BR9902291A - Processo e instalação para a aplicação e complementação de um eletrólito em uma instalação de tratamento eletroquìmico - Google Patents
Processo e instalação para a aplicação e complementação de um eletrólito em uma instalação de tratamento eletroquìmicoInfo
- Publication number
- BR9902291A BR9902291A BR9902291-5A BR9902291A BR9902291A BR 9902291 A BR9902291 A BR 9902291A BR 9902291 A BR9902291 A BR 9902291A BR 9902291 A BR9902291 A BR 9902291A
- Authority
- BR
- Brazil
- Prior art keywords
- installation
- electrolyte
- application
- electrochemical treatment
- supplementation
- Prior art date
Links
- 238000009434 installation Methods 0.000 title abstract 5
- 239000003792 electrolyte Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 230000009469 supplementation Effects 0.000 title 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/12—Electroforming by electrophoresis
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
Patente de Invenção: <B>"PROCESSO E INSTALAçãO PARA A APLICAçãO E COMPLEMENTAçãO DE UM ELETRóLITO EM UMA INSTALAçãO DE TRATAMENTO ELETROQUìMICO"<D>. A invenção refere-se a um processo e a uma instalação para a aplicação, assim como para a complementação, de um eletrólito em uma instalação de tratamento eletroquímico. Ela caracateriza-se principalmente pelo fato de que os necessários sais eletrolíticos e/ou substâncias químicas são fornecidos ao eletrólito através do vácuo gerado em uma máquina de borrifar 12.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT0105798A AT408353B (de) | 1998-06-19 | 1998-06-19 | Verfahren und anlage zum ansetzen sowie zum ergänzen eines elektrolyts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9902291A true BR9902291A (pt) | 2000-02-29 |
Family
ID=3505656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9902291-5A BR9902291A (pt) | 1998-06-19 | 1999-06-17 | Processo e instalação para a aplicação e complementação de um eletrólito em uma instalação de tratamento eletroquìmico |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6231729B1 (pt) |
| JP (1) | JP2000034595A (pt) |
| KR (1) | KR100476102B1 (pt) |
| CN (1) | CN1196815C (pt) |
| AT (1) | AT408353B (pt) |
| BE (1) | BE1012406A3 (pt) |
| BR (1) | BR9902291A (pt) |
| DE (1) | DE19923944A1 (pt) |
| FR (1) | FR2780071B1 (pt) |
| TW (1) | TW460628B (pt) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100522873C (zh) * | 2005-12-30 | 2009-08-05 | 中国科学院上海硅酸盐研究所 | 一种铋层状结构弛豫铁电陶瓷材料及其制备方法 |
| CN1986485B (zh) * | 2006-12-25 | 2012-08-08 | 中国科学院上海硅酸盐研究所 | 一种高体电阻率铋层状结构压电陶瓷材料及其制备方法 |
| DE102009023124A1 (de) * | 2008-05-28 | 2009-12-03 | Ipt International Plating Technologies Gmbh | Verfahren zur galvanischen Kupferbeschichtung und Vorrichtung zur Durchführung eines solchen Verfahrens |
| EP2194165A1 (en) * | 2008-10-21 | 2010-06-09 | Rohm and Haas Electronic Materials LLC | Method for replenishing tin and its alloying metals in electrolyte solutions |
| DE102008058086B4 (de) * | 2008-11-18 | 2013-05-23 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen |
| JP5458604B2 (ja) * | 2009-03-04 | 2014-04-02 | 三菱マテリアル株式会社 | Sn合金めっき装置及びそのSn成分補給方法 |
