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BRPI0924261A2 - Reator de leito fluidizado para a produção de silício de alta pureza - Google Patents

Reator de leito fluidizado para a produção de silício de alta pureza

Info

Publication number
BRPI0924261A2
BRPI0924261A2 BRPI0924261-9A BRPI0924261A BRPI0924261A2 BR PI0924261 A2 BRPI0924261 A2 BR PI0924261A2 BR PI0924261 A BRPI0924261 A BR PI0924261A BR PI0924261 A2 BRPI0924261 A2 BR PI0924261A2
Authority
BR
Brazil
Prior art keywords
high purity
bed reactor
fluid bed
purity silicon
silicon production
Prior art date
Application number
BRPI0924261-9A
Other languages
English (en)
Inventor
Matthew S Bethards
Javier San Segundo Sanchez
José Luis Montesinos Barona
Evaristo Ayuso Conejero
Manuel Vicente Vales Canle
Xavier Benavides Rel
Pedro Thomas Lujan Garcia
Original Assignee
Siliken Chemicals S L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siliken Chemicals S L filed Critical Siliken Chemicals S L
Publication of BRPI0924261A2 publication Critical patent/BRPI0924261A2/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/037Purification
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818Feeding of the fluidising gas
    • B01J8/1827Feeding of the fluidising gas the fluidising gas being a reactant
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/029Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • C01B33/021Preparation
    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00389Controlling the temperature using electric heating or cooling elements
    • B01J2208/00407Controlling the temperature using electric heating or cooling elements outside the reactor bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00389Controlling the temperature using electric heating or cooling elements
    • B01J2208/00415Controlling the temperature using electric heating or cooling elements electric resistance heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00433Controlling the temperature using electromagnetic heating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00433Controlling the temperature using electromagnetic heating
    • B01J2208/0046Infrared radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0236Metal based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
BRPI0924261-9A 2009-02-26 2009-11-20 Reator de leito fluidizado para a produção de silício de alta pureza BRPI0924261A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/393,852 US8168123B2 (en) 2009-02-26 2009-02-26 Fluidized bed reactor for production of high purity silicon
PCT/US2009/065345 WO2010098797A1 (en) 2009-02-26 2009-11-20 Fluidized bed reactor for production of high purity silicon

Publications (1)

Publication Number Publication Date
BRPI0924261A2 true BRPI0924261A2 (pt) 2015-08-25

Family

ID=42631134

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0924261-9A BRPI0924261A2 (pt) 2009-02-26 2009-11-20 Reator de leito fluidizado para a produção de silício de alta pureza

Country Status (12)

