DE102023204369A1 - METHOD AND ADJUSTMENT ELEMENT SET - Google Patents

Abstract

A method for designing a set of adjusting elements (100A, 100B) with a plurality of adjusting elements (102, 102A, 102B) for adjusting a position of a component (202, 202') of a projection exposure system (1), with the following steps: a) determining (S1) a total area (G) to be covered by the adjusting element set (100A, 100B), which is required to adjust the position of the component (202, 202'), b) determining (S2) a step size (Δs) of the adjusting elements (102, 102A, 102B), c) determining (S3) a probability with which adjusting elements (102, 102A, 102B) that differ from one another in their geometry are required to adjust the position of the component (202, 202'), and d) determining (S4 ) a minimum required number of adjustment elements (102, 102A, 102B) for each geometry.

Description

The present invention relates to a method for designing a set of adjusting elements for adjusting a position of a component of a projection exposure system and a set of adjusting elements designed with the aid of such a method for adjusting a position of a component of a projection exposure system.

Microlithography is used to produce microstructured components, such as integrated circuits. The microlithography process is carried out using a lithography system which has an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by means of the projection system onto a substrate, for example a silicon wafer, which is coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, in order to project the mask structure onto the light-sensitive coating of the substrate transferred to.

Driven by the pursuit of ever smaller structures in the production of integrated circuits, EUV lithography systems are currently being developed which use light with a wavelength in the range from 0.1 nm to 30 nm, in particular 13.5 nm. In such EUV lithography systems, reflecting optics, i.e. mirrors, must be used instead of - as before - refracting optics, i.e. lenses, due to the high absorption of light of this wavelength by most materials.

When manufacturing a lighting system as mentioned above or a projection system as mentioned above, a highly precise correction of manufacturing tolerances, in particular from an original state to a deliverable state, is required. This requires very precise adjustment of components or assemblies in the order of around 10 µm. The attachment of the components or assemblies should ensure good thermal transfer. At the same time, dynamically stable transitions are required and the correction should be cost-effective compared to an actuation.

The challenge with the projection system in particular is to align heavy components with a mass of 1 to 2,000 kg to one another with an accuracy of around 10 µm. This alignment must be stable in the long term against settling effects. In addition, small components (less than 1 kg) must be aligned with one another even in the tightest of spaces, whereby an adjustment mechanism or an actuator cannot be implemented due to a lack of space available. A large adjustment range with a small step size is also desirable.

It is possible to keep spacers or spacers in defined sizes and quantities, for example in the form of setting boxes, in particular spacer setting boxes, in order to be able to space the components to be aligned with one another in the manufacturing process. Such setting boxes can contain several thousand spacers. This requires appropriate storage options. Alternatively, the spacers or spacers can also be manufactured individually on request. However, this increases production times and is preferably only implemented in exceptional cases. This needs to be improved.

Against this background, an object of the present invention is to provide an improved method for designing a set of adjustment elements.

Accordingly, a method for designing an adjusting element set with a plurality of adjusting elements for adjusting a position of a component of a projection exposure system is proposed. The method includes the following steps: a) determining a total area to be covered by the set of adjusting elements that is required to adjust the position of the component, b) determining a step size of the adjusting elements, c) determining a probability with which their geometry differs from one another distinguishing adjusting elements are required for adjusting the position of the component, and d) determining a minimum required number of adjusting elements for each geometry.

By determining the probability with which the adjusting elements, which differ in their step sizes, are required to adjust the position of the component, it is possible to only keep the actually required adjusting elements or spacers in stock in the respective adjusting element set. This advantageously leads to a cost reduction.

The adjusting element set can also be referred to as a spacer set, spacer box, setting box or spacer setting box. The adjustment element set can include any number of adjustment elements. The Adjusting elements differ from each other in their thickness or height, although several adjusting elements, each with identical height, can also be provided. The geometry of the adjusting elements can be understood in particular as their height. The term “geometry” can therefore be replaced by the term “height”.

The component basically has six degrees of freedom, namely three translational degrees of freedom each along an x-direction, a y-direction and a z-direction as well as three rotational degrees of freedom each around the x-direction, the y-direction and the z-direction. This means that both a position and an orientation of the component can be determined or described using the six degrees of freedom.

The “position” of the component is therefore understood to mean its coordinates or the coordinates of a measuring point provided on the component with respect to the x-direction, the y-direction and the z-direction. The “orientation” of the component is therefore particularly understood to mean its tilting in relation to the three directions. This means that the component can be tilted about the x-direction, the y-direction and/or the z-direction. This results in six degrees of freedom for the position and/or orientation of the component.

The “location” of the component includes both its position and its orientation. This means that the orientation and the position can also be referred to collectively as position or the position can be referred to as orientation and position. The terms “location” and “orientation and position” can therefore be interchanged arbitrarily. “Adjusting” or “aligning” the component can therefore be understood to mean that both the orientation and the position of the component can preferably be changed in order to move the component from an actual position to a desired position.

In the present case, the “overall area” is to be understood in particular as an area that must be covered with the help of the adjusting elements of the adjusting element set in order to move the component from its actual position to its desired target position. The “step size” or “increment” is the smallest step in the geometry or height of the adjustment elements that is required to achieve the desired specification.

Each adjustment element is assigned a geometry or height as mentioned above. The geometries or heights of the adjustment elements differ from each other. However, there can be several adjustment elements for each geometry or height. These adjusting elements then all have the same geometry or height and therefore do not differ from one another in their geometries or heights. The difference in geometries or heights is defined by the step size or increment. In step c), in particular, for each geometry or height, it is determined or calculated how high the probability is that the respective adjusting element will be used to adjust the position of the component.

In step d), on the other hand, it is determined or calculated how many adjustment elements must each have the same geometry or height in order to reliably have all adjustment elements available during the adjustment of the position of the component, without the process flow during the adjustment of the position being disrupted by the absence of one certain adjustment element is endangered.

According to one embodiment, step a) and/or step b) is carried out with the aid of tests and/or tolerance considerations.

