DE10194823T1 - Barrierenformender Film und Herstellungsverfahren dazu - Google Patents
Barrierenformender Film und Herstellungsverfahren dazuInfo
- Publication number
- DE10194823T1 DE10194823T1 DE2001194823 DE10194823T DE10194823T1 DE 10194823 T1 DE10194823 T1 DE 10194823T1 DE 2001194823 DE2001194823 DE 2001194823 DE 10194823 T DE10194823 T DE 10194823T DE 10194823 T1 DE10194823 T1 DE 10194823T1
- Authority
- DE
- Germany
- Prior art keywords
- barrier
- manufacturing process
- forming film
- process therefor
- therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/052—Forming heat-sealable coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
- Y10T428/31728—Next to second layer of polyamide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
- Y10T428/31736—Next to polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31725—Of polyamide
- Y10T428/31765—Inorganic-containing or next to inorganic-containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000313003 | 2000-10-13 | ||
| JP2001265308A JP2002187231A (ja) | 2000-10-13 | 2001-09-03 | バリア性フィルムおよびその製造法 |
| PCT/JP2001/008947 WO2002032659A1 (en) | 2000-10-13 | 2001-10-11 | Barrier film and method for production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10194823T1 true DE10194823T1 (de) | 2003-09-11 |
Family
ID=26602023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2001194823 Ceased DE10194823T1 (de) | 2000-10-13 | 2001-10-11 | Barrierenformender Film und Herstellungsverfahren dazu |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6720097B2 (de) |
| JP (1) | JP2002187231A (de) |
| DE (1) | DE10194823T1 (de) |
| GB (1) | GB2372999B (de) |
| WO (1) | WO2002032659A1 (de) |
Families Citing this family (61)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060127583A1 (en) * | 2003-12-18 | 2006-06-15 | Lichtenhan Joseph D | Polyhedral oligomeric silsesquioxanes and polyhedral oligomeric silicates barrier materials for packaging |
| US20060263531A1 (en) * | 2003-12-18 | 2006-11-23 | Lichtenhan Joseph D | Polyhedral oligomeric silsesquioxanes as glass forming coatings |
| EP1479513B1 (de) | 2002-02-28 | 2016-04-13 | Mitsubishi Plastics, Inc. | Gassperrmaterial |
| DE10218955B4 (de) * | 2002-04-27 | 2004-09-09 | Infineon Technologies Ag | Verfahren zur Herstellung einer strukturierten Schicht auf einem Halbleitersubstrat |
| JP4953408B2 (ja) * | 2003-02-28 | 2012-06-13 | 日本テトラパック株式会社 | 積層材料、積層材料の製造方法、積層材料のヒートシール方法および包装容器 |
| JP4036452B2 (ja) * | 2003-04-18 | 2008-01-23 | 日本テトラパック株式会社 | 包装積層材料の製造方法 |
| US20100129548A1 (en) * | 2003-06-27 | 2010-05-27 | Sundew Technologies, Llc | Ald apparatus and method |
| DE602004027256D1 (de) * | 2003-06-27 | 2010-07-01 | Sundew Technologies Llc | Vorrichtung und verfahren zur steuerung des dampfdrucks einer chemikalienquelle |
| US7052772B2 (en) * | 2003-08-14 | 2006-05-30 | 3M Innovative Properties Company | Material for packaging electronic components |
| US7727588B2 (en) * | 2003-09-05 | 2010-06-01 | Yield Engineering Systems, Inc. | Apparatus for the efficient coating of substrates |
| WO2005051525A1 (en) * | 2003-11-25 | 2005-06-09 | Polyvalor, Limited Partnership | Permeation barrier coating or layer with modulated properties and methods of making the same |
| JP4701610B2 (ja) * | 2003-12-24 | 2011-06-15 | 凸版印刷株式会社 | 高密着性を有する薄膜層を備えた積層体の製造方法 |