Country Link
US (3) US8168123B2 (pt)
EP (1) EP2318313A4 (pt)
JP (1) JP2012519130A (pt)
KR (1) KR20110132338A (pt)
CN (1) CN102239115A (pt)
AU (1) AU2009341100A1 (pt)
BR (1) BRPI0924261A2 (pt)
CA (1) CA2753354A1 (pt)
MX (1) MX2011008790A (pt)
RU (1) RU2011139109A (pt)
TW (1) TW201034757A (pt)
WO (1) WO2010098797A1 (pt)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101676203B (zh) 2008-09-16 2015-06-10 储晞 生产高纯颗粒硅的方法
JP2010171388A (ja) * 2008-12-25 2010-08-05 Hitachi Kokusai Electric Inc 基板処理装置及び半導体装置の製造方法及び基板処理用反応管
US8168123B2 (en) * 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
WO2010108065A1 (en) * 2009-03-19 2010-09-23 Ae Polysilicon Corporation Silicide - coated metal surfaces and methods of utilizing same
WO2010123869A1 (en) * 2009-04-20 2010-10-28 Ae Polysilicon Corporation Methods and system for cooling a reaction effluent gas
JP2012523963A (ja) * 2009-04-20 2012-10-11 エーイー ポリシリコン コーポレーション ケイ化物がコーティングされた金属表面を有する反応器
US8029756B1 (en) * 2010-03-30 2011-10-04 Peak Sun Sillcon Corporation Closed-loop silicon production
CN101935038B (zh) * 2010-08-13 2013-04-10 镇江环太硅科技有限公司 硅锭切割废料回收方法
US20120148728A1 (en) * 2010-12-09 2012-06-14 Siliken Sa Methods and apparatus for the production of high purity silicon
KR20140005199A (ko) * 2011-01-19 2014-01-14 알이씨 실리콘 인코포레이티드 반응기 시스템 및 이를 사용한 다결정 실리콘 제조 방법
DE102011077970A1 (de) * 2011-06-22 2012-12-27 Wacker Chemie Ag Vorrichtung und Verfahren zur Temperaturbehandlung von korrosiven Gasen
US8875728B2 (en) 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
EP2883613B1 (en) * 2012-08-13 2020-09-09 Jiangsu Zhongneng Polysilicon Technology Development Co., Ltd. Method for preparing high sphericity seed crystal and fluidized bed particle silicon
US9452403B2 (en) * 2012-10-19 2016-09-27 Sunedison, Inc. Using wavelet decomposition to determine the fluidization quality in a fluidized bed reactor
US9587993B2 (en) 2012-11-06 2017-03-07 Rec Silicon Inc Probe assembly for a fluid bed reactor
US9212421B2 (en) 2013-07-10 2015-12-15 Rec Silicon Inc Method and apparatus to reduce contamination of particles in a fluidized bed reactor
WO2014074510A1 (en) * 2012-11-06 2014-05-15 Rec Silicon Inc Method and apparatus to reduce contamination of particles in a fluidized bed reactor
KR20150096458A (ko) * 2012-12-21 2015-08-24 알이씨 실리콘 인코포레이티드 유동상 반응기 설비용 고온 등급 스틸
US9297765B2 (en) * 2013-03-14 2016-03-29 Sunedison, Inc. Gas decomposition reactor feedback control using Raman spectrometry
DE102013206339A1 (de) 2013-04-10 2014-10-16 Wacker Chemie Ag Vorrichtung und Verfahren zum Ausbau von polykristallinen Siliciumstäben aus einem Reaktor
US20170021319A1 (en) * 2014-03-10 2017-01-26 Sitec Gmbh Hydrochlorination reactor
US9662628B2 (en) 2014-08-15 2017-05-30 Rec Silicon Inc Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor
US20160045881A1 (en) * 2014-08-15 2016-02-18 Rec Silicon Inc High-purity silicon to form silicon carbide for use in a fluidized bed reactor
US9446367B2 (en) 2014-08-15 2016-09-20 Rec Silicon Inc Joint design for segmented silicon carbide liner in a fluidized bed reactor
US9238211B1 (en) 2014-08-15 2016-01-19 Rec Silicon Inc Segmented silicon carbide liner
CN105498664B (zh) * 2014-11-20 2017-09-12 江苏科技大学 一种磁流化床装置的控制方法
DE102015205727A1 (de) 2015-03-30 2016-10-06 Wacker Chemie Ag Wirbelschichtreaktor zur Herstellung von Chlorsilanen
TWI663281B (zh) * 2015-06-16 2019-06-21 Versum Materials Us, Llc 鹵代矽烷化合物的製備方法、組合物及含有其的容器
AU2016336428A1 (en) * 2015-10-09 2018-05-24 Milwaukee Silicon, Llc Devices and systems for purifying silicon
US11434138B2 (en) 2017-10-27 2022-09-06 Kevin Allan Dooley Inc. System and method for manufacturing high purity silicon
KR20220104151A (ko) * 2019-11-22 2022-07-26 가부시끼가이샤 도꾸야마 트리클로로실란의 제조 방법 및 배관
RU2744449C1 (ru) * 2019-12-27 2021-03-09 Федеральное государственное бюджетное учреждение науки Институт проблем химической физики Российской Академии наук (ФГБУН ИПХФ РАН) Кремнийсодержащий активный материал для отрицательного электрода и способ его получения
CN116194204A (zh) * 2020-09-21 2023-05-30 帝斯曼知识产权资产管理有限公司 用于减少氢化反应中金属性过渡金属在金属零件上沉积的陶瓷涂层

