DE4329338A1 - Method and device for forming a photoresist pattern - Google Patents

Abstract

A pattern which is designed in a pattern-design step (2) is converted into a sequence in a signal-conversion step (3) in accordance with the arrangement of an injection head for injecting solution droplets of a photoresist solution. The converted signal is converted into a drive signal for the injection head in a step (4) for formation of a head-drive signal. A step (6) of injecting the solution droplets is subsequently carried out, during which the injection head is driven in accordance with the drive signal, in order to inject solution droplets of a photoresist solution onto a base part. In addition, a curing step (8) for curing the solution droplets which have been injected onto the base part, an etching step (9) for etching the base part and a photoresist removal step (10) for removing a photoresist pattern are carried out, as a result of which the steps of the photoresist pattern formation are completed. <IMAGE>

Description

The present invention relates to a method and a device for forming a photoresist pattern, wel ches for a machining method using ei nes photoresist pattern is used and the step of Forming a pattern on a surface of a base partly using a photoresist layer and the step of causing machining changes tion in a part of the surface which does not have any has formed pattern, while the pattern part before egg processing action based on occurrence or the absence of the pattern on the surface is protected, whereupon processing continues becomes.

In some machining processes, a pattern is applied a surface of a base part using a Photoresist layer is formed and it becomes a processing change caused in a part which is not has pattern formed thereon while the pattern part is protected from a processing action, whereupon processing continues.

Such a processing method is used for ver various known areas are used, for example when etching, when coating with a metal layer coating and electrolytic oxidation to form a pattern. I.e. the procedure is in applied in a wide area.

Fig. 13 is a diagram showing the steps in a known etching processing method.

The etching processing method will be described with reference to FIG . A base part, for example a metal part or a polyimide part, which can be dissolved by a Ätzflüs fluid, is prepared. A cleaning step 201 for degreasing and the like is performed a first time with respect to the base part. A heat treatment step 202 is then performed to remove adsorbed moisture.

A photoresist application step 203 is then carried out. In this photoresist application step, a photoresist solution is applied to the base part, or a photoresist layer processed in advance is bonded in the form of a layer on the base part by contact bonding. In a preheat treatment step 204 , a solvent of the photoresist is evaporated and removed.

A pattern used for etching is generated in a pattern design step 205 using a CAD system (Computer Aided Design system) or the like. This designed pattern is used in a recording step 206 by a partition pad or a photo plotter, and is subjected to pattern checking processing.

At this stage, the pattern is drawn in a size larger than that of a normally machined pattern. The drawn-out pattern is then processed in a layer photography step 207 using a camera, and the photographed layer is developed into a layer.

The layer obtained in this way is an origi nal plate for exposure.

In an exposure step 208 , the original exposure plate is placed on the surface of the heat pre-treated th base part, and ultraviolet exposure is carried out from above the original plate.

The pattern on the original exposure plate will be designed so that a pattern part corresponds to a Part of the surface that remains after etching should, is transparent, and a sample part accordingly a surface part that is to be removed, is black.

When the ultraviolet exposure is carried out using such an original exposure plate, a resist part is polymerized at a position corresponding to a transparent part of the pattern and cured by ultraviolet light. Therefore, when the photoresist is polymerized and cured by ultraviolet light, the exposure step is completed. After the exposure step, a development step 209 is carried out in order to remove the photoresist material which has not been cured. Thereafter, a post-heat treatment step 210 is performed to evaporate a developing solution and a washing solution. In addition, the adhesive strength of the hardened parts is increased by heating. With this processing, the steps of the photoresist pattern formation are completed.

When the patterning of the photoresist is completed in this way, the flow proceeds to an etching step 211 . In the etching step 211 of the base, a solution which chemically dissolves a metal such as ferric chloride or cuprichloride is brought into contact with the patterned surface to remove the metal on parts of the base on which no photoresist pattern has been formed . In a photoresist removal step 212 , the last step is the photoresist layer, which is no longer required, stripped off or removed by oxidation, whereupon the whole process is ended.

Note that the following devices are used in the above described steps of the photoresist pattern formation ver used: a cleaning bath, a heat treatment oven, a photoresist coating or a unit for the con timing bonding, an ultraviolet exposure unit, a photoresist developer, a CAD system, a cut-off plot ter or a photo plotter, a large-format camera, a set of layer development units and a waste water area trading equipment.

As materials are a cleaning solution, photo varnish material, a release layer, a photograph layer, a set of development solutions, a waste treatment agents and the like.

In such a conventional etching process processing method and a corresponding device tre posed the following problems.

In the conventional method, Opera functions experts who have special knowledge and tech niken. In addition, the processing expensive materials for pattern formation needs, and there will be waste solutions and substances which could pollute the environment. The white ters become excessively energetic for such processing energy and water consumed. I.e. many problems remain ben unsolved.

Regarding the steps of the conventional Resist pattern forming processes used apparatus various expensive facilities are used work requires. Since in addition the facilities occupying a large space is the The investment in equipment is enormous and the entertainment or Management of setup costs very large.

When a printed circuit board ge is to be formed in addition to forming a Line pattern, a printing operation is performed to a Print a pattern showing the names, the monta positions, the positions and the like of parts, which used as indexes in subsequent operations , for example when assembling the parts. To For this purpose, a silk screen printing technique (silk screen printing technique). As is known becomes similar with silk screen printing as with education of a photoresist pattern requires an original laminate changes. In addition, this technique contains complicated ones Steps such as forming a plate part, printing of the plate part with ultraviolet light and develop lung. Furthermore, a printing step must be used of the printing plate formed in this way to be able to print figures on the board of the printed circuit to complete. Therefore this includes Printing step in addition to the various above be written problems, which with the conventional Resist pattern formation processes occur more complex xity and problems.

When forming a printed circuit board, it requires a lot of time to form a layer for etching. When dane ben the completed layer is checked and a If an error is found, the stratification must be repeated be carried out, resulting in a great loss to him gives.

When forming a large number of flexible plati Printed circuits will be silk screen printing performed to photoresist pattern on a base part-Ma material to print, which is a role of a base part Material is taken, and the printed sample who the checked. This process is for mass production suitable. However, the procedure requires a lot of time to Trial products or a small number of products, resulting in high costs ben.

It is therefore an object of the present invention to provide a Method and apparatus for forming a photograph paint pattern to be provided, which or which a light Formation of a photoresist allowed, no expensive material lien requires not polluting the environment and economically mixed in terms of set-up and production costs is.

An advantage of the present invention is to provide a Apparatus for forming a photoresist pattern is provided hen which can accomplish the above task and easily can perform the etching of the pattern.

Another advantage of the present invention is es, a device for forming a photoresist pattern to provide which can form a photoresist pattern and printing characters and graphic patterns Use of the same device permitted.

Yet another advantage of the present invention is ready, a resist pattern forming device deliver that easily and efficiently the formation of a Photoresist for the formation of a small number of fle xable printed circuit boards.

In order to achieve the above object according to the present invention, a photoresist pattern forming method is provided for forming a photoresist layer having a predetermined pattern on a surface of a base part to be processed, the photoresist layer for a subsequent processing step of causing the change is used on a surface part which has no photoresist layer formed thereon, based on a feature difference between surface parts due to the presence or absence of the photoresist layer,
wherein a solution droplet injection head is used for drawing / printing an image by performing solution droplet injection based on an image signal, a photoresist solution is used as a solution used in the solution droplet injection head, and an image signal, which represents a pattern to be formed is supplied to the solution droplet injection head, whereby a photoresist layer pattern is printed / formed on the surface of a base part by using the photoresist solution.

In addition, it is an ultraviolet curing agent Photoresist solution from the solution droplet injection head injected to form a pattern, and ultraviolet Light is radiated onto the formed pattern to reduce the Cure solution.

According to this method, the solution droplet becomes in jection head controlled by a control signal, which is formed on the basis of information, which is received in the form of an image signal, and a Photoresist pattern is applied directly to a base part by Fo tolacklösung droplets formed, which from the Lö solution droplet injection head and on adhere to the base part. Therefore, no original plate, which is used for the pattern exposure changes, and no photographic exposure and development steps required. Be accordingly does not require expensive materials and there are none Environmental problems. In addition, the process is be plus setup and production costs economically. Since image information is printed directly, education is a photoresist pattern very easily.

When an ultraviolet curing photoresist solution is used and ultraviolet light is printed on a the pattern is blasted to harden the solution, the ink that is printed on the base part on irradiation with ultraviolet light polymeri sized / hardened to form a strong layer. Dar in addition, the ink adheres firmly to the base part.

Furthermore, the photo layer pattern has forming Device according to the present invention a Lö solution droplet injection step of repeated inject tion of a photoresist solution with respect to the base part same pattern part on the surface of the base part based on the same resist pattern signal.

This process creates a photoresist solution of injected to the injection head directly on a base partial surface based on a photoresist pattern signal, which is in the form of an image signal is received, thereby forming a photoresist pattern becomes. In addition, because solution droplets repeatedly appear same base part surface based on the same When the resist pattern signal is injected, a Photoresist layer formed, which has a sufficient thickness owns.

In the photoresist pattern forming method according to FIG The present invention is the solution droplet injector tion step preferably carried out so that after a complete photoresist pattern through a series of Main / sub-scanning operations on the surface of a Base part has been formed, the same pattern on the Surface of the base part by the same scanning opera functions in turn.

Using this procedure can be a time to go sufficient evaporation of a solution droplet solution with is required between the first injection step and the second injection step guaranteed will.

Furthermore, according to the photoresist pattern forming method according to the present invention Solution droplet injection step preferably carried out leads so that solution droplets on the basis of a photo paint signal can be copied while the phases of belt or cuff-like scan regions (belt-like scan regions), which by main scanning operations of the Injek tion head, which has a width corresponding to a Has a plurality of dots in the sub-scanning direction, shot in the sub-scanning direction of the injection head be practiced so that the regions against each other in Overlap the subscanning direction.

With this method, a photoresist layer, wel no changes in connecting parts of neighboring th scanning regions on the surface of a base part owns, are formed.

According to the present invention, in order to obtain the obi To solve this problem, a photoresist pattern is formed Device provided, which a first injection head for injecting solution droplets from photoresist holes solution to a base part that is to be processed, having a second injection head which is independent gig of the first injection head is arranged to Injection of solution droplets, a scanning device for scanning the first and second injection heads and of the base part relative to each other, a receiving scarf device for receiving a sample image signal, a signal sequence conversion circuit for converting the sample image signals, which from the receiving circuit in accordance mood with an arrangement of each of the injection heads has been received, a voting device to choose from one of the injection heads and a control device for Controlling operations of the injection heads and the Ab touch device.

With this arrangement, operations become equivalent the respective intentions in units of the Injektionsköp fe performed in the same device.

Furthermore, according to the photoresist pattern forming apparatus of the present invention admits that the scanning device comprises a support base, which is suitable, both the base part and a To hold the recording disk, and that the second Injek tion head injects ink, which at the recording plate adhered to form a color image.

With this arrangement, a check pattern is used Checking a photoresist pattern on a record plate before forming a photoresist pattern Formed using a photoresist solution.

According to the resist pattern forming apparatus of FIG present invention, it is preferred that the base part is a printed circuit board, the second Injection head a white pigment ink to form a white pigment image and the receiving circuit a circuit pattern signal and a character / graphic signal receives which are used to print on the printed circuit board.

With this arrangement, by injecting a Fo resist solution, a photoresist pattern is formed, and there are Characters, graphic patterns and the like on the printed Circuit board by injecting a white pigment ink formed.

It also contains photoresist patterns forming Apparatus of the present invention preferably one Role around which a plate-like base part, which is to be processed, wound around, one Conveyor for conveying the base part, which is fed from the roll, a holder device for Holding the transported base part on a previous agreed portable position and an injection head, which is arranged around the predetermined Position for injecting solution droplets from a photo facing paint solution.

While a plate-like base part, which around a roll is wound, is fed, is with this Arrangement formed a photoresist pattern on the base part.

It also contains photoresist patterns forming Device of the present invention preferably ei Another injection head, which is on a surface is arranged opposite the injection head, wel with respect to the base part fed from the roll is arranged.

With this arrangement, resist patterns become the same early on the upper and lower surfaces of a ba sisteil formed.

Advantageous developments of the invention result from the subclaims.

More details, aspects and benefits of the above lying invention emerge from the following Description with reference to the drawings.

It shows:

Fig. 1 is a diagram showing the steps of a resist pattern forming method according to the present invention;

Fig. 2 is a diagram showing the steps in a case in which an ultraviolet curing solution is used as a photoresist solution;

3A is a view according to the vorlie constricting invention showing the arrangement of a resist pattern-forming device.

Fig. 3B is a front view showing an orifice plate of a solution droplet injection head used in the apparatus shown in Fig. 3A;

Fig. 4 is a view showing the arrangement of another embodiment of the resist pattern forming apparatus of the present invention;

Fig. 5 is a flow chart showing the steps in a case where the injection of a plurality of times is performed using the same pattern signal;

Fig. 6 is a diagram showing the steps of another embodiment of the resist pattern forming method of the present invention;

Fig. 7 is a view showing a patterning process in which the phase of the position of each scanning region is shifted in the sub-scanning direction;

Figs. 8A and in which the solution droplets injection steps in the method shown in Figure 7 are carried out as independent steps 8B views showing a method zei gen.

Fig. 9 is a view showing the arrangement of still another embodiment of the resist pattern forming apparatus of the present invention;

Fig. 10 is a view showing the arrangement of still another embodiment of the resist pattern forming apparatus of the present invention;

Fig. 11 is a view showing the arrangement of still another embodiment of the resist pattern forming apparatus of the present invention;

Fig. 12 is a view showing the arrangement of still another embodiment of the resist pattern forming apparatus of the present invention; and

Fig. 13 is a diagram showing the steps in a conventional resist pattern forming process.

Several embodiments of the present invention are below for the associated drawing wrote.

First embodiment of the method

Fig. 1 shows the steps of a photoresist pattern bil Denden method according to the present invention.

As shown in Fig. 1, the steps of photoresist patterning according to the present invention start with a pattern design step 2 for pattern design to design a required photoresist pattern. A signal converting step 3 is carried out next to convert the designed pattern into a signal for printing. A solution droplet injection head drive signal generation step 4 is then carried out to convert the signal for printing into a head drive signal. A solution droplet injection step 6 is carried out to control a printer in accordance with the solution droplet injection head drive signal formed in the step 4 .

In the solution droplet injection step 6 , a photoresist pattern is injected onto a base part 7 (to be processed) by using a photoresist solution 5 . In an etching step 8 , the base part 7 is etched. Thereafter, in a photoresist removal step 9, the photo paint pattern on the base part 7 , which is no longer required benö, removed.

In forming a photoresist pattern on the base member 7 in the manner described above, the present invention is characterized in that the photoresist pattern is formed by printing using the solution droplet injection head, with an original plate forming step, an exposure step and a developing step being omitted. With this omission, chemicals and water which are required for the formation of the original plate, exposure and development steps are no longer required, thereby realizing energy and labor savings.

In the pattern design step 2 , a pattern design is carried out to obtain the image information of a photoresist pattern as a signal (data). Therefore, this step is preferably carried out using a CAD system in terms of labor saving and efficiency. However, a hand-made original drawing can be read by an image scanner, and the resulting data can be converted into an image signal to be used as image information.

According to the present invention, in the first step, the image information of a pattern is converted into an electric signal to be supplied. In the signal conversion step 3 , the received signal is rearranged according to a combination and a sequence which are suitable for controlling the solution droplet injection head. When an original signal is a vector signal, vector / raster conversion is first performed to obtain a raster image signal.

The raster image signal is converted into a signal train converts which in connection with the outflow opening arrangement of the solution droplet injection head and egg a main / sub-scanning mechanism.

Assuming that the solution droplet Injection head a multiple discharge port arrangement possesses, the respective outflow openings are the same timed to inject solution droplets. In in this case, a plurality of image signals become concurrently one after the other according to the Positions of the discharge opening arrangement extracted and will be the next head drive signal formation step provided. This step is carried out leads to form a signal which is a voltage and has a pulse width required to be control the injection head directly.

The solution drop injection step 6 is the last step in the pattern formation. In this step, a photoresist ink is used as an injection solution.

Properties that a photoresist ink needs be changed differ depending on the Type of the following processing step. If at for example the following step a step under Ver using a water-soluble processing solution, for example etching, electroforming or electrolytic cal oxidation, the photoresist ink must be resistant to to be afloat. In addition, acid resistance can and alkali resistance depending on the formula one Machining solution are required.

Therefore, in this case, an optimal photoresist solution is sung an oil jet ink, a jet ink that penetrates Melting a solid wax is formed, which in molten state is to be injected, an ultra violet-curing ink of the type which later be is written, or something similar.

In the solution droplet injection step 6 , the base 7 is used as an image receiving surface. If the next step is etching, a metal such as copper, nickel or stainless steel or a plastic material which can be etched, for example polyimide, is used as the base part which is to be machined.

If the next step is electroforming becomes a conductive base part like a metal plate used. In this case one layer can do so like an oxide, chromium or sulfide layer on a Me valley surface are formed in order to peel a To facilitate the workpiece.

When the solution droplets attached to the base part adhere, hardened, all steps are the photo paint pattern formation finished.

Fig. 1 shows etch and resist removal steps as examples of subsequent steps. Different etching and resist removal steps are run when other steps are to be performed subsequently.

If etching is to be carried out using a metal plate as the base part 7 , the base part, which sits a photoresist pattern formed thereon, is immersed in an caustic liquid that dissolves ferric chloride, cupric chloride or the like, or doused with an caustic liquid, whereupon the Etching step is continued.

This operation creates a metal part which has no resist pattern formed thereon, is etched and removed, whereas a metal part, which the has photoresist patterns formed thereon, not removed remains on it. As a result, the base part is in Processed to match the resist pattern.

Finally, since the photoresist pattern is not left etched, a photoresist removal step 10 is performed to remove it. Sometimes a photoresist pattern is allowed to be left behind after etching. In such a case, the photoresist removal step is omitted. Usually, however, a photoresist pattern is removed as it interferes with the subsequent steps.

Removing a pattern of photoresist will remove the photo first coat with an alkali solution or similar ches softened and is made by applying an external Power such as water irradiation, showering or the like away. If a photoresist pattern is very thin, it can the photoresist layer can be removed by plasma etching. The present invention is characterized in this regard siert that a photoresist pattern by direct printing on a base part using a solution droplet Injection head is formed. It is one of these Procedure very convenient, an ultraviolet-curing fo resist solution to be used as a photoresist solution, which on is adhered to a base part using a lo solution droplet injection head.

For example, if an ultraviolet curing Solution is used, the ink will not harden, without ultraviolet light being irradiated thereon. There This can result in an obstruction of the injection discharge opening genes due to hardening of the ink can be prevented.

In addition, irradiation with ultra violet light the formed photoresist pattern into one solid layer hardened, and it increases the adhesion strength in relation to the base part. Hence increases the resistance to the in the following step th machining solution used, for example one Etching liquid and an electrolyte, and the execution tion of the photoresist pattern is improved.

Second embodiment of the method

Fig. 2 shows the steps of a photoresist pattern bil Denden method using an ultraviolet curing solution as a photoresist solution. This method differs from that shown in Fig. 1 in that an ultraviolet-curing photoresist solution 5 'is used as a photoresist solution in a solution droplet injection step, and an ultraviolet irradiation step 8 is additionally carried out after the solution droplet injection step.

A formula of an ultraviolet curing photo lacquer solution is shown below:
Pigment or color: appropriate amount (or nothing)
sensitizing agent (e.g. amino composition and keto composition): 2 to 15 (weight ratio)
Oligomer prepolymer (e.g. EA and acrylic urethane): 20 to 50 (weight ratio)
Reactive monomer (e.g. PETA and TMPTA): 10 to 20 (weight ratio)
Additives (for example stabilizers and lubricants): 0.1 to 5 (weight ratio).

A dye is not required as a photo paint samples should not be checked visually. It will however, a small amount of a coloring agent is preferred added as it helps to visually check that the Structuring has been carried out appropriately.

In an etching process for decoration, a photo paint samples are left behind. In this case can intentionally adding a colorant to the photoresist pattern added to improve the visual effect. A Photoresist solution, which is used in this case, must not be of an ultraviolet curing type. However, an ultraviolet curing type is considered Lich the strength and the adhesive strength of a layer before admitted.

In the ultraviolet curing step 8 , an ultraviolet light source such as a high pressure mercury vapor lamp is used to radiate ultraviolet light having a wavelength of 250 nm to 350 nm onto the photoresist pattern to polymerize and cure the prepolymer.

First embodiment of the device

A resist pattern forming apparatus to which the above-described resist pattern forming method of the present invention is applied will next be described with reference to Figs. 3A and 3B.

Fig. 3A shows the arrangement of a resist pattern forming apparatus according to the present invention. Fig. 3B is a front view showing an orifice plate of a solution droplet injection head used in the apparatus.

Referring to Fig. 3A, reference numeral 11 denotes a base plate, 12 a guide post, 13 a guide post beam, 14 a lifting base, 15 a lifting base arm, 16 and 17 slide rails, 18 and 19 slide bearings, 20 a bearing holder, 21 a wire hook , 22 a wire, 23 a wire pulley, 24 a motor support bar, 25 a main scanning motor, 27 a cam follower, 26 a cam follower shaft, 29 a cam, 28 a cam shaft, 30 a sub-scanning motor, 31 a moving / scanning base, 32 a Solution droplet injection head, 33 an orifice plate, 34 a suction holding base, 35 a suction port, 36 an outlet port, 37 an outlet fan, 38 a base part to be processed, 39 a support, 40 a pattern CAD, 41 a receiving circuit, 42 a signal conversion circuit , 43 a head drive circuit, 44 and 35 motor drive circuits, and 46 a control circuit.

The two guide posts 12 extend vertically near one end of one side of the upper surface of the base plate 11 so as to be separated from each other. The guide posts 12 are rod-like parts. The guide support beam 13 is attached to the upper ends of the pair of guide supports 12 to form an arch-like frame.

The lifting base 14 is fitted in the pair of guide posts 12 and is guided by the guide posts 12 to be moved vertically. Slide bearings are fitted in surface parts of the elevator base 14 which are in contact with the guide posts 12 , thereby allowing the elevator base 14 to move smoothly vertically.

The elevator base arm 15 extends horizontally from the elevator base 14 . The two slide rails 16 and 17 are placed close over the distal end of the arm 15 .

The moving / scanning base 31 is mounted on the sliding rails 16 and 17 . For this purpose the slide bearings 18 and 19 are fitted into the bearing holders 20 , and the slide rails 16 and 17 extend over the slide bearings 18 and 19, respectively.

The moving / sensing base 31 has the wire hook 21 to which the wire 22 is attached. The wire 22 is wound around the wire reel 23 which is attached to the shaft of the main scanning motor 25 and around a wire reel which is rotatably attached to another (not shown) lift base arm. When the main scanning motor 25 is rotated with this arrangement, the moving / scanning base 31 moves on the slide rails.

The cam follower 27 is mounted on the lift base 14 through the shaft 26 , and the cam 29 holds the lift base. A coil-like spring S is arranged on the upper side end of the elevator base 14 to bias the elevator base 14 downward.