| CN103361709B (zh) * | 2012-03-27 | 2016-04-06 | 上海梅山钢铁股份有限公司 | 电镀金属陶瓷镀液均匀性及稳定性控制装置 |
| WO2014033890A1 (ja) * | 2012-08-31 | 2014-03-06 | 株式会社日立製作所 | 非水系電気めっき方法および非水系電気めっき装置 |
| US9462359B2 (en) * | 2014-04-25 | 2016-10-04 | Huawei Technologies Co., Ltd. | System and method for photonic switching |
| CN105442024A (zh) * | 2015-12-30 | 2016-03-30 | 桂林斯壮微电子有限责任公司 | 药液自动添加系统 |
| JP6416435B1 (ja) * | 2018-08-22 | 2018-10-31 | 株式会社荏原製作所 | 基板のめっきに使用される酸化銅固形物、該酸化銅固形物を製造する方法、およびめっき液をめっき槽まで供給するための装置 |
| CN112111768A (zh) * | 2020-10-19 | 2020-12-22 | 新疆众和股份有限公司 | 阳极氧化补充装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3194540A (en) | 1961-07-28 | 1965-07-13 | Liberty Nat Bank And Trust Com | Homogenizing apparatus |
| US4599363A (en) * | 1979-07-13 | 1986-07-08 | Lever Brothers Company | Method for wetting and dispersing powders |
| JPS57171700A (en) * | 1981-04-15 | 1982-10-22 | Sumitomo Metal Ind Ltd | Electroplating method |
| JPS62199800A (ja) * | 1986-02-27 | 1987-09-03 | Kawasaki Steel Corp | 電気めつきにおけるめつき用金属粒供給方法およびその装置 |
| JP2681813B2 (ja) * | 1988-11-09 | 1997-11-26 | クニミネ工業株式会社 | 分散液調製装置 |
| DE9000771U1 (de) * | 1990-01-24 | 1990-03-29 | Degussa Ag, 6000 Frankfurt | Vorrichtung zum Dosieren in galvanischen Bädern |
| DE4118870A1 (de) | 1991-06-07 | 1992-12-17 | Ystral Gmbh Maschinenbau Und P | Vorrichtung zum benetzen und dispergieren von pulvern in fluessigkeiten |
| US5882502A (en) * | 1992-04-01 | 1999-03-16 | Rmg Services Pty Ltd. | Electrochemical system and method |
| KR100241575B1 (ko) * | 1994-02-28 | 2000-03-02 | 에모또 간지 | 도금용 금속분말의 연속용해장치 및 그 장치에 의한 금속 Ni 의 용해방법 |
| US5609747A (en) * | 1995-08-17 | 1997-03-11 | Kawasaki Steel Corporation | Method of dissolving zinc oxide |
-
1998
- 1998-06-19 AT AT0105798A patent/AT408353B/de not_active IP Right Cessation
-
1999
- 1999-05-24 TW TW088108448A patent/TW460628B/zh not_active IP Right Cessation
- 1999-05-25 DE DE19923944A patent/DE19923944A1/de not_active Withdrawn
- 1999-06-01 BE BE9900381A patent/BE1012406A3/fr not_active IP Right Cessation
- 1999-06-11 FR FR9907420A patent/FR2780071B1/fr not_active Expired - Fee Related
- 1999-06-17 BR BR9902291-5A patent/BR9902291A/pt not_active Application Discontinuation
- 1999-06-18 JP JP11172750A patent/JP2000034595A/ja active Pending
- 1999-06-18 CN CNB991085094A patent/CN1196815C/zh not_active Expired - Fee Related
- 1999-06-18 US US09/335,895 patent/US6231729B1/en not_active Expired - Fee Related
- 1999-06-18 KR KR19990022939A patent/KR100476102B1/ko not_active Expired - Fee Related
-
2001
- 2001-03-28 US US09/818,643 patent/US6451194B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE19923944A1 (de) | 1999-12-23 |
| KR20000006292A (ko) | 2000-01-25 |
| ATA105798A (de) | 2001-03-15 |
| US6231729B1 (en) | 2001-05-15 |
| JP2000034595A (ja) | 2000-02-02 |
| FR2780071A1 (fr) | 1999-12-24 |
| FR2780071B1 (fr) | 2002-04-05 |
| AT408353B (de) | 2001-11-26 |
| CN1196815C (zh) | 2005-04-13 |
| CN1240241A (zh) | 2000-01-05 |
| US20010017266A1 (en) | 2001-08-30 |
| KR100476102B1 (ko) | 2005-03-10 |
| TW460628B (en) | 2001-10-21 |
| US6451194B2 (en) | 2002-09-17 |
| BE1012406A3 (fr) | 2000-10-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |