-10

Family

ID=27732349

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60318301T Expired - Lifetime DE60318301T2 (de) 2002-02-11 2003-02-10 Mit positiv geladenen polyelektrolyten behandelte anionische schleifmittelteilchen für das chemomechanische polieren

Country Status (10)

Country Link
US (2) US6776810B1 (de)
EP (1) EP1483349B1 (de)
JP (1) JP4750362B2 (de)
KR (2) KR100972730B1 (de)
CN (1) CN1325591C (de)
AT (1) ATE382076T1 (de)
AU (1) AU2003216217A1 (de)
DE (1) DE60318301T2 (de)
TW (1) TWI241339B (de)
WO (1) WO2003068883A1 (de)

Families Citing this family (125)

* Cited by examiner, † Cited by third party
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CN1630697A (zh) 2005-06-22
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AU2003216217A1 (en) 2003-09-04
CN1325591C (zh) 2007-07-11
US20040229552A1 (en) 2004-11-18
KR20040088070A (ko) 2004-10-15
US7306637B2 (en) 2007-12-11
DE60318301T2 (de) 2008-04-10
WO2003068883A1 (en) 2003-08-21
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