DE1004011B - Acid galvanic nickel bath - Google Patents
Acid galvanic nickel bathInfo
- Publication number
- DE1004011B DE1004011B DED20039A DED0020039A DE1004011B DE 1004011 B DE1004011 B DE 1004011B DE D20039 A DED20039 A DE D20039A DE D0020039 A DED0020039 A DE D0020039A DE 1004011 B DE1004011 B DE 1004011B
- Authority
- DE
- Germany
- Prior art keywords
- bath according
- reaction products
- bath
- salt
- aromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 26
- 229910052759 nickel Inorganic materials 0.000 title claims description 13
- 239000002253 acid Substances 0.000 title claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 150000003839 salts Chemical class 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 6
- 150000008053 sultones Chemical class 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 3
- MHYFEEDKONKGEB-UHFFFAOYSA-N oxathiane 2,2-dioxide Chemical compound O=S1(=O)CCCCO1 MHYFEEDKONKGEB-UHFFFAOYSA-N 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 239000001294 propane Substances 0.000 claims description 2
- 239000000080 wetting agent Substances 0.000 claims description 2
- 238000007714 electro crystallization reaction Methods 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- -1 cyclic anhydrides Chemical class 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- MUDSDYNRBDKLGK-UHFFFAOYSA-N 4-methylquinoline Chemical compound C1=CC=C2C(C)=CC=NC2=C1 MUDSDYNRBDKLGK-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical compound C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- SMUQFGGVLNAIOZ-UHFFFAOYSA-N quinaldine Chemical compound C1=CC=CC2=NC(C)=CC=C21 SMUQFGGVLNAIOZ-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical class CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- YDQJXVYGARVLRT-UHFFFAOYSA-N Lepidine Natural products C=1C=CC(CC=2NC=CN=2)=CC=1OC=1C(OC)=CC=CC=1CC1=NC=CN1 YDQJXVYGARVLRT-UHFFFAOYSA-N 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 241000272534 Struthio camelus Species 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ZGTHJWXZUZSQOQ-UHFFFAOYSA-N [Na].[SH2]=N.[SH2]=N Chemical compound [Na].[SH2]=N.[SH2]=N ZGTHJWXZUZSQOQ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- QWTDNUCVQCZILF-UHFFFAOYSA-N iso-pentane Natural products CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
Es wurde gefunden, daß man zu hochwertigen galvanischen Nickelüberzügen gelangt, wenn man den üblichen sauren Nickelbädern vor oder während der Galvanisierung Verbindungen zusetzt, die durch Umsetzung von tertiären ein- oder mehrkernigen heterocyclischen Stickstoffbasen vom aromatischen Typ, insbesondere von Pyridin bzw. seinen Homologen mit 1, 3- bzw. I1 4-Sultonen erhältlich sind. Die hierbei entstehenden Umsetzungsprodukte sind innere Salze von quaternären Ammonium-N-propan- bzw. -butan-cü-sulfosäuren, deren Stickstoffatome Bestandteil eines aromatischen Ringsystems sind. Ihre Herstellung erfolgt in einfacher Weise entsprechend den Angaben von Helberger (Liebigs Annalen, Bd. 565, S. 24), indem man äquimolare Mengen beider Reaktionsteilnehmer aufeinander einwirken läßt, wobei man in einem organischen Lösungsmittel, vielfach auch in Wasser, arbeiten kann und in der Regel gute Ausbeuten erzielt. Diese leicht isolierbaren, durchweg gut kristallisierenden und sehr beständigen Umsetzungsprodukte ergeben, wie gefunden wurde, als Zusatz zu sauren Nickelbädern einen erhöhten Glanzeffekt und haben vor allem hervorragende einebnende Wirkung. Der einfachste Vertreter ist das innere Salz der Pyridinium-N-propan-cü-sulfosäure der nachstehenden FormelIt has been found that high-quality electroplated nickel coatings are obtained if compounds are added to the usual acidic nickel baths before or during electroplating which are obtained by reacting tertiary mononuclear or polynuclear heterocyclic nitrogen bases of the aromatic type, in particular pyridine or its homologues with 1 , 3- and I 1 4-sultones are available. The resulting reaction products are internal salts of quaternary ammonium-N-propane or -butane-cü-sulfonic acids, the nitrogen atoms of which are part of an aromatic ring system. They are produced in a simple manner according to the information provided by Helberger (Liebigs Annalen, vol. 565, p. 24) by allowing equimolar amounts of both reactants to act on one another, it being possible to work in an organic solvent, often also in water, and in usually good yields. As has been found, these easily isolable, consistently well crystallizing and very stable reaction products give, when added to acidic nickel baths, an increased luster effect and, above all, have an excellent leveling effect. The simplest representative is the inner salt of pyridinium-N-propane-cü-sulfonic acid of the formula below
