DE102022203438A1 - Optical arrangement, optical module, optical imaging device and method, method for supporting an optical element, with an actively tiltable optical element - Google Patents

Abstract

The present invention relates to an optical arrangement for an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element (108.1), in particular a facet element, a passive support device (108.2) and an actuator device (108.3), wherein the optical element (108.1) has an optical surface. The support device (108.2) is configured to support the optical element (108.1) on a support structure (110), wherein the support device (108.2) comprises a tilting joint device (108.6) which is configured to have at least a first tilt axis (108.7) and a to define the second tilt axis (108.8) of the optical element (108.1) with respect to the support structure (110), the first tilt axis (108.7) being inclined to the second tilt axis (108.8). The actuator device (108.3) comprises a lever unit (108.9), which has a first lever unit end (108.11) along a lever unit longitudinal axis (108.10), which is distant from the optical element (108.1), and has a second lever unit end, which corresponds to the optical element (108.1 ) is adjacent and is connected to the optical element (108.1). The actuator device (108.3) further comprises an actuator unit (108.13), which is configured to actively introduce a first actuating movement into the first lever unit end (108.11) transverse to the lever unit longitudinal axis (108.10), which tilts the optical element (108.1) with respect to the support structure (110) about the first tilt axis (108.7), and to actively introduce a second actuating movement, which causes a tilting of the optical element (108.1) with respect to the support structure (110) about the second tilt axis (108.8). The tilting joint device (108.6) has a first solid-state joint section (108.14) and a second solid-state joint section (108.15), which are kinematically arranged in series along a support force flow between the support structure (110) and the optical element (108.1), the first solid-state joint section (108.14) the first tilt axis (108.7) defines and the second solid joint section (108.15) defines the second tilt axis (108.8).

Description

BACKGROUND OF THE INVENTION

The present invention relates to an optical arrangement for microlithography which is suitable for the use of useful UV light, in particular light in the extreme ultraviolet (EUV) range. The invention further relates to an optical module, in particular a facet mirror, and an optical imaging device with such an optical module. The invention can be used in connection with any optical imaging method. It can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used for this purpose (for example optical masks).

Typically, the optical systems used in connection with the fabrication of such microelectronic circuits include a variety of optical element modules, which include optical elements such as lenses, mirrors, gratings, etc., arranged in the path of the light. These optical elements typically cooperate in an exposure process to illuminate a pattern formed on a mask, reticle, or the like and to transfer an image of that pattern to a substrate such as a wafer. The optical elements are usually combined in one or more functionally different optical element groups, which can be held within different optical element units. Facet mirror devices such as those mentioned above can serve, among other things, to homogenize the exposure light beam, i.e. H. in order to achieve the most even possible power distribution within the exposure light beam. They can also be used to provide any desired specific power distribution within the exposure light beam.

Due to the ongoing miniaturization of semiconductor devices, there is not only a constant need for improved resolution, but also a need for improved accuracy of the optical systems used to produce these semiconductor devices. Of course, this accuracy does not only have to be present initially, but must be maintained throughout the entire operation of the optical system. A problem in this context is the most precise possible power distribution or intensity distribution within the exposure light beam, which corresponds as closely as possible to a desired power distribution in order to ultimately avoid or at least reduce undesirable imaging errors. In order to enable the most sensitive power distribution possible, it is therefore desirable to reduce the optical area of the individual facet elements and to increase the number of facet elements, ultimately increasing the “resolution” of the facet mirror.

In order to achieve a desired power distribution, facet mirror devices were developed, such as those in DE 102 05 425 A1 (Holderer et al.), the entire disclosure of which is incorporated herein by reference. The DE 102 05 425 A1 (Holderer et al.) shows, among other things, facet mirror devices in which facet elements with a spherical rear surface sit in an assigned recess within a carrier element. The spherical rear surface rests on a corresponding spherical wall or several contact points of the support element delimiting this recess. The spherical back surface has a comparatively small radius of curvature so that it defines a center of rotation of the facet element that is far away from a center of curvature of the optical surface of the facet element. An operating lever is centrally connected to the back of the facet element and corresponding manipulators tilt the operating lever, ie produce lateral deflections of the free end of the operating lever in order to adjust both the position and the orientation of the optical surface of the facet.

A similar adjustment principle is also from the WO 2012/175116 A1 (Vogt et al.), the entire disclosure of which is incorporated herein by reference. Here too, an elongated operating lever is attached to the back of the facet element. The tilting of the optical surface of the facet element is also achieved here by a lateral deflection of an actuating lever transversely to its longitudinal axis.

A similar principle with active adjustment via a magnetic actuator device acting on the actuating lever is from the US 9,785,051 B2 (Van Schoot et al.) and the US 9,927,711 B2 (Hol et al.), the entire disclosure of which is incorporated herein by reference. A passive support device is provided here, with which the facet element is supported on a support structure (here a common support for a larger number of facet elements) via slim support rods. The longitudinal axes of the support rods intersect at a point around which the facet element can then be tilted as desired in the manner of a ball joint.

In the lighting system of EUV lithography systems, the facets are typically of a field facet mirror assigned to differently positioned facets of a pupil facet mirror. In certain optical designs (for example designs of the “specular reflector” type), in addition to individually tiltable field facets, individually tiltable pupil facets are also provided, with tiltability around two (usually orthogonal) axes typically being implemented in each case.

The field facets can be designed as micromirror arrays with typically hundreds of thousands of individual field facets, each of which, for example, has an optical area of the order of 1 mm ² . Such actuable micromirrors can in principle be manufactured in silicon using so-called MEMS technologies (MEMS = micro-electro-mechanical system) and directly integrate the drive, as shown, for example US 5,914,801 (Dhuler et al.), the entire disclosure of which is incorporated herein by reference.

In contrast, the pupil facets for such lighting systems typically use optical surfaces whose surface area is in the range between 20 mm ² and 30 mm ² , with a tilt of ±100 mrad per tilt axis typically being achieved. The pupil facets are typically exposed to a thermal power density of up to 100 kW/m ² due to the absorbed EUV radiation. In order to keep the temperature of the facet elements at a tolerable value (typically below 200 ° C, but if possible below 100 ° C), the support device of the facet elements must enable the best possible heat dissipation. This requires comparatively large minimum cross sections of the support elements used, which in turn result in a comparatively large torque that is required to achieve the desired tilting.

Such large tilting moments cannot be applied with conventional MEMS systems given the given sizes of the pupil facets, so that support devices produced using conventional precision mechanical processes are typically used, such as those from the one mentioned above US 9,785,051 B2 (Van Schoot et al.) or the US 9,927,711 B2 (Hol et al.) are known. However, these known support devices have the disadvantage that, due to their principle, they require comparatively large installation space and comparatively high torques in order to achieve the desired tilting with sufficient heat dissipation.

BRIEF SUMMARY OF THE INVENTION

The invention is therefore based on the object of providing an optical arrangement of an imaging device for microlithography, a corresponding optical module and a corresponding optical imaging device with such an arrangement, a method for supporting an optical element and an optical imaging method, which or which does not have the aforementioned disadvantages or at least to a lesser extent and, in particular, enables the required tilting of the optical surface of the optical element in a simple manner with little space requirement and good heat dissipation.

The invention solves this problem with the features of the independent claims.

The invention is based on the technical teaching that the required tilting of the optical surface of the optical element can be achieved in a simple manner with little installation space and good heat dissipation if the support device is designed as a passive component, which has two dedicated tilting axes arranged kinematically in series via corresponding solid-state joint sections Are defined. With such a design, with which a gimbal connection of the optical element to the support structure is ultimately achieved, it is possible to achieve a comparatively large heat transfer cross section with a comparatively low bending moment of resistance around the tilting axis (thanks to comparatively small dimensions) by appropriately dimensioning the respective solid-state joint section along the tilting axis transverse to the tilt axis).

It is advantageous here that the installation space, which is defined by a projection of the outer contour of the optical element along the longitudinal axis of the lever unit (and is also referred to below as the “enveloping space”), is largely for the in a direction transverse to the longitudinal axis of the lever unit respective solid-body joint section can be utilized (which can therefore be made comparatively long) without projecting laterally beyond the projection of the outer contour of the optical element, and therefore the enveloping space. In the case of facet mirrors, for example, an advantageously dense packing of the facet elements within a facet mirror (with regard to low light loss through gaps between the facet elements) is possible, which is essentially limited or defined by the outer contour of the optical elements.

However, the height of the support device can be adjusted along the longitudinal axis of the lever unit are advantageously kept low, which not least results in advantageously short paths for the heat dissipation from the optical element to the support structure or cooling devices located there. This axially (here: along the longitudinal direction or longitudinal axis of the lever unit) compact design also enables a comparatively short lever unit in this longitudinal direction, which can be designed as a simple lever element. As a result, comparatively large tilting angles from the neutral position of the optical element (ie when the actuator device is inactive or in the neutral state) can be achieved with the transverse deflection of the lever unit, which is possible within the envelope space.

Furthermore, it can be particularly advantageous if at least the part of the support device that includes the solid-state joint sections is designed as a MEMS component. This is not least because MEMS manufacturing technologies can be used to realize particularly compact designs in which (compared to conventional precision engineering manufacturing technologies) the wall thicknesses can be better tailored to the opposing requirements for heat transfer and the bending moment of resistance, especially in the area of the solid-state joint sections .

According to one aspect, the invention therefore relates to an optical arrangement for an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), with an optical element, in particular a facet element, a passive support device and an actuator device, wherein the optical element has an optical surface. The support device is configured to support the optical element on a support structure. The support device comprises a tilting joint device which is configured to define at least a first tilting axis and a second tilting axis of the optical element with respect to the support structure, wherein the first tilting axis is inclined to the second tilting axis. The actuator device comprises a lever unit which has a first lever unit end, which is remote from the optical element, and a second lever unit end, which is adjacent to the optical element and is connected to the optical element, along a lever unit longitudinal axis. The actuator device further comprises an actuator unit, which is configured to actively introduce a first actuating movement into the first lever unit end transverse to the lever unit longitudinal axis, which causes a tilting of the optical element with respect to the support structure about the first tilting axis, and to actively introduce a second actuating movement, which is a Tilting of the optical element with respect to the support structure about the second tilt axis causes. The tilting joint device here has a first solid-state joint section and a second solid-state joint section, which are arranged kinematically in series along a support force flow between the support structure and the optical element, the first solid-state joint section defining the first tilting axis and the second solid-state joint section defining the second tilting axis.

The solid-state joint sections can in principle be designed in any suitable manner in order to define the desired tilt axis. The respective solid-state joint section can also be divided into several separate sections, which then jointly define the tilting axis in question. In advantageously simple variants, the first solid-body joint section and/or the second solid-body joint section has at least one bending section, the bending section defining the associated tilting axis and extending along the associated tilting axis. The bending section preferably has a reduced wall thickness compared to at least one of the sections of the tilting joint device, which directly adjoin the bending section transversely to the associated tilting axis, since this allows a dedicated tilting axis to be defined in a particularly simple manner. Furthermore, the bending section can be designed in the manner of a hinge joint or in the manner of a leaf spring, because this results in particularly easy-to-implement designs with a clearly defined tilt axis. If necessary, the bending section can also be realized from a combination of one or more hinge joints and one or more leaf springs. In preferred variants, the bending section is designed to be elongated along the associated tilting axis (i.e. has a longitudinal dimension that is significantly larger, preferably at least 25% to 50% larger, than the smallest transverse dimension), because this allows, as described, particularly favorable conditions with regard to heat transfer and Achieve bending resistance moment.

In certain preferred variants, the bending section has a bending section length along the associated tilting axis, while the bending section has a maximum bending section width in a bending section width direction in a plane that runs perpendicular to the associated tilting axis and in a bending section thickness direction that runs transversely to the bending section width direction has minimal bending section thickness. Particularly favorable configurations then result from variants in which the bending section width is 1% to 20%, preferably 2% to 15%, more preferably wise 4% to 10%, of the maximum bending section length. In certain advantageous variants with good utilization of space, the optical element has a maximum element transverse dimension transverse to the lever unit longitudinal axis and the double bending section length is 40% to 97%, preferably 60% to 95%, more preferably 80% to 95%, of the maximum element transverse dimension. It is preferred to achieve the largest possible ratio, i.e. to get as close as possible to the value of 100%. In variants with favorable conditions with regard to the bending moment of resistance, the minimum bending section thickness is 1% to 20%, preferably 1.5% to 10%, more preferably 2% to 5%, of the maximum bending section width. It is preferred to choose the bending section thickness as low as technically possible.

In certain variants, the bending section has a bending section length along the associated tilting axis, while the bending section has a maximum bending section width in a bending section width direction in a plane that runs perpendicular to the associated tilting axis and a minimum in a bending section thickness direction that runs transversely to the bending section width direction Has bending section thickness. Particularly favorable properties, especially with regard to high heat transfer and a low bending moment of resistance, result from the following variants (individually or in any combination). In certain variants, the bending section length is preferably 1 mm to 3 mm, preferably 1.25 mm to 2.75 mm, more preferably 1.5 mm to 2.5 mm. In certain variants, the maximum bending section width is preferably 20 μm to 400 μm, preferably 50 μm to 300 μm, more preferably 100 μm to 200 μm. In certain variants, the minimum bending section thickness is preferably 1 µm to 10 µm, preferably 2 µm to 8 µm, more preferably 3 µm to 5 µm.

The tilting axes can in principle be arranged in any spatial position relative to the lever unit, as long as the desired tilting of the optical element and its optical surface is achieved. Preferably, at least one of the first tilting axis and the second tilting axis intersects the lever unit, since this results in favorable force conditions and movement conditions in which a deflection of the lever unit in a specific direction can be clearly assigned to a tilting about a specific tilting axis, i.e. possibly none Tilting around the other tilting axis occurs. It is particularly favorable if at least one of the first tilt axis and the second tilt axis intersects the lever unit longitudinal axis.

In certain variants, at least one of the first tilt axis and the second tilt axis runs in a plane which, in an inactive initial state of the actuator device, is 75° to 90°, preferably 80° to 90°, more preferably 85° to 90°, to the lever unit longitudinal axis slopes. Particularly simple kinematics and consequently also a particularly compact design of the support device can be realized if this plane is inclined at least substantially by 90° to the lever unit's longitudinal axis.

Furthermore, particularly favorable movement conditions result if the first tilt axis and the second tilt axis are inclined to one another at a tilt axis angle, the tilt axis angle being 60° to 90°, preferably 75° to 90°, more preferably 85° to 90°.

A particularly compact design of the support device with a low overall height along the longitudinal axis of the lever unit can also be realized in variants in which the first tilt axis and the second tilt axis run at least essentially in a common tilt axis plane.

The support device can in principle have one or more separate support units, via which the optical element is supported on the support structure. The separate support units can in turn act in particular kinematically in parallel between the support structure and the optical element. In preferred, because particularly simple, variants of the kinematically serial arrangement of the solid-body joint sections, the support device has at least one support unit, the at least one support unit having a first interface section for connecting the at least one support unit along the support force flow between the support structure and the optical element in kinematic serial order to the support structure, at least a first part of the first solid-state joint section, a connecting section, at least a first part of the second solid-state joint section and a second interface section for connecting the at least one support unit to the optical element.

The position of the two tilting axes relative to one another can be defined in a particularly simple manner via the design of the connecting section. In certain variants, for example, the connecting section can connect the first part of the first solid-state joint section and the first part of the second solid-state joint section in such a way connect that the first tilt axis and the second tilt axis run at least essentially in a common tilt axis plane. This makes it easy to realize the low overall height or compact design of the support device described above.

In certain variants, the connecting section can be essentially V-shaped, with a first leg of the connecting section extending along the first tilting axis, in particular extending at least substantially parallel to the first tilting axis, and a second leg of the connecting section extending along the second tilting axis extends, in particular extends at least substantially parallel to the second tilt axis. This design has the special advantage that the free space between the legs of the connecting section can be used for the arrangement of further components, for example sensor components (for example to determine the tilting of the optical element).

As already mentioned, the respective solid-body joint section can be designed in the manner of a simple hinge joint, which is, for example, simply realized by a short and thin web (transverse to the relevant tilting axis). In certain variants, the first part of the first solid-state joint section is formed by a first leaf spring which defines a first leaf spring main plane of extension, while the first part of the second solid-state joint section is formed by a second leaf spring which defines a second leaf spring main plane of extension. With regard to good heat transfer, it can be advantageous if the first leaf spring is designed to be elongated along the first tilting axis and/or the second leaf spring is designed to be elongated along the second tilting axis.

The leaf spring main extension planes can in principle be aligned with one another in any way, as long as a sufficient inclination of the two tilting axes relative to one another is guaranteed. For example, in the inactive state of the actuator device, the two leaf spring main extension planes can each run parallel to the lever unit longitudinal axis (if necessary even contain it).

In certain variants, the first leaf spring main extension plane and the second leaf spring main extension plane are inclined to one another by a maximum of 5° to 15°, preferably a maximum of 3° to 10°, more preferably a maximum of 0.5° to 2°. In particular, the leaf spring main extension planes can run at least essentially parallel to one another, which then makes particularly compact designs, in particular designs with a low overall height (along the lever unit longitudinal axis), possible. This is particularly true when the first leaf spring main extension plane and the second leaf spring main extension plane run at least essentially in a common plane.

As already mentioned, it may be sufficient to simply provide a support unit between the support structure and the optical element. In certain variants, however, the support unit is a first support unit and the support device has at least one second support unit that is separate from the first support unit. The second support unit then forms (like the first support unit) along the support force flow between the support structure and the optical element in kinematic serial order a further first interface section for connecting the second support unit to the support structure, a second part of the first solid-body joint section, a further connection section second part of the second solid-state joint section and a further second interface section for connecting the second support unit to the optical element.

The second support unit can in principle have any suitable design that differs from the first support unit. For example, different dimensions can be provided in order to take into account asymmetrical mechanical and/or thermal loads that act on the optical element (for example, to achieve higher rigidity and/or higher heat dissipation in the area of one of the support units).

In certain variants, the second support unit is at least essentially identical to the first support unit, whereby uniformly distributed properties of the support can be achieved. In principle, the support units can act kinematically in series with one another. In preferred variants, however, the second support unit acts kinematically parallel to the first support unit between the support structure and the optical element. Furthermore, the second support unit can be arranged rotated along a circumferential direction of the support device relative to the first support unit, in particular can be arranged rotated by at least substantially 180°. This can also be used to realize uniformly distributed properties of the support.

In certain, particularly simply designed variants, the first support unit and the second support unit are arranged and configured in such a way that the first part and the second part of the first th solid-state joint section are aligned with one another along the first tilt axis and the first part and the second part of the second solid-state joint section are aligned with one another along the second tilt axis.

In certain variants, the support device has at least one first interface section and at least one second interface section: the at least one first interface section is configured for direct connection of the support device to the support structure or is configured for connection of the support device to the support structure via at least one first connection element of the support device. Analogously, the at least one second interface section is configured for direct connection of the support device to the optical element or is configured for connection of the support device to the optical element via at least one second connection element of the support device.

In certain variants in which the optical element has a maximum element transverse dimension transverse to the lever unit longitudinal axis and the support device has a maximum support device height dimension along the lever unit longitudinal axis, the maximum support device height dimension can then be 5% to 25%, preferably 8% to 20%, more preferably 10% up to 15% of the maximum element transverse dimension. This results in particularly compact designs with a comparatively low overall height of the support device.

The mechanical connection of the support device to the optical element or the support structure or the lever unit can in principle be carried out in any suitable manner. Variants that are particularly easy to implement arise when the first connecting element is plate-shaped at least in the west and/or the second connecting element is plate-shaped at least in the west and/or the second connecting element is connected directly to the lever element. In particular, the plate-shaped connecting elements are also suitable for attaching additional components (for example sensor components or the like).

It goes without saying that the support device, the optical element and the lever unit can basically be constructed in a so-called differential construction, i.e. each made up of several separate components, which are connected to one another (alone or in any combination) in a cohesive, positive or non-positive manner. In preferred, particularly robust variants, the support device can be at least essentially monolithic. Likewise, the support device can be monolithically connected to an element body of the optical element. Likewise, the support device can be connected to the lever element directly or via the optical element, wherein the lever element can extend through a, in particular central, recess in the support device. It is particularly advantageous if the support device is at least partially, in particular essentially completely, designed and manufactured in the manner of a micro-electro-mechanical system (MEMS), since this allows a complex, compact and robust unit to be achieved in a simple manner with high precision can.

The actuator device can in principle be designed in any suitable manner, in particular generating the required force effect on the lever unit according to any suitable operating principles. The force effect is preferably achieved without contact. Particularly robust and easily controllable variants with precisely adjustable force effects result when the actuator device is designed in the manner of a magnetic actuator.

In certain advantageous variants because they are simply designed, the actuator device comprises a first magnet device, which is arranged on the lever unit in the area of the first lever unit end, and a second magnet device, which is functionally and spatially assigned to the first magnet device. The second magnet device is then configured to interact with the first magnet device in a non-contact manner in order to generate at least one of the first actuating movement and the second actuating movement. In certain variants, the actuator device comprises a first magnet device and a second magnet device, which are functionally and spatially assigned to one another, wherein at least one of the first magnet device and the second magnet device can be actively controlled in order to generate at least one of the first actuating movement and the second actuating movement . Particularly simple variants arise when the actuator device comprises a permanent magnet unit and an actively controllable electromagnet unit, which are functionally and spatially assigned to one another in order to generate, in particular without contact, at least one of the first actuating movement and the second actuating movement.

Designs with particularly favorable kinematics result when the first magnet device is arranged at the first lever unit end, the first lever unit end protruding along the lever unit longitudinal axis away from the optical element beyond the support device. Furthermore, it is advantageous if the first magnet device has at least one permanent magnet unit comprises, the magnetization direction of which runs in particular along the lever unit longitudinal axis, in particular at least substantially parallel to the lever unit longitudinal axis. This allows the desired force effect to be achieved transversely to the longitudinal axis of the lever unit in a particularly simple and sensitively metered manner.

With regard to the efficiency of force generation, it is particularly advantageous if the actuator device comprises a, in particular annular, magnetic yoke device which is arranged in the area of the first magnet device. This allows the magnetic losses during operation to be kept low. It is particularly advantageous if the actuator device comprises a magnetic yoke device which is arranged along the lever unit longitudinal axis between the first magnet device and the support device. The same applies if the actuator device comprises a magnetic yoke device, which is arranged such that the first magnet device is arranged along the lever unit longitudinal axis between the yoke device and the second magnet device.

The second magnet device can in principle be arranged in any suitable manner in order to achieve the desired force effect. The second magnet device is preferably arranged adjacent to the first end of the lever unit, since particularly compact designs with sufficient force can be achieved in a simple manner.

In principle, a single active magnet unit can be sufficient, the magnetic field of which is then superimposed on one or more passive magnet units in order to achieve the desired magnetic field distribution and thus the desired force effect. However, the second magnet device preferably comprises a plurality of M actively controllable magnet units, where M is in particular 2 to 16, preferably 2 to 8, more preferably 2 to 4.

In certain variants, the second magnet device comprises a plurality of M actively controllable magnet units, which in an inactive initial state of the actuator device are arranged distributed around the lever unit longitudinal axis, in particular are arranged at least substantially uniformly and / or in a ring shape around the lever unit longitudinal axis. This makes it possible to achieve a particularly sensitive adjustment of the desired magnetic field distribution in a particularly simple manner with a compact design. In this regard, it is also particularly advantageous if the second magnet device comprises a plurality of M actively controllable magnet units, the magnetization direction of which runs in particular along the longitudinal axis of the lever unit, in particular runs at least essentially parallel to the longitudinal axis of the lever unit.

A particularly simple control or adjustment of the force effect can be achieved if the second magnet device comprises at least one pair of magnet units made up of two actively controllable magnet units, which are assigned to one another in order to generate one of the first actuating movement and the second actuating movement.

Designs that are favorable in terms of efficiency or low magnetic losses can be achieved if the second magnet device comprises at least one actively controllable magnet unit with a coil unit, which is arranged in particular around a coil core. The coil core can protrude beyond the coil unit along the lever unit's longitudinal axis and can be connected to a pole shoe unit at an end facing the first magnet device and/or can be connected to a magnetic yoke unit at an end facing away from the first magnet device.

In particularly advantageous variants, the optical arrangement already integrates a sensor device for detecting the first actuating movement and the second actuating movement. The sensor device can in principle be constructed in any suitable manner in order to detect the first and second actuating movements. Well-known operating principles for detecting absolute or relative movements can be used for the detection (individually or in any combination) (for example optical, magnetic or electrical operating principles).

The sensor device preferably comprises a first sensor unit and a second sensor unit, which are functionally and spatially assigned to one another in such a way that during operation of the imaging device when the optical element is tilted by the actuator device, the second sensor unit is moved relative to the first sensor unit. This makes it possible to detect the tilting in a particularly simple manner.

In certain variants with particularly simple detection of the tilting, the sensor device comprises a first sensor unit and a functionally and spatially assigned second sensor unit, the first sensor unit being mechanically coupled to the support device or the actuator device in such a way that the first sensor unit is in operation of the imaging device when tilting the optical element through the actuator device with respect to the support structure at least is essentially fixed, and the second sensor unit is mechanically coupled to the optical element in such a way that the second sensor unit is moved together with the optical element by the actuator device during operation of the imaging device.

It is particularly advantageous if the sensor device comprises a first sensor unit and a functionally and spatially assigned second sensor unit, the first sensor unit being arranged on the support structure or a first connection element of the support device assigned to the support structure during operation of the imaging device, and the second sensor unit during operation of the Imaging device is arranged on the optical element or a second connection element of the support device assigned to the optical element. This makes it possible to achieve particularly compact designs with a high degree of functional integration.

In certain variants, the sensor device comprises a first sensor unit with at least one capacitive first sensor element and a second sensor unit with at least one capacitive second sensor element, wherein the second sensor element is functionally and spatially assigned to the first sensor element in order to at least one of the first actuating movement and the second actuating movement via a relative movement between the second sensor element and the first sensor element.

In principle, two sensor elements assigned to each other can be sufficient to detect the tilting about the relevant tilting axis. Preferably, the sensor device comprises a first sensor unit and a second sensor unit, wherein the first sensor unit comprises a plurality of N capacitive first sensor elements and the second sensor unit comprises a plurality of P capacitive second sensor elements. The first sensor elements can be assigned to the second sensor elements in particular in such a way that the first sensor elements and the second sensor elements engage with one another in a comb-like, contactless manner during operation of the imaging device when the optical element is tilted by the actuator device. This makes it easy to achieve particularly precise motion detection.

In certain variants, the sensor device comprises a first sensor unit and a second sensor unit, wherein the first sensor unit comprises a plurality of N rib-shaped capacitive first sensor elements and the second sensor unit comprises a plurality of P rib-shaped capacitive second sensor elements. The lever unit then defines a lever unit circumferential direction and a lever unit radial direction in a plane perpendicular to the lever unit longitudinal axis, the sensor elements extending in an inactive initial state of the actuator device along the lever unit circumferential direction, in particular in the manner of circular arc segments concentric to the lever unit longitudinal axis. Alternatively, in an inactive initial state of the actuator device, the sensor elements can extend along the lever unit radial direction, in particular expand radially with respect to the lever unit longitudinal axis. In both cases, particularly precise measurements can be achieved with a compact design.

The sensor device can basically be designed from any sensor components that have to be assembled separately. However, it is particularly advantageous if at least parts of the sensor system are integrated into at least parts of the support device during production. The support device is therefore preferably designed and manufactured at least in a MEMS part, but in particular essentially completely, in the manner of a micro-electro-mechanical system (MEMS), the MEMS part being configured in such a way that it is at least part of the sensor device forms, in particular forms at least part of a sensor of the sensor device.

In certain, particularly compact variants, the sensor device comprises at least one deformation-sensitive first sensor unit, which is assigned to the first solid-state joint section, and at least one deformation-sensitive second sensor unit, which is assigned to the second solid-state joint section. At least one of the deformation-sensitive sensor units can comprise a piezoelectric unit that is mechanically connected to the solid-state joint section, whereby particularly robust and reliable configurations can be achieved. It should be noted here that the term piezoelectric unit in the sense of the present application also includes in particular piezoresistive elements.

In certain, particularly robust and compact variants, at least one of the deformation-sensitive sensor units comprises a piezoelectric coating of the solid-state joint section. The solid-state joint section can comprise a leaf spring element and at least in part of the leaf spring element, in particular a free side surface of the leaf spring element, can be provided with a piezoelectric coating, in particular essentially completely provided with a piezoelectric coating.

In certain variants, a particularly compact configuration is achieved if the support device and the actuator device protrude laterally at most slightly beyond a (virtual) prismatic space, which is defined by a displacement of the optical element along the longitudinal axis of the lever unit (in the inactive initial state). In certain variants, a virtual projection of the optical element, which takes place in an inactive initial state of the actuator device along the lever unit's longitudinal axis onto a projection plane that runs perpendicular to the lever unit's longitudinal axis, defines a first projection contour, while a virtual projection of the support device along the lever unit's longitudinal axis onto the projection plane takes place, a second projection contour is defined, and a virtual projection of the actuator device, which takes place along the lever unit longitudinal axis onto the projection plane, defines a third projection contour. Preferably, the second projection contour and the third projection contour protrude beyond the first projection contour by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area of the first projection contour. Preferably, the second projection contour and the third projection contour lie at least substantially completely within the first projection contour. In particular, it is advantageous if the second projection contour and the third projection contour lie within the first projection contour at a distance from the first projection contour.

Particularly advantageous designs result when the optical surface has an area of 1 mm ² to 1000 mm ² , preferably 10 mm ² to 100 mm ² , more preferably 20 mm ² to 30 mm ² . The same applies if the optical surface has a maximum dimension of 1 mm to 30 mm, preferably 3 mm to 10 mm, more preferably 5 mm to 6 mm. The optical surface can basically be designed in any way, in particular can be curved in any way. In particularly simple designs, the optical surface is an at least essentially flat surface. The optical surface is preferably a reflective surface. However, refractive or diffractive optical surfaces can also be used. Furthermore, the optical surface can have any suitable outer contour. It is particularly advantageous if the optical surface has a polygonal outer contour, in particular a hexagonal outer contour, preferably an equilateral hexagonal outer contour.

The present invention further relates to an optical module, in particular a facet mirror, with at least two, in particular a plurality Q, optical arrangements according to the invention. The optical arrangements can be connected to a common support structure. Furthermore, the plurality Q can be 100 to 1,000,000, preferably 1,000 to 100,000, more preferably 5,000 to 10,000. Particularly compact designs with favorable power distribution and low light loss (due to gaps between the optical elements) result when the optical elements of at least two optical arrangements are arranged relative to one another to form a narrow gap, the gap having a gap width and the gap width in one mounted Condition is 1% to 10%, preferably 2% to 8%, more preferably 3% to 6%, of a maximum dimension of the optical surface.

The present invention further relates to an optical imaging device, in particular for microlithography, with an illumination device with a first optical element group, an object device for recording an object, a projection device with a second optical element group and an image device, wherein the illumination device is designed to illuminate the object and the projection device is designed to project an image of the object onto the image device. The lighting device and/or the projection device comprises at least one optical module according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

The present invention further relates to a method for supporting an optical element, in particular a facet element, of an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which the optical element, which has an optical surface, by means of a passive support device is supported on a support structure. The optical element is actively tilted via a lever unit by introducing a first actuating movement and a second actuating movement transversely to a lever unit longitudinal axis of the lever unit into a first lever unit end of the lever unit, which is distant from the optical element, while a second lever unit end of the lever unit is connected to the optical Element is connected. A tilting joint device of the support device defines at least a first tilting axis and a second tilting axis of the optical element with respect to the support structure, the first tilting axis being inclined to the second tilting axis. The first actuating movement causes the optical element to tilt with respect to the support structure about the first tilting axis, while the second adjusting movement causes the optical element to tilt with respect to the support structure about the second tilt axis. The tilt joint device has a first solid joint portion and a second solid joint portion, which are kinematically arranged in series along a support force flow between the support structure and the optical element, wherein the first solid joint portion defines the first tilt axis and the second solid joint portion defines the second tilt axis. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

Finally, the present invention relates to an optical imaging method, in particular for microlithography, in which an illumination device, which has a first optical element group, illuminates an object and a projection device, which has a second optical element group, projects an image of the object onto an image device. At least one optical element of the lighting device and/or the projection device is supported using a method according to the invention. This also allows the variants and advantages described above in connection with the optical arrangement to be realized to the same extent, so that reference is made to the above statements in order to avoid repetition.

Further aspects and exemplary embodiments of the invention result from the dependent claims and the following description of preferred exemplary embodiments, which refers to the attached figures. All combinations of the disclosed features, regardless of whether they are the subject of a claim or not, are within the scope of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

• 1 is a schematic representation of a preferred embodiment of a projection exposure system according to the invention, which includes a preferred embodiment of an optical arrangement according to the invention, in which a preferred embodiment of a connection arrangement according to the invention is used.
• 2 is a schematic sectional view of part of the arrangement according to the invention 1 .
• 3 is a schematic perspective view of the arrangement according to the invention 2 .
• 4 is a schematic sectional view of part of a variant of the optical arrangement 3 (along line IV-IV 3 ).
• 5 is a schematic perspective view of part of a further variant of the optical arrangement according to the invention.

DETAILED DESCRIPTION OF THE INVENTION

First embodiment

The following is with reference to the 1 until 4 a preferred embodiment of a projection exposure system 101 according to the invention for microlithography is described, which includes a preferred embodiment of an optical arrangement according to the invention. To simplify the following explanations, an x,y,z coordinate system is given in the drawings, with the z direction running parallel to the direction of the gravitational force. The x-direction and the y-direction are therefore horizontal, with the x-direction in the representation 1 runs vertically into the drawing plane. Of course, in further embodiments it is possible to choose any orientation that deviates from that of an x,y,z coordinate system.

Below we will initially refer to the 1 The essential components of a projection exposure system 101 are described as an example. The description of the basic structure of the projection exposure system 101 and its components is not intended to be restrictive.

A lighting device or a lighting system 102 of the projection exposure system 101 includes, in addition to a radiation source 102.1, an optical element group in the form of lighting optics 102.2 for illuminating an object field 103.1 (shown schematically). The object field 103.1 lies in an object plane 103.2 of an object device 103. A reticle 103.3 (also referred to as a mask) arranged in the object field 103.1 is illuminated. The reticle 103.3 is held by a reticle holder 103.4. The reticle holder 103.4 can be displaced in particular in one or more scanning directions via a reticle displacement drive 103.5. In the present example, such a scanning direction runs parallel to the y-axis.

The projection exposure system 101 further comprises a projection device 104 with a further optical element group in the form of projection optics 104.1. The projection optics 104.1 is used to image the object field 103.1 into a (schematized) image field 105.1, which lies in an image plane 105.2 of an image device 105. The image plane 105.2 runs parallel to the object plane 103.2. Alternatively, an angle other than 0° between the object plane 103.2 and the image plane 105.2 is also possible.

During exposure, a structure of the reticle 103.3 is imaged onto a light-sensitive layer of a substrate in the form of a wafer 105.3, the light-sensitive layer being arranged in the image plane 105.2 in the area of the image field 105.1. The wafer 105.3 is held by a substrate holder or wafer holder 105.4. The wafer holder 105.4 can be displaced in particular along the y direction via a wafer displacement drive 105.5. The displacement on the one hand of the reticle 103.3 via the reticle displacement drive 103.5 and on the other hand of the wafer 105.3 via the wafer displacement drive 105.5 can take place synchronized with one another. This synchronization can be done, for example, via a shared (in 1 Control device 106 (shown only very schematically and without control paths).

The radiation source 102.1 is an EUV radiation source (extreme ultraviolet radiation). The radiation source 102.1 emits in particular EUV radiation 107, which is also referred to below as useful radiation or illumination radiation. The useful radiation in particular has a wavelength in the range between 5 nm and 30 nm, in particular a wavelength of approximately 13 nm. The radiation source 102.1 can be a plasma source, for example an LPP source (Laser Produced Plasma, i.e. using a Laser generated plasma) or a DPP source (Gas Discharged Produced Plasma, i.e. plasma generated by gas discharge). It can also be a synchrotron-based radiation source. The radiation source 102.1 can also be a free electron laser (free electron laser, FEL).

Since the projection exposure system 101 works with useful light in the EUV range, the optical elements used are exclusively reflective optical elements. In further embodiments of the invention, it is of course also possible (particularly depending on the wavelength of the illuminating light) to use any type of optical element (refractive, reflective, diffractive) alone or in any combination for the optical elements.

The illumination radiation 107, which emanates from the radiation source 102.1, is focused by a collector 102.3. The collector 102.3 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces. The at least one reflection surface of the collector 102.3 can be exposed to the illumination radiation 107 in grazing incidence (Grazing Incidence, Gl), i.e. with angles of incidence greater than 45°, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45° become. The collector 11 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.

After the collector 102.3, the illumination radiation 107 propagates through an intermediate focus in an intermediate focus plane 107.1. In certain variants, the intermediate focus plane 107.1 can represent a separation between the illumination optics 102.2 and a radiation source module 102.4, which includes the radiation source 102.1 and the collector 102.3.

The illumination optics 102.2 includes a deflection mirror 102.5 along the beam path and a downstream first facet mirror 102.6. The deflection mirror 102.5 can be a flat deflection mirror or, alternatively, a mirror with an effect that influences the bundle beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 102.5 can be designed as a spectral filter, which at least partially separates out so-called false light from the illumination radiation 107, the wavelength of which deviates from the useful light wavelength. If the optically effective surfaces of the first facet mirror 102.6 are arranged in the area of a plane of the illumination optics 102.2, which is optically conjugate to the object plane 103.2 as a field plane, the first facet mirror 102.6 is also referred to as a field facet mirror. The first facet mirror 102.6 comprises a large number of individual first facets 102.7, which are also referred to below as field facets. These first facets and their optical surfaces are in the 1 only strongly indicated schematically by the dashed contour 102.7.

The first facets 102.7 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour. The first facets 102.7 can be designed as facets with a planar or alternatively with a convex or concave curved optical surface.

Like, for example, from the DE 10 2008 009 600 A1 (the entire disclosure of which is incorporated herein by reference), the first facets 102.7 themselves can also each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 102.6 can in particular be designed as a microelectromechanical system (MEMS system), as is the case, for example, in DE 10 2008 009 600 A1 is described in detail.

In the present example, the illumination radiation 107 runs horizontally between the collector 102.3 and the deflection mirror 102.5, i.e. along the y-direction. However, it is understood that a different orientation can also be selected for other variants.

A second facet mirror 102.8 is arranged downstream of the first facet mirror 102.6 in the beam path of the illumination optics 102.2. If the optically effective surfaces of the second facet mirror 102.8 are arranged in the area of a pupil plane of the illumination optics 102.2, the second facet mirror 102.8 is also referred to as a pupil facet mirror. The second facet mirror 102.8 can also be arranged at a distance from a pupil plane of the illumination optics 102.2. In this case, the combination of the first facet mirror 102.6 and the second facet mirror 102.8 is also referred to as a specular reflector. Such specular reflectors are known, for example, from US 2006/0132747 A1 , the EP 1 614 008 B1 or the US 6,573,978 (the entire disclosure of which is incorporated herein by reference).

The second facet mirror 102.8 in turn comprises a plurality of second facets, which are in the 1 are only strongly indicated schematically by the dashed contour 102.9. The second facets 102.9 are also referred to as pupil facets in the case of a pupil facet mirror. The second facets 102.9 can basically be designed like the first facets 102.7. In particular, the second facets 102.9 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal edges. Alternatively, the second facets 102.9 can be facets composed of micromirrors. The second facets 102.9 can in turn have planar or alternatively convex or concave curved reflection surfaces. In this regard, we refer again to the DE 10 2008 009 600 A1 referred.

In the present example, the lighting optics 102.2 thus forms a double-faceted system. This basic principle is also known as the fly's eye integrator. In certain variants, it can also be advantageous not to arrange the optical surfaces of the second facet mirror 102.8 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 104.1.

In a further, not shown, embodiment of the illumination optics 102.2, a transmission optics 102.10 (shown only in a highly schematic manner) can be arranged in the beam path between the second facet mirror 102.8 and the object field 103.1, which contributes in particular to the imaging of the first facets 102.7 into the object field 103.1. The transmission optics 102.10 can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 102.2. The transmission optics 102.10 can in particular include one or two mirrors for vertical incidence (NI mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GI mirror, grazing incidence mirror).

The lighting optics 102.2 has the design as shown in the 1 is shown, after the collector 102.3 exactly three mirrors, namely the deflection mirror 102.5, the first facet mirror 102.6 (e.g. a field facet mirror) and the second facet mirror 102.8 (e.g. a pupil facet mirror). In a further embodiment of the lighting optics 102.2, the deflection mirror 102.5 can also be omitted, so that the lighting optics 102.2 can then have exactly two mirrors after the collector 102.3, namely the first facet mirror 102.6 and the second facet mirror 102.8.

With the help of the second facet mirror 102.8, the individual first facets 102.7 are imaged into the object field 103.1. The second facet mirror 102.8 is the last beam-forming mirror or actually the last mirror for the illumination radiation 107 in the beam path in front of the object field 103.1. The image of the first facets 102.7 by means of the second facets 102.9 or with the second facets 102.9 and a transmission optics 102.10 into the object plane 103.2 is generally only an approximate image.

The projection optics 104.1 comprises a plurality of mirrors Mi, which are numbered according to their arrangement along the beam path of the projection exposure system 101. At the one in the 1 In the example shown, the projection optics 104.1 includes six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 can each have a passage opening (not shown) for the illumination radiation 107. In the present example, the projection optics 104.1 is a double-obscured optic. The projection optics 104.1 has an image-side numerical aperture NA that is greater than 0.5. In particular, the image-side numerical aperture NA can also be larger than 0.6. For example The image-side numerical aperture NA can be 0.7 or 0.75.

The reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape. The mirrors Mi, just like the mirrors of the lighting optics 102.2, can have highly reflective coatings for the lighting radiation 107. These coatings can be made up of several layers (multilayer coatings), in particular they can be designed with alternating layers of molybdenum and silicon.

In the present example, the projection optics 104.1 has a large object image offset in the y-direction between a y-coordinate of a center of the object field 103.1 and a y-coordinate of the center of the image field 105.1. This object-image offset in the y-direction can be approximately as large as a distance between the object plane 103.2 and the image plane 105.2 in the z-direction.

The projection optics 104.1 can in particular be anamorphic. In particular, it has different imaging scales βx, βy in the x and y directions. The two imaging scales βx, βy of the projection optics 104.1 are preferably (βx; βy) = (+/- 0.25; +/- 0.125). A positive image scale β means an image without image reversal. A negative sign for the image scale β means an image with image reversal. In the present example, the projection optics 104.1 thus leads to a reduction in the x-direction, i.e. in the direction perpendicular to the scanning direction, in a ratio of 4:1. In contrast, the projection optics 104.1 in the y direction, i.e. in the scanning direction, leads to a reduction in size in a ratio of 8:1. Other image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions are also possible, for example with absolute values of 0.125 or 0.25.

The number of intermediate image planes in the x and y directions in the beam path between the object field 103.1 and the image field 105.1 can be the same. Likewise, the number of intermediate image planes can be different depending on the design of the projection optics 104.1. Examples of projection optics with different numbers of such intermediate images in the x and y directions are, for example, from US 2018/0074303 A1 known (the entire disclosure of which is incorporated herein by reference).

In the present example, one of the pupil facets 102.9 is assigned to exactly one of the field facets 102.7 to form an illumination channel for illuminating the object field 103.1. This can in particular result in lighting based on Köhler's principle. The far field is broken down into a large number of object fields 103.1 using the field facets 102.7. The field facets 102.7 generate a plurality of images of the intermediate focus on the pupil facets 102.9 assigned to them.

The field facets 102.7 are each imaged onto the reticle 103.3 by an assigned pupil facet 102.9, with the images superimposing one another, so that there is an overlapping illumination of the object field 103.1. The illumination of the object field 103.1 is preferably as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by overlaying different lighting channels.

By arranging the pupil facets 102.9, the illumination of the entrance pupil of the projection optics 104.1 can be geometrically defined. By selecting the illumination channels, in particular the subset of the pupil facets 102.9 that carry light, the intensity distribution in the entrance pupil of the projection optics 104.1 can be adjusted. This intensity distribution is also referred to as the lighting setting of the lighting system 102. A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 102.2 can be achieved by redistributing the illumination channels. The aforementioned settings can be made for actively adjustable facets by appropriate control via the control device 106.

Further aspects and details of the illumination of the object field 103.1 and in particular the entrance pupil of the projection optics 104.1 are described below.

The projection optics 104.1 can in particular have a homocentric entrance pupil. This can be accessible or inaccessible. The entrance pupil of the projection optics 104.1 often cannot be illuminated precisely with the pupil facet mirror 102.8. When imaging the projection optics 104.1, which images the center of the pupil facet mirror 102.8 telecentrically onto the wafer 105.3, the aperture rays often do not intersect at a single point. However, an area can be found in which the pairwise distance of the aperture beams becomes minimal. This area represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.

In certain variants, it may be that the projection optics 104.1 has different positions of the entrance pupil for the tangential and sagittal beam paths.

In this case, it is preferred if an imaging optical element, in particular an optical component of the transmission optics 102.10, is provided between the second facet mirror 102.8 and the reticle 103.3. With the help of this imaging optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

When arranging the components of the lighting optics 102.2, as shown in the 1 is shown, the optical surfaces of the pupil facet mirror 102.8 are arranged in a surface conjugate to the entrance pupil of the projection optics 104.1. The first facet mirror 102.6 (field facet mirror) defines a first main extension plane of its optical surfaces, which in the present example is arranged tilted relative to the object plane 5. In the present example, this first main extension plane of the first facet mirror 102.6 is arranged tilted to a second main extension plane, which is defined by the optical surface of the deflection mirror 102.5. In the present example, the first main extension plane of the first facet mirror 102.6 is further arranged tilted to a third main extension plane, which is defined by the optical surfaces of the second facet mirror 102.8.

As shown below using the second facet mirror 102.8 and the 2 is explained, in the present example the facet mirror 102.8 (here a pupil facet mirror) is constructed as an optical module according to the invention, which comprises a large number of Q optical arrangements in the form of facet units 108, of which in 2 a facet unit 108 is shown. The facet units 108 are designed identically in the present example. In other variants, they can also be designed differently (individually or in groups).

The respective facet unit 108 comprises an optical element in the form of a (in 3 facet element 108.1 (illustrated transparently based on its edges), a passive support device 108.2 and an actuator device 108.3. The optical element 108.1 has a reflective optical surface 108.4, which is formed on a facet body 108.5. The facet body 108.5 can sit on a connecting element of the support device 108.2, which supports the facet body 108.5 over a large area, as shown in 2 is indicated by the dashed contour 109. In the present example, the facet body 108.5 and the connecting element 109 are formed by a common component, the optical surface 108.4 being formed by a reflective coating of this component 108.5, 109.

The support device 108.2 supports the optical element 108.1 on a support structure in the form of a carrier 110 of the facet mirror 102.8. The support device 108.2 includes a tilting joint device 108.6, which defines a first tilting axis 108.7 and a second tilting axis 108.8 of the optical element 108.1 with respect to the support structure 108.2, the first tilting axis 108.7 being inclined to the second tilting axis 108.8 (see 2 and 3 ).

The actuator device 108.3 comprises a lever unit 108.9, which has a first lever unit end 108.11 along a lever unit longitudinal axis 108.10, which is distant from the optical element 108.1, and a second lever unit end 108.12, which is adjacent to the optical element 108.1 and rigidly connected to the optical element 108.1 is.

The actuator device 108.3 further comprises an actuator unit 108.13, which is configured to actively introduce a first actuating movement into the first lever unit end 108.11 transversely to the lever unit longitudinal axis 108.10, which causes a tilting of the optical element 108.1 with respect to the support structure 110 about the first tilting axis 108.7 (like this in 2 indicated by the dash-two-dotted contour 111). Furthermore, the actuator unit 108.13 is configured to actively introduce a second actuating movement into the first lever unit end 108.11 transversely to the lever unit longitudinal axis 108.10, which causes a tilting of the optical element 108.1 with respect to the support structure 110 about the second tilting axis 108.8. Like this in particular 2 As can be seen, the lever unit longitudinal axis 108.10 coincides with a facet unit longitudinal axis 108.14 of the facet unit 108 in the (illustrated) inactive state of the actuator device 108.3.

In order to define the two tilt axes 108.7, 108.8, the tilt joint device 108.6 has a first solid-state joint section 108.15 and a second solid-state joint section 108.16, which are kinematically arranged in series with one another along a support force flow between the support structure 110 and the optical element 108.1. The first solid-state joint section 108.14 defines the first tilt axis 108.7, during which second solid joint section 108.15 defines the second tilt axis 108.8.

Through this design of the support device 108.2 as a passive component, which defines two kinematically serially arranged dedicated tilting axes 108.7, 108.8 via the two solid-state joint sections 108.14, 108.15, it is in particular possible, by means of correspondingly large dimensions of the respective solid-state joint section 108.14, 108.15 along the associated tilting axis 108.7, 108.8 to achieve a comparatively large heat transfer cross section with a comparatively low bending moment of resistance around the tilting axis 108.7, 108.8 (thanks to comparatively small dimensions transverse to the tilting axis). At the same time, an advantageously high level of heat dissipation is made possible without requiring excessively high tilting moments.

It is advantageous here that the prismatic envelope space (which is defined by a projection of the outer contour of the optical element 108.1 along the longitudinal axis of the lever unit, i.e. the lever unit longitudinal axis 108.10 or the facet unit longitudinal axis 108.14 of the facet unit 108) in a direction transverse to the longitudinal axis of the Lever unit 108.10 can largely be used for the respective solid-state joint section 108.14, 108.15 without protruding laterally beyond the enveloping space. The respective solid-body joint section 108.14, 108.15 can therefore be made comparatively long without projecting laterally beyond the enveloping space. On the one hand, this is advantageous in terms of low light loss through gaps between the facet elements 108, since a close or dense packing of the facet elements 108 within the facet mirror 102.8 is possible, which is essentially limited or defined only by the outer contour of the optical elements 108.1 is.

Along the lever unit longitudinal axis 108.10 or the facet unit longitudinal axis 108.14, the overall height of the support device 108.2 can, however, be advantageously kept low, which not least advantageously results in short paths for the heat dissipation from the optical element 108.1 to the support structure 110 or cooling devices located there (not shown). This axially (here: along the longitudinal direction or longitudinal axis of the lever unit) compact design also enables a comparatively short lever unit 108.9 in this longitudinal direction, which can be designed as a simple lever element. This allows comparatively large tilting angles from the (in 2 and 3 shown) neutral position of the optical element (ie with the actuator device 108.3 inactive or in the neutral state) can be achieved.

In the present example, a significant advantage is further achieved in that the part of the support device 108.2, which includes the solid-state joint sections 108.14, 108.15, is designed as a MEMS component. This is not least due to the fact that with the well-known MEMS manufacturing technologies, particularly compact designs can be realized in which (compared to conventional precision engineering manufacturing technologies) the wall thicknesses are better suited to the opposing requirements for heat transfer, especially in the area of the solid-state joint sections 108.14, 108.15 the bending moment of resistance can be adjusted.

The solid-body joint sections 108.14, 108.15 can in principle be designed in any suitable manner in order to define the respective tilt axis 108.7, 108.8. The respective solid-body joint section 108.14, 108.15 can also be divided into several separate sections, which then together define the relevant tilting axis 108.7, 108.8.

In the present example, the first solid-body joint section 108.14 and the second solid-body joint section 108.15 each have a bending section 108.16, which defines the associated tilt axis 108.7 or 108.8 and extends along the associated tilt axis 108.7 or 108.8. Like this in particular 3 As can be seen, the bending section 108.16 has a reduced wall thickness compared to the sections of the tilting joint device 108.6, which each directly adjoin the bending section 108.16 transversely to the assigned tilting axis 108.7 or 108.8, since this creates a dedicated tilting axis 108.7 or .108.8 can be defined.

The respective bending section 108.16 can, for example, be designed in the manner of a hinge joint or (as in the present example) in the manner of a leaf spring, because this results in particularly easy-to-implement designs with a clearly defined tilt axis 108.7 or 108.8. If necessary, the bending section 108.16 can also be realized from a combination of one or more hinge joints and one or more leaf springs. In the present example, the bending section is elongated along the associated tilting axis 108.7 or 108.8 (i.e. has a longitudinal dimension that is significantly larger than the smallest transverse dimension), because this makes it possible to achieve particularly favorable conditions with regard to heat transfer and bending moment of resistance, as described.

In the present example, the bending section 108.16 has a bending section length BL along the associated tilting axis 108.7 or 108.8, while the bending section has a maximum bending section width BW in a bending section width direction in a plane that runs perpendicular to the associated tilting axis 108.7 or 108.8 and in a Bending section thickness direction, which is transverse to the bending section width direction, has a minimum bending section thickness BT. Particularly favorable configurations then result from variants in which the bending section width BL is 1% to 20%, preferably 2% to 15%, more preferably 4% to 10%, of the maximum bending section length BW. In certain advantageous variants with good utilization of space, the optical element 108.1 has a maximum element transverse dimension EW transverse to the lever unit longitudinal axis and the double bending section length BL is 40% to 97%, preferably 60% to 95%, more preferably 80% to 95%, of the maximum Element transverse dimension EW. It is preferred to achieve the largest possible ratio, i.e. to get as close as possible to the value of 100%. It is understood that in certain variants with only one bending section 108.16 per tilting axis 108.7 or 108.8, the above-mentioned values can then apply to the ratio of the simple bending section length BL to the maximum element transverse dimension EW. In variants with favorable conditions with regard to the bending moment of resistance, the minimum bending section thickness BT is 1% to 20%, preferably 1.5% to 10%, more preferably 2% to 5%, of the maximum bending section width BW.

Particularly favorable properties, especially with regard to high heat transfer and a low bending moment of resistance, result from the following variants (individually or in any combination). In certain variants, the bending section length BL is preferably 1 mm to 3 mm, preferably 1.25 mm to 2.75 mm, more preferably 1.5 mm to 2.5 mm. In certain variants, the maximum bending section width BW is preferably 20 μm to 400 μm, preferably 50 μm to 300 μm, more preferably 100 μm to 200 μm. In certain variants, the minimum bending section thickness BT is preferably 1 μm to 10 μm, preferably 2 μm to 8 μm, more preferably 3 μm to 5 μm.

The tilt axes 108.7 and 108.8 can in principle be arranged in any spatial position relative to the lever unit 108.9, as long as the desired tilting of the optical element 108.1 and its optical surface 108.4 is achieved. In the present example, the first tilt axis 108.7 and the second tilt axis 108.8 each intersect the lever unit 108.9, since this results in favorable force conditions and movement conditions in which a deflection of the lever unit 108.9 in a specific direction is clearly associated with a tilt about a specific tilt axis 108.7 or 108.8 can be so that there may be no tilting about the other tilting axis. It is particularly advantageous here that the first tilt axis 108.7 and the second tilt axis 108.8 intersect the lever unit longitudinal axis 108.10.

The first tilt axis 108.7 and the second tilt axis 108.8 each run in a plane that is inclined to the lever unit longitudinal axis in an inactive initial state of the actuator device. The first tilt axis 108.7 and the second tilt axis 108.8 can each be inclined by 75° to 90°, preferably 80° to 90°, more preferably 85° to 90°, to the lever unit longitudinal axis. Particularly simple kinematics and consequently also a particularly compact design of the support device can be realized if, as in the present example, this plane is inclined at least substantially by 90° to the lever unit longitudinal axis 108.10.

Furthermore, particularly favorable movement conditions, clearly assigned to a specific deflection of the lever unit 108.9, arise when the first tilt axis and the second tilt axis are inclined to one another at a tilt axis angle, the tilt axis angle being 60° to 90°, preferably 75° to 90°, more preferably 85 ° to 90°. In the present example, with a tilt axis angle of 90°, a transverse deflection of the first end 108.11 of the lever unit 108.9 in the x direction exclusively produces a tilt about the first tilt axis 108.7, while a transverse deflection of the first end 108.11 of the lever unit 108.9 in the y direction exclusively a tilt about the second tilt axis 108.8 is generated.

A particularly compact design of the support device 108.2 with a low overall height along the lever unit longitudinal axis 108.10 or the facet unit longitudinal axis 108.14 can be realized in variants in which, as in the present example, the first tilt axis 108.7 and the second tilt axis 108.8 run at least essentially in a common tilt axis plane.

In the present example, a first part (namely the leaf spring 108.16) of the first solid-state joint section 108.14 and a first part (namely the leaf spring 108.16) of the second solid-state joint section 108.15 are formed on a first support unit 108.17 of the support device 108.2. The first support unit 108.17 points along the support force flow between the support structure 110 and the optical element 108.1 in kinematic serial order a first interface section 108.18, the first part 108.16 of the first solid-state joint section 108.14, a connecting section 108.19, the first part 108.16 of the second solid-state joint section 108.15 and a second interface section 108.20. The first interface section 108.18 serves to connect the first support unit 108.17 to the support structure 110, while the second interface section 108.20 serves to connect the first support unit 108.17 to the optical element 108.1.

It goes without saying that, in principle, a single support unit 108.17 can be sufficient to support the optical element 108.1 on the support structure 110. However, several separate support units 108.17 are preferably provided, which act kinematically in parallel between the support structure 110 and the optical element 108.1, since this allows a more uniform and advantageously stiffer support of the optical element 108.1 to be achieved along the lever unit longitudinal axis 108.10 or facet unit longitudinal axis 108.10. In the present example, a separate second support unit 108.21 is also provided, as will be described in more detail below.

The position of the two tilt axes 108.7, 108.8 relative to one another can be defined in a particularly simple manner via the design of the connecting section 108.19. As already described, the connecting section in the present example connects the first part 108.16 of the first solid-body joint section 108.14 and the first part 108.16 of the second solid-body joint section 108.15 such that the first tilt axis 108.7 and the second tilt axis 108.8 run at least essentially in a common tilt axis plane. This makes it easy to realize the low overall height or compact design of the support device 108.2 described above.

The connecting section 108.19 could basically have any design between the first parts 108.16 of the solid-state joint sections 108.14, 108.15. For example, it could be designed in the shape of a plate and essentially completely fill the space available within the enveloping space in the area of the tilting axis plane. In the present example, the connecting section is essentially V-shaped. A first leg 108.22 of the connecting section 108.19 extends along the first tilt axis 108.7, extending at least essentially parallel to the first tilt axis 108.7. The second leg 108.23 of the connecting section 108.19 extends along the second tilt axis 108.8, extending at least substantially parallel to the second tilt axis 108.8. This design has the special advantage that the free space between the two legs of the connecting section 108.19 can be used for the arrangement of further components. For example, in this area (as follows below using the 4 is explained) sensor components are arranged, which serve, for example, to determine the tilting of the optical element 108.1.

As already mentioned, the respective solid-body joint section 108.14. 108.15 can be designed in the manner of a simple hinge joint, which is, for example, simply realized by a short and thin web (transverse to the relevant tilt axis 108.7, 108.8).

In the present example, however, the first part of the first solid-state joint section 108.14 is formed, as described, by a first leaf spring 108.16, which defines a first leaf spring main plane of extension, while the first part of the second solid-state joint section 108.15 is formed, as described, by a second leaf spring 108.16, which defines a second leaf spring main plane of extension . With regard to good heat transfer through the respective solid-state joint section 108.14, 108.15, it is advantageous that the first leaf spring 108.16 is designed to be elongated along the first tilt axis 108.7 and the second leaf spring 108.16 is designed to be elongated along the second tilt axis 108.8.

The leaf spring main extension planes could in principle be aligned with one another in any way, as long as a sufficient inclination of the two tilting axes 108.7, 108.8 relative to one another is guaranteed. For example, in the inactive state of the actuator device 108.3, the two leaf spring main extension planes can each run parallel to the lever unit longitudinal axis 108.10 (possibly even including this, as will be explained below with reference to 5 is described).

In certain variants, the first leaf spring main extension plane and the second leaf spring main extension plane are inclined to one another by a maximum of 5° to 15°, preferably a maximum of 3° to 10°, more preferably a maximum of 0.5° to 2°. In the present example, the leaf spring main extension planes run at least essentially parallel to one another. The leaf spring main extension planes could in principle also be arranged offset from one another along the lever unit longitudinal axis 108.10. In the present example, however, the first leaf spring main extension plane and the second leaf spring main extension plane run at least essentially in a common plane, which means Then, as described, a particularly compact design with a low overall height (along the lever unit longitudinal axis 108.10) can be achieved.

As already mentioned, it may be sufficient to simply provide a first support unit 108.17 between the support structure 110 and the optical element 108.1. In the present example, however, a second support unit 108.21 that is separate from the first support unit 108.17 is provided. The second support unit 108.21 then forms (like the first support unit 108.17) along the support force flow between the support structure 110 and the optical element 108.1 in kinematic serial order a further first interface section 108.18 (for connecting the second support unit 108.21 to the support structure 110), a second part 108.16 of the first solid-state joint section 108.14, a further connecting section 108.19, a second part 108.16 of the second solid-state joint section 108.8 and a further second interface section 108.20 (for connecting the second support unit 108.21 to the optical element 108.1).

The second support unit 108.21 can in principle have any suitable design that differs from the first support unit 108.17. For example, different dimensions can be provided in order to take into account asymmetrical mechanical and/or thermal loads that act on the optical element 108.1 (i.e., for example, to achieve higher rigidity and/or higher heat dissipation in the area of one of the support units 108.17, 108.21) .

In the present example, the second support unit 108.21 is at least essentially identical to the first support unit 108.17, whereby uniformly distributed properties of the support are realized. The second support unit 108.21 acts kinematically parallel to the first support unit 108.17 between the support structure 110 and the optical element 108.1, with the second support unit 108.21 being arranged rotated along a circumferential direction of the support device 108.2 relative to the first support unit 108.17. The angle of rotation is at least essentially 180°, which means that uniformly distributed properties of the support are achieved.

Like this in particular 3 As can be seen, the first support unit 108.17 and the second support unit 108.21 are arranged and configured such that the first part 108.16 and the second part 108.16 of the first solid-state joint section 108.14 are aligned with one another along the first tilt axis 108.7, as are the first part 108.16 and the second part 108.16 of the second solid joint section 108.15 are aligned with one another along the second tilt axis 108.8.

In certain variants, the respective first interface section 108.18 can be designed for direct connection to the support device 110. In the present example, however, the respective first interface section 108.18 is connected to the support device 110 via a first connection element 108.24. Likewise, the respective second interface section 108.20 can be configured for direct connection of the support device 108.2 to the optical element 108.1 or for connection of the support device to the optical element 108.1 via a second connection element 109 of the support device 108.2. In the present example, the element body 108.5 of the optical element 108.1 and the second connecting element 109 are designed monolithically (i.e. in one piece) as described, so that ultimately both apply.

As already stated, with the design options described herein, an advantageously low overall height of the support device 108.2 can be achieved along the lever unit longitudinal axis 108.10 or the facet unit longitudinal axis 108.14. The support device 108.2 then has a maximum support device height dimension SH, the maximum support device height dimension SH then preferably being 5% to 25%, preferably 8% to 20%, more preferably 10% to 15%, of the maximum element transverse dimension EW. This results in particularly compact designs with a comparatively low overall height SH of the support device 108.2.

The mechanical connection of the support device 108.2 to the optical element 108.1 or the support structure 110 or the lever unit 108.9 can in principle be carried out in any suitable manner. Variants that are particularly easy to implement result when the first connecting element 108.24 is plate-shaped, at least in the west, as in the present example. The same applies if the second connection element 109 (as ultimately in the present example) is plate-shaped, at least in the west. The second connection element 109 is preferably connected directly to the lever element 108.9. Such plate-shaped connecting elements 108.24, 109 are particularly suitable for attaching additional components (for example sensor components or the like).

As already mentioned, the support device 108.2, the optical element 108.1 and the lever unit 108.9 can basically be constructed in a so-called differential design, i.e. each can be constructed from several separate components which (alone or in any combination) are cohesive can be connected to one another in a sig, positive or non-positive manner. In the present example, a particularly robust design is achieved in that the support device 108.2 is at least essentially monolithic. The support device 108.2 is also monolithically connected or formed with an element body 108.5 of the optical element. Likewise, the support device 108.2 can be connected to the lever element 108.9 directly or via the optical element 108.1. The lever unit or the lever element 108.9 can then extend, as in the present example, through a central recess 108.25 of the support device 108.2.

It is particularly advantageous if the support device 108.2 is designed and manufactured at least partially, in particular (as in the present example) but essentially completely, in the manner of a micro-electro-mechanical system (MEMS). This allows the support device 108.2 to be designed in a simple manner with high precision as a geometrically complex, compact and yet robust unit.

The actuator device 108.3 can basically be designed in any suitable way for actively tilting the optical element 108.1. In particular, the actuator device 108.3 can generate the required force on the lever unit 108.9 according to any suitable operating principles. The force effect is preferably achieved without contact, as in the present example. In the present example, a particularly robust and easily controllable design with a precisely adjustable force effect is realized in that the actuator device 108.3 is designed in the manner of a magnetic actuator.

For this purpose, the actuator device 108.3 in the present example comprises a first magnet device 108.26, which is arranged in the area of the first lever unit end 108.11 on the lever unit 108.9. The actuator unit 108.13 is then designed as a second magnet device, which is functionally and spatially assigned to the first magnet device 108.26. The second magnet device 108.13 interacts in a well-known manner with the first magnet device 108.26 without contact in order to generate the first and second actuating movements. The second magnetic device 108.13 can be actively controlled (by a control device, not shown) in order to generate the first and second actuating movements. In the present example, a particularly simple design is realized in that the magnet device 108.26 is designed as a permanent magnet unit and the second magnet device 108.13 is designed as an actively controllable electromagnet unit.

In the present example, particularly favorable kinematics are achieved by arranging the first magnet device 108.26 at the first lever unit end 108.11, which protrudes beyond the support device 108.2 along the lever unit longitudinal axis 108.10 away from the optical element 108.1. The magnetization direction of the first magnet device 108.26 runs along the lever unit longitudinal axis 108.10 (here: at least essentially parallel to the lever unit longitudinal axis 108.10). This allows the desired force effect to be achieved transversely to the lever unit longitudinal axis 108.10 in a particularly simple and sensitively metered manner.

With regard to the efficiency of force generation, it is particularly advantageous if the actuator device 108.3 comprises an annular magnetic yoke device 108.27 which is arranged in the area of the first magnet device 108.26, namely along the lever unit longitudinal axis 108.10 between the first magnet device 108.26 and the support device 108.2, so that the first Magnet device 108.26 is arranged along the lever unit longitudinal axis 108.10 between the yoke device 108.27 and the second magnet device 108.13.

The second magnet device 108.13 can in principle be arranged in any suitable manner in order to achieve the desired force effect. Preferably, the second magnet device 108.13 is arranged adjacent to the first lever unit end 108.11, as in the present example, since particularly compact designs with sufficient force can be achieved in a simple manner.

In principle, a single active magnet unit 108.28 can be sufficient, the magnetic field of which is then superimposed on one or more passive magnet units in order to achieve the desired magnetic field distribution and thus the desired force effect. However, the second magnet device 108.13 preferably comprises a plurality of M actively controllable magnet units 108.28, where M is in particular 2 to 16, preferably 2 to 8, more preferably 2 to 4. In the present example, four actively controllable magnet units 108.28 are provided.

In the inactive initial state of the actuator device 108.3, the actively controllable magnet units 108.28 are arranged at least substantially uniformly and in a ring shape around the lever unit longitudinal axis 108.10. This makes it possible to achieve a particularly sensitive adjustment of the desired magnetic field distribution in a particularly simple manner with a compact design. It is particularly advantageous in this regard also that the magnetization direction of the magnet units 108.28 runs along the lever unit longitudinal axis 108.10, wherein in the inactive initial state of the actuator device 108.3 it runs at least essentially parallel to the lever unit longitudinal axis 108.10.

A particularly simple control or adjustment of the force effect is achieved in the present example in that the two magnet units 108.28, which are diametrically opposite one another with respect to the lever unit longitudinal axis 108.10, form a pair of magnet units and are assigned to one another in order to generate the first actuating movement or the second actuating movement.

Designs that are favorable in terms of efficiency or low magnetic losses can be achieved if the respective actively controllable magnet unit 108.28, as in the present example, comprises a coil unit 108.29 which is arranged around a coil core 108.30. The coil core 108.30 protrudes beyond the coil unit 108.29 along the lever unit longitudinal axis 108.10 and can be connected to a pole shoe unit 108.31 at an end facing the first magnet device 108.26, while it can be connected to a magnetic yoke unit 108.32 at an end facing away from the first magnet device 108.26.

In the present example, the facet unit 108 already integrates a sensor device 108.33 for detecting the first positioning movement and the second positioning movement. The sensor device 108.33 can in principle be constructed in any suitable manner in order to detect the first and second actuating movements. Well-known operating principles for detecting absolute or relative movements can be used for the detection (individually or in any combination) (for example optical, magnetic or electrical operating principles).

In the present example, the sensor device 108.33 comprises a first sensor unit 108.34 and a second sensor unit 108.35, which are functionally and spatially assigned to one another in such a way that during operation of the imaging device 101 when the optical element 108.1 is tilted by the actuator device 108.3, the second sensor unit 108.35 relative to the first Sensor unit 108.34 is moved. This makes it possible to detect the tilting in a particularly simple manner.

For this purpose, the first sensor unit is mechanically coupled to the support device 108.2 in such a way that the first sensor unit 108.34 is at least essentially fixed during operation of the imaging device 101 when the optical element 108.1 is tilted with respect to the support structure 110, while the second sensor unit 108.35 is mechanically connected to the optical element 108.1 is coupled in that the second sensor unit 108.25 is moved together with the optical element 108.1 by the actuator device 108.3 during operation of the imaging device 101. For this purpose, in the present example, the first sensor unit is arranged on the first connection element 108.24, while the second sensor unit 108.35 is arranged on the optical element 108.1 or the second connection element 109. This makes it possible to achieve particularly compact designs with a high degree of functional integration.

In the present example, the first sensor unit 108.34 comprises a plurality of capacitive first sensor elements and the second sensor unit 108.35 comprises a plurality of capacitive second sensor elements, the second sensor elements being functionally and spatially assigned to the first sensor elements in order to carry out the first actuating movement and the second actuating movement via a relative movement between the first and second sensor elements via a corresponding electrical connection of the first and second sensor elements.

In principle, two sensor elements assigned to each other can be sufficient to detect the tilting about the relevant tilting axis 108.7, 108.8. Preferably, the first sensor unit 108.34 comprises a plurality of N capacitive first sensor elements and the second sensor unit 108.35 comprises a plurality of P capacitive second sensor elements. In this case, the first sensor elements can be assigned to the second sensor elements in particular in such a way that the first sensor elements and the second sensor elements engage with one another in a comb-like, non-contact manner during operation of the imaging device when the optical element is tilted by the actuator device, as in the present example. This makes it easy to achieve particularly precise motion detection.

In the present example, the first sensor unit 108.34 comprises a plurality of N rib-shaped capacitive first sensor elements, while the second sensor unit 108.35 comprises a plurality of P rib-shaped capacitive second sensor elements. In an inactive initial state of the actuator device 108.3, the sensor elements extend along the lever unit circumferential direction in the manner of circular arc segments concentric to the lever unit longitudinal axis 108.10.

Alternatively, the sensor elements can be in an inactive initial state of the actuator device 108.3 along the lever unit radial direction direction, whereby they can expand in a radial manner, in particular with respect to the lever unit's longitudinal axis, as shown in 4 is shown. There, the rib-shaped capacitive sensor elements of the first sensor unit 108.34 and the second sensor unit 108.35 are arranged alternately along the circumferential direction of the lever unit. In both cases (concentric arrangement, radial arrangement), particularly precise measurements can be achieved with a compact design.

The sensor device 108.33 can in principle be designed from any sensor components that must be mounted separately. However, it is particularly advantageous if at least parts of the sensor system are integrated into at least parts of the support device 108.2 during production. In the present example, the support device 108.2, designed as a MEMS component, is configured such that it also forms at least part of the sensor device 108.33, namely at least the rib-shaped capacitive sensor elements of the first sensor unit 108.34 and the second sensor unit 108.35 and preferably also at least parts of their electrical circuitry.

In certain, particularly compact variants, the sensor device 108.33 can additionally or alternatively also comprise at least one deformation-sensitive first sensor unit, which is assigned to the first solid-state joint section 108.14, and at least one deformation-sensitive second sensor unit, which is assigned to the second solid-state joint section 108.15. At least one of these deformation-sensitive sensor units can comprise a piezoelectric unit that is mechanically connected to the solid-state joint section 108.14 or 108.15, whereby particularly robust and reliable configurations can be achieved.

In certain, particularly robust and compact variants, at least one of the deformation-sensitive sensor units comprises a piezoelectric coating of the relevant solid-state joint section 108.14, 108.15. At least part of the leaf spring element 108.16 of the solid joint sections 108.14, 108.15 can be provided with a piezoelectric coating. Part of one or both of the free side surfaces (possibly also essentially the entire free side surface) of the leaf spring element 108.16 can be provided with a piezoelectric coating. The piezoelectric coating is of course arranged in such a way that when the optical element 108.1 is tilted, it is subjected to a corresponding expansion, which causes a corresponding measurement signal. The piezoelectric coating can be provided on one or more of the leaf spring elements 108.6 (in particular all leaf spring elements 108.6) of the solid-state joint sections 108.14, 108.15.

In the present example, a particularly compact configuration is achieved in that the support device and the actuator device 108.3 protrude laterally at most slightly beyond a (virtual) prismatic space (the envelope space), which is created by a displacement of the optical element 108.1 along the lever unit longitudinal axis 108.10 (in the inactive initial state). is defined.

In certain variants, a virtual projection of the optical element 108.1, which takes place in an inactive initial state of the actuator device 108.3 along the lever unit longitudinal axis 108.10 onto a projection plane that runs perpendicular to the lever unit longitudinal axis 108.10, defines a first projection contour, while a virtual projection of the support device 108.2 along the lever unit longitudinal axis 108.10 takes place on the projection plane, a second projection contour is defined, and a virtual projection of the actuator device 108.3, which takes place along the lever unit longitudinal axis 108.10 onto the projection plane, defines a third projection contour. In preferred variants, the second projection contour and the third projection contour protrude beyond the first projection contour by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area of the first projection contour. Preferably, as in the present example, the second projection contour and the third projection contour lie at least substantially completely within the first projection contour. In particular, it is advantageous if the second projection contour and the third projection contour lie within the first projection contour at a distance from the first projection contour.

Particularly advantageous designs result when the optical surface 108.4 has an area of 1 mm ² to 1000 mm ² , preferably 10 mm ² to 100 mm ² , more preferably 20 mm ² to 30 mm ² . The same applies if the optical surface 108.4 has a maximum dimension of 1 mm to 30 mm, preferably 3 mm to 10 mm, more preferably 5 mm to 6 mm. The optical surface 108.4 can basically be designed in any way, in particular can be curved in any way. In particularly simple designs, the optical surface 108.4 is an at least essentially flat surface. The optical surface 108.4 is preferably a reflective surface. However, refractive or diffractive optical surfaces can also be used. Furthermore, the optical surface 108.4 can have any suitable outer contour. It is particularly advantageous if the optical surface 108.4 is as in the present example has a polygonal outer contour, in particular a hexagonal outer contour, preferably an equilateral hexagonal outer contour as in the present example.

The pupil facet mirror 102.8 can contain a plurality Q of facet units 108. All facet units 108 can be connected to a common support structure 110. Furthermore, the plurality Q can be 100 to 1,000,000, preferably 1,000 to 100,000, more preferably 5,000 to 10,000. Particularly compact designs with favorable power distribution and low light loss (due to gaps between the optical elements) result when the optical elements 108.1 of at least two facet units 108 are arranged relative to one another to form a narrow gap, the gap having a gap width and the gap width in one assembled state is 1% to 10%, preferably 2% to 8%, more preferably 3% to 6%, a maximum dimension of the optical surface 108.4.

It is understood that the methods according to the invention can be carried out with the facet mirror 102.8 described above, so that reference is made to the above statements in this respect.

Second embodiment

The following is with reference to the 1 , 2 , 3 and 5 A further preferred embodiment of the arrangement according to the invention is described in the form of a facet unit 208, which instead of the facet unit 108 in the imaging device 101 of 1 can be used. The facet unit 208 corresponds to the facet unit 108 in its basic design and functionality 2 , so only the differences will be discussed here. In particular, identical components are provided with identical reference numbers, while similar components are provided with reference numbers increased by the value 100. Unless otherwise stated below, reference is made to the above statements in connection with the first exemplary embodiment with regard to the features, functions and advantages of these components.

A difference from the first exemplary embodiment is that the support device 208.2 (possibly again designed as a MEMS component) in the present example is designed such that the respective tilt axis 208.7 or 208.8 are realized by first and second solid-state joint sections 208.14 and 208.15, respectively which in turn use bending sections in the form of leaf springs 208.16. As was already mentioned above as an option, in the present example the two leaf spring main extension planes in the inactive state of the actuator device 108.3 each run parallel to the lever unit longitudinal axis 108.10 and even contain the lever unit longitudinal axis 108.10.

The connecting section 208.19 between the first and second solid joint sections 208.14, 208.15 is realized in this case as a simple annular plate. The same applies to the first connection element 208.24 and the second connection element 209, onto which in the present example a separate optical element body of the optical element 108.1 is placed and secured accordingly.

Furthermore, the design of the respective facet unit 208, especially the design of the actuator device 108.3, can be designed identically to the facet unit 108 of the first exemplary embodiment, so that reference is made to the above statements in this respect.

The present invention has been described above exclusively using examples from the field of microlithography. However, it is understood that the invention can also be used in connection with any other optical applications, in particular imaging methods at other wavelengths, in which similar problems arise with regard to the tilting adjustment of components in a small installation space.

Furthermore, the invention can be used in connection with the inspection of objects, such as so-called mask inspection, in which the masks used for microlithography are examined for their integrity, etc. Wafer 105.1 is then replaced by 1 for example, a sensor unit that captures the image of the projection pattern of the reticle 104.1 (for further processing). This mask inspection can then take place at essentially the same wavelength that is used in the later microlithography process. However, any wavelengths that deviate from this can also be used for the inspection.

The present invention was finally described above using concrete exemplary embodiments, which show concrete combinations of the features defined in the following patent claims. It should be expressly pointed out at this point that the subject matter of the present invention is not limited to these combinations of features, but also all of them other combinations of features, as resulting from the following patent claims, are part of the subject matter of the present invention.

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

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• US 20060132747 A1 [0078]
• EP 1614008 B1 [0078]
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• US 20180074303 A1 [0088]

Claims (22)

Optical arrangement for an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), with - an optical element (108.1), in particular a facet element, - a passive support device (108.2; 208.2) and - an actuator device (108.3), wherein - the optical element (108.1) has an optical surface, - the support device (108.2; 208.2) is configured to support the optical element (108.1) on a support structure (110), - the support device (108.2; 208.2 ) comprises a tilting joint device (108.6) which is configured to define at least a first tilting axis (108.7; 208.7) and a second tilting axis (108.8; 208.8) of the optical element (108.1) with respect to the support structure (110), wherein the first tilting axis (108.7; 208.7) is inclined to the second tilt axis (108.8; 208.8), - the actuator device (108.3) comprises a lever unit (108.9) which has a first lever unit end (108.11) along a lever unit longitudinal axis (108.10), which is separated from the optical element (108.1) is removed, and has a second lever unit end which is adjacent to the optical element (108.1) and is connected to the optical element (108.1), - the actuator device (108.3) comprises an actuator unit (108.13) which is configured to do so, to actively introduce a first actuating movement into the first lever unit end (108.11) transversely to the lever unit's longitudinal axis (108.10), which causes a tilting of the optical element (108.1) with respect to the support structure (110) about the first tilting axis (108.7; 208.7), and to actively introduce a second actuating movement, which causes a tilting of the optical element (108.1) with respect to the support structure (110) about the second tilt axis (108.8; 208.8), characterized in that - the tilting joint device (108.6) has a first solid-state joint section (108.14; 208.14) and a second solid-state joint section (108.15; 208.15), which are kinematically arranged in series along a support force flow between the support structure (110) and the optical element (108.1), wherein - the first solid-state joint section (108.14; 208.14) is the first Tilt axis (108.7; 208.7) defines and the second solid joint section (108.15; 208.15) defines the second tilt axis (108.8; 208.8). Optical arrangement according to Claim 1 , wherein - the first solid-body joint section (108.14; 208.14) and/or the second solid-body joint section (108.15; 208.15) has at least one bending section (108.16; 208.16), - the bending section (108.16; 208.16) defines the associated tilting axis and is along the associated tilting axis extends, in particular at least one of the following applies: - the bending section (108.16; 208.16) has a reduced wall thickness compared to at least one of the sections of the tilting joint device (108.6), which directly adjoin the bending section (108.16; 208.16) transversely to the associated tilting axis on; - the bending section (108.16; 208.16) is designed in the manner of a hinge joint or in the manner of a leaf spring; - The bending section (108.16; 208.16) is designed to be elongated along the associated tilting axis. Optical arrangement according to Claim 2 , wherein - the bending section (108.16; 208.16) has a bending section length along the associated tilting axis (108.7, 108.8; 208.7, 208.8) and - the bending section (108.16; 208.16) in a plane that is perpendicular to the associated tilting axis (108.7, 108.8; 208.7, 208.8), has a maximum bending section width in a bending section width direction and has a minimum bending section thickness in a bending section thickness direction which runs transversely to the bending section width direction, at least one of the following applies: - the bending section width is 1% to 20%, preferably 2% up to 15%, more preferably 4% to 10%, of the maximum bending section length; - the optical element (108.1) has a maximum element transverse dimension transverse to the lever unit longitudinal axis (108.10) and the double bending section length is 40% to 97%, preferably 60% to 95%, more preferably 80% to 95%, of the maximum element transverse dimension; - the minimum bending section thickness is 1% to 20%, preferably 1.5% to 10%, more preferably 2% to 5%, of the maximum bending section width. Optical arrangement according to Claim 2 or 3 , wherein - the bending section (108.16; 208.16) has a bending section length along the associated tilting axis (108.7, 108.8; 208.7, 208.8) and - the bending section (108.16; 208.16) in a plane that is perpendicular to the associated tilting axis (108.7, 108.8; 208.7, 208.8), has a maximum bending section width in a bending section width direction and has a minimum bending section thickness in a bending section thickness direction which runs transversely to the bending section width direction, at least one of the following applies: - the bending section length is 1 mm to 3 mm, preferably 1.25 mm to 2.75 mm, more preferably 1.5 mm to 2.5 mm; - the maximum bending section width is 20 µm to 400 µm, preferably 50 µm to 300 µm, more preferably 100 µm to 200 µm; - The minimum bending section thickness is 1 µm to 10 µm, preferably 2 µm to 8 µm, more preferably 3 µm to 5 µm. Optical arrangement according to one of the Claims 1 until 4 , wherein at least one of the following applies: - at least one of the first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) intersects the lever unit (108.9); - at least one of the first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) intersects the lever unit longitudinal axis (108.10); - at least one of the first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) runs in a plane which, in an inactive initial state of the actuator device (108.3), is 75° to 90°, preferably 80° to 90°, more preferably 85° to 90°, in particular at least substantially inclined by 90° to the lever unit longitudinal axis (108.10); - the first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) are inclined to one another at a tilt axis angle, the tilt axis angle being 60° to 90°, preferably 75° to 90°, more preferably 85° to 90° ; - The first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) run at least essentially in a common tilt axis plane. Optical arrangement according to one of the Claims 1 until 5 , wherein - the support device (108.2; 208.2) has at least one support unit (108.17; 108.21), - the at least one support unit (108.17; 108.21) along the support force flow between the support structure (110) and the optical element (108.1) in kinematic serial order a first interface section (108.18) for connecting the at least one support unit (108.17; 108.21) to the support structure (110), at least a first part of the first solid-state joint section (108.14; 208.14), a connecting section (108.19), at least a first part of the second solid-state joint section s (108.15; 208.15) and a second interface section (108.20) for connecting the at least one support unit (108.17; 108.21) to the optical element (108.1), in particular at least one of the following applies: - the connecting section (108.19) connects the first Part of the first solid-state joint section (108.14; 208.14) and the first part of the second solid-state joint section (108.15; 208.15) such that the first tilt axis (108.7; 208.7) and the second tilt axis (108.8; 208.8) run at least substantially in a common tilt axis plane; - the connecting section (108.19) is essentially V-shaped, with a first leg of the connecting section (108.19) extending along the first tilting axis (108.7; 208.7), in particular at least substantially parallel to the first tilting axis (108.7; 208.7) extends, and a second leg of the connecting section (108.19) extends along the second tilt axis (108.8; 208.8), in particular extends at least substantially parallel to the second tilt axis (108.8; 208.8). Optical arrangement according to Claim 6 , wherein - the first part of the first solid-state joint section (108.14; 208.14) is formed by a first leaf spring (108.16), which defines a first leaf spring main extension plane, - the first part of the second solid-state joint section (108.15; 208.15) by a second leaf spring (108.16; 208.16 ) is formed which defines a second leaf spring main extension plane; wherein in particular at least one of the following applies: - the first leaf spring (108.16; 208.16) is elongated along the first tilt axis (108.7; 208.7), - the second leaf spring (108.16; 208.16) is elongated along the second tilt axis (108.8; 208.8). formed, - the first leaf spring main extension plane and the second leaf spring main extension plane are inclined to one another by at most 5° to 15°, preferably at most 3° to 10°, more preferably at most 0.5° to 2°, in particular at least substantially parallel to one another; - The first leaf spring main extension plane and the second leaf spring main extension plane run at least essentially in a common plane. Optical arrangement according to Claim 6 or 7 , wherein - the support unit is a first support unit (108.17), - the support device (108.2; 208.2) has a second support unit (108.21) separate from the first support unit (108.17), - the second support unit (108.21) along the support force flow between the support structure (110) and the optical element (108.1) in kinematic serial order, a further first interface section (108.18) for connecting the second support unit (108.21) to the support structure (110), a second part of the first solid-state joint section (108.14; 208.14), a further connection section (108.19), a second part of the second solid joint section (108.15; 208.15) and a further second interface section (108.20) for connecting the second support unit (108.21) to the optical element (108.1), in particular at least one of the following applies: - the second support unit (108.21) is at least essentially identical to the first Support unit (108.17) formed; - the second support unit (108.21) acts kinematically parallel to the first support unit (108.17) between the support structure (110) and the optical element (108.1); - the second support unit (108.21) is arranged rotated along a circumferential direction of the support device (108.2; 208.2) relative to the first support unit (108.17), in particular arranged rotated by at least substantially 180°; - the first support unit (108.17) and the second support unit (108.21) are arranged and configured such that the first part and the second part of the first solid-state joint section (108.14; 208.14) are aligned with one another along the first tilt axis (108.7; 208.7) as well as the first Part and the second part of the second solid joint section (108.15; 208.15) are aligned with one another along the second tilt axis (108.8; 208.8). Optical arrangement according to one of the Claims 1 until 8th , wherein - the support device (108.2; 208.2) has at least one first interface section (108.18) and at least one second interface section (108.20), - the at least one first interface section (108.18) for directly connecting the support device (108.2; 208.2) to the support structure ( 110) is configured or is configured to connect the support device (108.2; 208.2) to the support structure (110) via at least one first connection element (108.24; 208.24) of the support device (108.2; 208.2), - the at least one second interface section (108.20). direct connection of the support device (108.2; 208.2) to the optical element (108.1) or for connecting the support device (108.2; 208.2) to the optical element (108.1) via at least one second connection element (109; 209) of the support device (108.2; 208.2), in particular at least one of the following applies: - the optical element (108.1) has a maximum element transverse dimension transverse to the lever unit longitudinal axis (108.10) and the support device (108.2; 208.2) has a maximum support device height dimension along the lever unit longitudinal axis (108.10), the maximum support device height dimension being 5% to 25%, preferably 8% to 20%, more preferably 10% to 15%, of the maximum element transverse dimension - the first connecting element (108.24; 208.24) is plate-shaped, at least in the west; - the second connecting element (109; 209) is plate-shaped at least in the west; - the second connecting element (109; 209) is directly connected to the lever unit (108.9); Optical arrangement according to one of the Claims 1 until 9 , wherein at least one of the following applies: - the support device (108.2; 208.2) is at least essentially monolithic; - the support device (108.2; 208.2) is monolithically connected to an element body of the optical element (108.1); - the support device (108.2; 208.2) is connected to the lever unit (108.9) directly or via the optical element (108.1), the lever unit (108.9) extending through a, in particular central, recess (108.25) in the support device (108.2; 208.2) extends; - The support device (108.2; 208.2) is at least partially, in particular essentially completely, designed and manufactured in the manner of a micro-electro-mechanical system (MEMS). Optical arrangement according to one of the Claims 1 until 10 , wherein - the actuator device (108.3) is designed in the manner of a magnetic actuator, in particular at least one of the following applies: - the actuator device (108.3) comprises a first magnet device (108.26), which is in the area of the first lever unit end (108.11) on the lever unit (108.9) is arranged, and a second magnet device (108.13), which is functionally and spatially assigned to the first magnet device (108.26), wherein the second magnet device (108.13) is configured to interact with the first magnet device (108.26) without contact, in order to at least to produce one of the first actuation movement and the second actuation movement; - the actuator device (108.3) comprises a first magnet device (108.26) and a second magnet device (108.13), which are functionally and spatially assigned to one another, at least one of the first magnet device (108.26) and the second magnet device (108.13) being actively controllable, to generate at least one of the first actuation movement and the second actuation movement; - The actuator device (108.3) comprises a permanent magnet unit (108.26) and an actively controllable electromagnet unit (108.13), which are functionally and spatially assigned to one another in order to generate, in particular without contact, at least one of the first actuating movement and the second actuating movement. Optical arrangement according to Claim 11 , wherein at least one of the following applies: - the first magnet device (108.26) is arranged at the first lever unit end, the first lever unit end (108.11) moving along the lever unit longitudinal axis (108.10) away from the optical element (108.1) via the support device (108.2; 208.2 ) protrudes; - the first magnet device (108.26) comprises at least one permanent magnet unit, the magnetization direction of which runs in particular along the lever unit longitudinal axis (108.10), in particular at least substantially parallel to the lever unit longitudinal axis (108.10); - the actuator device (108.3) comprises a, in particular annular, magnetic yoke device (108.27) which is arranged in the area of the first magnet device (108.26); - the actuator device (108.3) comprises a magnetic yoke device (108.27) which is arranged along the lever unit longitudinal axis (108.10) between the first magnet device (108.26) and the support device (108.2; 208.2); - The actuator device (108.3) comprises a magnetic yoke device (108.27), which is arranged such that the first magnet device (108.26) is arranged along the lever unit longitudinal axis (108.10) between the yoke device (108.27) and the second magnet device (108.13). Optical arrangement according to Claim 11 or 12 , wherein at least one of the following applies: - the second magnet device (108.13) is arranged adjacent to the first lever unit end (108.11); - the second magnet device (108.13) comprises a plurality of M actively controllable magnet units (108.28), where M is in particular 2 to 16, preferably 2 to 8, more preferably 2 to 4; - the second magnet device (108.13) comprises a plurality of M actively controllable magnet units (108.28), which in an inactive initial state of the actuator device (108.3) are arranged distributed around the lever unit longitudinal axis (108.10), in particular at least substantially uniformly and / or in a ring shape the lever unit longitudinal axis (108.10) are arranged distributed around; - the second magnet device (108.13) comprises a plurality of M actively controllable magnet units (108.28), the magnetization direction of which runs in particular along the lever unit longitudinal axis (108.10), in particular at least essentially parallel to the lever unit longitudinal axis (108.10); - the second magnet device (108.13) comprises at least one pair of magnet units made up of two actively controllable magnet units (108.28), which are assigned to one another in order to generate one of the first actuating movement and the second actuating movement; - The second magnet device (108.13) comprises at least one actively controllable magnet unit (108.28) with a coil unit (108.29), which is arranged in particular around a coil core (108.30), the coil core (108.30) along the lever unit longitudinal axis (108.10), in particular via the coil unit (108.29) protrudes and is connected to a pole piece unit (108.31) at an end facing the first magnet device (108.26) and/or is connected to a magnetic yoke unit (108.32) at an end facing away from the first magnet device (108.26). Optical arrangement according to one of the Claims 1 until 13 , wherein - a sensor device (108.33) is provided for detecting the first actuating movement and the second actuating movement, in particular at least one of the following applies: - the sensor device (108.33) comprises a first sensor unit (108.34) and a second sensor unit (108.35), which are assigned to one another functionally and spatially in such a way that during operation of the imaging device when the optical element (108.1) is tilted by the actuator device (108.3), the second sensor unit (108.35) is moved relative to the first sensor unit (108.34); - The sensor device (108.33) comprises a first sensor unit (108.34) and a functionally and spatially assigned second sensor unit (108.35), the first sensor unit (108.34) being mechanically coupled to the support device (108.2; 208.2) or the actuator device (108.3). that the first sensor unit (108.34) is at least essentially fixed with respect to the support structure (110) during operation of the imaging device when the optical element (108.1) is tilted by the actuator device (108.3), and the second sensor unit (108.35) is mechanically attached to the optical element in this way (108.1) is coupled in that the second sensor unit (108.35) is moved together with the optical element (108.1) by the actuator device (108.3) during operation of the imaging device; - The sensor device (108.33) comprises a first sensor unit (108.34) and a functionally and spatially assigned second sensor unit (108.35), the first sensor unit (108.34) being attached to the support structure (110) or one of the support structure (110) during operation of the imaging device first connection element (108.24; 208.24) of the support device (108.2; 208.2) is arranged and the second sensor unit (108.35) is arranged on the optical element (108.1) or a second connection element assigned to the optical element (108.1) during operation of the imaging device (109; 209) of the support device (108.2; 208.2) is arranged; Optical arrangement according to Claim 14 , wherein at least one of the following applies: - the sensor device (108.33) comprises a first sensor unit (108.34) with at least one capacitive first sensor element and a second sensor unit (108.35) with at least one capacitive second sensor element, the second sensor element being functional and is spatially assigned to detect at least one of the first actuating movement and the second actuating movement via a relative movement between the second sensor element and the first sensor element; - The sensor device (108.33) comprises a first sensor unit (108.34) and a second sensor unit (108.35), the first sensor unit (108.34) comprising a plurality of N capacitive first sensor elements and the second sensor unit (108.35) comprising a plurality of P capacitive second sensor elements comprises, wherein the first sensor elements are assigned to the second sensor elements in particular in such a way that the first sensor elements and the second sensor elements engage with one another in a comb-like, contactless manner during operation of the imaging device when the optical element (108.1) is tilted by the actuator device (108.3); - The sensor device (108.33) comprises a first sensor unit (108.34) and a second sensor unit (108.35), the first sensor unit (108.34) comprising a plurality of N rib-shaped capacitive first sensor elements and the second sensor unit (108.35) a plurality of P rib-shaped capacitive second sensor elements, and the lever unit (108.9) defines a lever unit circumferential direction and a lever unit radial direction in a plane perpendicular to the lever unit longitudinal axis (108.10), wherein the sensor elements extend along the lever unit circumferential direction in an inactive initial state of the actuator device (108.3), in particular in the manner of Lever unit longitudinal axis (108.10) extend concentric circular arc segments, or the sensor elements in an inactive initial state of the actuator device (108.3) extend along the lever unit radial direction, in particular expand radially with respect to the lever unit longitudinal axis (108.10); - The support device (108.2; 208.2) is designed and manufactured at least in a MEMS part, in particular essentially completely, in the manner of a micro-electromechanical system (MEMS), the MEMS part being configured in such a way that it supports at least part of the Sensor device (108.33), in particular forms at least part of a sensor of the sensor device (108.33). Optical arrangement according to Claim 14 or 15 , wherein - the sensor device (108.33) comprises at least one deformation-sensitive first sensor unit, which is assigned to the first solid-state joint section (108.14; 208.14), and at least one deformation-sensitive second sensor unit, which is assigned to the second solid-state joint section (108.15; 208.15), in particular at least One of the following applies: - at least one of the deformation-sensitive sensor units comprises a piezoelectric unit which is mechanically connected to the solid-state joint section (108.14, 108.15; 208.14, 208.15); - At least one of the deformation-sensitive sensor units comprises a piezoelectric coating of the solid-state joint section (108.14, 108.15; 208.14, 208.15), wherein the solid-state joint section (108.14, 108.15; 208.14, 208.15) in particular comprises a leaf spring element (108.16; 208.16) and at least in part of the leaf spring elements ( 108.16; 208.16), in particular a free side surface of the leaf spring element (108.16; 208.16), in particular essentially completely, is provided with a piezoelectric coating. Optical arrangement according to one of the Claims 1 until 16 , wherein - a virtual projection of the optical element (108.1), which takes place in an inactive initial state of the actuator device (108.3) along the lever unit's longitudinal axis (108.10) onto a projection plane which runs perpendicular to the lever unit's longitudinal axis (108.10), defines a first projection contour, - a virtual projection of the support device (108.2; 208.2) which takes place along the lever unit's longitudinal axis (108.10) onto the projection plane, defines a second projection contour, - a virtual projection of the actuator device (108.3) which takes place along the lever unit's longitudinal axis (108.10) onto the projection plane, a third Projection contour defined, whereby at least one of the following applies: - the second projection contour and the third projection contour protrude beyond the first projection contour by a maximum of 20%, preferably a maximum of 5% to 10%, more preferably a maximum of 1% to 3%, of the area of the first projection contour ; - the second projection contour and the third projection contour lie at least substantially completely within the first projection contour; - The second projection contour and the third projection contour lie within the first projection contour at a distance from the first projection contour. Optical arrangement according to one of the Claims 1 until 17 , where at least one of The following applies: - the optical surface (108.4) has an area of 1 mm ² to 1000 mm ² , preferably 10 mm ² to 100 mm ² , more preferably 20 mm ² to 30 mm ² ; - the optical surface (108.4) has a maximum dimension of 1 mm to 30 mm, preferably 3 mm to 10 mm, more preferably 5 mm to 6 mm; - the optical surface (108.4) has a polygonal outer contour, in particular a hexagonal outer contour, preferably an equilateral hexagonal outer contour; - the optical surface (108.4) is an at least essentially flat surface; - The optical surface (108.4) is a reflective surface. Optical module, in particular facet mirror, with at least two, in particular a plurality Q, of optical arrangements (108; 208) according to one of Claims 1 until 18 , in particular at least one of the following applies: - the optical arrangements (108; 208) are connected to a common support structure (110); - the majority Q is 100 to 1,000,000, preferably 1,000 to 100,000, more preferably 5,000 to 10,000; - the optical elements (108.1) of at least two optical arrangements (108; 208) are arranged relative to one another to form a narrow gap, the gap having a gap width and the gap width in an assembled state being 1% to 10%, preferably 2% to 8% , more preferably 3% to 6%, of a maximum dimension of the optical surface (108.4). Optical imaging device, in particular for microlithography, with - an illumination device (102) with a first optical element group (102.2), - an object device (103) for recording an object (103.3), - a projection device (104) with a second optical element group ( 104.1) and - an image device (105), wherein - the illumination device (102) is designed to illuminate the object (103.3) and - the projection device (104) is designed to project an image of the object (103.3) onto the image device (105). , characterized in that - the lighting device (102) and/or the projection device (104) has at least one optical module (102.8). Claim 19 includes. Method for supporting an optical element, in particular a facet element, an imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which - the optical element (108.1), which has an optical surface, by means of a passive Support device (108.2; 208.2) is supported on a support structure (110) and - the optical element (108.1) is actively tilted via a lever unit (108.9) by a first actuating movement and a transverse to a lever unit longitudinal axis (108.10) of the lever unit (108.9). second actuating movement is introduced into a first lever unit end (108.11) of the lever unit (108.9), which is distant from the optical element (108.1), while a second lever unit end (108.12) of the lever unit (108.9) is connected to the optical element (108.1), wherein - a tilting joint device (108.6) of the support device (108.2; 208.2) has at least a first tilting axis (108.7; 208.7) and a second tilting axis (108.8; 208.8) of the optical element (108.1) is defined with respect to the support structure (110), the first tilt axis (108.7; 208.7) being inclined to the second tilt axis (108.8; 208.8), - the first actuating movement involves a tilting of the optical element (108.1) with respect to the support structure (110) about the first tilt axis (108.7; 208.7), - the second actuating movement causes a tilting of the optical element (108.1) with respect to the support structure (110) about the second tilt axis (108.8; 208.8), characterized in that - the tilting joint device (108.6) has a first solid-state joint section (108.14; 208.14) and a second solid-state joint section (108.15; 208.15), which are kinematically arranged in series along a supporting force flow between the supporting structure (110) and the optical element (108.1), wherein - the first Solid-state joint section (108.14; 208.14) defines the first tilt axis (108.7; 208.7) and the second solid-state joint section (108.15; 208.15) defines the second tilt axis (108.8; 208.8) defined. Optical imaging method, in particular for microlithography, in which - an illumination device (102), which has a first optical element group (102.2), illuminates an object (103.3) and - a projection device (104), which has a second optical element group (104.1). , an image of the object (103.3) is projected onto an image device (105), characterized in that - at least one optical element (108.1) (108.1; 208.1) of the lighting device (102) and / or the projection device (104) by means of a method Claim 21 is supported,

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