CN1228189C - 平版印刷版原版及其制造方法 - Google Patents
平版印刷版原版及其制造方法 Download PDFInfo
- Publication number
- CN1228189C CN1228189C CN 02146060 CN02146060A CN1228189C CN 1228189 C CN1228189 C CN 1228189C CN 02146060 CN02146060 CN 02146060 CN 02146060 A CN02146060 A CN 02146060A CN 1228189 C CN1228189 C CN 1228189C
- Authority
- CN
- China
- Prior art keywords
- lithographic printing
- original edition
- printing plate
- acid
- aluminium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000007639 printing Methods 0.000 claims abstract description 274
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 249
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 237
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 26
- 230000035945 sensitivity Effects 0.000 claims abstract description 10
- 239000004411 aluminium Substances 0.000 claims description 212
- 238000000034 method Methods 0.000 claims description 208
- 239000011248 coating agent Substances 0.000 claims description 170
- 238000000576 coating method Methods 0.000 claims description 170
- 238000011282 treatment Methods 0.000 claims description 117
- 239000002245 particle Substances 0.000 claims description 111
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- 238000007254 oxidation reaction Methods 0.000 claims description 96
- 239000007788 liquid Substances 0.000 claims description 84
- 150000001875 compounds Chemical class 0.000 claims description 69
- 238000004519 manufacturing process Methods 0.000 claims description 48
- 239000003094 microcapsule Substances 0.000 claims description 45
- 230000008569 process Effects 0.000 claims description 45
- 229920000642 polymer Polymers 0.000 claims description 41
- 230000009257 reactivity Effects 0.000 claims description 34
- 125000000524 functional group Chemical group 0.000 claims description 30
- 238000005520 cutting process Methods 0.000 claims description 26
- 150000001398 aluminium Chemical class 0.000 claims description 10
- 238000011161 development Methods 0.000 abstract description 19
- 230000015572 biosynthetic process Effects 0.000 abstract description 12
- 238000004611 spectroscopical analysis Methods 0.000 abstract description 3
- 238000007599 discharging Methods 0.000 abstract 1
- -1 silicate compound Chemical class 0.000 description 163
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 134
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 53
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 36
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- 230000002378 acidificating effect Effects 0.000 description 35
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 35
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- 150000003839 salts Chemical class 0.000 description 22
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 8
- 238000010306 acid treatment Methods 0.000 description 8
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 8
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- 229910052802 copper Inorganic materials 0.000 description 7
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
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- 239000002002 slurry Substances 0.000 description 7
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 6
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- 229910019142 PO4 Inorganic materials 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
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- 238000006748 scratching Methods 0.000 description 1
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- 239000000344 soap Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229960005137 succinic acid Drugs 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229960003080 taurine Drugs 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 150000003538 tetroses Chemical class 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical class S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 229910021341 titanium silicide Inorganic materials 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- NLLZTRMHNHVXJJ-UHFFFAOYSA-J titanium tetraiodide Chemical compound I[Ti](I)(I)I NLLZTRMHNHVXJJ-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- ZBZHVBPVQIHFJN-UHFFFAOYSA-N trimethylalumane Chemical compound C[Al](C)C.C[Al](C)C ZBZHVBPVQIHFJN-UHFFFAOYSA-N 0.000 description 1
- 150000003641 trioses Chemical class 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910021342 tungsten silicide Inorganic materials 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YEIGUXGHHKAURB-UHFFFAOYSA-N viridine Natural products O=C1C2=C3CCC(=O)C3=CC=C2C2(C)C(O)C(OC)C(=O)C3=COC1=C23 YEIGUXGHHKAURB-UHFFFAOYSA-N 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
- 229910021355 zirconium silicide Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
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- Materials For Photolithography (AREA)
Abstract
Description
| 组成 | Fe(Wt%) | Si(Wt%) | Cu(Wt%) | Ti(Wt%) | Mn(Wt%) | Mg(Wt%) | Zn(Wt%) | Cr(Wt%) | 其它(Wt%) | Al(Wt%) |
| A | 0.31 | 0.06 | 0.01 | 0.03 | 0.01 | 0.01 | 0.0 | 0.01 | 0.01 | 99.55 |
| 支撑体 | 感热层 | C/Al | 孔隙率(%) | 微孔孔径(nm) | 起脏 | 背面蹭脏(页) | 感光度(m/cm2) | 耐印性(万页) | |
| 实施例1 | 1 | (1) | 0.88 | 60 | 40 | ○△ | 19 | 190 | 2.2 |
| 实施例2 | 2 | (1) | 0.65 | 55 | 8 | ○ | 15 | 180 | 1.9 |
| 实施例3 | 3 | (1) | 0.62 | 40 | 12 | ○ | 16 | 180 | 2.0 |
| 比较例1 | 4 | (1) | 1.09 | 15 | 10 | ○ | 19 | 370 | 0.1 |
| 比较例2 | 5 | (1) | 1.10 | 40 | 15 | × | 48 | 250 | 0.5 |
| 实施例4 | 1 | (2) | 0.88 | 60 | 40 | ○△ | 19 | 230 | 1.8 |
| 实施例5 | 2 | (2) | 0.65 | 55 | 8 | ○ | 15 | 220 | 1.7 |
| 实施例6 | 3 | (2) | 0.62 | 40 | 12 | ○ | 16 | 200 | 2.0 |
| 比较例3 | 4 | (2) | 1.09 | 15 | 10 | ○△ | 19 | 390 | 0.1 |
| 比较例4 | 5 | (2) | 1.10 | 40 | 15 | × | 48 | 270 | 0.5 |
| 阳极氧化被膜 | 粒子层 | ||||||||||||
| 电解液 | 扩孔处理 | 微孔孔径(nm) | 孔隙率(%) | 处理液的种类 | 粒子的平均粒径(nm) | 粒子的热传导率(W/(m*k) | 形成方法 | 处理液固体成分浓度(质量%) | 处理液温度(C) | 处理时间 | C/Al | ||
| 温度(℃) | 时间(秒) | ||||||||||||
| 实施例7 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.64 |
| 实施例8 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 浸泡处理 | 0.2 | 70 | 14 | 0.68 |
| 实施例9 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事XL | 40-60 | 10 | 浸泡处理 | 0.2 | 70 | 14 | 0.78 |
| 实施例10 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事ZL | 70-100 | 10 | 浸泡处理 | 0.2 | 70 | 14 | 0.82 |
| 实施例11 | 硫酸 | 30 | 60 | 15 | 50 | Al2O3水悬浊液 | 15 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.74 |
| 实施例12 | 硫酸 | 30 | 60 | 15 | 50 | Al2O3水悬浊液 | 750 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.88 |
| 实施例13 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.58 |
| 实施例14 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 浸泡处理 | 0.2 | 70 | 14 | 0.54 |
| 实施例15 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.64 |
| 实施例16 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 浸泡处理 | 0.2 | 70 | 14 | 0.54 |
| 实施例17 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.01 | 70 | 14 | 0.92 |
| 实施例18 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 5 | 70 | 14 | 0.64 |
| 实施例19 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 10 | 70 | 14 | 0.72 |
| 实施例20 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 10 | 14 | 0.59 |
| 实施例21 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 85 | 14 | 0.69 |
| 实施例22 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶 | 10-20 | 36 | 浸泡 | 0.2 | 70 | 2 | 0.64 |
| 520 | 处理 | ||||||||||||
| 实施例23 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 120 | 0.58 |
| 实施例24 | 硫酸 | - | - | 7 | 16 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.59 |
| 实施例25 | 硫酸 | 30 | 30 | 10 | 25 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.69 |
| 实施例26 | 硫酸 | 30 | 65 | 18 | 60 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.68 |
| 实施例27 | 硫酸 | 30 | 70 | 20 | 75 | 氧化铝溶胶520 | 10-20 | 36 | 浸泡处理 | 0.2 | 70 | 14 | 0.79 |
| 亲水化处理 | 感光度(mJ/cm2) | 耐印性(千页) | 起脏(页) | |
| 实施例7 | 硅酸盐 | 250 | 15 | 18 |
| 实施例8 | 硅酸盐 | 250 | 14 | 18 |
| 实施例9 | 硅酸盐 | 250 | 14 | 18 |
| 实施例10 | 硅酸盐 | 250 | 13 | 18 |
| 实施例11 | 硅酸盐 | 250 | 13 | 20 |
| 实施例12 | 硅酸盐 | 250 | 12 | 20 |
| 实施例13 | 聚乙烯基膦酸 | 250 | 14 | 20 |
| 实施例14 | 聚乙烯基膦酸 | 250 | 14 | 20 |
| 实施例15 | 无 | 250 | 15 | 23 |
| 实施例16 | 无 | 250 | 14 | 23 |
| 实施例17 | 硅酸盐 | 300 | 12 | 20 |
| 实施例18 | 硅酸盐 | 250 | 14 | 15 |
| 实施例19 | 硅酸盐 | 250 | 12 | 23 |
| 实施例20 | 硅酸盐 | 300 | 12 | 18 |
| 实施例21 | 硅酸盐 | 250 | 14 | 23 |
| 实施例22 | 硅酸盐 | 300 | 12 | 20 |
| 实施例23 | 硅酸盐 | 280 | 15 | 23 |
| 实施例24 | 硅酸盐 | 320 | 12 | 15 |
| 实施例25 | 硅酸盐 | 280 | 12 | 15 |
| 实施例26 | 硅酸盐 | 250 | 15 | 18 |
| 实施例27 | 硅酸盐 | 280 | 15 | 20 |
| 阳极酸化被膜 | 粒子层 | ||||||||||
| 电解液 | 扩孔处理 | 微孔孔径(nm) | 孔隙率(%) | 处理液的种类 | 粒子的平均直径(nm) | 粒子的热传导率(W/(mK) | 形成方法 | 处理液固体成分浓度(质量%) | C/Al | ||
| 温度(C) | 时间(秒) | ||||||||||
| 实施例28 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.62 |
| 实施例29 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 涂敷 | 0.2 | 0.64 |
| 实施例30 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事XL | 40-60 | 10 | 涂敷 | 0.2 | 0.72 |
| 实施例31 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事ZL | 70-100 | 10 | 涂敷 | 0.2 | 0.83 |
| 实施例 | 硫酸 | 30 | 60 | 15 | 50 | Al2O3水 | 15 | 36 | 涂敷 | 0.2 | 0.72 |
| 32 | 悬浊液 | ||||||||||
| 实施例33 | 硫酸 | 30 | 60 | 15 | 50 | Al2O3水悬浊液 | 750 | 36 | 涂敷 | 0.2 | 0.88 |
| 实施例34 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.58 |
