CN1196760A - 在玻璃上形成氧化锡涂层的方法 - Google Patents
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Abstract
本发明涉及在玻璃上形成氟掺杂氧化锡涂层的方法,该方法是通过提供一种含有机锡化合物,HF,水和氧气的,均匀的,气化的反应物混合物,并将该反应物混合物输送到该热玻璃带的表面上,在该表面上各种化合物发生反应以形成氟掺杂氧化锡涂层。根据本发明涂敷的氟掺杂氧化锡涂层显示出较低的薄膜电阻,并改进了在玻璃涂层表面上薄膜电阻的均匀性。
Description
发明领域
本发明主要涉及在玻璃上形成氧化锡涂层的方法,更具体地说,本发明涉及用化学蒸气沉积法在热玻璃衬底上制备氟掺杂的氧化锡涂层的方法。
发明背景
通常是通过连续涂敷玻璃衬底的方法来生产有涂层的玻璃制品,同时是在已知的“浮法玻璃工艺”的过程生产。该方法包括在适当封闭的熔化的锡浴上成形玻璃,经过充分地冷却后,将该玻璃转移到与该浴排成一行的移动滚筒上。当玻璃横过该滚筒向前时,先通过退火炉,此后被暴露到周围的大气中,并最终使该玻璃冷却。当该玻璃与熔化的锡浴接触时,为了防止氧化,该过程的浮法生产部分保持在非氧化气氛中。在退火炉中,保持空气的气氛。各种涂层的化学蒸气沉积(CVD)可在该浴或该退火炉,或甚至在它们之间的该过渡区里方便地实现,它借助于通过使热玻璃的表面与含反应物的化学蒸气接触,该反应物经高温热解以形成了该金属氧化物涂层。当然,要求该化学反应物的气化温度低于其热分解温度。存在几种锡的化合物,它们可通过使用CVD技术,经气化在玻璃上制备氧化锡涂层。
通过引入含掺杂剂的氧化锡涂层,可改进玻璃上的氧化锡涂层的所需特性,如低辐射系数,低薄膜电阻,高光透射率,高红外线反射率等等。在已有技术中已使用了几种物质作为掺杂剂,但对氧化锡涂层最有效的是元素氟。氟可以有机氟化物的形式引入沉积反应中,或以单独的含氟化合物与锡化合物反应而引入到沉积反应中。
在玻璃涂层的方法中使用的各种反应物的物理形态通常是液体,固体,气化的液体或固体,分散在载气混合物中的液体或固体,或分散在载气混合物中的气化的液体或固体。化学蒸气沉积方法中通常利用气化的液体或固体,它通常是分散在载气混合物中。
有机和无机锡化合物已用于氟掺杂氧化锡涂层的化学蒸气沉积法中。因此,例如美国专利号4,329,379公开了一种方法,该方法通过使玻璃与四氯化锡,氢氟酸(HF),空气和水的气化反应物接触,在热玻璃衬底上形成氟掺杂氧化锡涂层。类似地,美国专利号4,387,134提到氟掺杂氧化锡膜的薄膜电阻为1-10欧姆/方,该膜是通过将气化的水,甲醇,HF,四氯化锡和H2/N2气体组合物制备的。
另一方面,用于将掺杂的氧化锡涂层涂敷到玻璃上的其他较好的常规方法包括将有机锡化合物和含氟化合物的混合物气化,然后将这些气化的反应物对准热玻璃衬底的表面。这样的方法已在美国专利4,293,594中公开,该专利还推荐了含氧载气的使用。
另外,在美国专利4,590,096,中公开了使用有机锡化合物,有机氟掺杂物,空气和水蒸汽的混合物形成氟掺杂氧化锡涂层的化学蒸气沉积方法。在该方法中,据说该气流中含足够量的水蒸汽,使得在180℃时该气流的相对湿度约为6%到100%。
美国专利4,325,987,中公开了CVD法,其中在至少含30%氢气的载气中,四氯化锡和水蒸汽的气体混合物被输送到该玻璃的表面上。也可将单独的HF和水蒸汽的气体混合物输送到该玻璃的表面上。尽管较好的锡化合物是四氯化锡,这也是给出实例的唯一的锡化合物,但提到使用Sn(Alk)4这种类型的挥发性锡化合物和二丁基-二乙酰基锡的可能性,其中Alk指的是较低的烷基基团。因缺少怎样使用所提到的有机锡化合物来实施本发明的方法的任何信息,该公开内容未提供任何在这方面最新技术的进展情况。
