[go: up one dir, main page]

BR0207384A - Chapas de metal refratário com textura uniforme e métodos de fabricação das mesmas - Google Patents

Chapas de metal refratário com textura uniforme e métodos de fabricação das mesmas

Info

Publication number
BR0207384A
BR0207384A BR0207384-6A BR0207384A BR0207384A BR 0207384 A BR0207384 A BR 0207384A BR 0207384 A BR0207384 A BR 0207384A BR 0207384 A BR0207384 A BR 0207384A
Authority
BR
Brazil
Prior art keywords
uniform texture
refractory metal
metal sheets
manufacturing methods
spray
Prior art date
Application number
BR0207384-6A
Other languages
English (en)
Inventor
Peter R Jepson
Henning Uhlenhut
Prabhat Kumar
Original Assignee
Starck H C Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23029400&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR0207384(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Starck H C Inc filed Critical Starck H C Inc
Publication of BR0207384A publication Critical patent/BR0207384A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Forging (AREA)
  • Powder Metallurgy (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Aerials With Secondary Devices (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

"CHAPAS DE METAL REFRATáRIO COM TEXTURA UNIFORME E MéTODOS DE FABRICAçãO DAS MESMAS". Método (10) de formar alvo de borrifo a partir de lingotes de tântalo ou nióbio de pureza requisitada pelo processo de corte do lingote em comprimentos curtos (12) e pelo trabalho de pressão (14, 22, 30, 34) do lingote ao longo de eixos de trabalho alternados essencialmente ortogonais. Recozimentos intermediários (18, 26, 38) são aplicados, conforme necessário, para estabelecer uma textura uniforme no sentido da espessura e área ampla por todo o alvo, incluindo o centro. A textura uniforme é uma mistura substancialmente constante de grãos com orientação (100) e (111), aperfeiçoando assim o desempenho do borrifo com a provisão de uma taxa de borrifo mais previsível para controlar a espessura do filme.
BR0207384-6A 2001-02-20 2002-02-20 Chapas de metal refratário com textura uniforme e métodos de fabricação das mesmas BR0207384A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26998301P 2001-02-20 2001-02-20
PCT/US2002/005033 WO2002070765A1 (en) 2001-02-20 2002-02-20 Refractory metal plates with uniform texture and methods of making the same

Publications (1)

Publication Number Publication Date
BR0207384A true BR0207384A (pt) 2004-02-10

Family

ID=23029400

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0207384-6A BR0207384A (pt) 2001-02-20 2002-02-20 Chapas de metal refratário com textura uniforme e métodos de fabricação das mesmas

Country Status (20)

