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CN1334461A - Process for preparing air/fuel ratio thick-film sensor with wide temp range and narrow resistance band - Google Patents

Process for preparing air/fuel ratio thick-film sensor with wide temp range and narrow resistance band Download PDF

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CN1334461A
CN1334461A CN01128775.6A CN01128775A CN1334461A CN 1334461 A CN1334461 A CN 1334461A CN 01128775 A CN01128775 A CN 01128775A CN 1334461 A CN1334461 A CN 1334461A
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CN1160565C (en
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袁战恒
武明堂
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Xian Jiaotong University
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Abstract

宽温窄阻带厚膜空/燃比传感器的制备方法,根据N型过渡金属氧化物半导体在氧化气氛下晶界势垒高度的提高,还原气氛下晶界势垒高度的降低,采用金红石型TiO2结构对体内进行N型掺杂,晶界进行P型复合扩散。使样品在氧化气氛下,电导急剧降低,还原气氛下,急剧增加。采用厚膜工艺使样品在250℃~800℃范围内,使高温端氧化态下最低阻值和低温端还原态下的最高阻值出现1~3个数量级的差别。采用本制备方法使传感器性能大幅提高、成本低廉。The preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band, according to the increase of grain boundary barrier height of N-type transition metal oxide semiconductor in oxidizing atmosphere and the reduction of grain boundary barrier height in reducing atmosphere, adopts rutile type TiO 2 structure N-type doping is carried out in the body, and P-type compound diffusion is carried out at the grain boundary. The conductance of the sample decreased sharply in the oxidizing atmosphere, and increased sharply in the reducing atmosphere. Thick film technology is used to make the sample in the range of 250 ℃ ~ 800 ℃, so that the lowest resistance value in the oxidation state at the high temperature end and the highest resistance value in the reduction state at the low temperature end have a difference of 1 to 3 orders of magnitude. The performance of the sensor is greatly improved by adopting the preparation method, and the cost is low.

Description

宽温窄阻带厚膜空/燃比传感器的制备方法Preparation method of thick film air/fuel ratio sensor with wide temperature and narrow resistance band

一、技术领域1. Technical field

本发明涉及一种空/燃比控制传感器,更进一步涉及各类发动机、燃烧设备、器具的空/燃比控制用传感器的制备方法。The invention relates to an air/fuel ratio control sensor, and further relates to a preparation method of the sensor for air/fuel ratio control of various engines, combustion equipment and appliances.

二、背景技术2. Background technology

空燃比控制用传感器已出现在市场上的有ZrO2浓差电池型、TiO2及其它氧化物单相混合的电阻型。ZrO2浓差电池型在室温~800℃范围内存在铅中毒、结构相变及价格较高的问题,在使用中存在早期失效及成本偏高的缺点。为此,人们对TiO2及其它氧化物单相混合电阻型传感器进行了大量的研究,由于在室温~800℃的宽温范围内存在:(1)宽阻带、还原态下呈现高阻态;(2)寿命较短;(3)信号电路复杂等缺点。所以至今仍未大量投入使用。新近又进行了IBMD法的研究,但由于制备成本较高,性能难以保证、加热温度高等问题,也未能普及。但随着汽车数量的上升,城市的空气污染主要来源于汽车尾气的排放,各类燃烧设备、器具及汽车发动机在空/燃比不当时,一方面会排出大量有害气体,污染环境;另一方面使能源不能得到充分利用,造成浪费。Air-fuel ratio control sensors have appeared on the market with ZrO 2 concentration battery type, TiO 2 and other oxide single-phase mixed resistance type. The ZrO 2 concentration battery type has the problems of lead poisoning, structural phase change and high price in the range of room temperature to 800 ℃, and has the disadvantages of early failure and high cost in use. For this reason, people have done a lot of research on TiO 2 and other oxide single-phase mixed resistance sensors, because in the wide temperature range from room temperature to 800 ° C, there are: (1) wide resistance band, high resistance state in the reduced state ; (2) Short life; (3) Shortcomings such as complex signal circuit. So it has not been put into use in large quantities so far. The research of IBMD method has been carried out again recently, but due to problems such as high preparation cost, difficulty in guaranteeing performance, and high heating temperature, it has not been popularized. However, with the increase in the number of automobiles, urban air pollution mainly comes from the emission of automobile exhaust. When the air/fuel ratio of various combustion equipment, appliances and automobile engines is improper, on the one hand, a large amount of harmful gases will be emitted, polluting the environment; on the other hand The energy cannot be fully utilized, resulting in waste.

