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CN1160565C - Preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band - Google Patents

Preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band Download PDF

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CN1160565C
CN1160565C CNB011287756A CN01128775A CN1160565C CN 1160565 C CN1160565 C CN 1160565C CN B011287756 A CNB011287756 A CN B011287756A CN 01128775 A CN01128775 A CN 01128775A CN 1160565 C CN1160565 C CN 1160565C
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袁战恒
武明堂
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Xian Jiaotong University
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Abstract

宽温窄阻带厚膜空/燃比传感器的制备方法,根据N型过渡金属氧化物半导体在氧化气氛下晶界势垒高度的提高,还原气氛下晶界势垒高度的降低,采用金红石型TiO2结构对体内进行N型掺杂,晶界进行P型复合扩散。使样品在氧化气氛下,电导急剧降低,还原气氛下,急剧增加。采用厚膜工艺使样品在250℃~800℃范围内,使高温端氧化态下最低阻值和低温端还原态下的最高阻值出现1~3个数量级的差别。采用本制备方法使传感器性能大幅提高、成本低廉。The preparation method of wide temperature and narrow resistance band thick film air/fuel ratio sensor, according to the increase of grain boundary barrier height of N-type transition metal oxide semiconductor in oxidizing atmosphere and the reduction of grain boundary barrier height in reducing atmosphere, adopts rutile type TiO 2 structure N-type doping is carried out in the body, and P-type compound diffusion is carried out at the grain boundary. The conductivity of the sample decreases sharply in an oxidizing atmosphere, and increases sharply in a reducing atmosphere. The thick film process is used to make the sample in the range of 250 ° C to 800 ° C, so that the lowest resistance value in the oxidation state at the high temperature end and the highest resistance value in the reduction state at the low temperature end have a difference of 1 to 3 orders of magnitude. The performance of the sensor is greatly improved by adopting the preparation method, and the cost is low.

Description

宽温窄阻带厚膜空/燃比传感器的制备方法Preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band

一、技术领域1. Technical field

本发明涉及一种空/燃比控制传感器,更进一步涉及各类发动机、燃烧设备、器具的空/燃比控制用传感器的制备方法。The invention relates to an air/fuel ratio control sensor, and further relates to a preparation method of the sensor for air/fuel ratio control of various engines, combustion equipment and appliances.

二、背景技术2. Background technology

空/燃比控制用传感器已出现在市场上的有ZrO2浓差电池型、TiO2及其它氧化物单相混合的电阻型。ZrO2浓差电池型在室温~800℃范围内存在铅中毒、结构相变及价格较高的问题,在使用中存在早期失效及成本偏高的缺点。为此,人们对TiO2及其它氧化物单相混合电阻型传感器进行了大量的研究,由于在室温~800℃的宽温范围内存在:(1)宽阻带、还原态下呈现高阻态;(2)寿命较短;(3)信号电路复杂等缺点。所以至今仍未大量投入使用。新近又进行了IBMD法的研究,但由于制备成本较高,性能难以保证、加热温度高等问题,也未能普及。但随着汽车数量的上升,城市的空气污染主要来源于汽车尾气的排放,各类燃烧设备、器具及汽车发动机在空/燃比不当时,一方面会排出大量有害气体,污染环境;另一方面使能源不能得到充分利用,造成浪费。Air/fuel ratio control sensors have appeared on the market with ZrO 2 concentration cell type, TiO 2 and other oxide single-phase mixed resistance type. The ZrO 2 concentration battery type has the problems of lead poisoning, structural phase change and high price in the range of room temperature to 800 ℃, and has the disadvantages of early failure and high cost in use. For this reason, people have done a lot of research on TiO 2 and other oxide single-phase mixed resistance sensors, because in the wide temperature range from room temperature to 800 ° C, there are: (1) wide resistance band, high resistance state in the reduced state ; (2) Short life; (3) Shortcomings such as complex signal circuit. So it has not been put into use in large quantities so far. The research of IBMD method has been carried out again recently, but due to problems such as high preparation cost, difficulty in guaranteeing performance, and high heating temperature, it has not been popularized. However, with the increase in the number of automobiles, urban air pollution mainly comes from the emission of automobile exhaust. When the air/fuel ratio of various combustion equipment, appliances and automobile engines is improper, on the one hand, a large amount of harmful gases will be emitted, polluting the environment; on the other hand The energy cannot be fully utilized, resulting in waste.

