CN101303527A - 光固化性树脂组合物、干膜、固化物以及印刷电路板 - Google Patents
光固化性树脂组合物、干膜、固化物以及印刷电路板 Download PDFInfo
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- CN101303527A CN101303527A CNA2008100818560A CN200810081856A CN101303527A CN 101303527 A CN101303527 A CN 101303527A CN A2008100818560 A CNA2008100818560 A CN A2008100818560A CN 200810081856 A CN200810081856 A CN 200810081856A CN 101303527 A CN101303527 A CN 101303527A
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/062—Polyethers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
- C08L63/08—Epoxidised polymerised polyenes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Description
Claims (22)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007123829A JP4663679B2 (ja) | 2007-05-08 | 2007-05-08 | 光硬化性樹脂組成物、ドライフィルム、硬化物、及びプリント配線板 |
| JP2007-123829 | 2007-05-08 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110180880.1A Division CN102393603B (zh) | 2007-05-08 | 2008-05-08 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101303527A true CN101303527A (zh) | 2008-11-12 |
| CN101303527B CN101303527B (zh) | 2013-02-13 |
Family
ID=40113488
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110180880.1A Active CN102393603B (zh) | 2007-05-08 | 2008-05-08 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
| CN2008100818560A Active CN101303527B (zh) | 2007-05-08 | 2008-05-08 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110180880.1A Active CN102393603B (zh) | 2007-05-08 | 2008-05-08 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4663679B2 (zh) |
| KR (2) | KR101022073B1 (zh) |
| CN (2) | CN102393603B (zh) |
| TW (1) | TWI400565B (zh) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101866109A (zh) * | 2009-04-20 | 2010-10-20 | 富士胶片株式会社 | 着色固化性组合物、着色图案的形成方法、滤色器和液晶显示装置 |
| CN102152624A (zh) * | 2009-12-28 | 2011-08-17 | 精工爱普生株式会社 | 记录方法 |
| CN101544863B (zh) * | 2008-03-28 | 2012-04-25 | 太阳控股株式会社 | 印刷电路板用树脂组合物、干膜以及印刷电路板 |
| CN102472965A (zh) * | 2009-07-21 | 2012-05-23 | 太阳控股株式会社 | 光固化性树脂组合物 |
| CN102472967A (zh) * | 2009-08-19 | 2012-05-23 | 太阳控股株式会社 | 光固化性树脂组合物 |
| CN102472970A (zh) * | 2009-07-02 | 2012-05-23 | 太阳控股株式会社 | 光固化性热固化性树脂组合物 |
| CN102591146A (zh) * | 2010-12-28 | 2012-07-18 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物、印刷电路板 |
| CN103140800A (zh) * | 2010-09-29 | 2013-06-05 | 株式会社钟化 | 新颖感光性树脂组合物制作套组及其利用 |
| CN103365084A (zh) * | 2012-03-30 | 2013-10-23 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物及印刷电路板 |
| CN104109486A (zh) * | 2013-04-19 | 2014-10-22 | 迪睿合电子材料有限公司 | 各向异性导电膜、连接方法及接合体 |
| CN104950574A (zh) * | 2014-03-31 | 2015-09-30 | 太阳油墨(苏州)有限公司 | 光固化性热固化性树脂组合物、干膜、固化物及印刷电路板 |
| CN105319849A (zh) * | 2014-06-25 | 2016-02-10 | Jsr株式会社 | 遮光板形成用感光性组合物、遮光板和显示装置 |