| DE102004001603B4 (de) * | 2004-01-09 | 2009-03-05 | Schott Ag | Behälter mit Innendekor |
| JP4583954B2 (ja) * | 2005-02-07 | 2010-11-17 | 麒麟麦酒株式会社 | プラスチック容器のガスバリア性向上方法 |
| US8138104B2 (en) * | 2005-05-26 | 2012-03-20 | Applied Materials, Inc. | Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure |
| US7566655B2 (en) * | 2005-05-26 | 2009-07-28 | Applied Materials, Inc. | Integration process for fabricating stressed transistor structure |
| US8129290B2 (en) * | 2005-05-26 | 2012-03-06 | Applied Materials, Inc. | Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure |
| US7732342B2 (en) * | 2005-05-26 | 2010-06-08 | Applied Materials, Inc. | Method to increase the compressive stress of PECVD silicon nitride films |
| US20080206589A1 (en) * | 2007-02-28 | 2008-08-28 | Bruce Gardiner Aitken | Low tempertature sintering using Sn2+ containing inorganic materials to hermetically seal a device |
| US20070040501A1 (en) | 2005-08-18 | 2007-02-22 | Aitken Bruce G | Method for inhibiting oxygen and moisture degradation of a device and the resulting device |
| US7829147B2 (en) | 2005-08-18 | 2010-11-09 | Corning Incorporated | Hermetically sealing a device without a heat treating step and the resulting hermetically sealed device |
| US7722929B2 (en) * | 2005-08-18 | 2010-05-25 | Corning Incorporated | Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device |
| US7713890B2 (en) * | 2005-08-23 | 2010-05-11 | Milliken & Company | Flexible sheet-like composites |
| JP4667173B2 (ja) * | 2005-08-31 | 2011-04-06 | 花王株式会社 | 発熱具 |
| EP1764425A1 (de) * | 2005-09-15 | 2007-03-21 | Semico S.r.l. | Vorrichtung und Verfahren zur Herstellung eines flexibelen Bandes mit einer transparenten Beschichtung |
| US20080048178A1 (en) * | 2006-08-24 | 2008-02-28 | Bruce Gardiner Aitken | Tin phosphate barrier film, method, and apparatus |
| TWI275658B (en) * | 2006-09-13 | 2007-03-11 | Ind Tech Res Inst | Method of improving surface frame resistance of a substrate |
| US8115326B2 (en) * | 2006-11-30 | 2012-02-14 | Corning Incorporated | Flexible substrates having a thin-film barrier |
| US20110217558A1 (en) * | 2007-01-05 | 2011-09-08 | Brogan Paul H | Chemical composition and method of applying same to enhance the adhesive bonding of glass laminates |
| US20080206454A1 (en) * | 2007-02-27 | 2008-08-28 | Insight Equity A.P.X., L.P. (Dba Vision-Ease Lens) | Composition Of Primer Solution For Use With An Optical Article And Method Of Priming An Optical Article |
| US7878054B2 (en) * | 2007-02-28 | 2011-02-01 | The Boeing Company | Barrier coatings for polymeric substrates |
| EP2134773B1 (de) * | 2007-04-04 | 2015-05-27 | Tetra Laval Holdings & Finance S.A. | Verpackungslaminat; verfahren zur herstellung des verpackungsaminats und daraus hergestellter verpackungsbehälter |
| ES2375508T3 (es) * | 2007-05-21 | 2012-03-01 | Dow Global Technologies Llc | Objetos recubiertos. |
| WO2009005947A1 (en) | 2007-07-03 | 2009-01-08 | Newpage Wisconsin System, Inc. | Biodegradable and compostable high-barrier packaging material |
| EP2183407A1 (de) * | 2007-07-30 | 2010-05-12 | Dow Global Technologies Inc. | Atmosphärendruck- und plasmaverstärkter chemischer dampfablagerungsprozess |
| JP5312295B2 (ja) * | 2008-11-05 | 2013-10-09 | グンゼ株式会社 | バリア性多層延伸フィルム |