必须指出,对以上所涉及到的已有技术已作收集并仅依据本发明的目的作了导向性的探讨。这并不意味在本发明的动机之外,对这类种种工艺技术会另行汇集。
希望改进迄今为止的将氟掺杂的氧化锡涂层涂敷到热玻璃衬底表面上的已知方法,并因此提高有涂层的玻璃制品的薄膜电阻的均匀性及低的薄膜电阻。也希望提供一种方法,该方法能将氟掺杂氧化锡涂层涂敷到热玻璃衬底表面上,并且比迄今为止的已知方法的成本更低。
发明概述
本发明涉及用化学蒸气沉积方法将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面。令人惊奇的是,已经发现在玻璃上的氟掺杂氧化锡涂层的所需性能可通过利用包括以下步骤的方法得到改进:a)提供热玻璃衬底,包括欲沉积氟掺杂氧化锡涂层的表面;b)提供均匀的,被气化的反应物混合物,该混合物含有机锡化合物,氟化氢,氧气和水;以及c)将该气化的反应物混合物输送到该热玻璃衬底的表面上;其中该均匀的,被气化的反应物混合物发生反应,将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
在优选实施例中,一种钠扩散膜,最好是二氧化硅层在氟掺杂氧化锡沉积前先被涂敷到玻璃衬底的表面上。本发明的方法尤其适用于生产具有氟掺杂氧化锡涂层的玻璃,可用于能量效率高的建筑窗,飞机或汽车窗,以及各种光学的和电子的设备。优选实施方案的详细描述
氟掺杂氧化锡涂层可借助通常已知的技术如化学蒸气沉积法(CVD)被沉积在热玻璃衬底的表面上。根据此方法,反应物被混合以便形成一种均匀的,气化的反应物流,该物流被输送到该热玻璃衬底的表面,其中该气化的反应物流发生反应,将氟掺杂的氧化锡涂层沉积在热玻璃衬底的表面上。在热玻璃表面必定存在的氧化气氛中,有机锡涂层化合物发生热解以生成该氧化锡涂层。
该方法通常是在以浮法玻璃工艺生产玻璃的过程中实施的,并且当该玻璃仍然热时,在浮法金属浴,退火炉或该浴和该退火炉之间的过渡区进行。该玻璃衬底通常的温度约为750°F~1500°F。此温度是浮法玻璃工艺过程的各工序中,玻璃所具有的典型温度。
适合用于本发明的玻璃衬底包括用于制备有涂层玻璃制品的已有技术中已知的任一种常规的玻璃衬底。在制造车辆窗和平板玻璃时所使用的典型的玻璃衬底通常被称为钠钙玻璃。其他合适的玻璃通常为碱-钙玻璃、硼-硅酸盐玻璃,铝-硅酸盐玻璃,硼-铝硅酸盐玻璃,磷酸盐玻璃,熔融石英等,以及它们的组合物。优选的玻璃是钠钙玻璃。
本发明的CVD反应物流包括有机锡涂层化合物、该化合物被气化并输送到向前移动的玻璃带的表面位置或其附近。用于实施本发明的合适的有机锡化合物不限于上面具体列举的那些,还包括二甲基二氯化锡,二乙基二氯化锡,二丁基二醋酸锡,四甲基锡,甲基三氯化锡,三乙基氯化锡,三甲基氯化锡,乙基三氯化锡,丙基三氯化锡,异丙基三氧化锡,另丁基三氯化锡,特丁基三氯化锡,苯基三氯化锡,乙酯基乙基三氯化锡,以及诸如此类,以及它们的组合物。这些化合物在CVD技术的工艺中通常是众所周知的,同时在市面上是可买得到的,并作为将锡化合物涂层涂敷到热玻璃上的原始化合物。优选的有机锡化合物是二甲基二氯化锡。为了生成气态有机锡反应物流,将该有机锡化合物,任选的载气,氧化剂,稳定剂,烃类,惰性气体等气化。此处使用的术语气态有机锡反应物流典型的包括气化的有机锡化合物,氧化剂,和惰性载气。
