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TWI329036B - Nozzle for jetting fluid - Google Patents

Nozzle for jetting fluid Download PDF

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Publication number
TWI329036B
TWI329036B TW096143409A TW96143409A TWI329036B TW I329036 B TWI329036 B TW I329036B TW 096143409 A TW096143409 A TW 096143409A TW 96143409 A TW96143409 A TW 96143409A TW I329036 B TWI329036 B TW I329036B
Authority
TW
Taiwan
Prior art keywords
fluid
flow path
nozzle
plate body
substrate
Prior art date
Application number
TW096143409A
Other languages
Chinese (zh)
Other versions
TW200827034A (en
Inventor
Eun-Soo Kim
don-hyeoung Lee
Sang-Uk Lee
Original Assignee
Dms Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dms Co Ltd filed Critical Dms Co Ltd
Publication of TW200827034A publication Critical patent/TW200827034A/en
Application granted granted Critical
Publication of TWI329036B publication Critical patent/TWI329036B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • B05C5/0212Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
    • B05C5/0216Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nozzles (AREA)

Description

1329036 九、發明說明: 【發明所屬之技術領域】 本發明涉及一種流體喷嘴’尤其涉及一種藉由改盖其 結構而能夠均勻喷射藥液的流體喷嘴。 【先前技術】 通常,流體喷嘴是向基板表面噴射藥液等流體的裝置。 該流體喷嘴根據其用途可應用於各種領域。 即,該流體喷嘴可應用於在基板上塗敷藥液而形成塗 層的塗敷裝置、利用藥液對基板進行顯影作業的顯影裝 置、以噴射清洗液來除去基板上異物的清洗裝置等種種裝 置。 < 圖1和圖2舉例示出流體噴嘴用於顯影裝置上的示意 圖。如圖1所示,流體喷嘴丨的喷嘴本體2設置於基板G j上部。而且,該喷嘴本體2上連接有用於供給藥液貿的 藥液供給管6。由此,藥液供給管6所供給的藥液臀,通 過喷嘴本體2的喷出口 N而喷射到基板G上面。 此時,噴嘴本體2由第-板體4及第二板體3構成, 且該第-板體4及第二板體3相隔預定距離而設置,從而 '兩個板體之間形成流&,並在該流路端部形成喷出口 N。藥液w則通過該喷出口 N而向外喷射。 朴但是’現有技術的流體喷嘴在通過噴嘴喷射藥液時, 其樂液沿著直線軌跡高速喷出後與基板相接觸。此時,由 於南速噴出的藥液與基板點接觸,故在基板上面由喷出華 液所形成表面為不均句且呈波紋狀而在生産製程中會 1329036 導致障礙。 爲了克服上述問題,當藉由加大 藥液減速時,嘖中oria主工卜 、出的柄截面來使 組成華液的八t 表 液之間的附著力減弱,而 聚=子之間引力相對變大,進而使藥液相互凝 樂液以不均勻狀態噴射。 【發明内容】 於上述問題而生’其目的在於提供一種藉由 。一結構來向基板均勻地喷出藥液的流體喷嘴。 喷嘴現t述目的’本發明提供"'種流體噴嘴,其包括: ^^嘴本體,由4 喷出口;〜甘 且具有向基板喷出流體的 出口方向料流體。1中,㈣t 且用於朝該嗔 於該流路的橫截面面積曲面積大 冑此、、,。構可使4在通過該流路的流 體減速後贺出該流體。 本發明所提供的流體噴嘴具有如下優點。 第一,由於形成在噴嘴内部的流路寬度比較窄,故該 流體對流路内表面的附著六卜妒 ㈣者力比較大。因此,可在關 時使殘留的流體停止流動,# π & μ π ^ ]阀门 減少流體使用量。 ⑼防止不必要的流體嘴出而 第二,由於喷出口的哈φ 97赁出面積大於流路的橫截面面積, 因此可使大量流體低速嘴出。 第三’由於在噴出口上形成曲面,故流體可沿著該曲 面喷出’因此可以使大量流體低速向基板喷出。 第 在抓路上叹置腔室的結構,可以使流過該流路 1329036 的流體暫時停留在腔室後再流出。因此,此種結構可以使 流體在流路上均勻地流動。 【實施方式】 以下,參照附圖詳細說明本發明優選具體實施例的流 體喷嘴結構。 該流體噴嘴可適用於顯影裝置、塗敷裝置及清洗裝置, 但下面只對其在顯影裝置上的應用情況進行說明。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluid nozzle', and more particularly to a fluid nozzle capable of uniformly ejecting a chemical liquid by reshaping its structure. [Prior Art] Generally, a fluid nozzle is a device that ejects a fluid such as a chemical liquid to a surface of a substrate. The fluid nozzle can be applied to various fields depending on its use. In other words, the fluid nozzle can be applied to a coating device that applies a chemical solution on a substrate to form a coating layer, a developing device that develops a substrate by using a chemical solution, and a cleaning device that removes foreign matter on the substrate by spraying a cleaning liquid. . <Figure 1 and Figure 2 illustrate schematic views of a fluid nozzle for use on a developing device. As shown in Fig. 1, the nozzle body 2 of the fluid nozzle 设置 is disposed on the upper portion of the substrate G j . Further, the nozzle body 2 is connected to a chemical supply pipe 6 for supplying a liquid medicine. Thereby, the chemical solution hip supplied from the chemical solution supply pipe 6 is ejected onto the upper surface of the substrate G through the discharge port N of the nozzle body 2. At this time, the nozzle body 2 is composed of the first plate body 4 and the second plate body 3, and the first plate body 4 and the second plate body 