Family Cites Families (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2843458A (en) * 1955-10-20 1958-07-15 Cabot Godfrey L Inc Process for producing silicon tetrachloride
GB1159823A (en) * 1965-08-06 1969-07-30 Montedison Spa Protective Coatings
US4393013A (en) 1970-05-20 1983-07-12 J. C. Schumacher Company Vapor mass flow control system
US3906605A (en) * 1973-06-18 1975-09-23 Olin Corp Process for preparing heat exchanger tube
US4084024A (en) 1975-11-10 1978-04-11 J. C. Schumacher Co. Process for the production of silicon of high purity
US4298037A (en) 1976-12-02 1981-11-03 J. C. Schumacher Co. Method of shipping and using semiconductor liquid source materials
US4134514A (en) 1976-12-02 1979-01-16 J C Schumacher Co. Liquid source material container and method of use for semiconductor device manufacturing
US4140735A (en) 1977-08-15 1979-02-20 J. C. Schumacher Co. Process and apparatus for bubbling gas through a high purity liquid
US4227291A (en) 1978-06-22 1980-10-14 J. C. Schumacher Co. Energy efficient process for continuous production of thin semiconductor films on metallic substrates
US4341610A (en) 1978-06-22 1982-07-27 Schumacher John C Energy efficient process for continuous production of thin semiconductor films on metallic substrates
US4318942A (en) 1978-08-18 1982-03-09 J. C. Schumacher Company Process for producing polycrystalline silicon
US4298942A (en) * 1979-12-19 1981-11-03 The United States Of America As Represented By The Secretary Of The Air Force Nonlinear amplitude detector
US4436674A (en) 1981-07-30 1984-03-13 J.C. Schumacher Co. Vapor mass flow control system
US4891201A (en) 1982-07-12 1990-01-02 Diamond Cubic Liquidation Trust Ultra-pure epitaxial silicon
US4818495A (en) 1982-11-05 1989-04-04 Union Carbide Corporation Reactor for fluidized bed silane decomposition
US4979643A (en) 1985-06-21 1990-12-25 Air Products And Chemicals, Inc. Chemical refill system
US4859375A (en) 1986-12-29 1989-08-22 Air Products And Chemicals, Inc. Chemical refill system
KR880000618B1 (ko) 1985-12-28 1988-04-18 재단법인 한국화학연구소 초단파 가열 유동상 반응에 의한 고순도 다결정 실리콘의 제조 방법
US4883687A (en) 1986-08-25 1989-11-28 Ethyl Corporation Fluid bed process for producing polysilicon
US4820587A (en) 1986-08-25 1989-04-11 Ethyl Corporation Polysilicon produced by a fluid bed process
JPS63117906A (ja) * 1986-11-07 1988-05-21 Shin Etsu Chem Co Ltd 多結晶シリコン製造装置用部材
JPS63230504A (ja) * 1987-03-18 1988-09-27 Mitsui Toatsu Chem Inc 塩素の製造方法
DE3711444A1 (de) 1987-04-04 1988-10-13 Huels Troisdorf Verfahren und vorrichtung zur herstellung von dichlorsilan
US5139762A (en) 1987-12-14 1992-08-18 Advanced Silicon Materials, Inc. Fluidized bed for production of polycrystalline silicon
US5242671A (en) 1988-10-11 1993-09-07 Ethyl Corporation Process for preparing polysilicon with diminished hydrogen content by using a fluidized bed with a two-step heating process
US5326547A (en) 1988-10-11 1994-07-05 Albemarle Corporation Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process
JPH02233514A (ja) 1989-03-06 1990-09-17 Osaka Titanium Co Ltd 多結晶シリコンの製造方法
US5284676A (en) 1990-08-17 1994-02-08 Carbon Implants, Inc. Pyrolytic deposition in a fluidized bed
JPH06127922A (ja) * 1992-10-16 1994-05-10 Tonen Chem Corp 多結晶シリコン製造用流動層反応器
GB2271518B (en) 1992-10-16 1996-09-25 Korea Res Inst Chem Tech Heating of fluidized bed reactor by microwave
US5445742A (en) 1994-05-23 1995-08-29 Dow Corning Corporation Process for purifying halosilanes
US5516345A (en) 1994-06-30 1996-05-14 Iowa State University Research Foundation, Inc. Latent heat-ballasted gasifier method
FI96541C (fi) 1994-10-03 1996-07-10 Ahlstroem Oy Järjestely seinämässä sekä menetelmä seinämän pinnoittamiseksi
JP3705623B2 (ja) * 1995-03-24 2005-10-12 株式会社トクヤマ シラン類の分解・還元反応装置および高純度結晶シリコンの製造方法
US5798137A (en) 1995-06-07 1998-08-25 Advanced Silicon Materials, Inc. Method for silicon deposition
US5976247A (en) 1995-06-14 1999-11-02 Memc Electronic Materials, Inc. Surface-treated crucibles for improved zero dislocation performance
US5776416A (en) 1995-11-14 1998-07-07 Tokuyama Corporation Cyclone and fluidized bed reactor having same
US6060021A (en) 1997-05-07 2000-05-09 Tokuyama Corporation Method of storing trichlorosilane and silicon tetrachloride
DE19735378A1 (de) 1997-08-14 1999-02-18 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumgranulat
US5910295A (en) 1997-11-10 1999-06-08 Memc Electronic Materials, Inc. Closed loop process for producing polycrystalline silicon and fumed silica