A virtual assembly model (VMM) can be used for this. This eliminates the need for actual assembly of the component before adjustment. The tolerance consideration includes all manufacturing tolerances of the components to be installed, which influence the dimension to be set. The step size is significantly influenced by how far the dimension to be set can deviate from its nominal value.

According to a further embodiment, during step c), a Gaussian distribution, a uniform distribution, an exponential distribution or the like is placed over the total area determined during step a).

This makes it possible to determine the probability with which an adjusting element with a specific geometry or height is required to adjust the component.

According to a further embodiment, during step d) the at least required number of adjustment elements for each geometry is calculated using a cumulative binomial distribution, a simulation or an actual consumption.

Alternatively, a determination of actual consumption can be made. In particular, it is calculated how many adjustment elements of the respective geometry or height can be taken from the adjustment element set in order to always have at least one adjustment element present with a high degree of probability.

According to a further embodiment, a safety factor is taken into account during step d).

This makes it possible to secure the design of the adjustment element set. In order to be able to prevent non-statistical effects, such as systematic errors, it is possible to include additional adjustment elements in the adjustment element set. For example, a number of unlikely edge adjustment elements may be included in the adjustment element set. As soon as a certain number of adjustment steps have been carried out and adjustment elements have been installed, statistics can be prepared about the removal quantity per respective geometry or height, from which improved estimates for the probabilities and advantageous numbers can be derived.

According to a further embodiment, a nominal adjusting element is used during step a), which is added to the adjusting element set.

In the present case, a “nominal adjustment element” or “nominal spacer” is to be understood as meaning the adjustment element whose probability of being used when adjusting the position of the component is the highest compared to the other adjustment elements of the adjustment element set.

According to a further embodiment, the adjusting element set has coarse adjustment elements and fine adjustment elements, wherein during step c) a probability is determined with which the coarse adjustment elements, which differ from one another in their geometries, are each required to adjust the position of the component.

The fine adjustment elements and the coarse adjustment elements differ from each other in terms of their increment or step size. This means that the coarse adjustment elements have a larger increment and the fine adjustment elements have a smaller increment.

According to a further embodiment, a Gaussian distribution is placed over an entire area of the coarse adjustment elements, with the fine adjustment elements being assumed to be uniformly distributed.

This means in particular that the same number of fine adjustment elements is provided for each geometry or height of the fine adjustment elements.

Furthermore, a set of adjusting elements for adjusting a position of a component of a projection exposure system is proposed, wherein the set of adjusting elements is designed using the aforementioned method, and wherein the set of adjusting elements has a plurality of adjusting elements which differ from one another in their geometries.

The number of adjustment elements is basically arbitrary. However, for those geometries or heights that are more likely to be used to adjust the position of the component, more adjustment elements are provided per geometry or height than for those adjustment elements that are less likely to be used.

According to one embodiment, the adjusting elements have coarse adjusting elements and fine adjusting elements, wherein a step size of the coarse adjusting elements is larger or an integer multiple of a step size of the fine adjusting elements.

The coarse adjustment elements and the fine adjustment elements therefore differ from each other in their step size. The step size or increment can be larger for the coarse adjustment elements than for the fine adjustment elements.

In the present case, “on” is not necessarily to be understood as limiting it to exactly one element. Rather, several elements, such as two, three or more, can also be provided. Any other counting word used here should not be understood to mean that there is a limitation to exactly the number of elements mentioned. Rather, numerical deviations upwards and downwards are possible, unless otherwise stated.

The embodiments and features described for the method apply accordingly to the proposed adjustment element set and vice versa.

Further possible implementations of the invention also include combinations of features or embodiments described above or below with regard to the exemplary embodiments that are not explicitly mentioned. The person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

• 1 zeigt einen schematischen Meridionalschnitt einer Projektionsbelichtungsanlage für die EUV-Projektionslithographie;
• 2 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Justierelementsatzes zum Justieren einer Lage eines Bauteils der Projektionsbelichtungsanlage gemäß 1;
• 3 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Justierelements für den Justierelementsatz gemäß 2;
• 4 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Justierelements gemäß 3;
• 5 zeigt eine tabellarische Übersicht zur Bedarfsberechnung von unterschiedlichen Justierelementen gemäß 3;
• 6 zeigt ein schematisches Diagramm zur Auslegung des Justierelementsatzes gemäß 2;
• 7 zeigt eine schematische perspektivische Ansicht einer weiteren Ausführungsform eines Justierelementsatzes zum Justieren einer Lage eines Bauteils der Projektionsbelichtungsanlage gemäß 1;
• 8 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Grobjustierelements für den Justierelementsatz gemäß 7;
• 9 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Feinjustierelements für den Justierelementsatz gemäß 7;
• 10 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Grobjustierelements gemäß 8;
• 11 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Feinjustierelements gemäß 9;
• 12 zeigt eine tabellarische Ansicht des Justierelementsatzes gemäß 7;
• 13 zeigt eine schematische Darstellung der Toleranz für den Justierelementsatz gemäß 2 oder 7;
• 14 zeigt eine schematische Darstellung der Konvergenz für den Justierelementsatz gemäß 2 oder 7;
• 15 zeigt eine schematische Ansicht einer Ausführungsform eines optischen Systems für die Projektionsbelichtungsanlage gemäß 1; und
• 16 zeigt ein schematisches Blockdiagramm einer Ausführungsform eines Verfahrens zum Auslegen des Justierelementsatzes gemäß 2 oder 7.

Further advantageous refinements and aspects of the invention are the subject of the subclaims and the exemplary embodiments of the invention described below. The invention is further explained in more detail using preferred embodiments with reference to the accompanying figures.