| 实施例35 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 涂敷 | 0.2 | 0.52 |
| 实施例36 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.57 |
| 实施例37 | 硫酸 | 30 | 60 | 15 | 50 | 是糯特库事N | 10-20 | 10 | 涂敷 | 0.2 | 0.53 |
| 实施例38 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.01 | 0.89 |
| 实施例39 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 5 | 0.62 |
| 实施例40 | 硫酸 | 30 | 60 | 15 | 50 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 10 | 0.74 |
| 实施例41 | 硫酸 | 7 | 16 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.58 | ||
| 实施例42 | 硫酸 | 30 | 30 | 10 | 25 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.68 |
| 实施例43 | 硫酸 | 30 | 65 | 18 | 60 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.62 |
| 实施例44 | 硫酸 | 30 | 70 | 20 | 75 | 氧化铝溶胶520 | 10-20 | 36 | 涂敷 | 0.2 | 0.69 |
| 实施例45 | 硫酸 | 30 | 60 | 15 | 50 | Al2O3水悬浊液 | 15 | 36 | 电解 | 0.5 | 0.72 |
| 亲水化处理 | 感光度(mJ/cm2) | 耐印性(千页) | 耐起脏性(页) | |
| 实施例28 | 硅酸盐 | 250 | 16 | 20 |
| 实施例29 | 硅酸盐 | 250 | 15 | 18 |
| 实施例30 | 硅酸盐 | 250 | 15 | 18 |
| 实施例31 | 硅酸盐 | 250 | 15 | 18 |
| 实施例32 | 硅酸盐 | 250 | 13 | 20 |
| 实施例33 | 硅酸盐 | 250 | 12 | 20 |
| 实施例34 | 聚乙烯基膦酸 | 250 | 15 | 20 |
| 实施例35 | 聚乙烯基膦酸 | 250 | 15 | 20 |
| 实施例36 | 无 | 250 | 16 | 25 |
| 实施例37 | 无 | 250 | 15 | 25 |
| 实施例38 | 硅酸盐 | 300 | 12 | 20 |
| 实施例39 | 硅酸盐 | 250 | 14 | 20 |
| 实施例40 | 硅酸盐 | 250 | 14 | 23 |
| 实施例41 | 硅酸盐 | 320 | 12 | 18 |
| 实施例42 | 硅酸盐 | 280 | 14 | 18 |
| 实施例43 | 硅酸盐 | 250 | 16 | 20 |
| 实施例44 | 硅酸盐 | 280 | 15 | 25 |
| 实施例45 | 硅酸盐 | 300 | 12 | 45 |
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| JP200120496 | 2001-07-05 | ||
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| CN102575356A (zh) * | 2009-10-16 | 2012-07-11 | 汉高股份有限及两合公司 | 制备耐碱的阳极氧化铝表面的多步骤方法 |
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| JP4684685B2 (ja) * | 2005-03-03 | 2011-05-18 | 富士フイルム株式会社 | 感光性平版印刷版及びその製造方法 |
| CN100355945C (zh) * | 2005-03-18 | 2007-12-19 | 中国兵器工业第五九研究所 | 铝合金材料氟聚合物协合涂层处理工艺 |
| DE602006017047D1 (de) * | 2006-06-14 | 2010-11-04 | Eastman Kodak Co | Verfahren zur Verarbeitung von Fotopolymer-Druckplatten, die eine Deckschicht enthalten |
| CN100570017C (zh) * | 2006-09-25 | 2009-12-16 | 江苏中联科技集团有限公司 | 枝杈孔铝阳极箔的扩面侵蚀方法 |
| CN101320208B (zh) * | 2008-07-21 | 2011-06-01 | 上海复旦天臣新技术有限公司 | 反射全息薄膜及其制备方法 |
| CN102127787B (zh) * | 2011-04-02 | 2013-05-29 | 惠州市绿标光电科技有限公司 | 一种铝基板表面结构处理方法 |
| CN102304740B (zh) * | 2011-08-05 | 2014-07-30 | 金安国纪科技(珠海)有限公司 | 覆铜板用铝基的加工处理方法 |
| EP3112178B1 (en) * | 2014-02-26 | 2018-05-16 | Fujifilm Corporation | On-machine development type lithographic printing plate precursor processing method and printing method |
| WO2017168831A1 (ja) * | 2016-03-30 | 2017-10-05 | 富士フイルム株式会社 | 機上現像用平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| WO2020085500A1 (ja) * | 2018-10-25 | 2020-04-30 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版原版積層体、及び、平版印刷版の作製方法 |
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2002
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102575356A (zh) * | 2009-10-16 | 2012-07-11 | 汉高股份有限及两合公司 | 制备耐碱的阳极氧化铝表面的多步骤方法 |
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