三、发明内容3. Contents of the invention

本发明的目的在于克服上述现有技术的缺点,提供一种长寿命、低价格、高性能的宽温窄阻带厚膜空/燃比传感器的制备方法。本发明采用的技术方案是:根据N型过渡金属氧化物半导体在氧化气氛下晶界势垒高度的提高,还原气氛下晶界势垒高度的降低,采用金红石型TiO2结构对体内进行N型掺杂,晶界进行P型复合扩散。使样品在氧化气氛下,电导急剧降低,还原气氛下,急剧增加。采用厚膜工艺使样品在250℃~800℃范围内,使高温端氧化态下最低阻值和低温端还原态下的最高阻值出现1~3个数量级的差别。The purpose of the present invention is to overcome the above-mentioned shortcomings of the prior art, and provide a long-life, low-price, high-performance preparation method of a thick-film air/fuel ratio sensor with wide temperature and narrow resistance band. The technical scheme adopted in the present invention is: according to the improvement of the grain boundary barrier height of the N-type transition metal oxide semiconductor in the oxidizing atmosphere, and the reduction of the grain boundary barrier height in the reducing atmosphere, the N-type N-type transition metal oxide semiconductor is carried out in the body by using the rutile TiO2 structure. Doping, the grain boundary undergoes P-type recombination diffusion. The conductivity of the sample decreases sharply in an oxidizing atmosphere, and increases sharply in a reducing atmosphere. The thick film process is used to make the sample in the range of 250 ° C to 800 ° C, so that the lowest resistance value in the oxidation state at the high temperature end and the highest resistance value in the reduction state at the low temperature end have a difference of 1 to 3 orders of magnitude.

本发明的制备工艺为:The preparation process of the present invention is:

1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,置于1000℃~1350℃酌烧30分钟~4小时;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb) O2- based rutile structure into a compact, and then firing at 1000°C to 1350°C for 30 minutes to 4 hours;

2)细粉化后和(0~20)%wt中温玻璃粉混合,制成印刷用敏感粉浆料;2) After pulverization, it is mixed with (0-20)%wt medium-temperature glass powder to make a sensitive powder paste for printing;

3)在氧化铝基片上丝网印刷成叉指电极后,置于800℃~1000℃酌烧20分钟~1小时;3) After screen-printing the interdigitated electrodes on the alumina substrate, place them at 800°C to 1000°C for 20 minutes to 1 hour;

4)再用丝网印刷敏感粉浆料后,置于1000℃~1350℃酌烧1~2小时,将冷却速度控制在每分钟120℃~180℃,使样品冷却,制成敏感元件;4) After screen-printing the sensitive powder paste, place it at 1000°C-1350°C for 1-2 hours and control the cooling rate at 120°C-180°C per minute to cool the sample and make a sensitive element;

5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃~1000℃酌烧10~20分钟,使样品自然冷却;5) Then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place it at 800°C-1000°C for 10-20 minutes, and let the sample cool down naturally;

6)在敏感元件背面丝网印刷加热器浆料、并置于650℃~850℃酌烧10~45分钟;6) Screen-print the heater paste on the back of the sensitive element, and place it at 650°C-850°C for 10-45 minutes;

7)浸渍或涂敷10%~50%的催化剂盐溶液后,置于700℃~1000℃酌烧30分钟~2小时。7) After impregnating or coating 10%-50% catalyst salt solution, place it at 700°C-1000°C and burn for 30 minutes-2 hours.

采用本发明的制备方法,提高了空/燃比传感器的性能、降低了制造成本,使空燃比传感器的控制效果进一步提高。By adopting the preparation method of the invention, the performance of the air/fuel ratio sensor is improved, the manufacturing cost is reduced, and the control effect of the air-fuel ratio sensor is further improved.

四、具体实施方式4. Specific implementation

实施例1:对组份为0.63TiO2+0.2SnO2+0.05Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坯后,在1000℃酌烧30分钟,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于800℃酌烧20分钟;再用丝网印刷敏感粉浆料后,置于1000℃酌烧1小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃酌烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃酌烧半小时;浸渍于10%的催化剂PdCl2溶液后,置于700℃酌烧30分钟。Example 1: After finely grinding the porcelain powder sample reagent whose composition is 0.63TiO 2 +0.2SnO 2 +0.05Nb 2 O 5 +0.12Bi2O 3 , it was fired at 1000°C for 30 minutes to make a sensitive powder for printing Slurry; After screen-printing interdigitated electrodes on alumina substrates, place them at 800°C for 20 minutes; then use screen-printed sensitive powder paste, place them at 1000°C for 1 hour, and control the cooling rate Cool the sample at 120°C per minute to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigital electrode lead-out end of the sensitive element, and burn at 800°C for 10 minutes to cool the sample naturally; The heater paste is screen-printed on the back of the element, and fired at 650°C for half an hour; after being immersed in a 10% catalyst PdCl 2 solution, fired at 700°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~50Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~50Ω.

实施例2:对组份为0.63TiO2+0.2SnO2+0.05Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坯后,在1350℃酌烧4小时,细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于1000℃酌烧1小时;再用丝网印刷敏感粉浆料后,置于1350℃酌烧2小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃酌烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃酌烧10分钟;涂敷30%的催化剂H4PtCl2溶液后,置于1000℃酌烧2小时。Example 2: After grinding the ceramic powder sample reagent with the composition of 0.63TiO 2 +0.2SnO 2 +0.05Nb 2 O 5 +0.12Bi 2 O 3 into a compact, it was fired at 1350°C for 4 hours, and after fine powdering Mix with 20%wt medium-temperature glass powder to make a sensitive powder paste for printing; screen-print the interdigitated electrode on the alumina substrate, and then burn it at 1000°C for 1 hour; then use the screen-printed sensitive powder paste Finally, place it at 1350°C for 2 hours and control the cooling rate at 180°C per minute to cool the sample to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode of the sensitive element. Burn at 1000°C for 20 minutes, let the sample cool naturally; screen print the heater paste on the back of the sensitive element, and place it at 850°C for 10 minutes; apply 30% catalyst H 4 PtCl 2 solution, place Burn at 1000°C for 2 hours.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~250Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~250Ω.

实施例3:对组份为0.63TiO2+0.2SnO2+0.05 Nb2O5+0.12Bi2O3的瓷粉样品试剂研细制坏后,置于1150℃酌烧2小时,细粉化后和10%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于900℃酌烧40分钟;再用丝网印刷敏感粉浆料后,置于1150℃酌烧1.5小时,将冷却速度控制在每分钟150℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃酌烧15分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于700℃酌烧45分钟;涂敷50%的催化剂盐PdCl2溶液后,置于900℃酌烧1小时。Example 3: After the porcelain powder sample reagent with the composition of 0.63TiO 2 +0.2SnO 2 +0.05 Nb 2 O 5 +0.12Bi 2 O 3 was ground and crushed, it was fired at 1150°C for 2 hours, and the fine powder After melting, mix it with 10%wt medium-temperature glass powder to make a sensitive powder paste for printing; screen-print the interdigitated electrode on the alumina substrate, and then burn it at 900°C for 40 minutes; then use the screen-printed sensitive powder After making the slurry, place it at 1150°C for 1.5 hours and control the cooling rate at 150°C per minute to cool the sample to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element , burn at 900°C for 15 minutes, and cool the sample naturally; screen-print the heater paste on the back of the sensitive element, and burn at 700°C for 45 minutes; after coating 50% catalyst salt PdCl2 solution, place Burn at 900°C for 1 hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

在还原气氛下:在250℃~800℃内,阻值为95Ω~250Ω。Under reducing atmosphere: within 250℃~800℃, the resistance value is 95Ω~250Ω.

