CN101209437A - 流体喷嘴 - Google Patents
流体喷嘴 Download PDFInfo
- Publication number
- CN101209437A CN101209437A CNA2007101949470A CN200710194947A CN101209437A CN 101209437 A CN101209437 A CN 101209437A CN A2007101949470 A CNA2007101949470 A CN A2007101949470A CN 200710194947 A CN200710194947 A CN 200710194947A CN 101209437 A CN101209437 A CN 101209437A
- Authority
- CN
- China
- Prior art keywords
- fluid
- flow path
- nozzle
- substrate
- discharge port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 74
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000007599 discharging Methods 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 description 61
- 239000003814 drug Substances 0.000 description 48
- 239000000126 substance Substances 0.000 description 23
- 239000000243 solution Substances 0.000 description 16
- 239000008155 medical solution Substances 0.000 description 8
- 239000007921 spray Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
- B05C5/0216—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nozzles (AREA)
Abstract
Description
Claims (6)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060136306A KR100828665B1 (ko) | 2006-12-28 | 2006-12-28 | 유체 분사노즐 |
| KR10-2006-0136306 | 2006-12-28 | ||
| KR1020060136306 | 2006-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101209437A true CN101209437A (zh) | 2008-07-02 |
| CN101209437B CN101209437B (zh) | 2010-12-01 |
Family
ID=39609792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007101949470A Active CN101209437B (zh) | 2006-12-28 | 2007-12-05 | 流体喷嘴 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100828665B1 (zh) |
| CN (1) | CN101209437B (zh) |
| TW (1) | TWI329036B (zh) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101992154A (zh) * | 2009-08-24 | 2011-03-30 | 显示器生产服务株式会社 | 流体喷射装置 |
| CN103472693A (zh) * | 2013-08-28 | 2013-12-25 | 清华大学深圳研究生院 | 一种用于芯片显影工艺的工艺喷嘴 |
| CN107433233A (zh) * | 2017-08-18 | 2017-12-05 | 武汉华星光电技术有限公司 | 一种显影装置及其喷嘴 |
| CN110681508A (zh) * | 2018-07-04 | 2020-01-14 | 显示器生产服务株式会社 | 基板处理装置 |
| CN115443193A (zh) * | 2020-03-26 | 2022-12-06 | 诺信公司 | 喷嘴、粘合剂涂敷头、粘合剂涂敷设备和制造尿布的方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102156740B1 (ko) * | 2013-11-25 | 2020-09-16 | 세메스 주식회사 | 노즐 및 이를 갖는 기판 처리 장치 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100500756B1 (ko) * | 2003-06-27 | 2005-07-11 | 주식회사 디엠에스 | 평판 디스플레이 표면 처리용 유체분사장치 |
| KR100648411B1 (ko) * | 2003-10-17 | 2006-11-24 | 주식회사 디엠에스 | 유체분사노즐 |
| JP2005349280A (ja) | 2004-06-09 | 2005-12-22 | Tokyo Ohka Kogyo Co Ltd | スリットノズル |
| KR20060012958A (ko) * | 2004-08-05 | 2006-02-09 | 삼성전자주식회사 | 도포 장치용 노즐 |
| TWI263542B (en) * | 2004-10-04 | 2006-10-11 | Dainippon Screen Mfg | Apparatus for and method of processing substrate |
| JP4324538B2 (ja) * | 2004-10-04 | 2009-09-02 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
| JP2006106422A (ja) | 2004-10-06 | 2006-04-20 | Noritsu Koki Co Ltd | 感光材料処理装置 |
-
2006
- 2006-12-28 KR KR1020060136306A patent/KR100828665B1/ko active Active
-
2007
- 2007-11-16 TW TW096143409A patent/TWI329036B/zh not_active IP Right Cessation
- 2007-12-05 CN CN2007101949470A patent/CN101209437B/zh active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101992154A (zh) * | 2009-08-24 | 2011-03-30 | 显示器生产服务株式会社 | 流体喷射装置 |
| CN103472693A (zh) * | 2013-08-28 | 2013-12-25 | 清华大学深圳研究生院 | 一种用于芯片显影工艺的工艺喷嘴 |
| CN103472693B (zh) * | 2013-08-28 | 2016-01-20 | 清华大学深圳研究生院 | 一种用于芯片显影工艺的工艺喷嘴 |
| CN107433233A (zh) * | 2017-08-18 | 2017-12-05 | 武汉华星光电技术有限公司 | 一种显影装置及其喷嘴 |
| CN110681508A (zh) * | 2018-07-04 | 2020-01-14 | 显示器生产服务株式会社 | 基板处理装置 |
| CN115443193A (zh) * | 2020-03-26 | 2022-12-06 | 诺信公司 | 喷嘴、粘合剂涂敷头、粘合剂涂敷设备和制造尿布的方法 |
| US11938510B2 (en) | 2020-03-26 | 2024-03-26 | Nordson Corporation | Nozzle, adhesive application head, adhesive application apparatus, and method of making diaper |
| US12296356B2 (en) | 2020-03-26 | 2025-05-13 | Nordson Corporation | Nozzle, adhesive application head, adhesive application apparatus, and method of making diaper |
| US12521752B2 (en) | 2020-03-26 | 2026-01-13 | Nordson Corporation | Nozzle, adhesive application head, adhesive application apparatus, and method of making diaper |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100828665B1 (ko) | 2008-05-09 |
| TW200827034A (en) | 2008-07-01 |
| CN101209437B (zh) | 2010-12-01 |
| TWI329036B (en) | 2010-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140226 |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20140226 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |