DE102005020168A1 - Entspiegelungsschicht und Verfahren zu deren Aufbringung - Google Patents
Entspiegelungsschicht und Verfahren zu deren Aufbringung Download PDFInfo
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- DE102005020168A1 DE102005020168A1 DE102005020168A DE102005020168A DE102005020168A1 DE 102005020168 A1 DE102005020168 A1 DE 102005020168A1 DE 102005020168 A DE102005020168 A DE 102005020168A DE 102005020168 A DE102005020168 A DE 102005020168A DE 102005020168 A1 DE102005020168 A1 DE 102005020168A1
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- 238000000576 coating method Methods 0.000 title claims abstract description 84
- 239000011248 coating agent Substances 0.000 title claims abstract description 76
- 239000000758 substrate Substances 0.000 title claims abstract description 38
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 239000011521 glass Substances 0.000 title claims description 40
- 238000003980 solgel method Methods 0.000 title claims description 11
- 239000000919 ceramic Substances 0.000 title claims description 10
- 230000003667 anti-reflective effect Effects 0.000 title abstract description 9
- 239000011230 binding agent Substances 0.000 title abstract 2
- 239000010410 layer Substances 0.000 claims abstract description 128
- 238000000034 method Methods 0.000 claims abstract description 57
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- 239000000126 substance Substances 0.000 claims abstract description 51
- 239000002105 nanoparticle Substances 0.000 claims abstract description 23
- 230000008569 process Effects 0.000 claims abstract description 20
- 239000011148 porous material Substances 0.000 claims abstract description 19
- 239000002356 single layer Substances 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
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- 239000000203 mixture Substances 0.000 claims abstract description 9
- 238000005530 etching Methods 0.000 claims abstract description 7
- 238000011282 treatment Methods 0.000 claims abstract description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005507 spraying Methods 0.000 claims abstract description 6
- 238000005096 rolling process Methods 0.000 claims abstract description 5
- 238000005488 sandblasting Methods 0.000 claims abstract description 5
- 239000007791 liquid phase Substances 0.000 claims abstract description 4
- 238000000678 plasma activation Methods 0.000 claims abstract description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 4
- 238000010422 painting Methods 0.000 claims abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 13
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 9
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 239000006117 anti-reflective coating Substances 0.000 claims description 9
- 238000007598 dipping method Methods 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000005388 borosilicate glass Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 150000004756 silanes Chemical class 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 150000002430 hydrocarbons Chemical class 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000005361 soda-lime glass Substances 0.000 claims description 6
- 238000001994 activation Methods 0.000 claims description 5
- 230000004913 activation Effects 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 238000004040 coloring Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- 238000007788 roughening Methods 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims description 3
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 238000001311 chemical methods and process Methods 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims description 2
- 239000002241 glass-ceramic Substances 0.000 claims description 2
- 238000010297 mechanical methods and process Methods 0.000 claims description 2
- 230000005226 mechanical processes and functions Effects 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 239000002318 adhesion promoter Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000005328 architectural glass Substances 0.000 claims 1
- 239000011222 crystalline ceramic Substances 0.000 claims 1
- 239000002178 crystalline material Substances 0.000 claims 1
- 238000007606 doctor blade method Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 3
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- 239000007767 bonding agent Substances 0.000 abstract description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract description 2
- 238000007654 immersion Methods 0.000 abstract 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 abstract 2
- 238000005119 centrifugation Methods 0.000 abstract 1
- 239000011787 zinc oxide Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 25
- 238000012360 testing method Methods 0.000 description 17
- 239000000523 sample Substances 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000013461 design Methods 0.000 description 7
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- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 230000007774 longterm Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
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- 238000010521 absorption reaction Methods 0.000 description 4
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- 235000012239 silicon dioxide Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
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- 239000005871 repellent Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
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- 238000003860 storage Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
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- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000005336 safety glass Substances 0.000 description 2
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- 239000007858 starting material Substances 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910002796 Si–Al Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
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- 125000004429 atom Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 235000010338 boric acid Nutrition 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 150000001875 compounds Chemical class 0.000 description 1
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- 230000005670 electromagnetic radiation Effects 0.000 description 1
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- 238000003379 elimination reaction Methods 0.000 description 1
- 230000002996 emotional effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
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- 238000010348 incorporation Methods 0.000 description 1
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- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- RIPZIAOLXVVULW-UHFFFAOYSA-N pentane-2,4-dione Chemical compound CC(=O)CC(C)=O.CC(=O)CC(C)=O RIPZIAOLXVVULW-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
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- 230000002940 repellent Effects 0.000 description 1
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- 238000005201 scrubbing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
- C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005020168A DE102005020168A1 (de) | 2005-04-28 | 2005-04-28 | Entspiegelungsschicht und Verfahren zu deren Aufbringung |
| PCT/EP2006/003973 WO2006114321A1 (fr) | 2005-04-28 | 2006-04-28 | Couche antireflet et procede de fabrication associe |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005020168A DE102005020168A1 (de) | 2005-04-28 | 2005-04-28 | Entspiegelungsschicht und Verfahren zu deren Aufbringung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102005020168A1 true DE102005020168A1 (de) | 2006-11-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| DE102005020168A Withdrawn DE102005020168A1 (de) | 2005-04-28 | 2005-04-28 | Entspiegelungsschicht und Verfahren zu deren Aufbringung |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102005020168A1 (fr) |
