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AU2001290869A1 - Tool and method for in situ vapor phase deposition source material reloading andmaintenance - Google Patents

Tool and method for in situ vapor phase deposition source material reloading andmaintenance

Info

Publication number
AU2001290869A1
AU2001290869A1 AU2001290869A AU9086901A AU2001290869A1 AU 2001290869 A1 AU2001290869 A1 AU 2001290869A1 AU 2001290869 A AU2001290869 A AU 2001290869A AU 9086901 A AU9086901 A AU 9086901A AU 2001290869 A1 AU2001290869 A1 AU 2001290869A1
Authority
AU
Australia
Prior art keywords
andmaintenance
tool
vapor phase
source material
deposition source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001290869A
Inventor
Daniel W. Bullock
Vincent P. Labella
Paul M. Thibado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Arkansas at Little Rock
Original Assignee
University of Arkansas at Fayetteville
University of Arkansas at Little Rock
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Arkansas at Fayetteville, University of Arkansas at Little Rock filed Critical University of Arkansas at Fayetteville
Publication of AU2001290869A1 publication Critical patent/AU2001290869A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AU2001290869A 2000-09-22 2001-09-14 Tool and method for in situ vapor phase deposition source material reloading andmaintenance Abandoned AU2001290869A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/668,899 US6551405B1 (en) 2000-09-22 2000-09-22 Tool and method for in situ vapor phase deposition source material reloading and maintenance
US09668899 2000-09-22
PCT/US2001/028648 WO2002024984A1 (en) 2000-09-22 2001-09-14 Tool and method for in situ vapor phase deposition source material reloading and maintenance

Publications (1)

Publication Number Publication Date
AU2001290869A1 true AU2001290869A1 (en) 2002-04-02

Family

ID=24684201

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001290869A Abandoned AU2001290869A1 (en) 2000-09-22 2001-09-14 Tool and method for in situ vapor phase deposition source material reloading andmaintenance

Country Status (4)

Country Link
US (1) US6551405B1 (en)
EP (1) EP1337699A1 (en)
AU (1) AU2001290869A1 (en)
WO (1) WO2002024984A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2025774B1 (en) * 2006-05-19 2014-03-05 Ulvac, Inc. Vapor deposition apparatus for organic vapor deposition material and process for producing organic thin film
DE102007012370A1 (en) * 2007-03-14 2008-09-18 Createc Fischer & Co. Gmbh Vapor deposition device and vapor deposition method for molecular beam deposition and molecular beam epitaxy
DE102010060292B4 (en) 2010-11-01 2023-05-25 Antec Solar Gmbh Process and CSS reactor for the continuous coating of substrates
US20150368831A1 (en) * 2014-06-18 2015-12-24 King Abdullah University Of Science And Technology Systems and methods for automated production of multi-composition nanomaterial
TWI737718B (en) * 2016-04-25 2021-09-01 美商創新先進材料股份有限公司 Deposition systems including effusion sources, and related methods

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625378A (en) * 1970-06-25 1971-12-07 Frank H Attiz High-vacuum manipulating tool
US4681773A (en) 1981-03-27 1987-07-21 American Telephone And Telegraph Company At&T Bell Laboratories Apparatus for simultaneous molecular beam deposition on a plurality of substrates
US4605469A (en) 1983-11-10 1986-08-12 Texas Instruments Incorporated MBE system with in-situ mounting
US4569829A (en) * 1983-11-10 1986-02-11 Texas Instruments Incorporated MBE Source bakeout system
US4687400A (en) 1984-09-07 1987-08-18 Metals, Ltd. Device for moving objects in a closed container
JPS61122192A (en) 1984-11-19 1986-06-10 Anelva Corp Epitaxial grower with molecular beams
IE56166B1 (en) * 1985-02-15 1991-05-08 Tekscan Ltd Manipulator means
US4966519A (en) 1985-10-24 1990-10-30 Texas Instruments Incorporated Integrated circuit processing system
US5044871A (en) 1985-10-24 1991-09-03 Texas Instruments Incorporated Integrated circuit processing system
US4855255A (en) 1988-03-23 1989-08-08 Massachusetts Institute Of Technology Tapered laser or waveguide optoelectronic method
US4999316A (en) 1988-03-23 1991-03-12 Massachusetts Institute Of Technology Method for forming tapered laser or waveguide optoelectronic structures
US5156815A (en) 1988-09-08 1992-10-20 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
US5080870A (en) 1988-09-08 1992-01-14 Board Of Regents, The University Of Texas System Sublimating and cracking apparatus
DE3908265A1 (en) * 1989-03-14 1990-09-20 Leybold Ag CHARGING DEVICE FOR MELTING PLANTS
JPH0437689A (en) * 1990-05-30 1992-02-07 Hitachi Ltd Molecular beam epitaxy equipment
ES2067381B1 (en) 1993-01-14 1995-10-16 Consejo Superior Investigacion PHOSPHORUS EFFUSION CELL FOR EPITAXIA OF MOLECULAR BEAMS.
US5440575A (en) 1994-04-06 1995-08-08 At&T Corp. Article comprising a semiconductor laser with stble facet coating
US5820681A (en) * 1995-05-03 1998-10-13 Chorus Corporation Unibody crucible and effusion cell employing such a crucible
JPH097947A (en) 1995-06-21 1997-01-10 Anelva Corp Molecular beam cell
FR2748957B1 (en) * 1996-05-22 1998-07-31 Celes PRESSURE INJECTION OR CASTING MACHINE
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process

Also Published As

Publication number Publication date
US6551405B1 (en) 2003-04-22
EP1337699A1 (en) 2003-08-27
WO2002024984A1 (en) 2002-03-28

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