CH9 · CH9 · CH,CH 9 · CH 9 · CH,
An Stelle des Pyridins können dessen C-substituierten Homologen treten, z. B. die isomeren Picoline, Lutidine, Äthylpyridine u. a. m., ferner mehrkernige heterocyclische Stickstoffbasen z. B. Chinolin, Isochinolin, Chinaldin, Lepidin, Acridin, Phenanthridin u. a. m. Weiterhin können an seine Stelle heterocyclische Stickstoffbasen vom aromatischen Typ treten, die zwei und mehr Stickstoffatome im aromatischen System enthalten, z. B. Pyridazin, Pyrimidin, Pyrazin, Phthalazin, Chinazolin, Chinoxalin, Phenazin u. a., die gegebenenfalls auch an mehreren Stickstoffatomen mit Sultonen umgesetzt sein können. Die Stickstoffbasen können auch durch Substituenten, wie Halogene, Nitrogruppen usw. substituiert sein.Instead of the pyridine its C-substituted homologues can occur, e.g. B. the isomeric picolines, lutidines, Ethyl pyridines et al. m., Also polynuclear heterocyclic nitrogen bases z. B. quinoline, isoquinoline, quinaldine, Lepidine, acridine, phenanthridine and others. m. Furthermore, heterocyclic nitrogen bases can take its place occur of the aromatic type containing two or more nitrogen atoms in the aromatic system, e.g. B. Pyridazine, pyrimidine, pyrazine, phthalazine, quinazoline, quinoxaline, phenazine and others, which may also include several nitrogen atoms can be implemented with sultones. The nitrogen bases can also be replaced by substituents such as halogens, nitro groups, etc. may be substituted.
Als Sultone (cyclische Anhydride organischer Oxyalkansulfonsäuren), die zum Aufbau der erfindungsgemäßen Mittel Verwendung finden können, sind neben dem 1, 3-Propan- bzw. 1, 4-Butan-sulton auch solche verwendbar, die in der aliphatischen Kette an einem beliebigen Kohlenstoffatom einen Substituenten tragen, z. B. 1, 1-Dimethyl-l, 3-propansulton (Isopentansulton) und endlich solche, bei denen Kohlenstoffatome eines cycloaliphatischen oder aromatischen Ringsystems Bestandteile des Sulton-Ringes darstellen, z. B. Tolylsulton, 1, 8-Naphthsulton u. a. m.As sultones (cyclic anhydrides of organic oxyalkanesulfonic acids), which can be used to build up the agents according to the invention are in addition to the 1, 3-propane or 1, 4-butane sultone can also be used in the aliphatic chain at any one Carbon atom carry a substituent, e.g. B. 1, 1-dimethyl-l, 3-propane sultone (isopentane sultone) and finally those in which carbon atoms of a cycloaliphatic represent or aromatic ring system components of the Sulton ring, z. B. tolyl sultone, 1,8-naphthsultone et al. m.
Saures galvanisches NickelbadAcid galvanic nickel bath
Anmelder:
DEHYDAG,Applicant:
DEHYDAG,
Deutsche Hydrierwerke G.m.b.H.,
Düsseldorf, Henkelstr. 67Deutsche Hydrierwerke GmbH,
Düsseldorf, Henkelstr. 67
Dr. Wolfgang Gündel, Düsseldorf-Oberkassel,Dr. Wolfgang Gündel, Düsseldorf-Oberkassel,
und Dr. Wennemar Strauss, Düsseldorf-Holthausen,and Dr. Wennemar Strauss, Düsseldorf-Holthausen,
sind als Erfinder genannt wordenhave been named as inventors
Die aus den Aminbasen und den Sultonen erhältlichen Umsetzungsprodukte, die erfindungsgemäß als Glanz- und Einebnungsmittel für saure Nickelbäder verwendet werden sollen, werden vorzugsweise als solche, d. h. in Form ihrer inneren Salze, zur Anwendung gebracht. Man kann jedoch auch das cyclische Salz durch Behandeln mit geeigneten anorganischen Basen aufspalten und die Verbindungen in Form ihrer sulfosäuren Metallsalze verwenden.The reaction products obtainable from the amine bases and the sultones, which according to the invention are used as gloss and leveling agents to be used for acidic nickel baths are preferably used as such, i.e. H. in Form of their internal salts. However, the cyclic salt can also be treated by treatment split with suitable inorganic bases and the compounds in the form of their sulfonic acids metal salts use.