三、发明内容3. Contents of the invention

本发明的目的在于克服上述现有技术的缺点,提供一种长寿命、低价格、高性能的宽温窄阻带厚膜空/燃比传感器的制备方法。本发明采用的技术方案是:根据N型过渡金属氧化物半导体在氧化气氛下晶界势垒高度的提高,还原气氛下晶界势垒高度的降低,采用金红石型TiO2结构对体内进行N型掺杂,晶界进行P型复合扩散。使样品在氧化气氛下,电导急剧降低,还原气氛下,急剧增加。采用厚膜工艺使样品在250℃~800℃范围内,使高温端氧化态下最低阻值和低温端还原态下的最高阻值出现1~3个数量级的差别。The purpose of the present invention is to overcome the above-mentioned shortcomings of the prior art, and provide a long-life, low-price, high-performance preparation method of a thick-film air/fuel ratio sensor with wide temperature and narrow resistance band. The technical scheme adopted in the present invention is: according to the improvement of the grain boundary barrier height of the N-type transition metal oxide semiconductor in the oxidizing atmosphere, and the reduction of the grain boundary barrier height in the reducing atmosphere, the N-type N-type transition metal oxide semiconductor is carried out in the body by using the rutile TiO2 structure. Doping, the grain boundary undergoes P-type recombination diffusion. The conductivity of the sample decreases sharply in an oxidizing atmosphere, and increases sharply in a reducing atmosphere. The thick film process is used to make the sample in the range of 250 ° C to 800 ° C, so that the lowest resistance value in the oxidation state at the high temperature end and the highest resistance value in the reduction state at the low temperature end have a difference of 1 to 3 orders of magnitude.

本发明的制备工艺为:The preparation process of the present invention is:

1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,置于1000℃~1350℃灼烧30分钟~4小时;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb)O2 - based rutile structure into a billet, and burning at 1000°C to 1350°C for 30 minutes to 4 hours;

2)将灼烧后的坯体细粉化后和(0~20)%wt中温玻璃粉混合,制成印刷用敏感浆料;2) Finely pulverize the calcined green body and mix it with (0-20)%wt medium-temperature glass powder to make a sensitive paste for printing;

3)在氧化铝基片上丝网印刷成叉指电极后,置于800℃~1000℃灼烧20分钟~1小时;3) After screen-printing the interdigitated electrodes on the alumina substrate, place them at 800°C to 1000°C for 20 minutes to 1 hour;

4)再用丝网印刷敏感浆料后,置于1000℃~1350℃灼烧1~2小时,将冷却速度控制在每分钟120℃~180℃,使样品冷却,制成敏感元件;4) After screen-printing the sensitive paste, place it at 1000°C-1350°C for 1-2 hours and control the cooling rate at 120°C-180°C per minute to cool the sample and make a sensitive element;

5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃~1000℃灼烧10~20分钟,使样品自然冷却;5) Use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and burn at 800°C to 1000°C for 10 to 20 minutes to cool the sample naturally;

6)在敏感元件背面丝网印刷加热器浆料、并置于650℃~850℃灼烧10~45分钟;6) Screen-print the heater paste on the back of the sensitive element, and burn it at 650°C-850°C for 10-45 minutes;

7)浸渍或涂敷10%~50%的催化剂盐溶液后,置于700℃~1000℃灼烧30分钟~2小时。7) After impregnating or coating 10%-50% catalyst salt solution, burn at 700°C-1000°C for 30 minutes-2 hours.

采用本发明的制备方法,提高了空/燃比传感器的性能、降低了制造成本,使空/燃比传感器的控制效果进一步提高。By adopting the preparation method of the invention, the performance of the air/fuel ratio sensor is improved, the manufacturing cost is reduced, and the control effect of the air/fuel ratio sensor is further improved.

四、具体实施方式4. Specific implementation

实施例1:对组份为0.63TiO2+0.2SnO2+0.05 Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坯后,在1000℃灼烧30分钟,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于800℃灼烧20分钟;再用丝网印刷敏感浆料后,置于1000℃灼烧1小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃灼烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃灼烧半小时;浸渍于10%的催化剂PdCl2溶液后,置于700℃灼烧30分钟。Example 1: After finely grinding the ceramic powder sample reagent with the composition of 0.63TiO 2 +0.2SnO 2 +0.05 Nb 2 O 5 +0.12Bi 2 O 3 into a blank, it was fired at 1000°C for 30 minutes to make it for printing Sensitive paste; after screen-printing interdigitated electrodes on an alumina substrate, burn at 800°C for 20 minutes; then print sensitive paste with screen, burn at 1000°C for 1 hour, and control the cooling rate Cool the sample at 120°C per minute to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigital electrode lead-out end of the sensitive element, and burn at 800°C for 10 minutes to cool the sample naturally; The heater paste is screen-printed on the back of the element and fired at 650°C for half an hour; after being immersed in a 10% catalyst PdCl 2 solution, it is fired at 700°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~250Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~250Ω.