气化的有机锡化合物可用常规的已有技术的任一程序来制备,例如用热的载气流将分散的或流化的有机锡粉末气化或在填料床中将有机锡颗粒气化,或将溶液化的有机锡化合物注入到热的载气流中,或使载气通过液体有机锡化合物鼓泡。这些方法在美国专利3,852,098;2,780,553;4,351,861;4,571,350;3,970,037;4,212,663;和4,261,722中较完全地提出了,在此引入以供参考。用于制备含气化有机锡化合物的反应物流的优选方法是在混合气体存在下,在薄膜蒸发器中使该化合物气化,正如在美国专利5,090,985中所公开的那样,在此也全部引入以供参考。正如上面所指出的,通常含如氦气,氮气或氩气或其混合物的惰性气体的气体流可任选地含有像水或氧气这样的氧化剂。优选载气是氦气和氮气以及其混合物,其中还含有作为氧化剂的氧气。所得到的含气化的有机锡化合物的反应物流通常被加热到约250°F到约450°F,然后被输送到热玻璃衬底表面处的反应区。
气态氟化氢或氢氟酸(此处用的“HF”指的是氟化氢气体或氢氟酸)与气化的有机锡化合物混合。含单独HF的反应物流通常包含HF和载体,优选的是包括水蒸汽。将水加入到含HF的反应物流中可降低涂层玻璃的辐射系数,同时又增加沉积的氟掺杂氧化锡的生长速率。该含HF的反应物流另外还可能含有通常的辅助剂,到如氦气,氮气或氩气以及其混合物,还可含有氧化剂如氧。
将反应物输送到热玻璃衬底上欲沉积涂层的表面上之前,将含HF的反应物流与该有机锡反应物流在某一位置处混合,此位置最好较接近涂敷位置。含HF的反应物流可利用上述讨论的有关有机锡气化的方法之一来气化该化合物而制备或提供HF气体。在输送到热玻璃衬底之前,含HF的气化的反应物流可通过混合两种气流的方法与含气化的有机锡化合物的反应物流合并。另一种方法是,以液态或溶液状态存在的含HF的反应物流可注入到含气化的有机锡化合物的热反应物流中,由此气化含氟的溶液或液体化合物。合并后,含有机锡,HF,水和氧的气化反应物被输送到热玻璃表面,在此处它们相互反应,并将氟掺杂氧化锡涂层沉积在玻璃表面上。
在优选的实施例中,有机锡反应物流是通过在上述的一种蒸发器中气化二甲基二氯化锡和惰性载气如氮气,氦气或其混合物而生成的。然后将所得到的气流与气态氧气混合。同时,在第二蒸发器中将HF和水混合在一起,所得到的气态的HF和水蒸汽的反应物流再与气态的有机锡反应物流混合,以生成均匀的气态反应物流。该均匀的气态反应物流被送到热玻璃衬底的表面上,在那里氟掺杂氧化锡涂层被沉积在热玻璃衬底的表面上。该均匀的气态反应物流可通过任何合适的涂敷装置被送到该玻璃的表面上。在美国专利4,504,526中例举了一种较好的涂敷装置,在此全部引入以供参考。
根据本发明,被输送到热玻璃衬底表面的均匀的气态反应物混合物优选地包括(全部以摩尔百分数计)约10~60%氧气,约2~50%的水和约0.2~2%HF,最优选地包括约30%~50%氧气,约15~35%水,和约0.5~1.5%HF。该均匀的气态反应物的混合物也包含有机锡化合物,所要求的该锡化合物的浓度是随所要求的氧化锡涂层的厚度和该玻璃衬底的线速度而变化。因此,本领域技术人员所希望的是,在气态反应物混合物中所含的有机锡的数量要足以在所要求的衬底线速度下,涂敷所要求厚度的涂层。对典型的工业操作来说,该气态的反应物混合物通常要含约0.01~8%的有机锡。
当根据本发明形成氟掺杂氧化锡涂层时,也注意到最好是在该玻璃衬底和氟掺杂氧化锡涂层之间涂敷一层作为钠扩散膜的材料层。当根据本发明所沉积的氟掺杂氧化锡涂层被涂敷到在上述具有钠扩散膜层的玻璃上时,与直接涂敷到玻璃上相对比,已经发现,该涂层玻璃制品显示出较低的辐射系数,较低的薄膜电阻和较低的混浊度。该钠扩散层优选的是由二氧化硅形成。该二氧化硅层最好是使用常规的CVD技术形成。
在最优选的实施方案中,首先在热玻璃衬底表面沉积氧化锡薄膜,在其上沉积二氧化硅薄膜,使得在该玻璃和接着被沉积的氟掺杂氧化锡之间间形成氧化锡/二氧化硅底基层结构。在这个实施例中,该二氧化硅膜不仅起着钠扩散膜的作用,而且与第一(无掺杂的)氧化锡膜一起,有助于抑制所得到的有涂层的玻璃制品的虹彩。在美国专利4,377,613中公开了这类抗虹彩层的使用,全部引此以供参考。
