[go: up one dir, main page]

AU2001285636A1 - Method and device for treating surfaces using a glow discharge plasma - Google Patents

Method and device for treating surfaces using a glow discharge plasma

Info

Publication number
AU2001285636A1
AU2001285636A1 AU2001285636A AU8563601A AU2001285636A1 AU 2001285636 A1 AU2001285636 A1 AU 2001285636A1 AU 2001285636 A AU2001285636 A AU 2001285636A AU 8563601 A AU8563601 A AU 8563601A AU 2001285636 A1 AU2001285636 A1 AU 2001285636A1
Authority
AU
Australia
Prior art keywords
glow discharge
discharge plasma
treating surfaces
treating
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001285636A
Inventor
Pierre Fayet
Bertrand Roessler
Walter Schwarzenbach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tetra Pak Suisse SA
Original Assignee
Tetra Pak Suisse SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tetra Pak Suisse SA filed Critical Tetra Pak Suisse SA
Publication of AU2001285636A1 publication Critical patent/AU2001285636A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
AU2001285636A 2000-09-22 2001-09-17 Method and device for treating surfaces using a glow discharge plasma Abandoned AU2001285636A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH01850/00A CH694949A5 (en) 2000-09-22 2000-09-22 Method and apparatus for the treatment of surfaces by means of a glow discharge plasma.
CH1850/00 2000-09-22
PCT/CH2001/000559 WO2002025693A1 (en) 2000-09-22 2001-09-17 Method and device for treating surfaces using a glow discharge plasma

Publications (1)

Publication Number Publication Date
AU2001285636A1 true AU2001285636A1 (en) 2002-04-02

Family

ID=4566500

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001285636A Abandoned AU2001285636A1 (en) 2000-09-22 2001-09-17 Method and device for treating surfaces using a glow discharge plasma

Country Status (7)

Country Link
US (1) US6919107B2 (en)
EP (1) EP1325509B1 (en)
JP (1) JP2004535037A (en)
AU (1) AU2001285636A1 (en)
CH (1) CH694949A5 (en)
DE (1) DE50115255D1 (en)
WO (1) WO2002025693A1 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8357242B2 (en) * 2007-05-03 2013-01-22 Jewett Russell F Crystalline film devices, apparatuses for and methods of fabrication
EP1705965A1 (en) * 2005-03-21 2006-09-27 Universiteit Gent Method and system for plasma treatment under high pressure
CH697933B1 (en) * 2005-11-03 2009-03-31 Tetra Laval Holdings & Finance Method and apparatus for coating plastic films with an oxide layer.
DE112007003640B4 (en) * 2007-08-31 2013-01-17 Toshiba Mitsubishi-Electric Industrial Systems Corporation Apparatus for generating a plasma by means of a dielectric barrier discharge
JP5491755B2 (en) * 2009-03-26 2014-05-14 パナソニック株式会社 Deposition equipment
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
EP3222749A1 (en) 2009-05-13 2017-09-27 SiO2 Medical Products, Inc. Outgassing method for inspecting a coated surface
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
DE102010026722A1 (en) * 2010-07-09 2012-01-12 Ahlbrandt System Gmbh Device for modifying surface area of e.g. sheet goods, has plasma generation device whose electrodes are arranged at front side, gap formed between electrodes, and another gap formed between electrodes and goods
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
WO2013071138A1 (en) 2011-11-11 2013-05-16 Sio2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
JP6509734B2 (en) 2012-11-01 2019-05-08 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド Film inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
KR102336796B1 (en) 2013-03-11 2021-12-10 에스아이오2 메디컬 프로덕츠, 인크. Coated Packaging
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
US9435028B2 (en) * 2013-05-06 2016-09-06 Lotus Applied Technology, Llc Plasma generation for thin film deposition on flexible substrates
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9725802B2 (en) 2014-11-11 2017-08-08 Graham Packaging Company, L.P. Method for making pet containers with enhanced silicon dioxide barrier coating
BR112018003051B1 (en) 2015-08-18 2022-12-06 Sio2 Medical Products, Inc VACUUM BLOOD COLLECTION TUBE
CN112175220B (en) * 2020-09-03 2023-01-03 广东以色列理工学院 High-temperature-resistant modified polypropylene film and preparation method and application thereof