实施例4:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,在1000℃酌烧30分钟,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于800℃酌烧20分钟;再用丝网印刷敏感粉浆料后,置于1000℃酌烧1小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃酌烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃酌烧10分钟;浸渍于10%的催化剂H4PtCl2溶液后,在700℃酌烧30分钟。Example 4: After finely grinding the ceramic powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 into a compact, it was fired at 1000°C for 30 minutes to make a sensitive powder paste for printing; After screen-printing interdigitated electrodes on the aluminum substrate, place them at 800°C for 20 minutes; then use screen printing for sensitive powder paste, place them at 1000°C for 1 hour, and control the cooling rate at 120°C per minute , to cool the sample to make a sensitive element; then use platinum paste to melt the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and place it at 800°C for 10 minutes to cool the sample naturally; screen printing on the back of the sensitive element Heat the slurry and place it at 650°C for 10 minutes; after soaking in a 10% catalyst H 4 PtCl 2 solution, burn it at 700°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例5:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,置于1200℃酌烧2小时,细粉化后和8%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于900℃酌烧40分钟;再用丝网印刷敏感粉浆料后,置于1100℃酌烧1.5小时,将冷却速度控制在每分钟150℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃酌烧16分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于700℃酌烧25分钟;浸渍于25%的催化剂PdCl2溶液后,在900℃酌烧1小时。Example 5: after finely grinding the porcelain powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 to make a billet, place it at 1200°C for 2 hours, and after fine powdering, mix with 8%wt medium temperature glass powder mixed to make a sensitive powder paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, burn at 900°C for 40 minutes; Burn for 1.5 hours, control the cooling rate at 150°C per minute, cool the sample, and make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead of the sensitive element, and place it at 900°C for 16 Minutes, let the sample cool down naturally; screen-print the heater paste on the back of the sensitive element, and place it at 700°C for 25 minutes; soak it in a 25% catalyst PdCl 2 solution, and burn it at 900°C for 1 hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例6:对组份0.64TiO2+0.3SnO2+0.06Nb2O5的瓷粉样品试剂研细制坯后,置于1350℃酌烧4小时,细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,置于1000℃酌烧1小时;再用丝网印刷敏感粉浆料后,置于1350℃酌烧2小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃酌烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃酌烧45分钟;涂敷50%的催化剂H4PtCl2溶液后,在1000℃酌烧2小时。Example 6: after finely grinding the ceramic powder sample reagent of the component 0.64TiO 2 +0.3SnO 2 +0.06Nb 2 O 5 into a billet, place it at 1350°C for 4 hours, and after fine powdering, mix with 20%wt medium temperature glass powder mixed to make a sensitive powder paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, place it at 1000°C for 1 hour; Burn for 2 hours, control the cooling rate at 180°C per minute, cool the sample to make a sensitive element; then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and place it at 1000°C for 20 minutes, let the sample cool naturally; screen-print the heater paste on the back of the sensitive element, and place it at 850°C for 45 minutes; after coating 50% catalyst H 4 PtCl 2 solution, burn it at 1000°C for 2 hours.

所制样品在氧化气氛下:在250℃~800℃内,阻值为50kΩ~1000kΩ。The prepared sample is in an oxidizing atmosphere: within 250°C-800°C, the resistance value is 50kΩ-1000kΩ.

所制样品在还原气氛下:在250℃~800℃内,阻值为85Ω~150Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 85Ω-150Ω.

实施例7:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1000℃酌烧4小时,细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,在800℃酌烧1小时;再用丝网印刷敏感粉浆料后,置于1000℃酌烧2小时,将冷却速度控制在每分钟120℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃酌烧10分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于850℃酌烧10分钟;涂敷50%的催化剂PdCl2溶液后,在700℃酌烧2小时。Example 7: after finely grinding the ceramic powder sample reagent of the component 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 to make a billet, place it at 1000°C for 4 hours, and after fine powdering, mix with 20%wt medium temperature glass powder mixed to make a sensitive powder paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, burn at 800°C for 1 hour; Burn for 2 hours, control the cooling rate at 120°C per minute, cool the sample to make a sensitive element; then use platinum slurry to melt the platinum wire and the interdigitated electrode lead-out end of the sensitive element, and place it at 1000°C for 10 minutes. , let the sample cool naturally; screen-print the heater paste on the back of the sensitive element, and place it at 850°C for 10 minutes; after coating 50% catalyst PdCl 2 solution, burn it at 700°C for 2 hours.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~8000℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-8000°C, the resistance value is 150Ω-220Ω.

实施例8:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1350℃酌烧30分钟,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,在1000℃酌烧20分钟;再用丝网印刷敏感粉浆料后,置于1350℃酌烧1小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃酌烧20分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于650℃酌烧45分钟;浸渍于10%的催化剂H4PtCl2溶液中,在1000℃酌烧30分钟。Example 8: After finely grinding the ceramic powder sample reagent of the component 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 to make a billet, place it at 1350°C for 30 minutes and make a sensitive powder paste for printing; After screen-printing the interdigitated electrodes on the alumina substrate, burn them at 1000°C for 20 minutes; then print the sensitive powder paste on the screen, burn them at 1350°C for 1 hour, and control the cooling rate at 180°C per minute , to cool the sample to make a sensitive element; then use platinum paste to melt the platinum wire and the interdigital electrode lead-out end of the sensitive element, and place it at 800 ° C for 20 minutes to cool the sample naturally; screen printing on the back of the sensitive element Heater the slurry and place it at 650°C for 45 minutes; soak it in a 10% catalyst H 4 PtCl 2 solution and burn it at 1000°C for 30 minutes.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~800℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 150Ω-220Ω.

实施例9:对组份0.63TiO2+0.30SnO2+0.07Nb2O5的瓷粉样品试剂研细制坯后,置于1200℃酌烧3小时,细粉化后和15%wt中温玻璃粉混合,制成印刷用敏感粉浆料;在氧化铝基片上丝网印刷成叉指电极后,在920℃酌烧45分钟;再用丝网印刷敏感粉浆料后,置于1280℃酌烧1.5小时,将冷却速度控制在每分钟140℃,使样品冷却,制成敏感元件;再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃酌烧18分钟,使样品自然冷却;在敏感元件背面丝网印刷加热器浆料,并置于750℃酌烧半小时,浸渍于28%的催化剂PdCl2溶液后,在950℃酌烧1小时。Example 9: after finely grinding the ceramic powder sample reagent of the component 0.63TiO 2 +0.30SnO 2 +0.07Nb 2 O 5 to make a billet, place it at 1200°C for 3 hours, and after fine powdering, mix with 15%wt medium temperature glass powder mixed to make a sensitive powder paste for printing; after screen-printing interdigitated electrodes on an alumina substrate, burn them at 920°C for 45 minutes; Burn for 1.5 hours, control the cooling rate at 140°C per minute, cool the sample to make a sensitive element; then use platinum slurry to melt the platinum wire and the interdigitated electrode lead of the sensitive element, and place it at 900°C for 18 minutes. , Allow the sample to cool naturally; screen-print the heater paste on the back of the sensitive element, and place it at 750°C for half an hour, and then soak it in a 28% catalyst PdCl 2 solution, and then burn it at 950°C for 1 hour.

所制样品在氧化气氛下:在250℃~800℃内,阻值为200kΩ~5×106Ω。The prepared sample is in an oxidizing atmosphere: within 250°C to 800°C, the resistance value is 200kΩ to 5×10 6 Ω.

所制样品在还原气氛下:在250℃~800℃内,阻值为150Ω~220Ω。The prepared sample is under reducing atmosphere: within 250°C-800°C, the resistance value is 150Ω-220Ω.

