CN106918857A - A kind of apparatus and method for preparing nanometer grating - Google Patents
A kind of apparatus and method for preparing nanometer grating Download PDFInfo
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- CN106918857A CN106918857A CN201710253240.6A CN201710253240A CN106918857A CN 106918857 A CN106918857 A CN 106918857A CN 201710253240 A CN201710253240 A CN 201710253240A CN 106918857 A CN106918857 A CN 106918857A
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- substrate
- nanometer grating
- mounting bracket
- chute
- mounting seat
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- 238000000034 method Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 239000003292 glue Substances 0.000 claims abstract description 25
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 19
- 238000010894 electron beam technology Methods 0.000 claims abstract description 17
- 238000004528 spin coating Methods 0.000 claims abstract description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- 239000004568 cement Substances 0.000 claims description 7
- 238000003860 storage Methods 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 239000012467 final product Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004411 aluminium Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000002791 soaking Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 6
- 238000013461 design Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000000025 interference lithography Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
The invention discloses a kind of device for preparing nanometer grating, including mounting seat and L-shaped mounting bracket, and L-shaped mounting bracket is fixedly welded on a side roof part of mounting seat, the bottom of the mounting seat is fixedly welded with support frame, motor is installed with the top of the mounting seat, the output shaft of the motor is connected with the second rotating connector, and second rotating connector is provided with glue evenning table away from one end of motor, and second rotating connector is rotated with glue evenning table and is connected.A kind of device for preparing nanometer grating proposed by the present invention, simple structure is reasonable in design, photoresist spin coating operation is completed using glue evenning table, the exposure work of substrate is completed using electron beam exposure apparatus, reticule version, collector lens and speculum, device proposed by the present invention is used to prepare nanometer grating, equipment investment is small, preparation cost is low, simple to operate, it is easy to control, short preparation period, gained nanometer grating performance is good, quality is high, and product qualified rate is high, is worthy to be popularized.
Description
Technical field
The present invention relates to nanometer grating technical field, more particularly to a kind of apparatus and method for preparing nanometer grating.
Background technology
Grating as a kind of very important chemical component, be widely used in integrated circuit, optic communication, optical interconnection,
The fields such as optical information processing, optical measurement.With developing rapidly for nanometer technology, it is most wide that nanometer technology becomes current research
One of general, science and technology fields that input is most.As grating is in the application of nanoscale, the preparation method of nanometer grating seems
It is particularly significant.In the prior art, the preparation method of nanometer grating mainly include holographic lithography, beamwriter lithography, ion beam lithography,
X-ray lithography etc..Above method generally existing device therefor cost of investment is high, complex operation, and process conditions are harsh, it is difficult to control
System, nanometer grating preparation cost is high, the cycle is long, gained nanometer grating quality dissatisfaction, the low problem of product qualified rate.Based on upper
Statement is stated, the present invention proposes a kind of apparatus and method for preparing nanometer grating.
The content of the invention
The invention aims to solve shortcoming present in prior art, and a kind of nanometer grating for preparing for proposing
Apparatus and method.
A kind of device for preparing nanometer grating, including mounting seat and L-shaped mounting bracket, and L-shaped mounting bracket fixes weldering
A side roof part of mounting seat is connected on, the bottom of the mounting seat is fixedly welded with support frame, the top of the mounting seat
Motor is installed with, the output shaft of the motor is connected with the second rotating connector, and second rotating connector is away from electricity
One end of machine is provided with glue evenning table, and second rotating connector is rotated with glue evenning table and is connected, and the L-shaped mounting bracket is near spin coating
The side of platform is provided with the first chute, and push-rod electric machine is provided with first chute, and the first chute is slidably connected with push-rod electric machine,
The output shaft of the push-rod electric machine is fixedly connected with mounting bracket, and the bottom of the mounting bracket is fixedly welded with cement storage chamber, and
Gum outlet is provided with below the cement storage chamber, the L-shaped mounting bracket is installed with electron beam and exposes near the side of glue evenning table
Ray machine, and electron beam exposure apparatus is located at the top of push-rod electric machine, the top of the L-shaped mounting bracket sets near the side of glue evenning table
There is the second chute, the first sliding block and the second sliding block, first sliding block and the second sliding block uniform are provided with second chute
Two slides are connected, and first sliding block is fixedly connected with reticule version away from one end of the second chute, and described second slides
Block is fixedly connected with collector lens away from one end of the second chute, and the top of the L-shaped mounting bracket is away from electron beam exposure apparatus
One end bottom be installed with the first rotating connector, the bottom of first rotating connector is provided with speculum, and described
First rotating connector is rotated with speculum and is connected.
Preferably, the central axis of the electron beam exposure apparatus, reticule version and collector lens is same horizontal line.
Preferably, support frame as described above totally 4, and it is equally distributed on the bottom outside of mounting seat.
The invention allows for a kind of method for preparing nanometer grating, comprise the following steps：
S1, substrate is pre-processed after, the metal film that thickness is 0.08~0.19 μm is plated in substrate surface, then by substrate
It is placed on glue evenning table, makes metal film upward, position to the substrate center position of gum outlet is adjusted using push-rod electric machine, drips positivity light
Photoresist simultaneously starts motor, and motor drives glue evenning table high-speed rotation to the thickness of metallic film surface spin coating one by the second rotating connector
The positive photoresist for 0.2~0.3 μm is spent, after spin coating is uniform, 1~2min is dried at being placed in 150~190 DEG C；
S2, drip negative photoresist again in the photoresist surface obtained by step S1, spin coating a layer thickness is 0.19~0.25 μm negative
Property photoresist, after spin coating is uniform, at being placed in 70~90 DEG C dry 1~2min, under conditions of 95~105 DEG C dry 1~2min；
Position between S3, regulation electron beam exposure apparatus, reticule version and collector lens, adjusts the reflection angle of speculum,
Photomask board is placed in substrate top, and ensures that photomask board is brought into close contact with substrate, be 68~88mJ/cm with exposure dose2
It is exposed treatment；
S4, by sodium hydroxide solution that the concentration that the substrate after exposure-processed in step S3 is placed in 25~32 DEG C is 0.8~1.2%
In, develop 18~22s, and 1~2min is dried under conditions of being subsequently placed in 95~105 DEG C, is subsequently placed in the environment of 70~90 DEG C,
28~40min of drying, cools down after removal photoresist, obtains final product required nanometer grating.
Preferably, the substrate preprocess method in the step S1 is：Place the substrate in immersion 30 in acetone soln~
After 50min, it is cleaned by ultrasonic 10~15min, then with 10~15min of deionized water rinsing, is finally placed in 105~135 DEG C of baking
Dried to constant weight in case.
Preferably, the substrate in the step S1 is the one kind in quartz substrate, silicon substrate or glass substrate；The metal
Film is the one kind in aluminium film, chromium film or nickel copper film.
A kind of device for preparing nanometer grating proposed by the present invention, simple structure is reasonable in design, and light is completed using glue evenning table
Photoresist spin coating operation, the exposure work of substrate is completed using electron beam exposure apparatus, reticule version, collector lens and speculum,
Device proposed by the present invention is used to prepare nanometer grating, and equipment investment is small, and preparation cost is low, simple to operate, it is easy to control, and prepares
Cycle is short, gained nanometer grating performance is good, quality is high, and product qualified rate is high, is worthy to be popularized.
Brief description of the drawings
Fig. 1 is a kind of structural representation of the device for preparing nanometer grating.
In figure：1 mounting seat, 2L shapes mounting bracket, 3 gum outlets, 4 cement storage chamber, 5 first chutes, 6 push-rod electric machines, 7 are installed
Support, 8 electron beam exposure apparatus, 9 second chutes, 10 first sliding blocks, 11 second sliding blocks, 12 reticules version, 13 collector lenses, 14
First rotating connector, 15 speculums, 16 glue evenning tables, 17 second rotating connectors, 18 motors, 19 support frames.
Specific embodiment
The present invention is made with reference to specific embodiment further explain.