实施例2:对组份为0.63TiO2+0.2SnO2+0.05Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坯后,在1350℃灼烧4小时,将灼烧后的坯体细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于1000℃灼烧1小时;再用丝网印刷敏感浆料后,置于1350℃灼烧2小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃灼烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃灼烧10分钟;涂敷30%的催化剂H4PtCl2溶液后,置于1000℃灼烧2小时。Example 2: After grinding the ceramic powder sample reagent with the composition of 0.63TiO 2 +0.2SnO 2 +0.05Nb 2 O 5 +0.12Bi 2 O 3 into a compact, it was burned at 1350°C for 4 hours, and the burned The green body is finely powdered and mixed with 20%wt medium-temperature glass powder to make a sensitive paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, it is burned at 1000°C for 1 hour; After screen-printing the sensitive paste, place it at 1350°C for 2 hours and control the cooling rate at 180°C per minute to cool the sample to make a sensitive element; then use platinum paste to seal the platinum wire and the interdigitated electrode of the sensitive element The leading end is welded, placed at 1000°C for 20 minutes, and the sample is cooled naturally; the heater paste is screen-printed on the back of the sensitive element, and placed at 850°C for 10 minutes; coated with 30% catalyst H 4 PtCl 2 After the solution, burn at 1000°C for 2 hours.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~250Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~250Ω.

实施例3:对组份为0.63TiO2+0.2SnO2+0.05Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坏后,置于1150℃灼烧2小时,将灼烧后的坯体细粉化后和10%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于900℃灼烧40分钟;再用丝网印刷敏感浆料后,置于1150℃灼烧1.5小时,将冷却速度控制在每分钟150℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃灼烧15分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于700℃灼烧45分钟;涂敷50%的催化剂盐PdCl2溶液后,置于900℃灼烧1小时。Example 3: After the porcelain powder sample reagent with the composition of 0.63TiO 2 +0.2SnO 2 +0.05Nb 2 O 5 +0.12Bi 2 O 3 was ground and crushed, it was burned at 1150°C for 2 hours. The final green body is finely powdered and mixed with 10%wt medium-temperature glass powder to make a sensitive paste for printing; after screen printing on an alumina substrate to form an interdigitated electrode, place it at 900°C for 40 minutes; then use After screen-printing the sensitive paste, burn it at 1150°C for 1.5 hours, and control the cooling rate at 150°C per minute to cool the sample to make a sensitive element; The lead-out end of the electrode is welded, placed at 900°C for 15 minutes, and the sample is cooled naturally; the heater paste is screen-printed on the back of the sensitive element, and placed at 700°C for 45 minutes; coated with 50% catalyst salt PdCl 2 After the solution, it was burned at 900°C for 1 hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~250Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~250Ω.