GB9902099D0 (en) 1999-01-29 1999-03-24 Boc Group Plc Vacuum pump systems
DE19948395A1 (de) * 1999-10-06 2001-05-03 Wacker Chemie Gmbh Strahlungsbeheizter Fliessbettreaktor
KR100731558B1 (ko) 2000-08-02 2007-06-22 미쯔비시 마테리알 폴리실리콘 가부시끼가이샤 육염화이규소의 제조 방법
US7056484B2 (en) 2000-09-14 2006-06-06 Solarworld Aktiengesellschaft Method for producing trichlorosilane
DE10057481A1 (de) 2000-11-20 2002-05-23 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium
DE10060469A1 (de) 2000-12-06 2002-07-04 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium
DE10061680A1 (de) 2000-12-11 2002-06-20 Solarworld Ag Verfahren zur Herstellung von Silan
DE10062419A1 (de) 2000-12-14 2002-08-01 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium
DE10063862A1 (de) 2000-12-21 2002-07-11 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularen Silizium
KR100411180B1 (ko) 2001-01-03 2003-12-18 한국화학연구원 다결정실리콘의 제조방법과 그 장치
DE10118483C1 (de) 2001-04-12 2002-04-18 Wacker Chemie Gmbh Staubrückführung bei der Direktsynthese von Chlor- und Methylchlorsilanen in Wirbelschicht
DE10124848A1 (de) 2001-05-22 2002-11-28 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium in einer Wirbelschicht
US7033561B2 (en) 2001-06-08 2006-04-25 Dow Corning Corporation Process for preparation of polycrystalline silicon
US20020187096A1 (en) 2001-06-08 2002-12-12 Kendig James Edward Process for preparation of polycrystalline silicon
US6932954B2 (en) 2001-10-19 2005-08-23 Tokuyama Corporation Method for producing silicon
AU2003211024A1 (en) 2002-02-14 2003-09-04 Advanced Silicon Materials Llc Energy efficient method for growing polycrystalline silicon
WO2004035472A1 (ja) * 2002-09-12 2004-04-29 Takayuki Shimamune 高純度シリコンの製造方法及び装置
NO321276B1 (no) 2003-07-07 2006-04-18 Elkem Materials Fremgangsmate for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan
GB0327169D0 (en) * 2003-11-21 2003-12-24 Statoil Asa Method
JP2007522649A (ja) 2003-12-23 2007-08-09 ジョン シー. シューマカー、 半導体反応器用の排気調整システム
US20070178028A1 (en) 2004-02-23 2007-08-02 Eiichi Fukasawa Apparatus for production of metal chloride
DE102004010055A1 (de) 2004-03-02 2005-09-22 Degussa Ag Verfahren zur Herstellung von Silicium
US7141114B2 (en) 2004-06-30 2006-11-28 Rec Silicon Inc Process for producing a crystalline silicon ingot
US20060105105A1 (en) 2004-11-12 2006-05-18 Memc Electronic Materials, Inc. High purity granular silicon and method of manufacturing the same
US8029914B2 (en) * 2005-05-10 2011-10-04 Exxonmobile Research And Engineering Company High performance coated material with improved metal dusting corrosion resistance
US7462211B2 (en) 2005-06-29 2008-12-09 Exxonmobil Chemical Patents Inc. Gas-solids separation device and method
CN101316651B (zh) 2005-07-19 2011-03-02 瑞科硅公司 硅喷动流化床
DE102005039118A1 (de) 2005-08-18 2007-02-22 Wacker Chemie Ag Verfahren und Vorrichtung zum Zerkleinern von Silicium
DE102005042753A1 (de) 2005-09-08 2007-03-15 Wacker Chemie Ag Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor
NO20054402L (no) 2005-09-22 2007-03-23 Elkem As Method for production of trichlorosilane and silicon for use in the production of trichlorosilane
AU2007226533B2 (en) * 2006-03-15 2012-12-13 Reaction Sciences, Inc. Method for making silicon for solar cells and other applications
EP2021279A2 (en) 2006-04-13 2009-02-11 Cabot Corporation Production of silicon through a closed-loop process
US7935327B2 (en) 2006-08-30 2011-05-03 Hemlock Semiconductor Corporation Silicon production with a fluidized bed reactor integrated into a siemens-type process
DE102007021003A1 (de) 2007-05-04 2008-11-06 Wacker Chemie Ag Verfahren zur kontinuierlichen Herstellung von polykristallinem hochreinen Siliciumgranulat
US7927984B2 (en) 2008-11-05 2011-04-19 Hemlock Semiconductor Corporation Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition
US8168123B2 (en) 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon

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US20110027160A1 (en) 2011-02-03
US20100215562A1 (en) 2010-08-26
JP2012519130A (ja) 2012-08-23
TW201034757A (en) 2010-10-01
MX2011008790A (es) 2011-12-14
RU2011139109A (ru) 2013-11-20
CA2753354A1 (en) 2010-09-02
US20120171102A1 (en) 2012-07-05
US8158093B2 (en) 2012-04-17
KR20110132338A (ko) 2011-12-07
EP2318313A4 (en) 2013-05-01
WO2010098797A1 (en) 2010-09-02
CN102239115A (zh) 2011-11-09
EP2318313A1 (en) 2011-05-11
US8168123B2 (en) 2012-05-01

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