Embodiment
As shown in figure 1, a kind of device for preparing nanometer grating proposed by the present invention, including mounting seat 1 and L-shaped install branch
Frame 2, and L-shaped mounting bracket 2 is fixedly welded on a side roof part of mounting seat 1, the bottom of mounting seat 1 is fixedly welded with support
Frame 19, support frame 19 totally 4, and the bottom outside of mounting seat 1 is equally distributed on, the top of mounting seat 1 is installed with
Motor 18, the output shaft of motor 18 is connected with the second rotating connector 17, the one end of the second rotating connector 17 away from motor 18
Glue evenning table 16 is provided with, the second rotating connector 17 is rotated with glue evenning table 16 and is connected, and L-shaped mounting bracket 2 is close to the one of glue evenning table 16
Side is provided with the first chute 5, and push-rod electric machine 6 is provided with the first chute 5, and the first chute 5 is slidably connected with push-rod electric machine 6, push rod
The output shaft of motor 6 is fixedly connected with mounting bracket 7, and the bottom of mounting bracket 7 is fixedly welded with cement storage chamber 4, and cement storage chamber 4
Lower section is provided with gum outlet 3, and L-shaped mounting bracket 2 is installed with electron beam exposure apparatus 8, and electronics near the side of glue evenning table 16
Beam exposure machine 8 is located at the top of push-rod electric machine 6, and the top of L-shaped mounting bracket 2 is provided with the second chute near the side of glue evenning table 16
9, the first sliding block 10 and the second sliding block 11 are provided with the second chute 9, the first sliding block 10 and uniform second chute 9 of the second sliding block 11 are slided
Dynamic connection, the first sliding block 10 is fixedly connected with reticule version 12 away from one end of the second chute 9, and the second sliding block 11 is away from second
One end of chute 9 is fixedly connected with the center of collector lens 13, electron beam exposure apparatus 8, reticule version 12 and collector lens 13
Axis is same horizontal line, and the top of L-shaped mounting bracket 2 is installed with the away from one end bottom of electron beam exposure apparatus 8
One rotating connector 14, the bottom of the first rotating connector 14 is provided with speculum 15, and the first rotating connector 14 and speculum
15 rotate connection.
A kind of method for preparing nanometer grating proposed by the present invention, comprises the following steps：
S1, by glass substrate be placed in acetone soln soak 40min after, be cleaned by ultrasonic 12min, then use deionized water rinsing
14min, is finally placed in 120 DEG C of baking oven and dries to constant weight, glass substrate surface is plated into the chromium film that thickness is 0.15 μm, so
Glass substrate is placed on glue evenning table 16 afterwards, makes chromium film upward, using the position of the regulation gum outlet 3 of push-rod electric machine 6 to glass lined
Bottom center, drips positive photoresist and starts motor 18, and motor 18 drives glue evenning table 16 high by the second rotating connector 17
Speed turns to the positive photoresist that chromium film surface spin coating a layer thickness is 0.2 μm, after spin coating is uniform, is dried at being placed in 160 DEG C
2min；
S2, negative photoresist is dripped again in the photoresist surface obtained by step S1, spin coating a layer thickness is 0.25 μm of negative photo
Glue, after spin coating is uniform, dries 1min at being placed in 80 DEG C, 2min is dried under conditions of 100 DEG C；
Position between S3, regulation electron beam exposure apparatus 8, reticule version 12 and collector lens 13, adjusts the anti-of speculum 15
Firing angle degree, glass substrate top is placed in by photomask board, and ensures that photomask board is brought into close contact with glass substrate, with exposure dose
It is 72mJ/cm2It is exposed treatment；
S4, the glass substrate after exposure-processed in step S3 is placed in the sodium hydroxide solution that 28 DEG C of concentration is 1%, developed
20s, 2min is dried under conditions of being subsequently placed in 95 DEG C, is subsequently placed in the environment of 80 DEG C, 35min is dried, after removal photoresist
Cooling, obtains final product required nanometer grating.
The above, the only present invention preferably specific embodiment, but protection scope of the present invention is not limited thereto,
Any one skilled in the art the invention discloses technical scope in, technology according to the present invention scheme and its
Inventive concept is subject to equivalent or change, should all be included within the scope of the present invention.
Claims (6)
1. a kind of device for preparing nanometer grating, including mounting seat（1）With L-shaped mounting bracket（2）, and L-shaped mounting bracket（2）
It is fixedly welded on mounting seat（1）A side roof part, it is characterised in that the mounting seat（1）Bottom be fixedly welded with branch
Support（19）, the mounting seat（1）Top be installed with motor（18）, the motor（18）Output shaft be connected with
Two rotating connectors（17）, second rotating connector（17）Away from motor（18）One end be provided with glue evenning table（16）, it is described
Second rotating connector（17）With glue evenning table（16）Rotate connection, the L-shaped mounting bracket（2）Near glue evenning table（16）Side
It is provided with the first chute（5）, first chute（5）Inside it is provided with push-rod electric machine（6）, and the first chute（5）With push-rod electric machine（6）It is sliding
Dynamic connection, the push-rod electric machine（6）Output shaft be fixedly connected with mounting bracket（7）, the mounting bracket（7）Bottom fix
It is welded with cement storage chamber（4）, and the cement storage chamber（4）Lower section be provided with gum outlet（3）, the L-shaped mounting bracket（2）Near spin coating
Platform（16）Side be installed with electron beam exposure apparatus（8）, and electron beam exposure apparatus（8）Positioned at push-rod electric machine（6）Top,
The L-shaped mounting bracket（2）Top near glue evenning table（16）Side be provided with the second chute（9）, second chute（9）It is interior
It is provided with the first sliding block（10）With the second sliding block（11）, first sliding block（10）With the second sliding block（11）Uniform second chute（9）
It is slidably connected, first sliding block（10）Away from the second chute（9）One end be fixedly connected with reticule version（12）, described
Two sliding blocks（11）Away from the second chute（9）One end be fixedly connected with collector lens（13）, the L-shaped mounting bracket（2）Top
Portion is away from electron beam exposure apparatus（8）One end bottom be installed with the first rotating connector（14）, described first rotates connection
Part（14）Bottom be provided with speculum（15）, and first rotating connector（14）With speculum（15）Rotate connection.
2. a kind of device for preparing nanometer grating according to claim 1, it is characterised in that the electron beam exposure apparatus
（8）, reticule version（12）And collector lens（13）Central axis be same horizontal line.
3. a kind of device for preparing nanometer grating according to claim 1, it is characterised in that support frame as described above（19）Totally 4
It is individual, and it is equally distributed on mounting seat（1）Bottom outside.
4. a kind of method for preparing nanometer grating, it is characterised in that comprise the following steps：
S1, substrate is pre-processed after, the metal film that thickness is 0.08~0.19 μm is plated in substrate surface, then by substrate
It is placed in glue evenning table（16）On, make metal film upward, using push-rod electric machine（6）Regulation gum outlet（3）Position to substrate center position
Put, drip positive photoresist and start motor（18）, motor（18）By the second rotating connector（17）Drive glue evenning table（16）It is high
Speed turns to the positive photoresist that metallic film surface spin coating a layer thickness is 0.2~0.3 μm, after spin coating is uniform, it is placed in 150~
1~2min is dried at 190 DEG C；
S2, drip negative photoresist again in the photoresist surface obtained by step S1, spin coating a layer thickness is 0.19~0.25 μm negative
Property photoresist, after spin coating is uniform, at being placed in 70~90 DEG C dry 1~2min, under conditions of 95~105 DEG C dry 1~2min；
S3, regulation electron beam exposure apparatus（8）, reticule version（12）And collector lens（13）Between position, adjust speculum
（15）Reflection angle, by photomask board be placed in substrate top, and ensure photomask board be brought into close contact with substrate, with exposure dose
It is 68~88mJ/cm2It is exposed treatment；
S4, by sodium hydroxide solution that the concentration that the substrate after exposure-processed in step S3 is placed in 25~32 DEG C is 0.8~1.2%
In, develop 18~22s, and 1~2min is dried under conditions of being subsequently placed in 95~105 DEG C, is subsequently placed in the environment of 70~90 DEG C,
28~40min of drying, cools down after removal photoresist, obtains final product required nanometer grating.