Claims (8)

1、宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:1. A method for preparing a thick film air/fuel ratio sensor with wide temperature and narrow resistance band, characterized in that: 1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,置于1000℃~1350℃酌烧30分钟~4小时;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb) O2- based rutile structure into a compact, and then firing at 1000°C to 1350°C for 30 minutes to 4 hours; 2)细粉化后和0~20%wt中温玻璃粉混合,制成印刷用敏感粉浆料;2) After fine powdering, it is mixed with 0-20%wt medium-temperature glass powder to make a sensitive powder paste for printing; 3)在氧化铝基片上丝网印刷成叉指电极后,在800℃~1000℃酌烧20分钟~1小时;3) After screen-printing interdigitated electrodes on an alumina substrate, burn them at 800°C to 1000°C for 20 minutes to 1 hour; 4)再用丝网印刷敏感粉浆料后置于1000℃~1350℃酌烧1~2小时,将冷却速度控制在每分钟120℃~180℃,使样品冷却,制成敏感元件;4) After printing the sensitive powder paste with screen printing, place it at 1000°C-1350°C for 1-2 hours and control the cooling rate at 120°C-180°C per minute to cool the sample and make a sensitive element; 5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃~1000℃酌烧10~20分钟,使样品自然冷却;5) Then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place it at 800°C-1000°C for 10-20 minutes, and let the sample cool down naturally; 6)在敏感元件背面丝网印刷加热器浆料,并置于650℃~850℃酌烧15~45分钟;6) Screen-print the heater paste on the back of the sensitive element, and place it at 650°C-850°C for 15-45 minutes; 7)浸渍或涂敷10%~50%的催化剂盐溶液,在700℃~1000℃酌烧30分钟~2小时。7) Dip or apply 10% to 50% catalyst salt solution, and burn at 700°C to 1000°C for 30 minutes to 2 hours. 2、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:2. The preparation method of the wide temperature narrow resistance band thick film air/fuel ratio sensor according to claim 1, characterized in that: 1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,置于1000℃酌烧30分钟;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb) O2- based rutile structure into a compact, and then firing at 1000°C for 30 minutes; 2)细粉化后制成印刷用敏感粉浆料;2) Make sensitive powder paste for printing after fine powdering; 3)在氧化铝基片上丝网印刷成叉指电极后,在800℃酌烧20分钟;3) After screen-printing interdigitated electrodes on an alumina substrate, burn them at 800°C for 20 minutes; 4)再用丝网印刷敏感粉浆料后,置于1000℃进行酌烧1小时,将样品的冷却速度控制在每分钟120℃使之冷却,制成敏感元件;4) After screen-printing the sensitive powder paste, place it at 1000°C for 1 hour, and control the cooling rate of the sample at 120°C per minute to cool it down to make a sensitive element; 5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于800℃酌烧10分钟,使样品自然冷却;5) Then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place it at 800°C for 10 minutes, and let the sample cool down naturally; 6)在敏感元件背面丝网印刷加热器浆料,并置于650℃酌烧10分钟;6) Screen-print the heater paste on the back of the sensitive element, and burn it at 650°C for 10 minutes; 7)浸渍于10%的催化剂盐溶液,在700℃酌烧30分钟。7) Soak in 10% catalyst salt solution and burn at 700°C for 30 minutes. 3、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:3. The preparation method of wide temperature narrow resistance band thick film air/fuel ratio sensor according to claim 1, characterized in that: 1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,置于1100℃酌烧2小时;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb)O2 - based rutile structure into a compact, and then firing at 1100°C for 2 hours; 2)细粉化后10%wt中温玻璃粉混合,制成印刷用敏感粉浆料;2) After fine powdering, 10%wt medium-temperature glass powder is mixed to make a sensitive powder paste for printing; 3)在氧化铝基片上丝网印刷成叉指电极后,在900℃下酌烧40分钟;3) After screen-printing interdigitated electrodes on an alumina substrate, burn them at 900°C for 40 minutes; 4)再用丝网印刷敏感粉浆料后,置于1100℃酌烧1.5小时,将冷却速度控制在每分钟150℃,使样品冷却,制成敏感元件;4) After screen-printing the sensitive powder paste, place it at 1100°C for 1.5 hours and control the cooling rate at 150°C per minute to cool the sample to make a sensitive element; 5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于900℃酌烧15分钟,使样品自然冷却;5) Then use platinum slurry to weld the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place it at 900°C for 15 minutes, and let the sample cool down naturally; 6)在敏感元件背面丝网印刷加热器浆料,并置于750℃酌烧半小时;6) Screen-print the heater paste on the back of the sensitive element, and burn it at 750°C for half an hour; 7)涂敷30%催化剂盐溶液,在850℃酌烧1小时。