实施例4:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,在1000℃灼烧30分钟,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于800℃灼烧20分钟;再用丝网印刷敏感浆料后,置于1000℃灼烧1小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃灼烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃灼烧10分钟;浸渍于10%的催化剂H4PtCl2溶液后,在700℃灼烧30分钟。Example 4: After finely grinding the ceramic powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 into a compact, it was fired at 1000°C for 30 minutes to make a sensitive paste for printing; After screen-printing the interdigitated electrodes on the substrate, burn them at 800°C for 20 minutes; then print the sensitive paste on the screen, burn them at 1000°C for 1 hour, and control the cooling rate at 120°C per minute. The sample is cooled to make a sensitive element; then the platinum wire and the interdigitated electrode terminal of the sensitive element are welded with platinum paste, and burned at 800°C for 10 minutes to cool the sample naturally; a heater is screen-printed on the back of the sensitive element slurry, and burn at 650°C for 10 minutes; after soaking in 10% catalyst H 4 PtCl 2 solution, burn at 700°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例5:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,置于1200℃灼烧2小时,将灼烧后的坯体细粉化后和8%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于900℃灼烧40分钟;再用丝网印刷敏感浆料后,置于1100℃灼烧1.5小时,将冷却速度控制在每分钟150℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃灼烧16分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于700℃灼烧25分钟;浸渍于25%的催化剂PdCl2溶液后,在900℃灼烧1小时。Example 5: after finely grinding the ceramic powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 to make a green body, place it at 1200°C for 2 hours, and finely powder the fired green body Then mix it with 8%wt medium-temperature glass powder to make a sensitive paste for printing; after screen-printing the interdigitated electrodes on the alumina substrate, burn at 900°C for 40 minutes; then use the screen-printed sensitive paste , placed at 1100°C for 1.5 hours, and the cooling rate was controlled at 150°C per minute to cool the sample to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and place Burn at 900°C for 16 minutes, let the sample cool naturally; screen print heater paste on the back of the sensitive element, and burn at 700°C for 25 minutes; soak in 25% catalyst PdCl 2 solution, burn at 900°C 1 hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例6:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,置于1350℃灼烧4小时,将灼烧后的坯体细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,置于1000℃灼烧1小时;再用丝网印刷敏感浆料后,置于1350℃灼烧2小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃灼烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃灼烧45分钟;涂敷50%的催化剂H4PtCl2溶液后,在1000℃灼烧2小时。Example 6: after finely grinding the porcelain powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 to make a compact, place it at 1350°C for 4 hours, and finely powder the fired body After mixing with 20%wt medium-temperature glass powder to make a sensitive paste for printing; after screen-printing an interdigitated electrode on an alumina substrate, burn it at 1000°C for 1 hour; then use a screen-printed sensitive paste , placed at 1350°C for 2 hours, and the cooling rate was controlled at 180°C per minute to cool the sample to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and place Burn at 1000°C for 20 minutes, let the sample cool naturally; screen print the heater paste on the back of the sensitive element, and burn at 850°C for 45 minutes; after coating 50% catalyst H 4 PtCl 2 solution, Sear for 2 hours.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例7:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1000℃灼烧4小时,将灼烧后的坯体细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,在800℃灼烧1小时;再用丝网印刷敏感浆料后,置于1000℃灼烧2小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃灼烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃灼烧10分钟;涂敷50%的催化剂PdCl2溶液后,在700℃灼烧2小时。Example 7: after finely grinding the ceramic powder sample reagent with the composition of 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 to make a green body, place it at 1000°C for 4 hours, and then finely powder the fired green body After mixing with 20%wt medium-temperature glass powder to make a sensitive paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, burn at 800°C for 1 hour; and then screen-print the sensitive paste, Burn at 1000°C for 2 hours, control the cooling rate at 120°C per minute, cool the sample, and make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place at 1000 Burn for 10 minutes at ℃, let the sample cool naturally; screen print the heater paste on the back of the sensitive element, and burn at 850°C for 10 minutes; after coating 50% catalyst PdCl 2 solution, burn at 700°C for 2 Hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~800℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 150Ω-220Ω.

实施例8:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1350℃灼烧30分钟,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,在1000℃灼烧20分钟;再用丝网印刷敏感浆料后,置于1350℃灼烧1小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃灼烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃灼烧45分钟;浸渍于10%的催化剂H4PtCl2溶液中,在1000℃灼烧30分钟。Example 8: after finely grinding the ceramic powder sample reagent of the component 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 into a compact, place it at 1350°C for 30 minutes to make a sensitive paste for printing; After screen-printing the interdigitated electrodes on the aluminum substrate, burn them at 1000°C for 20 minutes; then print the sensitive paste on the screen, burn them at 1350°C for 1 hour, and control the cooling rate at 180°C per minute. The sample is cooled to make a sensitive element; then the platinum wire and the interdigitated electrode terminal of the sensitive element are welded with platinum paste, and burned at 800°C for 20 minutes to cool the sample naturally; a heater is screen-printed on the back of the sensitive element slurry, and burn at 650°C for 45 minutes; soak in 10% catalyst H 4 PtCl 2 solution, and burn at 1000°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~800℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 150Ω-220Ω.