| JP5517446B2 (ja) * | 2008-12-19 | 2014-06-11 | 東洋製罐株式会社 | パウチの製造方法及びパウチ |
| DE102009018518A1 (de) | 2009-04-24 | 2010-10-28 | Tesa Se | Transparente Barrierelaminate |
| JP5201074B2 (ja) * | 2009-04-28 | 2013-06-05 | 大日本印刷株式会社 | 透明ガスバリア性フィルム |
| JP5201072B2 (ja) * | 2009-04-28 | 2013-06-05 | 大日本印刷株式会社 | 透明ガスバリア性フィルム |
| JP5201073B2 (ja) * | 2009-04-28 | 2013-06-05 | 大日本印刷株式会社 | 透明ガスバリア性フィルム |
| US20100294363A1 (en) * | 2009-05-22 | 2010-11-25 | Mitsubishi Polyester Film, Inc. | Coated Polyester Film For Lamination to Ethylene-Vinyl Acetate Layers |
| US8652225B2 (en) * | 2009-07-27 | 2014-02-18 | Joseph H. MacKay | Flexible coated abrasive finishing article and method of manufacturing the same |
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| US9114900B2 (en) * | 2010-08-25 | 2015-08-25 | Dixie Consumer Products Llc | Paper cup seal |
| EP2660047A1 (de) * | 2010-12-28 | 2013-11-06 | Mitsubishi Plastics, Inc. | Laminierter feuchtigkeitsbeständiger film |
| JP5720315B2 (ja) * | 2011-03-08 | 2015-05-20 | 凸版印刷株式会社 | 蒸着フィルムの評価方法 |
| TWI408085B (zh) * | 2011-03-23 | 2013-09-11 | China Steel Corp | 金屬材之包裝結構 |
| EP2647660A1 (de) * | 2012-04-02 | 2013-10-09 | Sika Technology AG | PVC-Membran mit verringerter Weichmachermigration |
| DE112012006381T5 (de) * | 2012-05-16 | 2015-01-29 | Otis Elevator Company | Seilscheibe für ein Aufzugsystem |
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| KR102187542B1 (ko) * | 2013-02-20 | 2020-12-07 | 도요보 가부시키가이샤 | 가스 배리어성 필름 |
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| US9725802B2 (en) * | 2014-11-11 | 2017-08-08 | Graham Packaging Company, L.P. | Method for making pet containers with enhanced silicon dioxide barrier coating |
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| ES2963042T3 (es) | 2017-06-22 | 2024-03-25 | Procter & Gamble | Películas que incluyen una capa soluble en agua y un recubrimiento orgánico depositado por vapor |
| US20200039886A1 (en) * | 2018-07-31 | 2020-02-06 | General Electric Company | Silicon Bond Coat with Amorphous Structure and Methods of Its Formation |
| KR102912247B1 (ko) * | 2018-10-18 | 2026-01-14 | 도레이 카부시키가이샤 | 적층체 |
| JP7355958B1 (ja) * | 2022-09-27 | 2023-10-03 | 大日本印刷株式会社 | バリアフィルム |
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| US6770176B2 (en) * | 2002-08-02 | 2004-08-03 | Itn Energy Systems. Inc. | Apparatus and method for fracture absorption layer |
-
2001
- 2001-09-03 JP JP2001265308A patent/JP2002187231A/ja active Pending
- 2001-10-11 GB GB0211638A patent/GB2372999B/en not_active Expired - Fee Related
- 2001-10-11 DE DE2001194823 patent/DE10194823T1/de not_active Ceased
- 2001-10-11 US US10/148,627 patent/US6720097B2/en not_active Expired - Fee Related
- 2001-10-11 WO PCT/JP2001/008947 patent/WO2002032659A1/ja not_active Ceased
-
2004
- 2004-02-24 US US10/785,259 patent/US7192625B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20040166239A1 (en) | 2004-08-26 |
| GB0211638D0 (en) | 2002-07-03 |
| GB2372999B (en) | 2004-09-29 |
| US20030068534A1 (en) | 2003-04-10 |
| WO2002032659A1 (en) | 2002-04-25 |
| US7192625B2 (en) | 2007-03-20 |
| JP2002187231A (ja) | 2002-07-02 |
| GB2372999A (en) | 2002-09-11 |
| US6720097B2 (en) | 2004-04-13 |
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