必须指出,根据本发明为成功地混合和输送气化的反应物的过程条件不是很苛刻的。上述过程条件按实施本发明的常规方法被概括地公开了。然而,往往,所述的过程条件可能不能精确地应用到公开范围内所包括的每一种化合物。对发生这种情况的化合物会容易地被本领域技术人员所识别。在所有的这样的情况下,本方法可通过以本领域技术人员所公知的常规变更,例如通过增加或降低温度条件,通过改变有机锡和HF反应物的混合速率,通过气化工艺条件的例行变更等来成功地实施,或将其他一些常规的过程条件用于本发明的实施。
也要指出,本发明的方法可在已知的衬底上按需要重复,以便形成由一些连续层所组成的涂层,每一层的组成未必相同。很明显,当反应剂的流速给定时,该涂层的厚度与该衬底移动的速度有关。在这些情况下,如果需要,可通过并列使用2个或多个涂敷装置以增加反应的场所。用这种方法,在各层达冷却之前连续的各层进行重叠,结果产生了特别均匀的总涂层。
通过参考描述本发明的具体实施方案,可更容易地理解本发明。当然,该具体实施方案只是为了说明目的,在不违反本发明的实质和范围的情况下,还可以其它方案实施。
对照实例
熔化二甲基二氯化锡,然后使熔化了的二甲基二氯化锡在美国专利5,090,985中所说明的那一类型的薄膜蒸发器中进行气化。作为载气的氦也同时被引入该薄膜蒸发器中。薄膜蒸发器上安装有使温度保持在约350°F的蒸汽夹套。所形成的气态的DMT和氦气混合物离开该薄膜蒸发器并沿主反应物管道被输送。将气态氧气引入到主反应物管道中的该DMT/He气体流中。所形成的气体物流继续沿主反应物管道流动。
同时,将三氟乙酸(TFA)和水加入到温度维持在约400°F的第二薄膜蒸发器中。所得到的该气态TFA和水的混合物离开第二薄膜蒸发器,并通过与主反应物管道相连的加料管加料,该TFA/水的气体混合物与MDT/He/O2气流混合,经完全混合后形成均匀的气态反应物流。最终的气态反应物流由约(所有的百分数均以摩尔%计)44.2%氧气,22.1%水,30.2%氦气,0.97%TFA和2.53%DMT组成,最终气体混合物的总气体流量按制得的涂层玻璃制品的每米宽度计算,每分钟约为384标准升。
当使用美国专利4,504,526中涂敷装置,该气化的反应物流立即输送到玻璃带的表面、该玻璃表面上预先已用常规的CVD技术沉积了氧化锡第一薄膜和二氧化硅第二薄膜。该玻璃带以每分约466吋的线速度移动,其温度保持在1100°F~1200°F。该反应物流在热玻璃表面上反应,形成叠加在该二氧化硅和氧化锡膜上的氟掺杂氧化锡涂层。所得到的氟掺杂氧化锡涂层厚度约为3,200。
沿所得到的有涂层玻璃制品宽度上,以每隔2时增量测量该薄膜电阻。所得薄膜电阻每方为13.3到18.0欧姆之间,平均薄膜电阻每方为14.4欧姆。
实例
熔化二甲基二氯化物,然后使熔化了的二甲基二氯化锡在美国专利5,090,985中所说明的那一类型的薄膜蒸发器中进行气化。作为载气的氦也同时被引入该薄膜蒸发器中。薄膜蒸发器上安装有使温度保持在约350°F的蒸汽夹套。所得到的气DMT和氦气的混合物离开该薄膜蒸发器并沿着主反应物管道被输送。将气态氧气引入到主反应物管道中该DMT/He气体流中。所形成的气体物流继续沿着该主反应物管道流动。
同时,将HF水溶液加入到温度保持在约400°F的第二薄膜蒸发器中。并将另加的水引入到第二薄膜蒸发器中。所形成的气态HF和水的混合物离开第二薄膜蒸发器并通过与主反应物管道相连的加料管加料,该HF/水气体混合物与DMT/He/O2气流混合,经完全地混合后,形成均匀的气态反应物流。最终的气态混合物是由约(所有的百分数均以摩尔%计)42.9%氧气,24.6%水,29.3%氦气,0.70%HF,和2.5%DMT组成,最终气体混合物的总气体流量按制得的涂层玻璃制品的每米宽度计算,每分钟约为395标准升。