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5930130B2 (en) * 1979-09-20 1984-07-25 富士通株式会社 Vapor phase growth method
JPH07111957B2 (en) * 1984-03-28 1995-11-29 圭弘 浜川 Semiconductor manufacturing method
US4854263B1 (en) * 1987-08-14 1997-06-17 Applied Materials Inc Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films
US4863755A (en) * 1987-10-16 1989-09-05 The Regents Of The University Of California Plasma enhanced chemical vapor deposition of thin films of silicon nitride from cyclic organosilicon nitrogen precursors
JP2589599B2 (en) * 1989-11-30 1997-03-12 住友精密工業株式会社 Blow-out type surface treatment device
DE69032691T2 (en) * 1989-12-07 1999-06-10 Japan Science And Technology Corp., Kawaguchi, Saitama Process and apparatus for plasma treatment under atmospheric pressure
FR2666324B1 (en) * 1990-09-03 1993-04-09 Saint Gobain Vitrage Int THIN FILMS OF SILICON NITRIDE WITH IMPROVED PROPERTIES.
US5908565A (en) 1995-02-03 1999-06-01 Sharp Kabushiki Kaisha Line plasma vapor phase deposition apparatus and method
US5980999A (en) * 1995-08-24 1999-11-09 Nagoya University Method of manufacturing thin film and method for performing precise working by radical control and apparatus for carrying out such methods
JP3164019B2 (en) * 1997-05-21 2001-05-08 日本電気株式会社 Silicon oxide film, method for forming the same, and film forming apparatus
JPH1129873A (en) * 1997-07-11 1999-02-02 Sekisui Chem Co Ltd Method and apparatus for forming laminated film
JP3533094B2 (en) * 1997-12-17 2004-05-31 積水化学工業株式会社 Atmospheric pressure discharge plasma processing method and atmospheric pressure plasma processing apparatus
NL1010287C2 (en) * 1998-10-09 2000-04-11 Fuji Photo Film Bv A method for treating a photographic support with an atmospheric pressure glow discharge.
JP3959906B2 (en) * 1998-10-26 2007-08-15 松下電工株式会社 Plasma processing apparatus and plasma processing method
JP3555470B2 (en) * 1998-12-04 2004-08-18 セイコーエプソン株式会社 Etching method by atmospheric pressure high frequency plasma
JP2002110671A (en) * 2000-07-28 2002-04-12 Sekisui Chem Co Ltd Method for manufacturing semiconductor device
JP2002094221A (en) * 2000-09-20 2002-03-29 Sekisui Chem Co Ltd Atmospheric pressure pulse plasma processing method and apparatus

Also Published As

Publication number Publication date
JP2004535037A (en) 2004-11-18
DE50115255D1 (en) 2010-01-21
WO2002025693A1 (en) 2002-03-28
EP1325509A1 (en) 2003-07-09
EP1325509B1 (en) 2009-12-09
US6919107B2 (en) 2005-07-19
US20030185982A1 (en) 2003-10-02
CH694949A5 (en) 2005-09-30

Similar Documents

Publication Publication Date Title
AU2001285636A1 (en) Method and device for treating surfaces using a glow discharge plasma
AU2001279189A1 (en) Plasma processing method and apparatus
AU2001265093A1 (en) Methods and apparatus for plasma processing
AU2001288232A1 (en) Method and apparatus for tuning a plasma reactor chamber
AU2001279171A1 (en) Improved apparatus and method for forming a high pressure plasma discharge column
AU2002223092A1 (en) Pigging method and apparatus
AU2003232621A1 (en) Method and device for plasma treating workpieces
AU2002225452A1 (en) Method and device for plasma CVD
AU2003233770A1 (en) Method and device for plasma treating workpieces
AU4446400A (en) Method and apparatuses for plasma treatment
AU2002326159A1 (en) Plasma treating apparatus and plasma treating method
EP1139323A3 (en) Plasma display apparatus and manufacturing method
AU2001252164A1 (en) Method and device for operating a uv-radiation source
AU2001274578A1 (en) Gas supply device and treating device
AU2001279850A1 (en) Method and arrangement for studsystem
AU2001237845A1 (en) Plasma ion source and method
AU2001252348A1 (en) Method and plasma torch for treating a surface in a cavity and related filling-closure installation
AU3853900A (en) Arc detection method and apparatus
AU2003233772A1 (en) Method and device for plasma treating workpieces
AU2001261266A1 (en) Plasma processing method and apparatus
AU2001287708A1 (en) Method and device for regulating a vacuum in a chamber
AU2001234219A1 (en) Method and device for cleaning an oven
AU2002210358A1 (en) Nozzle device and method for operating a nozzle device
AU2003237688A1 (en) Method and device for plasma treating workpieces
AU2001253491A1 (en) Masking apparatus and method