Die Anwendungskonzentrationen für die erfindungsgemäßen Mittel liegen zwischen 0,1 und 10 g/l, vorzugsweise bei 0,4 bis 1 g/l. Im allgemeinen wird bei Temperaturen von etwa 60° C und bei Stromdichten bis 8 Amp./dm2 galvanisiert.The use concentrations for the agents according to the invention are between 0.1 and 10 g / l, preferably 0.4 to 1 g / l. In general, electroplating is carried out at temperatures of about 60 ° C. and at current densities of up to 8 amps / dm 2.
Die erfindungsgemäßen Mittel können zusammen mit bekannten Glanzmitteln, Porenverhütungsmitteln, Netzmitteln oder Leitsalzen verwendet werden für alle üblichen Metallunterlagen, wie Eisen, Aluminium, Kupfer, Messing usw.The agents according to the invention can be used together with known gloss agents, anti-pore agents, wetting agents or conductive salts are used for all common metal substrates, such as iron, aluminum, copper, Brass etc.
Als besonders wertvoll hat sich erwiesen, daß die erfindungsgemäßen Mittel in Kombination mit bekannten Glanzmitteln, insbesondere den bekannten Diaryldisulfimiden oder deren Salzen, z. B. mit Ditolyldisulfimid, eine spezifische Einebnungswirkung besitzen, ohne daß dadurch die Qualität der mit den bekannten Mitteln erhältlichen hochwertigen Nickelniederschläge, insbesondere die Duktilität dieser Niederschläge, beeinträchtigt wird. Die erfindungsgemäßen Galvanisierungsmittel sind auch für das Trommelvernicklungsverfahren geeignet.It has proven to be particularly valuable that the agents according to the invention in combination with known Brighteners, especially the known diaryldisulfimides or their salts, e.g. B. with ditolyl disulfimide, have a specific leveling effect without affecting the quality of the known agents available high-quality nickel precipitates, in particular the ductility of these precipitates, impaired will. The electroplating agents according to the invention are also suitable for the drum nickel plating process.
Es ist bereits vorgeschlagen worden, galvanischen Nickelbädern isocyclische, aromatische Sultone als Glanzmittel zuzusetzen. Demgegenüber handelt es sich bei den erfindungsgemäßen Bädern um den Zusatz von Sulfobetainen, welche sich von stickstoffhaltigen heterocyclischen Ringsystemen ableiten, welche salzartigenIt has already been proposed that isocyclic, aromatic sultones be used as brightening agents by electroplating nickel baths to add. In contrast, the baths according to the invention involve the addition of sulfobetaines, which are derived from nitrogen-containing heterocyclic ring systems, which are salt-like
609 838/336609 838/336
Charakter besitzen und überdies neben der Glanzwirkung einen hervorragenden Einebnungseffekt aufweisen. Des weiteren wurden galvanischen Nickelbädern bereits heterocyclische Stickstoffbasen zusammen mit schwefelhaltigen Glanzmitteln zugesetzt. Auch mit diesen bekannten Badverbesserungsmitteln haben die erfindungsgemäßen Zusätze nichts gemeinsam. Die letzteren besitzen im übrigen die spezifisch einebnende Wirkung, die den bekannten Mitteln nicht eigen ist.Have character and, in addition to the gloss effect, have an excellent leveling effect. Of further galvanic nickel baths were already heterocyclic nitrogen bases together with sulfur-containing ones Gloss agents added. Even with these known bath improvers, those according to the invention have Additions nothing in common. The latter also have the specific leveling effect, which is not peculiar to the known means.
1010
In einem Nickelbäd vom Watts-Typ werden 4 bis 8 g/l Ditolyl-disulfimid-natrium und 0,8 g/l des inneren Salzes der Pyridinium-N-propan-(w-sulfonsäure gelöst. Galvanisiert man in diesem Bad Eisen- oder Kupferbleche bei 60° C unter Anwendung einer mittleren Stromdichte von 6 Amp./qdm, so erhält man hochglänzende, duktile Nickelniederschläge, die sich durch einen besonderen Einebnungseffekt auszeichnen.In a Watts-type nickel bath there will be 4 to 8 g / l Ditolyl disulfimide sodium and 0.8 g / l of the inner salt of pyridinium N-propane (w-sulfonic acid dissolved. Galvanized one in this bath iron or copper sheets at 60 ° C using an average current density of 6 Amp./qdm, you get high-gloss, ductile nickel deposits, which are characterized by a special Distinguish the leveling effect.
2020th
Claims (5)
Chem. Zentralblatt 1950, II, S. 2120;Canadian Patent No. 463174
Chem. Zentralblatt 1950, II, p. 2120;
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE545564D BE545564A (en) | 1955-03-16 | ||
| NL100419D NL100419C (en) | 1955-03-16 | ||
| NL205377D NL205377A (en) | 1955-03-16 | ||
| DED20039A DE1004011B (en) | 1955-03-16 | 1955-03-16 | Acid galvanic nickel bath |
| CH341691D CH341691A (en) | 1955-03-16 | 1956-02-22 | Process for the production of electroplated nickel coatings |
| GB7388/56A GB815916A (en) | 1955-03-16 | 1956-03-09 | Process for the production of electrolytic nickel coatings using internal salts of aromatic bases as plating bath additives |
| US571125A US2876177A (en) | 1955-03-16 | 1956-03-13 | Additives for nickel electroplating baths |
| FR1143382D FR1143382A (en) | 1955-03-16 | 1956-03-14 | Process for preparing galvanic nickel coatings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED20039A DE1004011B (en) | 1955-03-16 | 1955-03-16 | Acid galvanic nickel bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1004011B true DE1004011B (en) | 1957-03-07 |
Family
ID=7036582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DED20039A Pending DE1004011B (en) | 1955-03-16 | 1955-03-16 | Acid galvanic nickel bath |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US2876177A (en) |
| BE (1) | BE545564A (en) |
| CH (1) | CH341691A (en) |
| DE (1) | DE1004011B (en) |
| FR (1) | FR1143382A (en) |
| GB (1) | GB815916A (en) |
| NL (2) | NL100419C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1182930B (en) * | 1961-06-12 | 1964-12-03 | Dehydag Gmbh | Process for the regeneration of nickel baths |
| US3190821A (en) * | 1961-02-10 | 1965-06-22 | Schering Ag | Nickel plating brightener |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1191652B (en) * | 1963-05-15 | 1965-04-22 | Dehydag Gmbh | Acid galvanic nickel bath |
| US3349015A (en) * | 1963-07-17 | 1967-10-24 | M & T Chemicals Inc | Electrodeposition of bright nickel |
| SE307487B (en) * | 1963-12-17 | 1969-01-07 | Candor Kemiska Ab | |
| FR1418245A (en) * | 1964-10-08 | 1965-11-19 | Pernix Enthone | New brightening agents for galvanic baths, in particular for nickel plating baths |
| FR1418244A (en) * | 1964-10-08 | 1965-11-19 | Pernix Enthone | New sultones and their application as leveling agents for electrolytic coatings, especially nickel |
| US3336324A (en) * | 1966-06-24 | 1967-08-15 | Cilag Chemie | N-allyl-pyridine-3-sulfonic acid betaine |
| US3862019A (en) * | 1974-04-26 | 1975-01-21 | R O Hull & Company Inc | Composition of electroplating bath for the electrodeposition of bright nickel |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| US4638005A (en) * | 1983-03-18 | 1987-01-20 | The Coca-Cola Company | Monoquaternized pyrazinium compounds and their use as electron carriers in photosynthetic processes |
| DE3817722A1 (en) | 1988-05-25 | 1989-12-14 | Raschig Ag | USE OF 2-SUBSTITUTED ETHANESULPHONE COMPOUNDS AS GALVANOTECHNICAL AUXILIARIES |
| IT1232841B (en) * | 1989-02-03 | 1992-03-05 | Kemifar Spa | ACTIVATING COMPOSITION FOR THE METALLIZATION OF INSULATING SUBSTRATES AND METALIZATION PROCEDURE OF SUCH SUBSTRATES USING THE SAME |
| DE4013349A1 (en) * | 1990-04-23 | 1991-10-24 | Schering Ag | 1- (2-SULFOAETHYL) PYRIDINIUMBETAIN, METHOD FOR THE PRODUCTION THEREOF AND ACID NICKEL BATH CONTAINING THIS COMPOUND |
| US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
| US7300563B2 (en) * | 2003-02-07 | 2007-11-27 | Pavco, Inc. | Use of N-alllyl substituted amines and their salts as brightening agents in nickel plating baths |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA463174A (en) * | 1950-02-14 | Canadian Industries Limited | Electrodeposition of nickel | |
| DE888191C (en) * | 1950-07-17 | 1953-08-31 | Udylite Corp | Bath and process for galvanic nickel plating |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2469727A (en) * | 1944-03-30 | 1949-05-10 | Du Pont | Electrodeposition of nickel |
| US2647866A (en) * | 1950-07-17 | 1953-08-04 | Udylite Corp | Electroplating of nickel |
-
0
- BE BE545564D patent/BE545564A/xx unknown
- NL NL205377D patent/NL205377A/xx unknown
- NL NL100419D patent/NL100419C/xx active
-
1955
- 1955-03-16 DE DED20039A patent/DE1004011B/en active Pending
-
1956
- 1956-02-22 CH CH341691D patent/CH341691A/en unknown
- 1956-03-09 GB GB7388/56A patent/GB815916A/en not_active Expired
- 1956-03-13 US US571125A patent/US2876177A/en not_active Expired - Lifetime
- 1956-03-14 FR FR1143382D patent/FR1143382A/en not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA463174A (en) * | 1950-02-14 | Canadian Industries Limited | Electrodeposition of nickel | |
| DE888191C (en) * | 1950-07-17 | 1953-08-31 | Udylite Corp | Bath and process for galvanic nickel plating |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3190821A (en) * | 1961-02-10 | 1965-06-22 | Schering Ag | Nickel plating brightener |
| DE1182930B (en) * | 1961-06-12 | 1964-12-03 | Dehydag Gmbh | Process for the regeneration of nickel baths |
Also Published As
| Publication number | Publication date |
|---|---|
| US2876177A (en) | 1959-03-03 |
| BE545564A (en) | |
| FR1143382A (en) | 1957-09-30 |
| CH341691A (en) | 1959-10-15 |
| NL205377A (en) | |
| GB815916A (en) | 1959-07-01 |
| NL100419C (en) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1004011B (en) | Acid galvanic nickel bath | |
| DE1053274B (en) | Bath for the production of galvanic metal coatings | |
| DE971806C (en) | Electroplated nickel plating | |
| DE1207177B (en) | Process for the production of shiny galvanic metal coatings | |
| DE1098781B (en) | Bath for the production of high-gloss galvanic metal coatings | |
| CH377611A (en) | Process for the production of metal coatings | |
| DE2900501C2 (en) | Aqueous cyanide-free bath for the electrodeposition of shiny zinc coatings and method for the electrodeposition of such coatings using the bath | |
| DE1007592B (en) | Bath for the production of galvanic metal coatings | |
| DE1066068B (en) | Electrolyte for galvanic deposition of mirror-shining, leveled, ductile nickel deposits | |
| DE1214069B (en) | Galvanic copper baths | |
| CH619987A5 (en) | ||
| DE1184172B (en) | Process for the galvanic deposition of firmly adhering and high-gloss copper coatings | |
| DE2319197C3 (en) | Aqueous bath and process for the galvanic deposition of a ductile, firmly adhering zinc coating | |
| EP0343559B1 (en) | Use of 2-substituted ethane sulfone compounds as galvanic auxiliary agents | |
| DE1204044B (en) | Shiny galvanic metal baths | |
| DE2326300A1 (en) | Aqueous ACID ZINC GALVANIZATION BATH AND PROCESS | |
| DE1030133B (en) | Process for the production of galvanic copper coatings | |
| DE2741347A1 (en) | BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF ALLOYS BASED ON PALLADIUM | |
| DE1621157A1 (en) | Acid galvanic nickel bath | |
| DE3317669C2 (en) | Aqueous bath and process for the electroplating of bright zinc coatings | |
| DE1208593B (en) | Acid galvanic nickel bath for the deposition of semi-glossy coatings | |
| DE1084098B (en) | Acid baths for the production of galvanic copper coatings | |
| DE1092744B (en) | Acid galvanic nickel bath | |
| DE1621117A1 (en) | Process for the electrolytic deposition of nickel coating | |
| DE1233690B (en) | Galvanic nickel bath |