7) Apply 30% catalyst salt solution and burn at 850°C for 1 hour. 4、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:4. The preparation method of wide temperature narrow resistance band thick film air/fuel ratio sensor according to claim 1, characterized in that: 1)将能合成(TiSnNb)O2基的金红石结构的半导体瓷粉试剂研细制坯后,在1350℃酌烧4小时;1) Grinding the semiconductor ceramic powder reagent capable of synthesizing (TiSnNb)O2 - based rutile structure into a compact, and firing it at 1350°C for 4 hours; 2)细粉化后和20%wt中温玻璃粉混合,制成印刷用敏感粉浆料;2) After fine powdering, mix with 20%wt medium temperature glass powder to make sensitive powder paste for printing; 3)在氧化铝基片上丝网印刷成叉指电极后,在1000℃下酌烧1小时;3) After screen-printing interdigitated electrodes on an alumina substrate, burn them at 1000°C for 1 hour; 4)再用丝网印刷敏感粉浆料后,置于1350℃酌烧2小时,将冷却速度控制在每分钟180℃,使样品冷却,制成敏感元件;4) After screen-printing the sensitive powder paste, place it at 1350°C for 2 hours and control the cooling rate at 180°C per minute to cool the sample to make a sensitive element; 5)再用铂浆料将铂丝和敏感元件的叉指电极引出端溶接,置于1000℃酌烧20分钟,使样品自然冷却;5) Then use platinum slurry to melt the platinum wire and the interdigitated electrode lead-out end of the sensitive element, place it at 1000°C for 20 minutes, and let the sample cool down naturally; 6)在敏感元件背面丝网印刷加热器浆料,并置于850℃酌烧45分钟;6) Screen-print the heater paste on the back of the sensitive element, and burn it at 850°C for 45 minutes; 7)浸渍于50%的催化剂盐溶液,在1000℃下酌烧2小时。7) Soak in 50% catalyst salt solution, and burn at 1000°C for 2 hours. 5、根据权利要求1所述的宽温窄阻带基厚膜空/燃比传感器的制备方法,其特征在于:所说的(TiSnNb)O2基中TiO2的含量为0.63mol~0.64mol。5. The method for preparing a thick-film air/fuel ratio sensor with wide temperature and narrow resistance band base according to claim 1, characterized in that the content of TiO 2 in the (TiSnNb)O 2 base is 0.63mol-0.64mol. 6、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:所说的(TiSnNb)O2基中SnO2的含量为0.2mol~0.3mol。6. The method for preparing a thick-film air/fuel ratio sensor with wide temperature and narrow resistance band according to claim 1, characterized in that the content of SnO 2 in the (TiSnNb)O 2 base is 0.2mol-0.3mol. 7、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:所说的(TiSnNb)O2基中Nb2O5的含量为0.05mol~0.07mol。7. The preparation method of wide temperature and narrow resistance band thick film air/fuel ratio sensor according to claim 1, characterized in that: the content of Nb 2 O 5 in said (TiSnNb)O 2 base is 0.05mol~0.07mol . 8、根据权利要求1所述的宽温窄阻带厚膜空/燃比传感器的制备方法,其特征在于:所说的盐溶液为PdCl2或H4PtCl2溶液。8. The preparation method of wide temperature and narrow resistance band thick film air/fuel ratio sensor according to claim 1, characterized in that: said salt solution is PdCl 2 or H 4 PtCl 2 solution.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106053550A (en) * 2016-06-06 2016-10-26 怀远县金浩电子科技有限公司 Preparation method of gas-sensitive semiconductor device
CN109716120A (en) * 2016-07-07 2019-05-03 俄罗斯联邦诺萨顿国家原子能公司 Apparatus for determining parameters of strip superconductors

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106053550A (en) * 2016-06-06 2016-10-26 怀远县金浩电子科技有限公司 Preparation method of gas-sensitive semiconductor device
CN109716120A (en) * 2016-07-07 2019-05-03 俄罗斯联邦诺萨顿国家原子能公司 Apparatus for determining parameters of strip superconductors

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