3 are disposed at a predetermined distance, so that a flow &amp is formed between the two plate bodies. And forming a discharge port N at the end of the flow path. The chemical solution w is sprayed outward through the discharge port N. However, when the prior art fluid nozzle ejects the liquid medicine through the nozzle, the liquid liquid is ejected at a high speed along a linear path and then comes into contact with the substrate. At this time, since the chemical liquid ejected at the south speed is in contact with the substrate, the surface formed by the ejected liquid on the substrate is uneven and corrugated, and 1329036 causes an obstacle in the production process. In order to overcome the above problems, when the deceleration of the chemical solution is increased, the oria main work and the shank cross section of the sputum are used to weaken the adhesion between the eight t-form liquids constituting the hua liquor, and the gravitation between the aggregates Relatively large, the liquid medicine is ejected in a non-uniform state. SUMMARY OF THE INVENTION The present invention has been made in view of the above problems. A fluid nozzle configured to uniformly discharge a chemical solution to a substrate. BACKGROUND OF THE INVENTION The present invention provides a fluid nozzle comprising: a nozzle body having a discharge port and an outlet direction fluid for ejecting fluid to the substrate. 1 , (4) t and used to make the cross-sectional area of the flow path larger than this, and. The structure 4 allows the fluid to be ejected after deceleration of the fluid passing through the flow path. The fluid nozzle provided by the present invention has the following advantages. First, since the width of the flow path formed inside the nozzle is relatively narrow, the fluid is relatively large in adhesion to the inner surface of the flow path. Therefore, the residual fluid can be stopped at the time of shutting off, and the # π & μ π ^ ] valve reduces the amount of fluid used. (9) Preventing unnecessary fluid from coming out. Second, since the area of the discharge port is larger than the cross-sectional area of the flow path, a large amount of fluid can be discharged at a low speed. Thirdly, since a curved surface is formed on the discharge port, fluid can be ejected along the curved surface. Therefore, a large amount of fluid can be ejected toward the substrate at a low speed. The structure of the chamber is sighed on the road, so that the fluid flowing through the channel 1329036 can temporarily stay in the chamber and then flow out. Therefore, this structure allows the fluid to flow evenly on the flow path. [Embodiment] Hereinafter, a fluid nozzle structure according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. The fluid nozzle can be applied to a developing device, a coating device, and a cleaning device, but only the application to the developing device will be described below.

圖3是本發明優選具體實施例的流體嘴嘴的簡單立體 圖,圖4是圖3所示流體噴嘴的正視圖。 如圖所示,本發明的流體喷嘴1〇可配置於藉由輥輪r 輸送的基板G的上方。 該流體喷嘴1〇具有用於向基板G喷出流體w (以下 稱爲藥液)的喷出口 N,並且包括用於向該噴嘴1()供认藥 液W的流體供給管18 (以下稱爲藥液供給管)。 、Figure 3 is a simplified perspective view of a fluid nozzle in accordance with a preferred embodiment of the present invention, and Figure 4 is a front elevational view of the fluid nozzle of Figure 3. As shown, the fluid nozzle 1 of the present invention can be disposed above the substrate G conveyed by the roller r. The fluid nozzle 1A has a discharge port N for discharging a fluid w (hereinafter referred to as a chemical liquid) to the substrate G, and includes a fluid supply pipe 18 for supplying the chemical liquid W to the nozzle 1 () (hereinafter referred to as Liquid supply tube). ,