当使用美国专利4,504,526,中的涂敷装置,该气化的反应物流立即输送到玻璃带的表面,该玻璃带表面上预先已用常规的CVD技术沉积了氧化锡第一薄膜和二氧化硅第二薄膜。该玻璃带以每分约466吋的线速度移动,其温度保持在1100°~1200°F的范围内。该反应物流在该热玻璃的表面上反应,形成叠加在二氧化硅和氧化锡膜上的氟掺杂氧化锡涂层。所得到的氟掺杂氧化锡涂层的厚度约为3,200。
沿所得到的有涂层玻璃制品的宽度上,以每隔2吋增量测量该薄膜电阻。所得薄膜电阻每方为13.0~15.9欧姆之间,平均薄膜电阻每方为14.0欧姆。
Claims (19)
1.一种化学蒸气沉积方法,用于将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上,该方法包括以下步骤:
A)提供一种热玻璃衬底,该衬底包括欲沉积氟掺杂氧化锡涂层的表面;
B)提供一种均匀的,气化的反应物混合物,该混合物含有机锡化合物,氟化氢,氧气和水;以及
C)将气化的反应物混合物输送到热玻璃衬底表面上;
其中该均匀的,气化的反应物混合物发生反应,以将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
2.根据权利要求1的方法,其中玻璃选自钠-钙玻璃,碱-钙玻璃,硼硅酸盐玻璃,铝硅酸盐玻璃,磷酸盐玻璃,熔融石英玻璃,及其组合。
3.根据权利要求1的方法,其中玻璃是钠-钙玻璃。
4.根据权利要求1的方法,其中该有机锡化合物选自二甲基二氯化锡,二乙基二氯化锡,二丁基二醋酸锡,四甲基锡,甲基三氯化锡,三乙基氯化锡,三甲基氯化锡,乙基三氯化锡,丙基三氯化锡,异丙基三氯化锡,仲丁基三氯化锡,叔丁基三氯化锡,苯基三氯化锡,乙酯基乙基三氯化锡,以及其组合。
5.根据权利要求1的方法,其中有机锡化合物是二甲基二氯化锡。
6.根据权利要求1的方法,其中所提供的玻璃衬底的温度约为750°F~1500°F。
7.根据权利要求1的方法,其中均匀的,气化的反应物混合物还包括选自氦气,氮气,氩气和一氧化二氮中的一种或多种化合物。
8.根据权利要求1的方法,还包括在热玻璃衬底的表面上沉积一层起钠扩散膜作用的物质层的步骤,这样该物质就置于上述玻璃衬底表面和氟掺杂氧化锡涂层之间。
9.根据权利要求8的方法,其中在沉积氟掺杂氧化锡涂层前,在热玻璃衬底表面上沉积一层二氧化硅。
10.根据权利要求9的方法,其中该二氧化硅层是通过化学蒸气沉积方法沉积到热玻璃衬底表面上的。
11.根据权利要求9的方法,其中在二氧化硅层沉积前,在热玻璃衬底表面上沉积一层氧化锡。
12.根据权利要求1的方法,其中气体反应物混合物包含约0.2~2%(摩尔)的氟化氢。
13.根据权利要求2的方法,其中气体反应物混合物包含约0.5~1.5%(摩尔)的氟化氢。
14.根据权利要求1的方法,其中气体反应物混合物包含约2~50%(摩尔)的水。
15.根据权利要求14的方法,其中气体反应物混合物包含约15~35%(摩尔)的水。
16.根据权利要求1的方法,其中气体反应物混合物包含约10~60%(摩尔)的氧气。
17.根据权利要求16的方法,其中气体反应物混合物包含约30~50%(摩尔)的氧气。
18.一种化学蒸气沉积方法,用于将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上,该方法包括以下步骤:
A)提供一种温度约为750°F~1500°F的热玻璃衬底,该衬底包括欲沉积氟掺杂氧化锡涂层的表面;