• 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography;
• 2 shows a schematic perspective view of an embodiment of an adjusting element set for adjusting a position of a component of the projection exposure system 1 ;
• 3 shows a schematic perspective view of an embodiment of an adjusting element for the adjusting element set according to 2 ;
• 4 shows a schematic diagram of a probability distribution of different heights of the adjustment element 3 ;
• 5 shows a tabular overview for calculating the requirements of different adjustment elements 3 ;
• 6 shows a schematic diagram for the design of the adjusting element set according to 2 ;
• 7 shows a schematic perspective view of a further embodiment of an adjusting element set for adjusting a position of a component of the projection exposure system 1 ;
• 8th shows a schematic perspective view of an embodiment of a coarse adjustment element for the adjustment element set according to 7 ;
• 9 shows a schematic perspective view of an embodiment of a fine adjustment element for the adjustment element set according to 7 ;
• 10 shows a schematic diagram of a probability distribution of different heights of the coarse adjustment element 8th ;
• 11 shows a schematic diagram of a probability distribution of different heights of the fine adjustment element 9 ;
• 12 shows a tabular view of the adjusting element set according to 7 ;
• 13 shows a schematic representation of the tolerance for the adjusting element set according to 2 or 7 ;
• 14 shows a schematic representation of the convergence for the adjustment element set according to 2 or 7 ;
• 15 shows a schematic view of an embodiment of an optical system for the projection exposure system according to 1 ; and
• 16 shows a schematic block diagram of an embodiment of a method for designing the adjustment element set according to 2 or 7 .

In the figures, identical or functionally identical elements have been given the same reference numerals, unless otherwise stated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of a lighting system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, lighting optics 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a module separate from the other lighting system 2. In this case, the lighting system 2 does not include the light source 3.

A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be displaced via a reticle displacement drive 9, in particular in a scanning direction.

In the 1 For explanation purposes, a Cartesian coordinate system with an x-direction x, a y-direction y and a z-direction z is shown. The x-direction x runs perpendicularly into the drawing plane. The y-direction y is horizontal and the z-direction z is vertical. The scanning direction is in the 1 along the y-direction y. The z direction z runs perpendicular to the object plane 6.

The projection exposure system 1 includes projection optics 10. The projection optics 10 is used to image the object field 5 into an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0 ° is also between the object plane 6 and the Image level 12 possible.

A structure on the reticle 7 is imaged on a light-sensitive layer of a wafer 13 arranged in the area of the image field 11 in the image plane 12. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be displaced in particular along the y-direction y via a wafer displacement drive 15. The displacement, on the one hand, of the reticle 7 via the reticle displacement drive 9 and, on the other hand, of the wafer 13 via the wafer displacement drive 15 can take place in synchronization with one another.

The light source 3 is an EUV radiation source. The light source 3 emits in particular EUV radiation 16, which is also referred to below as useful radiation, illumination radiation or illumination light. The useful radiation 16 in particular has a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example an LPP source (Laser Produced Plasma, plasma generated with the help of a laser) or a DPP source (Gas Discharged Produced Plasma). It can also be a synchrotron-based radiation source. The light source 3 can be a free electron laser (FEL).

The illumination radiation 16, which emanates from the light source 3, is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces. The at least one reflection surface of the collector 17 can be in grazing incidence (GI), i.e. with angles of incidence greater than 45 °, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45 ° Illumination radiation 16 is applied. The collector 17 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.

After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focus plane 18. The intermediate focus plane 18 can represent a separation between a radiation source module, having the light source 3 and the collector 17, and the illumination optics 4.

The lighting optics 4 comprises a deflection mirror 19 and, downstream of it in the beam path, a first facet mirror 20. The deflection mirror 19 can be a flat deflection mirror or alternatively a mirror with an effect that influences the bundle beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 19 can be designed as a spectral filter which separates a useful light wavelength of the illumination radiation 16 from false light of a wavelength that deviates from this. If the first facet mirror 20 is arranged in a plane of the illumination optics 4, which is optically conjugate to the object plane 6 as a field plane, it is also referred to as a field facet mirror. The first facet mirror 20 includes a large number of individual first facets 21, which can also be referred to as field facets. Of these first facets 21 are in the 1 just a few are shown as examples.

The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour. The first facets 21 can be designed as flat facets or alternatively as convex or concave curved facets.

Like, for example, from the DE 10 2008 009 600 A1 is known, the first facets 21 themselves can also each be composed of a large number of individual mirrors, in particular a large number of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details see the DE 10 2008 009 600 A1 referred.

Between the collector 17 and the deflection mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction y.

A second facet mirror 22 is located downstream of the first facet mirror 20 in the beam path of the illumination optics 4. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil facet mirror. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the lighting optics 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006/0132747 A1 , the EP 1 614 008 B1 and the US 6,573,978 .

The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

The second facets 23 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal edges, or alternatively they can be facets composed of micromirrors. In this regard, reference is also made to the DE 10 2008 009 600 A1 referred.

The second facets 23 can have flat or alternatively convex or concave curved reflection surfaces.

The lighting optics 4 thus forms a double faceted system. This basic principle is also known as the honeycomb condenser (Fly's Eye Integrator).

It may be advantageous not to arrange the second facet mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the second facet mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as is the case, for example, in FIG DE 10 2017 220 586 A1 is described.

With the help of the second facet mirror 22, the individual first facets 21 are imaged into the object field 5. The second facet mirror 22 is the last beam-forming mirror or actually the last mirror for the illumination radiation 16 in the beam path in front of the object field 5.

In a further embodiment of the illumination optics 4, not shown, transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5, which contributes in particular to the imaging of the first facets 21 into the object field 5. The transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the lighting optics 4. The transmission optics can in particular include one or two mirrors for perpendicular incidence (NI mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GI mirror, grazing incidence mirror).

The lighting optics 4 has the version in the 1 is shown, after the collector 17 exactly three mirrors, namely the deflection mirror 19, the first facet mirror 20 and the second facet mirror 22.

In a further embodiment of the lighting optics 4, the deflection mirror 19 can also be omitted, so that the lighting optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22.

The imaging of the first facets 21 into the object plane 6 by means of the second facets 23 or with the second facets 23 and a transmission optics is generally only an approximate image.

The projection optics 10 comprises a plurality of mirrors Mi, which are numbered consecutively according to their arrangement in the beam path of the projection exposure system 1.