具有一定的傾斜 液w朝基板G 設置後的該流體喷嘴10與該基板G 角度》因此’通過該流體噴嘴1〇喷出的藥 前進的相反方向喷出。 J J说體噴嘴1 〇 包括:喷嘴…2’其由-對板體組成,且具有用於向基 板G喷出樂液W的喷出";流路2〇,其形成在該喷嘴 本體12内部,且用於朝該噴出口 \方向引導流體。 組成該喷嘴本體12的—對板體包括第-板體16 Μ 二板體14,其中該第一板體16靠近該基板g, 板體Η則與該第-板體16以相對方式進行設置,並藉: 1329036 其他連接部件(未圖示)與該第一板體16相連接。該板 體的形狀爲長方體狀。 其中,該第一板體16和第二板體14相隔預定距離地 而進行設置,且兩者之間形成流路20。 如述’該流路20可將第一板體16及第二板體14之兩 個板體藉由連接部件相互連接而形成’也可藉由對一個板 體内部進行加工而形成。 另外,該等多個藥液供給管18分別與該喷嘴本體12 相連通’而在該長方體狀喷嘴本體12上,該等多個藥液 供給管1 8之間最好具有預定的間隔,以便向該流路2〇供 給均勻的藥液。 此時’在預定範圍内形成該流路2〇的寬度t,例如, 其寬度範圍爲〇.lmm至19mm。即,該寬度1窄於現有裝 置的流路寬度2.0mm。 如此,當流路20的寬度t較窄時,單位面積的流量就 會減乂進而使流路20内表面和藥液w之間的附著力增 加。 即,作用於藥液W和流路20内表面之間的附著力將 會克服作用於藥液之間的引力。 口此,通過該流路20流出的藥液w,與其之間互相 凝聚的傾向相比’沿著扁平狀流% 2〇内表面流下的傾向 占優勢°因此’該藥液w可通過扁平狀流路2g的内表面 而均勻喷出。 而且,向該流路20供給藥液貨的藥液供給管18藉由 1329036 開關功旎,可有效地喷射流體。 即,如果阻斷向噴嘴12的流路2〇供 由於藥液w得不到繼續#认 ’、。、、液w,則 故流路2〇中的藥液w所禹 到的重力小於其對流路2G内表面的附著力。 所又 因此,殘留在流路20中的藥液w在該附著力 下停留在某一位置上。 作用 藉由該喷嘴12的開關功能可防止不必要的藥液噴出, 從而可節省約5〇%的藥液。 另外,該流路20上形成有腔室c,其對藥液w 引導作用,從而使藥液w喷射得更加均勻。即,該腔室C 是在該第一板體16表面上以預定深度形成之具有半圓型 剖面的槽。該腔室C在第一板體16的表面以橫向 成。 因此,通過該流路20而流下的藥液w儲存在該腔室 c内後,在腔室c内互相混合。並且,如果腔室c内部儲 存預疋量的藥液W就會溢出,從而使藥液%沿著流路 流下。 如此’在藥液W通過腔室C的過程中,在流過流路2〇 的上部區域即流過腔室c上部區域時,由於藥液w與流 路20内表面接觸,因此藥液w的流動性増加,從而會以 不均勻的狀態流下。 因此,設置該腔室C,可在腔室C内暫時儲存及混合 流入的藥液W後,再使其通過流路20的下部區域向下流。 藉由此過程,可使藥液W互相混合’進而可以在比較均勻 1329036 的狀態下噴出。 上述說明中,腔吉r .^ R c的剖面形狀爲半圓形 亚不局限於上述形狀,也 本發明 是能夠儲存藥液w即可。疋二角形、四角形等’只要 卜如圖6所不,本發明具體實施例的口 n 由該第一板體16的端部25及第__ 及第一板體14的端部22所形 成。該噴出口 N的寬度tl大於該流路2〇的寬度卜 由於喷出口 N端部的噴出面面積大於流路20的橫截 面面積’因此可以使通過該流路2〇的藥液w減速後噴出。 而且,本發明的具體實施例中,與第二板體"的端部 22相比,該第一板體16的端部25向基板g方向更加凸出。 較佳的是,在該第一板體16的噴出口 N的端部25上形成 曲面24。 具體而言,將該第一板體16的端部25設成比第二板 體14的端部22更向基板G方向凸出的原因是爲了使第一 板體16的端部25與第二板體14的端部22之間具有預定 的高度差t2,以便使藥液W沿著與基板G相鄰設置的第 一板體16喷出。 在該第一板體10的端部25上形成曲面24,可使藥液 沿著曲面24並在第一板體16的底面和基板G的上表面之 間噴出。 此時,該第一板體16的底面可與喷出於基板G上的 藥液上層接觸。 因此,可使大量的藥液W在低速狀態下沿著該第一板The fluid nozzle 10 having a certain inclination liquid w disposed toward the substrate G and the angle of the substrate G are thus ejected in the opposite direction in which the medicine ejected from the fluid nozzle 1 is advanced. JJ says that the body nozzle 1 includes: a nozzle 2' which is composed of a pair of plates, and has a discharge "flow path 2〇 for ejecting the liquid W to the substrate G, which is formed in the nozzle body 12 Internal, and used to direct fluid toward the discharge port\ direction. The pair of plates constituting the nozzle body 12 includes a first plate body 16 and a second plate body 14, wherein the first plate body 16 is adjacent to the substrate g, and the plate body is disposed opposite to the first plate body 16 And borrow: 1329036 Other connecting members (not shown) are connected to the first plate body 16. The shape of the plate is a rectangular parallelepiped shape. The first plate body 16 and the second plate body 14 are disposed at a predetermined distance therebetween, and a flow path 20 is formed therebetween. As described above, the flow path 20 can be formed by connecting the two plates of the first plate body 16 and the second plate body 14 to each other by a connecting member, or can be formed by processing the inside of one of the plates. Further, the plurality of chemical liquid supply tubes 18 are respectively in communication with the nozzle body 12, and on the rectangular parallelepiped nozzle body 12, the plurality of chemical liquid supply tubes 18 preferably have a predetermined interval therebetween. A uniform chemical solution is supplied to the flow path 2A. At this time, the width t of the flow path 2 is formed within a predetermined range, for example, the width thereof is in the range of 〇.lmm to 19 mm. That is, the width 1 is narrower than the flow path width of the prior art device by 2.0 mm. As described above, when the width t of the flow path 20 is narrow, the flow rate per unit area is reduced, and the adhesion between the inner surface of the flow path 20 and the chemical liquid w is increased. That is, the adhesion between the chemical solution W and the inner surface of the flow path 20 will overcome the attraction force acting between the chemical liquids. In this case, the chemical solution w flowing out through the flow path 20 tends to have a tendency to flow down along the inner surface of the flat flow % 2〇, so that the liquid medicine w can pass through the flat shape. The inner surface of the flow path 2g is uniformly discharged. Further, the chemical liquid supply pipe 18 that supplies the liquid medicine to the flow path 20 can efficiently eject the fluid by the 1329036 switching power. In other words, if the flow path 2 to the nozzle 12 is blocked, the liquid medicine w cannot be stopped. When the liquid w is used, the gravity of the liquid medicine w in the flow path 2 is less than the adhesion of the inner surface of the flow path 2G. Therefore, the chemical liquid w remaining in the flow path 20 stays at a certain position under the adhesion. The nozzle function of the nozzle 12 prevents unnecessary chemical liquid from being ejected, thereby saving about 5% of the liquid medicine. Further, a cavity c is formed in the flow path 20, which guides the chemical liquid w, so that the chemical liquid w is more uniformly sprayed. That is, the chamber C is a groove having a semicircular cross section formed at a predetermined depth on the surface of the first plate body 16. The chamber C is formed laterally on the surface of the first plate body 16. Therefore, the chemical liquid w flowing down through the flow path 20 is stored in the chamber c, and then mixed with each other in the chamber c. Further, if the amount of the chemical liquid W stored in the chamber c is overflowed, the liquid medicine flows down the flow path. Thus, during the passage of the chemical liquid W through the chamber C, when the upper portion of the flow path 2〇 flows through the upper portion of the chamber c, since the chemical liquid w is in contact with the inner surface of the flow path 20, the chemical liquid w The fluidity increases and thus flows down in an uneven state. Therefore, by providing the chamber C, the inflowing chemical liquid W can be temporarily stored and mixed in the chamber C, and then flowed downward through the lower region of the flow path 20. By this process, the chemical liquids W can be mixed with each other', and the liquid can be ejected in a relatively uniform state of 1329036. In the above description, the cross-sectional shape of the cavity ji r.^ R c is not limited to the above shape, and the present invention is also capable of storing the chemical liquid w. The second embodiment of the present invention is formed by the end portion 25 of the first plate body 16 and the end portion 22 of the first plate body 16 and the end portion 22 of the first plate body 14 as long as the shape of the second plate is not shown in FIG. . The width t1 of the discharge port N is larger than the width of the flow path 2〇. Since the discharge surface area of the end portion of the discharge port N is larger than the cross-sectional area of the flow path 20, the chemical liquid w passing through the flow path 2 can be decelerated. ejection. Moreover, in a specific embodiment of the present invention, the end portion 25 of the first plate body 16 is more convex toward the substrate g than the end portion 22 of the second plate body. Preferably, a curved surface 24 is formed on the end portion 25 of the discharge port N of the first plate body 16. Specifically, the reason why the end portion 25 of the first plate body 16 is protruded more toward the substrate G than the end portion 22 of the second plate body 14 is to make the end portion 25 of the first plate body 16 and the first portion The end portions 22 of the second plate body 14 have a predetermined height difference t2 therebetween so that the chemical liquid W is ejected along the first plate body 16 disposed adjacent to the substrate G. A curved surface 24 is formed on the end portion 25 of the first plate body 10, so that the chemical liquid can be ejected along the curved surface 24 between the bottom surface of the first plate body 16 and the upper surface of the substrate G. At this time, the bottom surface of the first plate body 16 can be in contact with the upper layer of the chemical liquid sprayed on the substrate G. Therefore, a large amount of the drug solution W can be along the first plate at a low speed state.