The shaft 28 is attached to the cam 29 . It is not shown that the shaft 28 is held axially by a La ger, which BEFE is Stigt on the base plate 11 and is coupled to the shaft of the sub-scanning motor 30 ge. With this arrangement, the rotating force of the sub-scanning motor 30 is transmitted to the cam via the shaft 28 . Upon rotation of the cam 29 , the cam follower 27 is vertically moved into contact with a peripheral part of the cam 29 , whereby the lifting base 14 is vertically driven.

The solution droplet injection head 32 is mounted on the moving / scanning base 31 . A photoresist solution is applied to the solution droplet injection head 32 .

When viewed from the front surface side, a plurality of injection outflow ports N are formed on the mouth plate 33 of the solution droplet injection head 32 as shown in Fig. 3B. The injection discharge openings N are arranged two-dimensionally so that their highest positions differ slightly from one another. In addition, the outflow openings N represent a multiple outflow opening structure which is suitable for the simultaneous injection of solution droplets.

The rotating force of the main scanning motor 25 is transmitted to the wire 22 through the rollers so that the wire 22 moves the moving / scanning base 31 along the slide rails 16 and 17 . In the meantime, the solution droplet injection head 32 is operated to form a pattern in a belt-like or cuff-like scanning region having a width W by using the photoresist solution.

The lifting base 14 can be moved vertically by rotating the sub-scanning motor 30 . The amount of movement of the elevator base 14 is set equal to the width W for each scanning operation.

The base part 38 on which a photoresist pattern is to be printed is, for example, a plastic plate which is coated with a copper layer and is used as a printed circuit board which is held on the suction holding base 34 which is attached to the base plate 11 to to face the solution droplets injection head 32 . The suction support base 34 has a box-like shape. The outlet opening 36 is formed on the rear surface of the suction holding base 34 , and the outlet fan 37 is attached to an outlet opening part. A plurality of suction ports 35 are formed on the front surface of the box-like suction holding base 34 . With this arrangement, when the exhaust fan 37 is rotated, air is drawn into the suction holding base 34 through the suction ports 35 ge. Therefore, the base part 38 disposed on the front surface of the suction support base 34 is held under negative pressure.

The main scanning motor 25 is rotated after the base 38 on which the resist pattern is to be printed is held on the suction holding base 34 by suction. The rotating force of the motor 25 is transmitted to the wire 22 via the rollers to move the moving / scanning base 31 along the slide rails 16 and 17 . In the meantime, the solution droplet injection head 32 is operated in accordance with an image signal. As a result, a pattern is formed in a belt-like scanning region having the width W using the photoresist solution. Each time the main scanning operation is completed, the sub-scanning motor 30 is rotated to displace the elevator base 14 by an amount corresponding to the width W, and the moving / scanning base 31 is again moved in the main scanning direction. By repeating this operation, the belt-like or cuff-like scanning region is expanded sequentially to cover the entire surface of the base part 38 . A photoresist pattern can be printed on the entire surface of the base part 38 in accordance with the image signals.

The formation of a pattern to be formed on the base member 38 by the apparatus of the present invention is supplied in the form of an electrical signal. The CAD pattern system 40 is constructed to form pattern information and output it in the form of an electrical signal. The CAD pattern system 40 described here is a unit on the host side. For example, the CAD pattern system 40 forms a circuit pattern drawing for a printed circuit board.

A pattern signal as pattern information output from the CAD pattern system 40 is received by the receiving circuit 41 . The receiving circuit 41 includes an interface circuit and a buffer memory. The signal received by the receiving circuit 41 is supplied to the signal converting circuit 42 . When the pattern signal is a vector signal, the signal converting circuit 42 converts the signal into a raster signal.

The signal conversion circuit 42 performs signal conversion based on the orifice arrangement of the solution droplets injection head 32 as shown in Fig. 3B to form a pattern by injecting solution droplets simultaneously from the respective orifices.

The converted signal is supplied to the head drive circuit 43 to be converted into a drive signal having a voltage and a pulse width suitable for driving the respective solution droplet injection orifice elements. For example, when a printhead used by piezoelectric elements as the solution droplet injection head 32 , a waveform represented by a voltage of about 100 V and a pulse width of several hundred microseconds (µs) is a typical drive pulse waveform.

The motor drive circuits 44 and 45 are used to drive or monitor the motors 25 , 30 (for example, a pulse motor or a servo motor) for a main / sub-scanning operation. The above-described main / sub-scanning movement and driving of the solution droplet injection head 32 for pattern formation must be controlled synchronously. The control circuit 46 is provided for this control. The control circuit 46 simultaneously controls the flow of signals between the host side device 40 and the resist pattern forming device of the present invention and their operations.

When a pattern is designed with this arrangement, the solution droplet injection head 32 is operated in the main scanning and sub-scanning directions in accordance with the contents of the design, and a resist layer having the designed pattern is formed on the surface of the base 38 .

In the embodiment shown in Figs. 3A and 3B, the solution droplet injection head is moved in both the vertical and horizontal directions (main scanning and sub-scanning directions) while a base part to be processed is fixed in position to a To form photoresist patterns.

Since in this arrangement all movable elements for Pattern formation on the solution droplet injection side are operated, the pattern formation can even go through leads to be if the shape and dimensions of one too processed base part change. I.e. this Aus leadership has a wide range of applications.

Note that the structures and operational prin the scanning mechanism and the solution droplet Injection head does not apply to those of the embodiment are restricted. If, as will be described later, a Pattern on a flexible, thin, plate-like ba sisteil is to be formed, for example a fle flexible printed circuit board or a thin one Metal plate, the base part is moved while the ba sisteil is clamped / held by a pair of Conveyor rollers which are at two points or both ends of the base part are added, whereby the base part is allowed to be fed in the sub-scanning direction to become. In addition, as with the next Aus guide form a base part held on a drum be so that the rotation of the drum for one Scanning operation can be used.

The solution droplet injection head is not open limited a head, which is a multiple cam structure of an on-demand type be which is used as an inkjet printhead becomes, and a head of a continuous scheme can be used.

Second embodiment of the device

The benefits of an ultraviolet curing solution as a photoresist solution, which is used for photoresist pattern formation is used have already been described above.

When using an ultraviolet curing solution can be a base part of an Ultra violet irradiation unit are fed to the Lö solution to harden after a solution droplet Injection head a pattern has been formed. If however, an ultraviolet irradiation unit in Fo paint pattern forming apparatus of the present invention Finding is arranged can be at a position at which the unit opposes a path for a base part survives all steps of the photoresist pattern formation this device can be completed.

Fig. 4 shows an embodiment of a device for realizing such an arrangement.

Referring to Fig. 4, the components denoted by reference numerals 16 to 46 'are the same as those denoted by the same reference numerals in Fig. 3 be. Reference numeral 50 denotes a base part-holding drum, 51 a holder, 52 a base part to be machined, 53 an ultraviolet lamp, 54 a lamp cover and 55 a lamp drive circuit.

In this embodiment, an ultraviolet curing photoresist solution is used for a solution droplet injection head 32 , and an ultraviolet light source is arranged to face a conveyance path for a base part to be processed. The holder 51 for holding the base part is formed on the peripheral surface of the base part holding drum 50 . The base member 50 is wound around the circumferential surface of the drum, and the end parts of the base part are fixed to the bracket 51, whereby the base part on the circumferential surface of the base part-holding drum is kept 50th

A motor 30 'is arranged to rotate the base part-Hal tetrommel 50 . When the drum 50 'is rotated by the motor 30 ', the base part is scanned in the sub-scanning direction.

With this arrangement, if a flexible, plattenähn Liches base part such as a thin metal plate or a flexible printed circuit board part is used as the base part to be machined, the guide and rail ends of the base part are held by the bracket 51 ge to allow the base part on the Drum 50 to be kept in firm contact.

