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AU2001292775A1 - A method for quantifying the texture homogeneity of a polycrystalline material - Google Patents

A method for quantifying the texture homogeneity of a polycrystalline material

Info

Publication number
AU2001292775A1
AU2001292775A1 AU2001292775A AU9277501A AU2001292775A1 AU 2001292775 A1 AU2001292775 A1 AU 2001292775A1 AU 2001292775 A AU2001292775 A AU 2001292775A AU 9277501 A AU9277501 A AU 9277501A AU 2001292775 A1 AU2001292775 A1 AU 2001292775A1
Authority
AU
Australia
Prior art keywords
quantifying
polycrystalline material
texture homogeneity
homogeneity
texture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001292775A
Inventor
David P. Field
Christopher A. Michaluk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of AU2001292775A1 publication Critical patent/AU2001292775A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/20—Metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
AU2001292775A 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material Abandoned AU2001292775A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/665,845 2000-09-20
US09/665,845 US6462339B1 (en) 2000-09-20 2000-09-20 Method for quantifying the texture homogeneity of a polycrystalline material
PCT/US2001/029235 WO2002025271A2 (en) 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material

Publications (1)

Publication Number Publication Date
AU2001292775A1 true AU2001292775A1 (en) 2002-04-02

Family

ID=24671787

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001292775A Abandoned AU2001292775A1 (en) 2000-09-20 2001-09-19 A method for quantifying the texture homogeneity of a polycrystalline material

Country Status (8)

Country Link
US (1) US6462339B1 (en)
EP (1) EP1325315A2 (en)
JP (1) JP2004509356A (en)
KR (1) KR20030036809A (en)
CN (1) CN1236303C (en)
AU (1) AU2001292775A1 (en)
CA (1) CA2423406A1 (en)
WO (1) WO2002025271A2 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
GB0117892D0 (en) * 2001-07-23 2001-09-12 Oxford Instr Analytical Ltd Method of analysing crystalline texture
WO2005041663A1 (en) * 2003-10-31 2005-05-12 Ishihara Sangyo Kaisha, Ltd. Bactericide composition and method of controlling plant disease
WO2005080961A2 (en) * 2004-02-18 2005-09-01 Cabot Corporation Ultrasonic method for detecting banding in metals
US8252126B2 (en) 2004-05-06 2012-08-28 Global Advanced Metals, Usa, Inc. Sputter targets and methods of forming same by rotary axial forging
US7998287B2 (en) 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
US20060201589A1 (en) * 2005-03-11 2006-09-14 Honeywell International Inc. Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components
JP4797509B2 (en) * 2005-08-22 2011-10-19 株式会社Ｉｈｉ Destruction cause estimation apparatus and destruction cause estimation method
CN101374611B (en) * 2006-03-07 2015-04-08 卡伯特公司 Methods of producing deformed metal articles
KR101201577B1 (en) * 2007-08-06 2012-11-14 에이치. 씨. 스타아크 아이앤씨 Refractory metal plates with improved uniformity of texture
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
US9150957B2 (en) * 2008-11-03 2015-10-06 Tosoh Smd, Inc. Method of making a sputter target and sputter targets made thereby
CN101819150A (en) * 2010-04-21 2010-09-01 天津钢铁集团有限公司 Analytical method for component segregation of continuous casting slab
CN103376339B (en) * 2012-04-27 2015-05-20 中国科学院沈阳自动化研究所 Graphene crystal orientation rapid detection method based on atomic power microscopy
CN103928363B (en) * 2014-04-11 2016-09-07 常州天合光能有限公司 A kind of silicon chip crystal orientation detection method and detection device
CN103926262A (en) * 2014-04-18 2014-07-16 武汉钢铁(集团)公司 Evaluation method for auto sheet texture
US9785862B2 (en) 2014-08-18 2017-10-10 International Business Machines Corporation System and method for feeling surface roughness through microscopic data
WO2018179742A1 (en) 2017-03-30 2018-10-04 Ｊｘ金属株式会社 Tantalum sputtering target
KR102282885B1 (en) * 2020-03-06 2021-07-29 한국전기안전공사 Copper molten mark crystal orientation analysis method and system using EBSD
CN111664977B (en) * 2020-05-28 2022-03-04 哈尔滨工业大学 Method for detecting residual stress of silk-structure film
CN114965535B (en) * 2022-05-27 2025-02-11 睿宁高新技术材料(赣州)有限公司 Microstructure and performance analysis method, device and electronic equipment of NiV alloy target
CN115976484B (en) * 2022-12-28 2024-11-29 江苏芯德半导体科技股份有限公司 Sputtering process stability assessment method
AT527040B1 (en) * 2023-07-17 2024-10-15 Lkr Leichtmetallkompetenzzentrum Ranshofen Gmbh Computer-aided method for aligning texture measurement sample data of a texture measurement and device for data processing therefor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4990779A (en) * 1989-06-06 1991-02-05 Nippon Steel Corporation Method and apparatus for evaluating strains in crystals
US5466934A (en) * 1995-01-18 1995-11-14 Adams; Brent L. Method and apparatus for identification of crystallographic defects
US5576543A (en) * 1995-08-21 1996-11-19 Texsem Laboratories, Inc. Method and apparatus for determining crystallographic characteristics

Also Published As

Publication number Publication date
CN1236303C (en) 2006-01-11
JP2004509356A (en) 2004-03-25
US6462339B1 (en) 2002-10-08
CN1476533A (en) 2004-02-18
WO2002025271A3 (en) 2003-05-08
CA2423406A1 (en) 2002-03-28
EP1325315A2 (en) 2003-07-09
WO2002025271A2 (en) 2002-03-28
KR20030036809A (en) 2003-05-09

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