10 1329036 、 的下端噴出後與該基板G表面線接觸,從而均勻地 ”布於基板G上,或者藉由該第—板體ι6的底面與藥液 上層的接觸,而使該藥液w更加均勻地分布於基板上。 下面’參照附圖進-步詳細說明本發明優選具體實施 ' 例的流體噴嘴的操作過程。 如圖3至圖6所示’藉由藥液供給管18所供給的藥液 w供,’。到噴觜本體12的流路2〇巾。此時,如果把該流路 20的寬度t設定得比較窄,就可減少單位面積的流量,而 _ 增加流路20内表面和藥液W之間的附著力。 因此,通過該流路20流出的藥液w,與其之間互相 凝聚的傾向相比,沿著扁平狀流路2〇内表面流下的傾向 占優勢。因此’該藥液W可藉由扁平狀流路2〇的内表面 而均勻喷出。 而且,流過該流路20的藥液W經過腔室c可以均勻 方式混合。 即,流過流路20的上部區域時,因流動性增加而可能 以不均句狀態向下流的藥液w,在腔室C内暫時被儲存及 混合之後,再經過流路20的下部區域流出,因此,藥液 W可以在經過混合後在更爲均勻狀態下流出。 如此,藥液W可以均勻的狀態經由該流路20内部, 並通過該喷出口 N喷出。 另外,該藥液供給管1 8藉由開關功能可有效地噴射流 體。 、抓 即,如果阻斷向喷嘴12的流路2〇供給的藥液w,由 、樂液W得不到繼續供仏 η ^ ^ 故該樂液w的重力將小於其 卞机路20内表面的附著力。 因此,殘留在流路20内部 w 用下:停止流動而停留在某一位置上。 Q力的作 藉由該噴嘴 1 W噴出,^ 的上相關功能可防止不必要的藥液 育出從而可節省約50%的藥液w。 出在該流路2〇的藥"可通過喷出口 N而喷10 1329036, after the lower end is ejected, and is in line contact with the surface of the substrate G, thereby uniformly spreading on the substrate G, or by contacting the bottom surface of the first plate body ι6 with the upper layer of the chemical liquid, thereby making the liquid medicine w more Uniformly distributed on the substrate. The operation of the fluid nozzle of the preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings. As shown in Figs. 3 to 6, 'the supply is supplied by the chemical supply pipe 18. The chemical solution w is supplied, 'to the flow path 2 of the sneezing body 12, and at this time, if the width t of the flow path 20 is set to be narrow, the flow rate per unit area can be reduced, and _ the flow path 20 is increased. The adhesion between the inner surface and the chemical solution W. Therefore, the tendency of the chemical solution w flowing out through the flow path 20 to flow along the inner surface of the flat flow path 2 is superior to the tendency of the chemical liquid w flowing out of the flat flow path 2 Therefore, the chemical solution W can be uniformly ejected by the inner surface of the flat flow path 2。. Further, the chemical liquid W flowing through the flow path 20 can be uniformly mixed through the chamber c. In the upper region of the road 20, it may be in an uneven state due to an increase in fluidity. The liquid medicine w is temporarily stored and mixed in the chamber C, and then flows out through the lower portion of the flow path 20. Therefore, the chemical liquid W can be discharged in a more uniform state after being mixed. Thus, the liquid medicine W The liquid supply pipe can be ejected through the discharge port N in a uniform state. Further, the chemical supply pipe 18 can efficiently eject the fluid by the switching function. The liquid medicine w supplied from the flow path 2〇 cannot be supplied to the liquid solution W, so the gravity of the liquid solution w will be smaller than the adhesion of the inner surface of the winding machine 20. Therefore, it remains in the flow path. 20 Internal w Use: Stop the flow and stay at a certain position. The Q force is sprayed by the nozzle 1 W, and the related function of ^ can prevent unnecessary liquid medicine from being raised, thereby saving about 50% of the medicine. Liquid w. The medicine that is in the flow path 2 可 can be sprayed through the discharge port N

:在基…面。此時,該喷出口 N的寬 J 路2〇的寬度t。g m 的橫截面面積,從而Λ 出面面積大於流路20 噴出。 ,使通過該流路20的藥液減速後再 此外,盈塗-4c jwb 的端…基板更7部22相比’該第一板雜16 的喷出口 Ν端部25切口凸出,而且在該第一板體16 上升/成有曲面24。 藉由這一結構,經 板體16的-側喷出。喷出〇 N〇t出的錢…可由第一 7 wTT喷出的藥^ W沿著形成在該第一板體16端部 25上的曲面24’並通過第一板體“的 : 之間而喷出。 土低^上面 此時,該第一缸 扳體16的底面可與噴出於基板 藥液上層接觸。 双^上的 可使大里的藥液w在低速狀態下沿 體16的下端噴出祛 矛板 .〃該基板G表面線接觸,從而均勻地 分布於基板G上.赤本姑, ^地 ,成者藉由該第一板體16的底面與 12 1329036 22 ' 25 端部 C 腔室 G 基板 N 噴出口 R 輥輪 t ' tl 寬度 t2 面度差 W 藥液: In the base... At this time, the width J of the discharge port N is 2 width 〇. The cross-sectional area of g m such that the exit area is larger than the flow path 20 ejects. After decelerating the chemical solution passing through the flow path 20, the end portion of the overcoat-4c jwb is further protruded from the end portion 25 of the ejection opening 25 end portion of the first plate 16 The first plate body 16 is raised/formed with a curved surface 24. With this configuration, it is ejected through the side of the plate body 16. The money ejected from the ...N〇t...the medicine ejected by the first 7 wTT is along the curved surface 24' formed on the end portion 25 of the first plate 16 and passes between the first plate At the same time, the bottom surface of the first cylinder plate 16 can be in contact with the upper layer of the liquid medicine sprayed on the substrate. The liquid medicine w on the double bottom can be along the lower end of the body 16 at a low speed state. The surface of the substrate G is in line contact and evenly distributed on the substrate G. The red body, the ground, and the bottom surface of the first plate body 16 and the 12 1329036 22 '25 end C cavity Room G substrate N discharge port R roller t ' tl width t2 face difference W liquid

