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DE60034513D1 - Verfahren zur Herstellung eines Sputtertargets - Google Patents

Verfahren zur Herstellung eines Sputtertargets

Info

Publication number
DE60034513D1
DE60034513D1 DE60034513T DE60034513T DE60034513D1 DE 60034513 D1 DE60034513 D1 DE 60034513D1 DE 60034513 T DE60034513 T DE 60034513T DE 60034513 T DE60034513 T DE 60034513T DE 60034513 D1 DE60034513 D1 DE 60034513D1
Authority
DE
Germany
Prior art keywords
producing
sputtering target
sputtering
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60034513T
Other languages
English (en)
Other versions
DE60034513T2 (de
Inventor
Gang Han
Hideo Murata
Hideki Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Publication of DE60034513D1 publication Critical patent/DE60034513D1/de
Application granted granted Critical
Publication of DE60034513T2 publication Critical patent/DE60034513T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/14—Treatment of metallic powder
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
DE60034513T 1999-07-07 2000-07-05 Verfahren zur Herstellung eines Sputtertargets Expired - Lifetime DE60034513T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19299499 1999-07-07
JP11192994A JP2001020065A (ja) 1999-07-07 1999-07-07 スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料

Publications (2)

Publication Number Publication Date
DE60034513D1 true DE60034513D1 (de) 2007-06-06
DE60034513T2 DE60034513T2 (de) 2008-01-03

Family

ID=16300465

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60034513T Expired - Lifetime DE60034513T2 (de) 1999-07-07 2000-07-05 Verfahren zur Herstellung eines Sputtertargets

Country Status (4)

Country Link
US (2) US6589311B1 (de)
EP (1) EP1066899B1 (de)
JP (1) JP2001020065A (de)
DE (1) DE60034513T2 (de)

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US6676728B2 (en) 2004-01-13
US6589311B1 (en) 2003-07-08
US20030019326A1 (en) 2003-01-30
EP1066899A3 (de) 2004-03-17
EP1066899B1 (de) 2007-04-25
DE60034513T2 (de) 2008-01-03
EP1066899A2 (de) 2001-01-10
JP2001020065A (ja) 2001-01-23

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