DE602008004246D1 - Flachdruckplattenvorläufer - Google Patents
FlachdruckplattenvorläuferInfo
- Publication number
- DE602008004246D1 DE602008004246D1 DE602008004246T DE602008004246T DE602008004246D1 DE 602008004246 D1 DE602008004246 D1 DE 602008004246D1 DE 602008004246 T DE602008004246 T DE 602008004246T DE 602008004246 T DE602008004246 T DE 602008004246T DE 602008004246 D1 DE602008004246 D1 DE 602008004246D1
- Authority
- DE
- Germany
- Prior art keywords
- plate precursor
- pressure plate
- flat pressure
- image
- recording layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002243 precursor Substances 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
- C07C41/18—Preparation of ethers by reactions not forming ether-oxygen bonds
- C07C41/30—Preparation of ethers by reactions not forming ether-oxygen bonds by increasing the number of carbon atoms, e.g. by oligomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/215—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/235—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring
- C07C43/243—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring and to a carbon atom of a ring other than a six-membered aromatic ring having unsaturation outside the six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/06—Systems containing only non-condensed rings with a five-membered ring
- C07C2601/08—Systems containing only non-condensed rings with a five-membered ring the ring being saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Printing Plates And Materials Therefor (AREA)
- Secondary Cells (AREA)
- Organic Insulating Materials (AREA)
- Electric Double-Layer Capacitors Or The Like (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US94010607P | 2007-05-25 | 2007-05-25 | |
| EP07108957 | 2007-05-25 | ||
| PCT/EP2008/055951 WO2008145528A1 (en) | 2007-05-25 | 2008-05-15 | A lithographic printing plate precursor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602008004246D1 true DE602008004246D1 (de) | 2011-02-10 |
Family
ID=38626773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602008004246T Active DE602008004246D1 (de) | 2007-05-25 | 2008-05-15 | Flachdruckplattenvorläufer |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8445176B2 (de) |
| EP (1) | EP2153279B1 (de) |
| CN (1) | CN101681106B (de) |
| AT (1) | ATE493688T1 (de) |
| BR (1) | BRPI0811197B1 (de) |
| DE (1) | DE602008004246D1 (de) |
| WO (1) | WO2008145528A1 (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE602008004246D1 (de) | 2007-05-25 | 2011-02-10 | Agfa Graphics Nv | Flachdruckplattenvorläufer |
| EP2290447A1 (de) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | Satz zur Entwicklung einer Lithografiedruckplatte |
| EP2775351B1 (de) | 2013-03-07 | 2017-02-22 | Agfa Graphics NV | Vorrichtung und Verfahren zur Verarbeitung einer Lithografiedruckplatte |
| EP3392709A1 (de) | 2017-04-21 | 2018-10-24 | Agfa Nv | Lithografiedruckplattenvorläufer |
| WO2020120402A1 (en) * | 2018-12-10 | 2020-06-18 | Agfa Nv | On-press processing of a uv or violet-sensitized lithographic printing plate |
| CN114531860B (zh) | 2019-09-30 | 2024-01-30 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| CN114450161B (zh) * | 2019-09-30 | 2024-04-02 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| EP4263224A1 (de) | 2020-12-16 | 2023-10-25 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
| EP4382306A1 (de) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
Family Cites Families (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE635804A (de) | 1962-03-21 | |||
| DE2064079C2 (de) | 1970-12-28 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
| DE2209128C3 (de) * | 1971-03-05 | 1981-10-22 | CIBA-GEIGY AG, 4002 Basel | Bis-Stilbenverbindungen, Verfahren zu deren Herstellung und deren Verwendung als optische Aufheller |
| US4231957A (en) * | 1977-11-04 | 1980-11-04 | Ciba-Geigy Corporation | Phosphonium compounds, a process for their preparation and a process for the preparation of asymmetrically substituted stilbene fluorescent brightening agents |
| DE2822190A1 (de) | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
| US4252887A (en) | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
| EP0030917B2 (de) * | 1979-12-13 | 1991-03-20 | Ciba-Geigy Ag | Optische Aufheller aus Bis-styrylbenzolverbindungen, Verfahren zu deren Herstellung und deren Verwendung |
| US4459349A (en) | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US4410621A (en) * | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
| JPS5956403A (ja) | 1982-09-27 | 1984-03-31 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
| DE3347576A1 (de) * | 1983-12-30 | 1985-07-11 | Bayer Ag, 5090 Leverkusen | 1,4-bis-(styryl)-benzole und deren verwendung als optische aufheller |
| US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
| DE3936793A1 (de) * | 1989-11-04 | 1991-05-08 | Bayer Ag | Weisstoenerhaltige papierstreichmassen |
| US5401607A (en) * | 1991-04-17 | 1995-03-28 | Polaroid Corporation | Processes and compositions for photogeneration of acid |
| US6514668B1 (en) | 1996-12-26 | 2003-02-04 | Mitsubishi Chemical Corporation | Photosensitive lithographic printing plate |
| US6468711B1 (en) | 1998-09-09 | 2002-10-22 | Fuji Photo Film Co., Ltd. | Photosensitive composition and method for manufacturing lithographic printing plate |
| DE69909734T2 (de) | 1999-02-02 | 2004-04-15 | Agfa-Gevaert | Verfahren zur Herstellung positiv arbeitender Druckplatten |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| DE19915717A1 (de) | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
| US6335144B1 (en) | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
| DE19933139A1 (de) | 1999-07-19 | 2001-01-25 | Agfa Gevaert Ag | Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial |
| JP2001033961A (ja) | 1999-07-23 | 2001-02-09 | Fuji Photo Film Co Ltd | 感光性組成物および平版印刷版の製版方法 |
| DE19944073A1 (de) | 1999-09-14 | 2001-03-15 | Agfa Gevaert Ag | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
| JP4037015B2 (ja) | 1999-09-22 | 2008-01-23 | 富士フイルム株式会社 | 光重合性組成物、画像形成材料及び平版印刷版用版材 |
| JP3568431B2 (ja) * | 1999-09-29 | 2004-09-22 | 京セラミタ株式会社 | スチルベン誘導体、その製造方法およびそれを用いた電子写真感光体 |
| US6558873B1 (en) | 1999-10-05 | 2003-05-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
| US6797446B2 (en) * | 1999-12-31 | 2004-09-28 | Samsung Electronics Co., Ltd. | Electrophotographic photoreceptors |
| JP4230130B2 (ja) | 2001-07-04 | 2009-02-25 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
| US6875557B2 (en) | 2001-08-29 | 2005-04-05 | Fuji Photo Film Co., Ltd. | Plate-making method of printing plate |
| US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
| EP1349006B1 (de) | 2002-03-28 | 2013-09-25 | Agfa Graphics N.V. | Fotopolymerisierbare Zusammensetzung, die im Wellenlängenbereich von 300 bis zu 450 nm sensibilisiert ist |
| EP1356926B1 (de) | 2002-04-26 | 2008-01-16 | Agfa Graphics N.V. | Negativ-arbeitender thermischer Flachdruckplattenvorläufer, der einen Aluminiumträger mit einer glatten Oberfläche enthält |
| JP4469561B2 (ja) | 2003-05-09 | 2010-05-26 | 富士フイルム株式会社 | 感光性組成物 |
| JP4418714B2 (ja) | 2003-07-10 | 2010-02-24 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| JP2005238816A (ja) | 2003-07-22 | 2005-09-08 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
| US20080160447A1 (en) | 2003-09-22 | 2008-07-03 | Willi-Kurt Gries | Photopolymer Printing Plate Precursor |
| US7527916B2 (en) * | 2003-09-22 | 2009-05-05 | Agfa Graphics, N.V. | Photopolymerizable composition |
| JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
| EP1521123B1 (de) | 2003-10-02 | 2013-08-07 | Agfa Graphics N.V. | Alkalischer Entwickler für strahlungsempfindliche Zusammensetzungen |
| DE602005003244T2 (de) | 2004-01-23 | 2008-09-25 | Fujifilm Corp. | Lithographiedruckplattenvorläufer und lithographisches Druckverfahren |
| JP4439327B2 (ja) | 2004-04-30 | 2010-03-24 | 富士フイルム株式会社 | 平版印刷版用原版 |
| ATE553417T1 (de) | 2004-05-06 | 2012-04-15 | Agfa Graphics Nv | Fotopolymer-druckplatten-vorläufer |
| US7767382B2 (en) * | 2004-05-19 | 2010-08-03 | Agfa Graphics Nv | Method of making a photopolymer printing plate |
| US20060001849A1 (en) * | 2004-07-01 | 2006-01-05 | Ray Kevin B | Imaging a violet sensitive printing plate using multiple low power light sources |
| DE602004018483D1 (de) | 2004-07-30 | 2009-01-29 | Agfa Graphics Nv | Fotopolymerisierbare Zusammensetzung. |
| DE602004011046T2 (de) | 2004-07-30 | 2009-01-02 | Agfa Graphics N.V. | Divinylfluorene |
| WO2006048443A2 (en) | 2004-11-05 | 2006-05-11 | Agfa Graphics Nv | Photopolymerizable composition |
| US7749683B2 (en) | 2004-11-05 | 2010-07-06 | Agfa Graphics Nv | Photopolymerizable composition |
| JP2006215241A (ja) | 2005-02-03 | 2006-08-17 | Konica Minolta Medical & Graphic Inc | 感光性平版印刷版材料及びそれを用いた製版方法 |
| DE602005024371D1 (de) | 2005-05-10 | 2010-12-09 | Agfa Gevaert Nv | Verfahren zur Verarbeitung von Flachdruckplatten |
| ATE480800T1 (de) | 2005-05-10 | 2010-09-15 | Agfa Graphics Nv | Alkalischer entwickler für strahlungsempfindliche zusammensetzungen |
| JP4792326B2 (ja) | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
| ATE445861T1 (de) | 2005-08-26 | 2009-10-15 | Agfa Graphics Nv | Photopolymer druckplattenvorläufer |
| DE602008004246D1 (de) | 2007-05-25 | 2011-02-10 | Agfa Graphics Nv | Flachdruckplattenvorläufer |
-
2008
- 2008-05-15 DE DE602008004246T patent/DE602008004246D1/de active Active
- 2008-05-15 US US12/602,042 patent/US8445176B2/en active Active
- 2008-05-15 BR BRPI0811197-9A patent/BRPI0811197B1/pt not_active IP Right Cessation
- 2008-05-15 AT AT08759621T patent/ATE493688T1/de not_active IP Right Cessation
- 2008-05-15 EP EP08759621A patent/EP2153279B1/de active Active
- 2008-05-15 CN CN2008800174805A patent/CN101681106B/zh active Active
- 2008-05-15 WO PCT/EP2008/055951 patent/WO2008145528A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN101681106A (zh) | 2010-03-24 |
| US8445176B2 (en) | 2013-05-21 |
| CN101681106B (zh) | 2013-11-20 |
| WO2008145528A1 (en) | 2008-12-04 |
| EP2153279A1 (de) | 2010-02-17 |
| ATE493688T1 (de) | 2011-01-15 |
| BRPI0811197B1 (pt) | 2019-04-02 |
| US20100190105A1 (en) | 2010-07-29 |
| EP2153279B1 (de) | 2010-12-29 |
| BRPI0811197A2 (pt) | 2014-10-29 |
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