| CN106444282A (zh) * | 2015-08-13 | 2017-02-22 | 常州强力先端电子材料有限公司 | 一种含肟酯类光引发剂的感光性树脂组合物及其应用 |
| CN106569389A (zh) * | 2015-10-12 | 2017-04-19 | 东友精细化工有限公司 | 自发光感光树脂组合物、滤色器和包括滤色器的显示设备 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103477282A (zh) * | 2011-04-13 | 2013-12-25 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物及印刷电路板 |
| JP6001922B2 (ja) * | 2011-05-27 | 2016-10-05 | 太陽インキ製造株式会社 | 熱硬化性樹脂組成物、それを用いたドライフィルムおよびプリント配線板 |
| CN104427742B (zh) * | 2013-08-28 | 2017-08-22 | 鹏鼎控股(深圳)股份有限公司 | 覆盖膜及电路板 |
| JP6704224B2 (ja) * | 2015-04-15 | 2020-06-03 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板 |
| JP7429283B2 (ja) * | 2020-02-20 | 2024-02-07 | 富士フイルム株式会社 | 着色組成物、膜、カラーフィルタ、固体撮像素子および画像表示装置 |
| CN114442425A (zh) * | 2020-10-30 | 2022-05-06 | 常州正洁智造科技有限公司 | 固化性树脂组合物、及其形成的阻焊膜、层间绝缘材料和印刷电路板 |
| EP4534616A4 (en) * | 2022-05-30 | 2025-10-08 | Konica Minolta Inc | ACTINIC RADIATION-CURABLE INKJET RESIST INK, CURED FILM FORMING METHOD, CURED FILM, PRINTED CIRCUIT BOARD, AND ELECTRONIC DEVICE |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0780731B1 (en) | 1995-12-22 | 2002-04-17 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
| ATE446322T1 (de) * | 2001-06-11 | 2009-11-15 | Basf Se | Oxim ester photoinitiatoren mit kombinierter struktur |
| JP3912405B2 (ja) * | 2003-11-11 | 2007-05-09 | 三菱化学株式会社 | 硬化性組成物、硬化物、カラーフィルタ及び液晶表示装置 |
| JP4428151B2 (ja) * | 2004-06-23 | 2010-03-10 | Jsr株式会社 | 着色層形成用感放射線性組成物およびカラーフィルタ |
| WO2006018405A1 (en) * | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
| JP2006195425A (ja) * | 2004-12-15 | 2006-07-27 | Jsr Corp | 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル |
| JP4533800B2 (ja) * | 2005-05-31 | 2010-09-01 | 東洋インキ製造株式会社 | 感光性着色組成物およびカラーフィルタ |
| JP4809006B2 (ja) * | 2005-07-05 | 2011-11-02 | 太陽ホールディングス株式会社 | 着色感光性樹脂組成物及びその硬化物 |
| JP2007025358A (ja) * | 2005-07-19 | 2007-02-01 | Fujifilm Holdings Corp | カラーフィルタ及びその製造方法 |
| JP5384785B2 (ja) * | 2005-09-06 | 2014-01-08 | 太陽ホールディングス株式会社 | 樹脂組成物及びその硬化物並びにそれを用いて得られるプリント配線板 |
| KR100787341B1 (ko) * | 2005-09-06 | 2007-12-18 | 다이요 잉키 세이조 가부시키가이샤 | 수지 조성물 및 그의 경화물 및 그것을 이용하여 얻어지는인쇄 배선판 |
| JP4736692B2 (ja) * | 2005-10-12 | 2011-07-27 | 凸版印刷株式会社 | 感光性赤色着色組成物、それを用いたカラーフィルタ基板、および半透過型液晶表示装置 |
-
2007
- 2007-05-08 JP JP2007123829A patent/JP4663679B2/ja active Active
-
2008
- 2008-05-07 KR KR1020080042339A patent/KR101022073B1/ko active Active
- 2008-05-07 TW TW097116838A patent/TWI400565B/zh active
- 2008-05-08 CN CN201110180880.1A patent/CN102393603B/zh active Active
- 2008-05-08 CN CN2008100818560A patent/CN101303527B/zh active Active
-
2010
- 2010-12-27 KR KR1020100135400A patent/KR101120300B1/ko active Active
Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101544863B (zh) * | 2008-03-28 | 2012-04-25 | 太阳控股株式会社 | 印刷电路板用树脂组合物、干膜以及印刷电路板 |
| CN101866109A (zh) * | 2009-04-20 | 2010-10-20 | 富士胶片株式会社 | 着色固化性组合物、着色图案的形成方法、滤色器和液晶显示装置 |
| CN102472970A (zh) * | 2009-07-02 | 2012-05-23 | 太阳控股株式会社 | 光固化性热固化性树脂组合物 |
| CN102472970B (zh) * | 2009-07-02 | 2016-10-19 | 太阳控股株式会社 | 光固化性热固化性树脂组合物 |
| CN102472965A (zh) * | 2009-07-21 | 2012-05-23 | 太阳控股株式会社 | 光固化性树脂组合物 |
| CN102472965B (zh) * | 2009-07-21 | 2014-08-13 | 太阳控股株式会社 | 光固化性树脂组合物 |
| CN102472967A (zh) * | 2009-08-19 | 2012-05-23 | 太阳控股株式会社 | 光固化性树脂组合物 |
| TWI506088B (zh) * | 2009-08-19 | 2015-11-01 | Taiyo Holdings Co Ltd | A photohardenable resin composition |
| CN102152624B (zh) * | 2009-12-28 | 2015-01-21 | 精工爱普生株式会社 | 记录方法 |
| CN102152624A (zh) * | 2009-12-28 | 2011-08-17 | 精工爱普生株式会社 | 记录方法 |
| US9081276B2 (en) | 2010-09-29 | 2015-07-14 | Kaneka Corporation | Photosensitive resin composition production kit, and use thereof |
| CN103140800A (zh) * | 2010-09-29 | 2013-06-05 | 株式会社钟化 | 新颖感光性树脂组合物制作套组及其利用 |
| CN103140800B (zh) * | 2010-09-29 | 2015-11-25 | 株式会社钟化 | 新颖感光性树脂组合物制作套组及其利用 |
| CN102591146B (zh) * | 2010-12-28 | 2015-04-08 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物、印刷电路板 |
| CN102591146A (zh) * | 2010-12-28 | 2012-07-18 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物、印刷电路板 |
| CN103365084A (zh) * | 2012-03-30 | 2013-10-23 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物及印刷电路板 |
| CN103365084B (zh) * | 2012-03-30 | 2016-04-06 | 太阳油墨制造株式会社 | 光固化性树脂组合物、干膜、固化物及印刷电路板 |
| CN104109486A (zh) * | 2013-04-19 | 2014-10-22 | 迪睿合电子材料有限公司 | 各向异性导电膜、连接方法及接合体 |
| CN104109486B (zh) * | 2013-04-19 | 2018-07-20 | 迪睿合电子材料有限公司 | 各向异性导电膜、连接方法及接合体 |
| CN104950574A (zh) * | 2014-03-31 | 2015-09-30 | 太阳油墨(苏州)有限公司 | 光固化性热固化性树脂组合物、干膜、固化物及印刷电路板 |
| CN105319849A (zh) * | 2014-06-25 | 2016-02-10 | Jsr株式会社 | 遮光板形成用感光性组合物、遮光板和显示装置 |
| CN106444282A (zh) * | 2015-08-13 | 2017-02-22 | 常州强力先端电子材料有限公司 | 一种含肟酯类光引发剂的感光性树脂组合物及其应用 |
| CN106569389A (zh) * | 2015-10-12 | 2017-04-19 | 东友精细化工有限公司 | 自发光感光树脂组合物、滤色器和包括滤色器的显示设备 |
| CN106569389B (zh) * | 2015-10-12 | 2021-07-16 | 东友精细化工有限公司 | 自发光感光树脂组合物、滤色器和包括滤色器的显示设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102393603B (zh) | 2014-11-05 |
| KR101022073B1 (ko) | 2011-03-17 |
| KR20080099181A (ko) | 2008-11-12 |
| CN101303527B (zh) | 2013-02-13 |
| TW200910006A (en) | 2009-03-01 |
| CN102393603A (zh) | 2012-03-28 |
| TWI400565B (zh) | 2013-07-01 |
| KR101120300B1 (ko) | 2012-03-06 |
| JP2008281653A (ja) | 2008-11-20 |
| JP4663679B2 (ja) | 2011-04-06 |
| KR20110013342A (ko) | 2011-02-09 |
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