1414

Claims (1)

ijzyujoIjzyujo 十、申請專利範圍·· ι —種流體喷嘴,包括: 且具有向基板噴出流 喷嘴本體,其由一對板體構成 體的喷出口 ; 八形成在該喷嘴本體内部,且用於朝 方向引導流體, 貧出口 :中:該嗔出口端部的喷出面面積大於該流路的橫截 以使通過該流路的流體減速後噴出。 2·如申請專利範圍帛】項所述之流體喷嘴,其中 喷嘴本體包括: 孩 第一板體,其設置在鄰接於基板的位置上; 第二板體,其設置在該第-板體的上側,並與該第 板體相連接, 其中,與該第二板體的端部相比,該第一板體的端部 向基板方向更加凸出。 3_如申請專利範圍帛2項所述之流體噴嘴,其中: 該第一板體的噴出口端部爲曲面。 4 如申叫專利範圍第丨項所述之流體喷嘴,其中: 該流路具有當阻斷該流體的流動時,可藉由流體與流 路内表面之間的附著力’而停止流體流動的寬度。 5·如申請專利範圍帛i項至第4項其中任何一 之流體喷嘴’其特徵在於,進一步係包括腔室,該腔室开: 成在該流路上,並具有預定容積,其可以暫時儲存流過該 流路的流體,之後再使該流體流下。 15 1329036 ,其中: »並與該基 流體接觸, 6.如申請專利範圍第3項所述之流體喷嘴 藉由該噴出口而喷射的流體係沿曲面噴出 板線接觸,而該第一板體的下端與該基板上的 從而使流體均勻地塗覆於基板上。 Η•一、圖式: 如次頁。X. Patent Application Scope   A fluid nozzle includes: a spray nozzle that ejects a flow nozzle body to a substrate, which is formed by a pair of plate bodies; eight is formed inside the nozzle body and is used for guiding Fluid, lean outlet: medium: The discharge surface area of the exit end of the crucible is larger than the cross section of the flow path to decelerate the fluid passing through the flow path and eject it. The fluid nozzle according to the invention, wherein the nozzle body comprises: a first plate body disposed at a position adjacent to the substrate; and a second plate body disposed on the first plate body The upper side is connected to the first plate body, wherein an end portion of the first plate body protrudes more toward the substrate direction than an end portion of the second plate body. 3_ The fluid nozzle according to claim 2, wherein: the end of the first plate body is a curved surface. 4. The fluid nozzle of claim 2, wherein: the flow path has a flow force that stops fluid flow by blocking adhesion between the fluid and the inner surface of the flow path when the flow of the fluid is blocked. width. 5. The fluid nozzle of any one of claims 1-4, characterized in that it further comprises a chamber which is opened on the flow path and has a predetermined volume which can be temporarily stored The fluid flowing through the flow path is then allowed to flow down. 15 1329036, wherein: » is in contact with the base fluid, 6. The fluid nozzle sprayed by the discharge port according to the third aspect of the patent application is in contact with the curved surface of the curved plate, and the first plate The lower end is on the substrate such that the fluid is evenly applied to the substrate. Η•1, schema: as the next page. 1616
TW096143409A 2006-12-28 2007-11-16 Nozzle for jetting fluid TWI329036B (en)

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KR1020060136306A KR100828665B1 (en) 2006-12-28 2006-12-28 Fluid injection nozzle

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KR20110020507A (en) * 2009-08-24 2011-03-03 주식회사 디엠에스 Fluid injector
CN103472693B (en) * 2013-08-28 2016-01-20 清华大学深圳研究生院 A kind of technique nozzle for chip developing process
KR102156740B1 (en) * 2013-11-25 2020-09-16 세메스 주식회사 Nozzle and apparatus for treating substrates having the same
CN107433233A (en) * 2017-08-18 2017-12-05 武汉华星光电技术有限公司 A kind of developing apparatus and its nozzle
KR102045828B1 (en) * 2018-07-04 2019-11-18 주식회사 디엠에스 Substrate processing apparatus
JP7593741B2 (en) 2020-03-26 2024-12-03 ノードソン コーポレーション Nozzle, adhesive application head, adhesive application device, and diaper manufacturing method

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KR100500756B1 (en) * 2003-06-27 2005-07-11 주식회사 디엠에스 Injector for a glass substrate processing of plat display panel
KR100648411B1 (en) * 2003-10-17 2006-11-24 주식회사 디엠에스 Fluid Spray Nozzles
JP2005349280A (en) 2004-06-09 2005-12-22 Tokyo Ohka Kogyo Co Ltd Slit nozzle
KR20060012958A (en) * 2004-08-05 2006-02-09 삼성전자주식회사 Nozzle for Applicator
TWI263542B (en) * 2004-10-04 2006-10-11 Dainippon Screen Mfg Apparatus for and method of processing substrate
JP4324538B2 (en) * 2004-10-04 2009-09-02 大日本スクリーン製造株式会社 Substrate processing apparatus and substrate processing method
JP2006106422A (en) 2004-10-06 2006-04-20 Noritsu Koki Co Ltd Photosensitive material processing equipment

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