In this apparatus, the solution droplet in is jektionskopf 32 arranged to resist to the base portion-Haltetrom mel 50, while the ultraviolet lamp 53 is arranged to ultraviolet radiation around the circumferential surface of the drum 50th

The solution droplet injection head 32 is mounted on a moving / scanning base 31 and is moved on slide rails 16 and 17 in the main scanning direction to inject a photoresist ink in a belt or cuff-like region. Whenever the solution droplet injection head is moved back and forth, the motor 30 'is controlled or monitored for rotating the drum by a drive circuit 45 ' to move a base part holding drum 50 in the direction indicated by the arrow is to be a contribution corresponding to a width W of the belt or cuff-like region, whereby the area sequentially expands into which the photoresist ink is injected.

When the region on which a pattern is formed by the photoresist ink crosses the ultraviolet irradiation region of the high pressure mercury lamp 53 , the photoresist ink which is injected to form the pattern is polymerized and cured into a layer which is the one for a photoresist layer possesses the required strength.

When a main / sub scanning operation by combina tion of the movement of a base part to be machined and the movement of the print head is carried out in this way the space of the movement mechanism can be used Scanning can be reduced, and the mechanism for loading movement can be simplified.

It will be apparent that the arrangement shown in Fig. 4 can be modified so that a main scanning operation can be performed by rotating the drum and a sub-scanning operation is performed by moving the print head. The arrangement designed to perform scanning by moving a base part in this way can easily be used in a case where the base part is a flexible, lightweight, plate-like part.

In the arrangement which an ultraviolet cure de solution used in this way may inhibit the Solution droplet injection outflow openings prevented to improve reliability, and a Photoresist ink can be used reliably within a short time Time period to be cured. In addition, the Thickness of the formed photoresist layer high, and the An Adhesive strength with regard to the base part can be improved will.

As an apparatus for realizing the photoresist mu ster forming process, which by the above be is formed, a photoresist is used Pattern-forming device is provided which has a one direction for holding a base part to be processed has a solution droplet injection head under Ver application of an ultraviolet-curing photoresist solution, means for moving the base and the Lö solution droplet injection head relative to each other to perform a scanning operation, an ultraviolet Light source which is arranged to follow a path of the Base part to face, and a signal wall circuitry for receiving a resist pattern image signal and forming a signal for actuating a Lö solution droplet injection head drive circuit. With this device can use the method described above be performed.

For example, a method based on etching based, for the formation of a printed circuit board tine can be used. When the present invention Used for such a procedure must be the greatest Pay attention to the occurrence of line disconnections nes photoresist pattern due to an injection failure ei dedicated to a photoresist solution. In the present Invention it is difficult to completely eliminate operational errors to eliminate the outflow openings of the head. Therefore injecting a solution a plurality of times performed using the same pattern signal, to prevent line disconnections.

Fig. 5 is a diagram for explaining the steps of this method. A solution droplet injection step 106 differs from the solution droplet injection step 6 of FIG .

In the solution droplet injection step 106 , the solution droplet injection head is controlled by a signal which is formed in a head drive signal formation step 103 in order to inject the solution droplets of a photoresist solution 104 onto a base part 105 to be processed. In this case, the solution droplet injection steps 106 a and 106 b are carried out as completely independent steps, whereby solution droplet injections are carried out twice.

Specifically, in the solution droplet injection step 106, when pattern scanning of the entire surface of the base is completed by performing main scanning and sub-scanning operations while performing solution droplet injection in accordance with a resist pattern signal, the solution droplet injection head returns to the start position the raster scan in the solution droplet injection step 106 a back. Thereafter, the next injection step 106 b is carried out in accordance with the same photoresist pattern signal to inject the photoresist solution onto the same base part surfaces.

In this case, if the solution droplet injection step 106 is carried out in the manner described above, the following effects can be obtained.

First, the interval for evaporation of a lo solvent between the time at which he the first raster scanning for the complete surface has been det, and the time at which the second Ra ster scan for the complete surface leads will be maximized. After the solution droplet the previously injected solvent are constantly evaporated, the Lö subsequently adhere sung droplets on the same part of the base part, and therefore, a thick layer with a point can be smaller Size can be formed. Therefore, a high definition Fo paint patterns are formed.

In addition, non-uniformity of lo solution droplet sizes and changes in injection position tions can be reduced in order to obtain a photoresist pattern gene, which has a better layer quality.

When the amount of solution droplets for an inject operation has risen sufficiently, the lo sung droplet size. As a result, can be a fine photo paint layer cannot be formed. In addition, flow ßen solution droplets that adhere to the base part, out. Such adversity can be carried out through an injection a plurality of times at a plurality Intervals are prevented.

If, furthermore, as described above, subabta most of the complete base part surface performed is after the main scanning of the full Base part surface is finished, the maximum time can be difference between the two scanning operations Lich of the same part can be set. Therefore, a Solvent, which has a low rate of evaporation has, can be used as a photoresist resolution to ei ne change in the viscosity of the photoresist solution to prevent the exhaust port from being blocked prevent.

In each embodiment of the present invention Can be used as a solution droplet injection head for injecting of solution droplets of a photoresist solution a head, wel the same arrangement as that of an inkjet Own print head. Such heads who which is roughly classified into the following two types.

One is called the on-demand type called, which has a plurality of independent outflows openings and a pressure generating section shows. This type is designed to simultaneously lo To inject solution droplets. The head is in the Main scanning direction moved to a plurality of scanning to form lines. This means that long, belt or cuff-like scanning regions in the Main scanning direction formed.

The other type is so called Charge control type, which is designed to be a conductive solution from the outflow orifices to keep pressurized and inject ren while the solution by vibration into particles is converted. When the solution comes out of each outlet voltage is separated out, the loading of particles on the basis of presence or absence a voltage applied to a signal electrode controls. The directions of flight of charged particles and uncharged particles are released by a deflector trode differentiated, and a pattern is created through entwe which the charged particles or the uncharged par articles formed. According to the head of this scheme becomes the voltage pe applied to the deflection screens riodically changed to control the flow of solution droplets in the direction of a line of an electric force steer while turning the head in a direction perpendicular to it moving the direction of a line of electric force is to create a belt-like or cuff-like scanner gion to form.

Since the width of a belt or cuff-like Scanning region described by the head of the above a scheme is formed, is not sufficiently large, such belts are linked to each other in the subsection connected device to scan a plane to be scanned.

In such a belt or cuff-like Sampling gaps tend to be in the connections of the belts or cuffs, or belts or Cuffs tend to overlap excessively pen. In addition, it is difficult to make changes in the Size and pitch of solution droplets to be eliminated ren which at each position in the sub-scanning direction are injected inside the belts or cuffs. When the head described above aims to make characters and patterns can display the characters displayed and patterns can be distinguished without any hindrance be read out even if their appearance changes slightly deteriorated. It is believed, however, that such Changes in a photoresist pattern are caused. If in this case, for example, a printed scarf board is to be manufactured, etching errors occur, for example separations of electrode lines and Short circuits of isolated electrodes. Consequently the resulting product cannot be used in practice be turned.

Another photoresist forming process is called next taking into account the above Points described.

Fig. 6 shows another embodiment of the photoresist pattern forming method. The steps and components of this embodiment are the same as those of the embodiment described above with respect to FIG. 5, except that the solution droplet injection step 106 is modified. Therefore, the same reference numerals in Fig. 6 denote the same parts as in Fig. 5, and a detailed description thereof is omitted. Referring to Fig. 6, two solution droplet injection steps 106 a and 106 b are successively carried out with respect to the complete scanning surface of a base part 105 to be processed in order to complete a pattern on the entire surface.

Such a procedure can be carried out as follows. Assume that the solution droplet injection step 106 is performed N times. In this case, the position of a belt-like scanning region is sequentially shifted in the sub-scanning direction by an amount corresponding to 1 / N (N2) of a belt-like scanning region obtained by a main scanning operation, so that the scanning regions are consecutive overlap, thereby performing N-times solution droplet injection with respect to the same part on the base part. This procedure is described in detail below.

Fig. 7 shows a pattern-forming method in wel chem, when the two solution droplet injection steps 106 a and 106 b with respect to the complete scanning upper surface of the base part 105 successively leads through, the phase of the position of each belt or cuff-like scanning region in the Subscanning direction is shifted.

Referring to Fig. 7, arrows X and Y respectively indicate the main scanning direction and the sub-scanning direction, and reference symbols L-1, L-2 and L-3 denote belt-like and cuff-like scanning regions. That is, the respective belt-like scanning regions are sequentially covered while the phase of each region is shifted from another region by an amount corresponding to 1/2 the width of each region in the sub-scanning direction.

With this operation, a scanning surface becomes two solution droplet injections with a negative Pha subject to shifting. Since be neighboring scanning regions by an amount accordingly overlap half the width of each region Changes in division of connecting parts, changes in division in the widths of the belts or cuffs and similar reduced in order to achieve uniform division ize, thereby eliminating adverse effects of changes be ned.

A phase shift width becomes generally to 1 / N (N2) the width of a belt or cuff ten-like scanning region in the sub-scanning direction set. In this case, the number of times in which the solution droplet injection with respect to of the same part is carried out on a base part, set to N.

Belt or cuff-like scanning is used in the Order L-1, L-2 and L-3 carried out, and a subab tast advancement operation is from one end to the next whose end is carried out in the Y-direction, making the whole Scanning process is ended.

Fig. 8A and 8B show a different pattern-forming method in which the phase of the position of each belt or sleeve is moved in the subscanning direction, in which process solution droplet Injekti onsschritte 106 a and 106 b as a completely independent steps are carried out, similar as in the embodiment shown in FIG .

Fig. 8A shows a main scanning operation to be carried out a first time, in which reference symbols M-1, M-2 and M-3 denote belt-like scanning regions which are adjacent to each other. After these main scanning and sub-scanning operations are completed, a subsequent main / sub-scanning operation is performed as shown in Fig. 8B. In this scanning, the phases of the belt-like scanning regions O-1, O-2 and O-3 become different from those of the scanning regions M-1, M-2 and M-3 by an amount corresponding to 1/2 the width of each Belt shifted in the sub-scanning direction. As a result, two injections are made to the base, and therefore the same effects as those obtained by the method shown in Fig. 7 can be obtained.

In the scanning operation shown in FIGS . 8A and 8B, therefore, there is a large interval between the time at which the first scanning operation is performed and the time at which the second scanning operation is performed with respect to the same part, and a resist solution can under Use of a solvent with a low evaporation rate can be used.

Note that the above-mentioned solution droplet-in jection head and its scanning mechanism for some ope rations can be used, which with one of the like photoresist pattern formation are connected. thats why it makes sense to design a fixture arrangement, which to carry out a plurality of differentiated suitable for all operations.

Fig. 9 shows another embodiment of the photoresist pattern forming apparatus of the present invention. Solution droplet injection heads 111 and 112 for injecting solution droplets of a photoresist solution are integrally mounted on a moving / scanning base 113 with a bracket 114 . The moving / scanning base 113 is slidably mounted on guide rails 115 and 116 to be able to slide to perform a main scanning operation. A wire roll 118 is held on the shaft of the main scanning motor 117 . The wire roll 118 has a wire 119 wound around it. The wire 119 is wound around another roll (not shown). The moving / scanning base 113 is attached to the wire with a wire holder 120 . Bolts 121 and 122 are used to supply a photoresist solution and the like to the solution droplet injection heads 111 and 112, respectively.

A base on which a resist pattern is to be formed is held on a movement holding base 123 . The movement support base 123 is slidably supported on a stationary base 124 . A sub-scanning motor 125 is attached to a lead screw (not shown) to slide the movement support base 123 in the sub-scanning direction.

An arrangement for signal formation is so designed that a sample signal receiving circuit 126 is connected to a signal sequence conversion circuit 127 , and the signal sequence conversion circuit 127 is connected to the head controls 128 and 129 , which are each connected to the solution droplet injection heads 111 and 112 are connected.

A head selection designating section 133 is connected to a control circuit 132 . The control circuit 132 is connected to a main scanning motor driver 130 and a sub-scanning motor driver 131 , which are connected to the main scanning motor 117 and the sub-scanning motor 125 , respectively. The control circuit 132 is also connected to the head controls 128 and 129 .

Note that a scanner for scanning a base and the heads relative to each other are constituted by the moving / scanning base 113 , the holder 114 , the main scanning motor 117 , the moving holding base 123 , the stationary base 124 , the sub-scanning motor 125 and the like.

Next, an operation of the device shown in Fig. 9 is given. First, a signal for forming a resist pattern received by the pattern signal receiving circuit 126 is converted by the signal sequence converting circuit 127 in accordance with the arrangement of each solution droplet injection head and a scanning mode. The head drives 128 and 129 are actuated in accordance with this converted signal to drive the solution droplet injection heads 111 and 112 .

In response to a command from the head selection determining section 133 , the control circuit 132 performs control to operate one of the head drivers 128 and 129 , and also controls the operations of the main-scanning motor driver 130 , the sub-scanning motor driver 131 and the like.

The solution droplet injection heads 111 and 112 , which are controlled by the head drivers 128 and 129 , sequentially form a resist pattern on a base part fixed on the moving / holding base 123 . In this case, the main scanning motor 117 , which is driven by the main scanning motor driver, drives the wire reel 118 . As a result, the wire 119 is wound and looped around another roll (not shown). The moving / scanning base 113 is then attached to the wire with the wire holder 120 . When the wire moves, the holder, which is integrally mounted on the moving / scanning base 113 , moves on the sliding of the moving / scanning base 113 on the guide rails 115 and 116 . When the sub-scanning motor 125 is rotated to rotate the lead screw (not shown), the movement support base 123 on which the base is mounted slides on the stationary base 124 to be advanced in the sub-scanning direction.

As described above, the above is accordingly direction of this embodiment a photoresist pattern bil The device is provided which can easily take a photo can form paint samples, does not require expensive material, not polluting the environment and economical as to Setup and production costs is compared with the conventional device, which the knowledge and the technology required for operations by an expert, and precious materials for pattern formation in the Processing steps consumed while waste flows liquids and waste substances are generated, which can pollute the environment.

Furthermore, in the above-described resist pattern forming apparatus, the solution supplied to the solution droplet injection heads 111 and 112 for patterning, the target to which the solution is injected, and the injection pattern include many variations as shown in the following embodiments .

An arrangement of another embodiment will be described below, which is used to print a pattern on a paper board with a colored ink to perform a verification printing operation prior to photoresist pattern injection. This arrangement is basically the same as that resist pattern forming apparatus of the embodiment shown in FIG .

Either of the on-demand type solution droplet injection heads 111 and 112 or those of the charge control type can be used. As the photoresist solution supplied to the head 111 , an ultraviolet curing resin solution is used, for example. The head 112 is supplied with a colored ink liquid, that is, an aqueous ink liquid used in an ink jet printer.

Note that the charge control type head 111 allows a wider gap between the head and a solution droplet receiving surface than the other type head and is therefore more suitable for base parts such as printed circuit boards which show a large change in thickness. In addition, since the head 112 is mounted on the same moving base as the head 111 and uses the same scanning mechanism, it is preferred that the head 112 be of the same type as that of the head 111 .

A moving / holding base 123 has a fixing device designed to prevent movement of a base and a recording disk during a moving / scanning operation to hold both the base and the recording disk. When the thickness of a base or the recording disk changes greatly, positions under which deflected solution droplets arrive may differ from the expected positions in a charge control type head. In a head of the on requirement type, the flight directions of the ink particles can change greatly. To prevent this, a vertical movement adjusting mechanism is arranged on the movement support base 123 or a holder 114 , or a thick adjusting plate is set under a base or a recording plate. Alternatively, the charge control type head may include means for adjusting the deflection voltage value of the head.

In such an arrangement, before taking a photo lacquer solution is injected onto a base part, a pattern with a colored ink on a recording disk printed, which is placed in place of the base part.

In this case, when the head 112 is selected by using a head selection designating section 133 constituted by a switch, a keyboard or the like, a control circuit 132 operates a head driver 129 and sets a head driver 128 in a stopped state.

An output signal from a CAD, a reading signal from a scanner or the like is received by a pattern signal receiving circuit 126 and is temporarily stored in a memory. A signal train conversion circuit 127 performs signal train conversion by changing the reader address and timing with respect to the memory. In the case of belt-like or cuff-like scanning, this signal sequence is converted into units of belts or cuffs, and the resulting signal is first fed to the head control 129 .

The solution droplet injection head 112 is controlled by the head control 129 . At the same time, a main scanning motor 117 is rotated and the moving / scanning base 113 moves on guide rails 115 and 116 during the shift, whereby the colored ink is injected onto a belt-like region on the recording paper which is moving extends in the main scanning direction.

When a main scanning operation is completed, a sub-scanning motor 125 is rotated to move the movement holding base 123 by a predetermined amount in the sub-scanning direction to perform the next main scanning operation. A main scanning operation is repeatedly performed in this way. As a result, an image having the same pattern as that of a resist pattern is printed as a colored ink image on the recording plate. When the printed pattern is checked and no defects are found, the base is set on the movement support base 123 and the head 111 is designated by the head selection designation section 133 . Accordingly, the head controller 128 is operated and the head controller 129 is set in a stopped state.

Similar to the operation associated with the head 112 , in the following operation, a photoresist solution is injected onto the base to form a pattern.

When an ultraviolet curing resin solution is used as the photoresist solution, a curing step using an ultraviolet irradiation step is required. For this purpose, a base part of a hardening unit can be fed after the injection of a photoresist solution has ended. Alternatively, an ultraviolet irradiator may be incorporated into the apparatus shown in Fig. 9 so that a base is set in the apparatus to cure the photoresist solution during or after a scanning operation.

Before a Fo according to such a device resist pattern is formed and an etching step or the like Liches running can create a pattern on one too Verifying record disk will be printed where by the loss of operating time and materials in sequence of pattern errors is prevented.

Fig. 10 shows an arrangement according to another imple mentation form, which is intended to inject both a photoresist solution and a white pigment ink. The same reference numerals in Fig. 10 denote the same parts as in Fig. 9, and a detailed description thereof is omitted.

In this embodiment, a solution droplet injection head 112 'using the white pigment ink is attached to a holder 114 together with a photoresist solution droplet injection head 111 , and a feed bolt 121 ' is arranged to feed the white pigment ink to the solution droplet injection head 112 'Feed. As the pigment white ink, an ink for ink jet printing for printing characters and symbols on a known tape cassette, a known IC component or the like can be used.

In this apparatus, a resist pattern signal source 134 and a character / graphic signal source 135 are connected to a pattern signal receiving circuit. Note that the resist pattern signal source 134 and the character / graphics signal source 135 are shown as independent components. However, signals to the two components can be output from the same host unit.

This arrangement is in addition to the photo lacquer pattern formation for etching a printed circuit circuit board a printing operation by using a white ßen Pigments carried out, for example, the name and to print positions of parts as indices, wel che used to put the parts on the printed To attach circuit board.

When a signal is first input from the photoresist pattern signal source 134 to a pattern signal receiving circuit 126 in forming a photoresist pattern, the apparatus is operated in the same manner as described with respect to the embodiment shown in FIG. 9. If a printing operation is to be performed using a white pigment, the head 112 'is determined using a head selection determination section 133 . When a signal is input from the character / graphic signal source 135 of the pattern signal receiving circuit 126 , the head 112 'is driven by a head driver 129 to inject the white pigment ink.

In this case, the operation of the head drive is controlled by the determination section 133 in accordance with an original signal. For example, when an electrical circuit pattern is formed on a surface of a printed circuit board, while a character or a graphic pattern is printed on the other surface with a white pigment ink, or when a character or graphic pattern is printed on such an electrical circuit pattern on a Pla tine When printing with pigment white ink, the alignment of the pattern and the character or graphic pattern is important.

For the alignment of the pattern and the character or graphic pattern, the base member must be accurately mounted on a movement support base 123 . Note that in order to correct, for example, an error in the attachment positions of the two heads on the device side or the original coordinates of the upper and lower pattern drawings, the conditions for the signal sequence conversion can be changed on the basis of an instruction from the control circuit 132 . Alternatively, the operations of a main scanning motor driver 130 and a sub-scanning motor driver 131 may be controlled to change the scanning regions of the heads to perform position alignment.

According to the arrangement described above, can printing characters and graphic patterns with one white pigment, which is used for a process of a printed th circuit board using a photoresist mu sters is required, and showing high process frequency easily performed using the same device will. Since in addition pattern formation by the same Vor direction, the precision of a Alignment of a pattern and characters easily verbes be sert.

According to another variation, both heads are used to inject a photoresist solution, being one of the heads is used as a replacement head. Even if with this arrangement the other head which did is used neuter, fails, can surgery continuously through the replacement head without interruption leads to be.

Fig. 11 shows an embodiment of a photoresist pattern forming apparatus which is used for a flexible plate base. The same reference numerals in Fig. 11 denote the same parts as in Fig. 9, and a detailed description thereof will be omitted.

A flexible plate base 141 which is wound around a roller 140 is wound around a conveying roller 144 via a plate roller 142 for maintaining a movable position at a predetermined position. Pinch rollers 143 and 145 are driven against the rollers, respectively, to keep the disk base from sliding off. A sub-scanning motor 146 is coupled to the platen roller 142 to the plate roller 142 to rotate stepwise advance to the panel base portion 141 in sub-scanning direction. A solution droplet injection head 148 , which has a photoresist solution cartridge 147 and is used to inject solution droplets of a photoresist solution, is mounted on a movement / scanning base 150 which is slidably mounted on guide rails 149 and 150 . An ultraviolet light source 152 for curing a photoresist pattern is arranged between the platen roller 142 and the conveying roller 144 .

In this case, for example, the flexible base is a flexible printed circuit board which is normally obtained by bonding a copper layer on a heat-resistant resin layer and a polyimide layer. When such a base is used, the base is extracted with the copper-plated surface facing the solution droplet injection head 148 , and is positioned by the platen 142 . In this case, since no external force acts on the disk base 141 at the positioning part, the disk roller 142 as the back surface holding means is not necessarily required. For example, rollers can be placed above and below the solution droplet injection position to maintain a flat surface under tension.

When the base is positioned by the platen 142 , the solution droplet injection head 148 is actuated and the moving / scanning base 151 slides on the guide rails 149 and 150 to inject solution droplets onto a belt-like region, creating a photoresist pattern is formed. When the belt or cuff-like photoresist pattern is formed in the main scanning direction, the sub-scanning motor 146 is rotated to rotate the platen roller 142 by a predetermined amount to displace the platen base 141 , thereby performing sub-scanning operation. The photoresist solution that has been injected onto the plate base is hardened by the ultraviolet light source 152 .

In the arrangement described above, a plat ten-like base part in the form of a roll and wound is advanced sequentially, and a subab tactile operation by advancing the plate base performed using the role. Therefore, the Sub-scanning device can be simplified.

In addition, when patterns are formed consecutively det, while consecutively a base part can be advanced automatically a large number are formed by photoresist patterns.

In an etching process for the flexi described above ble plate base must have both the top and the lower surface of the plate part is often machined are printed like in the formation of a double-sided th circuit board.

Fig. 12 shows an embodiment of the photoresist pattern forming apparatus for processing the upper and lower surfaces of a flexible plate base. The same reference numerals in Fig. 12 denote the same parts as in Fig. 11, and a detailed description thereof is omitted. Note that a circuit system such as a control circuit has been omitted from the drawing.

In addition to an arrangement for forming a resist pattern on a surface of a plate base, the arrangement of which is similar to the embodiment described above, the apparatus of this embodiment includes a second plate roller 153 for reversing an incoming plate base 141 ', and a similar arrangement for forming a photoresist pattern on the opposite surface arranged by a pinch roller 154 , a photoresist solution cartridge 155 , a photoresist solution droplet injection head 156 , guide rails 157 and 158 , a moving / scanning base 159 , an ultraviolet light source 160, and a take-up roller 161 is formed.

With this arrangement, the disk base 141 'is advanced by a feed roller 140 to be wound around the pickup roller 161 . The base part 141 'is positioned on the surfaces of the two platen rollers 144 and 153 , and resist patterns are formed at the respective positions. The photoresist solution is cured by an ultraviolet light source 152 and the ultraviolet light source 160 . The base part having the resist pattern formed thereon is then picked up by the pick-up roller 161. As has been described above, in the devices of the embodiment shown in FIGS. 11 and 12, a flexible disk base is extracted from the roll and is advanced to perform a sub-scanning operation. In addition, photoresist patterns can be partially formed on the lower and upper surfaces of the base at the same time. Therefore, photoresist patterns can be efficiently formed with a very simple arrangement. Furthermore, such a device can be used to form a small number of photoresist samples as sample products, and can also be used as a simple production device in a small production facility.

Claims (13)

1. A photoresist pattern forming apparatus for forming a photoresist layer having a predetermined pattern on a surface of a base part ( 38 ) to be processed, the photoresist layer being used for a subsequent processing step of causing a change in a surface part which does not form a photoresist layer thereon has, on the basis of a feature difference between surface parts due to the presence or absence of the photoresist layer, characterized in that the device: a solution droplet injection head ( 32 ) for Injizie Ren an ultraviolet curing resin solution in accordance with a drive signal;
a base holder ( 34 );
a moving / scanning device for moving the solution droplet injection head ( 32 ) and the base part relative to one another;
a pattern signal circuit ( 40 , 41 ) for receiving / generating a photoresist pattern signal;
a signal conversion / head drive circuit ( 42 , 43 ) for converting the pattern signal and forming a head drive signal; and
an ultraviolet light source ( 53 ), wherein the ultraviolet curing resin solution is injected directly onto the base part ( 38 ) in accordance with the pattern signal and cured. 2. A photoresist pattern forming apparatus for a printed circuit board for forming a photoresist layer having a desired circuit pattern on a surface of a printed circuit board ( 52 ), the photoresist layer being used for a subsequent processing step of dissolving / removing a surface portion which is not formed thereon Having photoresist layer, on the basis of a difference between tween surface parts due to the presence or absence of the photoresist layer, characterized in that the device: a solution droplet injection head ( 32 ) for Injizie Ren solution droplets of a photoresist solution in accordance with a drive signal;
a holding device for a printed circuit board ( 50 );
moving / scanning means ( 31 ) for moving the solution droplet injection head and the printed circuit board relative to each other;
a receiving circuit ( 41 ) for receiving a circuit pattern drawing signal; and
a signal conversion / head drive circuit ( 42 , 43 ) for converting the received signal and forming a head drive signal,
wherein the photoresist solution is injected directly onto the printed circuit board to form a pattern in accordance with the circuit pattern drawing signal. 3. A device according to claim 2, characterized in that the moving / scanning device ( 31 ) for moving the solution droplet injection head ( 32 ) and the printed circuit board ( 52 ) relative to each other a main scanning device ( 25 ) for reciprocating movement of the Lö solution droplet injection head ( 32 ), the head being arranged on a moving / scanning base, and a sub-scanning device ( 30 ') for relatively moving the printed circuit board in a direction perpendicular to the moving / scanning direction, an amount of movement such is set that a complete upper surface of the printed circuit board ( 52 ) is scanned by the main scanning and sub-scanning device ( 25 , 30 '), the solution droplet injection head ( 32 ) having a scanning region so that the photoresist solution on a belt or .cuff-like scanning region is injected by a main scanning operation, and the belt or cuff the similar scanning region extends into a planar scanning region by a sub-scanning operation. 4. A photoresist pattern-forming device for forming a photoresist layer having a predetermined pattern on a surface of a base part ( 38 ) to be processed, the photoresist layer being used for a subsequent processing step of causing a change in a surface part which does not have a photoresist layer formed thereon has, on the basis of a feature difference between surface parts due to the presence or absence of the photoresist layer, characterized in that the device:
a solution droplet injection head ( 32 ) for Injizie Ren a photoresist solution in accordance with a control signal to;
a base holder ( 34 );
a scanning device ( 31 ) for moving the Lö solution droplet injection head ( 32 ) and the base part ( 38 ) relative to each other;
a pattern signal circuit ( 40 , 41 ) for receiving / generating a photoresist pattern signal;
a signal conversion / head drive circuit ( 42 , 43 ) for converting the pattern signal and forming a head drive signal; and
a control circuit ( 46 ) for controlling the pattern signal and an operation of the scanner,
wherein the control circuit ( 46 ) has a control mode of performing solution droplet injection on the same part of the base part ( 52 ) a plurality of times on the basis of the same pattern signal. 5. An apparatus according to claim 4, characterized in that the control circuit ( 46 ) has an Operationssteu erbetriebsart in which the same pattern is formed which the same by a series of operations after a complete photoresist pattern has been formed on a base part surface Base part surface based on the same pattern signal is overlapped. 6. An apparatus according to claim 4, characterized in that the solution droplet injection head ( 32 ) is a head for injecting solution droplets, which has a width corresponding to a plurality of points in a sub-scanning direction and a belt or cuff ten-similar scanning region by a main scanning region, and
wherein the control circuit ( 46 ) has an operation control mode in which the belt-like scanning regions are shifted in the sub-scanning direction so as to successively overlap each other, and wherein the scanning regions expand into a flat region by successively injecting patterns to overlap each other on the base part based on the same pattern signal. 7. A device forming photoresist patterns, characterized by:
a first injection head ( 111 ) for injecting Lö sung droplets of a photoresist solution to be processed on the base part;
a second injection head ( 112 ) which is arranged independently of the first injection head ( 111 ) for injecting solution droplets;
scanning means ( 113 , 123 ) for scanning the first and second injection heads and the base relative to each other;
a receiving circuit ( 126 ) for receiving a sample image signal;
a signal sequence conversion circuit ( 127 ) for converting the sample image signal received by the receiving circuit in accordance with an arrangement of each of the injection heads;
selecting means ( 133 ) for selecting one of the injection heads; and
control means ( 132 ) for controlling operations of the injection heads ( 111 , 112 ) and the scanning means ( 113 , 123 ). 8. A photoresist pattern forming apparatus according to claim 7, characterized in that the scanning device ( 113 , 123 ) has a holding base ( 123 ) which is suitable for holding both the base part and a recording disk, and that the second injection head ( 112 ) injects an ink which adheres to the recording plate to form a color image. 9. A resist pattern forming apparatus according to An Claim 8, characterized in that the base part is a Ba is part of printed wiring, the second Injection head a white pigment ink to form a white pigment image, and the receiving circuit a signal of the wiring pattern and a line chen / graphic signal receives which are used to Print on the base portion of the printed wiring through respectively. 10. A photoresist pattern forming device, characterized by:
a roller ( 140 ) around which a plate-like base part ( 141 ) to be processed is wound;
a conveyor ( 144 ) for conveying the base part ( 141 ) which is fed from the roller ( 140 );
holding means ( 142 ) for holding the conveyed base part at a predetermined portable position; and
an injection head ( 148 ), which is arranged to face the predetermined position, for injecting solution droplets of a photoresist solution. 11. A photoresist pattern forming device according to claim 10, characterized in that the device further comprises another injection head ( 156 ) wel cher is arranged on a surface opposite to the injection head ( 148 ) which is arranged with respect to the base part ( 141 ') is which of the roller ( 140 ) is voro ben.