B)提供一种均匀的,气化的反应物混合物,该混合物含有机锡化合物,约0.2~2%(摩尔)的氟化氢,约2~50%(摩尔)的水,和约10~60%(摩尔)的氧气;以及
C)将气化的反应物混合物输送到热玻璃衬底的表面上;
其中该均匀的,气化的反应物混合物发生反应,以将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
19.一种化学蒸汽沉积方法,用于将用氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上,该方法包括以下步骤:
A)提供一种温度为约750℃~1500°F的热玻璃衬底,该衬底包括欲沉积氟掺杂氧化锡涂层的表面,该表面涂敷有二氧化硅层;
B)提供一种均匀的,气化的反应物混合物,该混合物含有机锡化合物,约0.2~2%(摩尔)的氟化氢,约2~50%(摩尔)的水,和约10~60%(摩尔)的氧气;以及
C)将气化的反应物混合物输送到热玻璃衬底的表面上;
其中该均匀的,气化的反应物混合物发生反应,以将氟掺杂氧化锡涂层沉积在热玻璃衬底表面上的二氧化硅层上。
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| CN104294992A (zh) * | 2014-10-17 | 2015-01-21 | 宁波华尔克应用材料有限公司 | 一种节能玻璃砖及其制备方法 |
| CN104294992B (zh) * | 2014-10-17 | 2017-02-01 | 宁波华尔克应用材料有限公司 | 一种节能玻璃砖及其制备方法 |
| CN112851334A (zh) * | 2021-02-04 | 2021-05-28 | 宁波云川环保科技有限公司 | 一种基于氮化硅的加热体及其制备工艺 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0839218A1 (en) | 1998-05-06 |
| KR19990028727A (ko) | 1999-04-15 |
| EP0839218B1 (en) | 2002-01-09 |
| US5698262A (en) | 1997-12-16 |
| DE69709525T2 (de) | 2002-08-29 |
| DE69709525D1 (de) | 2002-02-14 |
| JPH11509895A (ja) | 1999-08-31 |
| RU2194089C2 (ru) | 2002-12-10 |
| PL324429A1 (en) | 1998-05-25 |
| AU2828197A (en) | 1997-11-26 |
| MX9800254A (es) | 1998-07-31 |
| BR9702244A (pt) | 1999-02-17 |
| ATE211779T1 (de) | 2002-01-15 |
| CA2225961A1 (en) | 1997-11-13 |
| EP0839218A4 (zh) | 1998-06-03 |
| WO1997042357A1 (en) | 1997-11-13 |
| PL185373B1 (pl) | 2003-04-30 |
| CN1122115C (zh) | 2003-09-24 |
| KR100577945B1 (ko) | 2006-08-30 |
| JP4322314B2 (ja) | 2009-08-26 |
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