实施例9:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1200℃灼烧3小时,将灼烧后的坯体细粉化后和15%wt中温玻璃粉混合,制成印刷用敏感浆料;在氧化铝基片上丝网印刷成叉指电极后,在920℃灼烧45分钟;再用丝网印刷敏感浆料后,置于1280℃灼烧1.5小时,将冷却速度控制在每分钟140℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃灼烧18分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于750℃灼烧半小时,浸渍于28%的催化剂PdCl2溶液后,在950℃灼烧1小时。Example 9: after finely grinding the ceramic powder sample reagent of the component 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 to make a green body, place it at 1200°C for 3 hours, and finely powder the fired green body Finally, mix it with 15%wt medium-temperature glass powder to make a sensitive paste for printing; after screen-printing the interdigitated electrode on the alumina substrate, burn it at 920°C for 45 minutes; and then use the screen-printed sensitive paste, Burn at 1280°C for 1.5 hours, control the cooling rate at 140°C per minute, cool the sample, and make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode terminal of the sensitive element, and place it at 900 Burn at ℃ for 18 minutes, let the sample cool naturally; screen print heater paste on the back of the sensitive element, and burn at 750°C for half an hour, impregnate in 28% catalyst PdCl 2 solution, burn at 950°C for 1 Hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~800℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 150Ω-220Ω.

Claims (6)

1, the preparation method of wide temp range and narrow resistance band air/fuel ratio thick-film sensor is characterized in that:
1) can synthesize (TiSnNb) O 2Behind the semiconductor porcelain powder reagent porphyrize base of the rutile structure of base, place 1000 ℃~1350 ℃ calcinations 30 minutes~4 hours;
2) warm glass dust after the base substrate fine-powdered after the calcination and among 0~20%wt is mixed, make the responsive slurry of printing;
3) after serigraphy becomes interdigital electrode on the alumina substrate, 800 ℃~1000 ℃ calcinations 20 minutes~1 hour;
4) use the responsive slurry of serigraphy again after, place 1000 ℃~1350 ℃ calcinations 1~2 hour, cooling velocity is controlled at 120 ℃~180 ℃ of per minutes, make the sample cooling, make sensitive element;
5) weld with the interdigital electrode exit of platinum slurry again, place 800 ℃~1000 ℃ calcinations 10~20 minutes, make the sample natural cooling platinum filament and sensitive element;
6), and place 650 ℃~850 ℃ calcinations 15~45 minutes at sensitive element back side serigraphy well heater slurry;
7) flood or apply 10%~50% catalyzer salt solusion, 700 ℃~1000 ℃ calcinations 30 minutes~2 hours.
2, the preparation method of wide temp range and narrow resistance band air/fuel ratio thick-film sensor according to claim 1 is characterized in that:
1) can synthesize (TiSnNb) O 2Behind the semiconductor porcelain powder reagent porphyrize base of the rutile structure of base, place 1100 ℃ of calcinations 2 hours;
2) warm glass dust after the base substrate fine-powdered after the calcination and among the 10%wt is mixed, make the responsive slurry of printing;
3) after serigraphy becomes interdigital electrode on the alumina substrate, 900 ℃ of following calcinations 40 minutes;
4) use the responsive slurry of serigraphy again after, place 1100 ℃ of calcinations 1.5 hours, cooling velocity is controlled at 150 ℃ of per minutes, make the sample cooling, make sensitive element;
5) weld with the interdigital electrode exit of platinum slurry again, place 900 ℃ of calcinations 15 minutes, make the sample natural cooling platinum filament and sensitive element;
6), and place 750 ℃ of calcination half an hour at sensitive element back side serigraphy well heater slurry;
7) coating 30% catalyzer salt solusion was 850 ℃ of calcinations 1 hour.
3, the preparation method of wide temp range and narrow resistance band base air/fuel ratio thick-film sensor according to claim 1 is characterized in that: said (TiSnNb) O 2TiO in the base 2Content be 0.63mol~0.64mol.
4, the preparation method of wide temp range and narrow resistance band air/fuel ratio thick-film sensor according to claim 1 is characterized in that: said (TiSnNb) O 2SnO in the base 2Content be 0.2mol~0.3mol.
5, the preparation method of wide temp range and narrow resistance band air/fuel ratio thick-film sensor according to claim 1 is characterized in that: said (TiSnNb) O 2Nb in the base 2O 5Content be 0.05mol~0.07mol.
6, the preparation method of wide temp range and narrow resistance band air/fuel ratio thick-film sensor according to claim 1 is characterized in that: said salt solusion is PdCl 2Or H 4PtCl 2Solution.
CNB011287756A 2001-09-03 2001-09-03 Preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band Expired - Fee Related CN1160565C (en)

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