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MX375818B - Método para producir placas de impresión flexográfica a través de múltiple exposición con leds uv. - Google Patents

Método para producir placas de impresión flexográfica a través de múltiple exposición con leds uv.

Info

Publication number
MX375818B
MX375818B MX2017007720A MX2017007720A MX375818B MX 375818 B MX375818 B MX 375818B MX 2017007720 A MX2017007720 A MX 2017007720A MX 2017007720 A MX2017007720 A MX 2017007720A MX 375818 B MX375818 B MX 375818B
Authority
MX
Mexico
Prior art keywords
layer
sup
flexographic printing
forming layer
photopolymerizable
Prior art date
Application number
MX2017007720A
Other languages
English (en)
Other versions
MX2017007720A (es
Inventor
Matthias Beyer
Peter Fronczkiewicz
Thorben Wendland
Original Assignee
Flint Group Germany Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52282414&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MX375818(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Flint Group Germany Gmbh filed Critical Flint Group Germany Gmbh
Publication of MX2017007720A publication Critical patent/MX2017007720A/es
Publication of MX375818B publication Critical patent/MX375818B/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

Un método para producir placas de impresión flexográfica, en las cuales un elemento de impresión flexográfica fotopolimerizable se utiliza como el material de partida, el cual comprende al menos los siguientes, colocados encimados entre sí; un soporte dimensionalmente estable, y al menos una capa fotopolimerizable formadora de relieves, que comprende al menos un aglutinante elastomérico, un compuesto etilénicamente insaturado y un fotoiniciador; y una capa capaz de formar imágenes digitalmente, y el método comprende al menos las siguientes etapas: (a) generar una máscara creando imágenes de la capa capaz de formar imágenes digitalmente, (b) exponer la capa fotopolimerizable formadora de relieves a través de la máscara utilizando luz actínica y fotopolimerización de las regiones de imagen de la capa; y (c) revelar la capa fotopolimerizada lavando las regiones no fotopolimerizadas de la capa formadora de relieves utilizando un solvente orgánico o utilizando revelado térmico, caracterizado en que la etapa (b) comprende dos o más ciclos de exposición (b-1) a (b-n) utilizando luz actínica a una intensidad de 100 a 10000 mV/cm2 de una pluralidad de LEDs UV, en donde la energía introducida en la capa fotopolimerizable formadora de relieves por ciclo de exposición es de 0.1 a 5 J/cm2.
MX2017007720A 2014-12-17 2015-12-16 Método para producir placas de impresión flexográfica a través de múltiple exposición con leds uv. MX375818B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14198604.2A EP3035123A1 (de) 2014-12-17 2014-12-17 Verfahren zur Herstellung von Flexodruckformen durch mehrfache Belichtung mit UV-LEDs
PCT/EP2015/079930 WO2016096945A1 (de) 2014-12-17 2015-12-16 Verfahren zur herstellung von flexodruckformen durch mehrfache belichtung mit uv-leds

Publications (2)

Publication Number Publication Date
MX2017007720A MX2017007720A (es) 2017-09-05
MX375818B true MX375818B (es) 2025-03-07

Family

ID=52282414

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2017007720A MX375818B (es) 2014-12-17 2015-12-16 Método para producir placas de impresión flexográfica a través de múltiple exposición con leds uv.

Country Status (9)

Country Link
US (1) US10175580B2 (es)
EP (2) EP3035123A1 (es)
JP (1) JP6726190B2 (es)
CN (1) CN107278278B (es)
BR (1) BR112017012559B1 (es)
ES (1) ES2786320T3 (es)
MX (1) MX375818B (es)
PL (1) PL3234696T3 (es)
WO (1) WO2016096945A1 (es)

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CN113934116B (zh) 2015-10-26 2024-07-23 埃斯科绘图成像有限责任公司 用于弹性印刷板的受控曝光的系统和方法
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US11007767B2 (en) 2016-11-28 2021-05-18 Flint Group Germany Gmbh Light exposure device and method for exposing plate-shaped materials to light
DE202018006543U1 (de) 2017-03-20 2021-02-15 Esko-Graphics Imaging Gmbh Einrichtung zum Anpassen des Bodens einer flexografischen Druckplatte in einem gesteuerten bzw. geregelten Belichtungssystem
WO2019072701A1 (de) 2017-10-10 2019-04-18 Flint Group Germany Gmbh Reliefvorläufer mit geringem cupping und fluting
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
WO2019192764A1 (en) 2018-04-06 2019-10-10 Esko-Graphics Imaging Gmbh Method for persistent marking of flexo plates with workflow information and plates marked therewith
CN112334839B (zh) 2019-05-30 2023-10-31 埃斯科绘图成像有限责任公司 自动测量光聚合物印刷版密度的处理和装置
JP7133083B2 (ja) * 2019-08-29 2022-09-07 エスコ－グラフィックス イメージング ゲゼルシャフト ミット ベシュレンクテル ハフツング フォトポリマー露光で使用するためのｕｖ ｌｅｄ放射光源
US11878503B2 (en) 2019-10-07 2024-01-23 Esko Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
US20210318620A1 (en) 2020-04-10 2021-10-14 Esko-Graphics Imaging Gmbh Systems and methods for optimization of parameters for exposing flexographic photopolymer plates
NL2025875B1 (en) * 2020-06-19 2022-02-17 Xeikon Prepress Nv Apparatus and method for exposure of relief precursors
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NL2027142B1 (en) * 2020-12-17 2022-07-11 Flint Group Germany Gmbh Method for exposure of relief precursors with multiple profiles
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US20240316914A1 (en) * 2023-03-20 2024-09-26 Macdermid Graphics Solutions, Llc Curing of Flexo Printing Elements Using UV LED Systems

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Also Published As

Publication number Publication date
US10175580B2 (en) 2019-01-08
EP3234696B1 (de) 2020-02-05
BR112017012559A2 (pt) 2018-01-02
JP2018503120A (ja) 2018-02-01
PL3234696T3 (pl) 2020-09-07
CN107278278B (zh) 2020-09-11
EP3035123A1 (de) 2016-06-22
BR112017012559B1 (pt) 2022-06-07
MX2017007720A (es) 2017-09-05
ES2786320T3 (es) 2020-10-09
WO2016096945A1 (de) 2016-06-23
JP6726190B2 (ja) 2020-07-22
EP3234696A1 (de) 2017-10-25
US20180004093A1 (en) 2018-01-04
CN107278278A (zh) 2017-10-20

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