5. a kind of method for preparing nanometer grating according to claim 4, it is characterised in that the substrate in the step S1
Preprocess method is：Place the substrate in after soaking 30~50min in acetone soln, be cleaned by ultrasonic 10~15min, then spend from
Sub- water rinses 10~15min, is finally placed in 105~135 DEG C of baking oven and dries to constant weight.
6. a kind of method for preparing nanometer grating according to claim 4, it is characterised in that the substrate in the step S1
It is the one kind in quartz substrate, silicon substrate or glass substrate；The metal film is the one kind in aluminium film, chromium film or nickel copper film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710253240.6A CN106918857B (en) | 2017-04-18 | 2017-04-18 | Device and method for preparing nano grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710253240.6A CN106918857B (en) | 2017-04-18 | 2017-04-18 | Device and method for preparing nano grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106918857A true CN106918857A (en) | 2017-07-04 |
| CN106918857B CN106918857B (en) | 2021-09-14 |
Family
ID=59568803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710253240.6A Active CN106918857B (en) | 2017-04-18 | 2017-04-18 | Device and method for preparing nano grating |
Country Status (1)
| Country | Link |
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| CN (1) | CN106918857B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109352888A (en) * | 2018-12-10 | 2019-02-19 | 中国科学技术大学 | Spin coating and molding integrated device |
| CN111856636A (en) * | 2020-07-03 | 2020-10-30 | 中国科学技术大学 | A method for controllable fine-tuning of line density distribution of variable-pitch grating mask |
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|---|---|---|---|---|
| DE4329338A1 (en) * | 1993-08-31 | 1995-03-02 | Olympus Optical Co | Method and device for forming a photoresist pattern |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
| CN101261449A (en) * | 2007-03-06 | 2008-09-10 | 中国科学技术大学 | Optical online detection device and detection method for grating ion beam etching |
| CN101846760A (en) * | 2010-04-09 | 2010-09-29 | 重庆理工大学 | Method for making nano-grating |
| CN204155062U (en) * | 2014-11-05 | 2015-02-11 | 安徽三安光电有限公司 | A kind of coating developing machine with exposure function |
| US20160289839A1 (en) * | 2012-07-18 | 2016-10-06 | Screen Semiconductor Solutions Co., Ltd. | Substrate processing apparatus and substrate processing method |
-
2017
- 2017-04-18 CN CN201710253240.6A patent/CN106918857B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4329338A1 (en) * | 1993-08-31 | 1995-03-02 | Olympus Optical Co | Method and device for forming a photoresist pattern |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
| CN101261449A (en) * | 2007-03-06 | 2008-09-10 | 中国科学技术大学 | Optical online detection device and detection method for grating ion beam etching |
| CN101846760A (en) * | 2010-04-09 | 2010-09-29 | 重庆理工大学 | Method for making nano-grating |
| US20160289839A1 (en) * | 2012-07-18 | 2016-10-06 | Screen Semiconductor Solutions Co., Ltd. | Substrate processing apparatus and substrate processing method |
| CN204155062U (en) * | 2014-11-05 | 2015-02-11 | 安徽三安光电有限公司 | A kind of coating developing machine with exposure function |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109352888A (en) * | 2018-12-10 | 2019-02-19 | 中国科学技术大学 | Spin coating and molding integrated device |
| CN111856636A (en) * | 2020-07-03 | 2020-10-30 | 中国科学技术大学 | A method for controllable fine-tuning of line density distribution of variable-pitch grating mask |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106918857B (en) | 2021-09-14 |
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| CB03 | Change of inventor or designer information |
Inventor after: Hou Xiang Inventor after: Qiu Kaihong Inventor after: Chen Feng Inventor after: Ou Jinliang Inventor before: Qiu Kaihong |
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Effective date of registration: 20210819 Address after: 364000 Yongding Industrial Park, Gaopi Town, Yongding District, Longyan City, Fujian Province Applicant after: FUJIAN ZOOMKING TECHNOLOGY Co.,Ltd. Address before: 364000 406, entrepreneurship building, science and technology entrepreneurship Park, No. 15, Qutan Road, Dongxiao Town, Longyan City, Fujian Province Applicant before: Qiu Kaihong |
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