CN105803406A - 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 - Google Patents
一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 Download PDFInfo
- Publication number
- CN105803406A CN105803406A CN201610144237.6A CN201610144237A CN105803406A CN 105803406 A CN105803406 A CN 105803406A CN 201610144237 A CN201610144237 A CN 201610144237A CN 105803406 A CN105803406 A CN 105803406A
- Authority
- CN
- China
- Prior art keywords
- target
- rare
- transition metal
- rare earth
- earth transition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 94
- 239000000956 alloy Substances 0.000 title claims abstract description 94
- 229910052761 rare earth metal Inorganic materials 0.000 title claims abstract description 78
- 150000002910 rare earth metals Chemical class 0.000 title claims abstract description 34
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 230000007704 transition Effects 0.000 title claims abstract description 17
- 239000007888 film coating Substances 0.000 title abstract 2
- 238000009501 film coating Methods 0.000 title abstract 2
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 62
- -1 rare earth transition metal Chemical class 0.000 claims abstract description 44
- 229910052738 indium Inorganic materials 0.000 claims abstract description 32
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000003754 machining Methods 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 229910052786 argon Inorganic materials 0.000 claims abstract description 8
- 239000013077 target material Substances 0.000 claims description 33
- 239000010935 stainless steel Substances 0.000 claims description 27
- 229910001220 stainless steel Inorganic materials 0.000 claims description 27
- 238000003825 pressing Methods 0.000 claims description 21
- 150000003624 transition metals Chemical class 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 12
- 238000005498 polishing Methods 0.000 claims description 12
- 238000002604 ultrasonography Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000000465 moulding Methods 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000000227 grinding Methods 0.000 claims description 6
- 239000000155 melt Substances 0.000 claims description 6
- 239000000741 silica gel Substances 0.000 claims description 6
- 229910002027 silica gel Inorganic materials 0.000 claims description 6
- 229910052779 Neodymium Inorganic materials 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 5
- 239000011812 mixed powder Substances 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 3
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 3
- 229910052772 Samarium Inorganic materials 0.000 claims description 3
- 229910052771 Terbium Inorganic materials 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 230000014759 maintenance of location Effects 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 14
- 238000005204 segregation Methods 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 3
- 238000003466 welding Methods 0.000 abstract description 2
- 238000001513 hot isostatic pressing Methods 0.000 abstract 3
- 230000007547 defect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000010030 laminating Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 9
- 238000001514 detection method Methods 0.000 description 5
- 238000011049 filling Methods 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- 229910002546 FeCo Inorganic materials 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910001092 metal group alloy Inorganic materials 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 229910052571 earthenware Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610144237.6A CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610144237.6A CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105803406A true CN105803406A (zh) | 2016-07-27 |
| CN105803406B CN105803406B (zh) | 2019-04-09 |
Family
ID=56467295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610144237.6A Active CN105803406B (zh) | 2016-03-14 | 2016-03-14 | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105803406B (zh) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107190242A (zh) * | 2017-05-12 | 2017-09-22 | 华侨大学 | 一种具有大范围可调矫顽力纳米厚度稀土‑过渡合金薄膜的制备方法 |
| CN110453187A (zh) * | 2019-08-21 | 2019-11-15 | 东莞市欧莱溅射靶材有限公司 | 一种ito靶管与钛背管绑定预处理的方法 |
| WO2024051599A1 (zh) * | 2022-09-07 | 2024-03-14 | 有研稀土新材料股份有限公司 | 一种稀土旋转靶材及其制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1033654A (zh) * | 1987-09-17 | 1989-07-05 | 精工爱普生株式会社 | 光磁记录介质、溅射用靶及溅射用靶的制造方法 |
| CN1136331A (zh) * | 1993-12-02 | 1996-11-20 | 材料研究公司 | 磁光合金溅射靶 |
| CN104032274A (zh) * | 2014-06-12 | 2014-09-10 | 贵研铂业股份有限公司 | 一种CoCrPt系合金溅射靶材和薄膜及其制备方法 |
-
2016
- 2016-03-14 CN CN201610144237.6A patent/CN105803406B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1033654A (zh) * | 1987-09-17 | 1989-07-05 | 精工爱普生株式会社 | 光磁记录介质、溅射用靶及溅射用靶的制造方法 |
| CN1136331A (zh) * | 1993-12-02 | 1996-11-20 | 材料研究公司 | 磁光合金溅射靶 |
| CN104032274A (zh) * | 2014-06-12 | 2014-09-10 | 贵研铂业股份有限公司 | 一种CoCrPt系合金溅射靶材和薄膜及其制备方法 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107190242A (zh) * | 2017-05-12 | 2017-09-22 | 华侨大学 | 一种具有大范围可调矫顽力纳米厚度稀土‑过渡合金薄膜的制备方法 |
| CN110453187A (zh) * | 2019-08-21 | 2019-11-15 | 东莞市欧莱溅射靶材有限公司 | 一种ito靶管与钛背管绑定预处理的方法 |
| WO2024051599A1 (zh) * | 2022-09-07 | 2024-03-14 | 有研稀土新材料股份有限公司 | 一种稀土旋转靶材及其制备方法 |
| GB2637414A (en) * | 2022-09-07 | 2025-07-23 | Grirem Advanced Mat Co Ltd | Rare earth rotary target and preparation method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105803406B (zh) | 2019-04-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5834663A (en) | Sintered magnet and method for making | |
| CN105008578A (zh) | 圆筒形Cu-Ga合金溅射靶材和其制造方法 | |
| US20060151321A1 (en) | Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body | |
| US4824481A (en) | Sputtering targets for magneto-optic films and a method for making | |
| CN109585113A (zh) | 一种烧结钕铁硼磁体的制备方法 | |
| JPH0768612B2 (ja) | 希土類金属―鉄族金属ターゲット用合金粉末、希土類金属―鉄族金属ターゲット、およびそれらの製造方法 | |
| CN105741994A (zh) | 一种钕铁硼磁体的制作方法 | |
| CN105803406A (zh) | 一种磁光记录介质镀膜用稀土过渡合金旋转靶材的制备方法及其制备靶材 | |
| CN104630527A (zh) | 一种制备铜基金刚石复合材料的方法 | |
| TW384487B (en) | Magnet alloy thin-tape and the resin-bonding magnet | |
| CN106946567B (zh) | 一种铁铝金属间化合物与ZrO2复相材料手机陶瓷背板的制备方法 | |
| WO2005056238A1 (fr) | Procede de fabrication d'un outil de broyage ultra-dur contenant un liant metallique ou ceramique | |
| CN111850485A (zh) | 一种钼合金靶材制备方法 | |
| US20170169998A1 (en) | In-Cu Alloy Sputtering Target And Method For Producing The Same | |
| CN106011758B (zh) | 一种光通信和磁储存镀膜用稀土-过渡金属旋转靶材及其制备方法 | |
| CN105033204B (zh) | 一种用于烧结磁体的急冷合金片 | |
| JP7648429B2 (ja) | スパッタリングターゲット部材、スパッタリングターゲット組立品、及び成膜方法 | |
| JPS6256543A (ja) | 希土類合金焼結体の製造方法 | |
| CN114606416B (zh) | 一种黏性流动态高熵非晶合金增强铝基复合材料及其制备方法 | |
| JPH02250964A (ja) | センダスト合金ターゲットおよびその製造方法 | |
| JPS6350469A (ja) | スパツタリング用合金タ−ゲツトの製造方法 | |
| CN116396723A (zh) | 陶瓷基多元无机盐复合相变储热材料及其制备方法 | |
| JP2534028B2 (ja) | 合金の粉砕方法 | |
| JPS63143255A (ja) | 合金タ−ゲツト材 | |
| CN109825741A (zh) | 一种Ni基金属触媒及其利用触媒制备IC芯片抛光垫修整用特种金刚石的方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200922 Address after: 110000 No. twenty-five, No. 91, developed by Shenyang economic and Technological Development Zone, Liaoning Patentee after: SHENYANG WEITAI SCIENCE AND TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: 214192 No. three, No. 99, Furong Road, Xishan economic and Technological Development Zone, Xishan District, Jiangsu, Wuxi Patentee before: WUXI XUMATIC NEW ENERGY TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220615 Address after: 213000 No. 61, Fuyang Road, Tianning District, Changzhou City, Jiangsu Province Patentee after: Yaxin semiconductor materials (Jiangsu) Co.,Ltd. Patentee after: Yaxin Electronic Technology (Changzhou) Co., Ltd Address before: 110000 No.91, No.25 Kaifa Road, Shenyang Economic and Technological Development Zone, Liaoning Province Patentee before: SHENYANG WEITAI SCIENCE AND TECHNOLOGY DEVELOPMENT CO.,LTD. |
|
| TR01 | Transfer of patent right |