At the one in the 1 In the example shown, the projection optics 10 includes six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The projection optics 10 is a double obscured optics. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture that is larger than 0.5 and which can also be larger than 0.6 and, for example, 0.7 or can be 0.75.

Reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape. The mirrors Mi, like the mirrors of the lighting optics 4, can have highly reflective coatings for the lighting radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

The projection optics 10 has a large object image offset in the y direction y between a y coordinate of a center of the object field 5 and a y coordinate of the center of the image field 11. This object image offset in the y direction y can be in be approximately as large as a z-distance between the object plane 6 and the image plane 12.

The projection optics 10 can in particular be anamorphic. In particular, it has different imaging scales βx, βy in the x and y directions x, y. The two imaging scales βx, βy of the projection optics 10 are preferably (βx, βy) = (+/- 0.25, +/- 0.125). A positive magnification 6 means an image without image reversal. A negative sign for the image scale 6 means an image with image reversal.

The projection optics 10 thus leads to a reduction in size in the x direction x, that is to say in the direction perpendicular to the scanning direction, in a ratio of 4:1.

The projection optics 10 leads to a reduction of 8:1 in the y direction y, that is to say in the scanning direction.

Other image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions x, y, for example with absolute values of 0.125 or 0.25, are also possible.

The number of intermediate image planes in the x and y directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can be different. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from US 2018/0074303 A1 .

One of the second facets 23 is assigned to exactly one of the first facets 21 to form an illumination channel for illuminating the object field 5. This can in particular result in lighting based on Köhler's principle. The far field is broken down into a large number of object fields 5 using the first facets 21. The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to them.

The first facets 21 are each imaged onto the reticle 7 by an assigned second facet 23, superimposed on one another, in order to illuminate the object field 5. The illumination of the object field 5 is in particular as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by overlaying different lighting channels.

By arranging the second facets 23, the illumination of the entrance pupil of the projection optics 10 can be geometrically defined. By selecting the lighting channels, especially the part Depending on the amount of second facets 23 that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the lighting setting or lighting pupil filling.

A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels.

Further aspects and details of the illumination of the object field 5 and in particular the entrance pupil of the projection optics 10 are described below.

The projection optics 10 can in particular have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

The entrance pupil of the projection optics 10 cannot regularly be illuminated precisely with the second facet mirror 22. When imaging the projection optics 10, which images the center of the second facet mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, an area can be found in which the pairwise distance of the aperture beams becomes minimal. This surface represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.

It may be that the projection optics have 10 different positions of the entrance pupil for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7. With the help of this optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

At the in the 1 As shown in the arrangement of the components of the illumination optics 4, the second facet mirror 22 is arranged in a surface conjugate to the entrance pupil of the projection optics 10. The first facet mirror 20 is tilted relative to the object plane 6. The first facet mirror 20 is arranged tilted to an arrangement plane that is defined by the deflection mirror 19. The first facet mirror 20 is arranged tilted to an arrangement plane that is defined by the second facet mirror 22.

When producing an illumination optics 4 as mentioned above or a projection optics 10 as mentioned above, a highly precise correction of manufacturing tolerances, in particular from an original state to a deliverable state, is required. A very precise adjustment of the order of around 10 µm is necessary, whereby a good thermal transition should be guaranteed. At the same time, dynamically stable transitions are required and the correction should be cost-effective compared to an actuation.

Particularly with the projection optics 10, the challenge is to align heavy components with a mass of 1 to 2,000 kg to one another with an accuracy of around 10 µm. This alignment must be stable in the long term against settling effects. Small components (less than 1 kg) have to be aligned with one another in a very limited installation space, whereby an adjustment mechanism or an actuator cannot be implemented due to the lack of available installation space. A large adjustment range with a small step size is also desirable.

These requirements can be implemented as follows. Spacers or spacers must be available in defined sizes and quantities, for example in the form of setting boxes, in particular spacer setting boxes, in order to be able to space the components to be aligned with one another in the manufacturing process. Alternatively, the spacers or spacers can also be manufactured individually on request. However, this increases production times and is preferably only implemented in exceptional cases. The overall range must be spacerable or with the required precision. Advantageously, only the spacers or spacers actually required should be available in stock in a respective spacer set. This leads to a cost reduction.

For precise assembly of components, intermediate pieces, spacers or spacers with an accuracy of less than 10µm are often necessary. These spacers can be individually ground. However, at least half a day passes between the calculation of the required dimensions and the availability of the ground parts. Faster availability can be achieved by using construction kits or spacer kits.

2 shows a schematic view of an embodiment of a construction kit, setting box or adjusting element set 100A as mentioned above. The adjusting element set 100A can also be referred to as a spacer set box. 3 shows a schematic perspective view of an embodiment of a spacer or adjusting element 102 for the adjusting element set 100A. Below we will refer to the 2 and 3 referred to at the same time.

The adjusting element set 100A comprises a plurality of adjusting elements 102. The adjusting elements 102 differ from one another in their geometry, in particular in their thickness or height, as will be explained below. However, for each geometry or height, several adjusting elements 102 with the same geometry or height can be provided. The number of adjusting elements 102 is basically arbitrary. However, only one adjustment element 102 will be referred to below.

The adjusting element 102 can be disk-shaped or hollow cylindrical and includes a cylindrical outside or outer surface 104 and a centrally provided bore or opening 106. The opening 106 is also cylindrical. Furthermore, the adjusting element 102 has a front or first end face 108 and a back or second end face 110. However, the adjusting element 102 can basically have any geometry.

The end faces 108, 110 are arranged parallel to one another and spaced apart from one another. The adjusting element 102 has a thickness or height d102. As previously mentioned, the adjusting elements 102 of the adjusting element set 100A have adjusting elements 102 with different heights d102, although several adjusting elements 102 with the same height d102 can also be part of the adjusting element set 100A. In the present case, the height d102 is to be understood as a distance between the two end faces 108, 110 arranged parallel to one another.

The adjusting element 102 can rest with its two end faces 108, 110 on two objects or components of the projection exposure system 1 that are to be aligned with one another. A fastening element, in particular a screw, can be passed through the opening 106.

To design the adjusting element set 100A, an area to be compensated, which should be adjustable with the aid of the adjusting element set 100A or with the aid of the adjusting element 102, is first determined. This range can also be referred to as the overall range, range or overall spacer range. This determination of the area is carried out, for example, by considering tolerances or tests.

An increment or space increment, in other words the sensitivity, is then determined via a tolerance consideration, a geometric consideration, tolerance simulations or tests. The increment can also be referred to as a step size. The smallest space increment is determined to get the alignment tasks into the specification. When designing the adjusting element set 100A, the probabilities of the requirements of the individual adjusting elements 102 are now determined.

This can be done, as in the 4 shown, a Gaussian distribution can be placed over a total spacer range or total area G as mentioned above. In the 3 The height d102 in mm is plotted on the abscissa or right axis and the probability p is plotted on the ordinate or vertical axis. In the exemplary case according to the 4 the total area G is as follows: $$G=\mathrm{3,685}mm-\mathrm{2,305}mm=1.38mm$$

The design can be done, for example, with a spacer range of -3s, +3s. The space increments with a magnitude of approximately 10 μm quantize the Gaussian distribution over the entire area G. The individual space increment probabilities add up to 1. A nominal spacer or nominal adjustment element 102 'is therefore most likely. The nominal adjusting element 102' differs from the other adjusting elements 102 only in that the probability of using the nominal adjusting element 102' is the greatest compared to the other adjusting elements 102. The nominal adjusting element 102' can also be referred to as a middle adjusting element.

A process for designing the adjusting member set 100A can be performed as follows. First, all components to be aligned are assembled, including the nominal spacer or nominal adjusting element 102'. This can be done in real life or using a virtual assembly model (VMM). The original state is then determined real or via a measuring system or virtually via the virtual assembly model. The correction and the required adjustment elements 102 for correction are described below certainly. The adjustment elements 102 are then provided and installed. The corrected state is then determined either physically or via the measuring system. If necessary, another spacer loop is required.

When designing the adjustment element set 100A, it must be determined how many adjustment elements 102 make sense per increment or step size. On the other hand, there must always be enough adjustment elements 102 in order not to endanger the process flow. An optimization is carried out based on the cost versus availability of the respective adjustment elements 102. The required boundary conditions here are replacement time, the consumption of adjustment elements 102 per adjustment element set 100A and the spacer probability or probability of the respective adjustment element 102.

The task here is to determine the number of adjustment elements 102 per increment or step size that are required in the adjustment element set 100A in order to reliably have all increments available during assembly, especially during the replacement period. This is implemented by a cumulative binomial distribution, which calculates how many adjustment elements 102 can be taken from the adjustment element set 100A in order to always have at least one adjustment element 102 present with a high probability, for example of 99%.

5 shows a table with an overview of requirement calculations for the cumulative probability C of greater than 0.997. In the 5 p denotes the probability and N the number of spacer tasks. The cumulative probability C indicates the security against idling of the adjustment element set 100A. The probability p provides a statement about how high the probability p is of using a respective adjustment element 102 with a specific height d102.

The design of the adjusting element set 100A can be secured. In order to prevent non-statistical effects, such as a systematic error, additional adjustment elements 102 can be added to the adjustment element set 100A. For example, this can be done by increasing the number of unlikely edge spacers or edge adjustment elements. This increases security. Furthermore, nominal spacers or nominal adjusting elements 102' can also be included. For example, these are adjustment elements 102, which may be installed during the initial setup, in particular when determining an actual situation.

6 shows schematically an example of the adjusting element set 100A, in which the adjusting elements 102 are not normally distributed. The height d102 is again plotted on the right axis or abscissa, whereas a number of the adjusting elements 102 is plotted on the vertical axis or ordinate. The adjusting element set 100A without nominal distribution is shown with a solid line. A safety curve is shown with a dashed line, and an expected value is shown with a dash-dotted line. If necessary, the safety curve can be calculated with a safety factor.

7 shows a schematic perspective view of a further embodiment of a modular system or adjusting element set 100B as mentioned above. The adjusting element set 100B can also be referred to as a spacer set. 8th and 9 each show a schematic perspective view of an embodiment of a coarse spacer or coarse adjustment element 102A and a fine spacer or fine adjustment element 102B for the adjustment element set 100B. Below we will refer to the 7 until 9 referred to at the same time.

The adjusting element set 100B differs from the adjusting element set 100A in that two different types of adjusting elements 102A, 102B, namely the coarse adjusting elements 102A and the fine adjusting elements 102B, are provided. The coarse adjustment elements 102A are assigned a thickness or height d102A. A thickness or height d102B is assigned to the fine adjustment elements 102B. The height d102A can be greater than the height d102B. However, this is not absolutely necessary. The coarse adjustment elements 102A have a large step size compared to the fine adjustment elements 102B, whereas the fine adjustment elements 120B have a small step size compared to the coarse adjustment elements 102A. This means in particular that the fine adjustment elements 102B can also be thicker than the coarse adjustment elements 102A.

To design the adjusting element set 100B, the total range G or total spacer range (original state) is first determined via tolerance considerations or tests. The total range G is the range that must be adjustable via the adjusting elements 102A, 102B.

The increment or space increment and thus the sensitivity of the adjusting elements 102A, 102B are then determined via tolerance considerations or tests. The smallest spacer step to get the tasks into specification is determined. In order to reduce the number of adjustment elements 102A, 102B, a division is made into coarse adjustment elements 102A and fine adjustment elements 102B. The probabilities of the individual rough adjustment elements 102A are then interpreted. Typically, a Gaussian distribution is placed over the area to be covered by the coarse adjustment elements 102A. For example with a range to be covered of -3s, +3s. The fine adjustment elements 102B are then assumed to be uniformly distributed.

To design the adjustment element set 102B, it is determined how many adjustment elements 102A, 102B make sense at most per increment or step size. On the other hand, there must always be enough adjustment elements 102A, 102B in order not to endanger the process flow. An optimization takes place with regard to the costs of the adjusting elements 102A, 102B versus the availability of the adjusting elements 102A, 102B. The required boundary conditions are the replacement time, the consumption of the adjustment elements 102A, 102B per adjustment element set 100B and the probability of using the respective adjustment elements 102A, 102B.

The task here is to determine the number of adjusting elements 102A, 102B per increment that are required in the adjusting element set 100B in order to reliably have all increments of the adjusting elements 102A, 102B available during assembly, in particular during the replacement period. The implementation takes place via a cumulative binomial distribution, which is used to calculate how many adjustment elements 102A, 102B must be kept in stock in order to always have at least one adjustment element 102A, 102B present with a high probability, for example of 99%.

To secure the design, for example to prevent non-statistical effects, in particular systematic errors, additional adjusting elements 102A, 102B can be added to the adjusting element set 100B. For example, the number of unlikely edge adjustment elements is increased. Furthermore, as previously mentioned, nominal spacers or nominal adjusting elements 102A', 102B' ( 10 and 11 ) must be included.

10 shows the design of the coarse adjustment elements 102A. 11 shows the design of the fine adjustment elements 102B. In the 10 and 11 the respective height d102a, d102B is plotted on the right axis or abscissa axis and the number of adjusting elements 102A, 102B is plotted on the vertical axis or ordinate axis. The target statistics are entered with a solid line. The beams in the 10 and 11 represent the adjustment element set 100B.

Important parameters when designing the adjusting elements 102, 102A, 102B of the respective adjusting element set 100A, 100B are the increment or step size Δs and the value range R to be covered. In the case of a single-row adjusting element set 100A, n stages or increments of the adjusting elements 102 are required: $$n=\frac{R}{\mathrm{\Delta }s}+1$$

In the case of a two-row adjustment element set 102B, however, n stages or increments of the adjustment elements 102A, 102B are required: $$n=2\sqrt{\frac{R}{\mathrm{\Delta }s}+1}$$

$$n_{zweireihig}=2\sqrt{\frac{\mathrm{1,436}mm}{\mathrm{0,004}mm}+1}=\mathrm{37,9}$$

In theory, for a given example with a value range R of 1.436 mm and a step size Δs of 0.004 mm, the following applies: $$n_{einreiHiG}=\frac{\mathrm{1,436}mm}{0.004mm}+1=360$$

$$n_{\mathrm{e.g}weireiHiG}=2\sqrt{\frac{\mathrm{1,436}mm}{0.004mm}+1}=37.9$$

In practice, with a suitable choice of the step size Δs of the coarse adjustment elements 102A, the result is: $$n_{\mathrm{e.g}weireiHiG}=n_{fein}+n_{GrOb}=20+18=38$$

12 shows very schematically the adjusting element set 100B according to the aforementioned example. In the left part of the figure are the 12 the coarse adjustment elements 102A are shown with a step size Δs of 80 μm and in the right part of the figure the fine adjustment elements 102B are shown with a step size Δs of 4 μm. There are therefore 18 variants of the coarse adjustment elements 102A and 20 variants of the fine adjustment elements 102B. However, it does not apply that the height d102A is always greater than the height d102B.

Other distributions besides the previously mentioned Gaussian distribution are also conceivable. After a certain period of use, the probabilities can also be determined via the actual consumption of the adjustment elements 102, 102A, 102B. The probabilities can also be determined via so-called Monte Carlo simulations or process flow simulations, in which the component and assembly configurations are constructed in a simulated manner with randomly determined tolerance values and the required thicknesses d102, d102A, d102B of the adjusting elements 102, 102A, 102B are determined from the results . The more random configurations are simulated, the more meaningful the statistical analysis derived from them regarding the probability that an adjusting element 102, 102A, 102B of a certain thickness d102, d102A, d102B is required. The advantage of an additional process flow simulation is that the entire nested replacement process and the nested removal from the respective adjustment element set 100A, 100B are taken into account. This makes it possible to determine whether a selected stock quantity is sufficient to ensure withdrawal during the replenishment period, i.e. the time in which the stock is not replenished.

If the step size Δs is chosen favorably, it is 0.2 times the width of the tolerance band to be maintained. This means that neighboring spacers can also be used for a setting task. Theoretically, under otherwise ideal boundary conditions, it only needs to be ensured that the step size Δs is less than or equal to the width of the tolerance band. In this constellation, it is always possible to achieve a state that is just outside the tolerance band by replacing the adjusting element 102, 102A, 102B with one that differs from the installed adjusting element 102, 102A, 102B by exactly one step size Δs to achieve tolerance. This means that when choosing the appropriate adjustment element 102, 102A, 102B, the set state will never deviate from the desired setting by more than half the step size Δs, given otherwise ideal boundary conditions.

It is possible to merge spacer tasks. In this case, different sets of adjusting elements 100A, 100B are combined.

A division between single-row or double-row with coarse adjustment elements 102A to fine-adjustment elements 102B or n-row is possible while minimizing the spacer thicknesses.

An adjustment element 102, 102A, 102B can represent several dimensions. However, typically only one dimension is provided. The respective adjusting element set 100A, 100B typically has approximately 20 to 200 different adjusting elements 102, 102A, 102B. The total number of adjustment elements 102A, 102B per adjustment element set 100A, 100B is typically 100 to 10,000.

$$v=t-ƒ$$

$$r\le \frac{t}{4}$$

$$\mathrm{\Delta }s\le \mathrm{0,4}\ast t$$

13 shows the distribution of tolerance. t stands for the tolerance, which means that the actual deviation (condition) must not exceed the tolerance t. The tolerance band therefore has a width of T = 2 ∗ t. v represents the default value. The amount of the measured deviation must not exceed the specified value v. r stands for the maximum reproducibility error (3 sigma) during assembly including changing the adjusting element 102, 102A, 102B of the same type. f stands for the maximum measurement error (3 sigma) when determining the deviation and Δs stands for the step size or spacer step size. Z stands for the nominal state. In a favorable constellation that ensures a stable adjustment process, the following applies: $$ƒ\le \frac{\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102023204369A1\_0018.png,DE102023204369A1\_0028.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}$$

$$v=t-ƒ$$

$$r\le \frac{\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102023204369A1\_0018.png,DE102023204369A1\_0028.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}$$

$$\mathrm{\Delta }s\le 0.4\ast t$$

If the aforementioned equations are adhered to, there is a maximum of one adjustment loop.

$$t\ge 4\ast r$$

14 illustrates the convergence. From the equations mentioned above, the minimum tolerance to be maintained under the given boundary conditions of measurement error/and reproducibility error r follows: $$t\ge 4\ast ƒ$$

$$t\ge 4\ast r$$

If these equations are adhered to, there is also a maximum of one adjustment loop. This means, for example, that if there is a measurement accuracy of 120 µm, a tolerance of +/-480 µm can be accepted. In order to achieve a tolerance of 268 µm, the measurement error must be a maximum of 67 µm. In the 14 Reference numeral 112 denotes the measured value before spacing. The reference number 114, on the other hand, denotes the measured value after the spacer. “Spaceing” refers to the installation of the appropriate adjustment elements 102, 102A, 102B. $$\begin{array}{c}3{\sigma }_{\mathrm{\Delta }pOs}=\sqrt{2}\ast r\le \frac{\sqrt{2}\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102023204369A1\_0018.png,DE102023204369A1\_0028.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}\\ 3{\sigma }_{\mathrm{\Delta }mess}=\sqrt{2}\ast ƒ\le \frac{\sqrt{2}t}{4}\end{array}\}3{\sigma }_{\mathrm{\Delta }just}=\sqrt{2{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="DE102023204369A1\_0015.png,DE102023204369A1\_0018.png"\; state="\{\{state\}\}">r</figure-callout>}}^2+2{\mathrm{<figure-callout\; id="2"\; label="ƒ"\; filenames="DE102023204369A1\_0015.png,DE102023204369A1\_0018.png"\; state="\{\{state\}\}">ƒ</figure-callout>}}^2}\le \sqrt{2}\ast \frac{\sqrt{2}\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102023204369A1\_0018.png,DE102023204369A1\_0028.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}=\frac{\mathrm{<figure-callout\; id="2"\; label="t"\; filenames="DE102023204369A1\_0015.png,DE102023204369A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{2}$$

A general connection can be described as follows: $$t_{min}=\frac{\mathrm{\Delta }s}{2}+\sqrt{2{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="DE102023204369A1\_0015.png,DE102023204369A1\_0018.png"\; state="\{\{state\}\}">r</figure-callout>}}^2+2{\mathrm{<figure-callout\; id="2"\; label="ƒ"\; filenames="DE102023204369A1\_0015.png,DE102023204369A1\_0018.png"\; state="\{\{state\}\}">ƒ</figure-callout>}}^2}+ƒ=v_{min}+ƒ$$

t _min stands for the minimum tolerance that can be maintained, Δs for the step size or increment, r for the maximum reproducibility error (3 sigma) during assembly including changing the adjusting element 102, 102A, 102B of the same type, v _min for the minimum default value, where the measured deviation in magnitude must not exceed the minimum specified value v _min , and f for the maximum measurement error (3 sigma) when determining the deviation. As described above, with otherwise ideal boundary conditions (r = 0 and t = 0), the set state never deviates more than Δs/2 from the desired state.

15 shows a schematic view of an embodiment of an optical system 200 for the projection exposure system 1.

The optical system 200 can be an illumination optics 4 as mentioned above or a projection optics 10 as mentioned above. Therefore, the optical system 200 can also be referred to as illumination optics 4 or as projection optics 10. However, it is assumed below that the optical system 200 is a projection optics 10.

The optical system 200 has a component 202. The component 202 can be an optical element, in particular a mirror. The component 202 can be, for example, one of the mirrors M1 to M6. The optical system 200 further includes a fixed world 204. The fixed world 204 can be any other component of the projection exposure system 1. For example, the fixed world 204 is a force frame or the like.

When manufacturing the optical system 200 and/or when replacing the component 202, it may be necessary to align or adjust the component 202 in space or with respect to the fixed world 204. The component 202 is initially in an actual position IL. The component 202 can be aligned or adjusted in such a way that the component 202 is moved from the actual position IL into a target position SL. In the target position SL, the component is provided with the reference number 202 'and shown with dashed lines.

The component 202 basically has six degrees of freedom, namely three translational degrees of freedom each along the x-direction x, the y-direction y and the z-direction z as well as three rotational degrees of freedom each about the x-direction x, the y-direction y and the z direction z. This means that both a position and an orientation of the component 202 can be determined or described using the six degrees of freedom.

The “position” of the component 202 is therefore to be understood as meaning its coordinates or the coordinates of a measuring point provided on the component 202 with respect to the x-direction x, the y-direction y and the z-direction z. The “orientation” of the component 202 is therefore to be understood in particular as meaning its tilting with respect to the three directions x, y, z. This means that the component 202 can be tilted about the x-direction x, the y-direction y and/or the z-direction z. This results in the six degrees of freedom for the position and/or orientation of the component 202.

The “location” of the component 202 includes both its position and its orientation. This means that the orientation and the position can also be referred to collectively as position or the position can be referred to as orientation and position. The terms “location” and “orientation and position” can therefore be interchanged arbitrarily.

“Adjusting” or “aligning” the component 202 is therefore to be understood as meaning that both the orientation and the position of the component 202 can preferably be changed in order to move the component 202 from the actual position IL to the target position SL to spend. In the present example, the adjustment is carried out in such a way that the component 202 'in its target position SL is displaced along the z-direction z and tilted about the x-direction x relative to the component 202 in its actual position IL.

The component 202 is adjusted by installing, for example, a nominal spacer 102 'between the fixed world 204 and the component 202. The component 202 is now in the actual position IL. However, assembly can also be done virtually. In order to move the component 202 into the target position SL, for example, several adjusting elements 102 of the adjusting element set 100A are used, which make it possible to move the component 202 from its actual position IL into the target position SL.

16 shows a schematic block diagram of an embodiment of a method for designing the adjustment element set 100A, 100B.

The method describes the previously explained design of the respective adjustment element set 100A, 100B. In the method, in a step S1, the total area G to be covered by the adjusting element set 100A, 100B, which is required to adjust the position of the component 202, 202 ', is determined. In a step S2, the step size Δs of the adjusting elements 102, 102A, 102B is determined.

In a step S3, the probability is determined with which adjusting elements 102, 102A, 102B that differ from one another in their heights d102, d102A, d102B are required to adjust the position of the component 202, 202'. In a step S4, a minimum required number of adjustment elements 102, 102A, 102B is also determined for each height d102, d102A, d102B.

Step S1 and/or step S2 are carried out using tests and/or tolerance considerations. During step S3, a Gaussian distribution can be placed over the total area G determined during step S1. During step S4, the minimum required number of adjustment elements 102, 102A, 102B for each step size Δs can be calculated using a cumulative binomial distribution.

Furthermore, a safety factor can be taken into account during step S4. During step S1, the nominal adjusting element 102', 102A' may be used, which is added to the respective adjusting element set 100A, 100B.

As mentioned above, the adjusting element set 100B may have coarse adjusting elements 102A and fine adjusting elements 102B, with a probability being determined during step S3 with which the coarse adjusting elements 102A, which differ from one another in their heights d102A, are used to adjust the structure partly 202, 202' are required. A Gaussian distribution can be placed over the entire area G of the coarse adjustment elements 102A, with the fine adjustment elements 102B being assumed to be uniformly distributed.

Although the present invention has been described using exemplary embodiments, it can be modified in many ways.

REFERENCE SYMBOL LIST

1

Projection exposure system

2

Lighting system

3

light source

4

Illumination optics

5

Object field

6

Object level

7

Reticule

8th

Reticle holder

9

Reticle displacement drive

10

Projection optics

11

Image field

12

Image plane

13

wafers

14

wafer holder

15

Wafer displacement drive

16

Illumination radiation

17

collector

18

Intermediate focal plane

19

Deflecting mirror

20

first facet mirror

21

first facet

22

second facet mirror

23

second facet

100A

Adjustment element set

100B

Adjustment element set

102

Adjusting element

102'

Nominal adjustment element

102A

Adjusting element

102A'

Nominal adjustment element

102B

Adjusting element

102B'

Nominal adjustment element

104

external surface

106

breakthrough

108

face

110

face

112

Measured value

114

Measured value

200

optical system

202

Component

202'

Component

204

solid world

C

cumulative probability

d102

Height

d102A

Height

d102B

Height

G

Total area

IL

Current situation

M1

Mirror

M2

Mirror

M3

Mirror

M4

Mirror

M5

Mirror

M6

Mirror

N

Number

p

probability

Δs

step size

SL

Target location

S1

Step

S2

Step

S3

Step

S4

Step

t

tolerance

v

Default value

x

x direction

y

y direction

e.g

z direction

Z

Condition

σ

Sigma

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 102008009600 A1 [0050, 0054]
• US 20060132747 A1 [0052]
• EP 1614008 B1 [0052]
• US 6573978 [0052]
• DE 102017220586 A1 [0057]
• US 20180074303 A1 [0071]

Claims (10)

Method for designing an adjusting element set (100A, 100B) with a plurality of adjusting elements (102, 102A, 102B) for adjusting a position of a component (202, 202') of a projection exposure system (1), with the following steps: a) determining (S1) a total area (G) to be covered by the adjusting element set (100A, 100B), which is required to adjust the position of the component (202, 202'), b) determining (S2) a step size (Δs) of the adjusting elements (102, 102A, 102B), c) determining (S3) a probability with which adjusting elements (102, 102A, 102B) that differ from one another in their geometry are required to adjust the position of the component (202, 202'), and d) determining (S4) a minimum required number of adjustment elements (102, 102A, 102B) for each geometry. Procedure according to Claim 1 , wherein step a) and/or step b) is carried out with the help of tests and/or tolerance considerations. Procedure according to Claim 1 or 2 , wherein during step c) a Gaussian distribution, a uniform distribution, an exponential distribution or the like is placed over the total area (G) determined during step a). Procedure according to one of the Claims 1 - 3 , wherein during step d) the at least required number of adjustment elements (102, 102A, 102B) is calculated for each geometry using a cumulative binomial distribution, a simulation or an actual consumption. Procedure according to Claim 4 , whereby a safety factor is taken into account during step d). Procedure according to one of the Claims 1 - 5 , wherein during step a) a nominal adjusting element (102', 102A') is used, which is added to the adjusting element set (100A, 100B). Procedure according to one of the Claims 1 - 6 , wherein the adjusting element set (100B) has coarse adjusting elements (102A) and fine adjusting elements (102B), and during step c) a probability is determined with which the coarse adjusting elements (102A), which differ from one another in their geometries, are used to adjust the position of the component ( 202, 202') are required in each case. Procedure according to Claim 7 , wherein a Gaussian distribution is placed over a total area (G) of the coarse adjustment elements (102A), and the fine adjustment elements (100B) are assumed to be uniformly distributed. Adjusting element set (100A, 100B) for adjusting a position of a component (202, 202 ') of a projection exposure system (1), the adjusting element set (100A, 100B) using the method according to one of Claims 1 - 8th is designed, and wherein the adjusting element set (100A, 100B) has a plurality of adjusting elements (102, 102A, 102A) which differ from one another in their geometries. Adjusting element set according to Claim 9 , wherein the adjusting elements (102A, 102B) have coarse adjusting elements (102A) and fine adjusting elements (102B), and wherein a step size (Δs) of the coarse adjusting elements (102A) is larger or an integer multiple of a step size (Δs) of the fine adjusting elements (102B).

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