| WO (1) | WO2006114321A1 (fr) |
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| DE102007009786A1 (de) * | 2007-02-27 | 2008-08-28 | Schott Ag | Beschichtetes vorgespanntes Glas und Verfahren zu dessen Herstellung |
| WO2008145750A3 (fr) * | 2007-05-31 | 2009-01-29 | Univ Ernst Moritz Arndt | Procédé destine a l'induction de surfaces avec des micro- et nanoparticules a l'aide d'un procède plasmatique |
| WO2009037055A1 (fr) * | 2007-09-13 | 2009-03-26 | Siemens Aktiengesellschaft | REVÊTEMENT SiO2 POREUX TRANSPARENT POUR MATÉRIAU SUBSTRAT TRANSPARENT AYANT DES PROPRIÉTÉS OPTIQUES AMÉLIORÉES |
| WO2009038903A1 (fr) * | 2007-09-18 | 2009-03-26 | Guardian Industries Corp. | Procédé de fabrication d'un revêtement de silice antireflet, produit résultant et dispositif photovoltaïque le comprenant |
| EP2053027A1 (fr) * | 2007-10-23 | 2009-04-29 | Guardian, Industries Corp. | Procédé de fabrication d'un revêtement de silicium anti-réfléchissant, produit résultant, et dispositif photovoltaïque le comprenant |
| DE102007058927A1 (de) * | 2007-12-05 | 2009-06-10 | Schott Ag | Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials |
| DE102007058926A1 (de) * | 2007-12-05 | 2009-06-10 | Schott Ag | Solarglas und Verfahren zur Herstellung eines Solarglases |
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| WO2010079495A1 (fr) * | 2009-01-12 | 2010-07-15 | Cleansun Energy Ltd. | Substrat présentant un revêtement anti-réfléchissant et auto-nettoyant et procédé pour sa préparation |
| WO2010089382A1 (fr) | 2009-02-09 | 2010-08-12 | Saint-Gobain Glass France | Corps en verre transparent, ainsi que ses procédés de fabrication et d'utilisation |
| WO2010130722A1 (fr) * | 2009-05-13 | 2010-11-18 | Saint-Gobain Glass France | Procédé permettant de fabriquer une vitre à réflexion réduite |
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| DE102010009999A1 (de) | 2010-03-02 | 2011-09-08 | Schott Ag | Verfahren zur Mehrfachbeschichtung sowie mehrlagig beschichtetes Glas-Substrat |
| DE102010012841A1 (de) * | 2010-03-25 | 2011-09-29 | Schott Ag | Verfahren zum Aufbringen einer Entspiegelungsschicht sowie Glas mit einer Entspiegelungsschicht |
| DE102010044951A1 (de) | 2010-09-10 | 2012-03-15 | Schott Ag | Signaltrennelement |
| WO2012028626A3 (fr) * | 2010-09-01 | 2012-07-26 | Agc Glass Europe | Substrat verrier revêtu d'une couche anti-réfléchissante |
| US8617641B2 (en) | 2009-11-12 | 2013-12-31 | Guardian Industries Corp. | Coated article comprising colloidal silica inclusive anti-reflective coating, and method of making the same |
| CN103582617A (zh) * | 2011-05-31 | 2014-02-12 | 肖特公开股份有限公司 | 用于涂布易清洁涂层的基底元件 |
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| US9490400B2 (en) | 2013-06-24 | 2016-11-08 | Osram Opto Semiconductors Gmbh | Optoelectronic component including a conversion element and method of producing an optoelectronic component including a conversion element |
| EP3133184A1 (fr) | 2015-08-17 | 2017-02-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Procede de formation d'une couche a haute transmission lumineuse et/ou a faible reflexion lumineuse |
| BE1024950B1 (fr) * | 2011-08-31 | 2018-08-23 | Agc Glass Europe | Substrat verrier revêtu d'une couche anti-réfléchissante |
| CN109077620A (zh) * | 2017-06-14 | 2018-12-25 | 佛山市顺德区美的电热电器制造有限公司 | 不粘涂层及其制备方法以及锅具或烤盘面板和煮食设备 |
| DE102010054858B4 (de) * | 2010-12-17 | 2019-05-23 | Interpane Entwicklungs- Und Beratungsgesellschaft Mbh | Verfahren und Vorrichtung zur Herstellung einer reflexionsmindernden Beschichtung |
| CN110436795A (zh) * | 2019-08-28 | 2019-11-12 | 福建工程学院 | 一种制备含蛋挞状结构的二氧化硅薄膜的方法 |
| EP3670174A4 (fr) * | 2017-08-16 | 2020-08-19 | Nissan Motor Co., Ltd. | Structure antisalissure |
| CN117623641A (zh) * | 2023-11-27 | 2024-03-01 | 中建材玻璃新材料研究院集团有限公司 | 一种用于玻璃瓶的具有过渡层的复合防护膜层的制备方法 |
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| CN101811827A (zh) * | 2010-04-09 | 2010-08-25 | 黄再元 | 利用废弃玻璃陶瓷制得的玻璃陶瓷原料及用其生产玻璃陶瓷产品的方法 |
| DE102011076756A1 (de) * | 2011-05-31 | 2012-12-06 | Schott Ag | Substratelement für die Beschichtung mit einer Easy-to-clean Beschichtung |
| US9298081B2 (en) * | 2013-03-08 | 2016-03-29 | Globalfoundries Inc. | Scattering enhanced thin absorber for EUV reticle and a method of making |
| DE102014013550A1 (de) * | 2014-09-12 | 2016-03-31 | Schott Ag | Beschichtetes chemisch vorgespanntes flexibles dünnes Glas |
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| DE102007009786A1 (de) * | 2007-02-27 | 2008-08-28 | Schott Ag | Beschichtetes vorgespanntes Glas und Verfahren zu dessen Herstellung |
| DE102007009785A1 (de) * | 2007-02-27 | 2008-08-28 | Hero-Glas Veredelungs Gmbh | Verfahren zur Herstellung von beschichtetem Glas mit erhöhter Festigkeit, sowie verfahrensgemäß herstellbares Glaserzeugnis |
| DE102007009785B4 (de) * | 2007-02-27 | 2013-07-25 | Hero-Glas Veredelungs Gmbh | Verfahren zur Herstellung von beschichtetem Glas mit erhöhter Festigkeit, sowie verfahrensgemäß hergestelltes Glaserzeugnis |
| DE102007009786B4 (de) * | 2007-02-27 | 2013-09-05 | Schott Ag | Beschichtetes vorgespanntes Glas, Verfahren zu dessen Herstellung und dessen Verwendung |
| US8541065B2 (en) | 2007-05-31 | 2013-09-24 | Inp Greifswald, Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V. | Method for coating surfaces with microparticles and nanoparticles with the aid of plasma methods |
| WO2008145750A3 (fr) * | 2007-05-31 | 2009-01-29 | Univ Ernst Moritz Arndt | Procédé destine a l'induction de surfaces avec des micro- et nanoparticules a l'aide d'un procède plasmatique |
| CN101802058B (zh) * | 2007-09-13 | 2012-11-14 | 西门子公司 | 针对透明基底材料的具有提高的光学性能的透明多孔SiO2涂层 |
| US20100227147A1 (en) * | 2007-09-13 | 2010-09-09 | Siemens Aktiengesellschaft | Transparente porous sio2 coating for a transparent sustrate material having improved optical properties |
| US8734954B2 (en) | 2007-09-13 | 2014-05-27 | Siemens Aktiengesellschaft | Transparent porous SiO2-coating for a transparent substrate material having improved optical properties |
| WO2009037055A1 (fr) * | 2007-09-13 | 2009-03-26 | Siemens Aktiengesellschaft | REVÊTEMENT SiO2 POREUX TRANSPARENT POUR MATÉRIAU SUBSTRAT TRANSPARENT AYANT DES PROPRIÉTÉS OPTIQUES AMÉLIORÉES |
| WO2009038903A1 (fr) * | 2007-09-18 | 2009-03-26 | Guardian Industries Corp. | Procédé de fabrication d'un revêtement de silice antireflet, produit résultant et dispositif photovoltaïque le comprenant |
| EP2053027A1 (fr) * | 2007-10-23 | 2009-04-29 | Guardian, Industries Corp. | Procédé de fabrication d'un revêtement de silicium anti-réfléchissant, produit résultant, et dispositif photovoltaïque le comprenant |
| DE102007058926A1 (de) * | 2007-12-05 | 2009-06-10 | Schott Ag | Solarglas und Verfahren zur Herstellung eines Solarglases |
| DE102007058927A1 (de) * | 2007-12-05 | 2009-06-10 | Schott Ag | Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials |
| DE102007058926B4 (de) * | 2007-12-05 | 2010-04-29 | Schott Ag | Solarglas und Verfahren zur Herstellung eines Solarglases sowie dessen Verwendung |
| DE102007058927B4 (de) * | 2007-12-05 | 2010-04-29 | Schott Ag | Substrat mit einer Sol-Gel-Schicht und Verfahren zur Herstellung eines Verbundmaterials sowie dessen Verwendung |
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| DE202008008318U1 (de) | 2008-06-20 | 2009-10-29 | Schott Ag | Verbundsubstratelement |
| WO2010001053A3 (fr) * | 2008-07-01 | 2010-04-01 | Essilor International (Compagnie Generale D'optique) | Utilisation d'un revetement poreux non photocatalytique en tant que revetement antisalissure |
| FR2933420A1 (fr) * | 2008-07-01 | 2010-01-08 | Essilor Int | Utilisation d'un revetement poreux non photocatalytique en tant que revetement antisalissure |
| DE102008056792B4 (de) | 2008-11-11 | 2018-06-28 | Schott Ag | Verfahren zum Aufbringen einer porösen selbstreinigenden Entspiegelungsschicht sowie Glas mit dieser Entspiegelungsschicht und Verwendung einer selbstreinigenden porösen Entspiegelungsschicht |
| DE102008056792A1 (de) * | 2008-11-11 | 2010-05-20 | Schott Ag | Verfahren zum Aufbringen einer porösen Entspiegelungsschicht sowie Glas mit einer Entspiegelungsschicht |
| WO2010079495A1 (fr) * | 2009-01-12 | 2010-07-15 | Cleansun Energy Ltd. | Substrat présentant un revêtement anti-réfléchissant et auto-nettoyant et procédé pour sa préparation |
| US9073782B2 (en) | 2009-01-12 | 2015-07-07 | Cleansun Energy Ltd. | Substrate having a self cleaning anti-reflecting coating and method for its preparation |
| WO2010089382A1 (fr) | 2009-02-09 | 2010-08-12 | Saint-Gobain Glass France | Corps en verre transparent, ainsi que ses procédés de fabrication et d'utilisation |
| DE102009008141A1 (de) | 2009-02-09 | 2010-08-19 | Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg | Transparenter Glaskörper, Verfahren zu dessen Herstellung und dessen Verwendung |
| DE102009025788A1 (de) * | 2009-05-13 | 2010-11-25 | Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg | Verfahren zur Herstellung einer reflexionsverminderten Scheibe |
| CN102422184A (zh) * | 2009-05-13 | 2012-04-18 | 法国圣戈班玻璃厂 | 生产反射减少的玻璃品的方法 |
| WO2010130722A1 (fr) * | 2009-05-13 | 2010-11-18 | Saint-Gobain Glass France | Procédé permettant de fabriquer une vitre à réflexion réduite |
| US8617641B2 (en) | 2009-11-12 | 2013-12-31 | Guardian Industries Corp. | Coated article comprising colloidal silica inclusive anti-reflective coating, and method of making the same |
| DE102009056756A1 (de) | 2009-12-04 | 2011-06-09 | Schott Ag | Material für Batterie-Elektroden, dieses enthaltende Batterie-Elektroden sowie Batterien mit diesen Elektroden und Verfahren zu dessen Herstellung |
| DE102010009999B4 (de) * | 2010-03-02 | 2017-02-09 | Schott Ag | Verwendung von Nanopartikeln und/oder Organosilanen zur Herstellung von vorgespannten, mehrlagig beschichteten Glas-Substraten |
| WO2011107277A1 (fr) | 2010-03-02 | 2011-09-09 | Schott Ag | Procédé de revêtement multiple, ainsi que substrat de verre à revêtement multicouches |
| DE102010009999A1 (de) | 2010-03-02 | 2011-09-08 | Schott Ag | Verfahren zur Mehrfachbeschichtung sowie mehrlagig beschichtetes Glas-Substrat |
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| CN103813993A (zh) * | 2010-09-01 | 2014-05-21 | 旭硝子欧洲玻璃公司 | 涂覆有减反射层的玻璃基材 |
| WO2012028626A3 (fr) * | 2010-09-01 | 2012-07-26 | Agc Glass Europe | Substrat verrier revêtu d'une couche anti-réfléchissante |
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| BE1024950B1 (fr) * | 2011-08-31 | 2018-08-23 | Agc Glass Europe | Substrat verrier revêtu d'une couche anti-réfléchissante |
| DE102012219571A1 (de) * | 2012-10-25 | 2014-04-30 | Solarworld Innovations Gmbh | Photovoltaikmodul mit einer Markierung |
| US9490400B2 (en) | 2013-06-24 | 2016-11-08 | Osram Opto Semiconductors Gmbh | Optoelectronic component including a conversion element and method of producing an optoelectronic component including a conversion element |
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| EP3133184A1 (fr) | 2015-08-17 | 2017-02-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Procede de formation d'une couche a haute transmission lumineuse et/ou a faible reflexion lumineuse |
| CN109077620A (zh) * | 2017-06-14 | 2018-12-25 | 佛山市顺德区美的电热电器制造有限公司 | 不粘涂层及其制备方法以及锅具或烤盘面板和煮食设备 |
| EP3670174A4 (fr) * | 2017-08-16 | 2020-08-19 | Nissan Motor Co., Ltd. | Structure antisalissure |
| CN110436795A (zh) * | 2019-08-28 | 2019-11-12 | 福建工程学院 | 一种制备含蛋挞状结构的二氧化硅薄膜的方法 |
| CN110436795B (zh) * | 2019-08-28 | 2022-03-08 | 福建工程学院 | 一种制备含蛋挞状结构的二氧化硅薄膜的方法 |
| CN117623641A (zh) * | 2023-11-27 | 2024-03-01 | 中建材玻璃新材料研究院集团有限公司 | 一种用于玻璃瓶的具有过渡层的复合防护膜层的制备方法 |
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