Country Link
US (1) US20020112789A1 (pt)
EP (1) EP1366203B1 (pt)
JP (1) JP4327460B2 (pt)
KR (1) KR100966682B1 (pt)
CN (2) CN1789476A (pt)
AT (1) ATE339532T1 (pt)
AU (1) AU2002257005B2 (pt)
BR (1) BR0207384A (pt)
CA (1) CA2438819A1 (pt)
CZ (1) CZ20032246A3 (pt)
DE (1) DE60214683T2 (pt)
ES (1) ES2272707T3 (pt)
HU (1) HUP0303269A3 (pt)
IL (1) IL157279A0 (pt)
MX (1) MXPA03007490A (pt)
NO (1) NO20033547L (pt)
NZ (1) NZ527628A (pt)
PT (1) PT1366203E (pt)
WO (1) WO2002070765A1 (pt)
ZA (1) ZA200306399B (pt)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040016635A1 (en) * 2002-07-19 2004-01-29 Ford Robert B. Monolithic sputtering target assembly
JP4263900B2 (ja) * 2002-11-13 2009-05-13 日鉱金属株式会社 Ｔａスパッタリングターゲット及びその製造方法
BRPI0409797A (pt) * 2003-04-23 2006-05-30 Starck H C Inc alvos para raios-x de liga de molibdênio tendo uma estrutura de grão uniforme
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
US20040256226A1 (en) * 2003-06-20 2004-12-23 Wickersham Charles E. Method and design for sputter target attachment to a backing plate
CN1871372B (zh) * 2003-11-06 2010-11-17 日矿金属株式会社 钽溅射靶
WO2005080961A2 (en) * 2004-02-18 2005-09-01 Cabot Corporation Ultrasonic method for detecting banding in metals
WO2005098073A1 (en) 2004-03-26 2005-10-20 H.C. Starck Inc. Refractory metal pots
US7666243B2 (en) 2004-10-27 2010-02-23 H.C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
US7998287B2 (en) * 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
JP5065248B2 (ja) 2005-05-05 2012-10-31 ハー．ツェー．スタルク ゲゼルシャフト ミット ベシュレンクテル ハフツング 基材表面の被覆法及び被覆製品
EP1880036A2 (en) * 2005-05-05 2008-01-23 H.C. Starck GmbH Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
US20070044873A1 (en) 2005-08-31 2007-03-01 H. C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
CZ308045B6 (cs) 2006-03-07 2019-11-20 Cabot Corp Způsob výroby kovového výrobku a kovová deska, vyrobená tímto způsobem
JP4974362B2 (ja) 2006-04-13 2012-07-11 株式会社アルバック Ｔａスパッタリングターゲットおよびその製造方法
US20080078268A1 (en) 2006-10-03 2008-04-03 H.C. Starck Inc. Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof
US7776166B2 (en) * 2006-12-05 2010-08-17 Praxair Technology, Inc. Texture and grain size controlled hollow cathode magnetron targets and method of manufacture
US20080145688A1 (en) 2006-12-13 2008-06-19 H.C. Starck Inc. Method of joining tantalum clade steel structures
US8197894B2 (en) * 2007-05-04 2012-06-12 H.C. Starck Gmbh Methods of forming sputtering targets
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
EP2185300B1 (en) * 2007-08-06 2018-10-24 H. C. Starck, Inc. Refractory metal plates with improved uniformity of texture
US8246903B2 (en) 2008-09-09 2012-08-21 H.C. Starck Inc. Dynamic dehydriding of refractory metal powders
US8043655B2 (en) * 2008-10-06 2011-10-25 H.C. Starck, Inc. Low-energy method of manufacturing bulk metallic structures with submicron grain sizes
CN101920436B (zh) * 2010-08-20 2011-10-26 宁夏东方钽业股份有限公司 溅射钽环件用钽条的制备工艺
CN102021523A (zh) * 2010-09-29 2011-04-20 吴江南玻华东工程玻璃有限公司 一种解决镀膜玻璃边缘效应的方法
US9120183B2 (en) 2011-09-29 2015-09-01 H.C. Starck Inc. Methods of manufacturing large-area sputtering targets
CN102658346A (zh) * 2012-04-06 2012-09-12 宁夏东方钽业股份有限公司 一种大规格钽靶材的锻造方法
CN102699247B (zh) * 2012-05-18 2014-06-18 宁夏东方钽业股份有限公司 一种超导钽棒的锻造方法
CN103861982B (zh) * 2012-12-18 2016-06-15 宁夏东方钽业股份有限公司 一种铌旋转靶材铸锭的锻造方法
CN104419901B (zh) * 2013-08-27 2017-06-30 宁波江丰电子材料股份有限公司 一种钽靶材的制造方法
JP6009683B2 (ja) * 2014-03-27 2016-10-19 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
EP3129176B1 (en) 2014-04-11 2024-10-09 Materion Newton Inc. High purity refractory metal sputtering targets which have a uniform random texture manufactured by hot isostatic pressing high purity refractory metal powders
WO2016104878A1 (ko) * 2014-12-22 2016-06-30 국방과학연구소 탄탈륨의 미세조직 및 집합조직 제어방법
JP6293928B2 (ja) 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
JP6293929B2 (ja) * 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
US11177119B2 (en) * 2017-03-30 2021-11-16 Jx Nippon Mining & Metals Corporation Tantalum sputtering target
US11062889B2 (en) 2017-06-26 2021-07-13 Tosoh Smd, Inc. Method of production of uniform metal plates and sputtering targets made thereby
US20190161850A1 (en) * 2017-11-30 2019-05-30 Tosoh Smd, Inc. Ultra-fine grain size tantalum sputtering targets with improved voltage performance and methods thereby
JP7076632B2 (ja) 2019-03-26 2022-05-27 Ｊｘ金属株式会社 ニオブスパッタリングターゲット
CN110983218B (zh) * 2019-12-25 2021-09-03 西部超导材料科技股份有限公司 一种组织均匀的小规格纯铌棒材的制备方法
CN112143990B (zh) * 2020-09-04 2022-01-07 中国航发北京航空材料研究院 一种钛合金β相大尺寸单晶的制备方法
CN116288091A (zh) * 2023-03-28 2023-06-23 南昌大学 一种低温制备超细晶粒钽片的退火工艺
US20250179624A1 (en) 2023-12-05 2025-06-05 Tosoh Smd, Inc. Tantalum sputtering target with improved performance and predictability and method of manufacturing
TW202540463A (zh) * 2023-12-05 2025-10-16 美商塔沙Ｓｍｄ公司 具有改善的性能及可預測性之鉭濺射靶及其製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2603980B2 (ja) * 1988-01-13 1997-04-23 株式会社東芝 高断熱性鋳鉄
JP2796752B2 (ja) * 1990-04-27 1998-09-10 日本軽金属株式会社 耐食皮膜用Ａｌ―Ｎｉ―Ｓｉ合金製スパッタリングターゲット
JPH06264233A (ja) * 1993-03-12 1994-09-20 Nikko Kinzoku Kk Ｔｆｔ製造用スパッタリングタ−ゲット
JP2857015B2 (ja) * 1993-04-08 1999-02-10 株式会社ジャパンエナジー 高純度アルミニウムまたはその合金からなるスパッタリングターゲット
US5590389A (en) * 1994-12-23 1996-12-31 Johnson Matthey Electronics, Inc. Sputtering target with ultra-fine, oriented grains and method of making same
US5850755A (en) * 1995-02-08 1998-12-22 Segal; Vladimir M. Method and apparatus for intensive plastic deformation of flat billets
JPH10235670A (ja) * 1997-02-26 1998-09-08 Tosoh Corp ポリオレフィン樹脂連続気泡発泡体の製造方法
US6569270B2 (en) * 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
US6348139B1 (en) * 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6464809B2 (en) * 1998-11-30 2002-10-15 Outokumpu Oyj Processes for producing articles with stress-free slit edges
JP3079378B1 (ja) * 1999-02-10 2000-08-21 東京タングステン株式会社 Ｍｏスパッターリングターゲット材及びその製造方法
JP2001020065A (ja) * 1999-07-07 2001-01-23 Hitachi Metals Ltd スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料
US6878250B1 (en) * 1999-12-16 2005-04-12 Honeywell International Inc. Sputtering targets formed from cast materials
US6331233B1 (en) * 2000-02-02 2001-12-18 Honeywell International Inc. Tantalum sputtering target with fine grains and uniform texture and method of manufacture
ATE412782T1 (de) * 2000-05-22 2008-11-15 Cabot Corp Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung

Also Published As

Publication number Publication date
EP1366203A4 (en) 2004-07-28
CN1535322A (zh) 2004-10-06
EP1366203A1 (en) 2003-12-03
ZA200306399B (en) 2004-08-18
WO2002070765A1 (en) 2002-09-12
JP2004526863A (ja) 2004-09-02
MXPA03007490A (es) 2004-09-06
ATE339532T1 (de) 2006-10-15
JP4327460B2 (ja) 2009-09-09
DE60214683D1 (de) 2006-10-26
HK1066833A1 (zh) 2005-04-01
IL157279A0 (en) 2004-02-19
AU2002257005B2 (en) 2007-05-31
CN1789476A (zh) 2006-06-21
EP1366203B1 (en) 2006-09-13
PT1366203E (pt) 2006-12-29
KR100966682B1 (ko) 2010-06-29
HUP0303269A3 (en) 2004-05-28
NO20033547D0 (no) 2003-08-11
US20020112789A1 (en) 2002-08-22
ES2272707T3 (es) 2007-05-01
NZ527628A (en) 2004-07-30
CA2438819A1 (en) 2002-09-12
DE60214683T2 (de) 2007-09-13
KR20030090645A (ko) 2003-11-28
NO20033547L (no) 2003-09-26
CN1238547C (zh) 2006-01-25
HUP0303269A2 (hu) 2004-01-28
CZ20032246A3 (cs) 2004-03-17

Similar Documents

Publication Publication Date Title
BR0207384A (pt) Chapas de metal refratário com textura uniforme e métodos de fabricação das mesmas
IL166622A (en) Process for making alumina and layered coatings containing them
AU2003242371A1 (en) Room-temperature molten salt, process for producing the same and applications thereof
EP1295954A4 (en) PLATINUM MATERIAL REINFORCED BY DISPERSED OXIDES AND PRODUCTION METHOD THEREFOR
DE60102485D1 (de) Herstellung von aluminium-silizium-legierungen
CS276979B6 (en) Process for producing oriented strip or sheet from silicon steel with orientation in the direction of an elementary cube edge from continuously cast slabs
FR2856079B1 (fr) Procede de traitement de surface pour toles et bandes en alliage d'aluminium
CA2299088A1 (en) Method for shaping strip-like films
EP1266703A3 (en) System and method for optimizing mill cuts
CN106694547B (zh) 一种阳极氧化用硬态铝合金的热轧工艺
CN206764034U (zh) 一种建筑钢板用切割装置
JPS5756104A (en) Blooming method by universal slabbing mill
Hartung et al. Increased yield of cold strip through the EDC system
DK1411140T3 (da) Fremgangsmåde ved fremstilling af særlig godt formbart stålbånd eller stålplade
Durnev Conditions of formation symmetry of(100)[001] orientation during rolling of electrical steel
JPS6468437A (en) Tic grain dispersion strengthened titanium based alloy
Chen et al. A study on annealing treatment under various temperatures for the interfaces of Cu-Ag composite sheets
JPS5662602A (en) Production of aluminum plate
Kazabov et al. Study of the Engineering Parameters of High-Speed Rolling of Thin Sheet Made From AMg 2 and Al--Mg Aluminum Alloy
TW291498B (en) Superplastic aluminum alloy and manufacture thereof
Kamiya et al. Ti-4. 5 Al-3 V-2 Fe-2 Mo denture base processed by superplastic forming
Araiza et al. Effect of cold reduction and annealing temperature on the normal anisotropy of fast-annealed strips fabricated from continuous cast low carbon steel thin slabs
JPH0255651A (ja) 切屑処理法に優れたｓ系快削ステンレス鋼の製造法
Zentsov et al. The foundations of lead sheet and foil technology
JPS56107846A (en) Method of producing scissors

Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B11B Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements